JPS6348276B2 - - Google Patents
Info
- Publication number
- JPS6348276B2 JPS6348276B2 JP4453584A JP4453584A JPS6348276B2 JP S6348276 B2 JPS6348276 B2 JP S6348276B2 JP 4453584 A JP4453584 A JP 4453584A JP 4453584 A JP4453584 A JP 4453584A JP S6348276 B2 JPS6348276 B2 JP S6348276B2
- Authority
- JP
- Japan
- Prior art keywords
- group
- organosilane
- formula
- groups
- amount
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
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- 150000001282 organosilanes Chemical class 0.000 claims description 33
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 9
- 239000003054 catalyst Substances 0.000 claims description 8
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 8
- 125000003545 alkoxy group Chemical group 0.000 claims description 7
- 125000003302 alkenyloxy group Chemical group 0.000 claims description 6
- 238000004519 manufacturing process Methods 0.000 claims description 6
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 15
- 229910052801 chlorine Inorganic materials 0.000 description 13
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 12
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 12
- 239000000460 chlorine Substances 0.000 description 11
- -1 ketone compound Chemical class 0.000 description 10
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 9
- 238000000034 method Methods 0.000 description 8
- 238000006243 chemical reaction Methods 0.000 description 7
- 239000000047 product Substances 0.000 description 7
- 125000003342 alkenyl group Chemical group 0.000 description 6
- 239000007858 starting material Substances 0.000 description 6
- 125000000217 alkyl group Chemical group 0.000 description 5
- 125000003118 aryl group Chemical group 0.000 description 5
- 238000004821 distillation Methods 0.000 description 4
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 4
- 238000009835 boiling Methods 0.000 description 3
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 3
- 125000001309 chloro group Chemical group Cl* 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- ZWXYOPPJTRVTST-UHFFFAOYSA-N methyl-tris(prop-1-en-2-yloxy)silane Chemical compound CC(=C)O[Si](C)(OC(C)=C)OC(C)=C ZWXYOPPJTRVTST-UHFFFAOYSA-N 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 229920002379 silicone rubber Polymers 0.000 description 3
- 239000004945 silicone rubber Substances 0.000 description 3
- 238000003756 stirring Methods 0.000 description 3
- 125000000547 substituted alkyl group Chemical group 0.000 description 3
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 2
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 2
- 150000001298 alcohols Chemical class 0.000 description 2
- 239000006227 byproduct Substances 0.000 description 2
- 125000004432 carbon atom Chemical group C* 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 238000002290 gas chromatography-mass spectrometry Methods 0.000 description 2
- 125000001183 hydrocarbyl group Chemical group 0.000 description 2
- 239000012770 industrial material Substances 0.000 description 2
- 150000001367 organochlorosilanes Chemical class 0.000 description 2
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 238000010992 reflux Methods 0.000 description 2
- 229910000077 silane Inorganic materials 0.000 description 2
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 1
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 1
- HSOYYCLJBUIKMI-UHFFFAOYSA-N C[SiH2]OC(Cl)Cl Chemical compound C[SiH2]OC(Cl)Cl HSOYYCLJBUIKMI-UHFFFAOYSA-N 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- 229910021591 Copper(I) chloride Inorganic materials 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 125000003277 amino group Chemical group 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 125000004218 chloromethyl group Chemical group [H]C([H])(Cl)* 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- OXBLHERUFWYNTN-UHFFFAOYSA-M copper(I) chloride Chemical compound [Cu]Cl OXBLHERUFWYNTN-UHFFFAOYSA-M 0.000 description 1
- 229940045803 cuprous chloride Drugs 0.000 description 1
- 125000004093 cyano group Chemical group *C#N 0.000 description 1
- FVCOIAYSJZGECG-UHFFFAOYSA-N diethylhydroxylamine Chemical compound CCN(O)CC FVCOIAYSJZGECG-UHFFFAOYSA-N 0.000 description 1
