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JP6918985B2 - Raw material supply equipment, flash smelting furnace and operation method of flash smelting furnace - Google Patents
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JP6918985B2 - Raw material supply equipment, flash smelting furnace and operation method of flash smelting furnace - Google Patents

Raw material supply equipment, flash smelting furnace and operation method of flash smelting furnace Download PDF

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JP6918985B2
JP6918985B2 JP2019564737A JP2019564737A JP6918985B2 JP 6918985 B2 JP6918985 B2 JP 6918985B2 JP 2019564737 A JP2019564737 A JP 2019564737A JP 2019564737 A JP2019564737 A JP 2019564737A JP 6918985 B2 JP6918985 B2 JP 6918985B2
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raw material
smelting furnace
flash smelting
gas
reaction
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JPWO2019139079A1 (en
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竜也 本村
竜也 本村
浩行 佐野
浩行 佐野
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Pan Pacific Copper Co Ltd
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    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22BPRODUCTION AND REFINING OF METALS; PRETREATMENT OF RAW MATERIALS
    • C22B5/00General methods of reducing to metals
    • C22B5/02Dry methods smelting of sulfides or formation of mattes
    • C22B5/12Dry methods smelting of sulfides or formation of mattes by gases
    • C22B5/14Dry methods smelting of sulfides or formation of mattes by gases fluidised material

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Description

本発明は、原料供給装置、自溶炉及び自溶炉の操業方法に関する。 The present invention relates to a raw material supply device, a flash smelting furnace, and a method for operating the flash smelting furnace.

自溶炉とは、銅、ニッケル等の非鉄金属の製錬、及び、マット処理製錬に用いられる製錬炉であり、反射炉型のセットラの上にシャフトを設け、その頂部から原料と反応に供するガスを吹き込むことで原料の酸化熱を利用し、瞬時に酸化溶融を行う炉である。自溶炉において、原料と反応用ガスを炉内へ供給する装置は、自溶炉の性能を決定付ける重要な役割を担っている。この原料供給装置の性能が反応シャフト内での原料の反応効率、反応進行度を左右し、その結果、自溶炉の処理能力及びメタル採収率に影響を及ぼす。自溶炉における反応シャフト内での反応は、速やか、かつ、全ての原料が均一に同じ反応進行度で進行することが望ましい。このため、原料と反応用ガスとは、均一に混合されることが望ましい。 A flash smelting furnace is a smelting furnace used for smelting non-ferrous metals such as copper and nickel and for matte smelting. A shaft is provided on a reverberatory furnace type settler and reacts with raw materials from the top. It is a furnace that instantly oxidizes and melts by using the heat of oxidation of the raw material by blowing the gas to be used for. In a flash smelting furnace, a device that supplies raw materials and reaction gas into the flash smelting furnace plays an important role in determining the performance of the flash smelting furnace. The performance of this raw material supply device affects the reaction efficiency and reaction progress of the raw material in the reaction shaft, and as a result, affects the processing capacity of the flash smelting furnace and the metal yield. It is desirable that the reaction in the reaction shaft in the flash smelting furnace proceeds quickly and that all the raw materials proceed uniformly at the same extent of reaction. Therefore, it is desirable that the raw material and the reaction gas are uniformly mixed.

このような原料と反応用ガスとの混合を改善するため、原料供給装置から反応シャフト内へ供給される主送風を旋回させるものが知られている(特許文献1)。また、管状の精鉱シュートの内側に燃料バーナーを取り囲んで酸素吹込管を設け、その開口部に案内羽根を設けて旋回流を供給することが知られている(特許文献2)。 In order to improve the mixing of the raw material and the reaction gas, there is known one that swirls the main air supplied from the raw material supply device into the reaction shaft (Patent Document 1). Further, it is known that an oxygen blowing pipe is provided inside a tubular concentrate chute so as to surround a fuel burner, and a guide blade is provided at an opening thereof to supply a swirling flow (Patent Document 2).

