JP7555853B2 - Light-scattering photosensitive resin composition, color filter, and image display device - Google Patents

Description

The present invention relates to a light-scattering photosensitive resin composition, a color filter, and an image display device, and more particularly to a light-scattering photosensitive resin composition, a color filter, and an image display device that can increase the brightness of light flowing in from a backlight unit or a quantum dot pixel layer.

Color filters are widely used in imaging devices and liquid crystal displays (LCDs), and their range of applications is expanding.

In recent years, one method for creating color filters is the pigment dispersion method, which uses a pigment-dispersed photosensitive resin. However, this pigment dispersion method has problems in that the light efficiency is reduced because part of the light emitted from the light source is absorbed by the color filter as it passes through the color filter, and the color reproducibility is reduced due to the characteristics of the pigment contained in the color filter.

Color filters using quantum dots have been proposed as a solution to these problems. For example, Korean Patent Publication No. 10-2009-0036373 discloses that replacing existing color filters with light-emitting layers made of quantum dot phosphors can improve the luminous efficiency and display quality of display devices.

However, in the case of color filters containing quantum dots, the performance of the color filter may decrease slightly due to a decrease in the efficiency of the quantum dots, especially the efficiency of blue quantum dots, and in the case of blue quantum dots, there is a problem that the overall manufacturing cost increases due to their high cost.

Therefore, a color filter was presented that uses a light source that emits blue light, has a red pattern layer containing red quantum dot particles, and a green pattern layer containing green quantum dot particles, and has a blue pixel layer that does not contain quantum dot particles in a position corresponding to the blue pattern layer, so that the red quantum dot particles emit red light and the green quantum dot particles emit green light, and the blue pixel layer allows blue light to pass through, resulting in a blue color.

However, in the case of blue, direct light occurs, making it difficult to achieve clear mixing when mixing colors. To solve this problem, technology has been developed to introduce a scattering layer into the blue pixel layer for scattering purposes. However, the introduction of a scattering layer causes the problem of reduced luminance. For this reason, there is a need to develop a photosensitive resin composition to improve the efficiency of blue pixels.

One object of the present invention is to provide a light-scattering photosensitive resin composition that can improve the problem of brightness reduction caused by the introduction of a scattering layer.

Another object of the present invention is to provide a light-scattering pixel layer formed from the photosensitive resin composition.

Another object of the present invention is to provide a color filter including the light-scattering pixel layer.

A further object of the present invention is to provide an image display device equipped with the above-mentioned color filter.

On the other hand, the present invention is
A photosensitive resin composition for forming a light-scattering pixel layer,
The photosensitive resin composition includes scattering particles, an alkali-soluble resin, a photopolymerizable compound, a photopolymerization initiator, and a solvent,
The light-scattering pixel layer formed from the photosensitive resin composition has a surface roughness of 50 Å or more.

In one embodiment of the present invention, the light-scattering pixel layer formed from the photosensitive resin composition may have a brightness of 60% or more relative to a light source based on a thickness of 10 μm.

In one embodiment of the present invention, the light source may be a blue light source.

In one embodiment of the present invention, the wavelength of the blue light source may be in the range of 380 nm to 530 nm.

In one embodiment of the present invention, the scattering particles may satisfy the following mathematical formula 1:

In one embodiment of the present invention, the alkali-soluble resin may have a substituent derived from glycidyl (meth)acrylate, and the repeating unit having the substituent derived from glycidyl (meth)acrylate may be contained in an amount of 10 to 50 mol % relative to 100 mol % of the total repeating units constituting the alkali-soluble resin.

In one embodiment of the present invention, the repeating unit having a substituent derived from glycidyl (meth)acrylate may be a repeating unit represented by the following chemical formula 1.

In the above formula,
Ra and Rb are each independently hydrogen or methyl.

In one embodiment of the present invention, the photopolymerization initiator may have a maximum absorption wavelength (λmax) at wavelengths of 360 nm or less.

On the other hand, the present invention provides a light-scattering pixel layer formed from the photosensitive resin composition.

On the other hand, the present invention provides a color filter including the light-scattering pixel layer.

On the other hand, the present invention provides an image display device that is characterized by being equipped with the above-mentioned color filter.

The photosensitive resin composition according to the present invention can increase the brightness of the light-scattering pixel layer by controlling the surface roughness of the light-scattering pixel layer to 50 Å or more. In addition, since the photosensitive resin composition according to the present invention can increase the brightness, it is easy to adjust the content of scattering particles.

The present invention will be explained in more detail below.

One embodiment of the present invention is a photosensitive resin composition for forming a light-scattering pixel layer, comprising: scattering particles (A); an alkali-soluble resin (B); a photopolymerizable compound (C); a photopolymerization initiator (D); and a solvent (E);
The light-scattering pixel layer formed from the photosensitive resin composition has a surface roughness of 50 Å or more.

The surface roughness means the arithmetic mean roughness Ra. In the present invention, the method for measuring the surface roughness of the light-scattering pixel layer is not particularly limited, and may be measured, for example, by the method presented in the experimental example described later.

In one embodiment of the present invention, the surface roughness of the light-scattering pixel layer is adjusted to 50 Å or more, for example, in the range of 50 Å to 300 Å, thereby improving the total reflection of light entering from the backlight unit and increasing the brightness. If the surface roughness of the light-scattering pixel layer is less than 50 Å, the brightness of the light-scattering pixel layer may decrease.

The surface roughness of the light-scattering pixel layer can be adjusted by appropriately changing the types and compositions of the components contained in the photosensitive resin composition described below.

The light-scattering pixel layer formed from the photosensitive resin composition is characterized by having a brightness of 60% or more relative to the light source based on a thickness of 10 μm.

The light source may be a blue light source, and the wavelength of the blue light source may be in the range of 380 nm to 530 nm.

A brightness of 60% or more is advantageous for adjusting the color mixing balance between the light scattering pixel layer and the red pixel layer and/or green pixel layer.

