JP7555217B2 - Evaporation source and deposition device - Google Patents

Description

The present invention relates to a crucible, an evaporation source, and an evaporation apparatus used for vacuum deposition.

In a deposition apparatus for performing vacuum deposition, an evaporation source for evaporating or sublimating a film-forming material (evaporation material) is provided. The evaporation source is provided with a crucible in which the film-forming material is contained. A crucible according to a conventional example will be described with reference to FIG. 18. FIG. 18 is a schematic cross-sectional view showing a part of a crucible according to a conventional example. The crucible 500 includes a crucible body 510 having an opening for inserting and removing a container containing the film-forming material, a lid 520 for closing the opening of the crucible body 510, and a metal gasket 530 for sealing the gap between the crucible body 510 and the lid 520. In the crucible 500 according to the conventional example, annular protrusions 511 and 521 are provided on the crucible body 510 and the lid 520, respectively, and a configuration is adopted in which the annular protrusions 511 and 521 are inserted into the gasket 530. By adopting this configuration, a stable seal is achieved.

However, in the case of the above configuration, the annular protrusions 511, 521 leave marks on the gasket 530 where they have dug into it. As a result, after several uses, the desired sealing performance cannot be achieved and the gasket 530 must be replaced with a new one, resulting in increased costs.

JP 2014-198863 A Patent No. 3747324

The object of the present invention is to provide a crucible, evaporation source, and deposition device that can extend the durability life of a gasket.

In order to solve the above problems, the present invention provides
A crucible including: a crucible body having an opening for inserting and removing a container for accommodating a film forming material; a lid fixed to the crucible body for closing the opening; and a metal gasket for sealing a gap between the crucible body and the lid ;
a first heater for heating the crucible body;
a second heater for heating the gasket;
a control device that turns on both the first heater and the second heater during deposition, and turns off the first heater and then the second heater after deposition is completed;
An evaporation source comprising:
Both surfaces of the gasket are flat,
the crucible body is provided with a recess in which the gasket is disposed along the opening, and the bottom surface of the recess is formed of a flat surface;
The surface of the lid or a member provided between the lid and the gasket with which the gasket comes into contact is also configured as a flat surface,
The linear expansion coefficient of the material of the gasket is greater than the linear expansion coefficient of the material of the crucible body;
The present invention is characterized in that, under a temperature environment during non-deposition, the gasket is arranged with a gap between it and the inner side surface of the recess, and under a temperature environment during deposition, the gasket is configured to, due to thermal expansion, come into close contact with the inner side surface and bottom surface of the recess and the lid or a member provided between the lid and the gasket.

According to the present invention, the bottom surface of the recess in the crucible body and the surface of the lid or the member provided between the lid and the gasket that comes into contact with the gasket are all flat, so no protrusions are left on the gasket as in the prior art. In addition, in the temperature environment during deposition, the gasket thermally expands and comes into close contact with the inner side and bottom surface of the recess and the lid or the member provided between the lid and the gasket, providing sufficient sealing.

As explained above, the present invention can extend the durability of the gasket.

FIG. 2 is a schematic diagram of a deposition apparatus. FIG. 1 is a schematic diagram of a crucible according to a first embodiment of the present invention. 1 is a schematic diagram of a gasket according to a first embodiment of the present invention; FIG. 2 is a schematic diagram of a crucible body according to the first embodiment of the present invention. FIG. 2 is a schematic configuration diagram of a lid according to the first embodiment of the present invention. FIG. 2 is a diagram illustrating the behavior of the crucible according to the first embodiment of the present invention. FIG. 2 is a diagram illustrating the behavior of the crucible according to the first embodiment of the present invention. FIG. 11 is a schematic cross-sectional view showing a part of an evaporation source according to a second embodiment of the present invention. FIG. 11 is a control flow diagram of an evaporation source according to a second embodiment of the present invention. FIG. 11 is a schematic cross-sectional view showing a part of an evaporation source according to a third embodiment of the present invention. FIG. 11 is a schematic cross-sectional view showing a part of an evaporation source according to a fourth embodiment of the present invention. FIG. 11 is a schematic cross-sectional view showing a part of an evaporation source according to a fifth embodiment of the present invention. FIG. 13 is a schematic cross-sectional view showing a part of a crucible according to Example 6 of the present invention. FIG. 13 is a schematic cross-sectional view showing a part of an evaporation source according to a seventh embodiment of the present invention. FIG. 13 is a schematic cross-sectional view showing a part of an evaporation source according to an eighth embodiment of the present invention. FIG. 13 is a schematic cross-sectional view showing a part of an evaporation source according to a ninth embodiment of the present invention. FIG. 23 is a schematic cross-sectional view showing a part of an evaporation source according to a tenth embodiment of the present invention. FIG. 11 is a schematic cross-sectional view showing a part of a crucible according to a conventional example.

