JP6653828B2 - Surface treatment equipment - Google Patents

Description

  The present invention relates to a surface treatment apparatus for supplying a replacement gas into a processing chamber and modifying the surface of a film by gas replacement discharge.

2. Description of the Related Art There is known a surface treatment apparatus that supplies a replacement gas such as nitrogen into a processing chamber provided with a discharge electrode to form a gas replacement discharge, and modifies the surface of a film that moves in opposition to the processing chamber.
For example, in the apparatus disclosed in Patent Document 1, a processing chamber is provided so as to face a grounded processing roller, and a discharge electrode is provided in the processing chamber and a replacement gas is supplied.
Then, the surface of the film conveyed in contact with the processing roller is processed by the energy of the gas replacement discharge.

In such a surface treatment apparatus, the degree of gas replacement in the processing chamber is important for maintaining a stable gas replacement discharge state in the processing chamber.
However, air outside the processing chamber may adhere to the surface of the moving film and flow into the processing chamber as an entrainment flow. When the entrainment flow flows into the processing chamber and the concentration of the replacement gas inside decreases, the gas replacement discharge state may become unstable.

Therefore, it is necessary to increase the supply amount of the replacement gas to the processing chamber in accordance with the inflow of the entrained flow, or to prevent the inflow of the entrained flow.
If the supply amount of the replacement gas is increased and the consumption amount is increased, there is a problem that the cost increases accordingly. In addition, the replacement gas whose supply amount has been increased may leak out of the processing chamber and cause a problem. For example, if a large amount of nitrogen or the like flows out to the outside, an oxygen deficiency state occurs outside.

  Therefore, in the apparatus of Patent Document 1, in order to prevent the inflow of the entrainment flow, a nip roller that contacts the film surface and rotates according to the rotational force of the processing roller is provided close to the opening of the processing chamber. . In this conventional apparatus, a nip roller provided in contact with the film near the processing chamber blocks an entrained flow layer on the film and prevents the entrained flow from flowing into the processing chamber. .

JP 2005-076063 A JP 2000-309870 A

In the conventional surface treatment apparatus as described above, since the film is sandwiched between the nip roller and the processing roller pressed against the film, it is necessary to surely block the entrainment flow accompanying the film at the contact portion between the film and the nip roller. Can be.
However, depending on the properties of the film to be processed, the nip roller may not be able to be pressed against the surface. If the film is used for optical purposes, for example, in which even a slight scratch will lead to a decrease in quality, and the film is easily damaged, the nip roller cannot be brought into contact with the film surface.

That is, the above-described surface treatment apparatus that presses the nip roller against the film surface to block the entrainment flow may not be used.
An object of the present invention is to prevent the entrainment flow from flowing into the processing chamber more reliably even when the roller can be brought into contact with the film surface, and even when the roller cannot be brought into contact with the film surface. It is an object of the present invention to provide a surface treatment apparatus capable of maintaining the degree of substitution.

According to the present invention, a processing roller and a processing chamber opposed to the processing roller and configured to supply a replacement gas therein to form a gas replacement discharge are provided, and the film surface moving in contact with the processing roller is provided with the gas. It is assumed that the surface treatment apparatus is modified by the energy of the displacement discharge.
On the premise of the above-mentioned apparatus, a first aspect of the present invention is to provide an entrainment flow separate from the processing chamber at a position upstream of the processing chamber in the moving direction of the film and opposed to the film in contact with the processing roller. A shutoff roller and an interval adjusting mechanism for adjusting an opposing interval between the entrainment shutoff roller and the processing roller are provided .
The interval adjusting mechanism adjusts an opposing interval between the entrainment flow cutoff roller and the processing roller so that the entrainment flow interruption roller and the film are brought into contact with each other or a shear force capable of cutting the entrainment flow is applied. A non-contact state is maintained in the range to prevent the accompanying flow adhering to the film from flowing into the processing chamber.
The material and thickness of the film to be processed by this apparatus are not limited as long as the film is in contact with the processing roller and can be moved by its rotation.