Scattering Particles (A)
In one embodiment of the present invention, the scattering particles serve to increase the path of light emitted from a light source, thereby improving overall light efficiency.

The photosensitive resin composition of the present invention containing the scattering particles can be suitably used to act as a blue pixel by a blue light source, and if a colorant other than the scattering particles is contained, a problem of reduced transmission efficiency of blue light generated from the light source may occur. Therefore, it is preferable that the photosensitive resin composition of the present invention does not contain a colorant other than the scattering particles.
In the present invention, the scattering particles include a metal oxide.

The metal oxide may include an oxide of one or more metals selected from the group consisting of Li, Be, B, Na, Mg, Al, Si, K, Ca, Sc, V, Cr, Mn, Fe, Ni, Cu, Zn, Ga, Ge, Rb, Sr, Y, Mo, Cs, Ba, La, Hf, W, Tl, Pb, Ce, Pr, Nd, Pm, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb, Ti, Sb, Sn, Zr, Nb, Ce, Ta, In, and combinations thereof.

For example, the metal oxide may include _one or more selected from the group consisting of _Al2O3 , _SiO2 , _ZnO , _ZrO2 , _BaTiO3 , _TiO2 , _{Ta2O5 , Ti3O5} , ITO, IZO, ATO, ZnO- _{Al, Nb2O3 ,} SnO, MgO, and combinations thereof, and if necessary, a material that has been surface-treated with a compound having an unsaturated bond such as acrylate may also be used.

The scattering particles may satisfy the following mathematical formula 1:

That is, the content of scattering particles having a particle size of 100 nm or more may be equal to or greater than the content of scattering particles having a particle size of less than 100 nm. When the content of scattering particles having a particle size of 100 nm or more and the content of scattering particles having a particle size of less than 100 nm satisfy the above mathematical formula 1, the scattering effect is increased, which is advantageous in performing the role of a blue pixel layer.

The scattering particles may be limited in average particle size and content in the entire composition so that the luminous intensity of the color filter can be maximized.

In the present invention, the "average particle size" may refer to the number-average particle size, which can be determined, for example, from images observed with a field emission scanning electron microscope (FE-SEM) or a transmission electron microscope (TEM). Specifically, it can be obtained by extracting several samples from the FE-SEM or TEM observation images, measuring the diameters of these samples, and taking the arithmetic average value.

For example, the metal oxide contained in the scattering particles of the present invention may have an average particle size in the range of 30 to 500 nm, preferably 30 to 300 nm. When the average particle size of the metal oxide satisfies the above range, the scattering effect is increased, and the photosensitive resin composition containing the scattering particles can perform the role of a blue pixel by a blue light source, which is preferable. In addition, the development of sinking in the composition can be suppressed to obtain a surface of uniform quality, so the average particle size may be appropriately adjusted within the above range.

The scattering particles may be contained in a range of 0.1 to 50 wt % relative to 100 wt % of the total solid content in the photosensitive resin composition, preferably in a range of 0.5 to 30 wt %, and more preferably in a range of 0.5 to 20 wt %. When the scattering particles are contained within the above range, it is advantageous that a scattering pixel having excellent luminous intensity can be manufactured. Specifically, when the scattering particles are contained within the above range, it is advantageous that the desired luminous intensity can be easily secured and a decrease in the stability of the composition can be suppressed.
Meanwhile, the photosensitive resin composition of the present invention can be used to perform the role of a blue pixel by a blue light source when cured, and if a colorant other than the scattering particles is included, there may be a problem that the transmittance efficiency of blue light emitted from the light source is reduced.

Therefore, the present invention is characterized by not containing any colorants other than scattering particles.

Alkali-soluble resin (B)
The alkali-soluble resin has reactivity due to the action of light or heat and alkali solubility, and acts as a dispersion medium for solid matters such as scattering particles, thereby performing the function of a binder resin.

Specifically, the alkali-soluble resin has a substituent derived from glycidyl (meth)acrylate, and the repeating unit having the substituent derived from glycidyl (meth)acrylate is preferably contained in an amount of 10 to 50 mol % relative to 100 mol % of the total repeating units constituting the alkali-soluble resin, from the viewpoint of controlling the surface roughness of the light-scattering pixel layer.

If the repeating unit having a substituent derived from glycidyl (meth)acrylate is contained in an amount of less than 10 mol % relative to the total 100 mol % of the repeating units constituting the alkali-soluble resin, the taper angle of the pattern cross section may become poor, and if it is contained in an amount of more than 50 mol %, the reflow characteristics may increase, residues and taper dragging may occur, and the brightness of the light-scattering pixel layer may decrease.

The repeating unit having a substituent derived from glycidyl (meth)acrylate may be a repeating unit represented by the following chemical formula 1.

In the above formula,
Ra and Rb are each independently hydrogen or methyl.

The alkali-soluble resin having a substituent derived from glycidyl (meth)acrylate may be obtained by reacting glycidyl (meth)acrylate with a copolymer of an unsaturated carboxyl group-containing monomer and another monomer copolymerizable therewith.

Examples of the unsaturated carboxyl group-containing monomer include unsaturated monocarboxylic acids, unsaturated dicarboxylic acids, unsaturated tricarboxylic acids, and other unsaturated polycarboxylic acids having two or more carboxyl groups in the molecule.

Examples of the unsaturated monocarboxylic acid include acrylic acid, methacrylic acid, crotonic acid, α-chloroacrylic acid, and cinnamic acid.

Examples of the unsaturated dicarboxylic acid include maleic acid, fumaric acid, itaconic acid, citraconic acid, and mesaconic acid.

