JP6778376B2 - Floating zone melting method and equipment using it - Google Patents
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この発明は、たとえば赤外線集中加熱浮遊帯域溶融法で単結晶を製造するときの、原料棒の配置方法に関する。 The present invention relates to, for example, a method of arranging raw material rods when producing a single crystal by an infrared concentrated heating floating zone melting method.
シリコン、サファイア、ガリウム砒素(砒化ガリウム)、ニオブ酸リチウム、タンタル酸リチウム、四ホウ酸リチウムなどの市場規模の大きな単結晶材料の多くは、原料のすべてを一旦溶融し、その一部から結晶化させるチョクラルスキー(Cz)法やブリッジマン法といった手法で生産されている。これらの手法の特長は、高品質で大口径の結晶を量産できることにある。その一方、欠点としては、結晶育成に坩堝が必須であることや偏析制御が困難であることなどがある。 Many of the large market-sized single crystal materials such as silicon, sapphire, gallium arsenide (gallium arsenide), lithium niobate, lithium tantalate, and lithium tetraborate melt all of the raw materials once and crystallize from some of them. It is produced by methods such as the Czochralski (Cz) method and the Bridgeman method. The feature of these methods is that high quality and large diameter crystals can be mass-produced. On the other hand, the drawbacks are that a crucible is indispensable for crystal growth and that segregation control is difficult.
坩堝における問題としては、シリコンの結晶育成に用いる石英坩堝では、使い捨てである点、サファイアやニオブ酸リチウムの結晶育成に用いられることのあるイリジウムや白金といった貴金属坩堝は非常に高額である点がある。貴金属坩堝の場合、使用に伴って形状変形が進行したりするため、定期的な改鋳が必要となる。これらの要因が一層の低コスト化を阻害する大きな要因である。 The problems with crucibles are that quartz crucibles used for growing silicon crystals are disposable, and precious metal crucibles such as iridium and platinum, which are sometimes used for growing crystals of sapphire and lithium niobate, are very expensive. .. In the case of a precious metal crucible, shape deformation progresses with use, so regular recasting is required. These factors are major factors that hinder further cost reduction.
偏析に関する問題としては、偏析制御が困難であるために量産は偏析制御が不要な結晶材料が中心となっている点である。シリコンの場合、p型シリコンでは偏析係数が0.8と1に近いホウ素をドーパントして利用できるため、Cz法で育成してもドーパントの偏析は問題となりにくいのに対し、n型シリコンでは偏析係数がせいぜい0.35と1に比べて小さなリンなどしかドーパントとして利用できないため、ドーパントの偏析が問題となる。そのため、結晶育成過程での固化率を制限せざるを得ず、n型シリコンは、長尺化が難しく、p型シリコンに比べて低コストの量産が困難である。近年注目を集める単結晶シリコン太陽電池では、基板にn型シリコンを用いるタイプの変換効率がp型シリコンを用いるものに比べて高いことから、n型シリコンの低コスト化が効果的な状況にある。一方、ニオブ酸リチウムやタンタル酸リチウムといった単結晶では、リチウムとニオブあるいはリチウムとタンタルの組成比が1:1の定比組成に近い結晶ほど表面弾性波素子としての性能が高いことが知られているが、実際に量産されているのは、Cz法で育成可能なニオブやタンタルが過剰の一致溶融組成の結晶である。 The problem with segregation is that it is difficult to control segregation, so mass production is centered on crystalline materials that do not require segregation control. In the case of silicon, since boron whose segregation coefficient is close to 0.8 and 1 can be used as a dopant in p-type silicon, the segregation of the dopant is unlikely to be a problem even when grown by the Cz method, whereas in n-type silicon, the segregation coefficient is high. Segregation of the dopant becomes a problem because only phosphorus, which is smaller than 0.35 and 1, can be used as the dopant at most. Therefore, the solidification rate in the crystal growth process must be limited, and it is difficult to increase the length of n-type silicon, and it is difficult to mass-produce n-type silicon at a lower cost than p-type silicon. In single crystal silicon solar cells, which have been attracting attention in recent years, the conversion efficiency of the type that uses n-type silicon for the substrate is higher than that that uses p-type silicon, so it is effective to reduce the cost of n-type silicon. .. On the other hand, in single crystals such as lithium niobate and lithium tantalate, it is known that crystals having a composition ratio of lithium to niobium or lithium to tantalum closer to a constant ratio composition of 1: 1 have higher performance as a surface elastic wave element. However, what is actually mass-produced is a crystal having a matching melt composition in which niobium and tantalum that can be grown by the Cz method are excessive.
こうした点を踏まえると現在工業化されている結晶材料は、適切な坩堝が利用可能な一致溶融組成に近い物質の結晶に限られているといえる。融液の反応性が高いために適切な坩堝のない物質や極端な偏析を生じる物質の結晶はたとえ優れた特性を有していたとしても工業的に利用することは現状では困難である。 Based on these points, it can be said that the crystal materials currently being industrialized are limited to crystals of substances having a matching melt composition in which an appropriate crucible can be used. Due to the high reactivity of the melt, it is currently difficult to industrially use crystals of substances that do not have an appropriate crucible or substances that cause extreme segregation, even if they have excellent properties.
赤外線集中加熱浮遊帯域溶融(IR-FZ)法は、坩堝材の消耗やドーパントの偏析といったCz法やブリッジマン法の欠点を補いうる手法の一つとして開発されたもので、高周波加熱浮遊帯域溶融(rf-FZ)法と同様に坩堝不要の帯域溶融法である(例えば特許文献1)。坩堝不要であることから融液の反応性が高くても結晶育成が可能である。さらに、帯域溶融法であることから、ドーパントの偏析係数が1に比べて極端に大きくても小さくても適切な組成の溶融帯を用いることで均一組成の長尺結晶を原理的に育成可能という特長を有している。しかし、大口径の単結晶育成が困難であったために工業的に用いられることは皆無に近く、研究用に多様な化合物単結晶の少量育成に用いられるにすぎなかった。 The infrared intensive heating floating zone melting (IR-FZ) method was developed as one of the methods that can compensate for the shortcomings of the Cz method and Bridgeman method, such as crucible material consumption and dopant segregation. Similar to the (rf-FZ) method, this is a zone melting method that does not require a crucible (for example, Patent Document 1). Since no crucible is required, crystals can be grown even if the melt has high reactivity. Furthermore, since it is a band melting method, it is possible to grow long crystals with a uniform composition in principle by using a melting band with an appropriate composition regardless of whether the segregation coefficient of the dopant is extremely large or small compared to 1. It has features. However, since it was difficult to grow a large-diameter single crystal, it was rarely used industrially, and it was only used for growing a small amount of various compound single crystals for research.
このIR-FZ法でも育成結晶径を改善する試みが行われている。例えば、特許文献2では回転楕円鏡をその長径方向に移動できる装置を用いてシリコンの育成で原料径に合わせて適切な位置に回転楕円鏡を移動させることでシリコン結晶を大型化できた。 Attempts have also been made to improve the growth crystal diameter in this IR-FZ method. For example, in Patent Document 2, the size of the silicon crystal could be increased by moving the spheroid mirror to an appropriate position according to the diameter of the raw material by growing silicon using a device capable of moving the spheroid mirror in the major axis direction.
特許文献1の浮遊帯域溶融装置は、四楕円鏡型のもので、試料棒の加熱位置で交叉する水平な直交軸上に4つの回転楕円面反射鏡(内面が反射面)が配置されてなるものである。各回転楕円面反射鏡の第1焦点に赤外線ランプが配置され、4つの回転楕円面反射鏡はその第2焦点を加熱位置で共有するように配置されている(上記直交軸の交点が第2焦点)。赤外線ランプから出射する光を各回転楕円面反射鏡で反射させて加熱位置に集光させ、試料を加熱するものである。 The floating zone melting device of Patent Document 1 is a four-elliptical mirror type, and has four rotary ellipsoidal reflectors (inner surface is a reflective surface) arranged on a horizontal orthogonal axis intersecting at the heating position of the sample rod. It is a thing. An infrared lamp is arranged at the first focal point of each spheroidal reflector, and the four spheroidal reflectors are arranged so as to share the second focal point at the heating position (the intersection of the orthogonal axes is the second). focus). The light emitted from the infrared lamp is reflected by each retroreflector and focused on the heating position to heat the sample.
