JP7201380B2 - Cleaning system and cleaning method - Google Patents

Description

The present invention relates to a cleaning system and cleaning method.

BACKGROUND ART With increasing environmental awareness, it is essential to take measures to reduce odors when operating odor-generating devices or facilities. As a method for reducing the odor in the exhaust gas, there is known a method of washing the exhaust gas with water or a treatment liquid to dissolve the odorous components in the exhaust gas in the water. There is also known a method of improving the odor reduction efficiency by using a treatment liquid having a deodorizing effect. For example, Patent Literature 1 discloses a deodorizing device that reduces the odor in the air by spraying hypochlorous acid water on the air sent inside, and exhausts the air with the reduced odor. ing.

JP 2012-100717 A

The concentration of odor varies depending on the type of odor source. Even if the exhaust gas contains a higher concentration of odor, it is necessary to sufficiently reduce the odor. I had a problem.

It is an object of the present invention to reduce the amount of cleaning fluid used in cleaning systems.

In order to achieve the object of the present invention, for example, the cleaning system of the present invention has the following configuration. i.e.
a cooling device for cooling the gas to be cleaned and for separating the condensed liquid from the gas;
a cleaning device for cleaning the gas treated by the cooling device with a cleaning liquid;
with
The cooling device cools the gas to be cleaned that has flowed in through the first inlet with outside air that has flowed in from the second inlet, and has a first outlet through which the cooled gas to be cleaned flows out; and a second outlet through which the outside air used in
A confluence section is further provided in which the gas to be cleaned that has flowed out of the first outlet and the outside air that has flowed out from the second outlet join together, and the gas to be cleaned and the outside air after confluence join together. It is characterized by being led to a cleaning device .

The amount of cleaning liquid used in the cleaning system can be reduced.

1 is a schematic configuration diagram of a cleaning apparatus according to one embodiment of the present invention; FIG. 1 is a schematic configuration diagram of a cleaning system according to one embodiment of the present invention; FIG. 1 is a schematic configuration diagram of a cleaning system according to one embodiment of the present invention; FIG. 4 is a flowchart of a cleaning method according to one embodiment of the present invention; 1 is a schematic configuration diagram of a cleaning system according to one embodiment of the present invention; FIG. 1 is a schematic configuration diagram of a cooling device according to an embodiment of the present invention; FIG. 1 is a schematic configuration diagram of a cooling device according to an embodiment of the present invention; FIG.

BEST MODE FOR CARRYING OUT THE INVENTION Hereinafter, embodiments of the present invention will be described with reference to the accompanying drawings. It should be noted that the embodiments to be described below show examples of specific implementations of the present invention, and are merely specific examples of the configuration described in the claims. In particular, the cleaning device, cleaning system, and cleaning method according to the present invention are not limited to devices, systems, and methods whose main purpose is to deodorize gas to be deodorized. The cleaning apparatus, cleaning system, and cleaning method according to the present invention are for cleaning gas, and can be used for various purposes other than deodorization. For example, the cleaning apparatus, cleaning system, and cleaning method according to the present invention can also be used for sterilization of objects to be sterilized in gas. Therefore, the cleaning device, cleaning system, and cleaning method according to the present invention include devices, systems, and methods that are mainly intended for purposes other than deodorization but can be used for deodorization. EMBODIMENT OF THE INVENTION Hereinafter, embodiment of this invention is described taking as an example the (wet) deodorizing apparatus, the deodorizing system, and the deodorizing method which mainly aim at deodorizing the gas of the deodorizing object.

[Embodiment 1]
The wet deodorizing apparatus according to Embodiment 1 includes an inlet, a cleaning section, an outlet, a cleaning liquid supply section, and a bubble supply section. 1(A) and 1(B) are schematic diagrams each showing a configuration of an example of a wet deodorizing device according to Embodiment 1. FIG. A wet deodorizing apparatus according to this embodiment will be described below with reference to FIGS.

FIG. 1(A) shows a wet deodorizing device 100A according to this embodiment, and FIG. 1(B) shows a wet deodorizing device 100B according to this embodiment. A gas to be cleaned (deodorized) flows into these wet deodorizers 100A and 100B through an inlet 110, is deodorized by cleaning with a cleaning liquid 122, and flows out through an outlet 160. . In this specification, the gas to be cleaned may be referred to as the first gas.

The gas to be deodorized flows into the wet deodorizers 100A and 100B from the inlet 110 . For example, a pump (not shown) can be used to deliver the gas to be deodorized to inlet 110 . Here, the pump for sending the gas to the inlet 110 may be arranged inside or outside the wet deodorizing apparatuses 100A, 100B. The type of gas to be deodorized is not particularly limited. The high deodorizing performance of the wet deodorizing apparatuses 100A and 100B according to the present embodiment is suitable for deodorizing gas having a high odor concentration. For example, gases to be deodorized include gases produced by fermentation of organic matter, including exhaust from containers storing food waste or night soil. A specific example of an object to be deodorized is exhaust air from a compost (a composting apparatus).

The odorous component to be removed is also not particularly limited. Here, examples of odorous components in compost include basic components such as ammonia or trimethylamine, sulfide components such as methyl mercaptan, aldehyde components such as acetaldehyde, or carboxylic acid components such as propionic acid. mentioned. The wet deodorizing apparatuses 100A and 100B according to this embodiment are particularly suitable for reducing the concentration of ammonia. For example, in one embodiment, the concentration of ammonia in the gas to be deodorized is 100 ppm or more when cooled by a cooler, and 3000 ppm or more when not cooled by a cooler. Also, the gas to be deodorized that flows in from the inlet 110 may be gas that has been treated by another device such as a cooler or a deodorizing device located in the preceding stage.

The cleaning unit 120 cleans the gas to be deodorized that has flowed into the wet deodorizing devices 100A and 100B with the first cleaning liquid 122 . The cleaning part 120 has a contact part 121 where the gas to be deodorized and the first cleaning liquid 122 contact, and a part in which the first cleaning liquid 122 is stored. In one embodiment, the first cleaning liquid 122 is stored at the bottom of the wet deodorizers 100A,B, so the cleaning section 120 is also located at the bottom of the wet deodorizers 100A,B.

