JP6674520B2 - Particle manufacturing equipment - Google Patents

Description

  The present invention relates to a particle manufacturing apparatus for obtaining particles used in electronic devices such as phosphors, solar cells, and semiconductors by using a spray pyrolysis method.

  Ultra-fine particles in the order of submicron to micron are used for phosphors in displays such as cathode ray tubes (CRT, Cathode Ray Tube), FED (Field Emission Displays), and PDP (Plasma Display Panels). It is generally manufactured using a spray flame method. The ultrasonic spray flame method, which is a spray pyrolysis method, has been developed as a method for producing fine particles that can be substituted for the solid phase method used industrially.

  In a fine particle manufacturing apparatus using an ultrasonic spray flame method, an ultrasonic sprayer that sprays a raw material solution using ultrasonic waves to form droplets to obtain a raw material in droplet form, and a burner that generates a flame, It is generally composed of an electrostatic collector that collects fine particles obtained by introducing droplet-shaped raw materials into the flame, and a burner is installed above the ultrasonic sprayer. A flame is generated at the top of a burner composed of a plurality of cylinders having a coaxial center. As an apparatus for manufacturing fine particles having such a configuration, for example, there is a manufacturing apparatus disclosed in Patent Document 1.

  In an ultrasonic atomizer, a raw material solution is sprayed using ultrasonic waves to form a droplet-shaped raw material. The raw material in the form of droplets formed by the ultrasonic atomizer is introduced into the flame with a carrier gas, controls the temperature in the flame, and generates fine particles in the flame. The fine particles produced by the reaction in the flame of the burner are collected in the electrostatic collector. The gas such as the carrier gas that has risen together with the fine particles generated in the flame is collected in a cooling trap by a suction pump, and discharged through the suction pump.

  In order to suppress the particle size distribution in the conventional fine particle manufacturing apparatus having the above-described configuration, the raw material solution is formed into droplets using ultrasonic waves capable of forming relatively uniform liquid droplets (droplet-shaped raw material). The method was used. Further, the particle size of the particles can be controlled by changing the concentration of the raw material solution.

JP 2005-120283 A

  In the conventional ultrasonic spray flame method, the droplet-shaped raw material solution, which is a droplet solution, is directly introduced into the flame to generate fine particles, so that the process of producing particles is simplified. The electrostatic collector that collects the dust is indispensable.

  In the conventional fine particle manufacturing apparatus, no change in the particle size of the fine particles was observed even when the temperature of the flame was changed. However, there was a tendency that as the concentration of the raw material solution was increased, the particle diameter of the fine particles was also increased. However, in a conventional fine particle manufacturing apparatus, a raw material solution having a constant concentration and a constant volume is supplied to a batch type ultrasonic atomizer, and the concentration and the volume of the raw material solution cannot be changed. There was a problem that serial production was not possible.

  The present invention has been made in order to solve the above-described problems, and at least one of obtaining a device capable of manufacturing and recovering particles with a relatively simple device configuration, and being capable of continuously manufacturing particles is provided. It is an object to obtain a particle manufacturing apparatus that can be realized.

  A particle manufacturing apparatus according to one embodiment of the present invention includes a raw material solution atomizing mechanism for atomizing a raw material solution in an atomization container to obtain a droplet-shaped raw material, and thermally decomposing the droplet-shaped raw material in a capture space. A particle production capture mechanism that obtains the raw material particles, and a raw material transport unit that transports the droplet-shaped raw material toward the particle production capture mechanism, the particle production capture mechanism having the capture space, A chamber provided to introduce the droplet-shaped raw material into the capture space along a direction, and the capture outside the chamber so as to sandwich the capture space in a vertical direction orthogonal to the horizontal direction. An upper heater and a lower heater provided at an upper portion and a lower portion of a space; and a particle collection substrate provided at a lower portion of the trapping space in the chamber, wherein a heating temperature of the upper heater is the lower heating portion. Vessel heating It is set high from the degree.

  In the particle manufacturing apparatus according to one aspect of the present invention, the droplet-shaped raw material introduced into the trapping space along the horizontal direction is thermally decomposed by heat treatment by the partial heater and the lower heater to become raw material particles. By depositing on the particle collecting substrate provided in the lower part of the space, it is possible to generate and capture the raw material particles in the chamber.