- YTPNLBCMTSWLKJ-UHFFFAOYSA-N dimethoxy-methyl-prop-1-en-2-yloxysilane Chemical compound CO[Si](C)(OC)OC(C)=C YTPNLBCMTSWLKJ-UHFFFAOYSA-N 0.000 description 1
- GBFVZTUQONJGSL-UHFFFAOYSA-N ethenyl-tris(prop-1-en-2-yloxy)silane Chemical compound CC(=C)O[Si](OC(C)=C)(OC(C)=C)C=C GBFVZTUQONJGSL-UHFFFAOYSA-N 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 125000005843 halogen group Chemical group 0.000 description 1
- IXCSERBJSXMMFS-UHFFFAOYSA-N hydrogen chloride Substances Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 description 1
- 229910000041 hydrogen chloride Inorganic materials 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 239000003999 initiator Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000005055 methyl trichlorosilane Substances 0.000 description 1
- JLUFWMXJHAVVNN-UHFFFAOYSA-N methyltrichlorosilane Chemical compound C[Si](Cl)(Cl)Cl JLUFWMXJHAVVNN-UHFFFAOYSA-N 0.000 description 1
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 238000005580 one pot reaction Methods 0.000 description 1
- 150000003961 organosilicon compounds Chemical class 0.000 description 1
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 1
- 238000010248 power generation Methods 0.000 description 1
- 239000002516 radical scavenger Substances 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 239000003566 sealing material Substances 0.000 description 1
- 150000004756 silanes Chemical class 0.000 description 1
- 150000003377 silicon compounds Chemical class 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 150000003623 transition metal compounds Chemical class 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
Description
本発明はオルガノシラン、特には分子中にアル
ケニルオキシ基とアルコキシ基を含有するオルガ
ノシランの製造方法関するものである。
分子中にけい素原子に直接結合したアルケニル
オキシ基とアルコキシ基を含有するオルガノシラ
ンは室温硬化性シリコーンゴムの硬化剤として有
用とされているものであるが、このオルガノシラ
ンはけい素原子に直接結合した塩素原子を含有す
るオルガノクロロシランとアルコールとを反応さ
せて部分アルコキシシランを合成し、ついでこゝ
に残存している塩素原子にケトン化合物を遷移金
属化合物触媒と塩化水素捕捉剤の存在下で反応さ
せて該当するオルガノシランとするという方法で
製造されている。
しかし、この方法は副生成物が多いために、目
的物の分離精製が難しく、反応収率も低いという
不利があり、また始発材料がオルガノクロロシラ
ンであるために蒸留分離だけでは目的物中におけ
る残留クロルの量を低減できず、これを200ppm
以下、特には20ppm以下にすることが難しく、そ
のためこれに添加した室温硬化性シリコーンゴム
の工業的用途が著しく制限されるという欠点があ
つた。
本発明はこのような不利を解決したアルケニル
オキシ基とアルコキシ基を含有するオルガノシラ
ンの製造方法に関するものであり、これは一般式
(こゝにR1は水素原子または非置換または置換
のアルキル基、アルケニル基またはアリール基、
R2,R3,R4は水素原子またはR1と同じ基、aは
0〜2の整数)で示されるオルガノシランを、一
般式R5OH〔こゝにR5は非置換または置換のアル
キル基、アルケニル基、アリール基または式―
CH2CH2OR6(R6は前記R1に同じ)で示される
基〕で示されるアルコールと触媒の存在下で反応
させて、一般式
(こゝにR1,R2,R3,R4,R5,aは前記に同
じ、bは1〜3の整数、a+b≦3)で示される
アルケニルオキシ基とアルコキシ基を含有するオ
ルガノシランを得ることを特徴とするものであ
る。
すなわち、本発明者らはアルケニルオキシ基と
アルコキシ基を含有するオルガノシランの効率的
な製造方法について種々検討した結果、上記した
一般式で示されるオルガノシランとアルコールと
を反応させると1一段階で収率よく目的とするオ
ルガノシランを得ることができることを見出すと
共に、この方法で得られたオルガノシランは残存
クロル量を著しく低くすることができるので、こ
れを添加した室温硬化性シリコーンゴム組成物は
各種精密工業材料としても有利に使用することが
できるということを確認して本発明を完成させ
た。
本発明の方法で始発剤とされるオルガノシラン
は一般式
で示され、このR1が水素原子またはメチル基、
エチル基、プロピル基、ブチル基などのアルキル
基、ビニル基、アリル基などのアルケニル基、フ
エノール基などのアリール基またはこれらの基の
炭素原子に結合した水素原子の1部または全部を
ハロゲン原子、シアノ基などで置換したクロロメ
チル基、3,3,3―トリフルオロプロピル基、
シアノメチル基などから選択される非置換または
置換の1価炭化水素基で、R2,R3,R4が水素原
子または上記したR1と同じ1価炭化水素基とさ
れ、aが0〜2の整数とされるものであり、これ
には
The present invention relates to a method for producing organosilanes, particularly organosilanes containing alkenyloxy groups and alkoxy groups in the molecule. Organosilanes containing alkenyloxy and alkoxy groups directly bonded to silicon atoms in their molecules are said to be useful as curing agents for room-temperature curable silicone rubber; A partial alkoxysilane is synthesized by reacting an organochlorosilane containing a bonded chlorine atom with an alcohol, and then a ketone compound is added to the remaining chlorine atom in the presence of a transition metal compound catalyst and a hydrogen chloride scavenger. It is produced by a method of reaction to form the corresponding organosilane. However, this method has the disadvantage that it is difficult to separate and purify the target product due to the large number of by-products, and the reaction yield is also low.Also, since the starting material is organochlorosilane, distillation alone is not enough to remove residual residue in the target product. Unable to reduce the amount of Chlor, this was reduced to 200ppm.