特表2010-538162号公報Special Table 2010-538162 特開昭60−248832号公報Japanese Unexamined Patent Publication No. 60-248832

ところで、原料供給装置の直下の領域は、主送風によって、温度が低く、精鉱反応が進みにくい領域となっている。特許文献1や特許文献2は、このような原料供給装置の直下の領域に積極的に旋回流を発生させるものとはなっておらず、改良の余地があった。 By the way, the region directly below the raw material supply device is a region where the temperature is low and the concentrate reaction is difficult to proceed due to the main ventilation. Patent Document 1 and Patent Document 2 do not positively generate a swirling flow in the region directly below such a raw material supply device, and there is room for improvement.

本発明は上記の課題に鑑みてなされたものであり、自溶炉内に供給された原料と反応用ガスの混合を積極的に促進し、反応を均一化することを目的としている。 The present invention has been made in view of the above problems, and an object of the present invention is to positively promote the mixing of the raw material and the reaction gas supplied into the flash smelting furnace to make the reaction uniform.

本発明の原料供給装置は、自溶炉内に原料を供給するとともに、少なくとも前記自溶炉内に前記原料の反応に寄与する反応用ガスを供給する原料供給装置であって、半径方向外側に向かって開口した供給孔を有する中空円錐台状の分散コーンを先端部に備え、前記供給孔を通じて前記原料を分散させる分散用ガスを吐出するランスと、前記ランスの外側に設けられ、前記原料を前記自溶炉内に供給する原料流路と、前記原料流路の外側に設けられ、前記反応用ガスを前記自溶炉内に供給するガス流路と、前記ランスを回転駆動する、駆動部と、を備える。 The raw material supply device of the present invention is a raw material supply device that supplies raw materials into the flash smelting furnace and at least supplies reaction gas that contributes to the reaction of the raw materials into the flash smelting furnace, and is outward in the radial direction. A hollow cone-shaped dispersion cone having a supply hole that opens toward the tip is provided at the tip, and a lance that discharges a dispersion gas that disperses the raw material through the supply hole and a lance that is provided outside the lance to provide the raw material. A drive unit that rotationally drives the raw material flow path to be supplied into the flash smelting furnace, the gas flow path provided outside the raw material flow path to supply the reaction gas into the flash smelting furnace, and the lance. And.

この場合において、前記ガス流路内に突出させて配置されたベーンを、さらに備えてもよい。このベーンは、前記第2の反応用ガスを前記ランスが回転駆動されることによって旋回する前記分散用ガスの旋回方向と対向する方向に旋回させる姿勢で設置することができる。前記ランスは、前記分散コーンの外周面に突起を備えていてもよい。前記分散コーンの外周面に補強部を設けた構成とすることができる。 In this case, a vane may be further provided so as to project into the gas flow path. The vane can be installed in a posture in which the second reaction gas is swirled in a direction opposite to the swirling direction of the dispersion gas, which is swirled by the rotational drive of the lance. The lance may be provided with protrusions on the outer peripheral surface of the dispersion cone. A reinforcing portion may be provided on the outer peripheral surface of the dispersion cone.

本発明の自溶炉は、本発明の原料供給装置を備えている。 The flash smelting furnace of the present invention includes the raw material supply device of the present invention.

本明細書の自溶炉の操業方法は、自溶炉内に原料を供給するとともに、少なくとも前記自溶炉内に前記原料の反応に寄与する反応用ガスを供給する自溶炉の操業方法であって、ランスの外側に設けられた原料流路を通じて前記自溶炉内に前記原料を供給しつつ、前記原料流路の外側に設けられたガス流路を通じて前記反応用ガスを前記自溶炉に供給する工程を有し、前記反応用ガスを前記自溶炉に供給するときに、半径方向外側に向かって開口した供給孔を有する中空円錐台状の分散コーンを先端部に備えるランスを回転駆動しつつ、前記供給孔を通じて前記原料を分散させる分散用ガスを吐出する。 The method of operating the flash smelting furnace of the present specification is a method of operating a flash smelting furnace that supplies a raw material into the flash smelting furnace and at least supplies a reaction gas that contributes to the reaction of the raw material into the flash smelting furnace. The raw material is supplied into the flash smelting furnace through a raw material flow path provided outside the lance, and the reaction gas is supplied to the flash smelting furnace through a gas flow path provided outside the raw material flow path. Rotates a lance having a hollow conical trapezoidal dispersion cone at the tip, which has a supply hole that opens outward in the radial direction when the reaction gas is supplied to the flash smelting furnace. While driving, the dispersion gas that disperses the raw material is discharged through the supply hole.

