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JP6819415B2 - Reaction tank and stirring reactor - Google Patents
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JP6819415B2 - Reaction tank and stirring reactor - Google Patents

Reaction tank and stirring reactor Download PDF

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JP6819415B2
JP6819415B2 JP2017070376A JP2017070376A JP6819415B2 JP 6819415 B2 JP6819415 B2 JP 6819415B2 JP 2017070376 A JP2017070376 A JP 2017070376A JP 2017070376 A JP2017070376 A JP 2017070376A JP 6819415 B2 JP6819415 B2 JP 6819415B2
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baffle plate
tank body
stirring
reaction
liquid
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JP2018171562A (en
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大志 内藤
大志 内藤
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Sumitomo Metal Mining Co Ltd
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    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
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Description

本発明は、反応槽および攪拌反応装置に関する。 The present invention relates to a reaction vessel and a stirring reaction device.

ニッケルやコバルトなどを製錬する方法として、塩素浸出電解採取法がある(特許文献1参照)。この方法によってニッケルを製錬する場合、以下の手順で行われる。 As a method for smelting nickel, cobalt, etc., there is a chlorine leaching electrowinning method (see Patent Document 1). When nickel is smelted by this method, the procedure is as follows.

まず、ニッケル硫化物を主成分とするニッケルマットを粉砕した後、これを塩化物溶液に分散させてその中に塩素ガスを吹き込む。すると、ニッケルを含む有価金属が塩化物溶液中に浸出され、ニッケルを含むニッケル浸出液が生成される(塩素浸出)。このニッケル浸出液からコバルト、鉄などの不純物元素を除去すると、塩化ニッケル溶液が生成される。そして、塩化ニッケル溶液を電解採取することによって、電気ニッケルが生産される。 First, a nickel mat containing nickel sulfide as a main component is crushed, and then this is dispersed in a chloride solution and chlorine gas is blown into the solution. Then, the valuable metal containing nickel is leached into the chloride solution, and a nickel leaching solution containing nickel is generated (chlorine leaching). When impurity elements such as cobalt and iron are removed from this nickel leachate, a nickel chloride solution is produced. Then, nickel electrolysis is produced by electrowinning the nickel chloride solution.

かかる塩素浸出電解採取法において、塩素浸出の際に、有価金属の高い浸出率を得る方法として、特許文献2に記載された技術がある。特許文献2の技術では、塩素浸出槽(反応槽)内の酸化還元電位を所定の時間周期毎に測定し、設定値と測定値との差により塩素流量調節弁の開度を調整している。すると、反応槽内の酸化還元電位の時間変動の幅を小さくすることができるので、金属元素の高い浸出率を達成することができる旨が記載されている。 In such a chlorine leaching electrowinning method, there is a technique described in Patent Document 2 as a method for obtaining a high leaching rate of a valuable metal at the time of chlorine leaching. In the technique of Patent Document 2, the redox potential in the chlorine leaching tank (reaction tank) is measured at predetermined time cycles, and the opening degree of the chlorine flow rate control valve is adjusted by the difference between the set value and the measured value. .. Then, it is described that the width of the time fluctuation of the redox potential in the reaction vessel can be reduced, so that a high leaching rate of the metal element can be achieved.

特開2005−248245号公報Japanese Unexamined Patent Publication No. 2005-248245 特開2009−91646号公報Japanese Unexamined Patent Publication No. 2009-91646 特開平9−29084号公報Japanese Unexamined Patent Publication No. 9-29084

上述したように、特許文献2の技術では酸化還元電位の時間変動を所定の範囲に維持しているが、金属元素の高い浸出率を安定して維持する上では、酸化還元電位の時間変動だけでなく反応槽内における酸化還元電位の空間的な偏りも少なくすることが必要となる。 As described above, in the technique of Patent Document 2, the time fluctuation of the redox potential is maintained within a predetermined range, but in order to stably maintain the high leaching rate of the metal element, only the time fluctuation of the redox potential is maintained. However, it is necessary to reduce the spatial bias of the redox potential in the reaction vessel.

反応槽内における酸化還元電位の空間的な偏りを小さくする方法として、反応槽内の液体等を攪拌する方法があり、攪拌を促進する一般的な方法として、バッフルプレートを使用する技術がある。 As a method of reducing the spatial bias of the redox potential in the reaction vessel, there is a method of stirring a liquid or the like in the reaction vessel, and as a general method of promoting stirring, there is a technique of using a baffle plate.

しかし、一般的なバッフルプレートを使用した場合、バッフルプレートと反応槽壁面との連結部分では液体の流速が遅くなりよどみが発生する。上述した塩素浸出工程では、液体中に未溶解物やいわゆる「だま」等の固形物が含まれている場合があり、かかる固形物がよどみの部分で堆積してしまう可能性がある。堆積物の量が少なければ設備の稼働を継続できるが、堆積物が多量に発生すると、堆積物等の除去のために設備を停止しなければならなくなる。すると、ニッケルなどの生産性が低下してしまうという問題が生じる。 However, when a general baffle plate is used, the flow velocity of the liquid becomes slow at the connecting portion between the baffle plate and the wall surface of the reaction tank, and stagnation occurs. In the chlorine leaching step described above, the liquid may contain undissolved substances or solid substances such as so-called “dama”, and such solid substances may be deposited at the stagnation portion. If the amount of sediment is small, the equipment can continue to operate, but if a large amount of sediment is generated, the equipment must be shut down to remove the sediment. Then, there arises a problem that the productivity of nickel and the like is lowered.

一方、特許文献3のようなバッフルプレートを設ければよどみの発生を抑制することができる可能性がある。特許文献3では、バッフルプレートを上下一対のアームを介して反応槽の内壁に固定し、バッフルプレートと反応槽の内壁との間に間隙を形成している。すると、バッフルプレートと反応槽壁面との間に液体を流すことができるので、反応槽壁面近傍でよどみが発生することを防止できる可能性がある。 On the other hand, if a baffle plate as in Patent Document 3 is provided, there is a possibility that the occurrence of stagnation can be suppressed. In Patent Document 3, the baffle plate is fixed to the inner wall of the reaction vessel via a pair of upper and lower arms, and a gap is formed between the baffle plate and the inner wall of the reaction vessel. Then, since the liquid can flow between the baffle plate and the wall surface of the reaction tank, there is a possibility that stagnation may be prevented from occurring in the vicinity of the wall surface of the reaction tank.

しかし、特許文献3のバッフルプレートでも、バッフルプレートと反応槽壁面との間に上下一対のアームがあるので、アームに固形物が付着すると、その付着物をきっかけとして固形物の堆積が進行する可能性がある。固形物の堆積が進行すると、バッフルプレートと反応槽壁面との間の隙間を埋めてしまう可能性がある。したがって、特許文献3の技術でも、堆積物が発生すれば堆積物等を除去しなければならず、堆積物等を除去するために設備を停止しなければならない。 However, even in the baffle plate of Patent Document 3, since there are a pair of upper and lower arms between the baffle plate and the wall surface of the reaction tank, if solid matter adheres to the arms, the solid matter can be deposited as a trigger. There is sex. As solid matter builds up, it can fill the gap between the baffle plate and the reaction vessel wall. Therefore, even in the technique of Patent Document 3, if deposits are generated, the deposits and the like must be removed, and the equipment must be stopped in order to remove the deposits and the like.