FIG. 1(C) is an enlarged view of one of the contact portions 121 in FIG. 1(A). The process of mixing the gas to be deodorized with the first cleaning liquid 122 will be described with reference to FIG. 1(C). First, the gas to be deodorized is accelerated by the pump and moves toward the narrowed passage portion 123 . In the example of FIG. 1(A), the gas to be deodorized passes through the channel narrowing portion 123 provided in the contact portion 121 and in proximity to the liquid surface of the first cleaning liquid 122 . At this time, since the flow of the gas to be deodorized is accelerated, a vortex flow accompanied by the first cleaning liquid 122 is generated after passing through the passage narrowed portion. Therefore, the gas to be deodorized and the first cleaning liquid 122 are efficiently mixed, and the gas to be deodorized is cleaned. Thus, the cleaning unit 120 can mix the gas to be deodorized with the first cleaning liquid 122, and in one embodiment, can agitate the gas to be deodorized and the first cleaning liquid 122 together. . In the example of FIG. 1A, the cleaning unit 120 has two contact portions 121 each having a flow path constricted portion, but the number of contact portions 121 is not particularly limited. For example, the wet deodorizing devices 100A and 100B may be provided with three or more contact portions (passage narrowing portions) if deodorizing efficiency is desired to be further improved. Moreover, by setting the number of the contact portions 121 to one in the wet deodorizing devices 100A and 100B, the size can be reduced more than when a plurality of contact portions are provided.

In the example of FIG. 1B, the gas to be deodorized passes through the inside of the first cleaning liquid 122 at the contact portion 121, and the gas to be deodorized is cleaned at this time. In the examples of FIGS. 1A and 1B, the liquid level of the first cleaning liquid 122 is uneven due to the pressure of the gas to be deodorized flowing from the inlet 110 . The liquid level of the first cleaning liquid 122 is set to be higher than the inflow port 153 and the outflow port 154 and lower than the outflow port 180 . In addition, the liquid level of the first cleaning liquid 122 during cleaning is close to the channel narrowed portion 123 . That is, by discharging the first cleaning liquid 122 through the outflow port 180, it is possible to prevent the water level from becoming too high, and it is possible to discharge the first cleaning liquid 122 after being used for cleaning. . By maintaining the water level higher than the inflow port 153 and the outflow port 154 , it is possible to supply air bubbles to the first cleaning liquid 122 .

However, the configuration of the cleaning unit 120 is not limited to this. For example, the first cleaning liquid 122 may be sprayed in the cleaning section 120 . In this case, the gas to be deodorized is cleaned when passing through the mist of the first cleaning liquid 122 . Further, in the cleaning unit 120, the gas to be deodorized that has flowed in from the inlet 110 may be bubbled into the first cleaning liquid 122. In this case also, the gas to be deodorized can be cleaned with the first cleaning liquid 122.

The gas after being cleaned with the first cleaning liquid 122 flows out from the outlet 160 . The gas exiting the outlet 160 may be released into the atmosphere or may be further processed by other equipment such as a deodorizer. Thus, the gas discharged from the outlet 160 has less odor components to be deodorized than the gas to be deodorized before flowing in from the inlet 110 . Specifically, when the odor to be deodorized is the odor from the compost, at least the concentration of ammonia is reduced by washing with the wet deodorizing apparatuses 100A and 100B.

Next, the internal structure of the wet deodorizing apparatuses 100A and 100B will be described. The inside of the wet deodorizing apparatuses 100A and 100B is classified into several compartments. The wet deodorizing devices 100A and 100B have an inflow section 131 and an inflow port 110 is provided in the inflow section 131 . The inflow section 131 is a section upstream of the cleaning section 120 where cleaning with the first cleaning liquid 122 is performed, that is, a section between the inflow port 110 and the cleaning section 120 . The wet deodorizing devices 100A and 100B also have an outflow section 141 in which an outflow port 160 is provided. The outflow section 141 is a section downstream of the cleaning section 120 where cleaning with the first cleaning liquid 122 is performed, that is, a section between the cleaning section 120 and the outflow port 160 .

The cleaning liquid supply units 130 and 140 supply a second cleaning liquid different from the first cleaning liquid 122 . The cleaning liquid supply units 130 and 140 can supply the second supply liquid so as to be mixed with the first cleaning liquid 122 used for cleaning in the cleaning unit 120 . Here, the cleaning liquid supply units 130 and 140 clean the gas to be deodorized with the second cleaning liquid in at least one of between the inlet 110 and the cleaning section 120 and between the cleaning section 120 and the outlet 160. A second cleaning liquid can be supplied as described. For example, cleaning liquid supplies 130 and 140 may supply the second cleaning liquid to the space between inlet 110 and cleaning section 120 (i.e., inlet section 131) and the space between cleaning section 120 and outlet 160. (i.e., outflow compartment 141).

As an example, the wet deodorizing apparatus 100A includes a first cleaning liquid supply unit 130 that sprays a second cleaning liquid into an inflow section 131 and an outflow section 141 that sprays a second cleaning liquid, as shown in FIG. and a second cleaning liquid supply unit 140 . The first cleaning liquid supply section 130 sprays the second cleaning liquid on the gas flow path from the inlet 110 to the cleaning section 120 . Also, the first cleaning liquid supply section 130 sprays the second cleaning liquid on the gas flow path from the cleaning section 120 toward the outlet 160 . However, as in the wet deodorizing apparatus 100B shown in FIG. 1B, a configuration in which the second cleaning liquid supply unit 140 is provided and the first cleaning liquid supply unit 130 is not provided can also be adopted. Also, it is not essential that the cleaning liquid supply units 130 and 140 spray the second cleaning liquid. For example, it is possible to employ a configuration in which the gas to be deodorized passes through the inside of the second cleaning liquid as air bubbles.

The cleaning liquid supply units 130 and 140 are provided so that the second cleaning liquid after cleaning the gas to be deodorized is mixed with the first cleaning liquid used for cleaning in the cleaning section 120 . For example, as shown in FIGS. 1A and 1B, wet deodorizing devices 100A and 100B can have a single washing tank having an inlet 110, a washing section 120, and an outlet 160. FIG. The cleaning liquid supply units 130 and 140 are arranged so that the liquid surface of the first cleaning liquid 122 in the cleaning unit 120 is lower than the supply position of the second cleaning liquid (that is, the position of the cleaning liquid supply units 130 and 140). be able to.

