JP6711525B2 - Sealing treatment liquid for anodic oxide coating of aluminum alloy, concentrated liquid and sealing treatment method - Google Patents
Sealing treatment liquid for anodic oxide coating of aluminum alloy, concentrated liquid and sealing treatment method Download PDFInfo
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- C25D11/02—Anodisation
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Description
本発明は、アルミニウム合金の陽極酸化皮膜用封孔処理液、濃縮液及び封孔処理方法に関する。 The present invention relates to a sealing treatment solution for an anodized film of an aluminum alloy, a concentrated solution and a sealing treatment method.
アルミニウム合金の陽極酸化皮膜には、汚れ防止、耐食性の向上等を達成するため封孔処理を施すのが一般的である。封孔処理方法としては、沸騰水封孔、水蒸気封孔、常温封孔、酢酸ニッケル水溶液を用いて封孔処理を行う酢酸ニッケル封孔等が知られている(下記非特許文献1参照)。 The anodic oxide coating of an aluminum alloy is generally subjected to a sealing treatment in order to prevent stains and improve corrosion resistance. Known sealing methods include boiling water sealing, steam sealing, room temperature sealing, and nickel acetate sealing in which a sealing treatment is performed using a nickel acetate aqueous solution (see Non-Patent Document 1 below).
中でも、沸騰水封孔に比べて皮膜の耐食性が得られやすく、水蒸気封孔に比べて作業効率に優れており、常温封孔に比べて液管理がしやすい等の理由により、酢酸ニッケル封孔が特に用いられている。 Among them, the corrosion resistance of the coating is more easily obtained than boiling water sealing, the work efficiency is superior to steam sealing, and the liquid management is easier than normal temperature sealing. Is especially used.
しかしながら、近年、ニッケルアレルギーや微粉末性のニッケル塩の有毒性が問題になっていることから、ニッケル塩を用いない封孔処理方法によって、酢酸ニッケル封孔と同程度の耐食性、封孔度等の封孔性能を有する陽極酸化皮膜を製造することが望まれている。 However, in recent years, nickel allergy and toxicity of fine powdery nickel salts have become a problem, so by using a sealing treatment method without using nickel salt, corrosion resistance and sealing degree similar to nickel acetate sealing can be obtained. It is desired to produce an anodic oxide coating having the sealing performance described above.
本発明は、上記した従来技術の問題点に鑑みてなされたものであり、ニッケル塩を含有しない封孔処理液であって、ニッケル塩を含有する封孔処理液を用いた場合と同程度の封孔性能を付与することができ、且つ、封孔処理された陽極酸化皮膜が優れた耐汚染性を示すことができる封孔処理液を提供することを目的とする。 The present invention has been made in view of the problems of the above-mentioned conventional techniques, and is a sealing treatment liquid that does not contain a nickel salt, and is approximately the same as when a sealing treatment liquid that contains a nickel salt is used. An object of the present invention is to provide a sealing treatment liquid capable of imparting sealing performance and capable of exhibiting excellent stain resistance of the sealed anodic oxide film.
本発明者は、上記した目的を達成すべく鋭意研究を重ねてきた。その結果、金属塩、pH緩衝剤及び界面活性剤を含有するアルミニウム合金の陽極酸化皮膜用封孔処理液であって、上記金属塩は、アルカリ金属塩及びアルカリ土類金属塩より選択される少なくとも1種である封孔処理液によれば、上記目的を達成できることを見出し、本発明を完成するに至った。 The present inventor has conducted extensive studies to achieve the above object. As a result, a sealing treatment liquid for an anodized film of an aluminum alloy containing a metal salt, a pH buffer and a surfactant, wherein the metal salt is at least selected from alkali metal salts and alkaline earth metal salts. It was found that the above-mentioned object can be achieved by using one type of sealing treatment liquid, and the present invention has been completed.
即ち、本発明は、下記のアルミニウム合金の陽極酸化皮膜用封孔処理液、濃縮液及び封孔処理方法に関する。
1.金属塩、pH緩衝剤及び界面活性剤を含有するアルミニウム合金の陽極酸化皮膜用封孔処理液であって、
前記金属塩は、アルカリ金属塩及びアルカリ土類金属塩からなる群より選択される少なくとも1種である、ことを特徴とする封孔処理液。
2.前記金属塩は、Na、Mg、K及びCaからなる群より選択される少なくとも1種の金属の金属塩である、項1に記載の封孔処理液。
3.前記金属塩は、Mg及びCaからなる群より選択される少なくとも1種の金属の金属塩である、項1に記載の封孔処理液。
4.前記金属塩は、酢酸塩、スルファミン酸塩、硫酸塩及び硝酸塩からなる群より選択される少なくとも1種である、項1〜3のいずれかに記載の封孔処理液。
5.前記金属塩は、硝酸塩である、項1〜3のいずれかに記載の封孔処理液。
6.前記pH緩衝剤は、有機酸塩、アンモニウム塩、アミノ酸、ホウ酸塩、アミン化合物及び含窒素複素環式化合物からなる群より選択される少なくとも1種である、項1〜5のいずれかに記載の封孔処理液。
7.前記pH緩衝剤は、含窒素複素環式化合物である、項1〜5のいずれかに記載の封孔処理液。
8.前記界面活性剤は、アニオン系界面活性剤及び両性界面活性剤からなる群より選択される少なくとも1種である、項1〜7のいずれかに記載の封孔処理液。
9.前記界面活性剤は、硫酸塩系界面活性剤、スルホン酸塩系界面活性剤及びリン酸エステル系界面活性剤からなる群より選択される少なくとも1種である、項1〜7のいずれかに記載の封孔処理液。
10.pHが7.0〜10.0である、項1〜9のいずれかに記載の封孔処理液。
11.ニッケル系金属塩を含まない、項1〜10のいずれかに記載の封孔処理液。
12.前記封孔処理液中の前記金属塩、前記pH緩衝剤及び前記界面活性剤の含有量の合計は、0.2〜100g/Lである、項1〜11のいずれかに記載の封孔処理液。
13.金属塩、pH緩衝剤及び界面活性剤を含有するアルミニウム合金の陽極酸化皮膜用封孔処理液の濃縮液であって、
前記金属塩は、アルカリ金属塩及びアルカリ土類金属塩からなる群より選択される少なくとも1種である、ことを特徴とする濃縮液。
14.アルミニウム合金の陽極酸化皮膜の封孔処理方法であって、
アルミニウム合金の陽極酸化皮膜用封孔処理液中に、アルミニウム合金の陽極酸化皮膜を有する物品を浸漬する工程を有し、
前記封孔処理液は、金属塩、pH緩衝剤及び界面活性剤を含有し、
前記金属塩は、アルカリ金属塩及びアルカリ土類金属塩からなる群より選択される少なくとも1種である、
ことを特徴とする封孔処理方法。
15.前記封孔処理液の液温が85〜100℃である項14に記載の封孔処理方法。
16.前記封孔処理液のpHが7.0〜10.0である、項14又は15に記載の封孔処理方法。
17.項14〜16のいずれかに記載の封孔処理方法により封孔処理された物品。That is, the present invention relates to a sealing treatment liquid for an anodized film of an aluminum alloy, a concentrate, and a sealing treatment method described below.
1. A sealing treatment liquid for an anodized film of an aluminum alloy containing a metal salt, a pH buffer and a surfactant,
The pore-sealing solution, wherein the metal salt is at least one selected from the group consisting of alkali metal salts and alkaline earth metal salts.
2. Item 2. The sealing treatment liquid according to Item 1, wherein the metal salt is a metal salt of at least one metal selected from the group consisting of Na, Mg, K and Ca.
3. Item 2. The sealing treatment liquid according to Item 1, wherein the metal salt is a metal salt of at least one metal selected from the group consisting of Mg and Ca.
4. Item 4. The sealing treatment liquid according to any one of Items 1 to 3, wherein the metal salt is at least one selected from the group consisting of acetate, sulfamate, sulfate and nitrate.
5. Item 4. The sealing treatment liquid according to any one of Items 1 to 3, wherein the metal salt is a nitrate.
6. Item 6. The pH buffer is at least one selected from the group consisting of organic acid salts, ammonium salts, amino acids, borate salts, amine compounds, and nitrogen-containing heterocyclic compounds, in any one of claim|item 1 -5. Sealing liquid for.
7. Item 6. The sealing treatment liquid according to any one of Items 1 to 5, wherein the pH buffer is a nitrogen-containing heterocyclic compound.
8. Item 8. The sealing treatment liquid according to any one of Items 1 to 7, wherein the surfactant is at least one selected from the group consisting of anionic surfactants and amphoteric surfactants.
9. Item 8. The surfactant according to any one of Items 1 to 7, wherein the surfactant is at least one selected from the group consisting of a sulfate-based surfactant, a sulfonate-based surfactant, and a phosphate ester-based surfactant. Sealing liquid for.
10. Item 10. The sealing treatment liquid according to any one of Items 1 to 9, which has a pH of 7.0 to 10.0.
11. Item 11. The pore-sealing treatment liquid according to any one of Items 1 to 10, which does not contain a nickel-based metal salt.
12. Item 12. The sealing treatment according to any one of Items 1 to 11, wherein the total content of the metal salt, the pH buffer and the surfactant in the sealing treatment liquid is 0.2 to 100 g/L. liquid.
13. A concentrated liquid of a sealing treatment liquid for an anodized film of an aluminum alloy containing a metal salt, a pH buffer and a surfactant,
The concentrated liquid, wherein the metal salt is at least one selected from the group consisting of alkali metal salts and alkaline earth metal salts.
14. A method for sealing an anodized film of an aluminum alloy,
In the sealing treatment liquid for anodized film of aluminum alloy, having a step of immersing an article having an anodized film of aluminum alloy,
The sealing treatment liquid contains a metal salt, a pH buffer and a surfactant,
The metal salt is at least one selected from the group consisting of alkali metal salts and alkaline earth metal salts,
A sealing treatment method characterized by the above.
15. Item 15. The sealing treatment method according to Item 14, wherein the sealing treatment liquid has a liquid temperature of 85 to 100°C.
16. Item 16. The sealing treatment method according to Item 14 or 15, wherein the sealing treatment liquid has a pH of 7.0 to 10.0.
17. An article which has been subjected to a pore-sealing treatment by the pore-sealing treatment method according to any one of Items 14 to 16.
本発明の封孔処理液によれば、アルミニウム合金の陽極酸化皮膜に対して、ニッケル塩を含有する封孔処理液を用いた場合と同程度の封孔性能を付与することができ、且つ、優れた耐汚染性を付与することができる。 According to the sealing treatment liquid of the present invention, to the anodized film of the aluminum alloy, it is possible to impart the same sealing performance as when using the sealing treatment liquid containing a nickel salt, and Excellent stain resistance can be imparted.
また、本発明の濃縮液によれば、当該濃縮液を希釈するだけで容易に本発明のアルミニウム合金の陽極酸化皮膜用封孔処理液を調製することができる。 In addition, according to the concentrate of the present invention, the sealing treatment liquid for an anodized film of an aluminum alloy of the present invention can be easily prepared only by diluting the concentrate.
更に、本発明のアルミニウム合金の陽極酸化皮膜の封孔処理方法によれば、アルミニウム合金の陽極酸化皮膜に対して、ニッケル塩を含有する封孔処理液を用いた場合と同程度の封孔性能を付与することができ、且つ、優れた耐汚染性を付与することができる。 Further, according to the method for sealing a anodic oxide coating of an aluminum alloy of the present invention, the anodic oxide coating of an aluminum alloy has a sealing performance equivalent to that when a sealing treatment liquid containing a nickel salt is used. Can be imparted, and excellent stain resistance can be imparted.