The following describes in detail the embodiments of the present invention with reference to the drawings. However, unless otherwise specified, the dimensions, materials, shapes, and relative positions of the components described in the embodiments are not intended to limit the scope of the present invention.

Example 1
A crucible, an evaporation source, and a deposition apparatus according to a first embodiment of the present invention will be described with reference to FIGS.

<Vapor deposition equipment>
1 is a schematic diagram of a deposition apparatus. The deposition apparatus 1 includes a chamber 2 configured to be in a near-vacuum state (reduced pressure atmosphere) by a vacuum pump 3, and an evaporation source 10 disposed inside the chamber 2. The evaporation source 10 serves to evaporate or sublimate a material (film forming material, evaporation material) to be evaporated onto a substrate B by heating the material. The material evaporated or sublimated by the evaporation source 10 is attached to the evaporation surface (surface on the evaporation source 10 side) of the substrate B placed inside the chamber 2, thereby forming a thin film on the substrate B.

The evaporation source 10 includes a crucible 100, a heater 200 for heating the crucible 100, and a control device 300 for controlling the heater 200. The control device 300 according to this embodiment is configured to control the operation of not only the heater 200 but also the entire deposition apparatus 1, including the vacuum pump 3.

<Crucible>
FIG. 2 is a schematic diagram of a crucible according to Example 1 of the present invention, in which FIG. 2(a) is a plan view of the crucible, and FIG. 2(b) is a cross-sectional view along the line AA in FIG. 2(a). FIG. 3 is a schematic diagram of a gasket according to Example 1 of the present invention, in which FIG. 2(a) is a plan view of the gasket, and FIG. 2(b) is a cross-sectional view along the line BB in FIG. 2(a). FIG. 4 is a schematic diagram of a crucible body according to Example 1 of the present invention, in which FIG. 2(a) is a front view of the crucible body (viewed from the side where the gasket is arranged), and FIG. 2(b) is a cross-sectional view along the line CC in FIG. 2(a). FIG. 5 is a schematic diagram of a lid according to Example 1 of the present invention, in which FIG. 2(a) is a rear view of the lid (viewed from the side where the gasket is in close contact), and FIG. 2(b) is a cross-sectional view along the line DD in FIG. 2(a).

The crucible 100 according to this embodiment includes a crucible body 110 having an opening 111 for inserting and removing a container 130 containing a film-forming material 120, a lid 140 for closing the opening 111, and a metal gasket 150 for sealing the gap between the crucible body 110 and the lid 140. The crucible body 110 and the lid 140 are fixed by a fixing device 160. Note that various known techniques such as bolts and nuts may be used for the fixing device 160. The crucible body 110 is also provided with an outlet 112 for releasing the evaporated or sublimated film-forming material 120 toward the substrate B.

