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JP6921722B2 - Manufacturing method of wiring board - Google Patents
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JP6921722B2 - Manufacturing method of wiring board - Google Patents

Manufacturing method of wiring board Download PDF

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JP6921722B2
JP6921722B2 JP2017226393A JP2017226393A JP6921722B2 JP 6921722 B2 JP6921722 B2 JP 6921722B2 JP 2017226393 A JP2017226393 A JP 2017226393A JP 2017226393 A JP2017226393 A JP 2017226393A JP 6921722 B2 JP6921722 B2 JP 6921722B2
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cavity
wiring board
recess
pad
manufacturing
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JP2019096796A (en
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奈須 孝有
孝有 奈須
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Niterra Co Ltd
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NGK Spark Plug Co Ltd
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Description

本発明は、絶縁材からなる基板本体の少なくとも一方の表面に開口するキャビティを有し、且つ該キャビティの底面に開口する凹部内にパッドが形成された配線基板の製造方法に関する。 The present invention relates to a method for manufacturing a wiring board having a cavity that opens on at least one surface of a substrate body made of an insulating material and having a pad formed in a recess that opens on the bottom surface of the cavity.

例えば、複数のセラミック層を積層し且つ表面および裏面を有する基板本体と、該基板本体の前記表面側における一部のセラミック層を貫通して形成された円錐形状のキャビティと、該キャビティの底面を有する裏面側のセラミック層の上面に形成された一対のパッドと、該パッドの底面と個別に接触し且つ前記裏面側のセラミック層を貫通する2本のビア導体と、を含む発光素子実装用配線基板が提案されている(例えば、特許文献1参照)。 For example, a substrate body in which a plurality of ceramic layers are laminated and has a front surface and a back surface, a conical cavity formed through a part of the ceramic layers on the front surface side of the substrate body, and a bottom surface of the cavity. A wiring for mounting a light emitting element, which includes a pair of pads formed on the upper surface of the ceramic layer on the back surface side, and two via conductors that individually contact the bottom surface of the pads and penetrate the ceramic layer on the back surface side. Substrates have been proposed (see, for example, Patent Document 1).

しかし、前記発光素子実装用配線基板のように、個々に所定の厚みを有する複数のセラミック層を積層した基板本体の表面側に、該表面側の位置するセラミック層を打ち抜いて形成したキャビティでは、前記セラミック層となる焼成前のグリーンシートの厚みに依存して該キャビティの深さが決まるため、追って実装すべき電子部品の厚みに応じた過不足のない深さのキャビティにすることは困難であった。そのため、前記電子部品の厚みよりもかなり余裕を持った深さのキャビティを形成せざるを得ず、小型化、低背化、および高密度化の要望に対応しにくい、という問題があった。
更に、予め、前記キャビティの底面となる裏面側のセラミック層を貫通させたビア導体の上端面を含む前記セラミック層の上面に、前記パッドを印刷によって形成した後、これら全体を焼成しているので、該パッドとビア導体との間における電気的な接続が不安定になり得る。しかも、上記キャビティの底面は、上記パッドが配置された状態で焼成されているため、異種材料を同時に焼成することにより、焼成時に当該キャビティの底面がうねることによって、高い平面度を得ることが困難となる、という問題もあった。
However, in a cavity formed by punching out a ceramic layer located on the surface side of a substrate body in which a plurality of ceramic layers having a predetermined thickness are individually laminated, such as the wiring board for mounting a light emitting element. Since the depth of the cavity is determined depending on the thickness of the green sheet before firing, which is the ceramic layer, it is difficult to obtain a cavity having a sufficient depth according to the thickness of the electronic component to be mounted later. there were. Therefore, there is no choice but to form a cavity having a depth considerably larger than the thickness of the electronic component, and there is a problem that it is difficult to meet the demands for miniaturization, low profile, and high density.
Further, since the pads are formed by printing on the upper surface of the ceramic layer including the upper end surface of the via conductor through which the ceramic layer on the back surface side which is the bottom surface of the cavity is penetrated, all of them are fired. , The electrical connection between the pad and the via conductor can be unstable. Moreover, since the bottom surface of the cavity is fired with the pads arranged, it is difficult to obtain high flatness by firing different materials at the same time because the bottom surface of the cavity undulates during firing. There was also the problem of becoming.

特開2006−222358号公報(第1〜14頁、図1〜10)Japanese Unexamined Patent Publication No. 2006-222358 (pages 1 to 14, FIGS. 1 to 10)

本発明は、背景技術で説明した問題点を解決し、絶縁材からなる基板本体において対向する一対の表面の少なくとも一方に、実装すべき電子部品の厚みに最適な深さのキャビティを有し、且つ該キャビティの底面に設けるパッドと該パッドに接するビア導体との電気的接続が安定していると共に、上記キャビティの底面が高い平面度を有している配線基板の製造方法を提供する、ことを課題とする。 The present invention solves the problems described in the background art, and has a cavity having a depth optimum for the thickness of an electronic component to be mounted on at least one of a pair of opposing surfaces in a substrate body made of an insulating material. Further, the present invention provides a method for manufacturing a wiring board in which the electrical connection between the pad provided on the bottom surface of the cavity and the via conductor in contact with the pad is stable and the bottom surface of the cavity has high flatness. Is an issue.

課題を解決するための手段および発明の効果Means for Solving Problems and Effects of Invention

本発明は、前記課題を解決するため、前記キャビティを研削加工によって形成し、且つ該キャビティの底面にパッドの基部側を収容する凹部を研削する際に、予め、その真下に配設したビア導体の一端側をも併せて研削する、ことに着想して成されたものである。
即ち、本発明による配線基板の製造方法(請求項1)は、絶縁材からなり、対向する一対の表面を有する基板本体と、該基板本体の少なくとも一方の表面に開口するキャビティと、該キャビティの底面に開口する少なくとも1つの凹部と、該凹部内に少なくも基部側が形成され、上記基板本体内の厚み方向に沿って形成されたビア導体に接続するパッドと、を備えてなる配線基板の製造方法であって、絶縁材からなり、対向する一対の表面を有し、且つ該一対の表面間の厚み方向に沿ったビア導体を内設する基板本体を用意する基板本体準備工程と、前記基板本体における少なくも一方の表面を研削して、比較的高い平面度の底面と該底面の周辺から立設した側面とを有するキャビティを形成する第1研削工程と、前記キャビティの底面の一部と上記ビア導体の一端側とを研削して、該ビア導体の一端側が底面に露出する凹部を形成する第2研削工程と、前記凹部内に金属粉末を含む導電性ペーストを充填して、前記凹部内に少なくも基部側が位置するパッドを形成するパッド形成工程と、を含む、ことを特徴とする。
In order to solve the above problems, the present invention has a via conductor that is previously arranged directly under the cavity when the cavity is formed by grinding and the recess that accommodates the base side of the pad is ground on the bottom surface of the cavity. It was created with the idea of grinding one end of the beer as well.
That is, the method for manufacturing a wiring board according to the present invention (claim 1) is a substrate main body made of an insulating material and having a pair of opposing surfaces, a cavity that opens to at least one surface of the substrate main body, and the cavity. Manufacture of a wiring board comprising at least one recess that opens to the bottom surface and a pad that has at least a base side formed in the recess and is connected to a via conductor formed along the thickness direction in the substrate body. The method is a substrate main body preparation step of preparing a substrate main body made of an insulating material, having a pair of opposing surfaces, and internally providing a via conductor along the thickness direction between the pair of surfaces, and the substrate. The first grinding step of grinding at least one surface of the main body to form a cavity having a relatively high flat bottom surface and a side surface erected from the periphery of the bottom surface, and a part of the bottom surface of the cavity. A second grinding step of grinding one end side of the via conductor to form a recess in which one end side of the via conductor is exposed on the bottom surface, and filling the recess with a conductive paste containing a metal powder to form the recess. It is characterized by including a pad forming step of forming a pad in which at least the base side is located.