  A second invention is characterized in that a drive mechanism for rotating the entrainment flow interrupting roller and a switching mechanism for connecting and shutting off between the drive mechanism and the entrainment flow interruption roller are provided. .

  According to a third aspect of the present invention, the entrainment flow interrupting roller is maintained at a non-contact position with respect to the film by the interval adjusting mechanism, and the driving mechanism sets a position between the peripheral speed of the entrainment flow interrupting roller and the moving speed of the film. The speed difference is maintained.

  According to a fourth aspect of the present invention, the entrainment flow interrupting roller is maintained at a position in contact with the film by the interval adjustment mechanism, and the connection between the entrainment flow interrupting roller and the driving mechanism is interrupted by the switching mechanism. It is characterized by the following.

  A fifth invention is characterized in that a distance adjusting mechanism for adjusting a distance between the entrainment flow cutoff roller and the processing chamber is provided.

  A sixth invention is characterized in that a replacement gas outflow mechanism for causing the replacement gas to flow out from the surface of the entrainment flow blocking roller is provided.

According to the first aspect of the present invention, the entrainment flow interrupting roller separate from the processing chamber is brought into contact with the film on the upstream side of the processing chamber, or is brought into non-contact with the film to adjust the facing distance with the processing roller. At the optimum position.
For example, when the entrainment flow-blocking roller is brought into contact with the film, the entrainment flow-blocking roller sandwiches the film between the processing roller and the film, thereby more reliably blocking the entrainment flow of the film, and the entrainment flow flows to the processing chamber. Inflow can be prevented.
In addition, by pressing the moving film with the rollers, the film can be prevented from shifting and more stable movement can be realized. As a result, the positional relationship between the film surface and the processing chamber is maintained, and uniform surface modification can be performed.

  Further, since the film can be brought into close contact with the processing roller by the entrainment flow blocking roller, it is possible to prevent a cavity from being formed between the film and the processing roller even in a portion facing the processing chamber. Therefore, it is possible to prevent a change in the discharge state due to the above-mentioned cavities and to prevent a partial reforming defect, thereby enabling uniform surface modification.

On the other hand, with respect to a film for which the entrainment flow interrupting roller is not desired to be brought into contact with the surface, the optimal interval can be maintained while maintaining the non-contact state. Therefore, it is possible to prevent the entrainment flow from flowing into the processing chamber without damaging the film.
If the inflow of the entrainment flow can be prevented, the degree of replacement in the processing chamber can be maintained, the consumption of the replacement gas can be suppressed, and a stable gas replacement discharge state can be maintained. Further, the discharge is not disturbed by the entrainment flow.

  According to the second aspect of the invention, when the entrainment flow interrupting roller is brought into contact with the film, the connection between the entrainment flow obstruction roller and the driving mechanism is disconnected, and the entrainment flow obstruction roller is set in a free rotation state to respond to movement of the film. When the entrainment cutoff roller is not in contact with the film, a drive mechanism can be connected to arbitrarily control the rotation of the entrainment cutoff roller.

  According to the third invention, even when it is not desired to bring the roller into contact with the film surface, the layer of the entrainment flow on the film is destroyed by the speed difference between the peripheral speed of the entrainment interruption roller and the moving speed of the film. In addition, it is possible to prevent the entrainment flow from flowing into the processing chamber.

According to the fourth aspect, since the film is sandwiched between the entrainment flow blocking roller and the processing roller, the entrainment flow can be more reliably blocked at the contact portion of the entrainment flow blocking roller. Further, since the film is sandwiched between both rollers, fluttering of the film can be prevented.
Further, since the entrainment cutoff roller rotates following the movement of the film, there is no need to control the drive mechanism.