以下、本発明について詳細に説明する。 Hereinafter, the present invention will be described in detail.
1.封孔処理液
本発明の封孔処理液は、金属塩、pH緩衝剤及び界面活性剤を含有するアルミニウム合金の陽極酸化皮膜用封孔処理液であって、上記金属塩は、アルカリ金属塩及びアルカリ土類金属塩より選択される少なくとも1種である。 1. Sealing treatment liquid The sealing treatment liquid of the present invention is a sealing treatment liquid for an anodized film of an aluminum alloy containing a metal salt, a pH buffer and a surfactant, wherein the metal salt is an alkali metal salt or It is at least one selected from alkaline earth metal salts.
(金属塩)
本発明の封孔処理液が含有する金属塩は、アルカリ金属塩及びアルカリ土類金属塩からなる群より選択される少なくとも1種である。上記アルカリ金属塩、アルカリ土類金属塩としては特に限定されないが、水溶性のものが好ましく、カルボン酸塩、スルファミン酸塩、硫酸塩、硝酸塩、有機スルホン酸塩等が挙げられる。これらの中でも、封孔処理されたアルミニウム合金の陽極酸化皮膜が耐汚染性に優れる点で、カルボン酸塩、スルファミン酸塩、硫酸塩、硝酸塩が好ましく、酢酸塩、スルファミン酸塩、硫酸塩、硝酸塩がより好ましく、酢酸塩、硝酸塩が更に好ましく、硝酸塩が特に好ましい。上記金属塩は、一種単独で又は二種以上を混合して用いることができる。(Metal salt)
The metal salt contained in the sealing treatment liquid of the present invention is at least one selected from the group consisting of alkali metal salts and alkaline earth metal salts. The alkali metal salt or alkaline earth metal salt is not particularly limited, but water-soluble salts are preferable, and examples thereof include carboxylate, sulfamate, sulfate, nitrate, and organic sulfonate. Among these, carboxylate salt, sulfamate salt, sulfate salt, and nitrate salt are preferable in terms of excellent antifouling property of the anodized film of the aluminum alloy that has been subjected to the sealing treatment, and acetate salt, sulfamate salt, sulfate salt, and nitrate salt are preferable. Is more preferable, acetate and nitrate are more preferable, and nitrate is particularly preferable. The above metal salts may be used alone or in combination of two or more.
上記金属塩に含まれる金属としては、アルカリ金属及びアルカリ土類金属であれば特に限定されず、具体的には、Li、Be、Na、Mg、K、Ca、Rb、Sr、Cs、Ba、Fr、Raを用いることができる。これらの中でも、封孔処理されたアルミニウム合金の陽極酸化皮膜が耐汚染性に優れる点で、Na、Mg、K、Caの金属塩が好ましく、Mg、Caの金属塩がより好ましく、Mgの金属塩であることが更に好ましい。上記金属塩に含まれる金属は、一種単独で又は二種以上を混合して用いることができる。 The metal contained in the metal salt is not particularly limited as long as it is an alkali metal and an alkaline earth metal, and specifically, Li, Be, Na, Mg, K, Ca, Rb, Sr, Cs, Ba, Fr and Ra can be used. Among these, metal salts of Na, Mg, K, and Ca are preferable, metal salts of Mg and Ca are more preferable, and metal of Mg is preferable because the anodized film of the sealed aluminum alloy has excellent stain resistance. More preferably, it is a salt. The metals contained in the above metal salts may be used alone or in combination of two or more.
封孔処理液中の金属塩の濃度は特に限定されず、0.001〜1モル/Lが好ましく、0.01〜0.5モル/Lがより好ましい。金属塩の濃度が上記範囲であることにより、封孔処理液が十分な封孔性能を示すことができ、封孔処理液により封孔処理されたアルミニウム合金の陽極酸化皮膜が耐汚染性を十分に示すことができる。 The concentration of the metal salt in the sealing treatment liquid is not particularly limited and is preferably 0.001 to 1 mol/L, more preferably 0.01 to 0.5 mol/L. When the concentration of the metal salt is within the above range, the pore-sealing solution can exhibit sufficient pore-sealing performance, and the anodic oxide film of the aluminum alloy that has been pore-sealed by the pore-sealing solution has sufficient stain resistance. Can be shown in.
(pH緩衝剤)
pH緩衝剤としては特に限定されず、従来公知のpH緩衝剤を用いることができる。このようなpH緩衝剤としては、例えば、有機酸塩、アンモニウム塩、アミノ酸、ホウ酸塩、アミン化合物、含窒素複素環式化合物等が挙げられる。これらの中でも、封孔処理液により封孔処理されたアルミニウム合金の陽極酸化皮膜に優れた耐汚染性を付与することができる点で、含窒素複素環式化合物が好ましい。(PH buffer)
The pH buffer agent is not particularly limited, and a conventionally known pH buffer agent can be used. Examples of such pH buffering agents include organic acid salts, ammonium salts, amino acids, borates, amine compounds, nitrogen-containing heterocyclic compounds, and the like. Among these, nitrogen-containing heterocyclic compounds are preferable because they can impart excellent stain resistance to the anodized film of the aluminum alloy that has been subjected to the pore-sealing treatment with the pore-sealing liquid.
有機酸塩としては、カルボン酸やオキシカルボン酸の塩が挙げられる。上記カルボン酸、オキシカルボン酸の炭素数は4以下が好ましい。また、上記塩としては、ナトリウム塩、カリウム塩が挙げられる。 Examples of the organic acid salt include salts of carboxylic acid and oxycarboxylic acid. The carboxylic acid and oxycarboxylic acid preferably have 4 or less carbon atoms. In addition, examples of the salt include sodium salt and potassium salt.
アンモニウム塩としては有機酸のアンモニウム塩、無機酸のアンモニウム塩が挙げられる。有機酸のアンモニウム塩としては、カルボン酸やオキシカルボン酸のアンモニウム塩が挙げられる。上記カルボン酸、オキシカルボン酸の炭素数は4以下が好ましい。また、無機酸のアンモニウム塩としては、硫酸アンモニウム塩、硝酸アンモニウム塩、スルファミン酸アンモニウム塩等が挙げられる。 Examples of the ammonium salt include ammonium salts of organic acids and ammonium salts of inorganic acids. Examples of ammonium salts of organic acids include ammonium salts of carboxylic acids and oxycarboxylic acids. The carboxylic acid and oxycarboxylic acid preferably have 4 or less carbon atoms. Examples of ammonium salts of inorganic acids include ammonium sulfate salts, ammonium nitrate salts, ammonium sulfamic acid salts, and the like.
アミノ酸としては、グリシン、アラニン、アスパラギン等やそれらの塩が挙げられる。ホウ酸塩としては、ホウ酸ナトリウム、ホウ酸カリウム、ホウ酸アンモニウム等が挙げられる。アミン化合物としては、モノエタノールアミン、ジエタノールアミン、トリエタノールアミンであるエタノールアミンが挙げられ、また、アルキルアミン、芳香族アミンや、尿素等の水溶性カルボニルアミン等が挙げられる。 Examples of amino acids include glycine, alanine, asparagine, and salts thereof. Examples of the borate include sodium borate, potassium borate, ammonium borate and the like. Examples of the amine compound include ethanolamine which is monoethanolamine, diethanolamine and triethanolamine, and also include alkylamine, aromatic amine, water-soluble carbonylamine such as urea and the like.
含窒素複素環式化合物としては、ヘテロ原子として少なくとも1つの窒素原子を含む複素環式化合物、ヘテロ原子として少なくとも1つの窒素原子及び少なくとも1つの酸素原子を含む複素環式化合物が挙げられる。 Examples of the nitrogen-containing heterocyclic compound include a heterocyclic compound containing at least one nitrogen atom as a hetero atom and a heterocyclic compound containing at least one nitrogen atom and at least one oxygen atom as a hetero atom.
上記含窒素複素環式化合物としては、エチレンイミン環、アジリン環、アゼチジン環、アゼト環、ピロリジン環、ピロール環、ピペリジン環、ピリジン環、ヘキサメチレンイミン環、アザトロピリデン環、イミダゾール環、ピラゾール環、オキサゾール環、イミダゾリン環、ピラジン環、モルホリン環、プテリジン環、プリン環等を含む含窒素複素環式化合物が挙げられる。これらの中でも、ピロリジン環、ピロール環、ピペリジン環、ピリジン環、ヘキサメチレンイミン環、アザトロピリデン環、イミダゾール環、ピラゾール環、オキサゾール環、イミダゾリン環、ピラジン環、モルホリン環、プテリジン環、プリン環等を含む含窒素複素環式化合物が好ましい。 The nitrogen-containing heterocyclic compound, ethyleneimine ring, azirine ring, azetidine ring, azeto ring, pyrrolidine ring, pyrrole ring, piperidine ring, pyridine ring, hexamethyleneimine ring, azatropylidene ring, imidazole ring, pyrazole ring, oxazole Examples of the nitrogen-containing heterocyclic compound include a ring, an imidazoline ring, a pyrazine ring, a morpholine ring, a pteridine ring, a purine ring and the like. Among these, a pyrrolidine ring, a pyrrole ring, a piperidine ring, a pyridine ring, a hexamethyleneimine ring, an azatropylidene ring, an imidazole ring, a pyrazole ring, an oxazole ring, an imidazoline ring, a pyrazine ring, a morpholine ring, a pteridine ring, a purine ring and the like are included. Nitrogen-containing heterocyclic compounds are preferred.