The gasket 150 is made of a flat plate-like member having an opening 151 in the center. That is, both sides of the gasket 150 are made of flat surfaces. The crucible body 110 has a recess 113 in which the gasket 150 is arranged along the opening 111. The bottom surface of this recess 113 (the surface with which the gasket 150 contacts) is made of a flat surface. The crucible body 110 also has a screw shaft 114. The lid 140 according to this embodiment also has a recess 141 in which the gasket 150 is arranged. The bottom surface of this recess 141 (including the surface with which the gasket 150 contacts) is also made of a flat surface. The lid 140 also has an insertion hole 142 through which the screw shaft 114 is inserted. As a result, the lid 140 is attached to the crucible body 110 so that the screw shaft 114 is inserted into each insertion hole 142, and is fixed by a fixing device 160 (nut). In this embodiment, an opening 151 is provided in the center of the gasket 150, but this opening 151 does not have to be provided.

<Behavior of the crucible>
Fig. 6 and Fig. 7 are explanatory diagrams of the behavior of the crucible according to the first embodiment of the present invention. Fig. 6 shows the relationship between the crucible body and the gasket as viewed from the front side of the crucible body, and Fig. 7 shows the cross-sectional view of the crucible. Fig. 6(a) and Fig. 7(a) show the state under a temperature environment (room temperature environment) when no deposition is performed, and Fig. 6(b) and Fig. 7(b) show the state under a temperature environment during deposition.

In this embodiment, the materials of the gasket 150 are selected so that the linear expansion coefficient of the material is greater than that of the crucible body 110 and greater than that of the lid 140. For example, it is preferable to use aluminum as the material of the gasket 150 and titanium as the materials of the crucible body 110 and the lid 140.

In addition, in a temperature environment during non-deposition, the gasket 150 is arranged so as to have a gap between it and the inner side surface of the recess 113 of the crucible body 110 (see FIG. 6(a)). In this embodiment, in a temperature environment during non-deposition, the gasket 150 is arranged so as to have a gap between it and the inner side surface of the recess 141 of the lid 140. At this time, it is possible to set so that a minute gap is formed between the gasket 150 and the bottom surface of the recess 113 and between the gasket 150 and the bottom surface of the recess 141 (see FIG. 7(a)), or it is also possible to set so that there is no gap.

During the deposition process, the crucible 100 is heated by the heater 200 to evaporate or sublimate the film-forming material 120, and the crucible 100 is in a high-temperature state. In such a temperature environment during deposition, the gasket 150 is in a tight fit with the inner side and bottom of the recess 113 of the crucible body 110 and the lid 140 due to thermal expansion (see Figures 6(b) and 7(b)). In this embodiment, in the temperature environment during deposition, the gasket 150 is in a tight fit with the inner side and bottom of the recess 141 of the lid 140 due to thermal expansion (see Figure 7(b)).

<Advantages of the crucible, evaporation source, and deposition apparatus according to this embodiment>
According to this embodiment, the bottom surface of the recess 113 provided in the crucible body 110 and the surface of the lid 140 that the gasket 150 comes into contact with are both configured as flat surfaces. Therefore, unlike the conventional technology, no traces of protrusions remain on the gasket 150. Therefore, the durability life of the gasket 150 can be extended, and the gasket 150 can be used more than in the conventional technology. This also reduces costs. In addition, under the temperature environment during deposition, the gasket 150 thermally expands and adheres to the inner side and bottom surfaces of the recess 113 of the crucible body 110 and the lid 140, so that sufficient sealing can be obtained. As described above, according to this embodiment, sufficient sealing can be obtained during deposition.

Example 2
In this embodiment, the configuration of the evaporation source is shown, which has been provided with measures against leakage of the film-forming material after the deposition process. Since the basic configuration and operation are the same as those of the first embodiment, the same components are given the same reference numerals, and the description thereof will be omitted as appropriate. FIG. 8 is a schematic cross-sectional view showing a part of the evaporation source according to the second embodiment of the present invention, and is an enlarged cross-sectional view showing a part that clearly shows a configuration different from that of the first embodiment. FIG. 9 is a control flow diagram of the evaporation source according to the second embodiment of the present invention. The overall configuration of the deposition apparatus according to this embodiment is the same as that of the first embodiment.