According to the fifth aspect, the position of the entrainment cutoff roller can be adjusted to an optimum position on the upstream side of the processing chamber. When the distance between the entrainment flow shut-off roller and the processing chamber is too large, even if the entrainment flow is interrupted by the entrainment flow interrupting roller, outside air may be entrained again downstream of the entrainment flow. On the other hand, another member is provided in the vicinity of the processing chamber, and there is a case where the entrainment flow shut-off roller cannot be brought close to that.
With the use of the distance adjuster of the present invention, the entrainment cutoff roller can be installed at an optimum position in consideration of the various conditions as described above.

According to the sixth aspect of the present invention, the replacement gas flowing out of the entrainment flow shut-off roller can block the entrainment flow of the outside air at the opposing portion between the entrainment flow interruption roller and the film. Further, if the replacement gas adheres to the film after the entrainment flow is cut off and a layer of the replacement gas is formed, it becomes difficult for the outside air to be entrained, and the replacement gas flows into the processing chamber, and the replacement gas in the processing chamber is replaced. There is no reduction.
As described above, the replacement gas that has flowed out of the roller serving as the entrainment flow cutoff roller is positively entrained in the film, whereby the entrainment of outside air can be prevented, and the degree of substitution in the processing chamber can be prevented from lowering.

FIG. 3 is a conceptual diagram of the apparatus according to the first embodiment, showing a state in which an entrainment flow blocking roller is in contact with a film. FIG. 4 is a conceptual diagram of the device of the first embodiment, and is a diagram when the entrainment cutoff roller and the film are kept in a non-contact state. It is a conceptual diagram near the entrainment flow interruption roller of 2nd Embodiment. It is a conceptual diagram near the entrainment flow interruption roller of 2nd Embodiment.

In the apparatus of the first embodiment shown in FIGS. 1 and 2, a film F to be processed is wound around a grounded processing roller 1, and the processing roller 1 is located at a position facing the processing roller 1 via the film F. A processing chamber 2 and an entrainment flow blocking roller 6 are provided.
The processing roller 1 has a function of rotating in the direction of arrow x by a drive mechanism (not shown) and moving the film F in the direction of arrow a.

  Further, the processing chamber 2 is provided therein with a rod-shaped discharge electrode 3 having a length extending across the width of the film F, and is provided with gas supply pipes 4 and 5 for supplying a replacement gas. The gas supply pipe 4 is a pipe for opening a discharge port in the discharge electrode 3 and supplying a replacement gas near the tip of the discharge electrode 3. The gas supply pipe 5 supplies the replacement gas to the entire processing chamber 2. It is for supply. The broken arrows in the drawing indicate the replacement gas.

The above-mentioned replacement gas is a gas that replaces the inside of the processing chamber 2 in order to form a gas replacement discharge in an atmosphere other than the atmosphere outside the processing chamber 2.
Then, a high voltage is applied to the discharge electrode 3 to cause discharge, and the surface of the film F conveyed in contact with the processing roller 1 is processed by the energy of gas replacement discharge.
The material and thickness of the film F to be processed by this apparatus are not limited as long as the film F is in contact with the processing roller 1 and can be moved by its rotation. In particular, it may be thicker than a resin film for packaging material having a thickness of 250 [μm] stipulated by JIS standards, and it is possible to treat metal, paper, etc. in addition to resin.

The entrainment flow interrupting roller 6 has a length that spans the entire width of the film F at a position upstream of the processing chamber 2 in the film moving direction a and at a position where the film F is in contact with the processing roller 1. .
A drive mechanism 8 is connected to the entrainment flow cutoff roller 6 via a switching mechanism 7, and a control mechanism 9 for controlling the drive mechanism 8 is connected to the drive mechanism 8. The switching mechanism 7 is a mechanism that connects or disconnects the entrainment flow interrupting roller 6 and the driving mechanism 8 to switch the transmission of the driving force of the driving mechanism 8. When the entrainment flow interrupting roller 6 and the drive mechanism 8 are in a connected state, the entrainment flow interruption roller 6 is driven to rotate by the drive mechanism 8, and in the interrupted state, the entrainment flow interruption roller 6 is in a free rotation state. Becomes

Further, the apparatus according to the first embodiment includes an interval adjusting mechanism (not shown) for adjusting the interval between the entrainment flow shutoff roller 6 and the processing roller 1, and the distance from the entrainment flow shutoff roller 6 to the processing chamber 2. And a distance adjusting mechanism for adjusting.
The interval adjusting mechanism is a mechanism that adjusts an opposing interval between the entrainment flow interrupting roller 6 and the processing roller 1, and enables the roller to move in a direction indicated by a dashed line arrow A in FIG.