前記配線基板の製造方法によれば、以下の効果(1),(2)が得られる。
(1)前記第1研削工程によって、基板本体における少なくも一方の表面を研削して、比較的高い平面度の底面を含むキャビティが形成され、前記第2研削工程によって、前記キャビティの底面の一部に凹部が設けられ、更に、前記パッド形成工程によって、該凹部内に少なくも基部側が位置するパッドが形成されている。その結果、該パッドの上面の高さを後述するように適宜選択することと相まって、上記キャビティの深さを、追って実装すべき電子部品の厚みに応じた過不足のない最適な深さにできる。加えて、前記絶縁材がセラミックである場合、焼成後の第1研削工程により前記キャビティを形成するため、得られるキャビティの底面の平面度が、焼成により形成された場合に比べて、より高くすることができる。
(2)前記第2研削工程によって、前記キャビティの底面の一部に設けた凹部の底面には、当該凹部の底面を研削した際と同時に、一端側が研削された前記ビア導体の一端面を露出させている。従って、該ビア導体の一端面を確実に前記凹部の底面に露出させられるので、当該ビア導体の一端面を含む前記凹部内に形成されるパッドと当該ビア導体との電気的な接続を安定させることができる。
According to the method for manufacturing a wiring board, the following effects (1) and (2) can be obtained.
(1) By the first grinding step, at least one surface of the substrate body is ground to form a cavity including a bottom surface having a relatively high flatness, and by the second grinding step, one of the bottom surfaces of the cavity is formed. A recess is provided in the portion, and a pad in which at least the base side is located is formed in the recess by the pad forming step. As a result, the height of the upper surface of the pad can be appropriately selected as described later, and the depth of the cavity can be made an optimum depth without excess or deficiency according to the thickness of the electronic component to be mounted later. .. In addition, when the insulating material is ceramic, the cavity is formed by the first grinding step after firing, so that the flatness of the bottom surface of the obtained cavity is made higher than that formed by firing. be able to.
(2) One end surface of the via conductor whose one end side has been ground is exposed on the bottom surface of the recess provided in a part of the bottom surface of the cavity by the second grinding step at the same time when the bottom surface of the recess is ground. I'm letting you. Therefore, since one end surface of the via conductor is surely exposed to the bottom surface of the recess, the electrical connection between the pad formed in the recess including the one end surface of the via conductor and the via conductor is stabilized. be able to.

尚、前記絶縁材は、セラミック(例えば、アルミナ、窒化アルミニウム、ムライト、ガラス−セラミックなど)、あるいは、樹脂(例えば、エポキシ系、ポリイミド系など)である。
また、前記基板本体は、上記セラミックまたは樹脂の多層積層体、上記セラミックまたは樹脂の単層体、あるいは、単層または複層のセラミック層と単層または複層の樹脂層とを積層した複合積層体の何れかからなる。前記単層体は、例えば、セラミック粉または樹脂粉を含む絶縁性材料を焼成または硬化処理する方法の他、セラミック粉または樹脂粉を用いて3D(3次元)プリンターにより製造することも可能である。
更に、前記基板本体において対向する一対の表面とは、相対的な呼称であり、例えば、一方を表面と称し、且つ他方を裏面と称することも可能である。
The insulating material is ceramic (for example, alumina, aluminum nitride, mullite, glass-ceramic, etc.) or resin (for example, epoxy-based, polyimide-based, etc.).
Further, the substrate body is a multilayer laminate of the ceramic or resin, a single layer of the ceramic or resin, or a composite laminate in which a single-layer or multi-layer ceramic layer and a single-layer or multi-layer resin layer are laminated. Consists of one of the bodies. The monolayer can be produced by, for example, a method of firing or curing an insulating material containing ceramic powder or resin powder, or can be produced by a 3D (three-dimensional) printer using ceramic powder or resin powder. ..
Further, the pair of front surfaces facing each other in the substrate body are relative names, and for example, one may be referred to as a front surface and the other may be referred to as a back surface.

また、前記ビア導体は、前記基板本体の内部に内蔵された形態のほか、該基板本体の一方の少なくとも表面に一端面が露出している形態も含まれる。
更に、前記基板本体は、前記ビア導体と電気的に接続する内層配線を更に内設していても良い。
また、前記平面度は、平面の滑らかさ(均一性)を数値で表示可能とした指標であり、JIS B 0621−1984に依拠ないし準拠している。例えば、平面度が±10μm以下とは、基準とする仮想の平面に対し、その厚み方向の凹または凸が片面ごとに10μm以下であることを示す。
更に、前記研削には、円柱形状の砥石が用いられ、該砥石の表面には微細なWCなどの超硬砥粒、ダイヤモンド砥粒、あるいはアルミナ砥粒などが固着されている。
加えて、前記パッドのうち、外部に露出する表面には、防錆対策の金属被膜(例えば、ニッケル被膜と金被膜)を電解金属メッキなどにて被覆しても良い。
Further, the via conductor includes not only a form incorporated inside the substrate main body but also a form in which one end surface is exposed on at least one surface of the substrate main body.
Further, the substrate main body may further be provided with an inner layer wiring that electrically connects to the via conductor.
Further, the flatness is an index that makes it possible to display the smoothness (uniformity) of the plane numerically, and is based on or conforms to JIS B 0621-1984. For example, when the flatness is ± 10 μm or less, it means that the concave or convex in the thickness direction of the reference virtual plane is 10 μm or less for each side.
Further, a cylindrical grindstone is used for the grinding, and fine carbide abrasive grains such as WC, diamond abrasive grains, alumina abrasive grains and the like are fixed to the surface of the grindstone.
In addition, the surface of the pad that is exposed to the outside may be coated with a metal coating (for example, a nickel coating and a gold coating) for rust prevention by electrolytic metal plating or the like.

また、本発明には、前記キャビティの底面の平面度は、±10μm以下である、配線基板の製造方法(請求項2)も含まれる。
これによれば、前記キャビティの底面の平面度が、±10μm以下の滑らかさであるため、前記効果(1)を一層奏することが可能となる。
The present invention also includes a method for manufacturing a wiring board (claim 2), in which the flatness of the bottom surface of the cavity is ± 10 μm or less.
According to this, since the flatness of the bottom surface of the cavity is ± 10 μm or less, the effect (1) can be further exhibited.

