JP7319082B2 - 成膜装置及び成膜方法 - Google Patents
成膜装置及び成膜方法 Download PDFInfo
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- 238000000034 method Methods 0.000 title claims description 27
- 229910052751 metal Inorganic materials 0.000 claims description 62
- 239000002184 metal Substances 0.000 claims description 62
- 239000000758 substrate Substances 0.000 claims description 35
- 230000015572 biosynthetic process Effects 0.000 claims description 28
- 238000001514 detection method Methods 0.000 claims description 23
- 230000003647 oxidation Effects 0.000 claims description 13
- 238000007254 oxidation reaction Methods 0.000 claims description 13
- 230000003287 optical effect Effects 0.000 claims description 4
- 229910052744 lithium Inorganic materials 0.000 description 71
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 25
- 229910052783 alkali metal Inorganic materials 0.000 description 23
- 150000001340 alkali metals Chemical class 0.000 description 23
- 238000003860 storage Methods 0.000 description 22
- 230000000052 comparative effect Effects 0.000 description 14
- 230000008021 deposition Effects 0.000 description 11
- 239000000203 mixture Substances 0.000 description 11
- 230000002093 peripheral effect Effects 0.000 description 9
- 238000004804 winding Methods 0.000 description 7
- 239000007773 negative electrode material Substances 0.000 description 6
- 239000000463 material Substances 0.000 description 5
- 230000008018 melting Effects 0.000 description 5
- 238000002844 melting Methods 0.000 description 5
- 229910018068 Li 2 O Inorganic materials 0.000 description 4
- WMFOQBRAJBCJND-UHFFFAOYSA-M Lithium hydroxide Chemical compound [Li+].[OH-] WMFOQBRAJBCJND-UHFFFAOYSA-M 0.000 description 4
- 238000006243 chemical reaction Methods 0.000 description 3
- 230000007423 decrease Effects 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 238000007740 vapor deposition Methods 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical group [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 2
- 238000004833 X-ray photoelectron spectroscopy Methods 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 238000004458 analytical method Methods 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 239000003086 colorant Substances 0.000 description 2
- 239000003792 electrolyte Substances 0.000 description 2
- 239000011888 foil Substances 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 230000002265 prevention Effects 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 229910052709 silver Inorganic materials 0.000 description 2
- 239000004332 silver Substances 0.000 description 2
- 239000011734 sodium Substances 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- 229910012851 LiCoO 2 Inorganic materials 0.000 description 1
- 229910013870 LiPF 6 Inorganic materials 0.000 description 1
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 1
- 240000007594 Oryza sativa Species 0.000 description 1
- 235000007164 Oryza sativa Nutrition 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- 229910052797 bismuth Inorganic materials 0.000 description 1
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 description 1
- 238000011088 calibration curve Methods 0.000 description 1
- 229910002092 carbon dioxide Inorganic materials 0.000 description 1
- 239000001569 carbon dioxide Substances 0.000 description 1
- 238000004737 colorimetric analysis Methods 0.000 description 1
- 239000011889 copper foil Substances 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 229910052733 gallium Inorganic materials 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 238000005286 illumination Methods 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 1
- 230000006698 induction Effects 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 229910021450 lithium metal oxide Inorganic materials 0.000 description 1
- FUJCRWPEOMXPAD-UHFFFAOYSA-N lithium oxide Chemical compound [Li+].[Li+].[O-2] FUJCRWPEOMXPAD-UHFFFAOYSA-N 0.000 description 1