The cleaning liquid supply units 130 and 140 can supply the second cleaning liquid supplied from the outside of the apparatus instead of supplying the first cleaning liquid 122 stored in the wet deodorizing devices 100A and 100B. According to such a configuration, the cleaning liquid supply units 130 and 140 can supply fresh cleaning liquid, and the fresh cleaning liquid can be used to clean the gas to be deodorized, thereby further reducing odor. Here, the fresh cleaning liquid refers to cleaning liquid that has not yet been used for cleaning the gas to be deodorized in the wet deodorizing apparatuses 100A and 100B. For example, the fresh cleaning liquid may be a cleaning liquid substantially free of odorous components contained in the gas to be deodorized. Fresh cleaning fluid can also be cleaning water that is substantially free of components other than the cleaning fluid itself. However, the fresh cleaning liquid may be the cleaning liquid which has been used for cleaning the gas in another deodorizing device, provided that it is supplied from the outside of the device and has not yet been used for cleaning in this device. By using such a configuration in combination with the cleaning unit 120 that cleans the gas to be deodorized using the first cleaning liquid 122, the odor removal capability can be improved. In particular, the second cleaning liquid supply unit 140 makes it possible to remove odors better by cleaning the gas after cleaning with the first cleaning liquid 122 with fresh cleaning liquid. As described above, since the fresh second cleaning liquid is supplied so as to be mixed with the first cleaning liquid 122 used for cleaning in the cleaning section 120, the components to be cleaned in the first cleaning liquid 122 are further reduced. can do. Further, with a configuration having an outlet port 180, which will be described later, the first cleaning liquid 122 is appropriately discharged, so that cleaning can be performed with fresher cleaning liquid.

The first cleaning liquid 122 and the second cleaning liquid are further described below. The second cleaning liquid is not particularly limited. For example, the second cleaning liquid may be water. Also, the second cleaning liquid may be a weakly acidic or acidic aqueous solution with a pH of less than 7 so as to improve the ability to remove basic odor components such as ammonia. Furthermore, in order to improve deodorizing efficiency, the second cleaning liquid may be an aqueous solution containing a deodorizing agent. The type of deodorant is not particularly limited, and may be, for example, an oxidizing agent, an antibacterial agent, or a microorganism. Examples of oxidizing agents include ozone, hypochlorous acid, and the like. Examples of antibacterial agents include chitosan, catechin, and the like.

In one embodiment, an aqueous solution containing hypochlorous acid or hypochlorite ions is used as the second cleaning liquid. In this case, the pH of the second cleaning liquid is not particularly limited, but the pH of the second cleaning liquid can be 7 or less so as to improve the activity. Also, from the viewpoint of stability, the pH of the second cleaning liquid can be set to 5 or higher. An aqueous solution containing hypochlorous acid or hypochlorite ions having a pH of 5 or more and 7 or less is known as hypochlorous acid water. From the viewpoint of deodorant performance, the chlorine concentration in the second cleaning liquid can be 100 ppm or more, or can be 1000 ppm or more. On the other hand, from an economical point of view, the chlorine concentration in the second cleaning liquid may be 10 ppm or more and may be 500 ppm or less.

The second cleaning liquid may be hypochlorous acid water containing hypochlorous acid and bicarbonate ions. Such hypochlorous acid water has a stable pH due to its buffering action, and thus has stable properties. Such hypochlorous acid water can be obtained by mixing and diluting sodium hypochlorite and carbon dioxide in water. However, hypochlorous acid water obtained by other methods such as water electrolysis or mixing sodium hypochlorite and dilute hydrochloric acid can also be used as the second cleaning liquid.

The first cleaning liquid 122 is mixed with the second cleaning liquid that has been used for cleaning the gas to be deodorized. Thus, in one embodiment, the composition of the first cleaning liquid 122 is different than the second cleaning liquid. For example, the odor component concentration of the first cleaning liquid 122 can be higher than that of the second cleaning liquid. As an example, when hypochlorous acid water is used as the cleaning liquid, the first cleaning liquid 122 and the second cleaning liquid have different pH values. That is, the second cleaning liquid, which is a fresh cleaning liquid, is closer to the ideal pH range of the hypochlorous water spray than the first cleaning liquid 122 used for cleaning. Therefore, in the second cleaning liquid, the pH value of the hypochlorous water spray becomes closer to the acidic side or the alkaline side depending on the component to be deodorized. Also, the deodorant concentration (for example, chlorine concentration) of the second cleaning liquid can be made higher than that of the first cleaning liquid.

The properties of the first cleaning liquid 122 can be adjusted using a method of adding cleaning liquid, a method of supplying air bubbles, which will be described later, or the like. In one embodiment, an aqueous solution containing hypochlorous acid or hypochlorite ions is used as the first cleaning liquid. In this case, the pH of the first cleaning liquid is not particularly limited, but the pH of the first cleaning liquid can be 7 or less so as to improve the activity. Moreover, from the viewpoint of stability, the pH of the first cleaning liquid can be set to 5 or higher. From the viewpoint of deodorant performance, the chlorine concentration in the first cleaning liquid can be 100 ppm or more, or can be 1000 ppm or more. On the other hand, from the viewpoint of economy, the chlorine concentration in the first cleaning liquid may be 10 ppm or more and 500 ppm or less.

The bubble supply unit 150 mixes the first cleaning liquid 122 with bubbles of a second gas different from the gas to be cleaned (the gas to be deodorized or the first gas). The bubble supply unit 150 can mix gas bubbles supplied from the outside of the wet deodorizing apparatuses 100A and 100B as second gas bubbles. Due to the function of the bubble supply section 150, the contact area between the first cleaning liquid 122 and the gas to be deodorized in the cleaning section 120 increases, thereby improving the cleaning efficiency. In one embodiment, the bubble supply unit 150 supplies nanobubbles to the first cleaning liquid 122 to further improve cleaning efficiency. Nanobubbles refer to bubbles with an average bubble diameter of less than 1 μm. The first cleaning liquid 122 can also be activated by using nanobubbles. Also, by using nanobubbles, it is possible to suppress the generation of sludge in the first cleaning liquid 122 . Note that the function of the bubble supply unit 150 is not limited to the function of supplying nanobubbles as long as it has the function of increasing the contact area between the first cleaning liquid 122 and the gas to be deodorized. As one embodiment, the bubble supply unit 150 may supply microbubbles or millibubbles to the first cleaning liquid 122, or may supply bubbles in which these are mixed.