本発明は上記事情に鑑み、液体の攪拌を促進しつつ運転を止めなければならない程度の堆積物が発生することを抑制できる反応槽および攪拌反応装置を提供することを目的とする。 In view of the above circumstances, it is an object of the present invention to provide a reaction vessel and a stirring reaction apparatus capable of suppressing the generation of deposits to the extent that the operation must be stopped while promoting the stirring of the liquid.

(反応槽)
第1発明の反応槽は、回転軸と該回転軸に設けられた攪拌翼とを有する攪拌装置によって液体を攪拌するために使用される反応槽であって、前記攪拌装置の回転軸が中心軸とほぼ同軸となるように配置される、該攪拌装置によって攪拌される液体を収容する槽本体と、該槽本体の内壁近傍に該槽本体の内壁との間に隙間を空けて配設された邪魔板と、を備えており、前記邪魔板は、その表面が前記槽本体の半径方向と直交するように配設されており、その表面が該邪魔板の表面と非平行となるように接続された、該邪魔板の幅よりも幅が狭いフランジ部を備えていることを特徴とする。
第2発明の反応槽は、第1発明において、前記邪魔板は、その下端と前記槽本体の底面との間に隙間が形成されるように吊り下げられた状態で配設されていることを特徴とする。
(攪拌反応装置)
第3発明の攪拌反応装置は、第1または第2発明に記載の反応槽と、回転軸と該回転軸に設けられた攪拌翼とを有し、該反応槽内の液体を攪拌する攪拌装置と、を備えていることを特徴とする。
第4発明の攪拌反応装置は、第3発明において、前記反応槽内の液体に気体を吹き込む配管を備えており、該配管が前記邪魔板の表面に設置されていることを特徴とする。
(Reaction tank)
The reaction tank of the first invention is a reaction tank used for stirring liquid by a stirring device having a rotating shaft and a stirring blade provided on the rotating shaft, and the rotating shaft of the stirring device is the central axis. It is arranged with a gap between the tank body for accommodating the liquid to be agitated by the stirrer and the inner wall of the tank body near the inner wall of the tank body , which is arranged so as to be substantially parallel to the tank body. The baffle plate is provided, and the baffle plate is arranged so that its surface is orthogonal to the radial direction of the tank body, and the surface is connected so as to be non-parallel to the surface of the baffle plate. It is characterized by having a flange portion having a width narrower than the width of the baffle plate .
The reaction vessel of the second invention, in the first invention, the front Symbol baffles that are disposed in the suspended state such that a gap is formed between the bottom surface of the tank body and a lower end It is characterized by.
(Stirring reactor)
The stirring reaction apparatus of the third invention has a reaction vessel according to the first or second invention , a rotating shaft, and a stirring blade provided on the rotating shaft, and agitates the liquid in the reaction vessel. It is characterized by having.
The stirring reaction apparatus of the fourth invention is characterized in that, in the third invention , a pipe for blowing a gas into the liquid in the reaction tank is provided, and the pipe is installed on the surface of the baffle plate.

(反応槽)
第1発明によれば、槽本体内の液体を攪拌装置によって攪拌した場合、液体を攪拌する効果を高くすることができる。しかも、邪魔板は、槽本体内を旋回する液体の流れと対向する面が小さいので、よどみの発生を抑制することができ、よどみに起因する固形物の堆積等を抑制することができる。また、旋回流をせき止める効果を高くできるので、旋回しながら上昇する液体の流れを形成しやすくなる。すると、液面に向かって真っ直ぐに液体が上昇する場合に比べて、液体が液面に到達するまでの時間を長くできる
第2発明によれば、邪魔板は吊り下げられており、液体中には邪魔板と槽本体とを連結する部材が存在しない。したがって、邪魔板を設けたことに起因して、よどみや固形物の堆積等が生じることを防ぐことができる。
(攪拌反応装置)
第3発明によれば、攪拌装置によって液体を攪拌した際に、反応槽の槽本体内の液体を攪拌する効果を高くすることができる。しかも、邪魔板は、反応槽の槽本体内を旋回する液体の流れと対向する面が小さいので、よどみの発生を抑制することができ、よどみに起因する固形物の堆積等を抑制することができる。
第4発明によれば、配管の出口を邪魔板近傍の比較的流速の速い領域に配置できるので、吹き込まれた気体と液体の混合を促進することができる。
(Reaction tank)
According to the first invention, when the liquid in the tank body is stirred by the stirring device, the effect of stirring the liquid can be enhanced. Moreover, since the baffle plate has a small surface facing the flow of the liquid swirling in the tank body, it is possible to suppress the occurrence of stagnation and the accumulation of solid matter due to the stagnation . Since it increases the effect of damming the handed circumfluence, it tends to form a flow of liquid which rises while swirling. Then, the time until the liquid reaches the liquid surface can be lengthened as compared with the case where the liquid rises straight toward the liquid surface .
According to the second invention , the baffle plate is suspended, and there is no member in the liquid that connects the baffle plate and the tank body. Therefore, it is possible to prevent stagnation, accumulation of solid matter, and the like due to the provision of the baffle plate.
(Stirring reactor)
According to the third invention , when the liquid is stirred by the stirring device, the effect of stirring the liquid in the tank body of the reaction tank can be enhanced. Moreover, since the baffle plate has a small surface facing the flow of the liquid swirling in the tank body of the reaction tank, it is possible to suppress the occurrence of stagnation and suppress the accumulation of solid matter due to stagnation. it can.
According to the fourth invention , since the outlet of the pipe can be arranged in the region where the flow velocity is relatively high near the baffle plate, the mixing of the blown gas and the liquid can be promoted.

本実施形態の攪拌反応装置1の概略説明図である。It is the schematic explanatory drawing of the stirring reaction apparatus 1 of this embodiment. 図1のII−II線断面矢視図である。FIG. 1 is a cross-sectional view taken along the line II-II of FIG. 比較例の攪拌反応装置の概略説明図である。It is the schematic explanatory drawing of the stirring reaction apparatus of the comparative example.

本発明の攪拌反応装置は、反応槽内の液体を攪拌する機能を有する装置であって、反応槽内によどみや固形物の堆積が生じにくい構造としたことに特徴を有している。 The stirring reaction apparatus of the present invention is an apparatus having a function of stirring a liquid in a reaction vessel, and is characterized in that it has a structure in which stagnation and accumulation of solid matter are unlikely to occur in the reaction vessel.

本発明の攪拌反応装置が使用される用途はとくに限定されない。例えば、塩素浸出電解採取法によってニッケルを製造する設備においてニッケルマットを溶解して塩素浸出する装置や、水等の液体にニッケル(Ni)やコバルト(Co)を含む混合硫化物原料を溶解する装置、マット塩素浸出電解採取(Matte Chlorine Leaching Electrowinning(MCLE))プロセスの電解廃液から炭酸ニッケルを製造する装置等に、本発明の攪拌反応装置を使用することができる。 The application in which the stirring reactor of the present invention is used is not particularly limited. For example, a device that dissolves a nickel mat and leaches chlorine in a facility that manufactures nickel by the chlorine leaching electrolytic sampling method, or a device that dissolves a mixed sulfide raw material containing nickel (Ni) and cobalt (Co) in a liquid such as water. , The stirring reaction apparatus of the present invention can be used for an apparatus for producing nickel carbonate from the electrolytic waste liquid of the Matte Chlorine Leaching Electrowinning (MCLE) process.