  On the other hand, the distance adjustment mechanism adjusts the distance between the entrainment flow cutoff roller 6 and the processing chamber 2 and adjusts the distance along the outer peripheral surface of the processing roller 1 indicated by the arrow B. is there. For example, the spacing adjustment mechanism and the distance adjustment mechanism can move the support member rotatably supporting the entrainment flow interrupting roller 6 or can relatively move the support member and the rotation axis of the entrainment flow interruption roller 6. It is a mechanism that did. As a result, the distance d (see FIG. 2) between the processing roller 1 and the opposing portion of the entrainment flow blocking roller 6 facing the processing roller 1 and the distance between the entrainment flow blocking roller 6 and the opening end 2a of the processing chamber 2 are reduced. Can be adjusted.

The interval d is the shortest distance between the outer circumference of the entrainment flow blocking roller 6 and the outer circumference of the processing roller 1.
Further, a wavy arrow b in the drawing is an entrainment flow of the outside air accompanying the film F. When the entrainment flow b flows into the processing chamber 2, the degree of substitution inside is reduced.

In the apparatus of the first embodiment, the distance between the entrainment flow shut-off roller 6 and the processing roller 1 is adjusted by the interval adjustment mechanism, and the entrainment flow interrupting roller 6 is brought into contact with the film F or in a non-contact state. Or you can.
As shown in FIG. 1, the above-mentioned entrainment interrupting roller 6 can be brought into contact with the film F by setting the interval d to substantially zero. In this case, the connection between the entrainment flow interrupting roller 6 and the drive mechanism 8 is interrupted by the switching mechanism 7, and the entrainment flow interruption roller 6 is maintained in a free rotation state.

In this way, the entrainment flow interrupting roller 6 in contact with the film F rotates in the rotation direction y according to the movement of the film F moved by the processing roller 1.
As shown in FIG. 1, when the entrainment flow interrupting roller 6 sandwiches the film F between the processing roller 1 and the entraining flow interruption roller 6, the entrainment flow b is interrupted at a contact point P between the entrainment flow interruption roller 6 and the film F. In addition, it is possible to prevent the entrainment flow b from flowing into the processing chamber 2.

On the other hand, FIG. 2 shows a state in which the interval d is widened by the interval adjusting mechanism, and the entrainment cutoff roller 6 and the film F are kept out of contact. For example, this is a setting when there is a concern that the surface of the film F may be damaged by the entrainment flow blocking roller 6.
However, it is necessary to apply a shearing force to the layer of the entrained flow b so that the layer of the entrained flow b can be destroyed. Therefore, it is necessary to set according to the thickness of the layer of the entrainment flow b formed on the film F, and specifically, it is about several [mm].
At this time, the switching mechanism 7 connects the entrainment flow cutoff roller 6 and the drive mechanism 8, and the control mechanism 9 controls the drive mechanism 8 to rotate the entrainment flow cutoff roller 6 in the rotation direction x.

In the non-contact state shown in FIG. 2, the entrainment flow b on the film F is destroyed at the distance d between the entrainment flow interrupting roller 6 and the surface of the film F, and the entraining flow b is downstream from the entrainment flow interruption roller 6. The flow into the side processing chamber 2 is prevented.
In particular, as shown in FIG. 2, when the entrainment flow shut-off roller 6 is rotated in the rotation direction x, the rotation reverses to the flow direction of the entrainment flow b. Yes, further increases the blocking effect.
However, the rotation direction of the entrainment flow blocking roller 6 is not limited to x, and may be the rotation direction y shown in FIG. In any case, by making a difference between the peripheral speed of the entrainment flow blocking roller 6 and the moving speed of the film F, the layer of the entrainment flow b on the film F is easily broken.

