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JP7147689B2 - Method for producing imino group-containing organooxysilane compound - Google Patents
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JP7147689B2 - Method for producing imino group-containing organooxysilane compound - Google Patents

Method for producing imino group-containing organooxysilane compound Download PDF

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JP7147689B2
JP7147689B2 JP2019103828A JP2019103828A JP7147689B2 JP 7147689 B2 JP7147689 B2 JP 7147689B2 JP 2019103828 A JP2019103828 A JP 2019103828A JP 2019103828 A JP2019103828 A JP 2019103828A JP 7147689 B2 JP7147689 B2 JP 7147689B2
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洋一 殿村
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Shin Etsu Chemical Co Ltd
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本発明は、イミノ基含有オルガノキシシラン化合物の製造方法に関する。 TECHNICAL FIELD The present invention relates to a method for producing an imino group-containing organooxysilane compound.

含窒素オルガノキシシラン化合物は、塗料添加剤、接着剤、シランカップリング剤、繊維処理剤および表面処理剤等として有用である。
特に、イミノ基含有オルガノキシシラン化合物は、アミノ基が保護された構造を有しているため、エポキシ樹脂原料と混合して一液型組成物とすることができ、アミノ系シランカップリング剤添加の効果(接着性、補強性向上)を有する硬化性組成物として有用である。すなわち、イミノ基含有オルガノキシシラン化合物を含む組成物は、水分を遮断した系では反応性を示さず安定であるが、水分と接触することにより、イミノ基の加水分解による脱保護が起こってアミノ基が再生し、アミノ系シランカップリング剤を添加した場合と同等の効果を示す。
Nitrogen-containing organooxysilane compounds are useful as paint additives, adhesives, silane coupling agents, fiber treatment agents, surface treatment agents, and the like.
In particular, the imino group-containing organooxysilane compound has a structure in which the amino group is protected. It is useful as a curable composition having the effect of (adhesiveness, reinforcing property improvement). That is, a composition containing an imino group-containing organooxysilane compound does not exhibit reactivity in a moisture-blocked system and is stable. The group is regenerated and shows the same effect as when an amino-based silane coupling agent is added.

イミノ基含有オルガノキシシラン化合物の製造方法としては、例えば、3-アミノプロピルトリメトキシシランとシンナムアルデヒドを、有機溶媒を用いて共沸脱水させながら反応させる方法(特許文献1参照)、メチルイソブチルケトンの還流下、3-アミノプロピルトリメトキシシランを滴下して共沸脱水させながら反応させる方法(特許文献2参照)、トルエン還流下において、ベンズアルデヒドと3-アミノプロピルトリメトキシシランを共沸脱水させながら反応させる方法(特許文献3参照)等が提案されている。
これらのように、カルボニル基含有化合物とアミノオルガノキシシラン化合物との反応副生物として生じた水を、反応中の共沸脱水により、速やかに反応器内から水分を留出する方法が一般的に広く用いられている。
Examples of the method for producing an imino group-containing organooxysilane compound include a method of reacting 3-aminopropyltrimethoxysilane and cinnamaldehyde with an organic solvent while azeotropic dehydration (see Patent Document 1), and methyl isobutyl ketone. under reflux of, 3-aminopropyltrimethoxysilane is added dropwise for reaction while azeotropic dehydration (see Patent Document 2), and benzaldehyde and 3-aminopropyltrimethoxysilane are azeotropically dehydrated under reflux of toluene. A reaction method (see Patent Document 3) and the like have been proposed.
As described above, water produced as a by-product of the reaction between the carbonyl group-containing compound and the aminoorganoxysilane compound is generally azeotropically dehydrated during the reaction to rapidly distill the water out of the reactor. Widely used.

米国第2942019号明細書U.S. Pat. No. 2,942,019 特開平7-247294号公報JP-A-7-247294 特開2017-66335号公報JP 2017-66335 A

上記特許文献1~3に記載された方法おいて、反応副生物として生じた水を反応中の共沸脱水によって速やかに反応器内から留去している理由は、(1)反応の平衡をイミノ基生成反応側に傾かせた状態で反応を進行させるため、および(2)副生した水によって、生成したイミノ基含有オルガノキシシランの加水分解縮合反応が生じることを防止するためである。
しかし、特にケイ素原子に結合しているオルガノキシ基がメトキシ基やエトキシ基のような嵩高くない基である場合は、共沸脱水時の温度が高温となり、その結果、水が留出するよりも先に目的物のイミノ基含有オルガノキシシラン化合物の加水分解縮合反応に供されて目的物の収率が低下し、工業的に有利でない場合があった。
In the methods described in Patent Documents 1 to 3 above, the reason why the water produced as a reaction by-product is quickly distilled off from the reactor by azeotropic dehydration during the reaction is that (1) the equilibrium of the reaction is This is to allow the reaction to proceed in a state inclined toward the imino group-forming reaction side, and (2) to prevent the by-produced water from causing a hydrolytic condensation reaction of the formed imino group-containing organooxysilane.
However, especially when the organooxy group bonded to the silicon atom is a non-bulky group such as a methoxy group or an ethoxy group, the temperature during azeotropic dehydration is high, and as a result, water is distilled rather than distilled. In some cases, the target imino group-containing organosilane compound is first subjected to the hydrolytic condensation reaction, resulting in a decrease in the yield of the target product, which is not industrially advantageous.

本発明は、上記事情に鑑みなされたものであり、イミノ基含有オルガノキシシラン化合物を、効率的かつ収率よく製造できる方法を提供することを目的とする。 SUMMARY OF THE INVENTION An object of the present invention is to provide a method for producing an imino group-containing organooxysilane compound efficiently and in good yield.