以下の説明では、塩素浸出電解採取法を実施する設備において塩素浸出する装置として本発明の攪拌反応装置を使用する場合を代表として説明する。つまり、ニッケル硫化物を主成分とするニッケルマットを粉砕した粉砕物を塩化物水溶液に分散させて、粉砕物が分散した塩化物水溶液に塩素ガスを吹き込んでニッケルやコバルト、銅等の有価金属を塩素浸出する装置として本発明の攪拌反応装置を使用する場合を代表として説明する。 In the following description, the case where the stirring reaction device of the present invention is used as the device for leaching chlorine in the equipment for carrying out the chlorine leaching electrowinning method will be described as a representative. That is, a crushed product obtained by crushing a nickel mat containing nickel sulfide as a main component is dispersed in a chloride aqueous solution, and chlorine gas is blown into the chloride aqueous solution in which the crushed product is dispersed to remove valuable metals such as nickel, cobalt and copper. The case where the stirring reaction device of the present invention is used as the device for leaching chlorine will be described as a representative.

(本実施形態の攪拌溶解装置1)
図1および図2において、符号2は、本実施形態の攪拌溶解装置1における反応槽の槽本体を示している。この槽本体2は、上部に開口を有する中空な有底筒状の部材である。この槽本体2は、内部に塩化物水溶液Sを収容する断面円形の液体収容空間2hを有している。
(Stirring / dissolving device 1 of this embodiment)
In FIGS. 1 and 2, reference numeral 2 indicates a tank body of the reaction tank in the stirring / dissolving apparatus 1 of the present embodiment. The tank body 2 is a hollow bottomed tubular member having an opening at the top. The tank body 2 has a liquid storage space 2h having a circular cross section for storing the aqueous chloride solution S inside.

この槽本体2は、上部に天板2aが設けられており、この天板2aによって上部の開口が塞がれている。この天板2aには、有価金属を含有するニッケルマットや鉱石等を液体収容空間2h内の塩化物水溶液Sに供給する供給部2dが設けられている。また、槽本体2には、図示しないが、有価金属が塩素浸出された塩化物水溶液S(つまり塩素浸出液)を次工程に排出する排出部も設けられている。 The tank body 2 is provided with a top plate 2a at the top, and the opening at the top is closed by the top plate 2a. The top plate 2a is provided with a supply unit 2d for supplying a nickel mat or ore containing a valuable metal to the chloride aqueous solution S in the liquid storage space 2h. Further, although not shown, the tank body 2 is also provided with a discharge unit for discharging the chloride aqueous solution S (that is, the chlorine leaching solution) in which the valuable metal is leached into the next step.

(攪拌装置10)
図1および図2に示すように、槽本体2のほぼ中央部には、塩化物水溶液Sを攪拌する攪拌装置10が設けられている。この攪拌装置10は、槽本体2の中心軸とほぼ同軸となるように配置された回転軸11と、回転軸11に設けられた攪拌翼12と、を備えている。また、回転軸11の一端(図2では上端)は天板2aから外方に突出しており、モータ等の駆動源14に連結されている。
(Agitator 10)
As shown in FIGS. 1 and 2, a stirring device 10 for stirring the chloride aqueous solution S is provided in a substantially central portion of the tank body 2. The stirring device 10 includes a rotating shaft 11 arranged so as to be substantially coaxial with the central axis of the tank body 2, and a stirring blade 12 provided on the rotating shaft 11. Further, one end (upper end in FIG. 2) of the rotating shaft 11 projects outward from the top plate 2a and is connected to a drive source 14 such as a motor.

したがって、駆動源14を駆動すれば、回転軸11とともに攪拌翼12が回転し、攪拌翼12の回転によって槽本体2内の塩化物水溶液Sを攪拌することができる。 Therefore, if the drive source 14 is driven, the stirring blade 12 rotates together with the rotating shaft 11, and the chloride aqueous solution S in the tank body 2 can be stirred by the rotation of the stirring blade 12.

なお、回転軸11に設ける攪拌翼12の数はとくに限定されない。一段でもよいし、2段以上設けてもよい。攪拌翼12を複数段設ければ、攪拌力を強くできるし、槽本体2内に形成される塩化物水溶液Sの流動状態を調整することができる。例えば、攪拌翼12としてせん断性能の高いピッチドタービンを使用すれば、回転軸11の回転方向の流れを発生させやすくなる。また、攪拌翼12としてプロペラを採用すれば、回転軸11の軸方向の流れを発生させやすくなる。そして、ピッチドタービンとプロペラとを組み合わせて使用すれば、回転軸11の軸周りに旋回しながら上下方向に旋回する塩化物水溶液Sの流れを槽本体2内に発生させることができる。 The number of stirring blades 12 provided on the rotating shaft 11 is not particularly limited. It may be provided in one stage or in two or more stages. If the stirring blades 12 are provided in a plurality of stages, the stirring force can be increased and the flow state of the chloride aqueous solution S formed in the tank body 2 can be adjusted. For example, if a pitched turbine having high shear performance is used as the stirring blade 12, it becomes easy to generate a flow in the rotation direction of the rotating shaft 11. Further, if a propeller is adopted as the stirring blade 12, it becomes easy to generate an axial flow of the rotating shaft 11. Then, when the pitched turbine and the propeller are used in combination, a flow of the chloride aqueous solution S that swirls in the vertical direction while swirling around the axis of the rotating shaft 11 can be generated in the tank body 2.

また、回転軸11に複数の攪拌翼12を設けた場合、全ての攪拌翼12の直径を同じにしてもよいし、直径がそれぞれ異なっていてもよい。槽本体2内に形成する流動に合わせて適宜決定すればよい。 Further, when a plurality of stirring blades 12 are provided on the rotating shaft 11, the diameters of all the stirring blades 12 may be the same, or the diameters may be different from each other. It may be appropriately determined according to the flow formed in the tank body 2.

さらに、回転軸11に複数の攪拌翼12を設けた場合、隣接する攪拌翼12間の距離も槽本体2内に形成する流動に合わせて適宜決定すればよく、等間隔でもよいしそれぞれ異なっていてもよい。 Further, when a plurality of stirring blades 12 are provided on the rotating shaft 11, the distance between the adjacent stirring blades 12 may be appropriately determined according to the flow formed in the tank body 2, and may be at equal intervals or different. You may.

(邪魔板5)
図1および図2に示すように、反応槽の槽本体2内部には、攪拌装置10を囲むように複数枚(図2では4枚)の邪魔板5が設けられている。この複数枚の邪魔板5は、全て同じ形状に形成されている。そして、複数枚の邪魔板5は、槽本体2の中心軸に対して回転対称かつ等角度間隔となるように設けられている。
(Interfering board 5)
As shown in FIGS. 1 and 2, a plurality of (4 in FIG. 2) baffle plates 5 are provided inside the tank body 2 of the reaction tank so as to surround the stirring device 10. The plurality of baffle plates 5 are all formed in the same shape. The plurality of baffle plates 5 are provided so as to be rotationally symmetric and equiangularly spaced with respect to the central axis of the tank body 2.