上記含窒素複素環式化合物としては、エチレンイミン、アジリン、アゼチジン、アゼト、ピロリジン、ピロール、ピペリジン、ピリジン、ヘキサメチレンイミン、アザトロピリデン、イミダゾール、ピラゾール、オキサゾール、イミダゾリン、ピラジン、モルホリン、プテリジン、プリン等が挙げられ、これらの骨格にアミノ基やメチル基が付加した化合物を用いることができる。これらの中でも環状構成原子に一つまたは二つの窒素原子をヘテロ原子としてもち、炭素または一つのヘテロ原子酸素と炭素からなる環状5員〜7員環の複素環式化合物が好ましく、具体的にはピロリジン、ピロール、ピペリジン、ピリジン、ヘキサメチレンイミン、アザトロピリデン、イミダゾール、ピラゾール、オキサゾール、イミダゾリン、ピラジン、モルホリン等の化合物とその環状骨格を基本構造とした化合物群が挙げられる。また、重多環構造をもちヘテロ原子窒素を4つ以上もつもの、例えばプリン、プテリジン等の化合物とその多重環状骨格を基本構造とした化合物群も好ましい。中でも、5〜6員環のものが更に好ましく、ピロリジン、ピロール、ピペリジン、ピリジン、イミダゾール、ピラゾール、オキサゾール、イミダゾリン、ピラジン、モルホリン等の化合物とその環状骨格を基本構造とした化合物群が挙げられる。この中でも環内に二重結合を持つピロール、ピリジン、イミダゾール、ピラゾール、オキサゾール、イミダゾリン、ピラジン等の化合物とその環状骨格を基本構造とした化合物群が特に好ましい。これらの化合物群を構成する置換基としてはアミノ基やメチル基等が挙げられ、これらの置換基が付加した化合物群を用いてもよい。例えば2−アミノピリジン、4−アミノピリジン等のアミノピリジン等や、2−メチルイミダゾール等のメチルイミダゾール等が特に好ましいものとして挙げられる。中でも、ピリジン、イミダゾール、アミノピリジン、メチルイミダゾール等が最も好ましい。 Examples of the nitrogen-containing heterocyclic compound include ethyleneimine, azirine, azetidine, azeto, pyrrolidine, pyrrole, piperidine, pyridine, hexamethyleneimine, azatropylidene, imidazole, pyrazole, oxazole, imidazoline, pyrazine, morpholine, pteridine, purine and the like. A compound in which an amino group or a methyl group is added to these skeletons can be used. Among these, a heterocyclic compound having a cyclic 5-membered to 7-membered ring, which has one or two nitrogen atoms as heteroatoms in the ring-constituting atoms and is composed of carbon or one heteroatom oxygen and carbon, and specifically, Examples thereof include compounds such as pyrrolidine, pyrrole, piperidine, pyridine, hexamethyleneimine, azatropylidene, imidazole, pyrazole, oxazole, imidazoline, pyrazine and morpholine, and compounds having a cyclic skeleton as a basic structure. Also preferred are compounds having a heavy polycyclic structure and having four or more heteroatom nitrogens, for example, compounds such as purines and pteridines, and compounds having a basic structure of its multiple cyclic skeleton. Of these, those having a 5- or 6-membered ring are more preferable, and examples thereof include compounds such as pyrrolidine, pyrrole, piperidine, pyridine, imidazole, pyrazole, oxazole, imidazoline, pyrazine, and morpholine, and compounds having a cyclic skeleton as a basic structure. Among these, compounds having a double bond in the ring such as pyrrole, pyridine, imidazole, pyrazole, oxazole, imidazoline, and pyrazine, and compounds having a cyclic skeleton as a basic structure are particularly preferable. Examples of the substituents constituting these compound groups include amino groups and methyl groups, and the compound groups to which these substituents are added may be used. For example, aminopyridines such as 2-aminopyridine and 4-aminopyridine, and methylimidazoles such as 2-methylimidazole are particularly preferable. Among them, pyridine, imidazole, aminopyridine, methylimidazole and the like are most preferable.
上記含窒素複素環式化合物としては、ピリジン;2−アミノピリジン、4−アミノピリジン等のアミノピリジン;イミダゾール;2−メチルイミダゾール等のメチルイミダゾール;ピラゾール;プテリジン;オキサゾール等が特に好ましい。 As the nitrogen-containing heterocyclic compound, pyridine; aminopyridine such as 2-aminopyridine and 4-aminopyridine; imidazole; methylimidazole such as 2-methylimidazole; pyrazole; pteridine; oxazole and the like are particularly preferable.
上記pH緩衝剤は、一種単独で又は二種以上を混合して用いることができる。 The above pH buffer agents can be used alone or in combination of two or more.
封孔処理液中のpH緩衝剤の濃度は特に限定されず、0.1〜100g/Lが好ましく、0.2〜20g/Lがより好ましい。pH緩衝剤の濃度が上記範囲であることにより、封孔処理液が優れたpHの緩衝性を示すことができ、且つ、pH緩衝剤の濃度が高過ぎることにより発生する処理品表面の外観不良(乾きジミ)や染色品の色ヌケが抑制される。 The concentration of the pH buffering agent in the sealing treatment liquid is not particularly limited and is preferably 0.1 to 100 g/L, more preferably 0.2 to 20 g/L. When the concentration of the pH buffer is within the above range, the sealing treatment liquid can exhibit excellent pH buffering property, and the appearance of the surface of the treated product is poor due to the too high concentration of the pH buffer. (Dry spots) and color loss of dyed products are suppressed.
(界面活性剤)
界面活性剤としては特に限定されず、従来公知の界面活性剤を用いることができる。このような界面活性剤としては、アニオン系界面活性剤、ノニオン系界面活性剤、両性界面活性剤が挙げられる。(Surfactant)
The surfactant is not particularly limited, and a conventionally known surfactant can be used. Examples of such a surfactant include an anionic surfactant, a nonionic surfactant, and an amphoteric surfactant.
アニオン系界面活性剤としては、硫酸塩系界面活性剤、スルホン酸塩系界面活性剤、リン系界面活性剤等を用いることができる。 As the anionic surfactant, a sulfate-based surfactant, a sulfonate-based surfactant, a phosphorus-based surfactant or the like can be used.
硫酸塩系界面活性剤としては、芳香族硫酸塩系界面活性剤、脂肪族硫酸塩系界面活性剤等が挙げられる。 Examples of the sulfate-based surfactants include aromatic sulfate-based surfactants and aliphatic sulfate-based surfactants.
上記芳香族硫酸塩系界面活性剤としては、例えばポリオキシエチレンアルキルフェニルエーテル硫酸塩が挙げられる。また、脂肪族硫酸塩系界面活性剤としては、例えばポリオキシエチレンアルキルエーテル硫酸塩が挙げられる。 Examples of the aromatic sulfate-based surfactant include polyoxyethylene alkylphenyl ether sulfate. Further, examples of the aliphatic sulfate-based surfactant include polyoxyethylene alkyl ether sulfate.
スルホン酸塩系界面活性剤としては、芳香族スルホン酸塩系界面活性剤等が挙げられる。 Examples of the sulfonate-based surfactant include aromatic sulfonate-based surfactants.
上記芳香族スルホン酸塩系界面活性剤としては、ベンゼンスルホン酸塩、ナフタレンスルホン酸塩等の芳香族スルホン酸塩化合物や、ベンゼンスルホン酸塩、ナフタレンスルホン酸塩等の芳香族スルホン酸塩骨格に、アルキル基、ポリオキシエチレン基、ポリオキシエチレンアルキルエーテル基、カルボキシル基、カルボニル基、水酸基、アルコール基、ビニル基やアリル基等のアルキレン基や多重結合を持つ基、さらなるスルホン酸基が置換した化合物等が挙げられ、また、これらの化合物のホルマリン等での重縮合物、並びに共重合物等が挙げられる。このような芳香族スルホン酸塩系界面活性剤としては例えばアルキルベンゼンスルホン酸塩、アルキルナフタレンスルホン酸塩、ならびにそれらのホルマリン等重縮合物、ナフタレンスルホン酸塩のホルマリン等重縮合物、アルキレンベンゼンスルホン酸塩やアルキレンナフタレンスルホン酸塩等からの共重合物等が挙げられる。 Examples of the aromatic sulfonate surfactant include aromatic sulfonate compounds such as benzene sulfonate and naphthalene sulfonate, and aromatic sulfonate skeletons such as benzene sulfonate and naphthalene sulfonate. , Alkyl group, polyoxyethylene group, polyoxyethylene alkyl ether group, carboxyl group, carbonyl group, hydroxyl group, alcohol group, alkylene group such as vinyl group or allyl group, group having multiple bond, further sulfonic acid group substituted Examples thereof include compounds, and also include polycondensates of these compounds with formalin and the like, and copolymers. Examples of such aromatic sulfonate surfactants include alkylbenzene sulfonates, alkylnaphthalene sulfonates, their polycondensates such as formalin, formalin polycondensates of naphthalene sulfonates, and alkylenebenzene sulfonic acids. Examples thereof include copolymers from salts and alkylene naphthalene sulfonates.
上記芳香族スルホン酸塩系界面活性剤としては、また、ジフェニルエーテルジスルホン酸塩等の、複数個のフェニルスルホン酸塩がエーテル結合した化合物が挙げられ、また、当該化合物にアルキル基、ポリオキシエチレン基、ポリオキシエチレンアルキルエーテル基等が置換した化合物が挙げられる。このような芳香族スルホン酸塩系界面活性剤としては、例えば、アルキルジフェニルエーテルジスルホン酸塩、アルキルジフェニルエーテルジスルホコハク酸塩等が挙げられる。 Examples of the aromatic sulfonate-based surfactant also include compounds in which a plurality of phenyl sulfonates are ether-bonded, such as diphenyl ether disulfonate, and the compounds include an alkyl group and a polyoxyethylene group. , And compounds in which a polyoxyethylene alkyl ether group or the like is substituted. Examples of such aromatic sulfonate surfactants include alkyl diphenyl ether disulfonate and alkyl diphenyl ether disulfosuccinate.
リン系界面活性剤としては、リン酸エステル系界面活性剤、リン酸エステル塩系界面活性剤等を用いることができる。具体的には、ポリオキシエチレンアルキルエーテルリン酸エステル、ポリオキシエチレンアルキレン化フェニルエーテルリン酸エステル、アルキルリン酸エステル等とそれらの塩が挙げられる。 As the phosphorus-based surfactant, a phosphoric acid ester-based surfactant, a phosphoric acid ester salt-based surfactant, or the like can be used. Specific examples include polyoxyethylene alkyl ether phosphates, polyoxyethylene alkylated phenyl ether phosphates, alkyl phosphates and the like, and salts thereof.
ノニオン性界面活性剤としては、封孔処理液中の濃度の調整や、他の界面活性剤との組み合わせにより封孔処理液中で曇点を85℃以上とすることができるノニオン性界面活性剤を好適に用いることができる。このようなノニオン性界面活性剤としては、例えば、ポリオキシエチレンアルキルエーテル、グリセリンエステルポリオキシエチレンエーテル、ソルビタンエステル、脂肪酸アルカノールアミド等が挙げられる。 As the nonionic surfactant, a nonionic surfactant which can adjust the concentration in the pore-sealing treatment liquid or can be combined with another surfactant to have a cloud point of 85° C. or higher in the pore-sealing treatment liquid. Can be preferably used. Examples of such nonionic surfactants include polyoxyethylene alkyl ether, glycerin ester polyoxyethylene ether, sorbitan ester, and fatty acid alkanolamide.
両性界面活性剤としてはアルキルベタイン、脂肪酸アミドベタイン、アルキルアミンオキサイド等が挙げられる。 Examples of the amphoteric surfactant include alkyl betaine, fatty acid amide betaine, and alkylamine oxide.
上記界面活性剤としては、アニオン系界面活性剤が好ましい。中でも、硫酸塩系界面活性剤、スルホン酸塩系界面活性剤、リン系界面活性剤がより好ましく、スルホン酸塩系界面活性剤が更に好ましい。 As the above-mentioned surfactant, an anionic surfactant is preferable. Of these, sulfate-based surfactants, sulfonate-based surfactants and phosphorus-based surfactants are more preferred, and sulfonate-based surfactants are even more preferred.
上記界面活性剤は、一種単独で又は二種以上を混合して用いることができる。なお、上記ノニオン系界面活性剤は、封孔処理液の曇点が低くならないように選択すればよい。また、ノニオン系界面活性剤とアニオン系界面活性剤とを混合して用いる場合は、界面活性剤の曇点を高くすることができる。アニオン系界面活性剤を用いる場合は、含有金属や両性界面活性剤と反応して濁りを生じないものを選択すればよい。 The above surfactants may be used alone or in combination of two or more. The nonionic surfactant may be selected so that the clouding point of the sealing treatment liquid does not become low. When the nonionic surfactant and the anionic surfactant are mixed and used, the cloud point of the surfactant can be increased. When an anionic surfactant is used, it is sufficient to select one that does not cause turbidity by reacting with the contained metal or the amphoteric surfactant.