本発明者は上記目的を達成するため鋭意検討を重ねた結果、特にイミノ基生成反応が速く、イミノ基生成反応側に平衡が偏っている反応系、すなわち原料のカルボニル基含有化合物としてアルデヒド化合物を用いた系では、反応中に、反応副生物として生じた水を共沸脱水によって反応系外に除去するよりも、反応後に水を除去する方が、むしろ大きな収率低下を伴わずに目的のイミノ基含有オルガノキシシラン化合物が得られることを知見し、本発明を完成させた。 As a result of intensive studies to achieve the above object, the present inventors have found that the imino group-generating reaction is particularly rapid and the equilibrium is biased toward the imino group-generating reaction, that is, an aldehyde compound is used as a raw material containing a carbonyl group. In the system used, rather than removing water produced as a reaction by-product during the reaction from the reaction system by azeotropic dehydration, it is better to remove water after the reaction without a large decrease in yield. The inventors have found that an imino group-containing organooxysilane compound can be obtained, and completed the present invention.

すなわち、本発明は、
1. 下記一般式(1)

Figure 0007147689000001
(式中、R1は、水素原子またはヘテロ原子を含んでいてもよい炭素数1~20のm価炭化水素基を表し、R2は、水素原子または炭素数1~20の1価炭化水素基を表し、mは、1~10の整数を表す。)
で示されるカルボニル基含有化合物と、
下記一般式(2)
Figure 0007147689000002
(式中、R3は、炭素数1~20の2価炭化水素基を表し、R4およびR5は、それぞれ独立して炭素数1~20の1価炭化水素基を表し、nは、0、1または2を表す。)
で示されるアミノオルガノキシシラン化合物を反応させる、下記一般式(3)
Figure 0007147689000003
(式中、R1~R5、mおよびnは、前記と同じ意味を表す。)
で示されるイミノ基含有オルガノキシシラン化合物の製造方法であって、
副生物として生じた水を反応系外へ除去することなく前記反応を行い、前記反応の終了後に前記水を除去する工程を有することを特徴とするイミノ基含有オルガノキシシラン化合物の製造方法、
2. 前記水を除去する工程が、反応液の分液操作で二層分離した水層を除去することにより行われる1のイミノ基含有オルガノキシシラン化合物の製造方法、
3. 前記R2が、水素原子である1または2のイミノ基含有オルガノキシシラン化合物の製造方法
を提供する。 That is, the present invention
1. General formula (1) below
Figure 0007147689000001
(In the formula, R 1 represents a hydrogen atom or an m-valent hydrocarbon group having 1 to 20 carbon atoms which may contain a heteroatom; R 2 represents a hydrogen atom or a monovalent hydrocarbon group having 1 to 20 carbon atoms; group, and m represents an integer of 1 to 10.)
A carbonyl group-containing compound represented by
General formula (2) below
Figure 0007147689000002
(wherein R 3 represents a divalent hydrocarbon group having 1 to 20 carbon atoms, R 4 and R 5 each independently represent a monovalent hydrocarbon group having 1 to 20 carbon atoms, and n is represents 0, 1 or 2.)
The following general formula (3) is reacted with an aminoorganoxysilane compound represented by
Figure 0007147689000003
(In the formula, R 1 to R 5 , m and n have the same meanings as above.)
A method for producing an imino group-containing organooxysilane compound represented by
A method for producing an imino group-containing organooxysilane compound, characterized in that the reaction is carried out without removing water produced as a by-product out of the reaction system, and the water is removed after completion of the reaction,
2. 1. Method for producing an imino group-containing organooxysilane compound, wherein the step of removing water is performed by removing a water layer separated into two layers by a liquid separation operation of the reaction solution;
3. Provided is a method for producing an organooxysilane compound containing one or two imino groups, wherein R 2 is a hydrogen atom.

本発明によれば、塗料添加剤、接着剤、シランカップリング剤、繊維処理剤、表面処理剤等として有用な含窒素オルガノキシシラン化合物を、効率的かつ収率よく製造することができる。 INDUSTRIAL APPLICABILITY According to the present invention, nitrogen-containing organosilane compounds useful as paint additives, adhesives, silane coupling agents, fiber treatment agents, surface treatment agents, etc. can be produced efficiently and in good yield.

以下、本発明について具体的に説明する。
本発明の下記一般式(3)で示されるイミノ基含有オルガノキシシラン化合物の製造方法は、下記一般式(1)で示されるカルボニル基含有化合物と、下記一般式(2)で示されるアミノオルガノキシシラン化合物を、反応時に副生物として生じた水を反応系外へ除去することなく反応させ、反応終了後に副生した水を除去することを特徴とする。
The present invention will be specifically described below.
A method for producing an imino group-containing organosilane compound represented by the following general formula (3) of the present invention comprises a carbonyl group-containing compound represented by the following general formula (1) and an aminoorgano compound represented by the following general formula (2). The xysilane compound is reacted without removing water produced as a by-product during the reaction to the outside of the reaction system, and the water produced as a by-product is removed after the completion of the reaction.

Figure 0007147689000004
Figure 0007147689000004

一般式(1)および(3)において、R1は、水素原子またはヘテロ原子を含んでいてもよい炭素数1~20のm価炭化水素基を表し、R2は、水素原子または炭素数1~20の1価炭化水素基を表し、mは、1~10の整数を表す。
また、一般式(2)および(3)において、R3は、炭素数1~20の2価炭化水素基を表し、R4およびR5は、それぞれ独立して炭素数1~20の1価炭化水素基を表し、nは、0、1または2を表す。
In general formulas (1) and (3), R 1 represents a hydrogen atom or an m-valent hydrocarbon group having 1 to 20 carbon atoms which may contain a heteroatom, and R 2 is a hydrogen atom or a C 1 represents a monovalent hydrocarbon group of ∼20, and m represents an integer of 1-10;
In general formulas (2) and (3), R 3 represents a divalent hydrocarbon group having 1 to 20 carbon atoms, and R 4 and R 5 each independently represent a monovalent hydrocarbon group having 1 to 20 carbon atoms. represents a hydrocarbon group, and n represents 0, 1 or 2;