The unsaturated polycarboxylic acid may be an acid anhydride, and specific examples thereof include maleic anhydride, itaconic anhydride, and citraconic anhydride. The unsaturated polycarboxylic acid may also be a mono(2-(meth)acryloyloxyalkyl)ester thereof, and examples thereof include mono(2-acryloyloxyethyl) succinate, mono(2-methacryloyloxyethyl) succinate, mono(2-acryloyloxyethyl) phthalate, and mono(2-methacryloyloxyethyl) phthalate. The unsaturated polycarboxylic acid may also be a mono(meth)acrylate of a polymer having dicarboxylates at both ends, and examples thereof include ω-carboxypolycaprolactone monoacrylate and ω-carboxypolycaprolactone monomethacrylate.

The carboxyl group-containing monomers may be used alone or in combination of two or more.

Examples of other monomers copolymerizable with the carboxyl group-containing monomer include aromatic vinyl compounds such as styrene, α-methylstyrene, o-vinyltoluene, m-vinyltoluene, p-vinyltoluene, p-chlorostyrene, o-methoxystyrene, m-methoxystyrene, p-methoxystyrene, o-vinylbenzyl methyl ether, m-vinylbenzyl methyl ether, p-vinylbenzyl methyl ether, o-vinylbenzyl glycidyl ether, m-vinylbenzyl glycidyl ether, p-vinylbenzyl glycidyl ether, and indene; methyl acrylate, methyl methacrylate, ethyl acrylate, ethyl methacrylate, n-propyl acrylate, n-propyl methacrylate, i-propyl acrylate, i-propyl methacrylate, n-butyl acrylate, n-butyl methacrylate, i-butyl acrylate, i-butyl methacrylate, sec-butyl acrylate, sec-butyl methacrylate, t-butyl acrylate, t-butyl methacrylate, 2-hydroxyethyl ... diethyl methacrylate, 2-hydroxypropyl acrylate, 2-hydroxypropyl methacrylate, 3-hydroxypropyl acrylate, 3-hydroxypropyl methacrylate, 2-hydroxybutyl acrylate, 2-hydroxybutyl methacrylate, 3-hydroxybutyl acrylate, 3-hydroxybutyl methacrylate, 4-hydroxybutyl acrylate, 4-hydroxybutyl methacrylate, allyl acrylate, allyl methacrylate, benzyl acrylate, benzyl methacrylate, cyclohexyl acrylate, cyclohexyl methacrylate, phenyl acrylate, phenyl methacrylate, 2-methoxyethyl acrylate, 2-methoxyethyl methacrylate, 2-phenoxyethyl acrylate, 2-phenoxyethyl methacrylate, methoxydiethylene glycol acrylate, methoxydiethylene glycol methacrylate, methoxytriethylene glycol acrylate, methoxytriethylene glycol methacrylate, methoxypropylene glycol acrylate, methoxypropylene unsaturated carboxylic acid esters such as ethylene glycol methacrylate, methoxydipropylene glycol acrylate, methoxydipropylene glycol methacrylate, isobornyl acrylate, isobornyl methacrylate, dicyclopentadienyl acrylate, dicyclopentadiethyl methacrylate, 2-hydroxy-3-phenoxypropyl acrylate, 2-hydroxy-3-phenoxypropyl methacrylate, glycerol monoacrylate, and glycerol monomethacrylate; unsaturated carboxylic acid amino alkyl esters such as 2-aminoethyl acrylate, 2-aminoethyl methacrylate, 2-dimethylaminoethyl acrylate, 2-dimethylaminoethyl methacrylate, 2-aminopropyl acrylate, 2-aminopropyl methacrylate, 2-dimethylaminopropyl acrylate, 2-dimethylaminopropyl methacrylate, 3-aminopropyl acrylate, 3-aminopropyl methacrylate, 3-dimethylaminopropyl acrylate, and 3-dimethylaminopropyl methacrylate; glycidyl a unsaturated carboxylic acid glycidyl esters such as vinyl acetate, vinyl propionate, vinyl butyrate, vinyl benzoate, and the like; unsaturated ethers such as vinyl methyl ether, vinyl ethyl ether, and allyl glycidyl ether; vinyl cyanide compounds such as acrylonitrile, methacrylonitrile, α-chloroacrylonitrile, and vinylidene cyanide; acrylamide, methacrylamide, α-chloroacrylamide, N-2-hydroxyethyl acrylate, and the like; Examples of suitable monomers include unsaturated amides such as maleimide, N-phenylmaleimide, and N-cyclohexylmaleimide; unsaturated imides such as maleimide, N-phenylmaleimide, and N-cyclohexylmaleimide; aliphatic conjugated dienes such as 1,3-butadiene, isoprene, and chloroprene; and macromonomers having monoacryloyl or monomethacryloyl groups at the ends of the polymer molecular chains of polystyrene, polymethyl acrylate, polymethyl methacrylate, poly-n-butyl acrylate, poly-n-butyl methacrylate, and polysiloxane. These monomers may be used alone or in combination of two or more.

The acid value of the alkali-soluble resin is preferably in the range of 20 to 200 (KOH mg/g). When the acid value is within this range, the solubility in the developer is improved, the non-exposed parts are easily dissolved, and the sensitivity is increased, so that the pattern of the exposed parts remains during development, improving the film remaining ratio. Here, the acid value is a value measured as the amount (mg) of potassium hydroxide required to neutralize 1 g of polymer, and can usually be determined by titration with an aqueous potassium hydroxide solution.

Alkali-soluble resins having a polystyrene-equivalent weight average molecular weight (hereinafter abbreviated as "weight average molecular weight") of 3,000 to 200,000, preferably 5,000 to 100,000, as measured by gel permeation chromatography (GPC; using tetrahydrofuran as an eluent) are preferred. Molecular weights within the above range are preferred because they tend to improve the hardness of the coating film, increase the residual film rate, and provide excellent solubility of non-exposed areas in the developer and improve resolution.