本発明の原料供給装置及び自溶炉は、自溶炉内に供給された原料と反応用ガスの混合を積極的に促進し、反応を均一化することができる。 The raw material supply device and the flash smelting furnace of the present invention can positively promote the mixing of the raw material supplied into the flash smelting furnace and the reaction gas to make the reaction uniform.

図1は実施形態に係る銅製錬用の自溶炉の構成を概略的に示す図である。FIG. 1 is a diagram schematically showing a configuration of a flash smelting furnace for copper smelting according to an embodiment. 図2は第1実施形態の原料供給装置の一部を拡大した図である。FIG. 2 is an enlarged view of a part of the raw material supply device of the first embodiment. 図3は分散コーンを拡大して示す説明図である。FIG. 3 is an enlarged explanatory view showing the dispersed cone. 図4は分散用ガスが法線方向に拡がる様子を模式的に示す説明図である。FIG. 4 is an explanatory diagram schematically showing how the dispersion gas spreads in the normal direction. 図5はランスが回転することによる分散用ガスの旋回と、ベーンによる反応用ガスの旋回の様子とを模式的に示す説明図である。FIG. 5 is an explanatory diagram schematically showing a state in which the dispersion gas is swirled by the rotation of the lance and the reaction gas is swirled by the vane. 図6は分散コーンの外周面に突起が設けられた様子を示す説明図である。FIG. 6 is an explanatory view showing a state in which protrusions are provided on the outer peripheral surface of the dispersion cone.

以下、実施形態に係る自溶炉について、図1〜図6に基づいて、詳細に説明する。図1は、実施形態に係る銅製錬用の自溶炉100の構成を概略的に示す図である。 Hereinafter, the flash smelting furnace according to the embodiment will be described in detail with reference to FIGS. 1 to 6. FIG. 1 is a diagram schematically showing the configuration of a flash smelting furnace 100 for copper smelting according to an embodiment.

(第1実施形態)
図1に示すように、自溶炉100は、原料供給装置1と、炉体2と、を備える。原料供給装置1は、精鉱バーナーとも呼ばれ、原料である精鉱(銅精鉱(CuFeS2など))、反応用主送風ガス、反応用補助ガス、及び分散用ガス(反応にも寄与する)を炉体2内に供給する。炉体2は、精鉱と反応用ガスとが混合する反応シャフト3、セットラ4、アップテイク5を備える。なお、反応用主送風ガス及び反応用補助ガスは、酸素富化空気であり、分散用ガスは、空気または酸素富化空気である。これらの反応用ガス、および分散用ガスは、精鉱を分散し、同時に酸化させ、反応シャフト3の底部でマット及びスラグに分離する。
(First Embodiment)
As shown in FIG. 1, the flash smelting furnace 100 includes a raw material supply device 1 and a furnace body 2. The raw material supply device 1 is also called a concentrate burner, and is a raw material concentrate (copper concentrate (CuFeS 2 or the like)), a main blower gas for reaction, an auxiliary gas for reaction, and a gas for dispersion (which also contributes to the reaction). ) Is supplied into the furnace body 2. The furnace body 2 includes a reaction shaft 3, a settler 4, and an uptake 5 in which the concentrate and the reaction gas are mixed. The main blower gas for reaction and the auxiliary gas for reaction are oxygen-enriched air, and the dispersion gas is air or oxygen-enriched air. These reaction gases and dispersion gases disperse the concentrate, simultaneously oxidize it, and separate it into mats and slags at the bottom of the reaction shaft 3.

図2は、原料供給装置1の一部を拡大した図であって、原料、反応用ガス、分散用ガスを反応シャフト3側へ投入する投入部10を示した説明図である。 FIG. 2 is an enlarged view of a part of the raw material supply device 1, and is an explanatory view showing a charging section 10 for charging the raw material, the reaction gas, and the dispersion gas to the reaction shaft 3 side.