上記R1のヘテロ原子を含んでいてもよい、炭素数1~20、好ましくは炭素数1~10のm価炭化水素基は、直鎖状、分岐鎖状、環状のいずれでもよく、その具体例としては、メチル、エチル、n-プロピル、n-ブチル、n-ペンチル、n-ヘキシル、n-ヘプチル、n-オクチル、n-デシル、ドデシル、テトラデシル、ヘキサデシル、オクタデシル、イコシル基等の直鎖状アルキル基;イソプロピル、イソブチル、sec-ブチル、tert-ブチル、テキシル、2-エチルヘキシル基等の分岐鎖状アルキル基;シクロペンチル、シクロヘキシル基等の環状アルキル基;ビニル、アリル(2-プロペニル)、1-プロペニル基等のアルケニル基;フェニル、トリル基等のアリール基;ベンジル基等のアラルキル基;ピリジル、ピラジル基等のヘテロ原子含有アリール基;メチレン、エチレン、メチルエチレン(プロピレン)、トリメチレン、1-メチルトリメチレン、2-メチルトリメチレン(イソブチレン)、テトラメチレン、ヘキサメチレン、オクタメチレン、デカメチレン基等のアルキレン基;フェニレン基等のアリーレン基;メチレンフェニレン、メチレンフェニレンメチレン基等のアラルキレン基;1-オキサメチレン、1-アザメチレン基等のヘテロ原子含有アルキレン基等が挙げられる。 The m-valent hydrocarbon group of R 1 having 1 to 20 carbon atoms, preferably 1 to 10 carbon atoms, which may contain a heteroatom, may be linear, branched or cyclic. Examples include linear groups such as methyl, ethyl, n-propyl, n-butyl, n-pentyl, n-hexyl, n-heptyl, n-octyl, n-decyl, dodecyl, tetradecyl, hexadecyl, octadecyl, and icosyl groups. branched alkyl groups such as isopropyl, isobutyl, sec-butyl, tert-butyl, thexyl and 2-ethylhexyl groups; cyclic alkyl groups such as cyclopentyl and cyclohexyl groups; vinyl, allyl (2-propenyl), 1 - alkenyl groups such as propenyl group; aryl groups such as phenyl and tolyl groups; aralkyl groups such as benzyl group; heteroatom-containing aryl groups such as pyridyl and pyrazyl groups; alkylene groups such as methyltrimethylene, 2-methyltrimethylene (isobutylene), tetramethylene, hexamethylene, octamethylene and decamethylene groups; arylene groups such as phenylene groups; aralkylene groups such as methylenephenylene and methylenephenylenemethylene groups; Examples thereof include heteroatom-containing alkylene groups such as oxamethylene and 1-azamethylene groups.

これらの中でも、特に原料の入手容易性、生成物の有用性の観点から、R1は、メチル基、エチル基、n-プロピル基等の炭素数1~3のアルキル基;フェニル基、トリル基等の炭素数6~7のアリール基;フェニレン基が好ましい。 Among these, from the viewpoint of availability of raw materials and usefulness of products, R 1 is an alkyl group having 1 to 3 carbon atoms such as methyl group, ethyl group, n-propyl group; phenyl group, tolyl group; An aryl group having 6 to 7 carbon atoms such as a phenylene group is preferred.

上記R2、R4およびR5の炭素数1~20、好ましくは炭素数1~10、より好ましくは炭素数1~5の1価炭化水素基は、直鎖状、分岐鎖状、環状のいずれでもよく、その具体例としては、メチル、エチル、n-プロピル、n-ブチル、n-ペンチル、n-ヘキシル、n-ヘプチル、n-オクチル、n-デシル、ドデシル、テトラデシル、ヘキサデシル、オクタデシル、イコシル基等の直鎖状アルキル基;イソプロピル、イソブチル、sec-ブチル、tert-ブチル、テキシル、2-エチルヘキシル基等の分岐鎖状アルキル基;シクロペンチル、シクロヘキシル基等の環状アルキル基;ビニル、アリル、ブテニル、ペンテニル基等のアルケニル基;フェニル、トリル基等のアリール基;ベンジル基等のアラルキル基等が挙げられる。 The monovalent hydrocarbon group having 1 to 20 carbon atoms, preferably 1 to 10 carbon atoms, and more preferably 1 to 5 carbon atoms for R 2 , R 4 and R 5 may be linear, branched or cyclic. Any of them may be used, and specific examples include methyl, ethyl, n-propyl, n-butyl, n-pentyl, n-hexyl, n-heptyl, n-octyl, n-decyl, dodecyl, tetradecyl, hexadecyl, octadecyl, Linear alkyl groups such as icosyl group; branched alkyl groups such as isopropyl, isobutyl, sec-butyl, tert-butyl, thexyl and 2-ethylhexyl groups; cyclic alkyl groups such as cyclopentyl and cyclohexyl groups; vinyl, allyl, Examples include alkenyl groups such as butenyl and pentenyl groups; aryl groups such as phenyl and tolyl groups; and aralkyl groups such as benzyl groups.

これらの中でも、特に原料の入手容易性、生成物の有用性の観点から、R2は、メチル基、エチル基、n-プロピル基等の炭素数1~3のアルキル基;アリル基、ブテニル基、ペンテニル基等の炭素数2~5のアルケニル基が好ましく、水素原子がより好ましく、R4およびR5は、メチル基、エチル基、プロピル基等の炭素数1~3のアルキル基が好ましい。 Among these, from the viewpoint of availability of raw materials and usefulness of products, R 2 is an alkyl group having 1 to 3 carbon atoms such as methyl group, ethyl group and n-propyl group; allyl group and butenyl group; , pentenyl group and other alkenyl groups having 2 to 5 carbon atoms are preferred, and hydrogen atoms are more preferred. R 4 and R 5 are preferably C 1 to 3 alkyl groups such as methyl, ethyl and propyl groups.