  At the time of capturing the raw material particles, by setting the heating temperature of the upper heater higher than the heating temperature of the lower heater, the rising air flow generated by the heating temperature of the lower heater is suppressed, and the raw material is easily placed on the particle collecting substrate. Particles can be deposited.

  As a result, in the particle manufacturing apparatus according to one embodiment of the present invention, since the generation and collection of the raw material particles can be performed in one chamber, the raw material solution can be converted from the raw material particles while simplifying the apparatus configuration. Can be obtained.

FIG. 1 is a block diagram schematically illustrating a configuration of a particle manufacturing apparatus according to Embodiment 1 of the present invention. It is a block diagram which shows typically the structure of the particle manufacturing apparatus which is Embodiment 2 of this invention. It is a block diagram which shows typically the structure of the particle manufacturing apparatus which is Embodiment 3 of this invention.

<First Embodiment>
FIG. 1 is a block diagram schematically illustrating a configuration of a particle manufacturing apparatus 100 according to Embodiment 1 of the present invention. The particle manufacturing apparatus 100 according to the first embodiment includes a carrier introduction mechanism 60, a raw material solution atomization mechanism 50, and a particle production capture mechanism 80 as main components.

  The raw material solution atomizing mechanism 50 uses the ultrasonic vibrator 1 that generates ultrasonic waves to atomize the raw material solution 5 put into the atomizing container 4 into micrometer-sized droplets to obtain a droplet-shaped raw material. .

  The particle production capture mechanism 80 directly performs production and collection of the raw material particles in the cubic chamber 7 (chamber) in which the particle collecting substrate 9 is provided.

  The carrier introduction mechanism 60 is a gas supply source necessary for transporting the droplet-shaped raw material obtained by the raw material solution atomizing mechanism 50 into the cubic chamber 7.

  In the raw material solution atomizing mechanism 50 of the particle manufacturing apparatus 100, for example, an ultrasonic frequency in a range of 1.5 to 2.5 MHz can be used as the ultrasonic vibrator 1. By introducing water 3 into a water tank 2 as a medium of ultrasonic propagation generated by the ultrasonic vibrator 1 in a water tank 2 provided on the ultrasonic vibrator 1 and driving the ultrasonic vibrator 1, the atomization container The raw material solution 5 charged in 4 is converted into droplets to obtain a droplet-shaped raw material that is a micrometer-sized droplet.

  By supplying the carrier gas sent from the carrier gas cylinder 16 in the carrier introduction mechanism 60 into the atomization container 4 from the carrier gas introduction line 6, the droplet-shaped raw material sprayed in the internal space of the atomization container 4 , And is carried through a mist supply line 71 into a horizontally arranged cubic chamber 7. That is, the carrier introduction mechanism 60 functions as a raw material transport unit that transports the droplet-shaped raw material generated in the atomization container 4 toward the cubic chamber 7 that is a particle generation unit.

  Droplet-shaped raw material is introduced in the horizontal direction D7 from the inlet 7i of the cubic chamber 7 through the mist supply line 71, and is guided to the internal capture space SP7. The cubic chamber 7 has a top surface 7u, a bottom surface 7b and two side surfaces along a horizontal direction to form a rectangular parallelepiped capture space SP7 therein, and an introduction port 7i connected to a mist supply line 71 and The discharge port 7o connected to the exhaust gas discharge line 72 is formed at a height between the upper surface 7u and the bottom surface 7b. As described above, the cubic chamber 7 is provided so as to introduce the droplet-shaped raw material into the space between the capture spaces SP7 along the horizontal direction D7.

  Outside the cubic chamber 7, a plate-like ceiling hot plate 8a (upper heater) is provided on the upper surface 7u, and a plate-like floor hot plate 8b (lower heater) is provided on the bottom surface 7b. That is, the hot plate group 8 is configured by the ceiling hot plate 8a and the floor hot plate 8b provided above and below the capture space SP7 so as to sandwich the capture space SP7 in the vertical direction orthogonal to the horizontal direction D7.

  On the other hand, inside the cubic chamber 7, a particle collecting substrate 9 is provided on a bottom surface 7b. As described above, the particle manufacturing apparatus 100 according to the first embodiment uses the cubic chamber 7 having the rectangular parallelepiped capture space SP7 therein as the capture container in the particle manufacturing capture mechanism 80, and thereby the inside of the cubic chamber 7 is used. A particle collecting substrate 9 for collecting particles can be provided on the bottom surface 7b.