As in Example 1, crucible 100A includes crucible body 110, container (not shown), lid 140A, gasket 150, and fixture 160. Unlike Example 1, lid 140A according to this example does not have recess 141. In this example, the side of lid 140A facing gasket 150 is configured as a flat surface. In this example, the same effect as in Example 1 can be obtained.

The evaporation source 10A according to this embodiment is equipped with a first heater 210 for heating the crucible body 110 and a second heater 220 for heating the gasket 150 as heaters for heating the crucible 100A. In this embodiment, the control device 300 turns on both the first heater 210 and the second heater 220 during deposition, and turns off the first heater 210 and then the second heater 220 after deposition is completed. The control method for the evaporation source 10A according to this embodiment will be described below with reference to the control flow of FIG. 9.

When the control device 300 receives a command to start the deposition process (S0), it turns on the first heater 210 (heater for crucible) (S1) and the second heater 220 (heater for gasket) (S2). The timing of turning on these heaters may be reversed or may be simultaneous. The crucible 100A is heated by turning on the first heater 210 and the second heater 220, and the film forming material is evaporated or sublimated by the environmental temperature in the crucible reaching a certain level or higher, thereby performing the deposition process. Then, the control device 300 judges whether or not to end the deposition based on a preset program process (S4). As a result, the deposition process continues while the deposition is not completed (S3), and when it is determined that the deposition is completed, the first heater 210 is turned off (S5).

After that, the control device 300 judges whether or not to turn off the second heater 220 (S6). Here, the timing at which the control device 300 turns off the second heater 220 is set based on the temperature of the crucible body 110 dropping to a temperature at which the film-forming material does not sublimate or evaporate. For example, it is possible to judge whether or not the time elapsed since the first heater 210 was turned off has reached a predetermined time, and set the second heater 220 to be turned off at the timing at which the time has passed. In other words, it is sufficient to set the time required for the temperature of the crucible body 110 to drop to a temperature at which the film-forming material does not sublimate or evaporate after the first heater 210 is turned off. This time can be set based on experimental data, empirical rules, etc. In addition, a sensor for measuring the temperature of the crucible body 110 can be provided, and the second heater 220 can be turned off at the timing at which the temperature measured by the sensor drops to a temperature at which the film-forming material does not sublimate or evaporate. As described above, the control device 300 determines whether to turn off the second heater 220 (S6), and turns off the second heater 220 (S7), thereby ending the heating control of the crucible 100A (S8).

As described above, according to the evaporation source 10A of this embodiment, the gasket 150 is heated and expanded even during the period from when the first heater 210 is turned off until when the second heater 220 is turned off, so that a seal can be obtained. The timing at which the control device 300 turns off the second heater 220 is set based on the temperature of the crucible body 110 having dropped to a temperature at which the film-forming material does not sublimate or evaporate. Therefore, even if the first heater 210 is turned off, the seal function is exerted while the film-forming material is sublimating or evaporating.

Example 3
10 is a schematic cross-sectional view showing a part of an evaporation source according to Example 3 of the present invention, and is an enlarged cross-sectional view showing a portion that clearly shows a configuration different from Example 1. The overall configuration of the deposition apparatus according to this example is the same as that of Example 1.

As in Example 1, crucible 100B includes crucible body 110, container (not shown), lid 140B, gasket 150, and fixture 160. As in Example 2, lid 140B in this example does not have recess 141. In this example, the side of lid 140B facing gasket 150 is flat.

In addition, in the evaporation source 10B according to this embodiment, as in the second embodiment, a first heater 210 for heating the crucible body 110 and a second heater 220 for heating the gasket 150 are provided as heaters for heating the crucible 100B. In this embodiment, the second heater 220 is provided between the lid 140B and the gasket 150. The surface of the second heater 220 that the gasket 150 contacts is configured as a flat surface. In this embodiment, under the temperature environment during deposition, the gasket 150 is in close contact with the inner side and bottom surface of the recess 113 of the crucible body 110 and the second heater 220 due to thermal expansion. In this embodiment, the same effect as in the first embodiment can be obtained. In addition, the heater can adopt a configuration in which a heater wire is provided on a non-conductive metal plate. By using a heater configured in this manner as the second heater 220, the gasket 150 comes into close contact with the second heater 220, providing a stable sealing function. In addition, since the contact surface of the second heater 200 with the gasket 150 becomes the sealing surface, it is preferable to process it to increase its smoothness.