上記R3の炭素数1~20、好ましくは炭素数1~10、より好ましくは炭素数1~5の2価炭化水素基は、直鎖状、分岐鎖状、環状のいずれでもよく、その具体例としては、メチレン、エチレン、メチルエチレン(プロピレン)、トリメチレン、1-メチルトリメチレン、2-メチルトリメチレン(イソブチレン)、テトラメチレン、ヘキサメチレン、オクタメチレン、デカメチレン基等のアルキレン基;フェニレン基等のアリーレン基;エチレンフェニレン、エチレンフェニレンメチレン基等のアラルキレン基等が挙げられる。 The divalent hydrocarbon group of R 3 having 1 to 20 carbon atoms, preferably 1 to 10 carbon atoms, more preferably 1 to 5 carbon atoms, may be linear, branched or cyclic. Examples include alkylene groups such as methylene, ethylene, methylethylene (propylene), trimethylene, 1-methyltrimethylene, 2-methyltrimethylene (isobutylene), tetramethylene, hexamethylene, octamethylene, and decamethylene groups; phenylene groups, etc. and aralkylene groups such as ethylenephenylene and ethylenephenylenemethylene groups.

これらの中でも、特に原料の入手容易性、生成物の有用性の観点から、R3は、メチレン基、エチレン基、メチルエチレン(プロピレン)基、トリメチレン基等の炭素数1~3のアルキレン基;フェニレン基が好ましい。 Among these, from the viewpoint of the availability of raw materials and the usefulness of the product, R 3 is an alkylene group having 1 to 3 carbon atoms such as a methylene group, an ethylene group, a methylethylene (propylene) group, and a trimethylene group; A phenylene group is preferred.

上記一般式(1)中のmは1~10の整数を表すが、1~5の整数が好ましく、また、上記一般式(2)中のnは、0、1または2であるが、0または1が好ましい。 m in the general formula (1) represents an integer of 1 to 10, preferably an integer of 1 to 5, and n in the general formula (2) is 0, 1 or 2, but 0 or 1 is preferred.

一般式(1)で示されるカルボニル基含有化合物の具体例としては、ホルムアルデヒド、アセトアルデヒド、プロピオンアルデヒド、ブチルアルデヒド、シクロヘキサンカルバルデヒド等の脂肪族アルデヒド化合物;ベンズアルデヒド、トルアルデヒド等の芳香族アルデヒド化合物;シンナムアルデヒド、α-メチルシンナムアルデヒド、α-ペンチルシンナムアルデヒド等のシンナムアルデヒド化合物;ピリジンカルバルデヒド等のピリジル基含有アルデヒド化合物;マロンジアルデヒド、スクシンアルデヒド、o-フタルアルデヒド、イソフタルアルデヒド、テレフタルアルデヒド等のジアルデヒド化合物;1,2,4-ベンゼントリカルボアルデヒド、1,3,5-ベンゼントリカルボアルデヒド等のトリアルデヒド化合物;アセトン、メチルエチルケトン、メチルイソブチルケトン、アセチルアセトン等の脂肪族ケトン化合物;アセトフェノン、ベンゾフェノン、ジアセチルベンゼン等の芳香族ケトン化合物等が挙げられる。 Specific examples of the carbonyl group-containing compound represented by the general formula (1) include aliphatic aldehyde compounds such as formaldehyde, acetaldehyde, propionaldehyde, butyraldehyde, and cyclohexanecarbaldehyde; aromatic aldehyde compounds such as benzaldehyde and tolualdehyde; cinnamaldehyde compounds such as maldehyde, α-methylcinnamaldehyde, α-pentylcinnamaldehyde; pyridyl group-containing aldehyde compounds such as pyridinecarbaldehyde; malondialdehyde, succinaldehyde, o-phthalaldehyde, isophthalaldehyde, terephthalaldehyde, etc. Dialdehyde compounds; trialdehyde compounds such as 1,2,4-benzenetricarbaldehyde and 1,3,5-benzenetricarbaldehyde; aliphatic ketone compounds such as acetone, methyl ethyl ketone, methyl isobutyl ketone and acetylacetone; acetophenone, benzophenone and aromatic ketone compounds such as diacetylbenzene.

一般式(2)で示されるアミノオルガノキシシラン化合物の具体例としては、アミノメチルトリメトキシシラン、アミノメチルジメトキシメチルシラン、アミノメチルメトキシジメチルシラン、アミノメチルトリエトキシシラン、アミノメチルジエトキシメチルシラン、アミノメチルエトキシジメチルシラン等のアミノメチルオルガノキシシラン化合物;3-アミノプロピルトリメトキシシラン、3-アミノプロピルジメトキシメチルシラン、3-アミノプロピルメトキシジメチルシラン、3-アミノプロピルトリエトキシシラン、3-アミノプロピルジエトキシメチルシラン、3-アミノプロピルエトキシジメチルシラン等のアミノプロピルオルガノキシシラン化合物等が挙げられる。 Specific examples of the aminoorganoxysilane compound represented by the general formula (2) include aminomethyltrimethoxysilane, aminomethyldimethoxymethylsilane, aminomethylmethoxydimethylsilane, aminomethyltriethoxysilane, aminomethyldiethoxymethylsilane, Aminomethylorganoxysilane compounds such as aminomethylethoxydimethylsilane; 3-aminopropyltrimethoxysilane, 3-aminopropyldimethoxymethylsilane, 3-aminopropylmethoxydimethylsilane, 3-aminopropyltriethoxysilane, 3-aminopropyl Examples include aminopropylorganoxysilane compounds such as diethoxymethylsilane and 3-aminopropylethoxydimethylsilane.