原料供給装置1の投入部10は、ランス16を備え、ランス16内には分散用ガスの通る第1通路11、反応用ガスの一部としての反応用補助ガスが通過する第4通路14が形成されている。第4通路14は、ランス16の中心部分に設けられており、第1通路11は、第4通路14の周囲に設けられている。また、投入部10は、ランス16の外側、より具体的にランス16の外周に設けられた原料流路としての第2通路12を備えている。投入部10は、さらに、第2通路12の外側、より具体的に第2通路12の外周に設けられ、反応用ガスの一部としての反応用主送風ガスが通過する第3通路13と備えている。第3通路13は、ガス流路に相当する。第3通路13は、内側をエアチャンバー171とした漏斗状部17aの下流側に連設された筒状部17bによって第2通路12の外側に設けられている。第3通路13は、その上方に設けられたエアチャンバー171と通じている。第2通路12と、第3通路13は、円筒状の仕切り壁21により、仕切られた状態となっている。 The input section 10 of the raw material supply device 1 includes a lance 16, and the lance 16 includes a first passage 11 through which the dispersion gas passes and a fourth passage 14 through which the reaction auxiliary gas as a part of the reaction gas passes. It is formed. The fourth passage 14 is provided in the central portion of the lance 16, and the first passage 11 is provided around the fourth passage 14. Further, the charging section 10 is provided with a second passage 12 as a raw material flow path provided on the outside of the lance 16, more specifically, on the outer circumference of the lance 16. The input section 10 is further provided on the outside of the second passage 12, more specifically on the outer periphery of the second passage 12, and is provided with a third passage 13 through which the main blast gas for reaction as a part of the reaction gas passes. ing. The third passage 13 corresponds to a gas flow path. The third passage 13 is provided on the outside of the second passage 12 by a tubular portion 17b connected to the downstream side of the funnel-shaped portion 17a having the inside as the air chamber 171. The third passage 13 communicates with an air chamber 171 provided above the third passage 13. The second passage 12 and the third passage 13 are in a state of being partitioned by a cylindrical partition wall 21.

第1通路11は、分散用ガスを反応シャフト3内へ供給する。第2通路12は、精鉱を反応シャフト3内へ供給する。第3通路13は、反応用主送風ガスをエアチャンバー17から反応シャフト3内へ供給する。また、第4通路14は、反応用補助ガスを反応シャフト3内へ供給する。 The first passage 11 supplies the dispersion gas into the reaction shaft 3. The second passage 12 supplies the concentrate into the reaction shaft 3. The third passage 13 supplies the reaction main blast gas from the air chamber 17 into the reaction shaft 3. Further, the fourth passage 14 supplies the reaction auxiliary gas into the reaction shaft 3.

ランス16の先端部(下端部)には、中空円錐台状の分散コーン15が形成されている。分散コーン15の側面下部151には第1通路11を通過した分散用ガスを反応シャフト3内へ吐出する複数の供給孔152が形成されている。供給孔152は、ガスの吐出方向が分散コーン15の底面円の法線方向となるように設けられている。 A hollow cone-shaped dispersion cone 15 is formed at the tip end portion (lower end portion) of the lance 16. A plurality of supply holes 152 for discharging the dispersion gas that has passed through the first passage 11 into the reaction shaft 3 are formed in the lower portion 151 of the side surface of the dispersion cone 15. The supply hole 152 is provided so that the gas discharge direction is the normal direction of the bottom circle of the dispersion cone 15.

原料供給装置1は、ランス16を回転駆動する駆動部30を備えている。ランス16の内部には、第1通路11及び第4通路14が形成されているが、例えば、スイベルジョイントを用いることで、ランス16の回転を可能としつつ、これらの通路に分散用ガスや反応用補助ガスが供給されるようになっている。 The raw material supply device 1 includes a drive unit 30 that rotationally drives the lance 16. A first passage 11 and a fourth passage 14 are formed inside the lance 16. For example, by using a swivel joint, the lance 16 can be rotated, and a dispersion gas or a reaction is formed in these passages. Auxiliary gas is being supplied.