ところが、大口径の単結晶育成には単に集光加熱するだけでなく、溶融帯の固液界面の形状を制御することが必要である。 However, in order to grow a large-diameter single crystal, it is necessary to control the shape of the solid-liquid interface of the molten zone, not just condensing and heating.
そのため、このシリコンの育成において溶融帯形状を丹念に調べた結果、溶融帯中心で原料−融液界面と結晶−融液界面が互いに近接していた。また、直接加熱される融液表面の温度が育成結晶の大口径化に伴って著しく高くなることが示唆された。このことは、溶融帯の外側と内側の温度差が大きいことを意味し、そのような状態でこの原料と結晶が接触することで溶融帯が著しく不安定化されることが考えられた。これらは、溶融帯の中心付近までの伝熱が不十分であることに起因していると考えられた。溶融帯の表面近傍と溶融帯の中心付近で溶融に必要な伝熱機構を定性的に考えると溶融帯表面近傍では、回転楕円鏡からの赤外線の集中による輻射伝熱効果が大きいことに加えて、原料と育成結晶の外周部に近いためこれらの回転による強制対流による伝熱の効果が大きい。したがって、熱伝導の寄与は相対的に小さい。一方、溶融帯中心部では、輻射伝熱効果がほとんど期待できないことに加えて、中心部では原料と育成結晶の回転による強制対流による伝熱の効果も小さい。したがって、熱伝導の寄与が相対的に大きい。こうした状況を是正するような措置を取ることができれば、育成結晶のより一層の大型化が期待できると考えられるが、これまでそのような試みがなされていないのが現状であった。 Therefore, as a result of careful examination of the shape of the molten zone in the growth of this silicon, the raw material-melt interface and the crystal-melt interface were close to each other at the center of the molten zone. In addition, it was suggested that the temperature of the surface of the melt that was directly heated increased significantly as the diameter of the grown crystals increased. This means that the temperature difference between the outside and the inside of the melting zone is large, and it is considered that the melting zone becomes significantly unstable due to the contact between the raw material and the crystal in such a state. These were considered to be due to insufficient heat transfer to the vicinity of the center of the fusion zone. Considering qualitatively the heat transfer mechanism required for melting near the surface of the melting zone and near the center of the melting zone, in addition to the large radiant heat transfer effect due to the concentration of infrared rays from the rotating elliptical mirror near the surface of the melting zone. Since it is close to the outer periphery of the raw material and the grown crystal, the effect of heat transfer by forced convection due to these rotations is large. Therefore, the contribution of heat conduction is relatively small. On the other hand, in the central part of the molten zone, the radiant heat transfer effect can hardly be expected, and in the central part, the effect of heat transfer by forced convection due to the rotation of the raw material and the grown crystal is also small. Therefore, the contribution of heat conduction is relatively large. If measures can be taken to correct such a situation, it is expected that the grown crystals will be further enlarged, but such an attempt has not been made so far.
この発明は、たとえば赤外線集中加熱浮遊帯域溶融法で単結晶を製造するときに溶融帯を安定化させるための原料棒の適切な配置方法を提供することを目的とする。 An object of the present invention is to provide an appropriate method for arranging raw material rods for stabilizing a melting zone when producing a single crystal by, for example, an infrared concentrated heating floating zone melting method.
この発明は単結晶を育成する浮遊帯域溶融法において鉛直方向に吊り下げられた複数の原料棒を、該原料棒間に間隙をもって配置し、間隙を維持したまま溶融帯を生成する浮遊帯域溶融法であり、間隙を変えることにより、溶融帯を安定化することができる方法である。 The present invention is a floating zone melting method in which a plurality of raw material rods suspended in the vertical direction are arranged with a gap between the raw material rods in a floating zone melting method for growing a single crystal, and a melting zone is generated while maintaining the gap. This is a method in which the melting zone can be stabilized by changing the gap.
また、この発明によると単結晶を育成する浮遊帯域溶融装置において、鉛直方向に吊り下げられた複数の原料棒を、該原料棒間に間隙をもって配置可能な保持機構を備えており、間隙を維持したまま溶融帯を生成することができるため、溶融帯を安定化することができる浮遊帯域溶融装置である。 Further, according to the present invention, in the floating zone melting device for growing a single crystal, a holding mechanism capable of arranging a plurality of raw material rods suspended in the vertical direction with a gap between the raw material rods is provided to maintain the gap. It is a floating zone melting device that can stabilize the melting zone because the melting zone can be generated as it is.
赤外線集中加熱浮遊帯域溶融法によりシリコン単結晶の育成を行った。通常1本の原料棒を用いて、溶融帯を形成し、単結晶を育成するが、溶融帯の中心部と外周部の温度差により溶融帯が不安定となり、原料棒のサイズの増大に伴い、図1のように溶融帯が維持できない状態があった。これを改善する方法を検討し、シャフトの回転軸上近傍を避けるように複数の原料棒を配置してそれらを同時に用いて結晶育成を行った。 Silicon single crystals were grown by the infrared concentrated heating floating band melting method. Normally, a single raw material rod is used to form a melting zone and grow a single crystal, but the melting zone becomes unstable due to the temperature difference between the central part and the outer peripheral part of the melting zone, and as the size of the raw material rod increases. As shown in FIG. 1, there was a state in which the melting zone could not be maintained. A method for improving this was examined, and a plurality of raw material rods were arranged so as to avoid the vicinity on the rotation axis of the shaft, and crystals were grown using them at the same time.
10mm×20mm角の原料棒を2本同時に用い、この長辺側を、回転軸の中心をはさみ、向い合せに配置し、その間隙を原料棒間距離2、4、7mmとし、育成試験を行い、20mm×20mm角の1本原料棒を用いた育成試験の結果と合わせて比較検討した。 Two 10 mm x 20 mm square raw material rods are used at the same time, and the long side is placed facing each other with the center of the rotation axis sandwiched between them, and the gap between the raw material rods is set to 2, 4, and 7 mm, and a growing test is performed. , A comparative study was carried out together with the results of a growing test using a single raw material rod of 20 mm × 20 mm square.
図2上段は、その例として鉛直方向に吊り下げられた10mm×20mm×180mmの2本の原料棒の間隔を変化させた原料棒配置を示している。図2下段は、ランプ出力を6.8kWとし、ほぼ同一の条件で形成した溶融帯の急冷固化体の縦断面の写真を示している。原料棒間距離が2 mm程度までは、ほぼ一定時間ごとに融液が毛細管現象により原料側に吸い上げられる現象が見られた。原料棒間距離が4mm近くになるとそのような現象は抑制された。 As an example, the upper part of FIG. 2 shows a raw material rod arrangement in which the distance between two raw material rods of 10 mm × 20 mm × 180 mm suspended in the vertical direction is changed. The lower part of FIG. 2 shows a photograph of a vertical cross section of a rapidly cooled solidified body of a molten zone formed under almost the same conditions with a lamp output of 6.8 kW. Up to a distance of about 2 mm between the raw material rods, a phenomenon was observed in which the melt was sucked up to the raw material side by capillarity at approximately regular intervals. Such a phenomenon was suppressed when the distance between the raw material rods was close to 4 mm.
さらに詳細な検討として、原料棒間距離と界面形状の凸度、ランプ出力、溶融帯高さの関係について示す。図3に溶融帯の模式図を示す。図4には、原料棒間距離と界面形状の凸度の関係について示す。図5には、原料棒間距離とランプ出力の関係について示す。図6には、原料棒間距離と溶融帯高さの関係について示す。 As a more detailed study, the relationship between the distance between the raw material rods, the convexity of the interface shape, the lamp output, and the height of the molten zone will be shown. FIG. 3 shows a schematic diagram of the melting zone. FIG. 4 shows the relationship between the distance between the raw material rods and the convexity of the interface shape. FIG. 5 shows the relationship between the distance between the raw material rods and the lamp output. FIG. 6 shows the relationship between the distance between the raw material rods and the height of the melting zone.