The type of gas supplied by the bubble supply unit 150 is not particularly limited. For example, the bubble supplier 150 may supply air. On the other hand, the bubble supply unit 150 can mix the first cleaning liquid 122 with a gas having an effect of adjusting the properties of the first cleaning liquid 122 . Examples of such gases include acid gases such as carbon dioxide. By adjusting the properties of the first cleaning liquid 122, it is possible to improve the removal efficiency of odorous components. For example, when the first cleaning liquid 122 absorbs a basic component, the pH increases. By lowering the pH of the first cleaning liquid 122 using an acid gas, the efficiency of removing the basic component can be improved. can. In particular, when hypochlorous acid water is used as the first cleaning liquid 122 or the second cleaning liquid, the deodorizing activity can be improved by lowering the pH of the first cleaning liquid 122 using an acid gas. Further, the bubble supply unit 150 can mix a gas having a deodorizing effect into the first cleaning liquid 122 . Examples of such gases include ozone and the like. That is, when the gas to be deodorized contains ammonia and hypochlorous acid water is used as the first cleaning liquid 122, it is preferable to use acid gas for the bubbles. With such a configuration, it is possible to increase gas-liquid contact while suppressing the pH of the first cleaning liquid 122 after the deodorizing process.

A specific configuration of the bubble supply unit 150 is not particularly limited. 1A and 1B show an example of a specific configuration of the air bubble supply section 150. FIG. In these examples, the bubble supply section 150 includes a circulation path 151 having an inlet 153 and an outlet 154, and a discharge section 152 for mixing bubbles into the first cleaning liquid 122 in the circulation path 151. there is The first cleaning liquid 122 stored in the cleaning section 120 flows into the circulation path 151 from the cleaning section 120 via an inlet 153 that is a connecting portion between the circulation path 151 and the cleaning section 120 . Also, the first cleaning liquid that has flowed in from the circulation path 151 is supplied to the cleaning section 120 again through an outlet 154 that is a connection portion between the circulation path 151 and the cleaning section 120 . With such a configuration, the first cleaning liquid 122 can be stirred.

As described above, when the liquid property of the first cleaning liquid 122 is adjusted using the method of supplying bubbles, the bubble supply unit 150 mixes the second gas bubbles into the first cleaning liquid 122 and then , the first cleaning liquid 122 may be pressurized. With such a configuration, it is possible to suppress the second gas from being released from the first cleaning liquid 122 at an early stage, and to more effectively adjust the properties of the first cleaning liquid 122 .

As a specific configuration example, the bubble supply unit 150 may be provided in the circulation path 151 and have a pressurized tank downstream of the release unit 152 . In this case, air bubbles mixed in the first cleaning liquid 122 at the discharge portion 152 can be effectively dissolved in the first cleaning liquid 122 in the pressurized tank. The pressure in the pressurized tank is not particularly limited and can be selected according to the type of bubbles, but may be, for example, 0.2 MPa or higher, or 1.0 MPa or lower or 0.5 MPa or lower. In particular, when the pH of the first cleaning liquid 122 is lowered with carbon dioxide, using such a configuration makes it possible to lower the pH more effectively. As in the configuration described above, in the cleaning unit 120, the first cleaning liquid 122 in which air bubbles are dissolved may be sprayed from the pressurized tank. In this case, the gas to be deodorized is more effectively cleaned when passing through the mist of the first cleaning liquid 122 .

The wet deodorizing devices 100A, B may have further configurations. For example, the wet deodorizing apparatuses 100A and 100B may have an input section 170 for inputting the first cleaning liquid 122. FIG. In addition, the wet deodorizing devices 100A and 100B may have an outlet 180 through which the first cleaning liquid 122 flows. In one embodiment, the amount of first cleaning liquid 122 is limited by outlet 180 . That is, even if the second cleaning liquid is mixed, the first cleaning liquid 122 flows out from the outlet 180 as an overflow, so the amount of the first cleaning liquid 122 is kept constant. Furthermore, the wet deodorizing devices 100A, B may have an outlet 190 at the bottom. Sludge accumulated in the wet deodorizers 100A and 100B can be discharged through the discharge port 190 . Furthermore, as shown in FIG. 1B, in order to improve the gas-liquid contact efficiency, a filler 195 may be provided at a location through which the second cleaning liquid is sprayed and the gas to be deodorized passes.

Finally, a deodorizing method according to one embodiment will be described with reference to the flowchart of FIG. 4(A). This deodorizing method can be realized by using the wet deodorizing device according to the first embodiment described above, for example, but it is also possible to use other wet deodorizing devices.

In step S10, the gas to be deodorized is guided to the cleaning section for cleaning with the first cleaning liquid. For example, the gas to be deodorized can be introduced from the inlet 110 into the cleaning section 120 . In step S20, bubbles of a gas different from the gas to be deodorized are mixed with the first cleaning liquid. For example, the bubble supplier 150 can mix bubbles with the first cleaning liquid 122 . In step S30, the gas after being cleaned with the first cleaning liquid 122 is led out of the cleaning section. For example, the gas cleaned in cleaning section 120 can be led out to outlet 160 .

Further, this deodorization method is a process of supplying the second cleaning liquid, which is a second cleaning liquid different from the first cleaning liquid 122, so as to be mixed with the first cleaning liquid 122 used for cleaning in the cleaning section 120. has the step of performing This processing will be called processing A. This step can be performed, for example, in at least one of step SS10 and step S30. For example, in at least one of step S10 and step S30, the first cleaning liquid is washed with the second cleaning liquid and the second cleaning liquid after cleaning the guided gas is mixed with the first cleaning liquid. A second cleaning liquid can be provided that has a different composition than the cleaning liquid. For example, the first cleaning liquid supply unit 130 can supply the second cleaning liquid so as to clean the gas guided from the inlet 110 to the cleaning unit 120 . Also, the second cleaning liquid supply unit 140 can supply the second cleaning liquid so as to clean the gas guided from the cleaning unit 120 to the outlet 160 .

[Modification of Embodiment 1]
In order to achieve the purpose of the configuration according to Embodiment 1 of improving the deodorizing ability of the deodorizing device, it is not necessary to employ all of the configuration shown in Embodiment 1. Modifications of the first embodiment will be described below.