封孔処理液中の界面活性剤の濃度は特に限定されず、10mg/L〜10g/Lが好ましく、20mg/L〜5g/Lがより好ましい。界面活性剤の濃度が上記範囲であることにより、封孔処理液が十分な封孔性能を示すことができ、且つ、封孔処理された陽極酸化皮膜の表面の粉吹きやカブリ外観不良を抑制することができる。 The concentration of the surfactant in the sealing treatment liquid is not particularly limited, preferably 10 mg/L to 10 g/L, more preferably 20 mg/L to 5 g/L. When the concentration of the surfactant is in the above range, the pore-sealing liquid can exhibit sufficient pore-sealing performance, and suppresses the powder blow and the fog appearance defect of the surface of the pore-treated anodic oxide film. can do.
(pH調整剤)
本発明の封孔処理液は、更に、pH調整剤を含んでいてもよい。pH調整剤としては特に限定されず、従来公知のpH調整剤を用いることができる。(PH adjuster)
The sealing treatment liquid of the present invention may further contain a pH adjusting agent. The pH adjusting agent is not particularly limited, and a conventionally known pH adjusting agent can be used.
封孔処理液を酸性側に調整するためのpH調整剤としては、例えば、酢酸、スルファミン酸、硫酸、硝酸、有機スルホン酸等の希釈水溶液が挙げられる。これらの中でも、封孔性能に優れる点で、硝酸が好ましい。 Examples of the pH adjuster for adjusting the sealing treatment liquid to the acidic side include dilute aqueous solutions of acetic acid, sulfamic acid, sulfuric acid, nitric acid, organic sulfonic acid and the like. Among these, nitric acid is preferable because of its excellent sealing performance.
封孔処理液をアルカリ性側に調整するためのpH調整剤としては、例えば、アンモニア水、水酸化ナトリウム水溶液、水酸化カリウム水溶液等が挙げられる。これらの中でも、封孔性能に優れる点で、水酸化ナトリウム水溶液が好ましい。 Examples of the pH adjuster for adjusting the sealing treatment liquid to the alkaline side include ammonia water, sodium hydroxide aqueous solution, potassium hydroxide aqueous solution and the like. Among these, an aqueous solution of sodium hydroxide is preferable because it has excellent sealing performance.
上記pH調整剤は、一種単独で又は二種以上を混合して用いることができる。 The above pH adjusters can be used alone or in combination of two or more.
封孔処理液中のpH調整剤の濃度は特に限定されず、0〜20g/Lが好ましく、0〜10g/Lがより好ましく、0〜5g/Lが更に好ましい。pH調整剤の濃度が上記範囲であることにより、封孔処理液が十分な封孔性能を示すことができ、封孔処理液により封孔処理された陽極酸化皮膜の封孔度の低下を抑制することができる。 The concentration of the pH adjuster in the sealing treatment liquid is not particularly limited and is preferably 0 to 20 g/L, more preferably 0 to 10 g/L, further preferably 0 to 5 g/L. When the concentration of the pH adjuster is within the above range, the pore-sealing solution can exhibit sufficient pore-sealing performance, and suppresses the reduction in the degree of sealing of the anodized film which has been pore-sealed by the pore-sealing solution. can do.
(その他の成分)
本発明の封孔処理液は、封孔性能や液の使用実用性を向上させるために、必要に応じて防カビ剤、錯化剤等の添加剤成分を含んでいてもよい。添加剤としては、例えば、安息香酸、安息香酸塩等の防カビ剤;クエン酸、クエン酸塩等の錯化剤等が挙げられる。また、防カビ剤としては市販の防カビ剤、例えば「TACカビコロン」(奥野製薬工業株式会社製)を添加してもよい。(Other ingredients)
The pore-sealing liquid of the present invention may contain an additive component such as an antifungal agent and a complexing agent, if necessary, in order to improve the pore-sealing performance and practical use of the liquid. Examples of the additives include antifungal agents such as benzoic acid and benzoate; complexing agents such as citric acid and citrate. Further, as the antifungal agent, a commercially available antifungal agent, for example, “TAC fungus colon” (manufactured by Okuno Chemical Industry Co., Ltd.) may be added.
(封孔処理液)
本発明の封孔処理液中の金属塩、pH緩衝剤及び界面活性剤の含有量の合計は、0.2〜100g/Lが好ましく、0.3〜50g/Lがより好ましく、0.5〜30g/Lが更に好ましい。上記含有量の合計が上述の範囲であることにより、封孔処理液が十分な封孔性能を示すことができ、封孔処理液により封孔処理されたアルミニウム合金の陽極酸化皮膜が耐汚染性を十分に示すことができ、且つ、封孔処理された陽極酸化皮膜の表面の粉吹きやカブリ外観不良を抑制することができる。(Sealing liquid)
The total content of the metal salt, the pH buffer and the surfactant in the sealing treatment liquid of the present invention is preferably 0.2 to 100 g/L, more preferably 0.3 to 50 g/L, and 0.5. -30 g/L is more preferable. When the total of the above contents is within the above range, the sealing treatment liquid can exhibit sufficient sealing performance, and the anodic oxide coating of the aluminum alloy sealed by the sealing treatment liquid is resistant to contamination. Can be sufficiently exhibited, and it is possible to suppress dusting of the surface of the anodized film subjected to the pore-sealing treatment and a defective fog appearance.
封孔処理液のpHは、7.0〜10.0が好ましく、7.2〜9.5がより好ましく、7.5〜9.0が更に好ましい。pHを上記範囲とすることにより、封孔処理液が十分な封孔性能を示すことができ、封孔処理液により封孔処理されたアルミニウム合金の陽極酸化皮膜が耐汚染性を十分に示すことができ、且つ、被処理物の表面に粉状付着物が付着する外観不良(粉吹き、カブリ)が抑制される。 The pH of the pore-sealing treatment liquid is preferably 7.0 to 10.0, more preferably 7.2 to 9.5, and further preferably 7.5 to 9.0. When the pH is in the above range, the pore-sealing solution can exhibit sufficient pore-sealing performance, and the anodic oxide film of the aluminum alloy that has been pore-sealed with the pore-sealing solution exhibits sufficient stain resistance. In addition, appearance defects (powder blowing, fog) in which powdery deposits adhere to the surface of the object to be processed are suppressed.
本発明の封孔処理液は、金属塩、pH緩衝剤及び界面活性剤を含有していればその他の成分は特に限定されないが、上述の各成分を含有する水溶液であることが好ましい。 The sealing treatment solution of the present invention is not particularly limited as long as it contains a metal salt, a pH buffer and a surfactant, but is preferably an aqueous solution containing the above-mentioned components.
本発明の封孔処理液は、ニッケル系金属塩等の金属塩を含まないことが好ましい。当該金属塩としては、Ni、Co、Fe、Cr等の金属塩が挙げられる。 The sealing treatment liquid of the present invention preferably does not contain a metal salt such as a nickel-based metal salt. Examples of the metal salt include metal salts of Ni, Co, Fe, Cr and the like.
2.濃縮液
本発明の濃縮液は、金属塩、pH緩衝剤及び界面活性剤を含有するアルミニウム合金の陽極酸化皮膜用封孔処理液の濃縮液であって、上記金属塩は、アルカリ金属塩及びアルカリ土類金属塩より選択される少なくとも1種である。上記封孔処理液に含まれる成分の濃度が高い濃縮液とすることにより、運搬、保存が容易になり、水等の希釈液で希釈することにより、上記封孔処理液を容易に調製することができる。上記希釈液としては、水が好ましい。 2. Concentrated Solution The concentrated solution of the present invention is a concentrated solution of a sealing treatment solution for an anodized film of an aluminum alloy containing a metal salt, a pH buffer and a surfactant, wherein the metal salt is an alkali metal salt or an alkali. It is at least one selected from earth metal salts. By using a concentrated solution having a high concentration of components contained in the sealing treatment solution, it is easy to carry and store, and the sealing treatment solution is easily prepared by diluting with a diluting solution such as water. You can Water is preferable as the diluent.
本発明の濃縮液が含有する金属塩、pH緩衝剤及び界面活性剤は、上記封孔処理液が含有するものと同一のものを用いることができる。本発明の濃縮液は、上記封孔処理液と同一の成分を含有するが、当該成分の含有量が異なる。 As the metal salt, pH buffer and surfactant contained in the concentrated liquid of the present invention, the same ones as those contained in the sealing treatment liquid can be used. The concentrated liquid of the present invention contains the same components as the sealing treatment liquid, but the contents of the components are different.
濃縮液中の金属塩、pH緩衝剤及び界面活性剤の含有量の合計は、1〜800g/Lが好ましく、1.5〜400g/Lがより好ましく、2.5〜250g/Lが更に好ましい。上記含有量の合計が上述の範囲であることにより、運搬、保存が容易であり、且つ、水等で希釈することにより、上記封孔処理液を容易に調製することができる。また、上記濃縮液中の金属塩、pH緩衝剤及び界面活性剤の含有量の合計は、封孔処理液と濃縮液との区別の点で、100g/Lを超える範囲であってもよく、150g/L以上であってもよい。 The total content of the metal salt, pH buffer and surfactant in the concentrated liquid is preferably 1 to 800 g/L, more preferably 1.5 to 400 g/L, further preferably 2.5 to 250 g/L. .. When the total content is within the above range, it is easy to carry and store, and the sealing treatment solution can be easily prepared by diluting with water or the like. Further, the total content of the metal salt, the pH buffer and the surfactant in the concentrated solution may be in the range of more than 100 g/L in terms of the distinction between the sealing treatment solution and the concentrated solution, It may be 150 g/L or more.
3.封孔処理方法
本発明の封孔処理方法は、アルミニウム合金の陽極酸化皮膜の封孔処理方法であって、アルミニウム合金の陽極酸化皮膜用封孔処理液中に、アルミニウム合金の陽極酸化皮膜を有する物品を浸漬する工程を有し、上記封孔処理液は、金属塩、pH緩衝剤及び界面活性剤を含有し、上記金属塩は、アルカリ金属塩及びアルカリ土類金属塩より選択される少なくとも1種である封孔処理方法である。 3. Sealing treatment method The sealing treatment method of the present invention is a sealing treatment method for an anodized film of an aluminum alloy, wherein the sealing treatment liquid for anodized film of an aluminum alloy has an anodized film of an aluminum alloy. And a step of immersing the article, wherein the sealing treatment liquid contains a metal salt, a pH buffer and a surfactant, and the metal salt is at least one selected from alkali metal salts and alkaline earth metal salts. This is the seed sealing treatment method.
封孔処理液としては、上記説明した封孔処理液を用いることができる。本発明の封孔処理方法では、上記封孔処理液中に、アルミニウムの合金の陽極酸化皮膜を有する物品を浸漬する工程を有する。浸漬方法としては特に限定されず、従来公知の方法により浸漬すればよい。 The sealing treatment liquid described above can be used as the sealing treatment liquid. The sealing treatment method of the present invention has a step of immersing an article having an anodized film of an aluminum alloy in the sealing treatment liquid. The dipping method is not particularly limited, and dipping may be performed by a conventionally known method.
上記工程における封孔処理液の温度は、85〜100℃が好ましく、88〜98℃がより好ましく、90〜98℃が更に好ましい。封孔処理液の温度を上記範囲とすることにより、十分な封孔性能を示すことができる。 The temperature of the sealing treatment liquid in the above step is preferably 85 to 100°C, more preferably 88 to 98°C, and further preferably 90 to 98°C. By setting the temperature of the sealing treatment liquid in the above range, sufficient sealing performance can be exhibited.