図7の模式図に示すように原料棒の間隔が広くなるに伴って、原料側の界面形状の凸度が減少し、平坦に近くなることがわかった。これは、原料棒の間隙を通って加熱光の一部が浸透し、シャフト回転中心近傍の原料棒や溶融帯表面を直接加熱できるためである。言い換えると1本の原料棒を用いる従来の条件では、回転中心近傍の伝熱が主に熱伝導でなされていたのに対し、複数の原料棒の隙間によって、輻射伝熱の寄与が加わったといえる。また、この溶融帯界面形状の変化に伴って溶融帯が安定化した。また、溶融帯と結晶の界面が最も凸になる結晶の回転中心近傍の直上は、2本の原料棒の間隙で、原料と育成結晶が接触しづらい配置となっていることも溶融帯の安定化に寄与していると考えられる。原料棒をさらに増やし、10mm×10mm×180mmの4本の原料棒の間隙が十字型になるように配し、その間隔を変化させた場合でも類似の結果が得られた。 As shown in the schematic diagram of FIG. 7, it was found that as the distance between the raw material rods increased, the convexity of the interface shape on the raw material side decreased and became closer to flat. This is because a part of the heating light permeates through the gap between the raw material rods, and the raw material rods and the surface of the molten zone near the center of rotation of the shaft can be directly heated. In other words, under the conventional conditions of using one raw material rod, heat transfer near the center of rotation was mainly performed by heat conduction, but it can be said that the contribution of radiant heat transfer was added by the gaps between multiple raw material rods. .. In addition, the molten zone was stabilized as the interface shape of the molten zone changed. In addition, the fusion zone is stable because the gap between the two raw material rods is located directly above the center of rotation of the crystal where the interface between the fusion zone and the crystal is most convex, making it difficult for the raw material and the grown crystal to come into contact with each other. It is thought that it contributes to the conversion. Similar results were obtained even when the number of raw material rods was further increased and the gaps between the four raw material rods of 10 mm × 10 mm × 180 mm were arranged in a cross shape and the intervals were changed.
また本試験を行った赤外線集中加熱浮遊帯域溶融装置には、間隙を維持したまま複数の原料棒を保持可能なクランプ状の保持機構を備えており、クランプ位置を調整することで間隙を調整した。 In addition, the infrared concentrated heating floating zone melting device used in this test is equipped with a clamp-like holding mechanism that can hold multiple raw material rods while maintaining the gap, and the gap was adjusted by adjusting the clamp position. ..
原料棒を複数用いることで生じる固液界面形状変化から、原料棒と育成結晶の接触が起こりにくくなることから、IR-FZ法での育成結晶の大型化を期待できる。IR-FZ法で大型化を実現できれば、坩堝を用いない偏析制御が可能な帯溶融法を結晶材料の量産に用いることができることになるため、Cz法では困難であったn型シリコンなど偏析制御が必要な結晶材料の長尺化が見込める。坩堝コスト分の低コスト化に加えて長尺化による低コスト化が期待される。また、例えばシリコンの場合、現状ではCz法で量産可能なのはp型結晶であるため、p型基板を前提としたデバイス設計における制約がなくなり、例えば、変換効率の高いn型基板を用いた太陽電池に用いることができる。 Due to the change in solid-liquid interface shape caused by the use of a plurality of raw material rods, contact between the raw material rods and the grown crystals is less likely to occur. Therefore, it can be expected that the grown crystals will be enlarged by the IR-FZ method. If the IR-FZ method can be used to increase the size, the zone melting method, which enables segregation control without using a crucible, can be used for mass production of crystalline materials. Therefore, segregation control for n-type silicon, etc., which was difficult with the Cz method. It is expected that the length of the crystal material that requires the above will be increased. In addition to reducing the cost of the crucible, it is expected that the cost will be reduced by increasing the length. Further, in the case of silicon, for example, since p-type crystals can be mass-produced by the Cz method at present, there are no restrictions in device design assuming a p-type substrate. For example, a solar cell using an n-type substrate with high conversion efficiency. Can be used for.
また、この方法では、原料のすべてではなく、一部を溶融帯として溶融する手法であり、原料すべてを一旦溶融するCz法等の手法に比べて必要な電力が少なくなりうるという利点を持つ。 Further, this method is a method of melting not all of the raw materials but a part of the raw materials as a melting zone, and has an advantage that the required electric power can be reduced as compared with a method such as the Cz method in which all the raw materials are once melted.
上述のとおり通常の赤外線集中加熱浮遊帯域溶融法では、1本の原料棒を用いて、溶融帯を形成し、単結晶を育成する。このため、赤外線加熱浮遊帯域溶融法で、育成結晶の大口径化を行う場合、原料棒の断面積を大きくする必要がある。図1は原料棒の断面積を変化(図左から(a)20×20mm2、(b)25×25mm2、(c)30×30mm2)させた条件におけるシリコン単結晶育成中の溶融帯付近の写真である。シリコン単結晶育成の条件は、原料供給速度が10mm/h(ケース(a)(b))、および5mm/h(ケース(c))、集光鏡位置は4mm(ケース(a)(b)(c))である。なお、ここで集光鏡位置は、赤外線を溶融帯に集光する集光鏡の焦点の位置と単結晶の回転軸と距離である。また、ランプ出力は原料棒が20×20mm2、25×25mm2、30×30mm2の各ケースに対し、それぞれ6.8kW(ケース(a))、8.6kW(ケース(b))、7.9kW(ケース(c))とした。図1に30×30mm2のケースでは同条件でのシリコン単結晶の育成を開始から約1分後の状態も示す(d)。ここで示す結果から明らかなように、原料が大きいほど、溶融帯形成に必要なランプ出力がそれぞれ大きくなるだけでなく、溶融帯は大きくくびれ、安定保持が困難な状態になり、溶融帯最小幅と育成結晶径の比は小さくなっていることがわかる。一般に高温になって融液の粘性が小さくなるほど溶融帯はくびれやすくなることから、この現象は、ランプの高出力化にともなって溶融帯の表面が局所的に加熱されて融液表面の粘性が低下する一方、溶融帯中心部では加熱が不十分で原料棒や育成結晶が溶融しにくく、互いに接近し、接触しやすいことに起因していると考えられる。 As described above, in the usual infrared concentrated heating floating zone melting method, a melting zone is formed by using one raw material rod, and a single crystal is grown. Therefore, when the diameter of the grown crystal is increased by the infrared heating floating zone melting method, it is necessary to increase the cross-sectional area of the raw material rod. FIG. 1 shows a molten zone during silicon single crystal growth under the condition that the cross-sectional area of the raw material rod is changed ((a) 20 × 20 mm 2 , (b) 25 × 25 mm 2 , (c) 30 × 30 mm 2 from the left). It is a photograph of the vicinity. The conditions for growing a silicon single crystal are that the raw material supply rate is 10 mm / h (cases (a) and (b)) and 5 mm / h (case (c)), and the condensing mirror position is 4 mm (cases (a) and (b)). (C)). Here, the position of the condensing mirror is the position of the focal point of the condensing mirror that concentrates infrared rays in the fusion zone, the rotation axis of the single crystal, and the distance. The lamp output is 6.8 kW (case (a)), 8.6 kW (case (b)), 7 for each case of the raw material rods of 20 × 20 mm 2 , 25 × 25 mm 2 , and 30 × 30 mm 2. It was set to 9.9 kW (case (c)). FIG. 1 also shows a state about 1 minute after the start of growth of the silicon single crystal under the same conditions in the case of 30 × 30 mm 2 (d). As is clear from the results shown here, the larger the raw material, the larger the lamp output required for forming the melting zone, and also the melting zone becomes large and constricted, making it difficult to maintain stability, and the minimum width of the melting zone. It can be seen that the ratio of the grown crystal diameter is small. Generally, the higher the temperature and the lower the viscosity of the melt, the easier it is for the melt zone to constrict. Therefore, this phenomenon is caused by the local heating of the surface of the melt zone as the output of the lamp increases, resulting in the viscosity of the melt surface. On the other hand, it is considered that the cause is that the raw material rods and the grown crystals are difficult to melt due to insufficient heating in the central part of the melting zone, and are easily approached and contacted with each other.