In particular, it is difficult to reduce the content to 20 ppm or less, which has the disadvantage that the industrial use of the room-temperature-curable silicone rubber added thereto is severely limited. The present invention relates to a method for producing an organosilane containing an alkenyloxy group and an alkoxy group, which solves these disadvantages, and is based on the general formula (R 1 is a hydrogen atom, an unsubstituted or substituted alkyl group, an alkenyl group, or an aryl group,
R 2 , R 3 , R 4 are hydrogen atoms or the same group as R 1 , and a is an integer of 0 to 2 ). Alkyl group, alkenyl group, aryl group or formula -
CH 2 CH 2 OR 6 (R 6 is the same as R 1 above)] in the presence of a catalyst to form a compound of the general formula (Here, R 1 , R 2 , R 3 , R 4 , R 5 , a are the same as above, b is an integer of 1 to 3, and a+b≦3) containing an alkenyloxy group and an alkoxy group. It is characterized by obtaining silane. That is, as a result of various studies on efficient production methods of organosilanes containing alkenyloxy groups and alkoxy groups, the present inventors found that when an organosilane represented by the above general formula is reacted with an alcohol, it is possible to react in 11 steps. It has been discovered that the desired organosilane can be obtained in good yield, and the organosilane obtained by this method can significantly reduce the amount of residual chlorine. The present invention was completed after confirming that it can be advantageously used as various precision industrial materials. The organosilane used as an initiator in the method of the present invention has the general formula and this R 1 is a hydrogen atom or a methyl group,
Alkyl groups such as ethyl, propyl, and butyl groups, alkenyl groups such as vinyl and allyl groups, aryl groups such as phenol groups, or some or all of the hydrogen atoms bonded to the carbon atoms of these groups are replaced by halogen atoms, Chloromethyl group substituted with cyano group etc., 3,3,3-trifluoropropyl group,
An unsubstituted or substituted monovalent hydrocarbon group selected from a cyanomethyl group, etc., where R 2 , R 3 , and R 4 are hydrogen atoms or the same monovalent hydrocarbon group as R 1 above, and a is 0 to 2. It is assumed to be an integer of
【式】【formula】
【式】【formula】
【式】【formula】
【式】【formula】
【式】【formula】
【式】【formula】
【式】【formula】
【式】【formula】
【式】【formula】
【式】などが例示される。
なお、このオルガノシランは一般はオルガノシラ
ンから合成されるので、通常は100〜1000ppmの
残存クロル量を含んでいるが、これをそのまゝ本
発明方法の始発材料として使用すると目的とする
オルガノシランが残存クロル量の多いものとなる
ので、水洗、蒸留などによつて残存クロル量が1
〜20ppmになるように精製しておくことがよい。
つぎにこのオルガノシランと反応させるアルコ
ールは前記したように一般式R5OHで示され、こ
ろR5が非置換または置換のアルキル基、アルケ
ニル基、アリール基であるか、または式―
CH2CH2OR6で示され、このR6が上記したR1と
同じ非置換または置換のアルキル基、アルケニル
基またはアリール基とされるものであるが、これ
にはCH3OH、C2H5OH、C3H7OH、C4H9OHな
どの直鎖アルコール、(CH3)2CHOH、
(CH3)3COHなどの分枝アルコール、
CH3OCH2CH2OH、C2H5OCH2CH2OHなどのセ
ロソルブ系のものが例示される。このアルコール
化合物の上記オルガノシランに対する配合量はオ
ルガノシランの部分アルコキシ化に必要とされる
理論量の80〜120モル%とすることがよいが、こ
の配合量は目的とするオルガノシランと始発材料
となるオルガノシランおよび反応副生物との沸点
差などを考慮して定めればよい。
上記したオルガノシランとアルコールとの反応
は触媒の存在下で反応させる必要があり、この触
媒としてはp―トルエンスルホン酸などの酸性触
媒、トリエチルアミン、ジエチルヒドロキシアミ
ン、グアニジル基含有けい素化合物などのような
アミノ基含有塩基性触媒などのように公知のもの
を使用すればよいが、工業的には安価で入手し易
く、蒸留時の分離も容易であるトリエチルアミン
とすることが好ましく、これは一般には始発材料
としてのオルガノシランに対しその0.01〜5重量
%の範囲で添加すればよい。
本発明の方法は上記した始発材料としてのオル
ガノシランに触媒を添加し、こゝに上記したアル
コールを滴下して反応させればよいが、この反応
はベンゼン、トルエン、キシレン、ヘキサンなど
のような反応に不活性な溶媒の存在下で行なつて
もよい。
本発明の方法は上記したような一般式で示され
るオルガノシランとアルコールとの一段反応でア
ルケニル基とアルコキシ基を有するオルガノシラ
ンを得るものであり、これによれば工業的に容易
にしかも純度高く、特に残存クロル量を著しく低
下させたオルガノシランが得られるという有利性