The molecular weight distribution [weight average molecular weight (Mw)/number average molecular weight (Mn)] of the alkali-soluble resin (B) is preferably in the range of 1.5 to 6.0, and more preferably in the range of 1.8 to 4.0. A molecular weight distribution [weight average molecular weight (Mw)/number average molecular weight (Mn)] in the range of 1.5 to 6.0 is preferable because it provides excellent developability.

The alkali-soluble resin (B) may be contained in a range of usually 5 to 85% by weight, preferably 10 to 80% by weight, and more preferably 50 to 75% by weight, based on 100% by weight of the total solid content in the photosensitive resin composition. When the alkali-soluble resin (B) is contained within the above range, it is preferable because it has sufficient solubility in the developer, making it difficult for development residues to occur on the substrate in non-pixel areas, and it is difficult for film reduction to occur in the pixel areas of the exposed areas during development, which tends to improve the leakage properties of the non-pixel areas.

Photopolymerizable compound (C)
The photopolymerizable compound contained in the photosensitive resin composition of the present invention is a compound that can be polymerized by the action of light and a photopolymerization initiator described later, and is a monofunctional monomer, a bifunctional monomer, or the like. , and other polyfunctional monomers.

The type of the monofunctional monomer is not particularly limited, and examples include nonylphenylcarbitol acrylate, 2-hydroxy-3-phenoxypropyl acrylate, 2-ethylhexylcarbitol acrylate, 2-hydroxyethyl acrylate, and N-vinylpyrrolidone.

The type of the bifunctional monomer is not particularly limited, and examples include 1,6-hexanediol di(meth)acrylate, ethylene glycol di(meth)acrylate, neopentyl glycol di(meth)acrylate, triethylene glycol di(meth)acrylate, bis(acryloyloxyethyl)ether of bisphenol A, and 3-methylpentanediol di(meth)acrylate.

The type of the polyfunctional monomer is not particularly limited, and examples thereof include trimethylolpropane tri(meth)acrylate, ethoxylated trimethylolpropane tri(meth)acrylate, propoxylated trimethylolpropane tri(meth)acrylate, pentaerythritol tri(meth)acrylate, pentaerythritol tetra(meth)acrylate, dipentaerythritol tri(meth)acrylate, dipentaerythritol penta(meth)acrylate, ethoxylated dipentaerythritol hexa(meth)acrylate, propoxylated dipentaerythritol hexa(meth)acrylate, and dipentaerythritol hexa(meth)acrylate.

Commercially available examples of the photopolymerizable compound include Miramer M600 manufactured by Miwon Specialty Chemicals, but are not limited to this.

The photopolymerizable compound may be contained in the range of 5 to 60% by weight, preferably 10 to 50% by weight, based on 100% by weight of the total solid content in the photosensitive resin composition. Being contained within the above range has the advantage of being favorable in terms of the strength and smoothness of the pixel part.

If the photopolymerizable compound is contained in an amount less than the above range, the strength of the coating film may be slightly reduced, and if the photopolymerizable compound is contained in an amount exceeding the above range, the smoothness may be slightly reduced, so it is preferable that the photopolymerizable compound is contained within the above range.

Photopolymerization initiator (D)
In one embodiment of the present invention, the photopolymerization initiator may be any photopolymerization initiator that is generally used in photosensitive resin compositions.

For example, the photopolymerization initiator may be an acetophenone-based, benzophenone-based, triazine-based, thioxanthone-based, oxime-based, benzoin-based, or biimidazole-based compound.

Examples of acetophenone compounds include diethoxyacetophenone, 2-hydroxy-2-methyl-1-phenylpropan-1-one, benzyl dimethyl ketal, 2-hydroxy-1-[4-(2-hydroxyethoxy)phenyl]-2-methylpropan-1-one, 1-hydroxycyclohexyl phenyl ketone, 2-methyl-1-(4-methylthiophenyl)-2-morpholinopropan-1-one, 2-benzyl-2-dimethylamino-1-(4-morpholinophenyl)butan-1-one, and oligomers of 2-hydroxy-2-methyl[4-(1-methylvinyl)phenyl]propan-1-one. Of these, 2-benzyl-2-dimethylamino-1-(4-morpholinophenyl)butan-1-one is preferably used.

Benzophenone compounds include benzophenone, methyl benzoylbenzoate, 4-phenylbenzophenone, hydroxybenzophenone, acrylated benzophenone, 4,4'-bis(dimethylamino)benzophenone, and 4,4'-bis(diethylamino)benzophenone.

Examples of triazine compounds include 2,4,6-trichloro-s-triazine, 2-phenyl-4,6-bis(trichloromethyl)-s-triazine, 2-(3',4'-dimethoxystyryl)-4,6-bis(trichloromethyl)-s-triazine, 2-(4'-methoxynaphthyl)-4,6-bis(trichloromethyl)-s-triazine, 2-(p-methoxyphenyl)-4,6-bis(trichloromethyl)-s-triazine, 2-(p-tolyl)-4,6-bis(trichloromethyl)-s-triazine, 2-biphenyl-4,6-bis(trichloromethyl)-s-triazine, bis(trichloromethyl)-6-styryl-s-triazine, 2-(naphtho 1-yl)-4,6-bis(trichloromethyl)-s-triazine, 2-(4-methoxynaphthyl)-4,6-bis(trichloromethyl)-s-triazine, 1-yl)-4,6-bis(trichloromethyl)-s-triazine, 2,4-trichloromethyl(piperonyl)-6-triazine, 2,4-trichloromethyl(4'-methoxystyryl)-6-triazine, and the like.
Examples of thioxanthone compounds include 2-isopropylthioxanthone, 2,4-diethylthioxanthone, 2,4-dichlorothioxanthone, and 1-chloro-4-propoxythioxanthone.

The oxime compounds include o-ethoxycarbonyl-α-oximino-1-phenylpropan-1-one, and representative commercially available products include Irgacure OXE 01 and OXE 02 manufactured by BASF.
Examples of the benzoin compounds include benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, benzoin isobutyl ether, and benzyl dimethyl ketal.