[Modification 1]
The wet deodorizing apparatus according to one embodiment has the inlet 110, the cleaning section 120, the outlet 160, and at least one of the cleaning liquid supply section 130 and the cleaning liquid supply section 140 described above. According to such a configuration, the combination of the cleaning section 120 and the cleaning liquid supply sections 130 and 140 improves the deodorizing ability. A deodorizing method using such a wet deodorizing apparatus can be realized by performing steps S10 and S30 in FIG. 4A and performing processing A in at least one of steps S10 and S30.

[Modification 2]
A wet deodorizing device according to one embodiment has the inlet 110, the cleaning section 120, the outlet 160, and the air bubble supply section 150 described above. Here, the cleaning unit 120 mixes the gas to be deodorized that has flowed in from the inlet 110 with the first cleaning liquid 122 , thereby cleaning the gas to be deodorized with the first cleaning liquid 122 . According to such a configuration, the air bubbles mixed in the first cleaning liquid 122 increase the contact area when the gas to be deodorized and the first cleaning liquid 122 are mixed, thereby improving the deodorizing ability. . A deodorizing method using such a wet deodorizing apparatus can be realized by performing steps S10, S20, and S30 in FIG. 4(A). Processing A is not essential.

[Modification 3]
A wet deodorizing device according to one embodiment has the inlet 110, the cleaning section 120, the outlet 160, and the air bubble supply section 150 described above. Here, the bubble supply unit 150 mixes gas bubbles having an effect of adjusting the properties of the first cleaning liquid 122 or having a deodorizing effect into the first cleaning liquid 122 . According to such a configuration, it is possible to improve the deodorizing ability as already described. A deodorizing method using such a wet deodorizing apparatus can be realized by performing steps S10, S20, and S30 in FIG. 4(A). Processing A is not essential.

[Embodiment 2]
A wet deodorizing system according to Embodiment 2 includes a cooling device and a deodorizing device. The cooling device cools the gas to be deodorized and separates the condensed liquid from the gas. Also, the deodorizing device cleans the gas treated by the cooling device with a cleaning liquid. As the deodorizing device, the deodorizing device according to Embodiment 1 can be used, but the deodorizing device is not limited to this. According to the wet deodorizing system according to this embodiment, by cooling the gas to be deodorized, it is possible to separate the liquid containing a considerable part of the odor component. Therefore, the load on the deodorizing device can be reduced. As a result, the amount of cleaning liquid used by the deodorizing device can be reduced, or the amount of cleaning waste liquid discharged from the deodorizing device can be reduced.

The gas to be deodorized is not particularly limited. An example of the gas to be deodorized is the same as in the first embodiment, and the description is omitted. On the other hand, the higher the temperature of the gas to be deodorized, the easier it is for the liquid to condense in the cooling device, thereby improving the removal efficiency of odorous components in the cooling device. From this point of view, in one embodiment, the temperature of the gas to be deodorized can be 30° C. or less when cooled by the cooling device, and 60° C. when not cooled by the cooling device. That's it. Exhaust gas from compost can be cited as such a gas to be deodorized.

The configuration of the cooling device is not particularly limited, and any device can be used. For example, a device that air-cools or cools the gas to be deodorized that has flowed in with a refrigerant can be used as the cooling device. In one embodiment, the cooling device is configured to reduce the ammonia concentration of the gas to be deodorized from 3000 ppm or higher to 2500 ppm or lower by lowering the temperature of the gas to be deodorized from 50° C. or higher to 40° C. or lower. It is

The washing liquid is also not particularly limited. An example of the cleaning liquid is the same as that of the first embodiment, and the description thereof is omitted. On the other hand, in this embodiment, the amount of odorants sent to the deodorizer can be reduced because the cooling device separates the liquid containing a significant portion of the odorants. Therefore, especially when the cleaning liquid is an aqueous solution containing a deodorant, particularly when it is hypochlorous acid water, the amount of deodorant used by the deodorizer can be reduced by using the cooling device.

The present embodiment will be further described below with reference to FIG. 2 showing a configuration example of the wet deodorizing system according to the present embodiment. The wet deodorizing system shown in FIG. 2 includes a cooling device 300 and a deodorizing device 200 . The gas 500 to be deodorized is deodorized through the cooling device 300 and the deodorizing device 200 . The cooling device 300 cools the gas 500 to be deodorized that has flowed in through the inlet 301 and discharges it from the outlet 302 . At this time, the cooling device 300 separates the liquid 630 produced by the condensation from the gas and discharges it from the discharge port 303 . The outflow port 302 is connected to the inflow port 201 of the deodorizing device 200 , and the gas discharged from the outflow port 302 flows into the deodorizing device 200 through the inflow port 201 . Then, the deodorizing device 200 cleans the gas that has flowed in from the inlet 201 and has been processed by the cooling device 300 with the cleaning liquid 410 and discharges it from the outlet 202 . Cleaning fluid 410 is supplied from an external source 400, such as a well or hypochlorous acid water generator. Further, from the discharge port 203 of the deodorizing device 200, the washing waste liquid 620 generated by the washing including the sludge accumulated in the deodorizing device 200 is discharged.

When the wet deodorizing devices 100A and 100B according to the first embodiment are used as the deodorizing device 200, the cleaning liquid 410 is supplied as the second cleaning liquid, and the outlet 203 through which the waste cleaning liquid 620 is discharged corresponds to the outlet 190. Also, the inlet 201 corresponds to the inlet 110 and the outlet 202 corresponds to the outlet 160 .

The cooling device can also cool the gas to be deodorized using the cleaning liquid discharged from the deodorizing device. Such a configuration will be described with reference to FIG. 3 showing a configuration example of a wet deodorizing system according to this embodiment. The wet deodorizing system shown in FIG. 3 includes a cooling device 230 , a first deodorizing device 210 and a second deodorizing device 220 . The gas 500 to be deodorized is deodorized through the cooling device 230 , the second deodorizing device 220 and the first deodorizing device 210 .

The cooling device 230 cools the gas 500 to be deodorized that has flowed in through the inlet 231 and discharges it from the outlet 232 . Also, the cooling device 230 separates the liquid 623 produced by the condensation from the gas and discharges it from the discharge port 233 . Here, the cooling device 230 uses the cleaning liquid 430 supplied from the second deodorizing device 220 to cool the gas. In the cooling device 230, the cleaning liquid 430 and the gas 500 to be deodorized may be separated via a heat medium, or the cleaning liquid 430 and the gas 500 to be deodorized may be in direct contact. In the latter case, as the cooling device 230, a device that cleans the gas 500 to be deodorized using a cleaning liquid 430, such as the wet deodorizing devices 100A and 100B according to the first embodiment, can be used. In this case, the cooling device 230 may wash the gas by contacting the supplied cleaning liquid 430 directly with the gas using a method such as spraying, as described in the first embodiment. Further, the cooling device 230 may add the supplied cleaning liquid 430 to the internal cleaning liquid through an inlet such as the inlet 170, for example.