封孔処理液のpHは、7.0〜10.0が好ましく、7.2〜9.5がより好ましく、7.5〜9.0が更に好ましい。pHを上記範囲とすることにより、封孔処理液が十分な封孔性能を示すことができ、被処理物の表面に粉状付着物が付着する外観不良(粉吹き、カブリ)が抑制される。 The pH of the pore-sealing treatment liquid is preferably 7.0 to 10.0, more preferably 7.2 to 9.5, and further preferably 7.5 to 9.0. When the pH is in the above range, the pore-sealing treatment liquid can exhibit sufficient pore-sealing performance, and the appearance defect (powder blowing, fog) in which the powder-like deposit adheres to the surface of the object to be treated is suppressed. ..
封孔処理時間は、通常、処理対象とする陽極酸化皮膜の膜厚により決定することができる。具体的には、膜厚を示す数(μm)に、0.1〜10を乗じて得られる数を封孔処理時間(分)とすることが好ましく、膜厚を示す数(μm)に、0.2〜5を乗じて得られる数を封孔処理時間(分)とすることがより好ましく、膜厚を示す数(μm)に、0.5〜4を乗じて得られる数を封孔処理時間(分)とすることが更に好ましい。例えば、陽極酸化皮膜の膜厚が10μmであるならば、浸漬時間は、10に0.2〜5を乗じて、2〜50分程度とすることがより好ましい。封孔処理時間を上記範囲とすることにより、封孔処理液が十分な封孔性能を示すことができ、封孔処理液により封孔処理されたアルミニウム合金の陽極酸化皮膜が耐汚染性を十分に示すことができ、また、粉吹き、カブリ等の外観不良による、被処理物の外観の低下を抑制することができる。 The sealing treatment time can usually be determined by the film thickness of the anodized film to be treated. Specifically, it is preferable that the number obtained by multiplying the number (μm) indicating the film thickness by 0.1 to 10 is the sealing treatment time (minutes), and the number (μm) indicating the film thickness is The number obtained by multiplying 0.2 to 5 is more preferably the sealing treatment time (minutes), and the number obtained by multiplying the number (μm) indicating the film thickness by 0.5 to 4 is the sealing time. The treatment time (minute) is more preferable. For example, if the film thickness of the anodized film is 10 μm, it is more preferable that the immersion time be about 2 to 50 minutes by multiplying 10 by 0.2 to 5. By setting the sealing treatment time within the above range, the sealing treatment liquid can exhibit sufficient sealing performance, and the anodic oxide film of the aluminum alloy sealed by the sealing treatment liquid has sufficient contamination resistance. In addition, it is possible to suppress deterioration of the appearance of the object to be processed due to poor appearance such as powder blowing and fog.
上記工程では、封孔処理液を撹拌しながらアルミニウム合金の陽極酸化皮膜を有する物品を浸漬してもよい。撹拌方法としては、循環攪拌、空気攪拌、ガス撹拌、揺動撹拌が好適である。中でも、循環攪拌、ガス撹拌が好ましく、循環攪拌がより好ましい。上記ガス撹拌としては、窒素ガス、アルゴンガス等の不活性ガスを用いたガス撹拌が好適である。上記工程において、金属塩としてMg塩、Ca塩、Sr塩、Ba塩、Ra塩を含有し、pHが7以上の封孔処理液を用いる場合、封孔処理液が空気中の二酸化炭素を吸収し、濁りを生じる場合がある。このため、撹拌方法としては上述のように循環攪拌が好ましいが、設備上空気攪拌を行うことが必要な場合は上記不活性ガスを用いたガス撹拌を行うことが、封孔処理液の濁りを抑制することができる点で好ましい。 In the above step, the article having the anodic oxide coating of the aluminum alloy may be immersed while stirring the sealing treatment liquid. As a stirring method, circulation stirring, air stirring, gas stirring, and rocking stirring are suitable. Of these, circulation stirring and gas stirring are preferable, and circulation stirring is more preferable. As the gas stirring, gas stirring using an inert gas such as nitrogen gas or argon gas is suitable. In the above step, when a sealing treatment liquid containing Mg salt, Ca salt, Sr salt, Ba salt, Ra salt as a metal salt and having a pH of 7 or more is used, the sealing treatment liquid absorbs carbon dioxide in the air. However, turbidity may occur. Therefore, as the stirring method, circulation stirring is preferable as described above, but if it is necessary to perform air stirring on equipment, it is preferable to perform gas stirring using the above-mentioned inert gas to prevent turbidity of the sealing treatment liquid. It is preferable because it can be suppressed.
本発明の封孔処理方法は、上述のアルミニウム合金の陽極酸化皮膜用封孔処理液中にアルミニウム合金の陽極酸化皮膜を有する物品を浸漬する工程中に、上記封孔処理液中の濁りを除去する濁り除去処理を行ってもよい。また、上記濁り除去処理は、上記工程中以外の、例えば、上記物品を陽極酸化皮膜用封孔処理液中に浸漬するまでの待機中や、ラインの休止中に行ってもよい。濁り除去処理を行うことにより濁りに起因する粉吹き、カブリ等の外観不良による、陽極酸化皮膜の外観の低下を抑制することができる。 The sealing treatment method of the present invention removes turbidity in the sealing treatment liquid during the step of immersing the article having the anodic oxide coating of the aluminum alloy in the sealing treatment liquid for the anodic oxide coating of the aluminum alloy described above. The turbidity removing process may be performed. Further, the turbidity removing treatment may be carried out during the steps other than the above steps, for example, while waiting for the article to be immersed in the anodic oxide film sealing treatment liquid or during the suspension of the line. By performing the turbidity removal treatment, it is possible to suppress the deterioration of the appearance of the anodized film due to the poor appearance such as powder blowing and fog caused by the turbidity.
濁りの除去方法としては特に限定されず、従来公知の除去方法を用いることができる。上記除去方法としては、濾過除去が挙げられる。具体的には、封孔処理を行う槽から薬品補給添加溶解槽であるクッションタンク等の予備タンクに、封孔処理液の一部を流し、封孔処理液の温度を好ましくは50℃以下に冷却し、濾過器を通して濾過を行い、上記封孔処理を行う槽に戻して循環させる濾過除去が挙げられる。設備にクッションタンクが無い場合、単純濾過循環により濾過除去を行ってもよい。 The method for removing turbidity is not particularly limited, and a conventionally known removing method can be used. Examples of the removal method include filtration removal. Specifically, a part of the sealing treatment liquid is flowed from the sealing treatment tank to a spare tank such as a cushion tank which is a chemical replenishment addition dissolution tank, and the temperature of the sealing treatment liquid is preferably 50° C. or lower. Examples of the method include cooling and cooling, filtering through a filter, and returning to the tank in which the above-mentioned sealing treatment is performed, and circulating it. If the equipment does not have a cushion tank, it may be filtered and removed by simple filtration circulation.
本発明の封孔処理方法では、処理対象物はアルミニウム合金の陽極酸化皮膜である。上記アルミニウム合金の陽極酸化皮膜としては特に限定されず、一般的なアルミニウム合金に硫酸、シュウ酸等を用いた公知の陽極酸化法を適用して得られたアルミニウム合金の陽極酸化皮膜であればよい。アルミニウム合金としては特に限定的ではなく、各種のアルミニウム主体の合金を陽極酸化の対象とすることができる。アルミニウム合金の具体例としては、JISに規定されているJIS−A 1千番台〜7千番台で示される展伸材系合金、AC、ADCの各番程で示される鋳物材、ダイカスト材等を代表とするアルミニウム主体の各種合金群等が挙げられる。 In the sealing treatment method of the present invention, the object to be treated is an anodized film of aluminum alloy. The anodized film of the aluminum alloy is not particularly limited, and may be an anodized film of an aluminum alloy obtained by applying a known anodizing method using sulfuric acid, oxalic acid or the like to a general aluminum alloy. .. The aluminum alloy is not particularly limited, and various aluminum-based alloys can be the target of anodic oxidation. Specific examples of the aluminum alloy include wrought material alloys shown in JIS-A 1000s to 7000s specified in JIS, casting materials and die casting materials shown in each step of AC and ADC. Representative examples include various alloy groups mainly composed of aluminum.
アルミニウム合金に施される陽極酸化法としては、例えば、硫酸濃度が100g/L〜400g/L程度の水溶液を用い、液温を−10〜30℃程度として、0.5〜4A/dm2程度の陽極電流密度で電解を行う方法が挙げられる。As the anodizing method applied to the aluminum alloy, for example, an aqueous solution having a sulfuric acid concentration of about 100 g/L to 400 g/L is used, and the liquid temperature is about −10 to 30° C. and about 0.5 to 4 A/dm 2. The method of performing electrolysis with the anode current density of 1 is mentioned.
また、本発明の封孔処理方法においては、アルミニウム合金の陽極酸化皮膜に電解着色を施したものを処理対象としてもよい。 Further, in the sealing treatment method of the present invention, an anodic oxide coating of an aluminum alloy that is electrolytically colored may be treated.
電解着色方法としては、公知の着色技術の方法を採用できる。例えば、陽極酸化を行った後、電解着色浴に浸漬し、二次電解を行うことにより陽極酸化皮膜に着色を施すことができる。電解着色浴としては、ニッケル塩−ホウ酸浴、ニッケル塩−スズ塩−硫酸浴などを例示できる。 As an electrolytic coloring method, a known coloring technique can be adopted. For example, the anodized film can be colored by immersing it in an electrolytic coloring bath after performing anodization and performing secondary electrolysis. Examples of the electrolytic coloring bath include a nickel salt-boric acid bath and a nickel salt-tin salt-sulfuric acid bath.
また、本発明の封孔処理方法においては、アルミニウム合金の陽極酸化皮膜に染料を用いて染色を施したものを処理対象としてもよい。 Further, in the sealing treatment method of the present invention, an anodized film of an aluminum alloy, which is dyed with a dye, may be treated.
染料を用いた染色方法としては、従来公知の染料水溶液に陽極酸化皮膜を浸漬する方法が挙げられる。このような染料としては、アルミニウム合金陽極酸化皮膜用染料として市販されているものを用いることができ、例えば、アニオン系染料等が挙げられる。上記染料水溶液の温度は、10〜70℃が好ましく、20〜60℃がより好ましい。また、上記染料水溶液中の染料の濃度及び浸漬時間は、要望される染色の色調、色の濃さに応じて適宜設定すればよい。 Examples of the dyeing method using a dye include a method of immersing the anodized film in a conventionally known aqueous dye solution. As such a dye, a dye commercially available as a dye for an aluminum alloy anodized film can be used, and examples thereof include an anionic dye. 10-70 degreeC is preferable and, as for the temperature of the said dye aqueous solution, 20-60 degreeC is more preferable. Further, the concentration of the dye in the dye aqueous solution and the immersion time may be appropriately set depending on the desired color tone of dyeing and color strength.