図1および図2に示すように、邪魔板5は、板状の本体部6の幅方向の両端部に一対のフランジ部7,7が設けられたものである。つまり、邪魔板5は、断面が略I状(またはH状)に形成されている(図2参照)。 As shown in FIGS. 1 and 2, the baffle plate 5 is provided with a pair of flange portions 7 and 7 at both ends of a plate-shaped main body portion 6 in the width direction. That is, the baffle plate 5 has a substantially I-shaped (or H-shaped) cross section (see FIG. 2).

この邪魔板5は、その両端間の距離Hが槽本体2の直径よりも短く、一対のフランジ部7,7の幅Bよりも長くなるように形成されている。例えば、邪魔板5は、その両端間の距離Hが0.05D〜0.2D(Dは槽本体2の内径(図2参照)、以下同様)となり、一対のフランジ部7,7の幅Bが0.08D〜0.02Dとなるように形成されている。 The baffle plate 5 is formed so that the distance H between both ends thereof is shorter than the diameter of the tank body 2 and longer than the width B of the pair of flange portions 7, 7. For example, the baffle plate 5 has a distance H between both ends of 0.05D to 0.2D (D is the inner diameter of the tank body 2 (see FIG. 2), the same applies hereinafter), and the width B of the pair of flange portions 7 and 7. Is formed to be 0.08D to 0.02D.

また、邪魔板5は、その本体部6の外表面6aおよび内表面6bが槽本体2の半径方向と直交するように槽本体2内部に設けられている。本明細書において両者が直交するとは、槽本体2の半径方向(つまり、槽本体2の中心軸と直交する線、図2の線DL参照)と本体部6の外表面6aおよび内表面6bが直交する場合と、略直交する場合の両方を含んでいる。例えば、槽本体2の半径方向と本体部6の外表面6aおよび内表面6bのなす角度θ1、θ2が90°±30°程度、より好ましくは角度θ1、θ2が90°±20°程度となっている状態が、本明細書において槽本体2の半径方向と本体部6の外表面6aおよび内表面6bが直交する場合に含まれている。 Further, the baffle plate 5 is provided inside the tank body 2 so that the outer surface 6a and the inner surface 6b of the main body 6 are orthogonal to the radial direction of the tank body 2. In the present specification, the fact that the two are orthogonal means that the radial direction of the tank body 2 (that is, the line orthogonal to the central axis of the tank body 2, see the line DL of FIG. 2) and the outer surface 6a and the inner surface 6b of the main body 6 are It includes both the case of being orthogonal and the case of being substantially orthogonal. For example, the angles θ1 and θ2 formed by the radial direction of the tank body 2 and the outer surface 6a and the inner surface 6b of the main body 6 are about 90 ° ± 30 °, more preferably the angles θ1 and θ2 are about 90 ° ± 20 °. This state is included in the present specification when the radial direction of the tank body 2 and the outer surface 6a and the inner surface 6b of the main body 6 are orthogonal to each other.

しかも、邪魔板5は、その本体部6の外表面6aが槽本体2の内壁2wからある程度離間した位置になるように設けられている。つまり、邪魔板5は、槽本体2の内壁2wとの間に塩化物水溶液Sが流れることができる隙間gwが形成されるように設けられている。もちろん、一対のフランジ部7,7の端縁と槽本体2の内壁2wとの間にも塩化物水溶液Sが流れることができる隙間が形成されるように設けられている。例えば、本体部6の外表面6aから槽本体2の内壁2wまでの距離をLとすると、距離Lが0.02D〜0.3D程度となるように形成されている。 Moreover, the baffle plate 5 is provided so that the outer surface 6a of the main body 6 is separated from the inner wall 2w of the tank main body 2 to some extent. That is, the baffle plate 5 is provided so as to form a gap gw through which the aqueous chloride solution S can flow between the baffle plate 5 and the inner wall 2w of the tank body 2. Of course, a gap through which the aqueous chloride solution S can flow is also formed between the edge edges of the pair of flange portions 7 and 7 and the inner wall 2w of the tank body 2. For example, assuming that the distance from the outer surface 6a of the main body 6 to the inner wall 2w of the tank main body 2 is L, the distance L is formed to be about 0.02D to 0.3D.

そして、邪魔板5は、吊り下げられた状態で、その下端が槽本体2の底2bから離間した状態になるように設けられている。つまり、邪魔板5は、その下端と槽本体2の底2bとの間に塩化物水溶液Sが流れることができる隙間gbが形成されるように設けられている。例えば、邪魔板5の下端から槽本体2の底2bまでの距離をL2とすると、距離L2が100〜500mm程度となるように設けられている。 The baffle plate 5 is provided so that the lower end thereof is separated from the bottom 2b of the tank body 2 in a suspended state. That is, the baffle plate 5 is provided so that a gap gb through which the aqueous chloride solution S can flow is formed between the lower end thereof and the bottom 2b of the tank body 2. For example, assuming that the distance from the lower end of the baffle plate 5 to the bottom 2b of the tank body 2 is L2, the distance L2 is set to be about 100 to 500 mm.

ここでいう「吊り下げられた状態」とは、邪魔板5において塩化物水溶液Sに浸漬している部分と槽本体2の内壁2wおよび底2bとの間に、邪魔板5と槽本体2の内壁2wおよび底2bとの間を連結する部材が存在していない状態を意味している。例えば、「吊り下げられた状態」としては、槽本体2の天板2aに邪魔板5の上端が連結されている状態(図1参照)や、槽本体2において塩化物水溶液Sの液面よりも上方に位置する部分に梁などを設けてその梁などに邪魔板5の上端が連結されている状態などを挙げることができる。また、槽本体2の上方が開放されているような場合であれば、槽本体2が設けられている建屋の天井や梁などに邪魔板5の上端が連結されている状態も、「吊り下げられた状態」に含まれる。 The "suspended state" here means that the baffle plate 5 and the tank body 2 are between the portion of the baffle plate 5 immersed in the chloride aqueous solution S and the inner wall 2w and the bottom 2b of the tank body 2. It means that there is no member connecting between the inner wall 2w and the bottom 2b. For example, the "suspended state" includes a state in which the upper end of the baffle plate 5 is connected to the top plate 2a of the tank body 2 (see FIG. 1), or from the liquid level of the chloride aqueous solution S in the tank body 2. A state in which a beam or the like is provided in a portion located above and the upper end of the baffle plate 5 is connected to the beam or the like can be mentioned. In addition, if the upper part of the tank body 2 is open, the state where the upper end of the obstruction plate 5 is connected to the ceiling or beam of the building where the tank body 2 is provided is also "suspended". Included in the "state".

なお、邪魔板5の長さ(上下方向の長さ)はとくに限定されない。上記のように下端が槽本体2の底2bから離間した状態になるように邪魔板5が吊り下げられた状態において、邪魔板5の上部が塩化物水溶液Sの水面から露出する程度の長さが好適である。 The length of the baffle plate 5 (length in the vertical direction) is not particularly limited. When the baffle plate 5 is suspended so that the lower end is separated from the bottom 2b of the tank body 2 as described above, the length is such that the upper part of the baffle plate 5 is exposed from the water surface of the chloride aqueous solution S. Is preferable.

また、邪魔板5の厚さも塩化物水溶液Sを攪拌している状態において壊れない程度の強度を備えていればよく、とくに限定されず、その両端間の距離Hやフランジ部7,7の幅Bに比べて薄くなっていればよい。 Further, the thickness of the baffle plate 5 is not particularly limited as long as it has a strength that does not break when the chloride aqueous solution S is agitated, and the distance H between both ends and the widths of the flange portions 7 and 7 are not particularly limited. It suffices if it is thinner than B.