が与えられるため、これを硬化剤とした室温硬化
性シリコーンゴムは塩素原子などの不純物の混入
を極端に嫌う原子力発電用シール材、航空宇宙産
業用材料、超精密工業材料として、またエレクト
ロニツクス関連のシール材として有用とされると
いう優位性が与えられる。
つぎに本発明の実施例をあげる。
実施例 1
還流冷却器、温度計、撹拌棒および滴下ロート
を装備した1セパラブルフラスコに残存クロル
量が220ppmであるメチルトリ(イソプロペニル
オキシ)シランExamples include [Formula]. Since this organosilane is generally synthesized from organosilane, it usually contains 100 to 1000 ppm of residual chlorine, but if this organosilane is used as it is as a starting material for the method of the present invention, it will not produce the desired organosilane. Since the amount of residual chlorine is large, washing with water, distillation, etc. will reduce the amount of remaining chlorine to 1
It is best to refine it to ~20ppm. Next, the alcohol to be reacted with this organosilane is represented by the general formula R 5 OH as described above, and R 5 is an unsubstituted or substituted alkyl group, alkenyl group, or aryl group, or has the formula -
CH 2 CH 2 OR 6 , where R 6 is the same unsubstituted or substituted alkyl group, alkenyl group, or aryl group as R 1 described above, but this includes CH 3 OH, C 2 Straight chain alcohols such as H5OH , C3H7OH , C4H9OH , ( CH3 ) 2CHOH ,
Branched alcohols such as ( CH3 ) 3COH ,
Examples include cellosolve types such as CH 3 OCH 2 CH 2 OH and C 2 H 5 OCH 2 CH 2 OH. The amount of this alcohol compound to be blended with the organosilane is preferably 80 to 120 mol% of the theoretical amount required for partial alkoxylation of the organosilane, but this amount should be determined based on the desired organosilane and starting material. It may be determined by considering the boiling point difference between the organosilane and the reaction by-product. The reaction between organosilane and alcohol described above must be carried out in the presence of a catalyst, such as an acidic catalyst such as p-toluenesulfonic acid, triethylamine, diethylhydroxyamine, a guanidyl group-containing silicon compound, etc. Any known basic catalyst containing an amino group may be used, but it is preferable to use triethylamine, which is industrially inexpensive and easily available, and can be easily separated during distillation. It may be added in an amount of 0.01 to 5% by weight based on the organosilane as a starting material. In the method of the present invention, a catalyst is added to the organosilane as the starting material, and the alcohol mentioned above is added dropwise thereto to cause the reaction. The reaction may be carried out in the presence of a solvent inert to the reaction. The method of the present invention is to obtain an organosilane having an alkenyl group and an alkoxy group through a one-step reaction between an organosilane represented by the above general formula and an alcohol, and can be obtained industrially easily and with high purity. In particular, it has the advantage of producing organosilane with a significantly reduced amount of residual chlorine, so room-temperature-curing silicone rubber using this as a curing agent is used as a seal for nuclear power generation, where contamination with impurities such as chlorine atoms is extremely difficult. It has the advantage of being useful as a material for the aerospace industry, an ultra-precision industrial material, and as a sealing material for electronics. Next, examples of the present invention will be given. Example 1 Methyltri(isopropenyloxy)silane with a residual chloride content of 220 ppm in a separable flask equipped with a reflux condenser, thermometer, stirring bar and dropping funnel.