2本の原料棒を用いた上述の実施例を図2から図8を用いて再度検討する。図8は以下の検討のため図7の構成物に参照番号を付した原料棒間配置の模式図である。ここで、図8の(a)は従来通り1本の原料棒を用いた場合、同図(b)は2本の原料棒を間隔Sb空けた場合、同図(c)は2本の原料棒を間隔Sc空けた場合をそれぞれ示している。なお、図8(b)(c)及びそれに対応する図7では、Sb=2mm、Sc=4mmにて実験を行った場合の模式図に相当する。 The above-mentioned embodiment using two raw material rods will be reviewed again with reference to FIGS. 2 to 8. FIG. 8 is a schematic view of the arrangement between the raw material rods in which the components of FIG. 7 are numbered with reference to the following studies. Here, FIG. 8A shows a case where one raw material rod is used as before, FIG. 8B shows a case where two raw material rods are spaced by Sb, and FIG. 8C shows two raw materials. The cases where the bars are spaced Sc apart are shown. In addition, in FIGS. 8 (b) and 8 (c) and FIG. 7 corresponding thereto, it corresponds to a schematic view when the experiment is performed with Sb = 2 mm and Sc = 4 mm.
図8(a)〜(c)において、1a、1b、1cは回転軸中心、2a、2b1,2b2,2c1,2c2は原料棒、3a、3b1,3b2、3c1、3c2は原料棒の凸部、4b、4cは溶融帯溶液の原料棒間での液面、5a、5b、5cは生成された単結晶の凸部、6a、6b、6cは生成された単結晶、7a、7b、7cは溶融帯を示す。また、生成された単結晶6a、6b、6cの半径をrca、rcb、rcc、回転軸から原料棒(2a、2b1、2b2、2c1,2c2)の側面までの距離をrFa、rFb、rFc、原料棒の凸部の高さをhFa、hFb、hFc、単結晶凸部の高さをhca、hcb、hcc、溶融帯高さをHa、Hb、Hc、溶融帯最小間隔をhma,hmb,hmc、溶融帯最小幅をWa、Wb、Wcとして示す。図8のrFa、rFb、rFcは図3のrFに、同じくhFa、hFb、hFcはhFに、hca、hcb、hccはhcに、rca、rcb、rccはrcにそれぞれ対応する。なお、回転軸中心(1a〜1c)は同じであるが、原料棒と単結晶とはそれぞれ逆方向に回転して製造されている。 In FIGS. 8A to 8C, 1a, 1b, 1c are the center of rotation axis, 2a, 2b1, 2b2, 2c1, 2c2 are raw material rods, 3a, 3b1, 3b2, 3c1, and 3c2 are convex portions of the raw material rod. 4b and 4c are the liquid levels between the raw material rods of the molten zone solution, 5a, 5b and 5c are the convex portions of the produced single crystal, 6a, 6b and 6c are the produced single crystals, and 7a, 7b and 7c are melted. Shows a band. Further, the radii of the generated single crystals 6a, 6b, 6c are rca, rcb, rcc, and the distance from the rotation axis to the side surface of the raw material rod (2a, 2b1, 2b2, 2c1, 2c2) is rFa, rFb, rFc, the raw material. The height of the convex part of the rod is hFa, hFb, hFc, the height of the convex part of the single crystal is hca, hcb, hcc, the height of the melting zone is Ha, Hb, Hc, the minimum interval of the melting zone is hma, hmb, hmc, The minimum width of the melting zone is shown as Wa, Wb, Wc. RFa, rFb, and rFc in FIG. 8 correspond to rF in FIG. 3, hFa, hFb, and hFc correspond to hF, hca, hcb, and hcc correspond to hc, and rca, rccb, and rcc correspond to rc. Although the center of the rotation axis (1a to 1c) is the same, the raw material rod and the single crystal are manufactured by rotating in opposite directions.
図4において、結晶側および原料側の界面形状凸度(h/r)がそれぞれ黒丸、白丸で示されている。結晶側界面形状凸度(hc/rc)は図3および図8に示すように単結晶の半径rcに対する単結晶の凸部高さhcの比を示したものである。また原料側界面形状凸度(hF/rF)は回転軸中心から原料棒の側面までの距離rFに対する原料棒の凸部高さhFの比を示したものである。結晶側界面形状凸度(hc/rc)および原料側界面形状凸度(hF/rF)はその値が大きいものほど凸部高が高いことになる。図4は、この結果から、原料棒の間隔(原料棒間距離S)が2mmから5mmの範囲においては、原料棒の間隔が大きくなるにつれ原料側の界面形状凸度(hF/rF)が減少し、原料側の界面形状が平坦化することがわかる。 In FIG. 4, the interface shape convexity (h / r) on the crystal side and the raw material side is indicated by black circles and white circles, respectively. The crystal-side interface shape convexity (hc / rc) indicates the ratio of the convex portion height hc of the single crystal to the radius rc of the single crystal as shown in FIGS. 3 and 8. The interface shape convexity (hF / rF) on the raw material side indicates the ratio of the convex portion height hF of the raw material rod to the distance rF from the center of the rotation axis to the side surface of the raw material rod. The larger the values of the crystal-side interface shape convexity (hc / rc) and the raw material-side interface shape convexity (hF / rF), the higher the convexity height. From this result, FIG. 4 shows that in the range of the distance between the raw material rods (distance S between the raw material rods) of 2 mm to 5 mm, the interface shape convexity (hF / rF) on the raw material side decreases as the distance between the raw material rods increases. However, it can be seen that the interface shape on the raw material side is flattened.
図6において、原料棒間距離Sと溶融帯高さHとの関係を黒丸で示している。また、原料棒間距離Sと溶融帯最小幅Wとの関係を白丸で示している。原料棒の間隔(原料棒間距離S)が0〜7mmの範囲においては、原料棒の間隔が広くなるに伴って、溶融帯高さHが減少し、溶融帯最小幅Wが増大していることがわかる。なお、本実験において原料棒間距離(S)とランプ出力の関係については図5に示すようにほぼ一定である。 In FIG. 6, the relationship between the raw material rod distance S and the melting zone height H is shown by black circles. Further, the relationship between the raw material rod distance S and the minimum melting zone width W is indicated by white circles. In the range of the distance between the raw material rods (distance S between the raw material rods) of 0 to 7 mm, the melt zone height H decreases and the melt zone minimum width W increases as the distance between the raw material rods increases. You can see that. In this experiment, the relationship between the raw material rod distance (S) and the lamp output is almost constant as shown in FIG.
以上のことから、単結晶を育成する浮遊帯域溶融法において、鉛直方向に吊り下げられた複数の原料棒を、該原料棒間に間隙をもって配置し、間隙を維持したまま溶融帯を生成すると溶融帯が安定することがわかる。このことは浮遊帯域溶融法によってより大きな(半径が大きい)単結晶の製造を可能とする。本願発明によりIR-FZ法での育成結晶の大型化が可能となる。本発明のIR-FZ法によるn型シリコン単結晶の大型化量産化技術は、従来Cz法を使うが故に生じた「p型基板を使うという制約事項」から解放されることを意味する。そして、その効果は変換効率の高いn型基板を用いた太陽電池などで顕著に発揮されることとなる。 From the above, in the floating zone melting method for growing a single crystal, a plurality of raw material rods suspended in the vertical direction are arranged with a gap between the raw material rods, and when a melting zone is generated while maintaining the gap, melting occurs. It can be seen that the band is stable. This allows the production of larger (larger radii) single crystals by the floating zone melting method. According to the invention of the present application, it is possible to increase the size of a grown crystal by the IR-FZ method. The technique for large-scale mass production of an n-type silicon single crystal by the IR-FZ method of the present invention means that it is freed from the "restriction of using a p-type substrate" caused by using the conventional Cz method. Then, the effect is remarkably exhibited in a solar cell or the like using an n-type substrate having high conversion efficiency.