更に、本発明には、前記第1研削工程の前に、前記基板本体において対向する一対の表面を研磨して、該一対の表面を互いに平行で且つ比較的高い平面度とする研磨工程を有する、配線基板の製造方法(請求項3)も含まれる。
これによれば、前記キャビティを形成する前記第1研削工程の前に、予め、前記基板本体で対向する一対の表面を研磨する前記研磨工程が行われる。その結果、前記研磨された比較的滑らかな各表面を基準として、前記第1研削工程が施されるため、形成されるキャビティの底面の深さを、該キャビティが開口する表面に対して均一にできるので、前記効果(1)を一層確実に得ることが可能となる。
尚、前記研磨工程には、ローラー形状の砥石が用いられ、該砥石の表面にも微細な超硬砥粒、ダイヤモンド砥粒、あるいはアルミナ砥粒などが固着されている。
Further, the present invention includes a polishing step of polishing a pair of opposing surfaces in the substrate body to make the pair of surfaces parallel to each other and having a relatively high flatness before the first grinding step. , A method for manufacturing a wiring board (claim 3) is also included.
According to this, before the first grinding step of forming the cavity, the polishing step of polishing a pair of surfaces facing each other on the substrate main body is performed in advance. As a result, since the first grinding step is performed on the basis of each of the polished and relatively smooth surfaces, the depth of the bottom surface of the formed cavity is made uniform with respect to the surface on which the cavity opens. Therefore, the effect (1) can be obtained more reliably.
A roller-shaped grindstone is used in the polishing step, and fine cemented carbide abrasive grains, diamond abrasive grains, alumina abrasive grains, and the like are fixed to the surface of the grindstone.

また、本発明には、前記研磨工程後において、前記基板本体において対向する一対の表面における平面度は、±30μm以下である、配線基板の製造方法(請求項4)も含まれる。
これによれば、上記研磨工程によって、前記基板本体において対向する一対の表面における平面度が、予め±30μm以下り滑らかさにされているので、前記効果(1)を顕著に奏することが可能となる。
The present invention also includes a method for manufacturing a wiring board (claim 4), in which the flatness of the pair of surfaces facing each other in the substrate body after the polishing step is ± 30 μm or less.
According to this, the flatness of the pair of surfaces facing each other in the substrate main body is made smooth in advance by ± 30 μm or less by the polishing step, so that the effect (1) can be remarkably exhibited. Become.

更に、本発明には、前記パッドの上面は、前記基板本体の厚み方向において、前記凹部の内側に位置するか、該凹部の開口部と面一であるか、あるいは、前記凹部の開口部よりも外側で且つ前記キャビティの内側に位置している、配線基板の製造方法(請求項5)も含まれる。
これによれば、前記パッドの上面(頂面)の位置が、前記凹部の内側、該凹部の開口部と面一の高さ、あるいは、上記凹部の開口部よりも外側で且つ前記キャビティの内側の何れかに位置している。その結果、追ってキャビティの底面に実装される電子部品と上記パッドとの間を、最適長さのボンディングワイヤー、あるいは、最適な厚みのロウ材層などを介して、電気的に確実に実装することができる。従って、前記効果(1)を一層確実に得ることが可能となる。
尚、同じキャビティ内に形成される複数のパッドの上面ごとの位置は、互いに相違していても良い。
Further, in the present invention, the upper surface of the pad is located inside the recess in the thickness direction of the substrate body, is flush with the opening of the recess, or is more than the opening of the recess. Also included is a method of manufacturing a wiring board (claim 5), which is located on the outside and inside the cavity.
According to this, the position of the upper surface (top surface) of the pad is inside the recess, at a height flush with the opening of the recess, or outside the opening of the recess and inside the cavity. It is located in one of. As a result, the electronic component mounted on the bottom surface of the cavity and the pad are electrically and reliably mounted via a bonding wire having an optimum length or a brazing material layer having an optimum thickness. Can be done. Therefore, the effect (1) can be obtained more reliably.
The positions of the upper surfaces of the plurality of pads formed in the same cavity may be different from each other.

また、本発明には、前記キャビティの底面には、複数の前記凹部および前記パッドが形成されている、配線基板の製造方法(請求項6)も含まれる。
これによれば、少なくとも、実装すべき電子部品に設けられた外部電極の総数と同数となる複数のパッドおよび該パッドごとに凹部が予め形成されているので、前記効果(1)を確実に得ることが可能となる。
尚、前記キャビティの底面は、平面視で矩形(長方形または正方形)状を呈する形態の他、円形状、長円形状、楕円形状、五角形以上の多角形も含んでいる。
また、前記凹部は、平面視で円形状、矩形状、長円形状などを呈する。
The present invention also includes a method for manufacturing a wiring board (claim 6), in which a plurality of the recesses and the pads are formed on the bottom surface of the cavity.
According to this, at least a plurality of pads having the same number as the total number of external electrodes provided on the electronic component to be mounted and recesses are formed in advance for each of the pads, so that the effect (1) can be surely obtained. It becomes possible.
The bottom surface of the cavity includes not only a rectangular (rectangular or square) shape in a plan view, but also a circular shape, an oval shape, an elliptical shape, and a polygonal shape of a pentagon or more.
Further, the recess has a circular shape, a rectangular shape, an oval shape, or the like in a plan view.

加えて、本発明には、前記パッド形成工程の後で、前記キャビティの底面に電子部品を固着し、且つ該電子部品の外部電極と前記パッドとの間を電気的に接続する実装工程を有する、配線基板の製造方法(請求項7)も含まれる。
これによれば、前記効果(1)を有する電子装置を確実に得ることができる。
尚、前記電子部品には、半導体素子、発光素子、圧電素子などが例示される。
In addition, the present invention includes a mounting step of fixing the electronic component to the bottom surface of the cavity and electrically connecting the external electrode of the electronic component and the pad after the pad forming step. , A method for manufacturing a wiring board (claim 7) is also included.
According to this, an electronic device having the effect (1) can be surely obtained.
Examples of the electronic component include a semiconductor element, a light emitting element, and a piezoelectric element.

(A)は本発明の研磨工程を示す概略図、(B)、(C)は第1研削工程を示す概略図。(A) is a schematic view showing a polishing process of the present invention, and (B) and (C) are a schematic view showing a first grinding process. (A)、(B)は第2研削工程を示す概略図、(C)はパッド形成工程を示す概略図、(D)は実装工程を示す概略図。(A) and (B) are schematic views showing a second grinding process, (C) is a schematic view showing a pad forming process, and (D) is a schematic view showing a mounting process. (A)、(B)は異なる形態のパッドが形成された配線基板を示す概略図。(A) and (B) are schematic views showing a wiring board in which pads of different forms are formed. 本発明により得られる前記とは異なる形態の配線基板を示す概略図。The schematic diagram which shows the wiring board of the form different from the said obtained by this invention.