【式】428g
(2モル)とトリエチルアミン4gを入れて35℃
に加熱したのち、こゝに撹拌下に滴下ロートから
メタノール128g(4モル)を1時間で滴下し、
その後還流下に2時間加熱してから減圧蒸留した
ところ、沸点が74℃/114mmHgのものが188g得
られた。
つぎにこのものについて分析を行つたところ、
このIRは第1図に示したとおりであり、さらに
NMR、GC―MSの結果から、これはメチル(イ
ソプロペニルオキシ)ジメトキシシラン
[Formula] 428g (2 moles) and 4g of triethylamine were added at 35°C.
After heating to , 128 g (4 mol) of methanol was added dropwise from the dropping funnel over 1 hour while stirring.
Thereafter, the mixture was heated under reflux for 2 hours and then distilled under reduced pressure, yielding 188 g of a product with a boiling point of 74° C./114 mmHg. Next, when I analyzed this thing, I found that
This IR is as shown in Figure 1, and
Based on the NMR and GC-MS results, this is methyl(isopropenyloxy)dimethoxysilane.
【式】であることが
確認され、このものの残存クロル量も97ppmであ
り、その収率は58%であつた。
実施例 2
実施例1と同じ装置に、予じめ水洗、蒸留で残
存クロル量を5ppmまで低下させたメチルトリ
(イソプロペニルオキシ)シラン428g(2モル)
とトリエチルアミン4gを入れて35℃に加熱した
のち、こゝに撹拌下に滴下ロートからメタノール
64g(2モル)を40分間で滴下し、その後55〜60
℃に1時間加熱してから減圧蒸留したところ、沸
点が98℃/112mmHgのものが20/g得られた。
つぎにこれをIR、NMR、GC―MSでしらべた
ところ、これはメチルジ(イソプロペニルオキ
シ)メトキシシラン
It was confirmed that the formula was [Formula], the amount of residual chlorine in this product was 97 ppm, and the yield was 58%. Example 2 In the same equipment as Example 1, 428 g (2 mol) of methyltri(isopropenyloxy)silane, which had been washed with water and distilled to reduce the amount of residual chlorine to 5 ppm, was added.
After adding 4g of triethylamine and heating to 35℃, methanol was added from the dropping funnel while stirring.
64 g (2 mol) was added dropwise over 40 minutes, then 55-60
After heating to 1 hour at 0.degree. C. and distilling under reduced pressure, 20/g of the product with a boiling point of 98.degree. C./112 mmHg was obtained. Next, we examined this using IR, NMR, and GC-MS, and found that it was methyldi(isopropenyloxy)methoxysilane.
【式】であることが確
認され、このものの残存クロル量は3ppmであり、
その収率は53%であつた。
比較例
メチルトリクロロシラン299g(2モル)にメ
タノール64g(2モル)を約50分間で滴下し、60
℃に1時間加熱したのち減圧蒸留したところ、メ
チルジクロロメトキシシラン160gが得られた。
つぎにこれにトリエチルアミン290g、アセト
ン900gおよび塩化第1銅5.0gを加え、40℃で24
時間反応させた後、過して塩を除去し減圧蒸留
したところ、沸点が99℃/110mmHgのものが103
gが得られた。
このものは分析の結果、実施例2で得られたも
のと同じのメチルジ(イソプロペニルオキシ)メ
トキシシランであることが確認されたが、このク
ロル残量は260ppmであり、その収率も28%であ
つた。
実施例 3〜8
実施例1と同じ方法で、始発材料としてのオル
ガノシランを残存クロル量を5ppmとしたメチル
トリ(イソプロペニルオキシ)シランと残存クロ
ル量を7ppmとしたビニルトリ(イソプロペニル
オキシ)シランとし、アルコールをメタノール、
エタノール、メチルセロソルブ、エチルセロソル
ブとしてシランの合成を行なつたところ、下記第
1表に示すとおりの結果が得られた。
なお、この実施例3,5,8で得られたシラン
のIRは第2図〜第4図に示したとおりであつた。[Formula] was confirmed, and the residual amount of chlorine in this product was 3 ppm,
The yield was 53%. Comparative example: 64 g (2 moles) of methanol was added dropwise to 299 g (2 moles) of methyltrichlorosilane over about 50 minutes.
The mixture was heated to 0.degree. C. for 1 hour and then distilled under reduced pressure to obtain 160 g of methyldichloromethoxysilane. Next, 290 g of triethylamine, 900 g of acetone and 5.0 g of cuprous chloride were added to this, and the mixture was heated at 40℃ for 24 hours.