図9は、本発明の赤外線集中加熱浮遊帯域溶融装置が備える原料棒設置装置を示した図である。図9(A)は、上述の実施例において利用した、複数の原料棒を一定の間隙を保った状態で1つにまとめ、シャフトのフックにぶら下げる構成の原料棒設置部分を示し、図9(B)はその改良形を示している。 FIG. 9 is a diagram showing a raw material rod setting device included in the infrared centralized heating floating zone melting device of the present invention. FIG. 9A shows a raw material rod installation portion used in the above-described embodiment, in which a plurality of raw material rods are grouped together while maintaining a certain gap and hung from a hook of a shaft. B) shows the improved form.
図9(A)において、原料棒設置装置100は、シャフト11、フック12、ワイヤ13を備える。なお、2つの原料棒(102−1,102−2)は、スペーサ14により所定の間隙を備えて一体化される。ワイヤ13をフック12かけることによりシャフト11に一体化した原料棒をつりさげる。本発明の赤外線集中加熱浮遊帯域溶融装置はシャフト11が10で示す方向に回転する回転機構(不図示)を備える。 In FIG. 9A, the raw material rod setting device 100 includes a shaft 11, a hook 12, and a wire 13. The two raw material rods (102-1 and 102-2) are integrated with a predetermined gap by the spacer 14. By hooking the wire 13 on the hook 12, the raw material rod integrated with the shaft 11 is suspended. The infrared centralized heating floating zone melting device of the present invention includes a rotation mechanism (not shown) in which the shaft 11 rotates in the direction indicated by 10.
図9(B)において、原料棒設置装置200は、サスペンション機能付きシャフトを備える。外側シャフト21、内側シャフト22はバネ23を介して外側シャフト21の内部につりさげられた構成である。内側シャフト22は、外側シャフト21の内部をくりぬいた領域にはめ込まれバネ23を介して外側シャフト21に吊さげられている。外側シャフト21が10の方向に回転すると、内側シャフト22も回転するように構成される。また内部シャフトはスベーサ部24を備えスペーサ部24を挟んで原料棒(202−1、202−2)が所定の間隙を備えて一体化される。図9(A)と同様に本発明の赤外線集中加熱浮遊帯域溶融装置はシャフト21、22が10で示す方向に回転する回転機構(不図示)を備える。 In FIG. 9B, the raw material rod installation device 200 includes a shaft with a suspension function. The outer shaft 21 and the inner shaft 22 are suspended inside the outer shaft 21 via a spring 23. The inner shaft 22 is fitted in a hollowed out region of the outer shaft 21 and hung from the outer shaft 21 via a spring 23. When the outer shaft 21 rotates in the direction of 10, the inner shaft 22 is also configured to rotate. Further, the internal shaft is provided with a spacer portion 24, and the raw material rods (202-1, 202-2) are integrated with a predetermined gap so as to sandwich the spacer portion 24. Similar to FIG. 9A, the infrared centralized heating floating zone melting device of the present invention includes a rotation mechanism (not shown) in which the shafts 21 and 22 rotate in the direction indicated by 10.
図9(A)(B)においては、2つの原料棒を一体化する例を示したが、後述するように3つ以上の原料棒を一体化することも可能である。図10は、原料棒の構成例と原料棒設置装置での適用例を示す図である。図10の(A)〜(E)はそれぞれ原料棒を設置するシャフト(11)側から単結晶(106)方向(鉛直下向き)に原料棒を見た図である。図10(F)に1例として図10(A)を図9(A)の原料棒設置装置100に適応した場合に示す。図10(A)は底面が長方形である2つの原料棒102−1a、102−2aをスペーサ14aを挟んで一体に構成した場合、図10(B)は底面が正方形である4つの原料棒102−1b〜102−4bをスペーサ14bを挟んで一体に構成した場合、図10(C)は底面が正方形である3つの原料棒102−1c〜102−3cをスペーサ14cを挟んで一体に構成した場合、図10(D)は底面が円形である4つの原料棒102−1d〜102−4dをスペーサ14dを挟んで一体に構成した場合、図10(E)は底面が円形である3つの原料棒102−1e〜102−3eをスペーサ14eを挟んで一体に構成した場合をそれぞれ示す。図10の(A)〜(E)のいずれの図においても外周の円周状の矢印は、図10(F)の回転方向10と同じく、これらの一体化された原料棒の回転方向を示している。このように原料棒はスペーサ14を挟んだ構成にすることにより複数の原料棒を一体化することができる。図10(F)に示す例では、一体化された原料棒(102−1、102−2)がシャフト11の回転軸を中心に回転しながら、原料棒の先端が赤外線で加熱され溶融帯107を作り単結晶106を製造する。なお、105は単結晶の凸部、103−1,103−2は原料棒の凸部である。また単結晶106の回転軸はシャフト11の回転軸と同じで位置にあるが回転方向は逆である。上述したように、このように原料棒を増やし、10mm×10mm×180mmの原料棒3本を中心に間隙を持った三菱状に配したり、4本を間隙が十字型になるように配したりして、その間隔を変化させた場合でも溶融帯界面形状の平坦化とその結果溶融帯が安定化する結果が得られた。 Although FIGS. 9A and 9B show an example of integrating two raw material rods, it is also possible to integrate three or more raw material rods as described later. FIG. 10 is a diagram showing a configuration example of a raw material rod and an application example in a raw material rod installation device. 10 (A) to 10 (E) are views of the raw material rods viewed from the shaft (11) side on which the raw material rods are installed in the single crystal (106) direction (vertically downward). FIG. 10 (F) shows, as an example, the case where FIG. 10 (A) is applied to the raw material rod setting device 100 of FIG. 9 (A). FIG. 10 (A) shows two raw material rods 102-1a and 102-2a having a rectangular bottom surface integrally sandwiched by a spacer 14a, and FIG. 10 (B) shows four raw material rods 102 having a square bottom surface. When -1b to 102-4b are integrally formed by sandwiching the spacer 14b, FIG. 10C shows that three raw material rods 102-1c to 102-3c having a square bottom surface are integrally formed by sandwiching the spacer 14c. In the case of FIG. 10 (D), when four raw material rods 102-1d to 102-4d having a circular bottom surface are integrally formed with a spacer 14d interposed therebetween, FIG. 10 (E) shows three raw materials having a circular bottom surface. The case where the rods 102-1e to 102-3e are integrally formed with the spacer 14e interposed therebetween is shown. In any of the figures (A) to (E) of FIG. 10, the circumferential arrow on the outer circumference indicates the rotation direction of these integrated raw material rods as in the rotation direction 10 of FIG. 10 (F). ing. In this way, the raw material rods can be integrated with a plurality of raw material rods by sandwiching the spacer 14. In the example shown in FIG. 10 (F), the tip of the raw material rod is heated by infrared rays while the integrated raw material rods (102-1, 102-2) rotate around the rotation axis of the shaft 11, and the melting zone 107 To produce a single crystal 106. Reference numeral 105 is a convex portion of a single crystal, and 103-1 and 103-2 are convex portions of a raw material rod. The rotation axis of the single crystal 106 is at the same position as the rotation axis of the shaft 11, but the rotation direction is opposite. As described above, the number of raw material rods is increased in this way, and three raw material rods of 10 mm × 10 mm × 180 mm are arranged in a Mitsubishi shape with a gap around them, or four are arranged so that the gap becomes a cross shape. As a result, the result was obtained that the interface shape of the fusion zone was flattened and the fusion zone was stabilized as a result even when the interval was changed.
図9(A)は、ワイヤ13によりシャフト11の回転を一体化された原料棒に伝えるとともにワイヤ13により回転よる結晶成長時の原料棒の揺れを吸収する構成である。しかしながら図9(A)の構成でも原料棒が育成結晶に接触すると水平方向に大きくぶれることがある。図9(A)では左右に揺れる様子を示している。 FIG. 9A shows a configuration in which the rotation of the shaft 11 is transmitted to the integrated raw material rod by the wire 13 and the shaking of the raw material rod during crystal growth due to the rotation is absorbed by the wire 13. However, even with the configuration shown in FIG. 9A, when the raw material rod comes into contact with the grown crystal, it may shake significantly in the horizontal direction. FIG. 9A shows a state of swinging from side to side.