以上のように配設された複数の邪魔板5が槽本体2の収容空間2h内に設けられていれば、攪拌装置10によって槽本体2の収容空間2h内の塩化物水溶液S(塩素浸出液)を攪拌した際に、塩化物水溶液S(塩素浸出液)が複数の邪魔板5と干渉する。すると、槽本体2の収容空間2h内の塩化物水溶液S(塩素浸出液)の流れを、槽本体2の中心軸(言い換えれば攪拌装置10の回転軸11)周りの旋回流に上下方向の流動が加わった流れとすることができる。すると、槽本体2の収容空間2h内の塩化物水溶液S(塩素浸出液)を攪拌する効果を高くすることができるので、槽本体2の収容空間2h内における塩化物水溶液S(塩素浸出液)の状態を均質な状態(例えば、酸化還元電位やpH、液中の塩素の槽内濃度分布などが均一な状態)に近づけることができる。 If the plurality of baffle plates 5 arranged as described above are provided in the storage space 2h of the tank body 2, the chloride aqueous solution S (chlorine leachate) in the storage space 2h of the tank body 2 is provided by the stirring device 10. The chloride aqueous solution S (chlorine leachate) interferes with the plurality of baffle plates 5 when the mixture is stirred. Then, the flow of the chloride aqueous solution S (chlorine leachate) in the accommodation space 2h of the tank body 2 is moved in the vertical direction to the swirling flow around the central axis of the tank body 2 (in other words, the rotating shaft 11 of the stirring device 10). It can be an added flow. Then, the effect of stirring the chloride aqueous solution S (chlorine leachate) in the storage space 2h of the tank body 2 can be enhanced, so that the state of the chloride aqueous solution S (chlorine leachate) in the storage space 2h of the tank body 2 can be enhanced. Can be brought close to a homogeneous state (for example, a state in which the oxidation-reduction potential, pH, concentration distribution of chlorine in the liquid in the tank, etc. are uniform).

また、邪魔板5は、本体部6の外表面6aおよび内表面6bが槽本体2の半径方向と直交または略直交するように槽本体2内部に設けられている。このため、一対のフランジ部7,7が設けられていても、本体部6を槽本体2の半径方向と略平行に配置する場合に比べて、槽本体2内を旋回する塩化物水溶液S(塩素浸出液)の流れに対して対向する面が小さくなる。しかも、邪魔板5は槽本体2内部に吊り下げられた状態で設置されており、塩化物水溶液S(塩素浸出液)中には、邪魔板5と槽本体2の内壁2wや底2bとを連結する部材が存在しない。したがって、邪魔板5を設けたことに起因する、塩化物水溶液S(塩素浸出液)のよどみや固形物の堆積等が槽本体2内に生じることを防ぐことができる。 Further, the baffle plate 5 is provided inside the tank body 2 so that the outer surface 6a and the inner surface 6b of the main body 6 are orthogonal or substantially orthogonal to the radial direction of the tank body 2. Therefore, even if the pair of flange portions 7 and 7 are provided, the chloride aqueous solution S (which swirls in the tank body 2) is swirled in the tank body 2 as compared with the case where the main body 6 is arranged substantially parallel to the radial direction of the tank body 2. The surface facing the flow of the chlorine leachate becomes smaller. Moreover, the baffle plate 5 is installed in a suspended state inside the tank body 2, and the baffle plate 5 is connected to the inner wall 2w and the bottom 2b of the tank body 2 in the chloride aqueous solution S (chlorine leachate). There is no member to do. Therefore, it is possible to prevent the stagnation of the aqueous chloride solution S (chlorine leachate) and the accumulation of solid matter due to the provision of the baffle plate 5 in the tank body 2.

すると、ある程度長期間、槽本体2の堆積物を除去する作業を実施しなくてもよくなるので、塩素浸出作業の作業効率の低下を防止することができる。 Then, since it is not necessary to carry out the work of removing the deposits of the tank body 2 for a certain period of time, it is possible to prevent a decrease in the work efficiency of the chlorine leaching work.

(配管Pの配置)
塩素浸出の際には、塩化物水溶液S(塩素浸出液)に継続して塩素を吹き込むため、塩素を吹き込む配管Pが設けられるが(図1および図2参照)、かかる配管Pを邪魔板5に取り付けるようにしてもよい。
(Arrangement of piping P)
At the time of chlorine leaching, since chlorine is continuously blown into the chloride aqueous solution S (chlorine leaching solution), a pipe P for blowing chlorine is provided (see FIGS. 1 and 2), but the pipe P is placed on the obstruction plate 5. It may be attached.

例えば、図1および図2に示すように、邪魔板5の本体部6の内表面6bであって、攪拌装置10によって旋回流を発生させた場合の旋回流の流れ(図2の矢印F)の下流側に位置するフランジ部7の近傍に配管Pを配置する。そして、配管Pの気体排出口Paを邪魔板5の下流側フランジ部7の内表面6bにおける下端近傍に配置する。この場合、配管Pは邪魔板5にUボルト等を用いてしっかりと固定することができるので、配管Pを安定した状態に維持できる。また、配管Pが塩化物水溶液S(塩素浸出液)の流れに与える影響を小さくできる。 For example, as shown in FIGS. 1 and 2, the flow of the swirling flow when the swirling flow is generated by the stirring device 10 on the inner surface 6b of the main body 6 of the baffle plate 5 (arrow F in FIG. 2). The pipe P is arranged in the vicinity of the flange portion 7 located on the downstream side of the pipe P. Then, the gas discharge port Pa of the pipe P is arranged near the lower end of the inner surface 6b of the flange portion 7 on the downstream side of the baffle plate 5. In this case, since the pipe P can be firmly fixed to the baffle plate 5 by using a U bolt or the like, the pipe P can be maintained in a stable state. Further, the influence of the pipe P on the flow of the chloride aqueous solution S (chlorine leachate) can be reduced.

しかも、配管Pの気体排出口Paが邪魔板5の下流側フランジ部7の内表面6bにおける下端近傍に配置されていれば、吹き込まれた塩素と塩化物水溶液S(塩素浸出液)の混合を促進することができる。つまり、下流側フランジ部7の内表面6bにおける下端近傍は、塩化物水溶液S(塩素浸出液)の流速が比較的速い領域になるので、吹き込まれた塩素と塩化物水溶液S(塩素浸出液)の混合を促進することができる。すると、塩化物水溶液S(塩素浸出液)中の塩素の濃度を均一に近づけることができるので、塩化物水溶液S(塩素浸出液)の状態を均質な状態に近づけることができる。 Moreover, if the gas discharge port Pa of the pipe P is arranged near the lower end of the inner surface 6b of the flange portion 7 on the downstream side of the baffle plate 5, the mixing of the blown chlorine and the chloride aqueous solution S (chlorine leachate) is promoted. can do. That is, since the flow velocity of the chloride aqueous solution S (chlorine leachate) is relatively high near the lower end of the inner surface 6b of the downstream flange portion 7, the blown chlorine and the chloride aqueous solution S (chlorine leachate) are mixed. Can be promoted. Then, since the concentration of chlorine in the chloride aqueous solution S (chlorine leachate) can be brought close to uniform, the state of the chloride aqueous solution S (chlorine leachate) can be brought close to a homogeneous state.