アルミニウム合金の陽極酸化皮膜に染料を用いた染色を施したものを処理対象とし、封孔処理液が染料定着性を付与できない場合には、染色後、封孔処理前に、染料定着処理を施してもよい。当該染料定着処理に用いられる染料定着処理剤としては、アルミニウム合金陽極酸化皮膜染色工程用に市販されているもの(例えば奥野製薬工業(株)製 TAC固着剤−2、TACサンブロック77−5Cなど)が使用できる。また、封孔処理液中の上記pH緩衝剤及び上記界面活性剤の種類と配合を調整することにより、封孔処理液に染料定着性を付与することができる。 If the anodized film of an aluminum alloy is dyed with a dye, and if the sealing solution cannot impart dye fixability, a dye fixing treatment is performed after dyeing and before sealing. May be. The dye fixing treatment agent used in the dye fixing treatment is commercially available for the aluminum alloy anodized film dyeing step (for example, TAC Adhesive-2, TAC Sunblock 77-5C manufactured by Okuno Chemical Industries Co., Ltd., etc.). ) Can be used. Further, dye fixing property can be imparted to the sealing treatment liquid by adjusting the types and blending of the pH buffer and the surfactant in the sealing treatment liquid.
本発明の封孔処理方法では、上記したアルミニウム合金の陽極酸化皮膜を有する物品を被処理物として用い、前述した封孔処理液中に被処理物を浸漬すればよい。また、必要に応じて、アルミニウム合金の陽極酸化皮膜を有する物品に電解着色、染色等を施した後、十分に水洗を行い、前述した封孔処理液中に被処理物を浸漬してもよい。これにより、被処理物のアルミニウム合金の陽極酸化皮膜の封孔性能を大きく向上させることができる。 In the sealing treatment method of the present invention, the article having the anodized film of the aluminum alloy described above is used as the treatment object, and the treatment object may be immersed in the above-described sealing treatment liquid. Further, if necessary, the article having an anodized film of an aluminum alloy may be subjected to electrolytic coloring, dyeing, etc., and then sufficiently washed with water, and the article to be treated may be immersed in the above-described sealing treatment liquid. .. As a result, the sealing performance of the anodized film of the aluminum alloy to be treated can be greatly improved.
以下に実施例及び比較例を示して本発明を具体的に説明する。但し、本発明は実施例に限定されない。 The present invention will be specifically described below with reference to Examples and Comparative Examples. However, the present invention is not limited to the examples.
以下の製造条件に従って、下記の実施例及び比較例に用いる陽極酸化を施したアルミニウム合金試験片を調製した。 Under the following manufacturing conditions, anodized aluminum alloy test pieces used in the following examples and comparative examples were prepared.
陽極酸化済試験片A(染色処理及び染色定着処理無し)の調製
アルミニウムの試験片(JIS A1050P板材)を弱アルカリ性脱脂液(奥野製薬工業(株)製 トップアルクリーン101(商品名)の30g/L水溶液、浴温:60℃)に3分間浸漬して脱脂した。次いで、水洗し、硫酸を主成分とする陽極酸化浴(遊離硫酸180g/L及び溶存アルミ8.0g/Lを含む)で陽極酸化(浴温:20±1℃、陽極電流密度:1A/dm2、電解時間:30分間、膜厚:約10μm)を行った。得られた陽極酸化皮膜を水洗し、陽極酸化を施したアルミニウム合金試験片(以下、「陽極酸化済試験片A」という)を得た。 Preparation of anodized test piece A (without dyeing treatment and dye fixing treatment) An aluminum test piece (JIS A1050P plate material) was weakly alkaline degreasing liquid (Okuno Pharmaceutical Co., Ltd. Top Alclean 101 (trade name) 30 g/ It was degreased by immersing it in an L aqueous solution, a bath temperature: 60° C.) for 3 minutes. Then, it is washed with water and anodized in an anodic oxidation bath containing sulfuric acid as a main component (containing 180 g/L of free sulfuric acid and 8.0 g/L of dissolved aluminum) (bath temperature: 20±1° C., anodic current density: 1 A/dm). 2 , electrolysis time: 30 minutes, film thickness: about 10 μm). The obtained anodized film was washed with water to obtain an anodized aluminum alloy test piece (hereinafter referred to as "anodized test piece A").
陽極酸化済試験片B(染色処理及び染色定着処理有り)の調製
アルミニウムの試験片(JIS A1050P板材)を弱アルカリ性脱脂液(奥野製薬工業(株)製 トップアルクリーン101(商品名)の30g/L水溶液、浴温:60℃)に3分間浸漬して脱脂した。次いで、水洗し、硫酸を主成分とする陽極酸化浴(遊離硫酸180g/L及び溶存アルミ8.0g/Lを含む)で陽極酸化(浴温:20±1℃、陽極電流密度:1A/dm2、電解時間:30分間、膜厚:約10μm)を行った。得られた陽極酸化皮膜を水洗し、98%硫酸100mL/Lを含む酸活性浴(浴温:室温)に1分間浸漬して酸活性し、水洗を行った。次いで、染色処理液(奥野製薬工業(株)製 TAC染料 TACブラック402 1g/L)に50℃で1分浸漬し、水洗して染色処理を行った。次いで、染色定着処理液(奥野製薬工業(株)製 TAC固着剤−2(商品名)20mL/L)に室温で3分浸漬し、水洗を行うことにより染色定着処理を施し、染色処理された、陽極酸化を施したアルミニウム合金試験片(以下、「陽極酸化済試験片B」という)を得た。 Preparation of anodized test piece B (with dyeing treatment and dye fixing treatment) An aluminum test piece (JIS A1050P plate material) was weakly alkaline degreasing liquid (Okuno Pharmaceutical Co., Ltd. Top Alclean 101 (trade name) 30 g/ It was degreased by immersing it in an L aqueous solution, a bath temperature: 60° C.) for 3 minutes. Then, it is washed with water and anodized in an anodic oxidation bath containing sulfuric acid as a main component (containing 180 g/L of free sulfuric acid and 8.0 g/L of dissolved aluminum) (bath temperature: 20±1° C., anodic current density: 1 A/dm). 2 , electrolysis time: 30 minutes, film thickness: about 10 μm). The obtained anodized film was washed with water, immersed in an acid activation bath (bath temperature: room temperature) containing 98% sulfuric acid 100 mL/L for 1 minute for acid activation, and washed with water. Then, it was immersed in a dyeing treatment liquid (TAC dye TAC black 402 1 g/L manufactured by Okuno Chemical Industries Co., Ltd.) at 50° C. for 1 minute and washed with water to carry out dyeing treatment. Then, it was immersed in a dye-fixing treatment liquid (TAC Adhesive-2 (trade name) 20 mL/L manufactured by Okuno Chemical Industries Co., Ltd.) at room temperature for 3 minutes and washed with water to perform dye-fixing treatment, and then dyed. An anodized aluminum alloy test piece (hereinafter referred to as "anodized test piece B") was obtained.
陽極酸化済試験片C(染色処理有り、染色定着処理無し)の調製
アルミニウムの試験片(JIS A1050P板材)を弱アルカリ性脱脂液(奥野製薬工業(株)製 トップアルクリーン101(商品名)の30g/L水溶液、浴温:60℃)に3分間浸漬して脱脂した。次いで、水洗し、硫酸を主成分とする陽極酸化浴(遊離硫酸180g/L及び溶存アルミ8.0g/Lを含む)で陽極酸化(浴温:20±1℃、陽極電流密度:1A/dm2、電解時間:30分間、膜厚:約10μm)を行った。得られた陽極酸化皮膜を水洗し、98%硫酸100mL/Lを含む酸活性浴(浴温:室温)に1分間浸漬して酸活性し、水洗を行った。次いで、染色処理液(奥野製薬工業(株)製 TAC染料 TACブラック402 1g/L)に50℃で1分浸漬し、水洗を行うことにより染色処理を施し、染色処理された、陽極酸化を施したアルミニウム合金試験片(以下、「陽極酸化済試験片C」という)を得た。 Preparation of anodized test piece C (with dyeing treatment, without dyeing and fixing treatment) An aluminum test piece (JIS A1050P plate material) was weakly alkaline degreasing solution (Okuno Pharmaceutical Co., Ltd. Top Alclean 101 (trade name) 30 g /L aqueous solution, bath temperature: 60° C.) for 3 minutes for degreasing. Then, it is washed with water and anodized in an anodic oxidation bath containing sulfuric acid as a main component (containing 180 g/L of free sulfuric acid and 8.0 g/L of dissolved aluminum) (bath temperature: 20±1° C., anodic current density: 1 A/dm). 2 , electrolysis time: 30 minutes, film thickness: about 10 μm). The obtained anodized film was washed with water, immersed in an acid activation bath (bath temperature: room temperature) containing 98% sulfuric acid 100 mL/L for 1 minute for acid activation, and washed with water. Then, it is immersed in a dyeing treatment liquid (TAC dye TAC black 402 1 g/L manufactured by Okuno Chemical Industries Co., Ltd.) at 50° C. for 1 minute, and washed with water to give a dyeing treatment, and then subjected to a dyeing treatment and anodization. The obtained aluminum alloy test piece (hereinafter referred to as "anodized test piece C") was obtained.
(実施例1)
上記製造条件に従って製造した陽極酸化済試験片Aを、金属塩として酢酸ナトリウム1g/L、pH緩衝剤として酢酸アンモニウム1g/L、界面活性剤としてナフタレンスルホン酸ナトリウムホルマリン重縮合物0.5g/Lを含有し、硝酸とアンモニア水でpHを7.0、8.0、9.0のそれぞれに調整した水溶液である封孔処理液(浴温:92℃)に、各pH毎にそれぞれ5分間、10分間、20分間の各浸漬時間で浸漬して封孔処理を行った。(Example 1)
The anodized test piece A produced according to the above production conditions was treated with sodium acetate 1 g/L as a metal salt, ammonium acetate 1 g/L as a pH buffer, and sodium naphthalenesulfonate formalin polycondensate 0.5 g/L as a surfactant. For 5 minutes at each pH in a sealing treatment solution (bath temperature: 92° C.) that is an aqueous solution containing nitric acid and aqueous ammonia and adjusted to pH 7.0, 8.0, 9.0. The sealing treatment was performed by immersing for 10 minutes and 20 minutes respectively.
(実施例2)
陽極酸化済試験片Bを用いた以外は実施例1と同様にして、封孔処理を行った。(Example 2)
The sealing treatment was performed in the same manner as in Example 1 except that the anodized test piece B was used.
(実施例3)
金属塩として酢酸マグネシウム5g/L、pH緩衝剤としてトリエタノールアミン0.5g/L、界面活性剤としてドデシルベンゼンスルホン酸ナトリウム0.2g/Lを含有し、酢酸と水酸化ナトリウムでpHを調整した水溶液である封孔処理液を用いた以外は実施例1と同様にして、封孔処理を行った。(Example 3)
It contained 5 g/L of magnesium acetate as a metal salt, 0.5 g/L of triethanolamine as a pH buffer, and 0.2 g/L of sodium dodecylbenzenesulfonate as a surfactant, and the pH was adjusted with acetic acid and sodium hydroxide. The sealing treatment was performed in the same manner as in Example 1 except that the sealing treatment liquid that was an aqueous solution was used.
(実施例4)
金属塩として硝酸カルシウム5g/L、pH緩衝剤としてアラニン4g/L、界面活性剤としてアルキレンフェニルスルホン酸ナトリウム共重合物0.2g/Lを含有し、硝酸とアンモニア水でpHを調整した水溶液である封孔処理液を用いた以外は実施例1と同様にして、封孔処理を行った。(Example 4)
An aqueous solution containing 5 g/L of calcium nitrate as a metal salt, 4 g/L of alanine as a pH buffer, and 0.2 g/L of sodium alkylenephenylsulfonate copolymer as a surfactant, the pH of which is adjusted with nitric acid and ammonia water. The sealing treatment was carried out in the same manner as in Example 1 except that a certain sealing treatment liquid was used.