  Further, since each of the ceiling hot plate 8a and the floor hot plate 8b can be constituted by using a resistance heating element or the like, the temperature in the capture space SP7 of the cubic chamber 7 is arbitrarily set to 100 in accordance with the raw material particles to be produced. It can be controlled within the range of ~ 1000 ° C. The heating temperature of the ceiling hot plate 8a is set higher than the heating temperature of the floor hot plate 8b.

  As the carrier gas obtained from the carrier introduction mechanism 60, nitrogen gas is mainly used for the purpose of transporting the raw material in droplet form, and the flow rate of the nitrogen carrier gas is 2 to 10 L / min. In addition, a hydrogen gas for forming a reducing atmosphere or an oxygen gas for forming an oxidizing atmosphere is mixed in accordance with the raw material particles of the target.

  In the particle manufacturing apparatus 100 having such a configuration, the cubic particle manufacturing chamber 7 can collect the raw material particles obtained from the droplet-shaped raw material introduced in the horizontal direction D7 with the particle collecting substrate 9.

  Hereinafter, this point will be described in detail. In the trapping space SP7 of the cubic chamber 7, the solvent in the dropletized material evaporates due to heat treatment by the hot plate group 8, and the material is thermally decomposed to form material particles. It is collected by being deposited on the collecting substrate 9.

  The heating temperature of the floor hot plate 8b provided on the bottom surface 7b may cause an upward airflow in the capture space SP7. However, the heating temperature of the ceiling hot plate 8a provided on the upper surface 7u is reduced to the floor hot plate 8b. By setting the heating temperature to be higher than the heating temperature, the rising airflow caused by the floor hot plate 8b can be suppressed, and the raw material particles can be easily deposited on the particle collecting substrate 9.

  Further, the carrier gas containing the thermal decomposition product of the raw material and the solvent vapor is processed by the exhaust gas treatment device 10 connected to the outlet 7o of the cubic chamber 7 via the exhaust gas discharge line 72, and then is discharged from the exhaust gas output line 19. Released to the atmosphere.

  As described above, in the particle manufacturing apparatus 100 of the first embodiment, the raw material particles are generated in the cubic chamber 7 in which the droplet-shaped raw material is introduced into the capture space SP7, and the collection can be also realized. In addition, the generation and collection of the raw material particles can be performed with a relatively simple configuration without using a separate particle collection device. As a result, by simplifying the manufacturing process of the particles, the manufacturing cost of the particles is reduced, and improvement in operability and maintainability of the particle manufacturing apparatus 100 can be expected.

  As described above, in the particle manufacturing apparatus 100 of the first embodiment, the droplet-shaped raw material introduced in the horizontal direction D7 into the capture space SP7 of the cubic chamber 7 has a reduced flow velocity in the capture space SP7, The raw material particles are thermally decomposed by the heat treatment by the hot plate group 8 and are deposited on the particle collecting substrate 9 provided below the capture space SP7, so that the generation and capture of the raw material particles are performed in the cubic chamber 7. It can be carried out.

  By setting the heating temperature of the ceiling hot plate 8a higher than the heating temperature of the floor hot plate 8b when capturing the above-described raw material particles, the upward airflow caused by the heating temperature of the floor hot plate 8b is suppressed, and the particles are collected without any trouble. Raw material particles can be deposited on the substrate 9.

  As a result, the particle production capturing mechanism 80 in the particle production apparatus 100 according to the first embodiment can perform both generation and collection of the raw material particles in one cubic chamber 7, thereby simplifying the apparatus configuration. While obtaining the raw material particles from the raw material solution.

<Embodiment 2>
FIG. 2 is a block diagram schematically illustrating a configuration of a particle manufacturing apparatus 100B according to Embodiment 2 of the present invention. The particle manufacturing apparatus 100B according to the second embodiment includes a carrier introduction mechanism 60, a raw material solution atomizing mechanism 50B, and a particle manufacturing capture mechanism 80 as main components.

  The raw material solution atomizing mechanism 50B has the configuration of the raw material solution atomizing mechanism 50 of the first embodiment, and further includes a raw material solution supply tank 11, a solvent supply tank 12, a raw material supply line 41, and a solvent supply line 42. Features. The other configurations (the carrier introduction mechanism 60, the particle production capture mechanism 80, and the exhaust gas treatment apparatus 10) are the same as those of the particle production apparatus 100 shown in FIG. .