(邪魔板5について)
上記例では、邪魔板5の幅方向の両端部にそれぞれフランジ部7が設けられる場合を説明したが、フランジ部7は必ずしも設けなくてもよい。しかし、邪魔板5にフランジ部7を設ければ、邪魔板5が旋回流をせき止める効果を増大するので、旋回しながら上昇する塩化物水溶液Sの流れを形成しやすくなる。すると、液面に向かって真っ直ぐに塩化物水溶液Sが上昇する場合に比べて、塩化物水溶液Sが液面に到達するまでの時間を長くできる。したがって、塩化物水溶液Sを攪拌する効果を高くすることができるから、塩化物水溶液Sの状態を均質に近づけやすくなる。
(About the obstacle board 5)
In the above example, the case where the flange portions 7 are provided at both ends of the baffle plate 5 in the width direction has been described, but the flange portions 7 do not necessarily have to be provided. However, if the baffle plate 5 is provided with the flange portion 7, the baffle plate 5 increases the effect of damming the swirling flow, so that it becomes easy to form the flow of the chloride aqueous solution S that rises while swirling. Then, the time until the chloride aqueous solution S reaches the liquid surface can be lengthened as compared with the case where the chloride aqueous solution S rises straight toward the liquid surface. Therefore, since the effect of stirring the chloride aqueous solution S can be enhanced, the state of the chloride aqueous solution S can be easily brought close to a homogeneous state.

また、フランジ部7を設ける場合、その数や位置はとくに限定されない。
例えば、フランジ部7を、邪魔板5の幅方向の両端部に加えて、邪魔板5の幅方向の両端部間の表面(つまり本体部6の外表面6aおよび内表面6b、以下では中間部表面という)に設けてもよい。この場合には、邪魔板5の幅方向の両端部だけにフランジ部7を設ける場合に比べて、フランジ部7の幅が同じでも、攪拌翼12の外端縁からフランジ部7までの距離を近くできるので、塩化物水溶液Sをせん断する効果を高めることができるという点で好ましい。
Further, when the flange portions 7 are provided, the number and positions thereof are not particularly limited.
For example, the flange portion 7 is added to both ends in the width direction of the baffle plate 5, and the surfaces between both ends in the width direction of the baffle plate 5 (that is, the outer surface 6a and the inner surface 6b of the main body portion 6; It may be provided on the surface). In this case, the distance from the outer edge of the stirring blade 12 to the flange portion 7 is increased even if the width of the flange portion 7 is the same, as compared with the case where the flange portions 7 are provided only at both ends in the width direction of the baffle plate 5. Since it can be close to each other, it is preferable in that the effect of shearing the aqueous chloride solution S can be enhanced.

また、邪魔板5において、幅方向の一方の端部だけにフランジ部7を設けてもよい。例えば、槽本体2内の旋回流の流れに対して上流側に位置する端部にはフランジ部7を設けず、下流側に位置する端部にフランジ部7を設ける。この場合には、以下の問題を防ぐことができるいう点で好ましい。下流側に設けたフランジ部7の下流側に生じるよどみでフランジ部7に固形物の堆積が一時的に生じた場合には、堆積物がフランジ部7から剥がれ落ちる可能性がある。しかし、下流側に位置する端部にのみフランジ部7を設けた場合は、邪魔板5の幅方向の両端部にフランジ部7を設ける場合に比べて、堆積物がフランジ部7から剥がれ落ちても、剥がれ落ちた堆積物の塊が撹拌翼12に直接衝突する可能性を低くできるという点で好ましい。 Further, in the baffle plate 5, the flange portion 7 may be provided only at one end portion in the width direction. For example, the flange portion 7 is not provided at the end portion located on the upstream side with respect to the swirling flow in the tank body 2, and the flange portion 7 is provided at the end portion located on the downstream side. In this case, it is preferable in that the following problems can be prevented. If solid matter is temporarily deposited on the flange portion 7 due to the stagnation that occurs on the downstream side of the flange portion 7 provided on the downstream side, the deposit may be peeled off from the flange portion 7. However, when the flange portions 7 are provided only at the ends located on the downstream side, the deposits are peeled off from the flange portions 7 as compared with the case where the flange portions 7 are provided at both ends in the width direction of the baffle plate 5. It is also preferable in that the possibility that the mass of the peeled-off deposit directly collides with the stirring blade 12 can be reduced.

なお、幅方向の一方の端部のうち下流側の端部にのみフランジ部7を設けた場合において、中間部表面にもフランジ部7を設けてもよい。この場合には、中間部表面のフランジ部7とその下流側に設けたフランジ部7との間にもよどみが生じる。しかし、中間表面のフランジ部7と下流側のフランジ部7の間に固形物が堆積しても堆積物が剥がれ落ち難くなるので、剥がれ落ちた堆積物が撹拌翼12に直接衝突する可能性を低くできるという効果を期待できる。 When the flange portion 7 is provided only on the downstream end of one end in the width direction, the flange portion 7 may also be provided on the surface of the intermediate portion. In this case, stagnation also occurs between the flange portion 7 on the surface of the intermediate portion and the flange portion 7 provided on the downstream side thereof. However, even if solids are deposited between the flange portion 7 on the intermediate surface and the flange portion 7 on the downstream side, the deposits are difficult to peel off, so that the peeled deposits may directly collide with the stirring blade 12. The effect of being able to lower it can be expected.

逆に、槽本体2内の旋回流の流れに対して下流側に位置する端部にフランジ部7を設けず、上流側に位置する端部にのみフランジ部7を設けてもよい。この場合には、邪魔板5の幅方向の両端部にフランジ部7を設ける場合に比べて、邪魔板5の下流側によどみが生じにくいという点で好ましい。 On the contrary, the flange portion 7 may not be provided at the end portion located on the downstream side with respect to the swirling flow in the tank body 2, and the flange portion 7 may be provided only at the end portion located on the upstream side. In this case, it is preferable in that stagnation is less likely to occur on the downstream side of the baffle plate 5 as compared with the case where the flange portions 7 are provided at both ends in the width direction of the baffle plate 5.

なお、幅方向の一方の端部のうち上流側の端部にのみフランジ部7を設けた場合にも、中間部表面にフランジ部7を設けてもよい。この場合も、中間部表面のフランジ部7とその上流側のフランジ部7の間に固形物が堆積しても堆積物が剥がれ落ち難くなるので、剥がれ落ちた堆積物が撹拌翼12に直接衝突する可能性を低くできるという効果を期待できる。 Even when the flange portion 7 is provided only on the upstream end portion of one end portion in the width direction, the flange portion 7 may be provided on the surface of the intermediate portion. In this case as well, even if solids are deposited between the flange portion 7 on the surface of the intermediate portion and the flange portion 7 on the upstream side thereof, the deposits are difficult to peel off, so that the peeled deposits directly collide with the stirring blade 12. You can expect the effect of reducing the possibility of doing so.