以下において、本発明を実施するための形態について説明する。
図1(A)は、本発明に用いる一形態の基板本体2を示す垂直断面図、および本発明の研磨工程を示す概略図である。
上記基板本体2は、図1(A)に示すように、任意の厚みを有する複数のセラミック層(絶縁材)c1〜c3を一体に積層し、且つ対向する一対の表面3a,4aを有している。上記セラミック層c1〜c3には、それぞれの厚み方向に沿って、複数のビア導体6が適所に形成されている。更に、上記セラミック層c1,c2間には、上下のビア導体6に接続する内層配線5が形成されている。
尚、上記一対の表面3a,4aは、相対的な呼称である。そのため、以下では、研磨後も含め、一方を表面3a,3と称し、且つ他方を裏面4a,4と称する。
また、記セラミック層c1〜c3は、例えば、アルミナを主成分とし、上記内層配線5やビア導体6は、例えば、主にタングステン(以下、単にWと記載する)、あるいは、主にモリブデン(以下、単にMoと記載する)からなる。
Hereinafter, embodiments for carrying out the present invention will be described.
FIG. 1A is a vertical cross-sectional view showing one form of the substrate body 2 used in the present invention, and a schematic view showing the polishing process of the present invention.
As shown in FIG. 1A, the substrate main body 2 has a pair of surfaces 3a and 4a in which a plurality of ceramic layers (insulating materials) c1 to c3 having an arbitrary thickness are integrally laminated and opposed to each other. ing. A plurality of via conductors 6 are formed at appropriate positions in the ceramic layers c1 to c3 along the respective thickness directions. Further, an inner layer wiring 5 connected to the upper and lower via conductors 6 is formed between the ceramic layers c1 and c2.
The pair of surfaces 3a and 4a are relative names. Therefore, in the following, one is referred to as the front surface 3a and 3 and the other is referred to as the back surface 4a and 4 including after polishing.
Further, the ceramic layers c1 to c3 contain, for example, alumina as a main component, and the inner layer wiring 5 and the via conductor 6 are, for example, mainly tungsten (hereinafter, simply referred to as W) or mainly molybdenum (hereinafter, simply referred to as W). , Simply described as Mo).

前記基板本体2は、追って前記セラミック層c1〜c3となる3層のグリーンシートに打ち抜き加工を施し、所定の位置ごとにビアホールを形成し、該ビアホール内ごとにW粉末あるいはMo粉末などを含む導電性ペーストを充填し、何れかのグリーンシートの表面における適所に前記同様の導電性ペーストをパターン印刷した後、上記グリーンシートを積層し且つ焼成して、予め準備されている。
先ず、前記基板本体2における表面3aと裏面4aとに対し、これらを平滑な表面3および裏面(表面)4とする研磨工程を行った。即ち、図1(A)に示すように、基板本体2の表面3aに沿って、水平姿勢の回転軸sに固定されたローラー形状の砥石g1を高速回転させつつ移動させた。更に、基板本体2の裏面4aに沿っても、同様の研磨作業を行った。尚、上記砥石g1の円周面(表面)には、微細なWCなどの超硬砥粒、またはダイヤモンド砥粒などが固着されている。
その結果、図1(B)に示すように、基板本体2における前記表面3aおよび裏面4aは、平面度が±30μm以下(例えば、±3μm)の滑らかさで且つ互いに平行にして対向する表面3および裏面4となった。
In the substrate main body 2, the three layers of green sheets to be the ceramic layers c1 to c3 are punched to form via holes at predetermined positions, and each of the via holes is conductive containing W powder, Mo powder, or the like. The same conductive paste is pattern-printed at appropriate positions on the surface of any of the green sheets, and then the green sheets are laminated and fired to prepare in advance.
First, a polishing step was performed on the front surface 3a and the back surface 4a of the substrate main body 2 to make them a smooth front surface 3 and a back surface (front surface) 4. That is, as shown in FIG. 1A, the roller-shaped grindstone g1 fixed to the rotation axis s in the horizontal posture was moved along the surface 3a of the substrate main body 2 while rotating at high speed. Further, the same polishing work was performed along the back surface 4a of the substrate main body 2. Fine carbide abrasive grains such as WC or diamond abrasive grains are fixed to the circumferential surface (surface) of the grindstone g1.
As a result, as shown in FIG. 1 (B), the front surface 3a and the back surface 4a of the substrate main body 2 have a flatness of ± 30 μm or less (for example, ± 3 μm) and are parallel to each other and face each other. And the back side 4.

次に、図1(B)に示すように、前記基板本体2の表面3における平面視の中央側に対し、該表面3に開口するキャビティ(7)を形成するための第1研削工程を行った。即ち、上記平坦な表面3に対し、垂直姿勢とされた回転軸sと、その下端側に固定したに円柱形の砥石g2とを、回転させつつ、平面視で外周側が矩形状の軌跡を描くように移動させた。かかる研削作業を上記基板本体2の表面3からその厚み方向に沿って複数回にわたって連続して行った。尚、上記砥石g2の円周面と先端面とにも、前記同様のWCの超硬砥粒などが固着されている。
その結果、図1(C)に示すように、平面視で基板本体2における表面3の中央側に開口し、平面視が矩形状の底面8と、該底面8の周辺から前記表面3側に立設した四辺の側面9とからなり、全体が直方体形状を呈するキャビティ7が形成された。上記底面8の平面度は、±10μm以下(例えば、±3μm)の滑らかさであった。
尚、上記キャビティ7の底面8は、中層のセラミック層c2における厚み方向の内部(中間)に位置していた。
Next, as shown in FIG. 1 (B), a first grinding step for forming a cavity (7) opening in the surface 3 is performed on the central side of the surface 3 of the substrate body 2 in a plan view. rice field. That is, while rotating the rotating shaft s in a vertical posture with respect to the flat surface 3 and the cylindrical grindstone g2 fixed to the lower end side thereof, the outer peripheral side draws a rectangular locus in a plan view. I moved it like this. Such grinding work was continuously performed a plurality of times from the surface 3 of the substrate main body 2 along the thickness direction thereof. It should be noted that the same WC carbide abrasive grains and the like are fixed to the circumferential surface and the tip surface of the grindstone g2.
As a result, as shown in FIG. 1 (C), the bottom surface 8 is open to the center side of the surface 3 of the substrate main body 2 in a plan view, and the bottom surface 8 has a rectangular shape in a plan view, and the periphery of the bottom surface 8 is moved to the surface 3 side. A cavity 7 is formed, which is composed of the side surfaces 9 of the four sides that are erected and has a rectangular parallelepiped shape as a whole. The flatness of the bottom surface 8 was ± 10 μm or less (for example, ± 3 μm).
The bottom surface 8 of the cavity 7 was located inside (intermediate) in the thickness direction of the ceramic layer c2 of the middle layer.