As described above, according to the apparatus of the first embodiment, the entrainment flow b is cut off even when the entrainment flow interruption roller 6 cannot be brought into contact with the surface of the film F, and The inflow of the entrainment flow b can be prevented.
Therefore, the degree of substitution in the processing chamber 2 does not decrease due to the entrainment flow b, and the degree of substitution is maintained. Therefore, there is no need to supply a large amount of the replacement gas to the processing chamber 2 in order to maintain the replacement degree, and the consumption of the replacement gas can be suppressed.
Further, if the entrainment flow b does not flow into the processing chamber 2, the discharge state in the processing chamber 2 is not disturbed by the airflow of the entrainment flow b.

  Further, the distance between the entrainment flow blocking roller 6 and the processing chamber 2 can be adjusted by the distance adjusting mechanism. Since the distance in the direction of arrow B along the outer periphery of the processing roller 1 corresponds to the moving distance of the film F from the entrainment flow blocking roller 6 to the opening end 2a of the processing chamber 2, if the distance is too large, After the entrainment flow blocking roller 6 blocks the entrainment flow b, a new entrainment flow layer may be formed downstream of the entrainment flow interruption roller 6.

Therefore, it is considered that the above-mentioned distance is preferably small. However, the above-mentioned distance may not be so small depending on the apparatus conditions near the processing chamber 2. Even in such a case, if the entrained flow b is more completely shut off at the opposing portion between the entrained flow interrupting roller 6 and the processing roller 1, a new downstream side of the entrained flow interrupting roller 6 can be provided. The influence of the entrainment flow of the outside air formed in the air can be reduced. That is, it is possible to set the entrainment flow blocking roller 6 to an optimum distance by the interval adjusting mechanism and the distance adjusting mechanism.
In the first embodiment, the entrainment flow interrupting roller 6 is provided in a range where the film F is in contact with the processing roller 1 because the moving film F is less displaced. This is because the optimum distance d can be maintained.

In the second embodiment shown in FIGS. 3 and 4, an entrainment flow interruption roller 10 having a porous layer 11 is used instead of the entrainment flow interruption roller 6. Other configurations are the same as those of the first embodiment. FIGS. 3 and 4 show only the vicinity of the entrainment cutoff roller 10, but in other parts not shown, the same reference numerals as those in FIGS. This will be described with reference to FIG.
The roller 10 allows the distance between the processing roller 1 and the processing roller 1 to be adjusted by the distance maintaining mechanism, as in the entrainment flow interrupting roller 6 of the first embodiment shown in FIGS. It is a roller used while maintaining its state.

The entrainment flow blocking roller 10 includes a porous layer 11 on the outer periphery of a central gas supply pipe 12, and a plurality of outflow holes 12 a formed in a side wall of the gas supply pipe 12. A replacement gas supply source (not shown) is connected to an end of the gas supply pipe 12.
The replacement gas supplied from the replacement gas supply source flows out from the outer periphery of the entrainment flow interrupting roller 10 to the outside from the outflow hole 12a via the porous layer 11. The replacement gas supply source, the gas supply pipe 12, the outflow holes 12a and the porous layer 11 constitute the replacement gas outflow mechanism of the present invention.
The porous porous layer 11 can be formed of, for example, a sintered ceramic or a foamed resin having open cells.

  If the entrainment flow interrupting roller 10 as described above is used by controlling the interval adjusting mechanism so as to be in contact with the film F as shown in FIG. The entrainment flow b is displaced by the replacement gas indicated by the dashed arrow c flowing out of the film F, and is more reliably shut off at the contact point P with the film F. As a result, the entrainment flow b on the upstream side of the roller 10 does not move to the downstream side beyond the contact point P, and the layer of the replacement gas adheres on the film F on the downstream side of the roller 10 to entrain the outside air. It is difficult to form a flow.