The outflow port 232 is connected to the inflow port 221 of the second deodorizing device 220 , and the gas discharged from the outflow port 232 flows into the second deodorizing device 220 through the inflow port 221 . Then, the second deodorizing device 220 cleans the gas, which has been processed by the cooling device 230 and has flowed in from the inlet 221 , with the cleaning liquid 420 and discharges it from the outlet 222 . A cleaning liquid 420 is supplied from the first deodorizing device 210 . The second deodorizing device 220 also supplies the cleaning liquid 430 inside the second deodorizing device 220 to the cooling device 230 through the outlet 224 . For example, the second deodorizing device 220 can supply the cooling device 230 with the cleaning liquid 430 that overflows when the cleaning liquid 420 is supplied. Also, the sludge 622 accumulated in the second deodorizing device 220 is discharged from the outlet 223 of the second deodorizing device 220 .

The outflow port 222 is connected to the inflow port 211 of the first deodorizing device 210 , and the gas discharged from the outflow port 222 flows into the first deodorizing device 210 through the inflow port 211 . Then, the first deodorizing device 220 cleans the gas that has flowed in from the inlet 211 and has been processed by the second deodorizing device 220 with the cleaning liquid 410 and discharges it from the outlet 212 . Cleaning liquid 410 is supplied from an external source 400 . Also, the first deodorizing device 210 supplies the cleaning liquid 420 inside the first deodorizing device 210 to the second deodorizing device 220 through the outlet 214 . For example, the first deodorizing device 210 can supply the second deodorizing device 220 with the cleaning liquid 420 overflowing from the supply of the cleaning liquid 410 . Also, the sludge 621 accumulated in the first deodorizing device 210 is discharged from the discharge port 213 of the first deodorizing device 210 .

The first deodorizing device 210 can contain the cleaning liquid 420 up to the reference water level. Here, the cleaning liquid 420 may be a cleaning liquid after being used for gas cleaning. Then, the first deodorizing device 210 can supply the cleaning liquid exceeding the reference water level to the second deodorizing device 220 . The second deodorizing device 220 can similarly store the cleaning liquid 430 after being used for gas cleaning up to the standard water level, and can supply the cleaning liquid 430 exceeding the standard water level to the cooling device 230 .

As the first deodorizing device 210 and the second deodorizing device 220, the wet deodorizing device according to Embodiment 1 may be used, or another deodorizing device may be used. For example, as described in the first embodiment, the first deodorizing device 210 may clean the gas by contacting the supplied cleaning liquid 410 directly with the gas using a method such as spraying. Further, the second deodorizing device 220 may add the supplied cleaning liquid 420 to the internal cleaning liquid through an inlet such as the inlet 170, for example.

When the wet deodorizers 100A and 100B according to the first embodiment are used as the first deodorizing device 210, the cleaning liquid 410 is supplied as the second cleaning liquid, and the outflow port 214 through which the cleaning liquid 420 flows out corresponds to the outflow port 180. Also, the inlet 211 corresponds to the inlet 110 , the outlet 212 corresponds to the outlet 160 , and the outlet 213 corresponds to the outlet 190 . In this case, the cleaning liquid 410 supplied from the external supply source 400 can be directly sprayed inside the first deodorizing device 210 . According to such a configuration, it is possible to wash the gas to be deodorized using a fresh washing liquid in the latter stage of the wet deodorizing system, so that the odor can be better reduced. Further, when the wet deodorizing devices 100A and 100B according to the first embodiment are used as the second deodorizing device 220, the cleaning liquid 420 is supplied as the second cleaning liquid, and the outflow port 224 through which the cleaning liquid 430 flows out corresponds to the outflow port 180. . Also, the inlet 221 corresponds to the inlet 110 , the outlet 222 corresponds to the outlet 160 , and the outlet 223 corresponds to the outlet 190 .

Furthermore, the cooling device can air-cool the gas to be deodorized. Such a configuration will be described with reference to FIG. 5 showing a configuration example of a wet deodorizing system according to this embodiment. The wet deodorizing system shown in FIG. 5 includes a cooling device 300 and a deodorizing device 200. As shown in FIG. Components similar to those in FIG. 2 are denoted by the same reference numerals, and description thereof will be omitted.

A cooling device 300 shown in FIG. 5 has an inlet 301 into which gas 500 to be cleaned flows, and an inlet 304 into which external air 501 flows. Then, the gas 500 to be cleaned is cooled using the outside air 501 . Outside air refers to a gas whose temperature is lower than that of the gas to be cleaned. The cleaning apparatus may take in ambient air as outside air, or may take in gas contained in a cylinder or the like as outside air. Furthermore, it is desirable that the outside air has a lower concentration of odorous components than the gas to be cleaned. For example, the exhaust air discharged from the deodorizing device 200 may be taken in again as outside air.

A method of cooling the gas 500 to be cleaned by the outside air 501 is not particularly limited. For example, the gas 500 to be cleaned and the outside air 501 may be mixed directly in the cooling device 300 . The cooling device 300 according to one embodiment has a configuration for cooling the gas 500 to be cleaned with the outside air 501, and has an outlet 303 (discharge section) for discharging condensed water generated by cooling the gas 500 to be cleaned. are doing. According to such a configuration, the generated dew condensation water can be easily discharged.

On the other hand, the cooling device 300 according to one embodiment has a temperature adjustment unit that lowers the temperature of the gas 500 to be cleaned by the outside air 501 without mixing the gas 500 to be cleaned and the outside air 501 . For example, in the cooling device 300, the space through which the gas 500 to be cleaned passes and the space through which the external air 501 passes may be separated. By increasing the area of the wall separating the gas 500 to be cleaned and the outside air 501 (for example, by providing a pipe 311, which will be described later), it is possible to easily discharge the condensed water while maintaining the cooling efficiency. . In such a configuration, the gas to be cleaned 500 may be mixed with ambient air 501 after passing through the cooling device 300 in order to dilute the gas to be cleaned 500 . In particular, when the gas 500 to be cleaned is in a high temperature state, the use of such a configuration produces a special effect that dew condensation water is less likely to occur in the mixing section.