ランス16は、概ね20rpm〜120rpmの回転速度で駆動される。回転速度は、原料と反応用ガスの混合具合に応じて適宜選択することができる。 The lance 16 is driven at a rotation speed of approximately 20 rpm to 120 rpm. The rotation speed can be appropriately selected according to the mixing condition of the raw material and the reaction gas.

図3を参照すると、分散コーン15の外周面15a、より具体的には、分散コーン15の傾斜部の外周面15aには、補強部15a1が設けられている。補強部15a1は、周囲の部分よりも耐摩耗性が高い部分である。分散コーン15の外側には、第2通路12が形成されており、原料が供給される。このため、回転する分散コーン15に原料が衝突し、分散コーン15の摩耗が進行する可能性がある。そこで、摩耗し易い箇所に補強部15a1が設けられている。本実施形態における補強部15a1は、硬化肉盛を行うことで形成されているが、補強部15a1の構成は、これに限定されるものではなく、例えば、タングステンカーバイド等によって形成された耐摩耗部材を貼り付ける等の措置を採用することもできる。 Referring to FIG. 3, a reinforcing portion 15a1 is provided on the outer peripheral surface 15a of the dispersion cone 15, and more specifically, the outer peripheral surface 15a of the inclined portion of the dispersion cone 15. The reinforcing portion 15a1 is a portion having higher wear resistance than the peripheral portion. A second passage 12 is formed on the outside of the dispersion cone 15, and a raw material is supplied. Therefore, the raw material may collide with the rotating dispersion cone 15, and the dispersion cone 15 may be worn. Therefore, the reinforcing portion 15a1 is provided at a place where it is easily worn. The reinforcing portion 15a1 in the present embodiment is formed by performing hardening overlay, but the configuration of the reinforcing portion 15a1 is not limited to this, and is, for example, a wear-resistant member formed of tungsten carbide or the like. It is also possible to adopt measures such as pasting.

図2を参照すると、ランス16の軸線AXは、鉛直方向と一致させて配置されている。ランス16が、軸線AXを回転軸として、例えば、図4において矢示a1で示すように反時計回り方向に回転すると、その先端部に設けられた分散コーン15が有する供給孔152から吐出される分散用ガスに矢示a2で示すような接線方向のベクトルが付与される。接線方向のベクトルが付与された分散用ガスが第2通路12から供給された原料に接触すると、原料が撹拌され、第3通路13を通じて供給された反応用ガスとの混合が促進され、この結果、反応が均一化される。 Referring to FIG. 2, the axis AX of the lance 16 is arranged so as to coincide with the vertical direction. When the lance 16 rotates counterclockwise with the axis AX as the rotation axis, for example, as shown by arrow a1 in FIG. 4, the lance 16 is discharged from the supply hole 152 of the dispersion cone 15 provided at the tip thereof. A vector in the tangential direction as shown by arrow a2 is given to the dispersion gas. When the dispersion gas to which the tangential vector is given comes into contact with the raw material supplied from the second passage 12, the raw material is agitated and mixing with the reaction gas supplied through the third passage 13 is promoted, and as a result, the mixture is promoted. , The reaction is homogenized.