上記反応により得られる一般式(3)で示されるイミノ基含有オルガノキシシラン化合物の具体例としては、メチレンアミノメチルトリメトキシシラン、メチレンアミノメチルジメトキシメチルシラン、メチレンアミノメチルメトキシジメチルシラン、メチレンアミノメチルトリエトキシシラン、メチレンアミノメチルジエトキシメチルシラン、メチレンアミノメチルエトキシジメチルシラン、3-(メチレンアミノ)プロピルトリメトキシシラン、3-(メチレンアミノ)プロピルジメトキシメチルシラン、3-(メチレンアミノ)プロピルメトキシジメチルシラン、3-(メチレンアミノ)プロピルトリエトキシシラン、3-(メチレンアミノ)プロピルジエトキシメチルシラン、3-(メチレンアミノ)プロピルエトキシジメチルシラン等のメチレンアミノ基含有オルガノキシシラン化合物;ベンジリデンアミノメチルトリメトキシシラン、ベンジリデンアミノメチルジメトキシメチルシラン、ベンジリデンアミノメチルメトキシジメチルシラン、ベンジリデンアミノメチルトリエトキシシラン、ベンジリデンアミノメチルジエトキシメチルシラン、ベンジリデンアミノメチルエトキシジメチルシラン、3-(ベンジリデンアミノ)プロピルトリメトキシシラン、3-(ベンジリデンアミノ)プロピルジメトキシメチルシラン、3-(ベンジリデンアミノ)プロピルメトキシジメチルシラン、3-(ベンジリデンアミノ)プロピルトリエトキシシラン、3-(ベンジリデンアミノ)プロピルジエトキシメチルシラン、3-(ベンジリデンアミノ)プロピルエトキシジメチルシラン等のベンジリデンアミノ基含有オルガノキシシラン化合物;ピリジルメチレンアミノメチルトリメトキシシラン、ピリジルメチレンアミノメチルジメトキシメチルシラン、ピリジルメチレンアミノメチルメトキシジメチルシラン、ピリジルメチレンアミノメチルトリエトキシシラン、ピリジルメチレンアミノメチルジエトキシメチルシラン、ピリジルメチレンアミノメチルエトキシジメチルシラン、3-(ピリジルメチレンアミノ)プロピルトリメトキシシラン、3-(ピリジルメチレンアミノ)プロピルジメトキシメチルシラン、3-(ピリジルメチレンアミノ)プロピルメトキシジメチルシラン、3-(ピリジルメチレンアミノ)プロピルトリエトキシシラン、3-(ピリジルメチレンアミノ)プロピルジエトキシメチルシラン、3-(ピリジルメチレンアミノ)プロピルエトキシジメチルシラン等のピリジルメチレンアミノ基含有オルガノキシシラン化合物;N,N-ビス(トリメトキシシリルメチル)-1,4-キシレン-α,α’-ジイミン、N,N-ビス(ジメトキシメチルシリルメチル)-1,4-キシレン-α,α’-ジイミン、N,N-ビス(メトキシジメチルシリルメチル)-1,4-キシレン-α,α’-ジイミン、N,N-ビス(トリエトキシシリルメチル)-1,4-キシレン-α,α’-ジイミン、N,N-ビス(ジエトキシメチルシリルメチル)-1,4-キシレン-α,α’-ジイミン、N,N-ビス(メトキシジメチルシリルメチル)-1,4-キシレン-α,α’-ジイミン等のビスオルガノキシシリル基含有1,4-キシレン-α,α’-ジイミン化合物等が挙げられる。 Specific examples of the imino group-containing organooxysilane compound represented by the general formula (3) obtained by the above reaction include methyleneaminomethyltrimethoxysilane, methyleneaminomethyldimethoxymethylsilane, methyleneaminomethylmethoxydimethylsilane, methyleneaminomethyl triethoxysilane, methyleneaminomethyldiethoxymethylsilane, methyleneaminomethylethoxydimethylsilane, 3-(methyleneamino)propyltrimethoxysilane, 3-(methyleneamino)propyldimethoxymethylsilane, 3-(methyleneamino)propylmethoxydimethylsilane silane, 3-(methyleneamino)propyltriethoxysilane, 3-(methyleneamino)propyldiethoxymethylsilane, 3-(methyleneamino)propylethoxydimethylsilane and other methyleneamino group-containing organooxysilane compounds; methoxysilane, benzylideneaminomethyldimethoxymethylsilane, benzylideneaminomethylmethoxydimethylsilane, benzylideneaminomethyltriethoxysilane, benzylideneaminomethyldiethoxymethylsilane, benzylideneaminomethylethoxydimethylsilane, 3-(benzylideneamino)propyltrimethoxysilane, 3-(benzylideneamino)propyldimethoxymethylsilane, 3-(benzylideneamino)propylmethoxydimethylsilane, 3-(benzylideneamino)propyltriethoxysilane, 3-(benzylideneamino)propyldiethoxymethylsilane, 3-(benzylideneamino) ) benzylideneamino group-containing organooxysilane compounds such as propylethoxydimethylsilane; pyridylmethyleneaminomethyltrimethoxysilane, pyridylmethyleneaminomethyldimethoxymethylsilane, pyridylmethyleneaminomethylmethoxydimethylsilane, pyridylmethyleneaminomethyltriethoxysilane, pyridylmethylene aminomethyldiethoxymethylsilane, pyridylmethyleneaminomethylethoxydimethylsilane, 3-(pyridylmethyleneamino)propyltrimethoxysilane, 3-(pyridylmethyleneamino)propyldimethoxymethylsilane, 3-(pyridylmethyleneamino)propylmethoxydimethylsilane , 3-(pyridylmethyleneamino)propyltriethoxysilane, 3-(pyridylmethyleneamino)propyldiethoxymethylsilane, 3- Pyridylmethyleneamino group-containing organooxysilane compounds such as (pyridylmethyleneamino) propylethoxydimethylsilane; N,N-bis(trimethoxysilylmethyl)-1,4-xylene-α,α'-diimine, N,N- Bis(dimethoxymethylsilylmethyl)-1,4-xylene-α,α'-diimine, N,N-bis(methoxydimethylsilylmethyl)-1,4-xylene-α,α'-diimine, N,N- Bis(triethoxysilylmethyl)-1,4-xylene-α,α'-diimine, N,N-bis(diethoxymethylsilylmethyl)-1,4-xylene-α,α'-diimine, N,N Bisorganoxysilyl group-containing 1,4-xylene-α,α'-diimine compounds such as -bis(methoxydimethylsilylmethyl)-1,4-xylene-α,α'-diimine.