Here, an example of the cooling device will be described with reference to FIG. FIG. 6 is a perspective view schematically showing the cooling device 300. As shown in FIG.

The cooling device 300 is provided with three spaces by dividing a substantially rectangular box space with a first partition 315 , a second partition 325 and a third partition 335 . As shown in FIG. 2 , the cooling device 300 is provided with a first space 310 , a second space 320 and a third space 330 . The first space 310 is a space connected to the inlet 301 and partitioned by a first partition 315 . The second space 320 is a space connected to the inlet 304 and the outlet 305 and partitioned by the first partition 315 and the second partition 325 . The third space 330 is a space connected to the outflow port 302 and separated by the second partition 325 and the third partition 335 . Note that the number of spaces in the cooling device 300 is an example and is not limited to this.

The first space 310, the second space 320, and the third space 330 are substantially independent spaces due to the first partition 315, the second partition 325, and the third partition 335, and the gas flows into each space. cannot be moved. That is, the gas to be cleaned and the outside air are configured so as not to mix in their respective spaces. However, the first space 310 and the third space 330 are connected by a plurality of pipes 311 so that the gas to be cleaned can move between the first space 310 and the third space 330 . The piping 311 is desirably made of a material having high thermal conductivity such as copper. Also, in FIG. 6, the pipe 311 is represented as a cylinder, but it is not necessarily limited to this. As another form, the pipe 311 may be provided with a groove. Alternatively, the pipes 311 may be arranged irregularly.

In order to appropriately discharge the condensed water generated in each space, a discharge port 312 is provided in the first space 310, a discharge port 321 is provided in the second space 320, and a discharge port 303 is provided in the third space 330. there is Since the outlet 312 of the first space 310 is connected to the third space 330, the gas to be cleaned is prevented from being mixed with the outside air. Although the pipe connected to the drain port is not shown, it may be formed in an S shape so that only the liquid is discharged.

FIG. 7 is a plan view of the perspective view of the cooling device 300 of FIG. 6 viewed from a direction perpendicular to the XY plane. As shown in FIG. 3, the first partition 315, the second partition 325, and the third partition 335 are arranged with respect to the bottom surface (or horizontal surface) of the third space 330 so that the condensed water flows to the respective drain ports. Not parallel, but angled. By doing so, the condensed water can be properly discharged along the first partition 315 , the second partition 325 and the third partition 335 . An outlet 312, an outlet 321, and an outlet 303 (not shown in FIG. 7) are respectively provided at the lowest part along the partition of each space.

The cleaning target gas 500 flowing from the inlet 301 first flows into the first space 310 . The inflowing gas flows to the third space 330 via the pipe 311 . The gas in the third space 330 flows out from the outlet 302 .

On the other hand, the outside air 501 flowing in from the inlet 304 first flows into the second space 320 and then flows out from the outlet 305 . In the second space 320 , there are a plurality of pipes 311 between the inlet 301 and the outlet 302 through which the gas 500 to be cleaned flows. As a result, the temperature of the cleaning target gas 500 flowing inside the pipe 311 is lowered. Condensed water is generated on the inner wall of the pipe 311 as the temperature drops. In this way, it is possible to separate the odorous components contained in the gas 500 to be cleaned from the gas to be cleaned. The condensed water drops into the third space 330 due to gravity. Condensed water generated by cooling the gas to be cleaned is discharged from the discharge port 303 . Condensation generated in the first space 310 can drop into the third space 330 through the outlet 312 , and condensation from the outside air 501 generated in the second space 320 is discharged from the outlet 321 .

As another embodiment, the second space 320 may be provided with a shower port (not shown) for spraying liquid onto the pipe 311 . By providing the shower port, the temperature of the gas to be cleaned that flows inside the pipe 311 can be further lowered.

The gas 500 to be cleaned that has flowed out from the outlet 302 and the outside air 501 that has flowed out from the outlet 305 and has been used for cooling are first mixed at the confluence section 502 . Then, the combined gas 510 containing the cleaning target gas 500 and the outside air 501 is guided to the deodorizing device 200 and cleaned. By mixing the outside air 501 and the gas 500 to be cleaned in the confluence section 502, it is possible to introduce the gas into the deodorizing device 200 while reducing the concentration of odorous components contained in the gas to be cleaned. Therefore, even if the cleaning ability of the cleaning liquid used in the deodorizing tank is lowered, the same cleaning ability can be maintained as compared with the case of cleaning the gas 500 to be cleaned as it is. It is also possible to reduce the production cost.

Between the confluence part 502 and the deodorizing device 200, a blower part 520 such as a pump can be provided for blowing a gas 510 containing the gas 500 to be cleaned and the outside air 501 after confluence. By providing the air blower 520 at this position, it becomes possible to introduce both the gas 500 to be cleaned and the outside air 501 into the deodorizing system even when only one pump is used, for example. Additionally, a valve 350 may be further provided for adjusting the flow rate of the outside air 501 (or the gas to be cleaned 500). By using the valve 350, the amount of the inflowing outside air 501 (or the flow rate ratio between the gas 500 to be cleaned and the outside air 501) can be adjusted.

The liquid 630 , which is condensed water discharged from the discharge port 303 , may join the cleaning waste liquid 620 after being used for cleaning the gas discharged from the deodorizing device 200 at the junction 640 . Such a configuration is useful when reaction such as neutralization reaction is possible between the cleaning waste liquid 620 and the liquid 630 which is condensed water. For example, when the gas 500 to be cleaned is a gas containing ammonia such as exhaust gas from compost, and the deodorizing apparatus 200 uses an acidic liquid such as hypochlorous acid water as the cleaning liquid, the ammonia in the liquid 630 is cleaned. It can be neutralized with effluent 620 . The liquid after merging in the merging section 640 can be discharged or treated by an appropriate method.

In this way, cooling the gas to be deodorized and separating the condensed liquid from the gas can be realized at low cost. The air-cooling system as shown in FIG. 5 is expected to improve the deodorizing efficiency especially when using a deodorizing agent such as hypochlorous acid water. That is, the reaction of a chemical deodorant such as hypochlorous acid water generally progresses faster at higher temperatures. Further, according to the air-cooling system, the temperature of the gas to be cleaned is maintained to some extent, so it is expected that the deodorizing efficiency will be improved.