次いで、図2(A)に示すように、基板本体2における前記キャビティ7の底面8の適所ごとに対し、該底面8に開口する2つ(複数)の凹部(10)を形成する第2研削工程を行った。即ち、図2(A)において、上記キャビティ7の底面8における右端側の位置で、且つ最下層のセラミック層c3を貫通するビア導体6の上端(一端)側の真上の位置である該底面8に対し、垂直姿勢とされた回転軸sと、その下端側に固定したやや小径な円柱形の砥石g3とを、回転させつつ、平面視で外周側が円形状の軌跡を描くように移動させた。上記砥石g3には、その軸方向に沿って裏面4側に順次接近するように移動する操作も加えられた。 Next, as shown in FIG. 2A, a second grinding that forms two (plurality) recesses (10) that open in the bottom surface 8 at appropriate locations on the bottom surface 8 of the cavity 7 in the substrate body 2. The process was performed. That is, in FIG. 2A, the bottom surface of the cavity 7 is located on the right end side of the bottom surface 8 and directly above the upper end (one end) side of the via conductor 6 penetrating the ceramic layer c3 of the lowermost layer. With respect to 8, the rotating shaft s in a vertical posture and the slightly small-diameter cylindrical grindstone g3 fixed to the lower end side thereof are moved so as to draw a circular locus on the outer peripheral side in a plan view while rotating. rice field. An operation of moving the grindstone g3 so as to sequentially approach the back surface 4 side along the axial direction was also added.

引き続いて、図2(A)で前記キャビティ7の底面8における左端側の位置に対しても、前記と同様な研削作業を行った。尚、前記砥石g3の円周面と先端面とにも、前記同様のWCの超硬砥粒などが固着されている。
その結果、図2(B)に示すように、記キャビティ7の底面8における右端側および左端側の位置ごとに、平面視が円形状を呈し、且つ底面11が最下層のセラミック層c3の厚み方向の内部に位置し、全体が円柱形を呈する2つ(複数)の凹部10が形成された。該凹部10を前記第2研削工程で形成する際において、図2(B)中の破線で示すように、上記セラミック層c3を貫通して形成されていた前記ビア導体6の上端(一端)側6eも同時に研削された。その結果、上記凹部10ごとの底面11には、上記ビア導体6の新たな上端(一端)面が該底面11と面一に露出していた。
Subsequently, in FIG. 2A, the same grinding work as described above was performed on the position on the left end side of the bottom surface 8 of the cavity 7. It should be noted that the same WC carbide abrasive grains and the like are fixed to the circumferential surface and the tip surface of the grindstone g3.
As a result, as shown in FIG. 2 (B), each of the positions on the right end side and the left end side of the bottom surface 8 of the cavity 7 has a circular shape in a plan view, and the bottom surface 11 is the thickness of the ceramic layer c3 which is the lowest layer. Two (plurality) recesses 10 located inside in the direction and having a cylindrical shape as a whole were formed. When the recess 10 is formed in the second grinding step, as shown by the broken line in FIG. 2 (B), the upper end (one end) side of the via conductor 6 formed through the ceramic layer c3. 6e was also ground at the same time. As a result, a new upper end (one end) surface of the via conductor 6 was exposed flush with the bottom surface 11 on the bottom surface 11 of each recess 10.

更に、前記凹部10ごとの内側に、例えば、Au−Sn系合金の粉末を含む導電性ペーストを、図示しないディスペンサーなどの充填手段を用いて充填するパッド形成工程を行った。
その結果、図2(C)に示すように、基部側が凹部10内を占め且つ底面が前記ビア導体6に接続していると共に、上面(頂面)が上記凹部10の開口部よりも外側(上側)のキャビティ7内に位置しており、全体が円柱形状を呈する2つのパッド12が形成された。
引き続いて、上記パッド12を加熱するキュア処理を行って硬化させた後、該パッド12を含む前記基板本体2を、電解ニッケルメッキ浴および電解金メッキ浴に順次浸漬して、上記パッド12ごとの外部に露出する表面に対し、ニッケル膜および金膜(何れも図示せず)を順次被覆するメッキ工程を行った。
その結果、図2(C)に示すように、所望の深さのキャビティ7が基板本体2の表面3側に開口し、前記キャビティ7の底面8に設けた2つの凹部10ごとに底面で前記ビア導体6と電気的に安定した接続された2つのパッド12を有する配線基板1を得ることができた。
Further, a pad forming step was performed in which, for example, a conductive paste containing powder of an Au—Sn alloy was filled inside each of the recesses 10 by using a filling means such as a dispenser (not shown).
As a result, as shown in FIG. 2C, the base side occupies the inside of the recess 10 and the bottom surface is connected to the via conductor 6, and the upper surface (top surface) is outside the opening of the recess 10. Two pads 12 located in the cavity 7 (upper side) and having a cylindrical shape as a whole were formed.
Subsequently, after curing the pad 12 by heating it, the substrate main body 2 including the pad 12 is sequentially immersed in an electrolytic nickel plating bath and an electrolytic gold plating bath to externalize each pad 12. A plating step was performed in which a nickel film and a gold film (neither shown) were sequentially coated on the surface exposed to the surface.
As a result, as shown in FIG. 2C, a cavity 7 having a desired depth is opened on the surface 3 side of the substrate main body 2, and each of the two recesses 10 provided on the bottom surface 8 of the cavity 7 is said to be on the bottom surface. It was possible to obtain a wiring board 1 having two pads 12 electrically stably connected to the via conductor 6.

そして、図2(D)に示すように、前記キャビティ7の底面8における平面視で中央側に電子部品14を接合材(図示せず)などを介して搭載した後、該電子部品14における2つの外部電極(図示せず)と、前記2つのパッド12の上面との間を、ボンディングワイヤー15によって個別に電気的に接続した。
尚、図3(A)に示すように、左右一対の前記パッド12ごとの上面を、前記キャビティ7の底面8とほぼ面一にして形成した形態としても、該パッド12と、前記同様に搭載した電子部品14とを、ボンディングワイヤー15を介して、電気的に容易に接続することができる。また、前記パッド12ごとの上面を、前記凹部10ごとの内側に位置する形態としても、該パッド12と前記電子部品14とを、ボンディングワイヤー15を介して電気的に接続することが可能である。
Then, as shown in FIG. 2D, after mounting the electronic component 14 on the center side of the bottom surface 8 of the cavity 7 via a bonding material (not shown) or the like in a plan view, the electronic component 14 has 2 The two external electrodes (not shown) and the upper surfaces of the two pads 12 were individually electrically connected by a bonding wire 15.
As shown in FIG. 3A, even if the upper surface of each pair of left and right pads 12 is formed so as to be substantially flush with the bottom surface 8 of the cavity 7, the pads 12 are mounted in the same manner as described above. The electronic component 14 can be easily electrically connected to the electronic component 14 via the bonding wire 15. Further, even if the upper surface of each pad 12 is located inside each recess 10, the pad 12 and the electronic component 14 can be electrically connected via the bonding wire 15. ..