図11は3本の原料を1つにまとめたときに原料と育成結晶が接触し、大きく左右(水平方向に)ぶれた後の溶融帯の様子の一例である。この図のように育成結晶と溶融帯を形成している原料が一部に限られ、残りの原料が育成結晶と接触状態を保てなくなる場合がある。その場合、複数ある原料全体が斜めに傾く。原料棒が十分に長く、十分な質量がある場合には、未接触となった原料が再び溶融帯と接触する場合がある。しかし、原料棒が短く、質量が小さくなると原料全体が斜めに傾いたままの状態となり、原料全体を上下させても溶融帯を形成していない原料を溶融帯に改めて接触させることは困難になる。原料棒が長く、十分な質量を備える場合は、図9(A)の構成で十分対応が可能である。しかしながら、この現象が問題となる場合は、図9(B)に示したような原料棒設置装置200に変えることで複数ある原料の一部が溶融帯と接触しなくなる現象を抑制できる。 FIG. 11 is an example of the state of the molten zone after the raw materials and the grown crystals come into contact with each other when the three raw materials are put together and are largely shaken left and right (horizontally). As shown in this figure, the raw material forming the molten zone with the grown crystal is limited to a part, and the remaining raw material may not be able to maintain the contact state with the grown crystal. In that case, the entire plurality of raw materials are tilted diagonally. If the raw material rod is sufficiently long and has a sufficient mass, the uncontacted raw material may come into contact with the melting zone again. However, if the raw material rod is short and the mass is small, the entire raw material remains tilted at an angle, and it becomes difficult to bring the raw material that does not form a melting zone into contact with the melting zone again even if the entire raw material is moved up and down. .. When the raw material rod is long and has a sufficient mass, the configuration shown in FIG. 9 (A) is sufficient. However, when this phenomenon becomes a problem, it is possible to suppress the phenomenon that a part of a plurality of raw materials does not come into contact with the melting zone by changing to the raw material rod setting device 200 as shown in FIG. 9 (B).
別の方法としては、図9や図10に示したように複数の原料全体を一体化させて回転させるのではなく、複数のシャフトに個々の原料を固定し、そのシャフトを個々に回転させたり、上下に移動させたりする方法である。その1例を図12に示す。図12は本発明の赤外線集中加熱浮遊帯域溶融装置が備える原料棒設置装置を示した図であり、別の形態を示す図である。図12の原料棒設置装置300は、図9(B)で示したサスペンション機能付きシャフト(208−1,208−2)を複数備え、サスペンション機能付きシャフト各々に1つの原料棒(202−1,202−2)を設置する。また、サスペンション機能付きシャフト各々がそれぞれのシャフトの回転軸を中心に回転するように原料棒設置装置300は構成される。なお、サスペンション機能付きシャフト(208−1,208−2)の内側シャフト(22−1,22−2)、外側シャフト(21−1,21−2)、バネ(23−1,23−2)は、それぞれ図9(B)の内側シャフト(22)、外側シャフト(21)、バネ(23)に対応し、その構造は同じである。また図12においては、溶融帯を207、原料棒(202−1,202−2)のそれぞれの凸部を203−1,203−2、単結晶を206、単結晶の凸部を205とする。 As another method, instead of rotating the entire plurality of raw materials in an integrated manner as shown in FIGS. 9 and 10, individual raw materials are fixed to a plurality of shafts and the shafts are individually rotated. , It is a method of moving it up and down. An example thereof is shown in FIG. FIG. 12 is a diagram showing a raw material rod installation device included in the infrared centralized heating floating zone melting device of the present invention, and is a diagram showing another form. The raw material rod installation device 300 of FIG. 12 includes a plurality of shafts with suspension functions (208-1, 208-2) shown in FIG. 9 (B), and one raw material rod (202-1, 208-2) for each shaft with suspension function. 202-2) is installed. Further, the raw material rod installation device 300 is configured so that each of the shafts with a suspension function rotates about the rotation axis of each shaft. The inner shaft (22-1,22-2), the outer shaft (21-1,1-2), and the spring (23-1,23-2) of the shaft with suspension function (208-1,208-2). Corresponds to the inner shaft (22), the outer shaft (21), and the spring (23) of FIG. 9B, respectively, and their structures are the same. Further, in FIG. 12, the melting zone is 207, the convex portions of the raw material rods (202-1, 202-2) are 203-1 and 203-2, the single crystal is 206, and the convex portion of the single crystal is 205. ..
図12に示す方法においても、複数の原料棒を利用することが可能である。図13は複数の原料棒の構成例を示す図であり、そのバリエーションを示す。図13(A)のように底面が正方形である4つの原料棒202−1a〜202−4aをそれぞれサスペンション機能付きシャフトに取り付け各々がそれぞれ回転する4本のサスペンション機能付きシャフトを備えた原料棒設置装置を構成してもよい。図13(B)のように3つの原料棒(202−1b〜202−3b)に適用させてもよいし、図13(C)(D)のように原料棒(202−1c〜202‐4c、202−1d〜202−3d)の底面形状を円形に変えて3または4本のサスペンション機能付きシャフトを備えた原料棒設置装置を構成してもよい。つまり、2本以上のN本の原料を直線もしくはN角形となるような配置において個々に回転させられるように構成すればよい。 Also in the method shown in FIG. 12, it is possible to use a plurality of raw material rods. FIG. 13 is a diagram showing a configuration example of a plurality of raw material rods, and shows variations thereof. As shown in FIG. 13 (A), four raw material rods 202-1a to 202-4a having a square bottom surface are attached to the shafts with suspension functions, respectively, and the raw material rods equipped with four shafts with suspension functions each rotate. The device may be configured. It may be applied to three raw material rods (202-1b to 202-3b) as shown in FIG. 13 (B), or may be applied to raw material rods (202-1c to 202-4c) as shown in FIGS. 13 (C) and 13 (D). , 202-1d to 202-3d) may be changed to a circular shape to form a raw material rod installation device provided with three or four shafts with a suspension function. That is, two or more N raw materials may be configured to be individually rotated in an arrangement such that they form a straight line or an N-sided polygon.
複数の原料棒を一体化し回転させる場合、直接、輻射加熱される面とされない面は常に同じである。そのため、図2あるいは図7に示したように回転中心近傍の原料側の界面が溶融帯側に凸状に張り出した形になっていた。一方、図12や図13のように複数の原料棒を個々に回転させる場合には、時間平均すると個々の原料両面は均一に加熱されることになる。その結果、界面形状は平坦化され、このことから溶融帯の高さを小さくしたコンパクトな溶融帯の形成が可能となる。 When a plurality of raw material rods are integrated and rotated, the surface that is directly radiated and the surface that is not directly radiated are always the same. Therefore, as shown in FIG. 2 or 7, the interface on the raw material side near the center of rotation has a shape protruding toward the melting zone side. On the other hand, when a plurality of raw material rods are individually rotated as shown in FIGS. 12 and 13, both sides of the individual raw materials are uniformly heated on an average time. As a result, the interface shape is flattened, which makes it possible to form a compact melting zone with a reduced height of the melting zone.
図12に示したように複数のシャフトに個々の原料を固定した条件では、原料と加熱光源であるランプと回転楕円鏡との配置が固定される。この結果新たに”配置”が検討条件として生じる。その極端な例が原料(原料棒)と光源が正対する場合(図14)と原料(原料棒)の隙間と光源が正対する場合(図15)である。ここで、図14、図15はともに3つの原料棒(34−1〜34−3)をそれぞれたとえば図12のようにサスペンション機能付きシャフトを使って回転させる場合を想定している。つまり加熱光源であるランプ(赤外線ランプ:32−1〜32−3)と回転楕円鏡(31−1〜31−3)からなる3つの光源(33−1〜33−3)により、3つの原料棒(34−1〜34−3)を加熱する場合を示している。なお、図14、図15はそれぞれの原料棒の回転軸に沿った方向からみたものである。 Under the condition that the individual raw materials are fixed to the plurality of shafts as shown in FIG. 12, the arrangement of the raw materials, the lamp as the heating light source, and the spheroid mirror is fixed. As a result, a new "arrangement" arises as a condition for consideration. An extreme example is the case where the raw material (raw material rod) and the light source face each other (FIG. 14) and the case where the gap between the raw material (raw material rod) and the light source face each other (FIG. 15). Here, both FIGS. 14 and 15 assume a case where three raw material rods (34-1 to 3-4-3) are rotated by using a shaft with a suspension function as shown in FIG. 12, for example. That is, three raw materials are provided by three light sources (33-13-3-3) consisting of a lamp (infrared lamp: 32-1 to 2-32-3) and a spheroid mirror (31 to 1-31-3) which are heating light sources. The case where the rod (34-1-4-3) is heated is shown. It should be noted that FIGS. 14 and 15 are views from the directions along the rotation axis of each raw material rod.