Further, the air cooling system as shown in FIG. 5 is expected to improve the deodorizing efficiency especially when used for deodorizing the gas generated by the fermentation of organic matter, such as exhaust gas from compost. That is, such a gas has a relatively high temperature and contains a large amount of ammonia, which is easily soluble in water. Therefore, it is considered that a small amount of condensed water greatly reduces the concentration of ammonia. When such a gas is cooled by an air cooling system, the ammonia concentration is greatly reduced, while the high temperature of the gas can be maintained to some extent, so the deodorizing efficiency of the deodorizing apparatus is improved, and it is expected that a high deodorizing efficiency as a whole can be obtained. be. In particular, when hypochlorous acid water is used as the cleaning liquid, high deodorizing efficiency can be obtained by maintaining a temperature suitable for hypochlorous acid water. Moreover, such gases at relatively high temperatures are expected to provide good cooling efficiency even when non-temperature regulated ambient air is used.

Several configuration examples of the wet deodorizing system according to the present embodiment have been introduced above. However, the wet deodorizing system according to this embodiment is not limited to the above configuration. That is, the wet deodorizing system according to the present embodiment can include any number of cooling devices of one or more and any number of deodorizing devices of one or more. For example, in the configuration of FIG. 3, only the first deodorizing device 210 may be used as the deodorizing device, and the cleaning liquid inside the first deodorizing device may be supplied to the cooling device 230 to cool the gas to be deodorized. . Moreover, in the configuration of FIG. 3, a further third deodorizing device may be used as the deodorizing device. The configurations of the respective cooling device and deodorizing device are not particularly limited, and the wet deodorizing device according to Embodiment 1 can be employed as one or more of the cooling device and deodorizing device. Moreover, one or more wet deodorizing devices according to Embodiment 1 having mutually different configurations can be employed. For example, the first deodorizing device 210 may have the configuration shown in FIG. 1(B), and the second deodorizing device 220 may have the configuration shown in FIG. 1(A).

Finally, a deodorizing method according to one embodiment will be described with reference to the flowchart of FIG. 4(B). This deodorization method can be realized, for example, by using the wet deodorization system according to Embodiment 2 described above, but it is also possible to use another wet deodorization system. In step S60, the gas to be deodorized is cooled and the condensed liquid is separated from the gas. In step S70, the gas treated in step S60 is washed with a washing liquid.

200: deodorizing device, 300: cooling device, 410: cleaning liquid, 500: gas to be deodorized

Claims (19)

a cooling device for cooling the gas to be cleaned and for separating the condensed liquid from the gas;
a cleaning device for cleaning the gas treated by the cooling device with a cleaning liquid;
with
The cooling device cools the gas to be cleaned that has flowed in through the first inlet with outside air that has flowed in from the second inlet, and has a first outlet through which the cooled gas to be cleaned flows out; and a second outlet through which the outside air used in
A confluence section is further provided in which the gas to be cleaned that has flowed out of the first outlet and the outside air that has flowed out from the second outlet join together, and the gas to be cleaned and the outside air after confluence join together. A cleaning system, characterized in that it leads to a cleaning device . 2. The cleaning system according to claim 1, further comprising a blower provided between the merging section and the cleaning device, for blowing the combined gas to be cleaned and the outside air. 3. The cooling device according to claim 1, wherein the cooling device has a temperature adjustment unit that lowers the temperature of the gas to be cleaned by the outside air without mixing the gas to be cleaned and the outside air. Washing system as described. 4. The cooling device according to any one of claims 1 to 3, wherein the cooling device is configured to lower the temperature of the gas to be cleaned from 50°C or higher to 40°C or lower. washing system. The cleaning according to any one of claims 1 to 4, wherein the cooling device is configured to reduce the ammonia concentration of the gas to be cleaned from 3000 ppm or more to 2500 ppm or less. system. The cleaning device supplies cleaning liquid inside the cleaning device to the cooling device,
The cleaning system according to any one of claims 1 to 5 , wherein the cooling device uses the supplied cleaning liquid to cool the gas to be cleaned. a second cleaning device for cleaning the gas treated by the cooling device with a cleaning liquid;
a first cleaning device for cleaning the gas cleaned by the second cleaning device with a cleaning liquid as the cleaning device;
A cleaning liquid is supplied to the first cleaning device from the outside,
The cleaning system according to any one of claims 1 to 6 , wherein the cleaning liquid inside the first cleaning device is supplied to the second cleaning device. 8. The cleaning system according to claim 7 , wherein the first cleaning device contains cleaning liquid up to a reference water level, and supplies cleaning liquid exceeding the reference water level to the second cleaning device. . 9. The cleaning system according to claim 7 , wherein the first cleaning device supplies cleaning liquid used for cleaning the gas to the second cleaning device. 10. The cleaning system according to any one of claims 7 to 9 , wherein the first cleaning device sprays the cleaning liquid supplied from the outside as it is inside. 11. The cleaning system according to any one of claims 1 to 10 , characterized in that said cleaning liquid is an aqueous solution containing a deodorant. 12. The cleaning system according to any one of claims 1 to 11 , wherein the cleaning liquid is hypochlorous acid or an aqueous solution containing hypochlorite ions. 13. The cleaning system according to claim 12 , wherein the chlorine concentration in said cleaning liquid is 10 ppm or more. 14. The cleaning system according to claim 12 or 13 , wherein the pH of the cleaning liquid externally supplied to said cleaning device is 7 or less. The cleaning system according to any one of claims 1 to 14 , wherein the gas to be cleaned is gas produced by fermentation of organic matter. 16. The cleaning system according to any one of claims 1 to 15 , wherein the gas to be cleaned is exhaust from compost. 17. The cleaning system according to any one of claims 1 to 16 , wherein said cooling device has a discharge part for discharging condensed water produced by cooling said gas to be cleaned. 18. The apparatus according to claim 17 , further comprising a confluence section where the cleaning liquid after being used for cleaning the gas discharged from the cleaning device and the condensed water discharged from the discharge section join together. washing system. a cooling step of cooling the gas to be cleaned and separating the condensed liquid from the gas;
a cleaning step of cleaning the gas treated in the cooling step with a cleaning liquid;
has
In the cooling step, the gas to be cleaned is cooled with outside air,
After the cooling step, the gas to be cleaned and the outside air are merged;
In the cleaning step, the combined gas to be cleaned and the outside air are cleaned.
A cleaning method characterized by:

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