In this embodiment, similarly to the control flow described in the second embodiment, the control device 300 turns on both the first heater 210 and the second heater 220 during deposition, and turns on the first heater 210 after deposition is completed.
The second heater 220 is turned off after the heater 210 is turned off. In this embodiment as well, the same effects as those in the second embodiment can be obtained.

Example 4
11 is a schematic cross-sectional view showing a part of an evaporation source according to Example 4 of the present invention, and is an enlarged cross-sectional view showing a portion that clearly shows a configuration different from Example 1. The overall configuration of the deposition apparatus according to this example is the same as that of Example 1.

As in Example 1, crucible 100C includes crucible body 110, container (not shown), lid 140C, gasket 150, and fixture 160. As in Example 2, lid 140C according to this example does not have recess 141. In this example, the side of lid 140C facing gasket 150 is flat.

In addition, in the evaporation source 10C according to this embodiment, as in the second embodiment, the heater for heating the crucible 100C includes a first heater 210 for heating the crucible body 110 and a second heater 220 for heating the gasket 150. In this embodiment, the second heater 220 is fixed to the lid 140C so that the second heater 220 is disposed inside the opening 151 of the gasket 150. In this embodiment, as in the first and second embodiments, the gasket 150 is in close contact with the inner side and bottom of the recess 113 of the crucible body 110 and the lid 140C due to thermal expansion under the temperature environment during deposition. In this embodiment, the same effect as in the first embodiment can be obtained.

In this embodiment, similar to the control flow described in the second embodiment, the control device 300 turns on both the first heater 210 and the second heater 220 during deposition, and turns off the first heater 210 and then the second heater 220 after deposition is completed. In this embodiment, too, the same effect as in the second embodiment can be obtained.

Example 5
12 is a schematic cross-sectional view showing a part of an evaporation source according to Example 5 of the present invention, and is an enlarged cross-sectional view showing a portion that clearly shows a configuration different from Example 1. The overall configuration of the deposition apparatus according to this example is the same as that of Example 1.

The crucible 100D includes a crucible body 110, a container (not shown), a lid 140D, a gasket 150D, and a fixture 160, as in Example 1. Unlike Example 1, the gasket 150D of this example does not have an opening 151. However, this example can also adopt a configuration in which an opening 151 is provided. Also, unlike Example 1, the lid 140D of this example has a recess 141D for locating the second heater 220, instead of the gasket 150D. In this example, the contact surface of the lid 140D with the gasket 150D is flat.

In addition, in the evaporation source 10D according to this embodiment, as in the second embodiment, the heater for heating the crucible 100D is provided with a first heater 210 for heating the crucible body 110 and a second heater 220 for heating the gasket 150D. In this embodiment, the second heater 220 is fixed to the lid 140D so that the second heater 220 is disposed inside the recess 141D provided in the lid 140D. In this embodiment, as in the first and second embodiments, the gasket 150D is in close contact with the inner side and bottom of the recess 113 of the crucible body 110 and the lid 140D due to thermal expansion under the temperature environment during deposition. In this embodiment, the same effect as in the first embodiment can be obtained.

In this embodiment, similar to the control flow described in the second embodiment, the control device 300 turns on both the first heater 210 and the second heater 220 during deposition, and turns off the first heater 210 and then the second heater 220 after deposition is completed. In this embodiment, too, the same effect as in the second embodiment can be obtained.

Example 6
13 is a schematic cross-sectional view showing a part of a crucible according to Example 6 of the present invention, and is an enlarged cross-sectional view showing a part that clearly shows a configuration different from Example 1. The overall configuration of the deposition apparatus according to this example is the same as that of Example 1.