Examples of biimidazole compounds include 2,2'-bis(2-chlorophenyl)-4,4',5,5'-tetraphenylbiimidazole, 2,2'-bis(2,3-dichlorophenyl)-4,4',5,5'-tetraphenylbiimidazole, 2,2'-bis(2-chlorophenyl)-4,4',5,5'-tetra(alkoxyphenyl)biimidazole, 2,2'-bis(2-chlorophenyl)-4,4',5,5'-tetra(trialkoxyphenyl)biimidazole, and imidazole compounds in which the phenyl groups at the 4,4',5,5' positions are substituted with carboalkoxy groups.

In particular, from the standpoint of controlling the surface roughness of the light-scattering pixel layer, it is preferable for the maximum absorption wavelength (λmax) to be at wavelengths of 360 nm or less.

Specific examples of photopolymerization initiators with a maximum absorption wavelength (λmax) value of 360 nm or less include 1,2-octanedione, 1-[4-(phenylthio)phenyl]-, 2-(o-benzoyloxime) (trade name: Irgacure OXE-01), 2-benzyl-2-dimethylamino-1-(4-morpholinophenyl)-butanone-1 (trade name: Irgacure 369), etc.

The photopolymerization initiator may be used in the range of 0.01 to 10% by weight, preferably 0.01 to 5% by weight, based on 100% by weight of the solid content in the photosensitive resin composition. This content range is determined taking into consideration the photopolymerization rate of the photopolymerizable compound and the physical properties of the final coating film. If the content of the photopolymerization initiator is less than this range, the polymerization rate is low, which may lengthen the overall process time. Conversely, if the content exceeds this range, an excessive reaction may cause an excessive crosslinking reaction, which may actually deteriorate the physical properties of the coating film. Therefore, the content is appropriately within this range.

A photopolymerization initiator assistant may be used together with the photopolymerization initiator, but using a photopolymerization initiator assistant together with the photopolymerization initiator is preferred because it makes the photosensitive resin composition more sensitive and improves productivity. As the photopolymerization initiator assistant, preferably, one or more compounds selected from the group consisting of amines and carboxylic acid compounds may be used.

The amount of such photopolymerization initiator aid is usually 10 moles or less, preferably in the range of 0.01 to 5 moles, per mole of photopolymerization initiator. By using the photopolymerization initiator aid within the above range, it is possible to increase the polymerization efficiency and thereby improve productivity.

Solvent (E)
In one embodiment of the present invention, the type of the solvent (E) is not particularly limited as long as the photosensitive resin composition has an appropriate viscosity and the remaining components can be easily dissolved therein, and various organic solvents used in the field of photosensitive resin compositions may be used.

Specific examples include ethylene glycol monoalkyl ethers such as ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol monopropyl ether, and ethylene glycol monobutyl ether; diethylene glycol dialkyl ethers such as diethylene glycol dimethyl ether, diethylene glycol diethyl ether, diethylene glycol dipropyl ether, and diethylene glycol dibutyl ether; ethylene glycol alkyl ether acetates such as methyl cellosolve acetate and ethyl cellosolve acetate; propylene glycol monomethyl ether acetate; alkylene glycol alkyl ether acetates such as butyl ether acetate, propylene glycol monopropyl ether acetate, methoxybutyl acetate, and methoxypentyl acetate; aromatic hydrocarbons such as benzene, toluene, xylene, and mesitylene; ketones such as methyl ethyl ketone, acetone, methyl amyl ketone, methyl isobutyl ketone, and cyclohexanone; alcohols such as ethanol, propanol, butanol, hexanol, cyclohexanol, ethylene glycol, and glycerin; esters such as ethyl 3-ethoxypropionate and methyl 3-methoxypropionate; and cyclic esters such as gamma-butyrolactone.

Of these solvents, in terms of coatability and drying property, it is preferable to use an organic solvent having a boiling point of 100°C to 200°C, more preferably alkylene glycol alkyl ether acetates, ketones, esters such as ethyl 3-ethoxypropionate and methyl 3-methoxypropionate, and even more preferably propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate, cyclohexanone, ethyl 3-ethoxypropionate, methyl 3-methoxypropionate, etc. These solvents may be used alone or in combination of two or more kinds.

The solvent may be contained in an amount of usually 50 to 90% by weight, preferably 50 to 85% by weight, based on 100% by weight of the entire photosensitive resin composition. When the content of the solvent satisfies the above range, it is preferable because the coating properties tend to be good when applied with a coating device such as a roll coater, spin coater, slit and spin coater, slit coater (sometimes called a die coater), or inkjet.

Additive (F)
The photosensitive resin composition according to one embodiment of the present invention may further contain an additive (F) in addition to the above-mentioned components, if necessary.

The type of additive (F) may be determined according to the needs of the user and is not particularly limited in the present invention, but examples include fillers, other polymer compounds, thermosetting agents, surfactants, adhesion promoters, antioxidants, and anti-aggregation agents.

Examples of the filler include glass, silica, and alumina.

Specific examples of the other polymer compounds include thermosetting resins such as epoxy resins and maleimide resins, and thermoplastic resins such as polyvinyl alcohol, polyacrylic acid, polyethylene glycol monoalkyl ether, polyfluoroalkyl acrylate, polyester, and polyurethane.

Examples of the surfactants include polyoxyethylene alkyl ethers, polyoxyethylene alkyl phenyl ethers, polyethylene glycol diesters, sorbitan fatty acid esters, fatty acid modified polyesters, tertiary amine modified polyurethanes, and polyethyleneimines. Other product names include KP (manufactured by Shin-Etsu Chemical Co., Ltd.), POLYFLOW (manufactured by Kyoeisha Chemical Co., Ltd.), EFTOP (manufactured by Tochem Products Co., Ltd.), MEGAFAC (manufactured by Dainippon Ink and Chemicals, Inc.), Flourad (manufactured by Sumitomo 3M Limited), and Asahi Guard (manufactured by Sumitomo 3M Limited). Guard), Surflon (both manufactured by Asahi Glass Co., Ltd.), SOLSPERSE (manufactured by Zeneka Corporation), EFKA (manufactured by EFKA Chemicals), and PB821 (manufactured by Ajinomoto Co., Inc.).