After reacting for an hour, the salts were removed by filtration, and distillation was performed under reduced pressure. As a result, 103
g was obtained. As a result of analysis, this product was confirmed to be the same methyldi(isopropenyloxy)methoxysilane as that obtained in Example 2, but the residual amount of chlorine was 260 ppm, and the yield was also 28%. It was hot. Examples 3 to 8 Using the same method as in Example 1, organosilane as a starting material was changed to methyltri(isopropenyloxy)silane with a residual chlorine content of 5 ppm and vinyltri(isopropenyloxy)silane with a residual chlorine content of 7ppm. , alcohol to methanol,
When silane was synthesized using ethanol, methyl cellosolve, and ethyl cellosolve, the results shown in Table 1 below were obtained. The IR values of the silanes obtained in Examples 3, 5, and 8 were as shown in FIGS. 2 to 4.
【表】【table】
第1図〜第4図はいずれも本実施例で得られた
オルガノシランのIRを示したものであり、第1
図は実施例1、第2図は実施例3、第3図は実施
例5、第4図は実施例8で得られたオルガノシラ
ンのIRを示したものである。
Figures 1 to 4 all show the IR of the organosilane obtained in this example.
The figure shows the IR of the organosilanes obtained in Example 1, FIG. 2 in Example 3, FIG. 3 in Example 5, and FIG. 4 in Example 8.
1 一般式
(こゝにR1,R2は同種または異種の低級アル
キル基またはトリメチルシロキシ基、R3,R4は
水素原子または同種または異種の低級アルキル
基、R5は炭素数1〜8のアルキル基、mは0,
1,2または3,nは2,3または4,m+nは
4または5)で示される有機けい素化合物。
2 R1がメチル基、エチル基、プロピル基、ブ
チル基またはトリメチルシロキシ基、R2がメチ
ル基、R3が水素原子またはメチル基、R4がメチ
ル基またはエチル基、R5がメチル基、エチル基、
ブチル基またはオクチル基である特許請求の範囲
第1項記載の有機けい素化合物。
1 General formula (R 1 and R 2 are the same or different lower alkyl groups or trimethylsiloxy groups, R 3 and R 4 are hydrogen atoms or the same or different lower alkyl groups, and R 5 is an alkyl group having 1 to 8 carbon atoms. , m is 0,
1, 2 or 3, n is 2, 3 or 4, m+n is 4 or 5). 2 R 1 is a methyl group, ethyl group, propyl group, butyl group or trimethylsiloxy group, R 2 is a methyl group, R 3 is a hydrogen atom or a methyl group, R 4 is a methyl group or an ethyl group, R 5 is a methyl group, ethyl group,
The organosilicon compound according to claim 1, which is a butyl group or an octyl group.
Claims (1)
るアルケニルオキシ基とアルコキシ基を含有する
オルガノシランを得ることを特徴とするオルガノ
シランの製造方法。 2 触媒が塩基性触媒である特許請求の範囲第1
項記載のオルガノシランの製造方法。 3 オルガノシランが前記一般式のR2がメチル
基、R3,R4が水素原子のものである特許請求の
範囲第1項記載のオルガノシランの製造方法。A method for producing an organosilane, which comprises obtaining an organosilane containing an alkenyloxy group and an alkoxy group, where b is an integer of 1 to 3, and a+b≦3. 2 Claim 1 in which the catalyst is a basic catalyst
The method for producing organosilane described in Section 1. 3. The method for producing an organosilane according to claim 1, wherein in the general formula of the organosilane, R 2 is a methyl group and R 3 and R 4 are hydrogen atoms.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4453584A JPS60188391A (en) | 1984-03-08 | 1984-03-08 | Method for manufacturing organosilane |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4453584A JPS60188391A (en) | 1984-03-08 | 1984-03-08 | Method for manufacturing organosilane |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS60188391A JPS60188391A (en) | 1985-09-25 |
| JPS6348276B2 true JPS6348276B2 (en) | 1988-09-28 |
Family
ID=12694198
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP4453584A Granted JPS60188391A (en) | 1984-03-08 | 1984-03-08 | Method for manufacturing organosilane |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS60188391A (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH07113034B2 (en) * | 1989-04-28 | 1995-12-06 | 信越化学工業株式会社 | Organosilicon compound |
-
1984
- 1984-03-08 JP JP4453584A patent/JPS60188391A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS60188391A (en) | 1985-09-25 |
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