The crucible 100E according to this embodiment includes a crucible body 110, a container (not shown), a lid 140E, a gasket 150, and a fixing device 160, similar to the first embodiment. The lid 140E according to this embodiment does not have a recess 141, similar to the second embodiment. In this embodiment, the surface of the lid 140E facing the gasket 150 is flat. Therefore, like the first embodiment, the surface of the lid 140E that comes into contact with the gasket 150 is flat. In this embodiment, the same effect as the first embodiment can be obtained.

In this embodiment, the spring 170 is provided as a biasing member that biases the gasket 150 toward the bottom surface of the recess 113 of the crucible body 110. That is, the fixing device 160 is tightened with the spring 170 disposed between the nut of the fixing device 160 and the lid 140E. As a result, the gasket 150 is pressed by the lid 140E and biased toward the bottom surface of the recess 113 of the crucible body 110. By adopting the above-mentioned configuration, it is possible to prevent a gap from being generated between the gasket 150 and the bottom surface of the recess 113 of the crucible body 110 even in a temperature environment during non-deposition (room temperature environment). Therefore, it is possible to prevent leakage of the film-forming material after the deposition process.

(Example 7)
14 is a schematic cross-sectional view showing a part of an evaporation source according to Example 7 of the present invention, and is an enlarged cross-sectional view showing a part that clearly shows a configuration different from Example 1. The overall configuration of the deposition apparatus according to this example is the same as that of Example 1. Similarly to Example 1, the evaporation source 10F according to this example also includes a crucible 100F, a heater for heating the crucible 100F, and a control device 300 (see FIG. 1) for controlling the operation of the heater.

The crucible 100F includes a crucible body 110, a container (not shown), a lid 140F, a gasket 150, and a fixing device 160, as in Example 1. As in Example 2, the lid 140F according to this example does not have a recess 141. In this example, the surface of the lid 140F facing the gasket 150 is flat. Therefore, as in Example 1, the surface of the lid 140F that comes into contact with the gasket 150 is flat. In this example, the same effect as in Example 1 can be obtained.

In this embodiment, as in the sixth embodiment, a spring 170 is provided as a biasing member that biases the gasket 150 toward the bottom surface of the recess 113 of the crucible body 110. In this embodiment, too, the same effect as in the sixth embodiment can be obtained.

In addition, the evaporation source 10F according to this embodiment includes a first heater 210 for heating the crucible body 110 and a second heater 220 for heating the gasket 150 as heaters for heating the crucible 100F. In this embodiment, similar to the control flow described in the second embodiment, the control device 300 turns on both the first heater 210 and the second heater 220 during deposition, and turns off the first heater 210 and then the second heater 220 after the deposition is completed. In this embodiment, the same effect as in the second embodiment can be obtained.

As described above, in this embodiment, the effects of Example 6 are added to the effects of Example 2, so that leakage of the film-forming material after the deposition process can be more reliably suppressed.

(Example 8)
15 is a schematic cross-sectional view showing a part of an evaporation source according to Example 8 of the present invention, and is an enlarged cross-sectional view showing a portion that clearly shows a configuration different from that of Example 1. The overall configuration of the deposition apparatus according to this example is the same as that of Example 1. Similarly to Example 1, the evaporation source 10G according to this example also includes a crucible 100G, a heater for heating the crucible 100G, and a control device 300 (see FIG. 1) for controlling the operation of the heater.

As in Example 1, the crucible 100G includes a crucible body 110, a container (not shown), a lid 140G, a gasket 150, and a fixing device 160. As in Example 2, the lid 140G according to this example does not have a recess 141. In this example, the side of the lid 140G facing the gasket 150 is configured as a flat surface.

In addition, in the evaporation source 10G according to this embodiment, as in the second embodiment, the heater for heating the crucible 100G is provided with a first heater 210 for heating the crucible body 110 and a second heater 220 for heating the gasket 150. In this embodiment, the second heater 220 is provided between the lid 140G and the gasket 150. The surface of the second heater 220 that contacts the gasket 150 is flat. In this embodiment, under the temperature environment during deposition, the gasket 150 is in close contact with the inner side and bottom surface of the recess 113 of the crucible body 110 and the second heater 220 due to thermal expansion. In this embodiment, the same effect as in the first embodiment can be obtained.