Examples of the adhesion promoter include vinyltrimethoxysilane, vinyltriethoxysilane, vinyltris(2-methoxyethoxy)silane, N-(2-aminoethyl)-3-aminopropylmethyldimethoxysilane, N-(2-aminoethyl)-3-aminopropyltrimethoxysilane, 3-aminopropyltriethoxysilane, 3-glycidoxypropyltrimethoxysilane, 3-glycidoxypropylmethyldimethoxysilane, 2-(3,4-epoxycyclohexyl)ethyltrimethoxysilane, 3-chloropropylmethyldimethoxysilane, 3-chloropropyltrimethoxysilane, 3-methacryloxypropyltrimethoxysilane, and 3-mercaptopropyltrimethoxysilane.

Specific examples of the antioxidant include 2,2'-thiobis(4-methyl-6-t-butylphenol) and 2,6-di-t-butyl-4-methylphenol.

Specific examples of the anti-aggregation agent include sodium polyacrylate.

For additives for which the content is not exemplified, those skilled in the art may add as much as appropriate within the range that does not impair the effects of the present invention. For example, the additive may be used in an amount of 0.05 to 10% by weight, preferably 0.1 to 10% by weight, and more preferably 0.1 to 5% by weight, relative to 100% by weight of the total photosensitive resin composition, but is not limited thereto.

According to one embodiment of the present invention, the additive may include an antioxidant. When an antioxidant is further included in this manner, there is an advantage that it is possible to expect an effect of preventing thermal aging during post-baking, which is one of the processes for forming a cured product.

The antioxidant may include, for example, one or more selected from the group consisting of phosphorus-based antioxidants, sulfur-based antioxidants, and phenol-based antioxidants. In this case, yellowing that may occur due to a light source after the display is manufactured can be suppressed. The antioxidant may be used in combination with a phenol-phosphorus compound, a phenol-sulfur compound, a phosphorus-sulfur compound, or a phenol-phosphorus-sulfur compound.

The type of the phenol-based antioxidant is not particularly limited, but specific examples include 3,9-bis[2-[3-(3-t-butyl-4-hydroxy-5-methylphenyl)propionyloxy]-1,1-dimethylethoxy]-2,4,8,10-tetraoxaspiro[5.5]undecane, pentaerythrityl tetrakis[3-(3,5-di-t-butyl-4-hydroxyphenyl)propionate], 1,3,5-trimethyl-2,4,6-tris(3'5'-di-t-butyl-4-hydroxybenzyl)benzene, triethylene glycol-bis[3-(3-t-butyl-5-methyl-4-hydroxyphenyl)propionate], 4,4'-thiobis(6-t-butyl-3-methylphenol), tris-(3,5-di-t-butyl-4-hydroxybenzyl )-isocyanurate, 1,3,5-tris(4-t-butyl-3-hydroxy-2,6-dimethylbenzyl)-isocyanurate, 1,6-hexanediol-bis[3-(3,5-di-t-butyl-4-hydroxyphenyl)propionate], 2,2-thio-diethylenebis[3-(3,5-di-t-butyl-4-hydroxyphenyl)propionate], N,N'-hexamethylenebis(3,5-di-t-butyl-4-hydroxy-hydrocinnamic acid amide), 1,3,5-trimethyl-2,4,6-tris(3,5-di-t-butyl-4-hydroxybenzyl)benzene, 2,4-bis[(octylthio)methyl]-O-cresol, 1,6-hexanediol-bis[3-(3,5-di-t-butyl-4-hydroxyphenyl)propionate], octadecyl Examples include 3-(3,5-di-tert-butyl-4-hydroxyphenol)propionate, 2,2'-methylenebis(4-methyl-6-t-butylphenol), 4,4'-butylidene-bis(3-methyl-6-t-butylphenol), 1,1,3-tris(2-methyl-4-hydroxy-5-t-butylphenyl)butane, 1,1,5-tris(4-hydroxybenzyl)benzene, and tetrakis[methylene-3-(3,5'-di-t-butyl-4'-hydroxyphenylpropionate)]methane.

Among these phenolic antioxidants, from the standpoint of heat resistance and prevention of heat discoloration, 3,9-bis[2-[3-(3-t-butyl-4-hydroxy-5-methylphenyl)propionyloxy]-1,1-dimethylethoxy]-2,4,8,10-tetraoxaspiro[5.5]undecane, 1,3,5-trimethyl-2,4,6-tris(3'5'-di-t-butyl-4-hydroxybenzyl)benzene, pentaerythrityl tetrakis[3-(3,5-di-t-butyl-4-hydroxyphenyl)propionate], triethylene glycol-bis[3-(3-t-butyl-5-methyl-4-hydroxyphenyl)propionate], 4,4'-thiobis(6-t-butyl-3-methylphenol), tris -(3,5-di-t-butyl-4-hydroxybenzyl)-isocyanurate, 1,3,5-tris(4-t-butyl-3-hydroxy-2,6-dimethylbenzyl)-isocyanurate, 1,6-hexanediol-bis[3-(3,5-di-t-butyl-4-hydroxyphenyl)propionate], 2,2-thio-diethylenebis[3-(3,5-di-t-butyl-4-hydroxyphenyl)propionate], N,N'-hexamethylenebis(3,5-di-t-butyl-4-hydroxy-hydrocinnamic acid amide), 1,3,5-trimethyl-2,4,6-tris(3,5-di-t-butyl-4-hydroxybenzyl)benzene, and 2,4-bis[(octylthio)methyl]-O-cresol are preferred.