さらに、邪魔板5の幅方向の両端部にフランジ部7を設けず、中間部表面だけにフランジ部7を設けてもよい。この場合には、邪魔板5の幅方向の両端部にのみフランジ部7を設ける場合や、邪魔板5の幅方向の両端部と中間部表面の両方にフランジ部7を設ける場合に比べて、フランジ部7の幅が同じ幅であっても旋回流を上昇流に変える効果が大きくなる。すると、中間部表面だけにフランジ部7を設ける場合には、フランジ部7を小さくしても旋回流を上昇流に変える十分な効果を得やすくなるので、邪魔板5の重量を軽減できる可能性がある。 Further, the flange portions 7 may be provided only on the surface of the intermediate portion without providing the flange portions 7 at both ends in the width direction of the baffle plate 5. In this case, as compared with the case where the flange portions 7 are provided only on both ends in the width direction of the baffle plate 5, and the cases where the flange portions 7 are provided on both both ends in the width direction and the surface of the intermediate portion of the baffle plate 5. Even if the width of the flange portion 7 is the same, the effect of changing the swirling flow to the ascending flow becomes large. Then, when the flange portion 7 is provided only on the surface of the intermediate portion, it is easy to obtain a sufficient effect of changing the swirling flow to the ascending flow even if the flange portion 7 is made smaller, so that the weight of the baffle plate 5 may be reduced. There is.

邪魔板5の中間部表面にフランジ部7を設ける場合、フランジ部7を設ける枚数はとくに限定されない。一枚でもよいし複数枚設けてもよい。フランジ部7の枚数を多くした場合には、固形物が堆積した場合でも、堆積物が剥がれ落ち難くなるという点で好ましい一方、邪魔板5の重量が増加する。したがって、邪魔板5の中間部表面にフランジ部7を設ける枚数は、目的等に合わせて適宜調整すればよい。 When the flange portion 7 is provided on the surface of the intermediate portion of the baffle plate 5, the number of flange portions 7 provided is not particularly limited. One sheet may be provided, or a plurality of sheets may be provided. When the number of flange portions 7 is increased, it is preferable that even if solid matter is deposited, the deposit is less likely to come off, but the weight of the baffle plate 5 is increased. Therefore, the number of flange portions 7 provided on the surface of the intermediate portion of the baffle plate 5 may be appropriately adjusted according to the purpose and the like.

また、邪魔板5におけるフランジ部7の配置(位置や間隔)を変更すれば塩化物水溶液Sの流動に与える影響が変化するので、フランジ部7の配置(位置や間隔)は、目的等に合わせて適宜調整すればよい。 Further, if the arrangement (position and spacing) of the flange portions 7 on the baffle plate 5 is changed, the influence on the flow of the chloride aqueous solution S changes. Therefore, the arrangement (position and spacing) of the flange portions 7 can be adjusted according to the purpose and the like. It may be adjusted appropriately.

複数枚の邪魔板5は、必ずしも同じ形状でなくてもよい。例えば、塩素を供給する配管Pを取り付ける邪魔板5については、邪魔板5を支持する構造物(例えば、天板2a等)の強度等の観点から、他の邪魔板5よりも邪魔板5全体の重量が軽くなるようにしてもよい。例えば、配管Pを取り付ける邪魔板5は、他の邪魔板5に比べて、邪魔板5の幅Hを狭くして邪魔板5の幅Hをフランジ部7の幅Bに近づけたりしてもよい。しかし、複数枚の邪魔板5の形状を全て同じ形状としておけば、攪拌された塩化物水溶液Sの状態を槽本体2内において均質に近づけやすくなるという利点が得られる。 The plurality of baffle plates 5 do not necessarily have the same shape. For example, with respect to the baffle plate 5 to which the chlorine supply pipe P is attached, the entire baffle plate 5 is more than the other baffle plates 5 from the viewpoint of the strength of the structure supporting the baffle plate 5 (for example, the top plate 2a, etc.). May be lighter in weight. For example, the baffle plate 5 to which the pipe P is attached may have a narrower width H of the baffle plate 5 and a width H of the baffle plate 5 closer to the width B of the flange portion 7 than the other baffle plates 5. .. However, if the shapes of the plurality of baffle plates 5 are all the same, there is an advantage that the state of the agitated chloride aqueous solution S can be easily brought to a uniform state in the tank body 2.

邪魔板5は、その本体部6の外表面6aおよび内表面6bが必ずしも槽本体2の半径方向と直交または略直交するように設けられていなくてもよい。例えば、邪魔板5は、本体部6の外表面6aおよび内表面6bが槽本体2の半径方向と略平行となるように配設されていてもよい。しかし、本体部6の外表面6aおよび内表面6bが槽本体2の半径方向と直交または略直交するように邪魔板5を設ければ、邪魔板5において、槽本体2内を旋回する流れに対して対向する面を小さくできる。すると、邪魔板5を設けたことに起因するよどみや、そのよどみに起因する固形物の堆積等をより生じにくくすることができる。 The baffle plate 5 does not necessarily have to be provided so that the outer surface 6a and the inner surface 6b of the main body 6 are orthogonal to or substantially orthogonal to the radial direction of the tank main body 2. For example, the baffle plate 5 may be arranged so that the outer surface 6a and the inner surface 6b of the main body 6 are substantially parallel to the radial direction of the tank main body 2. However, if the baffle plate 5 is provided so that the outer surface 6a and the inner surface 6b of the main body 6 are orthogonal to or substantially orthogonal to the radial direction of the tank body 2, the baffle plate 5 swirls in the tank body 2. On the other hand, the facing surface can be made smaller. Then, stagnation caused by the provision of the baffle plate 5 and accumulation of solid matter due to the stagnation can be made less likely to occur.

邪魔板5は必ずしも複数枚設けなくてもよく1枚でもよい。また、複数枚の邪魔板5を設ける場合でも、必ずしも槽本体2の中心軸に対して回転対称に設けなくてもよい。さらに、複数枚の邪魔板5は必ずしも等角度間隔となっていなくてもよい。槽本体2内に形成する流動に合わせて適切な枚数の邪魔板5を適切な位置に設置すればよい。しかし、複数枚の邪魔板5を設け、かつ、複数枚の邪魔板5を槽本体2の中心軸に対して回転対称かつ等角度間隔となるように設けておけば、攪拌された塩化物水溶液Sの状態を槽本体2内において均質に近づけやすくなる。 The number of the baffle plates 5 does not necessarily have to be a plurality, and may be one. Further, even when a plurality of baffle plates 5 are provided, they do not necessarily have to be provided rotationally symmetrically with respect to the central axis of the tank body 2. Further, the plurality of baffle plates 5 do not necessarily have to be equiangularly spaced. An appropriate number of baffle plates 5 may be installed at appropriate positions according to the flow formed in the tank body 2. However, if a plurality of baffle plates 5 are provided and a plurality of baffle plates 5 are provided so as to be rotationally symmetric and equiangularly spaced with respect to the central axis of the tank body 2, the stirred chloride aqueous solution is provided. It becomes easy to bring the state of S closer to homogeneous in the tank body 2.

本発明の邪魔板を有する攪拌反応装置と一般的な邪魔板を設けた攪拌反応装置とについて、固形物等の堆積状態を確認した。 Regarding the stirring reaction device having the baffle plate of the present invention and the stirring reaction device provided with the general baffle plate, the deposition state of solid matter and the like was confirmed.

実験では、非鉄金属硫化物の塩素浸出工程において使用される攪拌反応装置において、その反応槽内に邪魔板を配置して邪魔板への付着物の発生状況を確認した。 In the experiment, in the stirring reaction device used in the chlorine leaching step of non-ferrous metal sulfide, a baffle plate was placed in the reaction tank to confirm the generation state of deposits on the baffle plate.