  The raw material solution supply tank 11 has therein a raw material solution 5r for the raw material solution 5, and continuously supplies the raw material solution 5r into the atomization container 4 via the raw material supply line 41. The solvent supply tank 12 has therein a solvent 5 s for the raw material solution 5, and continuously supplies the solvent 5 s into the atomization container 4 via the solvent supply line 42.

  As described above, the raw material solution atomizing mechanism 50B in the particle manufacturing apparatus 100B according to Embodiment 2 has the raw material solution supply tank 11 and the raw material supply line 41 as the raw material solution supply unit, and the solvent supply tank 12 and the It has a solvent supply line 42.

  Therefore, the raw material solution 5r and the solvent 5s can be replenished from the raw material solution supply tank 11 and the solvent supply tank 12 so that the raw material solution 5 in the atomization container 4 does not disappear. As a result, the raw material solution atomizing mechanism 50B can continuously generate the raw material in the form of droplets, and the particle manufacturing apparatus 100B can continuously generate the raw material particles.

  Further, by adjusting the ratio of the raw material solution 5r supplied from the raw material supply tank 11 and the solvent 5s supplied from the solvent supply tank 12, the concentration of the raw material solution 5 in the atomization container 4 is set. Therefore, the adjustment of the particle size of the raw material particles can be realized even during the production.

  Hereinafter, an example of adjusting the particle size of the raw material particles will be described. It is generally known that the particle size of the raw material particles has a positive correlation with the concentration of the raw material solution 5.

  The concentration control of the raw material solution 5 in the atomization container 4 can be performed while appropriately changing the supply ratio of the raw material solution 5r and the solvent 5s from the raw material solution supply tank 11 and the solvent supply tank 12. Here, it is assumed that the concentration of the raw material solution 5r in the raw material solution supply tank 11 is set to 1%.

  In order to adjust 100 mL (milliliter) of the 1% concentration raw material solution 5 to 0.1% concentration, 900 mL of the solvent 5s is supplied, and the concentration of the raw material solution 5 can be reduced to 1/10.

  Thereafter, in order to raise the concentration of the raw material solution 5 (1000 mL) adjusted to 0.1% to 0.5%, the raw material solution in the atomization container 4 is supplied by supplying 800 mL of the 1% raw material solution 5r. 5 (1800 ml) can be adjusted to 0.5%.

  In practice, since the raw material solution 5 in the atomization container 4 is consumed by the generation of the raw material in the form of droplets, the raw material solution supplied from the raw material solution supply tank 11 and the solvent supply tank 12 while taking these amounts into consideration. It is necessary to set the supply ratio of the solution 5r and the solvent 5s.

  Note that the consumption flow rate of the raw material solution 5 in the atomization container 4 can be estimated from the flow rate of the carrier gas supplied from the carrier introduction mechanism 60.

<Embodiment 3>
In the particle manufacturing apparatuses 100 and 100B of Embodiments 1 and 2 described above, the raw material solution 5 put into the atomization container 4 is formed into droplets using the ultrasonic vibrator 1 that generates ultrasonic waves. The obtained droplet-shaped raw material is transferred into the cubic chamber 7 by the carrier gas supplied from the carrier gas cylinder 16 into the atomization container 4 via the carrier gas introduction line 6 in the carrier introduction mechanism 60. The case where the raw material particles are easily manufactured has been described.

  FIG. 3 is a block diagram schematically showing a configuration of a particle manufacturing apparatus 100C according to Embodiment 3 of the present invention. The particle manufacturing apparatus 100C according to the third embodiment includes a carrier introduction mechanism 60C, a raw material solution atomizing mechanism 50C, a particle manufacturing and capturing mechanism 80C, and a particle size control unit 30 as main components.

  The carrier introduction mechanism 60C has a configuration in which the carrier gas introduction line 60 is provided with a carrier gas flow adjustment valve 6b whose opening degree is controlled by a control signal C6 on the carrier gas introduction line 6 in addition to the configuration of the carrier introduction mechanism 60 (see FIGS. 1 and 2). The points are different. The carrier introduction mechanism 60C functions as a raw material transport unit that transports the droplet-shaped raw material generated in the atomization container 4 to the tubular reactor 13 that is a particle generation unit.