本発明の製造方法において、一般式(2)で示されるアミノオルガノキシシラン化合物の使用量は、特に限定されないが、反応性および生産性の点から、一般式(1)で示されるカルボニル基含有化合物のカルボニル基1モルに対し、0.5~2.0モルが好ましく、0.8~1.5モルがより好ましい。 In the production method of the present invention, the amount of the aminoorganoxysilane compound represented by the general formula (2) is not particularly limited, but from the viewpoint of reactivity and productivity, the carbonyl group-containing compound represented by the general formula (1) It is preferably 0.5 to 2.0 mol, more preferably 0.8 to 1.5 mol, per 1 mol of the carbonyl group of the compound.

なお、本発明の目的を損なわない範囲で、上記反応時に溶媒を添加することもできる。
溶媒の具体例としては、ペンタン、ヘキサン、シクロヘキサン、ヘプタン、イソオクタン、ベンゼン、トルエン、キシレン等の炭化水素系溶媒;ジエチルエーテル、テトラヒドロフラン、ジオキサン等のエーテル系溶媒;酢酸エチル、酢酸ブチル等のエステル系溶媒;アセトニトリル、N,N-ジメチルホルムアミド等の非プロトン性極性溶媒;ジクロロメタン、クロロホルム等の塩素化炭化水素系溶媒;メタノール、エタノール等のアルコール系溶媒等が挙げられるが、これらの中でも、イミノ基含有オルガノキシシラン化合物の水による加水分解縮合反応を抑制する観点から、炭化水素系溶媒、エーテル系溶媒、エステル系溶媒が好ましく、炭化水素系溶媒がより好ましい。これらの溶媒は1種を単独で用いても、2種以上を混合して用いてもよい。
A solvent may be added during the above reaction as long as the object of the present invention is not impaired.
Specific examples of solvents include hydrocarbon solvents such as pentane, hexane, cyclohexane, heptane, isooctane, benzene, toluene and xylene; ether solvents such as diethyl ether, tetrahydrofuran and dioxane; ester solvents such as ethyl acetate and butyl acetate. Solvents; aprotic polar solvents such as acetonitrile and N,N-dimethylformamide; chlorinated hydrocarbon solvents such as dichloromethane and chloroform; alcoholic solvents such as methanol and ethanol; Hydrocarbon solvents, ether solvents and ester solvents are preferable, and hydrocarbon solvents are more preferable, from the viewpoint of suppressing the hydrolytic condensation reaction of the contained organosilane compound with water. These solvents may be used singly or in combination of two or more.

上記反応の反応温度は特に限定されないが、収率向上の観点から、0~200℃が好ましく、0~100℃がより好ましく、0~80℃がより一層好ましい。 Although the reaction temperature for the above reaction is not particularly limited, it is preferably 0 to 200°C, more preferably 0 to 100°C, and even more preferably 0 to 80°C from the viewpoint of improving the yield.

一般式(3)で示されるイミノ基含有オルガノキシシラン化合物の製造方法としては、溶媒を使用する場合は、カルボニル基含有化合物と溶媒を仕込み、アミノオルガノキシシラン化合物を滴下する方法、アミノオルガノキシシラン化合物と溶媒を仕込み、カルボニル基含有化合物を滴下する方法、溶媒にカルボニル基含有化合物およびアミノオルガノキシシラン化合物を同時に滴下する方法等のバッチ反応で行う方法;カルボニル基含有化合物、アミノオルガノキシシラン化合物および溶媒を反応器や反応管に連続的にフィードし、生成物を連続的に抜き出す方法等の連続反応で行う方法が挙げられる。
溶媒を使用しない場合は、カルボニル基含有化合物を仕込み、アミノオルガノキシシラン化合物を滴下する方法、アミノオルガノキシシラン化合物を仕込み、カルボニル基含有化合物を滴下する方法等のバッチ反応で行う方法;カルボニル基含有化合物、アミノオルガノキシシラン化合物を反応器や反応管に連続的にフィードし、生成物を連続的に抜き出す方法等の連続反応で行う方法が挙げられる。
As a method for producing the imino group-containing organosilane compound represented by the general formula (3), when a solvent is used, a carbonyl group-containing compound and a solvent are charged, and an aminoorganoxysilane compound is added dropwise. A batch reaction method, such as a method in which a silane compound and a solvent are charged and a carbonyl group-containing compound is added dropwise, or a method in which a carbonyl group-containing compound and an aminoorganoxysilane compound are added dropwise to a solvent at the same time; carbonyl group-containing compound, aminoorganoxysilane. A continuous reaction method, such as a method of continuously feeding a compound and a solvent into a reactor or a reaction tube and continuously withdrawing a product, can be used.
When a solvent is not used, a batch reaction method such as a method of charging a carbonyl group-containing compound and dropping an aminoorganoxysilane compound, a method of charging an aminoorganoxysilane compound and dropping a carbonyl group-containing compound; A continuous reaction method, such as a method of continuously feeding the contained compound and the aminoorganoxysilane compound into a reactor or a reaction tube and continuously withdrawing the product, can be used.