実施例1では、攪拌反応装置の反応槽内に図1および図2に示すような方法で邪魔板を設けた。使用した邪魔板は、断面形状がI型の鋼材(つまり本願明細書でいうフランジ部を有する板材)であり、厚さ16mmでB×H=0.05D×0.15D(D:反応槽の内径)のものである(図2参照)。 In Example 1, a baffle plate was provided in the reaction vessel of the stirring reaction apparatus by the method shown in FIGS. 1 and 2. The obstruction plate used is a steel material having an I-shaped cross section (that is, a plate material having a flange portion as described in the present specification), has a thickness of 16 mm, and has B × H = 0.05D × 0.15D (D: reaction tank). Inner diameter) (see FIG. 2).

この邪魔板を、反応槽の中心軸に対して回転対称となるように、4枚吊り下げて反応槽に設置した。
また、邪魔板は、その表面から反応槽の内壁までの距離L(図1、図2参照)が0.15Dとなるように設置した。
邪魔板は、反応槽内における塩素浸出液の液面高さをXとすると、0.9Xだけ塩素浸出液に挿入した。かかる長さを塩素浸出液に挿入した場合、邪魔板の下端から反応槽の底面までの距離L2は約300mmとなる。
Four of these baffle plates were suspended in the reaction vessel so as to be rotationally symmetric with respect to the central axis of the reaction vessel.
Further, the baffle plate was installed so that the distance L (see FIGS. 1 and 2) from the surface thereof to the inner wall of the reaction tank was 0.15D.
The baffle plate was inserted into the chlorine leachate by 0.9X, where X is the liquid level height of the chlorine leachate in the reaction vessel. When such a length is inserted into the chlorine leachate, the distance L2 from the lower end of the baffle plate to the bottom surface of the reaction tank is about 300 mm.

比較例1では、攪拌反応装置の反応槽に図3に示すように邪魔板を設けた。使用した邪魔板は、厚さ16mmで幅が0.1D(D:反応槽の内径)の板材である。
この邪魔板を、反応槽の中心軸に対して回転対称となるように4枚設置した。
邪魔板は、その表面が反応槽の半径方向と略平行となるように。その側端縁を反応槽の内壁に固定し、その下端縁を反応槽の底面に固定した(図3参照)。
In Comparative Example 1, a baffle plate was provided in the reaction vessel of the stirring reaction device as shown in FIG. The baffle plate used is a plate material having a thickness of 16 mm and a width of 0.1 D (D: inner diameter of the reaction vessel).
Four of these baffle plates were installed so as to be rotationally symmetric with respect to the central axis of the reaction vessel.
The surface of the baffle plate should be approximately parallel to the radial direction of the reaction vessel. The side edge was fixed to the inner wall of the reaction vessel, and the lower end edge thereof was fixed to the bottom surface of the reaction vessel (see FIG. 3).

結果として、実施例1の反応槽では、6ヶ月間連続して操業したが、ニッケルなどの有価金属の高い浸出率が維持された。しかも、6ヶ月間連続操業した後、邪魔板の状況を確認したが、邪魔板への大きな固形物の付着は見られなかった。 As a result, the reaction vessel of Example 1 was operated continuously for 6 months, but a high leaching rate of valuable metals such as nickel was maintained. Moreover, after continuous operation for 6 months, the condition of the baffle plate was confirmed, but no large solid matter adhered to the baffle plate.

一方、比較例1の反応槽では、邪魔板への付着物の堆積が多量に生じたため、3ヶ月に一度、操業を止めて邪魔板から付着物を除去する必要があった。 On the other hand, in the reaction vessel of Comparative Example 1, since a large amount of deposits were deposited on the baffle plate, it was necessary to stop the operation once every three months to remove the deposits from the baffle plate.

以上の結果より、図1および図2に示すような方法で邪魔板を設置すれば、邪魔板への固形物の付着を抑制でき、大きな固形物が邪魔板に堆積することを防ぐことができることが確認された。 From the above results, if the baffle plate is installed by the method shown in FIGS. 1 and 2, it is possible to suppress the adhesion of solid matter to the baffle plate and prevent large solid matter from accumulating on the baffle plate. Was confirmed.

本発明の攪拌反応装置は、固形物を含む液体を攪拌する装置に適している。 The stirring reaction device of the present invention is suitable for a device for stirring a liquid containing a solid substance.

1 攪拌反応装置
2 槽本体
2b 底
2w 内壁
5 邪魔板
6 本体部
6a 外表面
6b 内表面
7 フランジ部
10 攪拌装置
11 回転軸
12 攪拌翼
gb 隙間
gw 隙間
S 塩化物水溶液

1 Stirring reaction device 2 Tank body 2b Bottom 2w Inner wall 5 Baffle plate 6 Main body 6a Outer surface 6b Inner surface 7 Flange 10 Stirrer 11 Rotating shaft 12 Stirring blade gb Gap gw Gap S Chloride aqueous solution

Claims (4)

回転軸と該回転軸に設けられた攪拌翼とを有する攪拌装置によって液体を攪拌するために使用される反応槽であって、
前記攪拌装置の回転軸が中心軸とほぼ同軸となるように配置される、該攪拌装置によって攪拌される液体を収容する槽本体と、
該槽本体の内壁近傍に該槽本体の内壁との間に隙間を空けて配設された邪魔板と、を備えており、
前記邪魔板は、
その表面が前記槽本体の半径方向と直交するように配設されており、
その表面が該邪魔板の表面と非平行となるように接続された、該邪魔板の幅よりも幅が狭いフランジ部を備えている
ことを特徴とする反応槽。
A reaction vessel used for stirring a liquid by a stirring device having a rotating shaft and a stirring blade provided on the rotating shaft.
A tank body containing a liquid to be agitated by the agitator, which is arranged so that the rotation axis of the agitator is substantially coaxial with the central axis .
It is provided with a baffle plate arranged in the vicinity of the inner wall of the tank body with a gap between it and the inner wall of the tank body.
The obstacle board is
The surface is arranged so as to be orthogonal to the radial direction of the tank body .
A reaction vessel characterized by having a flange portion whose surface is connected so as to be non-parallel to the surface of the baffle plate and whose width is narrower than the width of the baffle plate .
前記邪魔板は、
その下端と前記槽本体の底面との間に隙間が形成されるように吊り下げられた状態で配設されている
ことを特徴とする請求項1記載の反応槽。
The obstacle board is
The reaction tank according to claim 1 , wherein the reaction tank is suspended so as to form a gap between the lower end thereof and the bottom surface of the tank body.
請求項1または2記載の反応槽と、
回転軸と該回転軸に設けられた攪拌翼とを有し、該反応槽内の液体を攪拌する攪拌装置と、を備えている
ことを特徴とする攪拌反応装置。
The reaction vessel according to claim 1 or 2 ,
A stirring reaction apparatus having a rotating shaft and a stirring blade provided on the rotating shaft, and comprising a stirring device for stirring the liquid in the reaction vessel.
前記反応槽内の液体に気体を吹き込む配管を備えており、
該配管が前記邪魔板の表面に設置されている
ことを特徴とする請求項3記載の攪拌反応装置。
It is equipped with a pipe that blows gas into the liquid in the reaction vessel.
The stirring reaction device according to claim 3, wherein the pipe is installed on the surface of the baffle plate.
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