今ここで、図14、図15の光源33−1〜33−3が原料棒34−1〜34−3に回転軸に対し垂直方向(真横、水平方向)から照射される場合を考える。この場合の図14の点線Pのラインについて、光源33−1に正対する原料棒34−1の図を図16に、図15の点線Qのラインについて、光源33−2に正対する原料棒34−1の図を図17にそれぞれ模式的に示す。図17は原料棒34−2と34−3の間隙(隙間)が光源に正対するケースである。また図16、図17はそれぞれの原料棒の回転軸に対し垂直方向であってラインP、Qと平行方向にみたものである。さらに図14、図15の光源33−1〜33−3が原料棒34−1〜34−3に回転軸に対し傾斜を持って照射される場合を考える。この場合の図16に対応する図が図18、図17に対応する図が図19である。なお、図16〜図19において、303は原料棒34−1の凸部、305は単結晶の凸部、306は単結晶、307は溶融帯を示す。 Now, consider a case where the light sources 33-1 to 33-3 of FIGS. 14 and 15 irradiate the raw material rods 34-1 to 3-4-3 from the direction perpendicular to the rotation axis (right beside, horizontal direction). In this case, with respect to the dotted line P in FIG. 14, the raw material rod 34-1 facing the light source 33-1 is shown in FIG. 16, and with respect to the dotted line Q in FIG. 15, the raw material rod 34 facing the light source 33-2. The figure of -1 is schematically shown in FIG. FIG. 17 shows a case where the gap (gap) between the raw material rods 34-2 and 34-3 faces the light source. 16 and 17 are views perpendicular to the rotation axis of each raw material rod and parallel to the lines P and Q. Further, consider a case where the light sources 33-1 to 3-3 of FIGS. 14 and 15 irradiate the raw material rods 34-1 to 3-4-3 with an inclination with respect to the rotation axis. In this case, the figure corresponding to FIG. 16 is FIG. 18, and the figure corresponding to FIG. 17 is FIG. In FIGS. 16 to 19, 303 is a convex portion of the raw material rod 34-1, 305 is a convex portion of a single crystal, 306 is a single crystal, and 307 is a molten zone.
光源33−1と原料棒34−1が正対しかつ真横から光源が原料棒に対する図16の配置や、光源33−1と原料棒34−1が正対しかつ傾斜を持って光源が原料棒に対する図18の配置は、従来の単一の原料を用いた状況に類似している。単一の原料を用いた場合、図16に類似した水平配置の方が図18に類似した傾斜配置に比べて集光効率が高く、より小さなランプ出力で溶融帯を形成できることが知られている。これは、地面の暖まり方に対する太陽光の入射角度の効果と同様である。複数の原料を個々に回転する場合も同様で図16の水平配置に近い方が図18のより傾斜した配置に比べて集光効率が高く、より低出力のランプ出力で溶融帯を形成できる。一方、原料(原料棒)の隙間と光源が正対する図17や図19の配置では、溶融帯表面が図示したように傾いている。そのため、傾斜角度によっては図19の傾斜配置の方が図17の水平配置に近い場合に比べて集光効率が高くなることがある。 The light source 33-1 and the raw material rod 34-1 are facing each other and the light source is arranged with respect to the raw material rod from the side, and the light source 33-1 and the raw material rod 34-1 are facing each other and have an inclination. The arrangement in FIG. 18 is similar to the conventional single raw material situation. It is known that when a single raw material is used, the horizontal arrangement similar to FIG. 16 has higher light collection efficiency than the inclined arrangement similar to FIG. 18, and a melting zone can be formed with a smaller lamp output. .. This is similar to the effect of the angle of incidence of sunlight on how the ground warms. Similarly, when a plurality of raw materials are individually rotated, the one closer to the horizontal arrangement in FIG. 16 has higher light collection efficiency than the more inclined arrangement in FIG. 18, and a melting zone can be formed with a lower output lamp output. On the other hand, in the arrangement of FIGS. 17 and 19 in which the gap between the raw materials (raw material rods) and the light source face each other, the surface of the molten zone is inclined as shown in the drawing. Therefore, depending on the tilt angle, the tilted arrangement of FIG. 19 may have higher light collection efficiency than the case of being closer to the horizontal layout of FIG.
これを踏まえると、複数ある原料自体もしくは原料の隙間に正対するか否かに応じて加熱光源を大きく傾けたり、水平近くに配置にしたりすると効果的であることがわかる。このように加熱光源と原料の位置関係に応じて加熱光源の傾斜を変化させることは別の効果をもたらす。図20に加熱光源の配置の一例を示す図を示す。図20に示したように育成結晶を取り囲むように配置される加熱光源の傾きの大小が丁度交互となるように加熱光源を配置する。図20では原料棒44−1〜44−3を取り囲むように加熱光源43−1〜43−6が配備される。ここでは水平方向に配置された加熱光源43−2,43−4,43−6と傾斜して配置された加熱光源43−1,43−3,43−5とを備える。そうすると図20の投影図(45,46)に示したように、各光源の回転楕円鏡の空間配置が互いの干渉を避けやすくなるような配置となる。そのため、回転楕円鏡の一部を削り落とす必要が小さくなる。その結果、回転楕円鏡を削り落とすことにより生じる集光効率の低下を抑制できる。図20においては、育成結晶を取り囲むように配置される加熱光源は、育成結晶(単結晶)の回転軸に対し、2つの互いに異なる傾きを持たせた加熱光源を配置しているが、これらをさらに増やしてもよい。少なくとも2つの互いに異なる傾きを持たせた加熱光源を配置するとよい。つまり加熱光源を少なくとも2個備え、原料棒の回転軸に対する加熱光源の一方の照射角度と、加熱光源の他方の照射角度とが互いに異なるように構成されていてもよい。 Based on this, it can be seen that it is effective to tilt the heating light source greatly or to arrange it near the horizontal depending on whether or not the plurality of raw materials themselves or the gaps between the raw materials are faced. Changing the inclination of the heating light source according to the positional relationship between the heating light source and the raw material in this way brings about another effect. FIG. 20 shows a diagram showing an example of the arrangement of the heating light source. As shown in FIG. 20, the heating light sources are arranged so that the inclinations of the heating light sources arranged so as to surround the grown crystal are exactly alternating. In FIG. 20, heating light sources 43-1 to 43-6 are arranged so as to surround the raw material rods 44-1 to 44-3. Here, heating light sources 43-2, 43-4, 43-6 arranged in the horizontal direction and heating light sources 43-1, 43-3, 43-5 arranged in an inclined direction are provided. Then, as shown in the projection drawings (45, 46) of FIG. 20, the spatial arrangement of the spheroid mirrors of each light source is arranged so as to easily avoid mutual interference. Therefore, it is less necessary to scrape off a part of the spheroidal mirror. As a result, it is possible to suppress a decrease in focusing efficiency caused by scraping off the spheroidal mirror. In FIG. 20, as the heating light source arranged so as to surround the growing crystal, two heating light sources having different inclinations with respect to the rotation axis of the growing crystal (single crystal) are arranged. You may increase it further. It is advisable to arrange at least two heating light sources having different inclinations from each other. That is, at least two heating light sources may be provided, and the irradiation angle of one of the heating light sources with respect to the rotation axis of the raw material rod and the irradiation angle of the other of the heating light sources may be different from each other.