  The raw material solution atomizing mechanism 50C includes a configuration of the raw material solution atomizing mechanism 50B (see FIG. 2), and a supply flow rate adjusting valve 11b whose degree of opening and closing is controlled by control signals C11 and C12 of the raw material solution 5r and the solvent 5s. And that the valve 12b is provided on the raw material supply line 41 and the solvent supply line 42. In addition, in the raw material solution atomizing mechanism 50B of the particle manufacturing apparatus 100B of Embodiment 2, similarly to the raw material solution atomizing mechanism 50C, valves 11b and 12b are provided for controlling the supply ratio of the raw material solution 5r and the solvent 5s. Is also good.

  The particle production capturing mechanism 80C includes a tubular reactor 13, a particle classifier 14, a fine particle outlet 15, a particle diameter measuring device 17, a particle collector 18, a coarse particle outlet 25, a particle diameter measuring device 27, and a particle collecting device. It is composed of a container 28.

  The droplet-shaped raw material sprayed in the internal space of the atomization container 4 is carried into the particle classifier 14 via the mist supply line 22. The tubular reactor 13 is formed in a cylindrical shape so as to cover the outer periphery of the mist supply line 22 near the inlet 14i of the particle classifier 14, and can perform a function equivalent to a flame used in a conventional ultrasonic spray flame method. Execute the heating process. That is, the tubular reactor 13 functions as a particle generation unit that pyrolyzes the droplet-shaped raw material in the reaction space SP22 in the mist supply line 22 covered by the tubular reactor 13 to obtain raw material particles.

  Therefore, the droplet-shaped raw material in the reaction space SP22 of the mist supply line 22 is thermally decomposed by the heat treatment in the tubular reactor 13 and supplied to the particle classifier 14 as raw material particles.

  The particle classifier 14 receives the raw material particles generated in the reaction space SP22 covered by the tubular reactor 13, separates the raw material particles into fine particles and coarse particles, outputs the fine particles from the fine particle outlet 15, and converts the coarse particles into coarse particles. Output from the particle outlet 25.

  The particle size measuring device 17 (first particle size measuring unit) measures the particle size of the fine particles (first raw material particles which are raw material particles separated as fine particles) obtained from the fine particle outlet 15 and obtains the fine particle measurement result. After obtaining M17 (first measurement result), the fine particles are output to the particle collector 18 via the relay line 37.

  The particle size measuring device 27 (second particle size measuring unit) measures the particle size of coarse particles (second raw material particles that are raw material particles separated as coarse particles) obtained from the coarse particle outlet 25. After obtaining the coarse particle measurement result M27 (second measurement result), the coarse particles are output to the particle collector 28 via the relay line 47.

  The particle classifier 14, the particle size measuring device 17 and the particle size measuring device 27 are realized by using existing devices.

  The particle collector 18 (first particle collector) collects fine particles, and the particle collector 28 (second particle collector) collects coarse particles. The particle collectors 18 and 28 have the same configuration as the electrostatic collector disclosed in Patent Document 1, and are realized using an existing particle collector such as a filter type collector or a centrifugal type collector. it can.

  The carrier gas containing the thermal decomposition products of the raw materials and the solvent vapor is treated by exhaust gas treatment devices 20 and 30 connected to the particle collectors 18 and 28 via relay lines 38 and 48, and then is subjected to an exhaust gas output line. Emitted from 39 and 49 to atmosphere.

  The particle manufacturing apparatus 100C according to Embodiment 3 is further characterized by further including a particle size control unit 30. The particle diameter control unit 30 receives the fine particle measurement result M17 and the coarse particle measurement result M27 from the particle diameter measurement devices 17 and 27. The exhaust gas processing apparatus 20 outputs the control signal C6, the control signal C11, and the control signal C12 to the valve 6b, the valve 11b, and the valve 12b based on the particle measurement result M17 and the coarse particle measurement result M27, so that the valve 6b, The opening / closing degree of 11b and 12b is controlled.

  Accordingly, the particle size control unit 30 controls the flow rate of the droplet-shaped raw material, which is the ability to transport the droplet-shaped raw material by the carrier introduction mechanism 60C, by controlling the opening and closing of the valve 6b, and controls the raw material solution by controlling the opening and closing of the valve 11b. The supply flow rate of the raw material solution 5r, which is the supply capacity of 5r, is controlled, and the supply flow rate of the solvent 5s, which is the supply capacity of the solvent 5s, is controlled by controlling the opening and closing of the valve 12b, so that the particle size of each of the fine particles and the coarse particles is set to a desired value. It has a particle size adjustment function for adjusting to the target particle size.