Commercially available products include Irganox 1010 (manufactured by BASF), Sumilizer BBM-S (manufactured by Sumitomo Chemical), ADK STAB AO-80 (manufactured by ADEKA), Sumilizer GP (manufactured by Sumitomo Chemical), and Irganox 1035 (manufactured by BASF).

The type of the phosphorus-based antioxidant is not particularly limited, but specific examples include 3,9-bis(2,6-di-tert-butyl-4-methylphenoxy)-2,4,8,10-tetraoxa-3,9-diphosphaspiro[5.5]undecane, diisodecylpentaerythritol diphosphite, bis(2,4-di-t-butylphenyl)pentaerythritol diphosphite, 2,2'-methylenebis(4,6-di-t-butyl-1-phenyloxy)(2-ethylhexyloxy)phosphite, HORACES, 6-[3-(3-t-butyl-4-hydroxy-5-methylphenyl)propoxy]-2,4,8,10-tetra-t-butyldibenzo[d,f][1,3,2]dioxaphosphepine, triphenyl phosphite, diphenyl isodecyl phosphite, phenyl diisodecyl phosphite, 4,4'-butylidene-bis(3-methyl-6-t-butylphenylditridecyl)phosphite, octadecyl phosphite, tris(nonylphenyl)phosphite, 9,10-di Hydro-9-oxa-10-phosphaphenanthrene-10-oxide, 10-(3,5-di-t-butyl-4-hydroxybenzyl)-9,10-dihydro-9-oxa-10-phosphaphenanthrene-10-oxide, 10-decyloxy-9,10-dihydro-9-oxa-10-phosphaphenanthrene-10-oxide, tris(2,4-di-t-butylphenyl)phosphite, cyclic neopentanetetraylbis(2,4-di-t-butylphenyl)phosphite phosphite, cyclic neopentanetetraylbis(2,6-di-t-butylphenyl)phosphite, 2,2-methylenebis(4,6-di-t-butylphenyl)octylphosphite, tris(2,4-di-t-butylphenyl)phosphite, tetrakis(2,4-di-t-butylphenyl)[1,1-biphenyl]-4,4'diylbisphosphonite, bis[2,4-bis(1,1-dimethylethyl)-6-methylphenyl]ethyl ester, phosphonic acid, etc.

Among these phosphorus-based antioxidants, 2,2'-methylenebis(4,6-di-t-butyl-1-phenyloxy)(2-ethylhexyloxy)phosphorus, 3,9-bis(2,6-di-tert-butyl-4-methylphenoxy)-2,4,8,10-tetraoxa-3,9-diphosphaspiro[5.5]undecane, and 6-[3-(3-t-butyl-4-hydroxy-5-methylphenyl)propoxy]-2,4,8,10-tetra-t-butyldibenz[d,f][1,3,2]dioxaphosphepine are preferred in terms of heat resistance and heat discoloration prevention.

The type of the sulfur-based antioxidant is not particularly limited, but specific examples include 2,2-bis({[3-(dodecylthio)propionyl]oxy}methyl)-1,3-propanediyl-bis[3-(dodecylthio)propionate], 2-mercaptobenzimidazole, dilauryl-3,3'-thiodipropionate, dimyristyl-3,3'-thiodipropionate, distearyl-3,3'-thiodipropionate, pentaerythrityl-tetrakis(3-laurylthiopropionate), 2-mercaptobenzimidazole, etc.

Of these sulfur-based antioxidants, 2,2-bis({[3(dodecylthio)propionyl]oxy}methyl)-1,3-propanediyl-bis[3-(dodecylthio)propionate] and 2-mercaptobenzimidazole are preferred in terms of heat resistance and heat discoloration prevention.

The antioxidant may be included in the photosensitive resin composition according to the present invention in an amount of 0.1 to 30 wt %, preferably 0.5 to 20 wt %, based on 100 wt % of the total solid content in the photosensitive resin composition according to the present invention. When the content of the antioxidant is within the above range, it is advantageous in terms of solving the problem of brightness reduction.
One embodiment of the present invention relates to a light-scattering pixel layer formed from the above-described photosensitive resin composition.

In addition, one embodiment of the present invention relates to a color filter including the above-mentioned light-scattering pixel layer. The color filter according to one embodiment of the present invention is characterized in that it includes a light-scattering pixel layer formed by applying the above-mentioned photosensitive resin composition on a substrate, exposing and developing the same in a predetermined pattern.
The pattern forming method using the photosensitive resin composition according to the present invention will be described in detail below.

The method of forming a pattern using the photosensitive resin composition according to the present invention may be a method known in the art, and typically includes a coating step, an exposure step, and a removal step. The photosensitive resin composition according to the present invention is coated on a substrate, photocured, and developed to form a pattern, and can be used as a light-scattering pixel layer (pixel layer for blue pixels). The light-scattering pixel layer may appear white due to scattering when light is not introduced from a light source.
Specifically, the photosensitive resin composition is applied to a thickness of 2.0 to 3.4 μm on a glass substrate that is not coated with anything or a glass substrate that is coated with a SiNx (protective film) to a thickness of 500 to 1,500 Å by a suitable method such as spin coating or slit coating. After coating, light is irradiated to form a pattern required for the color filter. After light irradiation, the coating layer is treated with an alkaline developer to dissolve the non-irradiated part of the coating layer and form a pattern required for the color filter. This process is repeated for the number of R, G, and B colors required to obtain a color filter having a desired pattern. In addition, in the above process, the image pattern obtained by development is further heated or cured by exposure to actinic radiation, etc., to further improve crack resistance, solvent resistance, etc.

One embodiment of the present invention relates to an image display device including the above-mentioned color filter.
The color filter according to the present invention can be applied to various image display devices such as electroluminescent displays (EL), plasma display devices (PDP), field emission displays (FED), organic light-emitting devices (OLED), and quantum dot light-emitting diodes (QLED), as well as ordinary liquid crystal displays (LCD).