上述した図12から図15に示す例では、それぞれの原料棒(図12あっては202−1,202−2、図13にあっては202−1a〜202−4a、202−1b〜202−3b、202−1c〜202−4c、202−1d〜202−3d、図14、図15にあっては34−1〜34−3)が個々に回転するが、全体としては固定されている例を示した。つまりこれらの例では、成長させる単結晶の回転軸と原料棒の回転軸とは同一線上にはない。赤外線ランプの光をさらに平均化して原料棒に当てるためには、個々に回転する複数のシャフト全体をひとまとめに単結晶とは逆の方向に回転させるように原料棒設置装置を構成すればよい。たとえば、図14の例であれば、原料棒34−1〜34−3の各々が各原料棒の中心を軸として回転するとともに原料棒34−1〜34−3全体が軸X0を中心に回転するように原料棒設置装置を構成すればよい。 In the examples shown in FIGS. 12 to 15 described above, the respective raw material rods (202-1, 202-2 in FIG. 12, 202-1a to 202-4a, 202-1b to 202- in FIG. 13). An example in which 3b, 202-1c to 202-4c, 202-1d to 202-3d, 34-1 to 3-4-3 in FIGS. 14 and 15) rotate individually, but are fixed as a whole. showed that. That is, in these examples, the rotation axis of the single crystal to be grown and the rotation axis of the raw material rod are not on the same line. In order to further average the light of the infrared lamp and hit the raw material rod, the raw material rod installation device may be configured so that the entire plurality of individually rotating shafts are collectively rotated in the direction opposite to that of the single crystal. For example, in the example of FIG. 14, each of the raw material rods 34-1 to 3-4-3 rotates about the center of each raw material rod, and the entire raw material rods 34-1 to 3-4-3 rotate about the axis X0. The raw material rod installation device may be configured so as to do so.
また、上述のように複数の原料棒が、全体としても回転するように構成した原料棒設置装置に代えて図14、図15に示す光源33−1〜33−3が原料棒の周りを単結晶の回転軸を中心に回転するように構成してもよい。この場合、図14、図15に示す光源33−1〜33−3は、単結晶の回転軸に対し、同一の傾きで照射してもよいが、図20に示すように少なくとも2つ以上の互いに異なる傾きで照射するようにしてもよい。 Further, instead of the raw material rod setting device in which the plurality of raw material rods are configured to rotate as a whole as described above, the light sources 33-1 to 33-3 shown in FIGS. 14 and 15 simply surround the raw material rods. It may be configured to rotate about the rotation axis of the crystal. In this case, the light sources 33-1 to 33-3 shown in FIGS. 14 and 15 may irradiate the rotation axis of the single crystal with the same inclination, but at least two or more as shown in FIG. Irradiation may be performed at different inclinations.
上述した例の説明において、たとえば図9のシャフト11、21、22は原料棒の回転のために設置されているものであり、上側シャフト(上シャフト)である。上述した例の説明において、特に図示していないが、単結晶(図10(F)の106など)はその回転のために上シャフトとは別に下側シャフト(下シャフト)に固定される。なお、下シャフトは上シャフトとは逆方向に回転する。 In the description of the above-mentioned example, for example, the shafts 11, 21, and 22 of FIG. 9 are installed for the rotation of the raw material rod, and are the upper shafts (upper shafts). In the description of the above-mentioned example, although not particularly shown, a single crystal (such as 106 in FIG. 10F) is fixed to a lower shaft (lower shaft) separately from the upper shaft for its rotation. The lower shaft rotates in the opposite direction to the upper shaft.
本発明にあっては、単結晶(たとえば図10の106)を育成する浮遊帯域溶融法において、鉛直方向に吊り下げられた複数の原料棒(102−1,102−2)を、該原料棒間に間隙(104による間隙)をもって配置し、間隙を維持したまま溶融帯を生成する。 In the present invention, in the floating zone melting method for growing a single crystal (for example, 106 in FIG. 10), a plurality of raw material rods (102-1 and 102-2) suspended in the vertical direction are used as the raw material rods. A gap (a gap according to 104) is arranged between them, and a melting zone is generated while maintaining the gap.
また、本発明の浮遊帯域溶融法においては、単結晶(たとえば図10の106)を育成する浮遊帯域溶融装置において鉛直方向に吊り下げられた複数の原料棒(102−1,102−2)を、原料棒間に間隙(104による間隙)をもって配置可能な保持機構(12,13、14)を備え、この間隙を維持したまま溶融帯を生成する浮遊帯域溶融装置がつかわれる。 Further, in the floating zone melting method of the present invention, a plurality of raw material rods (102-1 and 102-2) suspended in the vertical direction in the floating zone melting device for growing a single crystal (for example, 106 in FIG. 10) are used. A floating zone melting device is used which is provided with a holding mechanism (12, 13, 14) which can be arranged with a gap (gap by 104) between the raw material rods and generates a melting zone while maintaining this gap.
また、図9(A)の12〜14の保持機構に代えて、図9(B)に示すように上下に移動可能なサスペンション機能を付したシャフトに複数の原料棒を固定し、これらの原料棒間に所定の間隙をもって配置可能な保持機構としてもよい。 Further, instead of the holding mechanisms of 12 to 14 in FIG. 9A, a plurality of raw material rods are fixed to a shaft having a suspension function that can move up and down as shown in FIG. 9B, and these raw materials are used. It may be a holding mechanism that can be arranged with a predetermined gap between the rods.
さらに図12に示すように、この上下に移動可能なサスペンション機能を付したシャフトを複数備え、シャフト各々に原料棒が設置され、原料棒の各々が所定の間隙をもつようにシャフトを保持する原料棒設置装置としてもよい。 Further, as shown in FIG. 12, a plurality of shafts having a suspension function that can be moved up and down are provided, a raw material rod is installed on each shaft, and a raw material that holds the shaft so that each of the raw material rods has a predetermined gap. It may be used as a rod installation device.
さらにまたシャフトの各々が個々に回転する回転機能を備えるようにしてもよい。
これら開示される浮遊帯域溶融装置は加熱光源を少なくとも2個備え、原料棒の回転軸に対する加熱光源の一方の照射角度と、加熱光源の他方の照射角度とが互いに異なるように構成されていてもよい。
Furthermore, each of the shafts may be provided with a rotation function of rotating individually.
These disclosed floating zone melting devices are provided with at least two heating light sources, and even if one irradiation angle of the heating light source with respect to the rotation axis of the raw material rod and the other irradiation angle of the heating light source are configured to be different from each other. Good.
Claims (7)
鉛直方向に吊り下げられた複数の原料棒を、前記原料棒間に2mmよりも大きな間隙をもって配置し、
前記間隙を維持したまま前記間隙を通して赤外線による加熱光を直接浸透させて溶融帯を生成する浮遊帯域溶融法。 In the infrared intensive heating floating zone melting method for growing a single crystal, a plurality of raw material rods suspended in the vertical direction are arranged with a gap larger than 2 mm between the raw material rods.
A floating zone melting method in which heating light by infrared rays is directly permeated through the gap while maintaining the gap to generate a melting zone.
鉛直方向に吊り下げられた複数の原料棒を、前記原料棒間に2mmよりも大きな間隙をもって配置可能な保持機構を備え、
前記間隙を維持したまま前記間隙を通して赤外線による加熱光を直接浸透させて溶融帯を生成する浮遊帯域溶融装置。 In the infrared concentrated heating floating zone melting device for growing a single crystal, a holding mechanism capable of arranging a plurality of raw material rods suspended in the vertical direction with a gap larger than 2 mm between the raw material rods is provided.
A floating zone melting device that creates a melting zone by directly infiltrating heating light by infrared rays through the gap while maintaining the gap .
前記シャフト各々に原料棒が設置され、
前記原料棒の各々が前記間隙をもつように前記シャフトを保持する原料棒設置装置を備える請求項2に記載の浮遊帯域溶融装置。 Equipped with multiple shafts with a suspension function that can move up and down,
Raw material rods are installed on each of the shafts.
The floating zone melting device according to claim 2, further comprising a raw material rod installation device that holds the shaft so that each of the raw material rods has the gap.
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