更に、図3(B)に示すように、前記2つの凹部10を前記キャビティ7の底面8における左端と右端とのやや中央側に形成し、該凹部10ごとに上面が前記キャビティ7の底面8よりも外側のキャビティ7内に突出するパッド12とした形態の配線基板1としても良い。前記パッド12ごとの上面には、比較的低融点の合金からなるハンダ16を介して、底面の周辺側に図示しない外部電極を有する電子部品14を実装することができる。従って、上記電子部品14をキャビティ7の内側に一層過不足なく配設して実装した電子装置とすることができる。
尚、以上において説明した配線基板1は、前記研磨工程後において、前記基板本体2における裏面4の適所に対し、図示しない複数の外部接続端子を形成し、かかる外部接続端子ごとに前記ビア導体6を介して前記パッド12と個別に導通可能としても良い。あるいは、上記外部接続端子の何れかと、前記キャビティ7の外側に位置しているビア導体6や内層配線5とを導通可能としても良い。
また、前述のボンディングワイヤー15に替えて、ハンダ16により実装することにしても良いし、該ハンダ16に替えて、ボンディングワイヤー15を使用しても良い。
Further, as shown in FIG. 3B, the two recesses 10 are formed on the slightly center side of the left end and the right end of the bottom surface 8 of the cavity 7, and the upper surface of each recess 10 is the bottom surface 8 of the cavity 7. The wiring board 1 may be in the form of a pad 12 protruding into the cavity 7 on the outer side. An electronic component 14 having an external electrode (not shown) on the peripheral side of the bottom surface can be mounted on the upper surface of each pad 12 via a solder 16 made of an alloy having a relatively low melting point. Therefore, the electronic component 14 can be an electronic device mounted by arranging the electronic component 14 inside the cavity 7 in just proportion.
In the wiring board 1 described above, after the polishing step, a plurality of external connection terminals (not shown) are formed at appropriate positions on the back surface 4 of the substrate main body 2, and the via conductor 6 is formed for each of the external connection terminals. It may be possible to conduct the pad 12 individually via the pad 12. Alternatively, any of the external connection terminals may be made conductive with the via conductor 6 and the inner layer wiring 5 located outside the cavity 7.
Further, the bonding wire 15 may be mounted instead of the above-mentioned bonding wire 15, or the bonding wire 15 may be used instead of the solder 16.

図4は、本発明により得られる異なる形態の配線基板1hを示す概略図である。
上記配線基板1hは、複数の樹脂層j1〜j3と複数のセラミック層c1,c2とを積層してなり、対向する表面3および裏面4を有する基板本体2hと、該基板本体2hの表面3における平面視の中央側に開口する平面視が比較的広いキャビティ7と、上記基板本体2hの裏面4に開口し且つ平面視が比較的狭い左右一対のキャビティ7と、を備えている。上記基板本体2hは、予め個別に積層されていた樹脂層j1〜j3とセラミック層c1,c2とを、前記樹脂層j3とセラミック層c1との間において図示しない接着層を介して接着したものである。
尚、上記樹脂層j1〜j3は、例えば、ポリイミド(PI)系樹脂からなり、上記セラミック層c1,c2は、前記同様のアルミナからなる。
FIG. 4 is a schematic view showing a wiring board 1h having a different form obtained by the present invention.
The wiring board 1h is formed by laminating a plurality of resin layers j1 to j3 and a plurality of ceramic layers c1 and c2, and has a substrate main body 2h having an opposing front surface 3 and a back surface 4 and a surface 3 of the substrate main body 2h. It includes a cavity 7 having a relatively wide plan view that opens to the center side of the plan view, and a pair of left and right cavities 7 that open to the back surface 4 of the substrate main body 2h and have a relatively narrow plan view. The substrate body 2h is formed by bonding resin layers j1 to j3 and ceramic layers c1 and c2, which are individually laminated in advance, between the resin layer j3 and the ceramic layer c1 via an adhesive layer (not shown). be.
The resin layers j1 to j3 are made of, for example, a polyimide (PI) -based resin, and the ceramic layers c1 and c2 are made of the same alumina.

また、前記樹脂層j1〜j3間には、複数の内層配線17と、これらの間を接続し、且つ樹脂層j2,j3を個別に貫通するビア(フィルドビア)導体18と、が形成されている。上記内層配線17とビア導体18は、主に銅からなり、上記樹脂層j1〜j3と共に、フォトリゾグラフィ技術により適宜形成されている。
前記樹脂層j3とセラミック層c1との間には、予め該セラミック層c1側の片面に形成された複数の内層配線5が位置している。該内層配線5は、上記ビア導体18を介して、前記表面3に開口するキャビティ7の底面8に開口する凹部10ごとに形成されたパッド12と個別に導通可能とされている。更に、当該内層配線5は、セラミック層c1を貫通するビア導体6を介して、前記裏面4に開口する2つのキャビティ7の底面(天井面)8に開口する凹部10ごとに形成されたパッド12とも個別に導通可能とされている。
Further, a plurality of inner layer wirings 17 and via (filled via) conductors 18 connecting between the resin layers j1 to j3 and individually penetrating the resin layers j2 and j3 are formed between the resin layers j1 to j3. .. The inner layer wiring 17 and the via conductor 18 are mainly made of copper, and are appropriately formed together with the resin layers j1 to j3 by a photolithography technique.
A plurality of inner layer wirings 5 previously formed on one side of the ceramic layer c1 are located between the resin layer j3 and the ceramic layer c1. The inner layer wiring 5 is made electrically conductive with the pad 12 formed for each recess 10 opened in the bottom surface 8 of the cavity 7 opening in the surface 3 via the via conductor 18. Further, the inner layer wiring 5 is a pad 12 formed for each recess 10 opened in the bottom surface (ceiling surface) 8 of the two cavities 7 opened in the back surface 4 via the via conductor 6 penetrating the ceramic layer c1. Both are individually conductive.

前記のような配線基板1hを得るには、予め、前記基板本体2hを用意し、その表面3aおよび裏面4aを研磨して、滑らかな表面3および裏面4とした。
次に、上記表面3および裏面4における適所ごとに対し、前記同様の第1研削工程を行って、上記表面3の中央側に広く開口し、且つ底面8が中層の樹脂層j2における厚み方向の内部(中間)に位置するキャビティ7と、上記裏面4の左右に狭く開口し、且つ底面(天井面)8が下層のセラミック層c2における厚み方向の中間に位置する2つのキャビティ7と、を順次形成した。
次いで、上記キャビティ7ごとの底面8における適所ごとに対し、前記同様の第2研削工程を順次行って、前記底面8ごとに左右一対ずつの凹部10を形成した。この際、前記樹脂層j2,j3間に位置していた前記ビア導体18ごとの上面(片面)側と、前記ビア導体6ごとの下端(一端)側も同時に研削されていた。
In order to obtain the wiring board 1h as described above, the board body 2h was prepared in advance, and the front surface 3a and the back surface 4a were polished to obtain smooth front surfaces 3 and back surfaces 4.
Next, the same first grinding step is performed on the front surface 3 and the back surface 4 at appropriate locations so that the surface 3 is widely opened to the center side and the bottom surface 8 is in the thickness direction of the middle resin layer j2. A cavity 7 located inside (middle) and two cavities 7 that are narrowly opened to the left and right of the back surface 4 and whose bottom surface (ceiling surface) 8 is located in the middle of the lower ceramic layer c2 in the thickness direction are sequentially arranged. Formed.
Next, the same second grinding step was sequentially performed for each suitable place on the bottom surface 8 of each of the cavities 7, and a pair of left and right recesses 10 were formed for each of the bottom surfaces 8. At this time, the upper surface (one side) side of each via conductor 18 located between the resin layers j2 and j3 and the lower end (one end) side of each via conductor 6 were also ground at the same time.