In this embodiment, similar to the control flow described in the second embodiment, the control device 300 turns on both the first heater 210 and the second heater 220 during deposition, and turns off the first heater 210 and then the second heater 220 after deposition is completed. In this embodiment, too, the same effect as in the second embodiment can be obtained.

In this embodiment, as in the sixth and seventh embodiments, a spring 170 is provided as a biasing member that biases the gasket 150 toward the bottom surface of the recess 113 of the crucible body 110.

Example 9
16 is a schematic cross-sectional view showing a part of an evaporation source according to Example 9 of the present invention, and is an enlarged cross-sectional view showing a portion that clearly shows a configuration different from Example 1. The overall configuration of the deposition apparatus according to this example is the same as that of Example 1. Similarly to Example 1, the evaporation source 10H according to this example also includes a crucible 100H, a heater for heating the crucible 100H, and a control device 300 (see FIG. 1) for controlling the operation of the heater.

As in Example 1, crucible 100H includes crucible body 110, container (not shown), lid 140H, gasket 150, and fixture 160. As in Example 2, lid 140H according to this example does not have recess 141. In this example, the side of lid 140H facing gasket 150 is flat.

In addition, in the evaporation source 10H according to this embodiment, as in the second embodiment, a first heater 210 for heating the crucible body 110 and a second heater 220 for heating the gasket 150 are provided as heaters for heating the crucible 100H. In this embodiment, the second heater 220 is fixed to the lid 140H so that the second heater 220 is disposed inside the opening 151 of the gasket 150. In this embodiment, as in the first and second embodiments, the gasket 150 is in close contact with the inner side and bottom of the recess 113 of the crucible body 110 and the lid 140H due to thermal expansion under the temperature environment during deposition. In this embodiment, the same effect as in the first embodiment can be obtained.

In this embodiment, similar to the control flow described in the second embodiment, the control device 300 turns on both the first heater 210 and the second heater 220 during deposition, and turns off the first heater 210 and then the second heater 220 after deposition is completed. In this embodiment, too, the same effect as in the second embodiment can be obtained.

In this embodiment, as in embodiments 6 to 8, a spring 170 is provided as a biasing member that biases the gasket 150 toward the bottom surface of the recess 113 of the crucible body 110.

Example 10
17 is a schematic cross-sectional view showing a part of an evaporation source according to Example 10 of the present invention, and is an enlarged cross-sectional view showing a portion that clearly shows a configuration different from Example 1. The overall configuration of the deposition apparatus according to this example is the same as that of Example 1. Similarly to Example 1, the evaporation source 10I according to this example also includes a crucible 100I, a heater for heating the crucible 100I, and a control device 300 (see FIG. 1) for controlling the operation of the heater.

The crucible 100I includes a crucible body 110, a container (not shown), a lid 140I, a gasket 150I, and a fixture 160, as in Example 1. Unlike Example 1, the gasket 150I of this example does not include an opening 151. However, this example can also include an opening 151. Unlike Example 1, the lid 140I of this example includes a recess 141I for locating the second heater 220, instead of the gasket 150I. In this example, the contact surface of the lid 140I with the gasket 150 is flat.

In addition, in the evaporation source 10I according to this embodiment, as in the second embodiment, the heater for heating the crucible 100I includes a first heater 210 for heating the crucible body 110 and a second heater 220 for heating the gasket 150I. In this embodiment, the second heater 220 is fixed to the lid 140I so that the second heater 220 is disposed inside the recess 141I provided in the lid 140I. In this embodiment, as in the first and second embodiments, the gasket 150I is in close contact with the inner side and bottom of the recess 113 of the crucible body 110 and the lid 140I due to thermal expansion under the temperature environment during deposition. In this embodiment, the same effect as in the first embodiment can be obtained.