図5を参照すると、実施形態の原料供給装置1は、第3通路13内に突出させて配置されたベーン22を備えている。ベーン22は、筒状部17bの内周壁面17b1に設置されている。ベーン22は、軸線AX方向に沿う方向に対して少なくとも0°よりも大きい角度を有するように軸部材23を介して筒状部17bの内周壁面17b1に取り付けられている。具体的に、ベーン22は、第3通路13を通過する反応用ガスをランス16が回転駆動されることによって旋回する分散用ガスの旋回方向(矢示a2方向)と対向する方向(矢示b1方向)に旋回させる姿勢で設置されている。このように分散用ガスと反応用ガスとを衝突させるようにすることで、撹拌混合作用を強化し混合状態をより改善することができる。なお、本実施形態のベーン22は、固定ベーンであるが、可動ベーンを採用することもできる。可動ベーンを採用することで、反応用ガスの旋回状態を制御することができるので、原料と反応用ガスとの混合状態に応じて反応用ガスの旋回状態を変化させ、効果的に原料と反応用ガスの混合を促進し、反応を均一化することができる。なお、第3通路13を通過した反応用ガスの旋回方向と分散用ガスの旋回方向を一致させてもよいが、反応用ガスの旋回方向と分散用ガスの旋回方向を相反する方向とする方が、原料と反応用ガスとの混合促進の観点からより好ましい。 Referring to FIG. 5, the raw material supply device 1 of the embodiment includes a vane 22 that is arranged so as to project into the third passage 13. The vane 22 is installed on the inner peripheral wall surface 17b1 of the tubular portion 17b. The vane 22 is attached to the inner peripheral wall surface 17b1 of the tubular portion 17b via the shaft member 23 so as to have an angle larger than 0 ° with respect to the direction along the axis AX direction. Specifically, the vane 22 has a direction (arrow b1) facing the turning direction (arrow a2 direction) of the dispersion gas that swirls the reaction gas passing through the third passage 13 when the lance 16 is rotationally driven. It is installed in a posture that turns in the direction). By causing the dispersion gas and the reaction gas to collide with each other in this way, the stirring and mixing action can be strengthened and the mixed state can be further improved. Although the vane 22 of the present embodiment is a fixed vane, a movable vane can also be adopted. By adopting a movable vane, the swirling state of the reaction gas can be controlled, so the swirling state of the reaction gas can be changed according to the mixed state of the raw material and the reaction gas, and the reaction gas effectively reacts with the raw material. The mixing of the gas can be promoted and the reaction can be homogenized. The swirling direction of the reaction gas passing through the third passage 13 and the swirling direction of the dispersion gas may be the same, but the swirling direction of the reaction gas and the swirling direction of the dispersion gas are opposite directions. However, it is more preferable from the viewpoint of promoting mixing of the raw material and the reaction gas.

図6を参照すると、ランス16は、分散コーン15の外周面に突起15bを備えている。突起15bは、複数設けられており、それぞれ分散コーン15の外周面にその長手方向に沿って配置されている。回転駆動されるランス16の外周面に設けられた突起15bは、羽根のように作用し、原料を水平方向へ分散させる効果を得ることができる。また、原料の流れ自体を旋回させることにもなるので、原料と反応用ガスとの混合が促進され、反応を均一化することができる。なお、突起は、四角形状の突起や、或いは、球状を半分に割ったような半球状の突起であってもよく、また、突起の配置も、ジグザグに配置することも可能である。 Referring to FIG. 6, the lance 16 is provided with protrusions 15b on the outer peripheral surface of the dispersion cone 15. A plurality of protrusions 15b are provided, and each of the protrusions 15b is arranged on the outer peripheral surface of the dispersion cone 15 along the longitudinal direction thereof. The protrusions 15b provided on the outer peripheral surface of the lance 16 driven to rotate act like blades, and can obtain the effect of dispersing the raw materials in the horizontal direction. Further, since the flow of the raw material itself is swirled, the mixing of the raw material and the reaction gas is promoted, and the reaction can be made uniform. The protrusions may be quadrangular protrusions or hemispherical protrusions obtained by dividing a sphere in half, and the protrusions may be arranged in a zigzag pattern.

以上のように、本実施形態の原料供給装置1によれば、自溶炉100内に供給された原料と反応用ガスの混合を積極的に促進し、反応を均一化することができる。 As described above, according to the raw material supply device 1 of the present embodiment, it is possible to positively promote the mixing of the raw material supplied into the flash smelting furnace 100 and the reaction gas to make the reaction uniform.

上述した実施形態は本発明の好適な実施の例である。但し、これに限定されるものではなく、本発明の要旨を逸脱しない範囲内において種々変形実施可能である。 The embodiments described above are examples of preferred embodiments of the present invention. However, the present invention is not limited to this, and various modifications can be made without departing from the gist of the present invention.