なお、本反応では副生物として水が生成するが、上述のとおり、本発明では、反応副生物として生じた水を反応系外へ除去することなく反応を行い、反応後、水を除去することを特徴としている。
生じた水を反応中に反応系外に除去するには共沸脱水を実施することになるが、この場合、溶媒を還流させる必要があるため、反応温度を高温としなければならない。加水分解縮合反応は、水が生成した段階において最も起こりやすいため、水が生成した時点で反応温度が高温であると、加水分解縮合反応が顕著に進行してしまう。そのため、反応中、すなわち水が生成している段階は、反応を温和な条件で実施し、反応後に水を除去する方が有利である。
In addition, although water is produced as a by-product in this reaction, as described above, in the present invention, the reaction is carried out without removing the water produced as a reaction by-product out of the reaction system, and water is removed after the reaction. is characterized by
Azeotropic dehydration is carried out in order to remove the generated water out of the reaction system during the reaction. In this case, the solvent must be refluxed, so the reaction temperature must be high. Since the hydrolytic condensation reaction most easily occurs at the stage when water is produced, if the reaction temperature is high at the time when water is produced, the hydrolytic condensation reaction will proceed remarkably. Therefore, it is advantageous to carry out the reaction under mild conditions during the reaction, that is, at the stage where water is being produced, and to remove the water after the reaction.

反応後に水を除去する方法としては、特に限定されるものではなく、常圧または減圧で共沸脱水を行う方法、二層分離した水層を分液操作により除去する方法、脱水剤を添加して除去する方法等が挙げられるが、実施の容易さおよび収率の観点から、分液操作によって二層分離した水層を除去する方法が好ましい。
分液操作によって二層分離した水層を除去する方法としては、バッチ反応で行う場合においては、反応後に撹拌機を停止し、水層が沈降した場合は反応器下部から水層を抜き出して除去する方法、水層が浮上した場合はまず有機層を反応器下部から抜き出し、その後水層を反応器下部から抜き出して廃棄する方法等が挙げられる。連続反応で行う場合においては、生成物をデカンターに供給し、デカンター内で二層分離した水層を抜き出す方法等が挙げられる。
上記のようにして得られた有機層からは、蒸留等の通常の方法で目的物を回収することができる。
The method for removing water after the reaction is not particularly limited, and includes a method of azeotropic dehydration under normal pressure or reduced pressure, a method of removing the water layer separated into two layers by a liquid separation operation, and a method of adding a dehydrating agent. However, from the viewpoint of ease of implementation and yield, a method of removing the aqueous layer separated into two layers by a liquid separation operation is preferable.
As a method for removing the water layer separated into two layers by the liquid separation operation, in the case of batch reaction, stop the stirrer after the reaction, and if the water layer settles, extract the water layer from the bottom of the reactor and remove it. When the water layer floats, the organic layer is first drawn out from the bottom of the reactor, and then the water layer is drawn out from the bottom of the reactor and discarded. In the case of continuous reaction, a method of supplying the product to a decanter and extracting the water layer separated into two layers in the decanter can be used.
The target product can be recovered from the organic layer obtained as described above by an ordinary method such as distillation.

以下、実施例および比較例を挙げて本発明をより具体的に説明するが、本発明は下記の実施例に制限されるものではない。 EXAMPLES The present invention will be described in more detail below with reference to examples and comparative examples, but the present invention is not limited to the following examples.

[実施例1]
撹拌機、還流器、滴下ロートおよび温度計を備えたフラスコに、ベンズアルデヒド509.3g(4.8モル)、トルエン1,200mlを仕込み、20~40℃で3-アミノプロピルトリメトキシシラン717.2g(4.0モル)を2時間かけて滴下し、その温度で1時間撹拌した。反応液を分液漏斗に移送し、二層に分離した下層の水層を除去した。上層を蒸留し、3-(ベンジリデンアミノ)プロピルトリメトキシシランを沸点149℃/0.4kPaの留分として768.8g得た。収率は72%であった。
[Example 1]
509.3 g (4.8 mol) of benzaldehyde and 1,200 ml of toluene were placed in a flask equipped with a stirrer, reflux vessel, dropping funnel and thermometer, and 717.2 g of 3-aminopropyltrimethoxysilane was added at 20-40°C. (4.0 mol) was added dropwise over 2 hours and stirred at that temperature for 1 hour. The reaction solution was transferred to a separatory funnel and the lower aqueous layer separated into two layers was removed. The upper layer was distilled to obtain 768.8 g of 3-(benzylideneamino)propyltrimethoxysilane as a fraction having a boiling point of 149° C./0.4 kPa. Yield was 72%.

[比較例1]
撹拌機、ディーンスターク装置、還流器、滴下ロートおよび温度計を備えたフラスコに、ベンズアルデヒド509.3g(4.8モル)、トルエン1,200mlを仕込み、トルエンが還流するまで加熱した。トルエン還流下(内温116℃)において、生じた水を留去しながら、3-アミノプロピルトリメトキシシラン717.2g(4.0モル)を2時間かけて滴下し、更に還流下で1時間撹拌した。得られた反応液を蒸留し、3-(ベンジリデンアミノ)プロピルトリメトキシシランを沸点149℃/0.4kPaの留分として、540.9g得た。収率は51%であった。
[Comparative Example 1]
A flask equipped with a stirrer, Dean-Stark apparatus, reflux, dropping funnel and thermometer was charged with 509.3 g (4.8 mol) of benzaldehyde and 1,200 ml of toluene and heated until the toluene was refluxed. 717.2 g (4.0 mol) of 3-aminopropyltrimethoxysilane was added dropwise over 2 hours while distilling off the water produced under reflux of toluene (internal temperature 116° C.), and further under reflux for 1 hour. Stirred. The obtained reaction liquid was distilled to obtain 540.9 g of 3-(benzylideneamino)propyltrimethoxysilane as a fraction having a boiling point of 149° C./0.4 kPa. Yield was 51%.