Even if the layer of the replacement gas formed on the film F on the downstream side of the entrainment flow interrupting roller 10 flows into the processing chamber 2, there is no problem because the degree of replacement in the processing chamber 2 is not reduced.
When the entrainment flow interrupting roller 10 is brought into contact with the film F, the connection between the drive mechanism 8 and the entrainment flow interruption roller 10 is interrupted by the switching mechanism 7, and the entrainment flow interruption roller 10 is freely rotated. Keep it in a state.

Also in the second embodiment, the gap between the processing roller 1 and the entrainment flow interrupting roller 10 is adjusted by the interval adjusting mechanism to keep the entrainment flow interrupting roller 10 out of contact with the film F. Can be.
FIG. 4 shows a state in which the entrainment flow interrupting roller 10 is brought into non-contact with the film F. In this case, the drive mechanism 8 is connected by the switching mechanism 7 and the entrainment is performed by the drive mechanism 8. The flow blocking roller 10 is rotated in the rotation direction x or the direction y (see FIG. 4).

When the entrainment cutoff roller 10 is rotated in the x direction shown in FIG. 4, the flow of the replacement gas c reverses the entrainment flow b of the outside air on the upstream side of the entrainment cutoff roller 10 due to the rotation of the roller 10. Therefore, the flow of the replacement gas can cancel the energetic flow of the entrained flow b and cut off the entrained flow b.
In addition, on the downstream side of the entrainment flow cutoff roller 10, the replacement gas c flowing out toward the film F accompanies the film F, thereby preventing the re-entrainment of the outside air and preventing the degree of substitution in the processing chamber 2 from decreasing. .

Also, when the entrainment flow shutoff roller 10 is rotated in the y direction, the entrainment flow b is interrupted within the opposing interval between the entrainment flow interception roller 10 and the film F, as in the first embodiment shown in FIG. it can. In particular, if a difference is made between the peripheral speed of the entrainment flow shut-off roller 10 and the moving speed of the film F, the layer of the entrainment flow b is easily broken, and the entrainment flow can be more reliably interrupted. Further, on the downstream side of the entrainment flow cutoff roller 10, the replacement gas c flowing out toward the film F is accompanied by the film F in the same manner as described above, thereby preventing the re-entrainment of the outside air, and the degree of replacement in the processing chamber 2 is reduced. It can be prevented from falling.
Also in the second embodiment, the entrainment flow blocking roller 10 can be adjusted from the contact state to the non-contact state with respect to the film F, and setting according to the characteristics of the film F is possible.

In the second embodiment, the replacement gas flows out from the entire side surface of the entrainment flow shut-off roller 10. The amount of the replacement gas is such that the flow of the entrainment flow b can be interrupted at the portion facing the film F. It is sufficient that the amount is negligible compared with the replacement gas supplied to the processing chamber 2. Therefore, even if the replacement gas flows out of the entrainment flow cutoff roller 10, there is no particular problem with respect to the consumption amount.
However, when the replacement gas is a harmful gas, when the entrainment flow interrupting roller 10 is used, it is necessary to exhaust the surroundings by another means.

  In each of the surface treatment apparatuses of the first and second embodiments, the entrainment flow shut-off roller is separate from the processing chamber 2 and the interval adjustment mechanism and the distance adjustment mechanism are provided so that the rollers can be brought into contact with each other. Even in the case where it is not possible, the entrainment flow shut-off roller can be provided at a position where the entrainment flow can be efficiently shut off. As a result, it is possible to cope with films having various characteristics while reliably preventing the entrainment flow from flowing into the processing chamber 2.