(実施例5)
金属塩として硝酸マグネシウム10g/L、pH緩衝剤としてピリジン4g/L、界面活性剤としてナフタレンスルホン酸ナトリウムホルマリン重縮合物0.5g/Lを含有し、硝酸と水酸化カリウムでpHを調整した水溶液である封孔処理液を用いた以外は実施例1と同様にして、封孔処理を行った。(Example 5)
An aqueous solution containing 10 g/L of magnesium nitrate as a metal salt, 4 g/L of pyridine as a pH buffer, and 0.5 g/L of sodium formalin naphthalenesulfonate as a polycondensate as a surfactant, the pH of which was adjusted with nitric acid and potassium hydroxide. The sealing treatment was carried out in the same manner as in Example 1 except that the sealing treatment liquid was used.
(実施例6)
陽極酸化済試験片Bを用い、金属塩として硝酸マグネシウム10g/L、pH緩衝剤としてピリジン4g/L、ナフタレンスルホン酸ナトリウムホルマリン重縮合物0.5g/Lを含有し、硝酸と水酸化カリウムでpHを調整した水溶液である封孔処理液を用いた以外は実施例1と同様にして、封孔処理を行った。(Example 6)
Using anodized test piece B, containing 10 g/L of magnesium nitrate as a metal salt, 4 g/L of pyridine as a pH buffer, 0.5 g/L of sodium formalin naphthalene sulfonate polycondensate, and using nitric acid and potassium hydroxide. The pore-sealing treatment was carried out in the same manner as in Example 1 except that the pore-sealing treatment liquid, which was an aqueous solution whose pH was adjusted, was used.
(実施例7)
上記製造条件に従って製造した陽極酸化済試験片Aを、金属塩として硝酸カリウム10g/L、pH緩衝剤として2−アミノピリジン0.5g/L及び2−メチルイミダゾール0.5g/L、界面活性剤としてポリオキシエチレンスチレン化フェニルエーテルリン酸エステル0.2g/Lを含有し、硝酸とアンモニア水でpHを7.5、9.5のそれぞれに調整した水溶液である封孔処理液(浴温:92℃)に、各pH毎にそれぞれ5分間、20分間の各浸漬時間で浸漬して封孔処理を行った。(Example 7)
The anodized test piece A produced according to the above production conditions was treated with 10 g/L of potassium nitrate as a metal salt, 0.5 g/L of 2-aminopyridine and 0.5 g/L of 2-methylimidazole as a pH buffer, and as a surfactant. A sealing treatment solution (bath temperature: 92) containing 0.2 g/L of polyoxyethylene styrenated phenyl ether phosphate and adjusted to pH 7.5 and 9.5 with nitric acid and ammonia water, respectively. (°C) for each pH for 5 minutes and 20 minutes for each immersion time to perform the sealing treatment.
(実施例8)
金属塩として硝酸マグネシウム20g/L、pH緩衝剤として2−アミノピリジン0.5g/L及び2−メチルイミダゾール0.5g/L、界面活性剤としてポリオキシエチレンスチレン化フェニルエーテルリン酸エステル0.2g/Lを含有し、硝酸とアンモニア水でpHを調整した水溶液である封孔処理液を用いた以外は実施例7と同様にして、封孔処理を行った。(Example 8)
20 g/L of magnesium nitrate as a metal salt, 0.5 g/L of 2-aminopyridine and 0.5 g/L of 2-methylimidazole as a pH buffer, and 0.2 g of polyoxyethylene styrenated phenyl ether phosphate as a surfactant. The pore-sealing treatment was carried out in the same manner as in Example 7 except that the pore-sealing treatment liquid containing /L and having its pH adjusted with nitric acid and aqueous ammonia was used.
(実施例9)
陽極酸化済試験片Bを用い、金属塩として硝酸バリウム1g/L、pH緩衝剤としてピラゾール1g/L及びプテリジン1g/L、界面活性剤として脂肪酸アミドアルキルベタイン1g/L及びアルキレンフェニルスルホン酸ナトリウム共重合物0.2g/Lを含有し、硝酸とアンモニア水でpHを調整した水溶液である封孔処理液を用いた以外は実施例7と同様にして、封孔処理を行った。(Example 9)
Using anodized test piece B, barium nitrate 1 g/L as a metal salt, pyrazole 1 g/L and pteridine 1 g/L as a pH buffer, fatty acid amide alkyl betaine 1 g/L as a surfactant and sodium alkylenephenyl sulfonate The sealing treatment was performed in the same manner as in Example 7 except that the sealing treatment liquid containing 0.2 g/L of the polymer and having its pH adjusted with nitric acid and aqueous ammonia was used.
(実施例10)
陽極酸化済試験片Aを用い、金属塩として硝酸マグネシウム20g/L、pH緩衝剤としてイミダゾール2g/L、界面活性剤としてポリオキシエチレンアルキルエーテル硫酸ナトリウム0.1g/L及びポリオキシエチレンフェニルエーテル硫酸ナトリウム0.2g/Lを含有し、硝酸とアンモニア水でpHを調整した水溶液である封孔処理液を用いた以外は実施例7と同様にして、封孔処理を行った。
(実施例11)
陽極酸化済試験片Aを用い、金属塩として硝酸マグネシウム20g/L、pH緩衝剤としてイミダゾール2g/L、界面活性剤としてポリオキシエチレンアルキルエーテル0.01g/L及びアルキレンフェニルスルホン酸ナトリウム共重合物0.2g/Lを含有し、硝酸とアンモニア水でpHを調整した水溶液である封孔処理液を用いた以外は実施例7と同様にして、封孔処理を行った。(Example 10)
Using anodized test piece A, magnesium nitrate 20 g/L as a metal salt, imidazole 2 g/L as a pH buffer, sodium polyoxyethylene alkyl ether sulfate 0.1 g/L and polyoxyethylene phenyl ether sulfate as a surfactant. The sealing treatment was carried out in the same manner as in Example 7 except that the sealing treatment liquid containing 0.2 g/L of sodium and having its pH adjusted with nitric acid and aqueous ammonia was used.
(Example 11)
Using anodized test piece A, magnesium nitrate 20 g/L as a metal salt, imidazole 2 g/L as a pH buffer, polyoxyethylene alkyl ether 0.01 g/L as a surfactant and sodium alkylenephenyl sulfonate copolymer The sealing treatment was carried out in the same manner as in Example 7 except that the sealing treatment liquid containing 0.2 g/L and adjusted in pH with nitric acid and aqueous ammonia was used.
(実施例12)
陽極酸化済試験片Bを用い、金属塩として硝酸カルシウム5g/L、pH緩衝剤としてオキサゾール1g/L、界面活性剤として脂肪酸アミドアルキルベタイン0.2g/L及びドデシルベンゼンスルホン酸ナトリウム0.5g/Lを含有し、硝酸とアンモニア水でpHを調整した水溶液である封孔処理液を用いた以外は実施例7と同様にして、封孔処理を行った。(Example 12)
Using anodized test piece B, 5 g/L of calcium nitrate as a metal salt, 1 g/L of oxazole as a pH buffer, 0.2 g/L of fatty acid amide alkyl betaine as a surfactant and 0.5 g/sodium dodecylbenzenesulfonate. The sealing treatment was performed in the same manner as in Example 7 except that the sealing treatment liquid containing L and adjusted in pH with nitric acid and aqueous ammonia was used.
(比較例1)
陽極酸化済試験片Aを、沸騰水封孔(イオン交換水)に92℃で20分浸漬して封孔処理を行った。(Comparative Example 1)
The anodized test piece A was immersed in boiling water sealing (ion-exchanged water) at 92° C. for 20 minutes for sealing treatment.
(比較例2)
陽極酸化済試験片Aを、酢酸ニッケル系封孔剤(奥野製薬工業(株)製 トップシールH−298(商品名))を40mL/L含むpH5.6の水溶液からなる封孔処理液(浴温:92℃)に、5分間、10分間、20分間の各浸漬時間で浸漬して封孔処理を行った。(Comparative example 2)
The anodized test piece A was filled with a nickel acetate-based sealing agent (top seal H-298 (trade name) manufactured by Okuno Chemical Industries Co., Ltd.) (40 mL/L) at a pH of 5.6 as a sealing treatment solution (bath). It was immersed in a temperature of 92° C.) for 5 minutes, 10 minutes and 20 minutes for each sealing treatment.
(比較例3)
陽極酸化済試験片Cを用いた以外は比較例2と同様にして、封孔処理を行った。(Comparative example 3)
The sealing treatment was performed in the same manner as Comparative Example 2 except that the anodized test piece C was used.
(比較例4)
硫酸アンモニウム10g/L、pH緩衝剤として2−アミノピリジン0.5g/L及び2−メチルイミダゾール0.5g/L、界面活性剤としてポリオキシエチレンスチレン化フェニルエーテルリン酸エステル0.2g/Lを含有し、硝酸とアンモニア水でpHを調整した水溶液である封孔処理液を用いた以外は実施例7と同様にして、封孔処理を行った。(Comparative example 4)
10 g/L ammonium sulfate, 0.5 g/L 2-aminopyridine and 0.5 g/L 2-methylimidazole as a pH buffer, and 0.2 g/L polyoxyethylene styrenated phenyl ether phosphate ester as a surfactant Then, the pore-sealing treatment was performed in the same manner as in Example 7 except that the pore-sealing treatment liquid that was an aqueous solution of which pH was adjusted with nitric acid and ammonia water was used.
上記実施例及び比較例において陽極酸化済試験片に封孔処理を行った直後、水道水で1分間流水水洗を行った。次いで、陽極酸化済試験片をドライヤーで乾燥した後、一夜室温環境下で放置して、封孔処理後の陽極酸化済試験片を調製した。 Immediately after performing the sealing treatment on the anodized test pieces in the above-mentioned Examples and Comparative Examples, they were washed with running water for 1 minute. Next, the anodized test piece was dried with a dryer, and then left overnight at room temperature environment to prepare anodized test piece after the sealing treatment.
上記実施例及び比較例で調製した封孔処理後の陽極酸化済試験片について、下記の試験方法により評価を行った。 The anodized test pieces after the sealing treatment prepared in the above Examples and Comparative Examples were evaluated by the following test methods.
封孔度
JIS H 8683−2:1999(アルミニウム及びアルミニウム合金の陽極酸化皮膜の封孔度試験方法 第2部:リン酸−クロム酸水溶液浸漬試験)に準拠して、封孔処理後の各試験片をリン酸−クロム酸水溶液に浸漬し、単位面積あたりの試験片の質量減少を測定した。数値が小さいほど、封孔度が良いことを示す。 Sealing degree According to JIS H 8683-2:1999 (Testing method for sealing degree of anodic oxide film of aluminum and aluminum alloy Part 2: Phosphoric acid-chromic acid aqueous solution immersion test), each test after sealing treatment The piece was immersed in a phosphoric acid-chromic acid aqueous solution, and the mass reduction of the test piece per unit area was measured. The smaller the value, the better the sealing degree.