更に、前記凹部10内ごとに対し、前記同様の導電性ペーストを充填するパッド形成工程を順次行って、前記図4で示したように、上面がキャビティ7ごとの底面8よりも外側の該キャビティ7内に位置する複数の前記パッド12を得ることができた。そして、該パッド12ごとの露出面に対し、前記メッキ工程を施して前記同様の金属膜を順次被覆した。
その結果、前記図4で示したように、基板本体2hの表面3および裏面4に開口する所望の深さである複数のキャビティ7と、該キャビティ7ごとの底面8に形成された複数の凹部10と、該凹部10内ごとに少なくとも基部側が位置する複数のパッド12と、該パッド12ごとの底面と電気的に安定して接続されたビア導体6,18とを有する前記配線基板1hを得ることができた。
尚、配線基板1hの基板本体2は、5層(複数層)のセラミック層のみを積層した形態、あるいは、5層(複数層)の樹脂層のみを積層した形態としても良い。
また、前記ハンダ16に替え、前記ボンディングワイヤー15を用いても良い。
Further, a pad forming step of filling each of the recesses 10 with the same conductive paste is sequentially performed, and as shown in FIG. 4, the cavity whose upper surface is outside the bottom surface 8 of each cavity 7 is formed. It was possible to obtain a plurality of the pads 12 located within 7. Then, the exposed surface of each pad 12 was subjected to the plating step to sequentially coat the same metal film.
As a result, as shown in FIG. 4, a plurality of cavities 7 having a desired depth to open in the front surface 3 and the back surface 4 of the substrate main body 2h, and a plurality of recesses formed in the bottom surface 8 of each cavity 7. 10, the wiring board 1h having a plurality of pads 12 having at least a base side located in each of the recesses 10 and via conductors 6 and 18 electrically stably connected to the bottom surface of each pad 12 is obtained. I was able to.
The substrate main body 2 of the wiring board 1h may be in a form in which only five layers (plurality of layers) of ceramic layers are laminated, or in a form in which only five layers (plurality of layers) of resin layers are laminated.
Further, the bonding wire 15 may be used instead of the solder 16.

前述した配線基板1,1hの製造方法によれば、前記第1研削工程により、基板本体2,2hにおける少なくも一方の表面3を研削し、比較的高い平面度の底面8を含むキャビティ7を形成し、前記第2研削工程により、前記キャビティ7の底面8の一部に凹部10を形成し、前記パッド形成工程により、該凹部10内ごとに少なくも基部側が位置するパッド12を形成している。その結果、該パッド12の上面の位置を適宜選択することで、上記キャビティ7の深さを、追って実装すべき電子部品14の厚みなどに応じた過不足のない最適なものにできる。
加えて、前記配線基板1,1hのように基板本体2を構成する絶縁材がセラミックの場合、前記キャビティ7を第1研削工程により形成するため、焼成により形成した場合に比べ、該キャビティ7の底面8の平面度を高くすることができる。
更に、前記第2研削工程により、前記キャビティ7の底面8の一部に設けた凹部10の底面11には、当該凹部10の底面11の研削と同時に、一端側が研削された前記ビア導体6,18の一端面が露出している。そのため、該ビア導体6,18と凹部10内に位置するパッド12との電気的な接続を、確実に安定したものとできる。
従って、前記配線基板1,1hの製造方法によれば、前記効果(1),(2)を確実に奏することができる。
According to the manufacturing method of the wiring boards 1 and 1h described above, at least one surface 3 of the substrate main bodies 2 and 2h is ground by the first grinding step, and the cavity 7 including the bottom surface 8 having a relatively high flatness is formed. By the second grinding step, a recess 10 is formed in a part of the bottom surface 8 of the cavity 7, and by the pad forming step, a pad 12 in which at least the base side is located is formed in each of the recesses 10. There is. As a result, by appropriately selecting the position of the upper surface of the pad 12, the depth of the cavity 7 can be optimally adjusted according to the thickness of the electronic component 14 to be mounted later.
In addition, when the insulating material constituting the substrate main body 2 is ceramic as in the wiring boards 1 and 1h, the cavity 7 is formed by the first grinding step, so that the cavity 7 is formed as compared with the case where the cavity 7 is formed by firing. The flatness of the bottom surface 8 can be increased.
Further, in the bottom surface 11 of the recess 10 provided in a part of the bottom surface 8 of the cavity 7 by the second grinding step, the via conductor 6 and one end side are ground at the same time as the bottom surface 11 of the recess 10 is ground. One end surface of 18 is exposed. Therefore, the electrical connection between the via conductors 6 and 18 and the pad 12 located in the recess 10 can be surely stabilized.
Therefore, according to the manufacturing method of the wiring boards 1, 1h, the effects (1) and (2) can be surely achieved.

本発明は、以上において説明した各形態に限定されるものではない。
例えば、前記基板本体2,2hを構成する絶縁材は、ムライトや窒化アルミニウムなどの高温焼成セラミックや、ガラス−セラミックなどの低温焼成セラミック、あるいは、エポキシ系などの樹脂としても良い。前記ガラス−セラミックなどやエポキシ系樹脂などの場合、前記ビア導体6,18や内層配線5,17には、例えば、銅や銀が適用される。
また、前記基板本体2,2hは、前記セラミック粉末あるいは樹脂粉末を3Dプリンターにより直接立体的に制作するか、あるいは、セラミックスラリーあるいは樹脂スラリーを、予め内部空間に前記ビア導体6などが配設された所定の鋳型内に充填した後、該スラリーを硬化させて制作しても良い。
The present invention is not limited to each of the forms described above.
For example, the insulating material constituting the substrate main body 2 and 2h may be a high-temperature co-fired ceramic such as mullite or aluminum nitride, a low-temperature co-fired ceramic such as glass-ceramic, or an epoxy-based resin. In the case of the glass-ceramic or the like or an epoxy resin, for example, copper or silver is applied to the via conductors 6 and 18 and the inner layer wirings 5 and 17.
Further, in the substrate main body 2 and 2h, the ceramic powder or the resin powder is directly three-dimensionally produced by a 3D printer, or the ceramic slurry or the resin slurry is arranged in advance in the internal space such as the via conductor 6. After filling in a predetermined mold, the slurry may be cured to produce the slurry.