1 原料供給装置
2 炉体
3 反応シャフト
10 投入部
11 第1通路
12 第2通路
13 第3通路
14 第4通路
16 ランス
17a 漏斗状部
17b 筒状部
17b1 内周壁面
22 ベーン
100 自溶炉
1 Raw material supply device 2 Furnace 3 Reaction shaft 10 Input part 11 1st passage 12 2nd passage 13 3rd passage 14 4th passage 16 Lance 17a Funnel-shaped part 17b Cylindrical part 17b1 Inner peripheral wall surface 22 vane 100 Flash smelting furnace

Claims (7)

自溶炉内に原料を供給するとともに、少なくとも前記自溶炉内に前記原料の反応に寄与する反応用ガスを供給する原料供給装置であって、
半径方向外側に向かって開口した供給孔を有する中空円錐台状の分散コーンを先端部に備え、前記供給孔を通じて前記原料を分散させる分散用ガスを吐出するランスと、
前記ランスの外側に設けられ、前記原料を前記自溶炉内に供給する原料流路と、
前記原料流路の外側に設けられ、前記反応用ガスを前記自溶炉内に供給するガス流路と、
前記ランスを回転駆動する、駆動部と、
を備える原料供給装置。
A raw material supply device that supplies raw materials into a flash smelting furnace and at least supplies reaction gas that contributes to the reaction of the raw materials into the flash smelting furnace.
A lance that is provided with a hollow cone-shaped dispersion cone having a supply hole that opens outward in the radial direction at the tip and discharges a dispersion gas that disperses the raw material through the supply hole.
A raw material flow path provided outside the lance and supplying the raw material into the flash smelting furnace,
A gas flow path provided outside the raw material flow path and supplying the reaction gas into the flash smelting furnace,
A drive unit that rotationally drives the lance,
Raw material supply device equipped with.
前記ガス流路内に突出させて配置されたベーンを、さらに備えた請求項1に記載の原料供給装置。 The raw material supply device according to claim 1, further comprising a vane that is arranged so as to project into the gas flow path. 前記ベーンは、前記反応用ガスを前記ランスが回転駆動されることによって旋回する前記分散用ガスの旋回方向と対向する方向に旋回させる姿勢で設置された請求項2に記載の原料供給装置。 The raw material supply device according to claim 2, wherein the vane is installed in a posture in which the reaction gas is swirled in a direction opposite to the swirling direction of the dispersion gas, which is swirled by rotationally driving the lance. 前記ランスは、前記分散コーンの外周面に突起を備えた請求項1乃至3のいずれか1項に記載の原料供給装置。 The raw material supply device according to any one of claims 1 to 3, wherein the lance is provided with protrusions on the outer peripheral surface of the dispersion cone. 前記分散コーンの外周面に補強部を設けた請求項1乃至4のいずれか1項に記載の原料供給装置。 The raw material supply device according to any one of claims 1 to 4, wherein a reinforcing portion is provided on the outer peripheral surface of the dispersion cone. 請求項1〜5のいずれか一項に記載の原料供給装置を備える自溶炉。 A flash smelting furnace provided with the raw material supply device according to any one of claims 1 to 5. 自溶炉内に原料を供給するとともに、少なくとも前記自溶炉内に前記原料の反応に寄与する反応用ガスを供給する自溶炉の操業方法であって、
ランスの外側に設けられた原料流路を通じて前記自溶炉内に前記原料を供給しつつ、前記原料流路の外側に設けられたガス流路を通じて前記反応用ガスを前記自溶炉に供給する工程を有し、
前記反応用ガスを前記自溶炉に供給するときに、半径方向外側に向かって開口した供給孔を有する中空円錐台状の分散コーンを先端部に備えるランスを回転駆動しつつ、前記供給孔を通じて前記原料を分散させる分散用ガスを吐出する自溶炉の操業方法。
It is a method of operating a flash smelting furnace that supplies a raw material into the flash smelting furnace and at least supplies a reaction gas that contributes to the reaction of the raw material into the flash smelting furnace.
While supplying the raw material into the flash smelting furnace through a raw material flow path provided outside the lance, the reaction gas is supplied to the flash smelting furnace through a gas flow path provided outside the raw material flow path. Have a process,
When the reaction gas is supplied to the flash smelting furnace, a lance having a hollow cone-shaped dispersion cone having a supply hole opened outward in the radial direction at the tip thereof is rotationally driven through the supply hole. A method for operating a flash smelting furnace that discharges a dispersion gas that disperses the raw materials.
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