- 229910001947 lithium oxide Inorganic materials 0.000 description 1
- 239000002932 luster Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 231100000572 poisoning Toxicity 0.000 description 1
- 230000000607 poisoning effect Effects 0.000 description 1
- -1 polypropylene Polymers 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 239000007774 positive electrode material Substances 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 235000009566 rice Nutrition 0.000 description 1
- 238000000682 scanning probe acoustic microscopy Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000004088 simulation Methods 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 238000005211 surface analysis Methods 0.000 description 1
- JBQYATWDVHIOAR-UHFFFAOYSA-N tellanylidenegermanium Chemical compound [Te]=[Ge] JBQYATWDVHIOAR-UHFFFAOYSA-N 0.000 description 1
- 230000000007 visual effect Effects 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E60/00—Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
- Y02E60/10—Energy storage using batteries
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- Physical Vapour Deposition (AREA)
- Battery Electrode And Active Subsutance (AREA)
Description
上記基板支持機構は、基板を支持する。
上記成膜源は、上記基板に金属膜を形成する。
上記検知機構は、上記基板に上記金属膜が形成される成膜中に、上記金属膜の状態を光学的に検知する。
上記真空容器は、上記基板支持機構、上記成膜源、及び上記検知機構を収容する。
10…主ローラ
10s…外周面
10c…中心軸
20…成膜源
21…溶融容器
25…蒸着材料
30…基板支持機構
31…巻出ローラ
32…巻取ローラ
33a、33b、33c、33d…ガイドローラ
40…防着板
41…開口
50…検知機構
51…色度計
52…制御装置
53…光源
56、57…シャッタ
60…フィルム
60d…成膜面
60r…非成膜面
70…真空容器
71…排気管
72…ガス供給機構
Claims (9)
- 基板を支持する基板支持機構と、
前記基板に金属膜を形成する成膜源と、
前記成膜源に対向する主ローラと、
前記基板に前記金属膜が形成される成膜中に、前記金属膜の状態を光学的に検知する検知機構と、
前記基板支持機構、前記成膜源、及び前記検知機構を収容する真空容器と
を具備し、
前記検知機構は、前記主ローラに巻回される前記基板に向けて白色光を放出する光源と、前記金属膜の色度を検知する色度計とを有し、
前記色度計は、前記主ローラに前記基板を介して対向し、前記光源により照射された前記金属膜の反射光を測色する成膜装置。 - 請求項1に記載の成膜装置であって、
前記検知機構は、減圧雰囲気で前記金属膜の酸化が進行した状態を前記金属膜の色度により検知する
成膜装置。 - 請求項2に記載の成膜装置であって、
前記検知機構によって検知された前記金属膜の前記色度に応じて、前記金属膜の成膜条件を制御する制御装置をさらに具備する
成膜装置。 - 請求項3に記載の成膜装置であって、
前記制御装置は、L*a*b*色空間における前記金属膜のb*値が10以下なるように前記成膜条件を制御する
成膜装置。 - 請求項4に記載の成膜装置であって、
前記制御装置は、前記L*a*b*色空間における前記金属膜のL*値が90以上なるように前記成膜条件を制御する
成膜装置。 - 基板支持機構に支持され、主ローラに巻回される基板に金属膜が形成される成膜中に、
前記主ローラに巻回される前記基板に向けた光源から白色光を放出し、前記光源によって照射された前記金属膜の反射光を前記主ローラに前記基板を介して対向させた色度計によって測色し、前記色度計によって前記金属膜の色度を検知する光学的手法を用い、
前記金属膜の状態を前記光学的手法で検知しながら、前記基板に前記金属膜を成膜する成膜方法。 - 請求項6に記載の成膜方法であって、
減圧雰囲気で前記金属膜の酸化が進行した状態を前記金属膜の色度により検知する
成膜方法。 - 請求項7に記載の成膜方法であって、
L*a*b*色空間における前記金属膜のb*値が10以下の成膜条件で前記基板に前記金属膜を成膜する
成膜方法。 - 請求項8に記載の成膜方法であって、
前記L*a*b*色空間における前記金属膜のL*値が90以上の成膜条件で前記基板に前記金属膜を成膜する
成膜方法。
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| Publication Number | Publication Date |
|---|---|
| JP2020180323A JP2020180323A (ja) | 2020-11-05 |
| JP7319082B2 true JP7319082B2 (ja) | 2023-08-01 |
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Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2003082452A (ja) | 2001-09-13 | 2003-03-19 | Citizen Watch Co Ltd | 装飾用金色被膜 |
| JP2016069684A (ja) | 2014-09-30 | 2016-05-09 | 住友金属鉱山株式会社 | 成膜装置および積層体フィルムと電極基板フィルムの各製造方法 |
| JP2017218674A (ja) | 2016-06-07 | 2017-12-14 | 日東電工株式会社 | 光学フィルムの製造方法 |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5852475A (ja) * | 1981-09-24 | 1983-03-28 | Ulvac Corp | 薄膜形成装置における薄膜監視測定方法およびその装置 |
| JP3179648B2 (ja) * | 1993-02-19 | 2001-06-25 | シチズン時計株式会社 | 金色装飾部品およびその製造方法 |
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2019
- 2019-04-24 JP JP2019082898A patent/JP7319082B2/ja active Active
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2003082452A (ja) | 2001-09-13 | 2003-03-19 | Citizen Watch Co Ltd | 装飾用金色被膜 |
| JP2016069684A (ja) | 2014-09-30 | 2016-05-09 | 住友金属鉱山株式会社 | 成膜装置および積層体フィルムと電極基板フィルムの各製造方法 |
| JP2017218674A (ja) | 2016-06-07 | 2017-12-14 | 日東電工株式会社 | 光学フィルムの製造方法 |
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| JP2020180323A (ja) | 2020-11-05 |
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