[実施例2]
3-アミノプロピルトリメトキシシラン717.2g(4.0モル)を、3-アミノプロピルトリエトキシシラン885.6g(4.0モル)に変更した以外は、実施例1と同様にして反応および分液を行い、さらに上層を蒸留し、3-(ベンジリデンアミノ)プロピルトリエトキシシランを沸点164℃/0.4kPaの留分として1,195.5g得た。収率は97%であった。
[Example 2]
Reaction and separation were carried out in the same manner as in Example 1, except that 717.2 g (4.0 mol) of 3-aminopropyltriethoxysilane was changed to 885.6 g (4.0 mol) of 3-aminopropyltriethoxysilane. The liquid was separated and the upper layer was distilled to obtain 1,195.5 g of 3-(benzylideneamino)propyltriethoxysilane as a fraction having a boiling point of 164° C./0.4 kPa. Yield was 97%.

[実施例3]
撹拌機、還流器、滴下ロートおよび温度計を備えたフラスコに、ベンズアルデヒド509.3g(4.8モル)、トルエン1,200mlを仕込み、70℃に加熱した。内温が安定した後、3-アミノプロピルトリエトキシシラン885.6g(4.0モル)を70~80℃で2時間かけて滴下し、その温度で1時間撹拌した。25℃まで冷却後、反応液を分液漏斗に移送し、二層に分離した下層の水層を除去した。上層を蒸留し、3-(ベンジリデンアミノ)プロピルトリエトキシシランを沸点164℃/0.4kPaの留分として1,150.9g得た。収率は93%であった。
[Example 3]
A flask equipped with a stirrer, reflux, dropping funnel and thermometer was charged with 509.3 g (4.8 mol) of benzaldehyde and 1,200 ml of toluene and heated to 70°C. After the internal temperature stabilized, 885.6 g (4.0 mol) of 3-aminopropyltriethoxysilane was added dropwise at 70 to 80° C. over 2 hours, and the mixture was stirred at that temperature for 1 hour. After cooling to 25° C., the reaction solution was transferred to a separatory funnel and the lower aqueous layer separated into two layers was removed. The upper layer was distilled to obtain 1,150.9 g of 3-(benzylideneamino)propyltriethoxysilane as a fraction having a boiling point of 164° C./0.4 kPa. Yield was 93%.

[比較例2]
3-アミノプロピルトリメトキシシラン717.2g(4.0モル)を、3-アミノプロピルトリエトキシシラン885.6g(4.0モル)に変更した以外は、比較例1と同様にして反応を行い、さらに反応液を蒸留し、3-(ベンジリデンアミノ)プロピルトリエトキシシランを沸点164℃/0.4kPaの留分として1,001.5g得た。収率は81%であった。
[Comparative Example 2]
The reaction was carried out in the same manner as in Comparative Example 1, except that 717.2 g (4.0 mol) of 3-aminopropyltriethoxysilane was changed to 885.6 g (4.0 mol) of 3-aminopropyltriethoxysilane. Furthermore, the reaction liquid was distilled to obtain 1,001.5 g of 3-(benzylideneamino)propyltriethoxysilane as a fraction having a boiling point of 164° C./0.4 kPa. Yield was 81%.

Claims (2)

下記一般式(1)
Figure 0007147689000005
(式中、R1は、水素原子またはヘテロ原子を含んでいてもよい炭素数1~20のm価炭化水素基を表し、R2は、水素原子または炭素数1~20の1価炭化水素基を表し、mは、1~10の整数を表す。)
で示されるカルボニル基含有化合物と、
下記一般式(2)
Figure 0007147689000006
(式中、R3は、炭素数1~20の2価炭化水素基を表し、R4およびR5は、それぞれ独立して炭素数1~20の1価炭化水素基を表し、nは、0、1または2を表す。)
で示されるアミノオルガノキシシラン化合物を反応させる、下記一般式(3)
Figure 0007147689000007
(式中、R1~R5、mおよびnは、前記と同じ意味を表す。)
で示されるイミノ基含有オルガノキシシラン化合物の製造方法であって、
副生物として生じた水を反応系外へ除去することなく前記反応を行い、前記反応の終了後に前記水を除去する工程を有し、
前記水を除去する工程が、反応液の分液操作で二層分離した水層を除去することにより行われることを特徴とするイミノ基含有オルガノキシシラン化合物の製造方法。
General formula (1) below
Figure 0007147689000005
(In the formula, R 1 represents a hydrogen atom or an m-valent hydrocarbon group having 1 to 20 carbon atoms which may contain a heteroatom; R 2 represents a hydrogen atom or a monovalent hydrocarbon group having 1 to 20 carbon atoms; group, and m represents an integer of 1 to 10.)
A carbonyl group-containing compound represented by
General formula (2) below
Figure 0007147689000006
(wherein R 3 represents a divalent hydrocarbon group having 1 to 20 carbon atoms, R 4 and R 5 each independently represent a monovalent hydrocarbon group having 1 to 20 carbon atoms, and n is represents 0, 1 or 2.)
The following general formula (3) is reacted with an aminoorganoxysilane compound represented by
Figure 0007147689000007
(In the formula, R 1 to R 5 , m and n have the same meanings as above.)
A method for producing an imino group-containing organooxysilane compound represented by
Conducting the reaction without removing water produced as a by-product out of the reaction system, and removing the water after the reaction is completed ;
A method for producing an imino group-containing organooxysilane compound, wherein the step of removing water is carried out by removing a water layer separated into two layers by a liquid separation operation of the reaction solution .
前記R2が、水素原子である請求項記載のイミノ基含有オルガノキシシラン化合物の製造方法。 2. The method for producing an imino group-containing organooxysilane compound according to claim 1 , wherein said R2 is a hydrogen atom.
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