In this embodiment, similar to the control flow described in the second embodiment, the control device 300 turns on both the first heater 210 and the second heater 220 during deposition, and turns off the first heater 210 and then the second heater 220 after deposition is completed. In this embodiment, too, the same effect as in the second embodiment can be obtained.

In this embodiment, as in embodiments 6 to 9, a spring 170 is provided as a biasing member that biases the gasket 150 toward the bottom surface of the recess 113 of the crucible body 110.

(others)
In the third and eighth embodiments, a second heater is provided between the lid and the gasket, and the gasket is in close contact with the second heater, not with the lid. However, in these embodiments, the second heater can also function as a lid. This eliminates the need to provide a separate lid, and the number of parts can be reduced. By adopting a configuration in which a heater wire is provided on a non-conductive metal plate as the second heater, the second heater can also function as a lid. In addition, since the contact surface (contact surface) of the second heater with the gasket becomes a sealing surface, it is preferable to process it so that it has high smoothness.

The shapes of the gasket 150, the opening 111 and the recess 113 provided in the crucible body 110, and the recess 141 provided in the lid 140 are not limited to the shapes shown in the above embodiments. The planar shapes of the opening 111 and the recess 113 provided in the crucible body 110, and the recess 141 provided in the lid 140 may be similar to the planar shape of the gasket 150 (the dimensions may be slightly larger than those of the gasket 150). For example, in the above embodiment 1, the outer wall surface of the gasket 150 is shown to be configured to connect the flat surfaces with a curved surface (so-called R surface), but as shown in the circle in FIG. 3, a curved surface may not be provided. The same applies to the inner wall surface of the opening 151 in the gasket 150. When such a configuration is adopted, the inner wall surface of the recess 113 in the crucible body 110 and the inner wall surface of the opening 111 may also be configured in the same manner (see the circle in FIG. 4). The same applies to the shape of the inner wall surface of the recess 141 of the lid 140 (see the circled diagram in Figure 5).

REFERENCE SIGNS LIST 1 deposition device 2 chamber 3 vacuum pump 10 evaporation source 100 crucible 110 crucible body 111 opening 112 discharge port 113 recess 114 screw shaft 120 film forming material 130 container 140 lid 141 recess 142 insertion hole 150 gasket 151 opening 160 fixing device 170 spring 200 heater 210 first heater 220 second heater 300 control device

Claims (4)

A crucible including: a crucible body having an opening for inserting and removing a container for accommodating a film forming material; a lid fixed to the crucible body for closing the opening; and a metal gasket for sealing a gap between the crucible body and the lid ;
a first heater for heating the crucible body;
a second heater for heating the gasket;
a control device that turns on both the first heater and the second heater during deposition, and turns off the first heater and then the second heater after deposition is completed;
An evaporation source comprising:
Both surfaces of the gasket are flat,
the crucible body is provided with a recess in which the gasket is disposed along the opening, and the bottom surface of the recess is formed of a flat surface;
The surface of the lid or a member provided between the lid and the gasket with which the gasket comes into contact is also configured as a flat surface,
The linear expansion coefficient of the material of the gasket is greater than the linear expansion coefficient of the material of the crucible body;
An evaporation source characterized in that, under a temperature environment during non-deposition, the gasket is arranged with a gap between it and the inner side surface of the recess, and under a temperature environment during deposition, the gasket is configured to come into close contact with the inner side surface and bottom surface of the recess and the lid or a member provided between the lid and the gasket due to thermal expansion. 2. The evaporation source according to claim 1, further comprising a biasing member for biasing the gasket toward a bottom surface of the recess. The evaporation source described in claim 1 or 2, characterized in that the timing at which the control device turns off the second heater is set based on the temperature of the crucible body decreasing to a temperature at which the film forming material does not sublimate or evaporate. A chamber;
The evaporation source according to claim 1 , which is provided in the chamber and performs evaporation on an evaporation surface of a substrate placed in the chamber;
A deposition apparatus comprising:

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