更に、前記基板本2,2hの表面3,3aや裏面4,4aは、平面視で矩形状、あるいは五角形以上の正多角形または変形多角形を呈する形態であっても良い。
また、前記キャビティは、平面視が円形状、長円形状、楕円形状、五角形以上の正多角形または変形多角形を呈する形態であっても良い。
更に、前記凹部は、平面視で矩形状、長円形状、楕円形状、五角形以上の正多角形または変形多角形を呈する形態であっても良いし、1つのキャビティの底面に1つを設けるか、あるいは3つ以上が併設されていても良い。
加えて、前記キャビティ7および凹部10は、前記基板本2,2hの裏面4側にのみ形成された形態の配線基板としても良い。
Further, the front surfaces 3, 3a and the back surfaces 4, 4a of the substrate pieces 2 and 2h may have a rectangular shape in a plan view, or a regular polygon or a deformed polygon of a pentagon or more.
Further, the cavity may have a circular shape, an oval shape, an elliptical shape, a regular polygon of a pentagon or more, or a deformed polygon in a plan view.
Further, the recess may have a rectangular shape, an oval shape, an elliptical shape, a regular polygon of a pentagon or more, or a deformed polygon in a plan view, or one is provided on the bottom surface of one cavity. Or, three or more may be installed side by side.
In addition, the cavity 7 and the recess 10 may be a wiring board formed only on the back surface 4 side of the substrate books 2 and 2h.

本発明によれば、絶縁材からなる基板本体における一対の表面の少なくとも一方に、実装すべき電子部品の厚みに最適な深さのキャビティを有し、且つ該キャビティの底面に設けるパッドと該パッドに接するビア導体との電気的接続が安定していると共に、上記キャビティの底面が高い平面度を有している配線基板の製造方法を確実に提供することができる。 According to the present invention, on at least one of a pair of surfaces of a substrate body made of an insulating material, a cavity having a depth optimum for the thickness of the electronic component to be mounted is provided, and a pad and the pad provided on the bottom surface of the cavity are provided. It is possible to reliably provide a method for manufacturing a wiring board in which the electrical connection with the via conductor in contact with the via conductor is stable and the bottom surface of the cavity has a high flatness.

1,1h……配線基板
2,2h……基板本体
3a,3……表面
4a,4……裏面(表面)
6,18……ビア導体
7……………キャビティ
8……………キャビティの底面
9……………キャビティの側面
10…………凹部
11…………凹部の底面
12…………パッド
14…………電子部品
c1〜c3…セラミック層(絶縁材)
J1〜j3…樹脂層(絶縁材)
1,1h ... Wiring board 2,2h ... Board body 3a, 3 ... Front side 4a, 4 ... Back side (front side)
6, 18 …… Via conductor 7 ……………… Cavity 8 ……………… Bottom of the cavity 9 ……………… Side of the cavity 10 ………… Recess 11 ………… Bottom of the recess 12 ………… … Pad 14 ………… Electronic components c1 to c3… Ceramic layer (insulating material)
J1 to j3 ... Resin layer (insulating material)

Claims (7)

絶縁材からなり、対向する一対の表面を有する基板本体と、該基板本体の少なくとも一方の表面に開口するキャビティと、該キャビティの底面に開口する少なくとも1つの凹部と、該凹部内に少なくも基部側が形成され、上記基板本体内の厚み方向に沿って形成されたビア導体に接続するパッドと、を備えてなる配線基板の製造方法であって、
絶縁材からなり、対向する一対の表面を有し、且つ該一対の表面間の厚み方向に沿ったビア導体を内設する基板本体を用意する基板本体準備工程と、
上記基板本体における少なくも一方の表面を研削して、比較的高い平面度の底面と該底面の周辺から立設した側面とを有するキャビティを形成する第1研削工程と、
上記キャビティの底面の一部と上記ビア導体の一端側とを研削して、該ビア導体の一端側が底面に露出する凹部を形成する第2研削工程と、
上記凹部内に金属粉末を含む導電性ペーストを充填して、前記凹部内に少なくも基部側が位置するパッドを形成するパッド形成工程と、を含む、
ことを特徴とする配線基板の製造方法。
A substrate body made of an insulating material and having a pair of opposing surfaces, a cavity that opens to at least one surface of the substrate body, at least one recess that opens to the bottom surface of the cavity, and at least a base in the recess. A method for manufacturing a wiring board, comprising: a pad for connecting to a via conductor whose side is formed and formed along the thickness direction in the board body.
A substrate body preparation step of preparing a substrate body made of an insulating material, having a pair of opposing surfaces, and internally providing a via conductor along the thickness direction between the pair of surfaces.
The first grinding step of grinding at least one surface of the substrate body to form a cavity having a bottom surface having a relatively high flatness and a side surface erected from the periphery of the bottom surface.
A second grinding step of grinding a part of the bottom surface of the cavity and one end side of the via conductor to form a recess in which one end side of the via conductor is exposed to the bottom surface.
The recess includes a pad forming step of filling the recess with a conductive paste containing a metal powder to form a pad in which the base side is located at least in the recess.
A method for manufacturing a wiring board, which is characterized in that.
前記キャビティの底面の平面度は、±10μm以下である、
ことを特徴とする請求項1に記載の配線基板の製造方法。
The flatness of the bottom surface of the cavity is ± 10 μm or less.
The method for manufacturing a wiring board according to claim 1, wherein the wiring board is manufactured.
前記第1研削工程の前に、前記基板本体において対向する一対の表面を研磨して、該一対の表面を互いに平行とする研磨工程を有する、
ことを特徴とする請求項1または2に記載の配線基板の製造方法。
Prior to the first grinding step, there is a polishing step of polishing a pair of opposing surfaces in the substrate body to make the pair of surfaces parallel to each other.
The method for manufacturing a wiring board according to claim 1 or 2, wherein the wiring board is manufactured.
前記研磨工程後において、前記基板本体において対向する一対の表面における平面度は、±30μm以下である、
ことを特徴とする請求項3に記載の配線基板の製造方法。
After the polishing step, the flatness of the pair of surfaces facing each other in the substrate body is ± 30 μm or less.
The method for manufacturing a wiring board according to claim 3, wherein the wiring board is manufactured.
前記パッドの上面は、前記基板本体の厚み方向において、前記凹部の内側に位置するか、該凹部の開口部と面一であるか、あるいは、前記凹部の開口部よりも外側で且つ前記キャビティの内側に位置している、
ことを特徴とする請求項1乃至4の何れか一項に記載の配線基板の製造方法。
The upper surface of the pad is located inside the recess in the thickness direction of the substrate body, is flush with the opening of the recess, or is outside the opening of the recess and of the cavity. Located inside,
The method for manufacturing a wiring board according to any one of claims 1 to 4, wherein the wiring board is manufactured.
前記キャビティの底面には、複数の前記凹部および前記パッドが形成されている、
ことを特徴とする請求項1乃至5の何れか一項に記載の配線基板の製造方法。
A plurality of the recesses and the pads are formed on the bottom surface of the cavity.
The method for manufacturing a wiring board according to any one of claims 1 to 5, wherein the wiring board is manufactured.
前記パッド形成工程の後で、前記キャビティの底面に電子部品を固着し、且つ該電子部品の外部電極と前記パッドとの間を電気的に接続する実装工程を有する、
ことを特徴とする請求項1乃至6の何れか一項に記載の配線基板の製造方法。
After the pad forming step, there is a mounting step of fixing the electronic component to the bottom surface of the cavity and electrically connecting the external electrode of the electronic component and the pad.
The method for manufacturing a wiring board according to any one of claims 1 to 6, wherein the wiring board is manufactured.
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