耐汚染性(マジックテスト−付着汚れ除去性試験)
封孔処理後の各試験片を室温にて1日放置し、表面に油性黒マジックインクにてマークを記入し、30秒静置した。次いで、水又はイソプロピルアルコールを染み込ませたボックスティシューにより拭き取りを行い、下記評価基準に従って評価した。
◎:軽く擦ると完全にマークを除去できる
○:強く擦るとマークを除去できる
△:強く擦っても若干マーク跡が残る
×:マークの黒色が取れない
なお、水を用いた試験により、△評価であれば実使用において問題ないと評価できる。 Contamination resistance (magic test-adhesive stain removal test)
Each test piece after the sealing treatment was left at room temperature for 1 day, a mark was written on the surface with an oil-based black magic ink, and the test piece was allowed to stand for 30 seconds. Then, it was wiped off with a box tissue soaked with water or isopropyl alcohol, and evaluated according to the following evaluation criteria.
◎: Marks can be completely removed by light rubbing ○: Marks can be removed by rubbing strongly △: Some mark marks remain even if strongly rubbed ×: Black color of the mark cannot be removed In addition, △ evaluation by water test If so, it can be evaluated that there is no problem in actual use.
外観評価
封孔処理を行った陽極酸化済試験片の表面の粉吹き、カブリ、又はそれらによる干渉膜虹の発生状態を目視で観察し、下記評価基準に従って評価した。
◎:粉吹き、カブリ、又はそれらによる干渉膜虹が全く発生しておらず、外観が良好である
○:粉吹き、カブリ、又はそれらによる干渉膜虹が若干発生しているが、外観に問題がない程度である
△:粉吹き、カブリ、又はそれらによる干渉膜虹が発生しており、軽度の外観不良が生じている
×:粉吹き、カブリ、又はそれらによる干渉膜虹が強く発生しており、重度の外観不良が生じている Appearance Evaluation The surface of the anodized test piece subjected to the sealing treatment was visually observed for dusting, fog, or the generation state of an interference film rainbow caused by them, and evaluated according to the following evaluation criteria.
⊚: Powder dust, fog, or interference film rainbow due to them is not generated at all, and appearance is good. ○: Powder dust, fog, or interference film rainbow due to them is slightly generated, but there is a problem in appearance. No: △: Blowing of powder, fog, or interference film rainbow due to them, and slight appearance defect occurred ×: Powder blowing, fog, or interference film rainbow due to them was strongly generated And has a severe appearance defect
結果を表1〜5に示す。 The results are shown in Tables 1-5.
表1〜5から明らかなように、実施例1〜12の封孔処理液を用いると、ニッケル塩を含有しない封孔処理液であっても、ニッケル塩を含有する封孔処理液を用いた場合と同程度の封孔性能を付与することができることが分かった。また、実施例1〜12の封孔処理液を用いると、封孔処理された陽極酸化皮膜が優れた耐汚染性を示すことができることが分かった。 As is clear from Tables 1 to 5, when the sealing treatment liquids of Examples 1 to 12 were used, even if the sealing treatment liquid did not contain the nickel salt, the sealing treatment liquid containing the nickel salt was used. It was found that the same level of sealing performance as that of the case can be provided. Further, it was found that when the sealing treatment liquids of Examples 1 to 12 were used, the sealing-treated anodic oxide film could exhibit excellent stain resistance.
(実施例13)
陽極酸化済試験片Aを、金属塩として硝酸マグネシウム10g/L、pH緩衝剤としてピリジン4g/L、界面活性剤としてナフタレンスルホン酸ナトリウムホルマリン重縮合物0.5g/Lを含有し、硝酸と水酸化カリウムでpHを9.0に調整した水溶液である封孔処理液(浴温:92℃)1Lに浸漬して封孔処理を行った。具体的には、上記封孔処理液に対してアルゴンガス撹拌を行いながら、20枚の試験片をそれぞれ20分間ずつ順次浸漬した。試験片は、大きさが5cm×10cmであり、面積が両面の合計で1dm2であった。(Example 13)
Anodized test piece A contains 10 g/L of magnesium nitrate as a metal salt, 4 g/L of pyridine as a pH buffer, 0.5 g/L of sodium naphthalenesulfonate formalin polycondensate as a surfactant, and nitric acid and water. The pore-sealing treatment was performed by immersing in 1 L of the pore-sealing treatment solution (bath temperature: 92° C.), which was an aqueous solution whose pH was adjusted to 9.0 with potassium oxide. Specifically, each of the 20 test pieces was sequentially immersed for 20 minutes while stirring the sealing solution with argon gas. The test piece had a size of 5 cm×10 cm, and the total area of both surfaces was 1 dm 2 .
(実施例14)
アルゴンガス撹拌に代えて、空気攪拌を行った以外は実施例13と同様にして、封孔処理を行った。(Example 14)
The sealing treatment was performed in the same manner as in Example 13 except that air stirring was performed instead of argon gas stirring.
実施例14では、空気攪拌により封孔浴が濃く白濁したが、アルゴンガス攪拌を行った実施例13では、封孔浴がわずかに白濁する程度であった。また、実施例13及び14の白濁物は、濾過除去が可能であった。 In Example 14, the pore-sealing bath was thickly turbid due to air agitation, but in Example 13 in which the argon gas was stirred, the pore-sealing bath was slightly turbid. The white turbid substances of Examples 13 and 14 could be removed by filtration.
Claims (10)
前記金属塩は、アルカリ金属塩及びアルカリ土類金属塩からなる群より選択される少なくとも1種であり、
前記pH緩衝剤は、含窒素複素環式化合物であり、
前記界面活性剤は、アニオン系界面活性剤及び両性界面活性剤からなる群より選択される少なくとも1種であり、
前記封孔処理液のpHが7.0〜10.0であり、
前記封孔処理液は、ニッケル塩を含まない、
ことを特徴とする封孔処理液。 A sealing treatment liquid for an anodized film of an aluminum alloy containing a metal salt, a pH buffer and a surfactant,
The metal salt is at least one selected from the group consisting of alkali metal salts and alkaline earth metal salts,
The pH buffering agent, Ri nitrogen-containing heterocyclic compound der,
The surfactant is at least one selected from the group consisting of anionic surfactants and amphoteric surfactants,
The pH of the sealing treatment liquid is 7.0 to 10.0,
The sealing treatment liquid does not contain nickel salt,
A sealing treatment liquid characterized by the following.
アルミニウム合金の陽極酸化皮膜用封孔処理液中に、アルミニウム合金の陽極酸化皮膜を有する物品を浸漬する工程を有し、
前記封孔処理液は、金属塩、pH緩衝剤及び界面活性剤を含有し、
前記金属塩は、アルカリ金属塩及びアルカリ土類金属塩からなる群より選択される少なくとも1種であり、
前記pH緩衝剤は、含窒素複素環式化合物であり、
前記界面活性剤は、アニオン系界面活性剤及び両性界面活性剤からなる群より選択される少なくとも1種であり、
前記封孔処理液のpHが7.0〜10.0であり、
前記封孔処理液は、ニッケル塩を含まない、
ことを特徴とする封孔処理方法。 A method for sealing an anodized film of an aluminum alloy, comprising:
In the sealing treatment liquid for anodized film of aluminum alloy, having a step of immersing an article having an anodized film of aluminum alloy,
The sealing treatment liquid contains a metal salt, a pH buffer and a surfactant,
The metal salt is at least one selected from the group consisting of alkali metal salts and alkaline earth metal salts,
The pH buffering agent, Ri nitrogen-containing heterocyclic compound der,
The surfactant is at least one selected from the group consisting of anionic surfactants and amphoteric surfactants,
The pH of the sealing treatment liquid is 7.0 to 10.0,
The sealing treatment liquid does not contain nickel salt,
A sealing treatment method characterized by the above.
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| JP2016064231 | 2016-03-28 | ||
| JP2016064231 | 2016-03-28 | ||
| PCT/JP2017/012340 WO2017170370A1 (en) | 2016-03-28 | 2017-03-27 | Sealing liquid for anodic oxide coating films of aluminum alloy, concentrated liquid and sealing method |
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| KR102119308B1 (en) * | 2018-05-28 | 2020-06-04 | 주식회사 알맥스 | Nikel-free sealing treatment of aluminium anodizing |
| CN112004669B (en) * | 2018-06-22 | 2023-06-23 | 惠普发展公司,有限责任合伙企业 | Nickel-free sealing of anodized metal substrates |
| CN109972185A (en) * | 2019-04-17 | 2019-07-05 | 邓华斌 | A kind of aluminium alloy is without nickel environmental protection hole sealing agent and preparation method thereof |
| CN110528043B (en) * | 2019-09-17 | 2021-05-07 | 蓝思精密(东莞)有限公司 | Sweat-proof liquid treatment process for metal sheet, metal shell and electronic equipment |
| WO2021100369A1 (en) * | 2019-11-21 | 2021-05-27 | 奥野製薬工業株式会社 | Chemical polishing agent and chemical polishing method |
| KR102750805B1 (en) | 2020-06-23 | 2025-01-08 | 삼성전자주식회사 | An electronic device comprising a housing including metal material |
| CN114075663B (en) * | 2020-08-21 | 2023-09-12 | 宝山钢铁股份有限公司 | Water-based treating agent for carbon steel surface, well corrosion-resistant carbon steel and preparation method thereof |
| CN114959829B (en) * | 2022-06-16 | 2024-06-04 | 江门市优博科技有限公司 | Normal-temperature environment-friendly sealing agent for dyeing aluminum and aluminum alloy anodic oxide films, and preparation method and application process thereof |
| WO2025216592A1 (en) * | 2024-04-12 | 2025-10-16 | 삼성전자 주식회사 | Housing component, electronic device including housing component, and method for manufacturing housing component |
| WO2025255709A1 (en) * | 2024-06-11 | 2025-12-18 | Henkel Ag & Co. Kgaa | Composition and process for sealing anodized aluminum surfaces |
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| GB991114A (en) * | 1960-09-30 | 1965-05-05 | Reynolds Metals Co | Improvements in sealing of anodic oxide films on aluminium |
| DE4210884C2 (en) * | 1991-04-09 | 2000-10-05 | Clariant Finance Bvi Ltd | Cobalt- and nickel-free compaction preparations |
| DE19621818A1 (en) * | 1996-05-31 | 1997-12-04 | Henkel Kgaa | Short-term hot compression of anodized metal surfaces with solutions containing surfactants |
| US6511532B2 (en) * | 2000-10-31 | 2003-01-28 | The United States Of America As Represented By The Secretary Of The Navy | Post-treatment for anodized aluminum |
| JP4397376B2 (en) * | 2004-01-30 | 2010-01-13 | 日鉱金属株式会社 | Sealing treatment agent, sealing treatment method, and printed circuit board treated with the treatment agent |
| US20080028560A1 (en) * | 2006-08-07 | 2008-02-07 | Nicola John Policicchio | Duster system for damp and dry dusting |
| CN101323965B (en) * | 2008-07-24 | 2012-03-14 | 武汉材料保护研究所 | Middle temperature sealant and closing process for aluminum anodized film |
| JP5408612B2 (en) * | 2009-04-13 | 2014-02-05 | 奥野製薬工業株式会社 | Sealing method for anodized film of aluminum alloy |
| CN101864589B (en) * | 2010-06-11 | 2013-01-30 | 武汉材料保护研究所 | Metal salt-free sealing agent for aluminum alloy anodic oxide film |
| US10557210B2 (en) * | 2014-02-24 | 2020-02-11 | The Boeing Company | Direct electrochemical synthesis of doped conductive polymers on metal alloys |
| CN105088311B (en) | 2015-08-06 | 2018-07-24 | 深圳前海艾丽优科技有限公司 | A kind of aluminium alloy is without nickel environmental protection hole sealing agent |
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