In the above embodiment, the gas supply pipes 4 and 5 for supplying the replacement gas are provided in the processing chamber 2, but the configurations of the gas supply pipe, the discharge electrode, and the processing chamber 2 are not limited to the above embodiment. The processing chamber 2 may have any configuration as long as the processing gas can be introduced into the processing chamber 2 to form a gas replacement discharge.
Further, in FIGS. 1 and 2, the processing chamber 2 is positioned above the processing roller 1, but the positional relationship between the processing roller 1 and the processing chamber 2 is not limited to this. The processing chamber 2 and the processing chamber 2 may be disposed so as to face each other with the film F to be processed interposed therebetween, for example, beside or below the processing roller 1.
Further, the contact length around which the film F is wound around the processing roller 1 is not particularly limited. However, it is necessary that the processing chamber 2 and the entrainment flow interrupting roller have a length that can be provided to face the film F.

Further, the material of the entrainment flow cutoff roller is not limited. However, if the surface of the film F has a certain degree of elasticity, it is difficult to damage the film F when the film F is sandwiched between the processing roller 1 and the entrainment roller. The range which can be used with becomes wide.
Further, in the above embodiment, the processing roller 1 is connected to the ground. However, if a potential difference at which a gas replacement discharge can be formed between the processing roller 1 and the discharge electrode 3 in the processing chamber 2 can be maintained, the processing roller 1 is grounded. It does not have to be a potential.

  The present invention is applicable to a surface treatment apparatus for modifying a film surface having various characteristics by gas replacement discharge.

REFERENCE SIGNS LIST 1 processing roller 2 processing chamber 3 discharge electrode 4 gas supply pipe 5 gas supply pipe 6 entrainment cutoff roller 7 switching mechanism 8 drive mechanism 10 entrainment cutoff roller 11 porous layer 12 gas supply pipe 12a outflow hole F film P contact b entrainment flow c (Replacement gas) flow

Claims (6)

A processing roller;
A processing chamber that faces the processing roller and supplies a replacement gas therein to form a gas replacement discharge is provided,
In a surface treatment apparatus that reforms the film surface moving in contact with the treatment roller with the energy of the gas displacement discharge,
At a position upstream of the processing chamber in the direction of movement of the film and at a position facing the film in contact with the processing roller, an entrainment flow blocking roller separate from the processing chamber,
A gap adjustment mechanism for adjusting the opposing distance between the entrained flow blockage roller and the treatment roller is provided,
The gap adjusting mechanism adjusts the facing gap,
The entrainment flow interrupting roller may be kept in a contact position with respect to the film, or the entrainment flow interruption roller may be applied to the entrained flow adhered to the film within a range in which a shear force capable of breaking a layer of the entrained flow is applied. Or keep the film in a non-contact state,
A surface treatment apparatus configured to prevent the entrainment flow adhering to the film from flowing into the processing chamber by the entrainment flow blocking roller. A drive mechanism for rotating the entrainment cutoff roller,
2. The surface treatment apparatus according to claim 1, further comprising a switching mechanism for connecting and disconnecting between the driving mechanism and the entrainment flow interruption roller.   The gap adjusting mechanism keeps the entrainment flow interrupting roller in a non-contact position with respect to the film, and the driving mechanism maintains a speed difference between the peripheral speed of the entraining flow interrupting roller and the moving speed of the film. The surface treatment apparatus according to claim 2, wherein the surface treatment apparatus is configured to perform the treatment.   3. The structure according to claim 2, wherein the entrainment flow interrupting roller is maintained at a position in contact with the film by the gap adjusting mechanism, and the connection between the entrainment flow interrupting roller and the driving mechanism is interrupted by the switching mechanism. Surface treatment device.   The surface treatment apparatus according to any one of claims 1 to 4, further comprising a distance adjusting mechanism for adjusting a distance between the entrainment flow cutoff roller and the processing chamber.   The surface treatment apparatus according to any one of claims 1 to 5, further comprising a replacement gas outflow mechanism that causes the replacement gas to flow out of the surface of the entrainment flow cutoff roller.

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