  In addition, as a particle size adjusting function based on the fine particle measurement result M17 and the coarse particle measurement result M27, the fine particle diameter priority control with emphasis on the fine particle measurement result M17, the coarse particle diameter priority control with emphasis on the coarse particle measurement result M27, the fine particle measurement Fine particle / coarse particle equalization control or the like in which the result M17 and the coarse particle measurement result M27 are equally emphasized can be considered.

  For convenience of explanation, a configuration in which the control signals C6, C11, and C12 are output to the valves 6b, 11b, and 12b is shown. However, the control signals C6, C11, and C12 are output to the flow control devices of the valves 6b, 11b, and 12b. It goes without saying that the degree of opening and closing of the valves 6b, 11b and 12b may be controlled by the flow control device.

  Also, by using a method other than adjusting the degree of opening and closing of the valves 6b, 11b, and 12b, the transport capacity of the droplet-shaped raw material (transport flow rate), the supply capacity of the raw material solution 5r (supply flow rate), and the supply capacity of the solvent 5s (Supply flow rate) may be controlled.

  The carrier introduction mechanism 60C of the particle manufacturing apparatus 100C according to the third embodiment includes a material solution supply tank 11, a solvent supply tank 12, a solvent supply tank 12, a material supply line 41, By providing the supply line 42, similarly to the particle manufacturing apparatus 100B of the second embodiment, it is possible to continuously generate the raw material particles and to adjust the particle diameter of the raw material particles even during the manufacturing.

  Furthermore, in the third embodiment, the particle size adjusting function based on the fine particle measurement result M17 and the coarse particle measurement result M27 by the particle size control unit 30 allows the fine particles and the coarse particles (first and second particles) to be continuously produced during the continuous production of the raw material particles. While controlling the particle size of the raw material particles, the fine particles and the coarse particles can be controlled so as to have the target particle size.

  As described above, according to the particle manufacturing apparatus 100C of the third embodiment, the particles are separated into fine particles and coarse particles by the particle classifier 14, and the particle diameter of the raw material particles is adjusted during the continuous production of the particles. Raw material particles can be obtained. That is, the particle size adjusting function of the particle classifier 14 and the particle size control unit 30 realizes an automatic adjusting system of the particle size of the generated raw material particles, and produces a raw material particle having a small particle size distribution range and a uniform particle size. Therefore, the added value of the particle manufacturing apparatus can be increased.

  In the present invention, each embodiment can be freely combined, or each embodiment can be appropriately modified or omitted within the scope of the invention.

DESCRIPTION OF SYMBOLS 1 Ultrasonic vibrator 4 Atomization container 5,5s Raw material solution 7 Cubic chamber 8a Ceiling hot plate 8b Floor hot plate 9 Particle collecting substrate 11 Raw material solution supply tank 12 Solvent supply tank 13 Tubular reactor 14 Particle classifier 17, 27 Particle size measuring device 18, 28 Particle collector 30 Particle size control unit 50, 50B, 50C Raw material solution atomizing mechanism 60, 60C Carrier introduction mechanism 80, 80C Particle production capture mechanism

Claims (1)

An atomization container for atomizing the raw material solution to obtain a droplet-shaped raw material,
A raw material solution supply unit that supplies the raw material solution to the atomization container,
A solvent supply unit that supplies the solvent for the raw material solution to the atomization container,
A particle generation unit that pyrolyzes the droplet-shaped raw material in the reaction space to obtain raw material particles,
A raw material transport unit that transports the droplet-shaped raw material toward the particle generation unit,
A particle classifier that receives the raw material particles generated by the particle generation unit and separates the raw material particles into fine particles and coarse particles.
A first particle size measurement unit that measures the particle size of the first raw material particles, which are the raw material particles separated as fine particles, and obtains a first measurement result;
A second particle size measuring unit that measures the particle size of the second raw material particles that are the raw material particles separated as coarse particles and obtains a second measurement result;
First and second particle collectors for collecting the first and second raw material particles,
Based on the first and second measurement results, the capability of transporting the droplet-shaped raw material by the raw material transport unit, the supply flow rate of the raw material solution by the raw material solution supply unit, and the supply of the solvent by the solvent supply unit A particle size control unit having a particle size adjustment function of controlling the flow rate to adjust the particle size of each of the first and second raw material particles,
Particle manufacturing equipment.

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