The image display device according to the present invention includes a configuration known in the art, except that it is provided with the color filters described above.

Hereinafter, the present invention will be described in more detail with reference to examples, comparative examples, and experimental examples. Note that it will be obvious to those skilled in the art that these examples, comparative examples, and experimental examples are merely for the purpose of explaining the present invention, and that the scope of the present invention is not limited to these examples, comparative examples, and experimental examples.

Synthesis Example 1 Synthesis of Alkali-Soluble Resin B-1 A flask equipped with a stirrer, a thermometer, a reflux condenser, a dropping funnel and a nitrogen inlet tube was prepared. Further, 100 parts by weight of a monomer consisting of 5 mol % N-benzylmaleimide, 15 mol % cyclohexyl methacrylate, 5 mol % methyl methacrylate, 20 mol % rosin methacrylate and 55 mol % acrylic acid was charged with 40 parts by weight of propylene glycol monomethyl ether acetate (hereinafter also referred to as PGMEA) and stirred and mixed to prepare a monomer dropping funnel. Further, 6 parts by weight of n-dodecanediol and 24 parts by weight of PGMEA were charged and stirred and mixed to prepare a chain transfer agent dropping funnel.
Next, 395 parts by weight of PGMEA was introduced into the flask, and the atmosphere in the flask was replaced with nitrogen from air, and the temperature of the flask was raised to 90° C. while stirring. Next, the dropping of the monomer and the chain transfer agent from the dropping funnel was started. The dropping was continued for 2 hours while maintaining the temperature at 90° C., and after 1 hour, the temperature was raised to 110° C. and maintained for 3 hours, after which a gas inlet tube was introduced and bubbling of a mixed gas of oxygen/nitrogen=5/95 (v/v) was started.
Next, 45 mol % of glycidyl methacrylate, 0.4 parts by weight of 2,2'-methylenebis(4-methyl-6-t-butylphenol), and 0.8 parts by weight of triethylamine were added to the flask relative to 100 mol % of the monomer, and the reaction was continued at 110°C for 6 hours. Thereafter, the mixture was cooled to room temperature to obtain an alkali-soluble resin having a weight average molecular weight of 11,100 and an acid value based on solid content of 70 mgKOH/g.

Synthesis Example 2: Synthesis of alkali-soluble resin B-2 A flask equipped with a stirrer, a thermometer, a reflux condenser, a dropping funnel and a nitrogen inlet tube was prepared. Further, 100 parts by weight of a monomer consisting of 10 mol % of N-benzylmaleimide, 25 mol % of cyclohexyl methacrylate, 5 mol % of methyl methacrylate, 25 mol % of rosin methacrylate and 35 mol % of acrylic acid was charged with 40 parts by weight of propylene glycol monomethyl ether acetate (hereinafter also referred to as PGMEA), which was then stirred and mixed to prepare a monomer dropping funnel. Further, 6 parts by weight of n-dodecanediol and 24 parts by weight of PGMEA were charged and stirred and mixed to prepare a chain transfer agent dropping funnel.

Next, 395 parts by weight of PGMEA was introduced into the flask, and the atmosphere in the flask was replaced with nitrogen from air, and the temperature of the flask was raised to 90° C. while stirring. Next, the dropping of the monomer and the chain transfer agent from the dropping funnel was started. The dropping was continued for 2 hours while maintaining the temperature at 90° C., and after 1 hour, the temperature was raised to 110° C. and maintained for 3 hours, after which a gas inlet tube was introduced and bubbling of a mixed gas of oxygen/nitrogen=5/95 (v/v) was started.
Next, 30 mol % of glycidyl methacrylate, 0.4 parts by weight of 2,2'-methylenebis(4-methyl-6-t-butylphenol), and 0.8 parts by weight of triethylamine were added to the flask relative to 100 mol % of the monomer, and the reaction was continued at 110°C for 6 hours. Thereafter, the mixture was cooled to room temperature to obtain an alkali-soluble resin having a weight average molecular weight of 11,600 and an acid value based on solid content of 50 mgKOH/g.

Synthesis Example 3 Synthesis of Alkali-Soluble Resin B-3 A flask equipped with a stirrer, a thermometer, a reflux condenser, a dropping funnel and a nitrogen inlet tube was prepared. Further, 100 parts by weight of a monomer consisting of 5 mol % N-benzylmaleimide, 25 mol % cyclohexyl methacrylate, 5 mol % methyl methacrylate, 40 mol % rosin methacrylate and 25 mol % acrylic acid was charged with 40 parts by weight of propylene glycol monomethyl ether acetate (hereinafter also referred to as PGMEA), and then stirred and mixed to prepare a monomer dropping funnel. Further, 6 parts by weight of n-dodecanediol and 24 parts by weight of PGMEA were charged and stirred and mixed to prepare a chain transfer agent dropping funnel.

Next, 395 parts by weight of PGMEA was introduced into the flask, and the atmosphere in the flask was replaced with nitrogen from air, and the temperature of the flask was raised to 90° C. while stirring. Next, the dropping of the monomer and the chain transfer agent from the dropping funnel was started. The dropping was continued for 2 hours while maintaining the temperature at 90° C., and after 1 hour, the temperature was raised to 110° C. and maintained for 3 hours, after which a gas inlet tube was introduced and bubbling of a mixed gas of oxygen/nitrogen=5/95 (v/v) was started.
Next, 15 mol % of glycidyl methacrylate, 0.4 parts by weight of 2,2'-methylenebis(4-methyl-6-t-butylphenol), and 0.8 parts by weight of triethylamine were added to the flask relative to 100 mol % of the monomer, and the reaction was continued at 110°C for 6 hours. Thereafter, the mixture was cooled to room temperature to obtain an alkali-soluble resin having a weight average molecular weight of 11,500 and an acid value based on solid content of 62 mgKOH/g.

Synthesis Example 4: Synthesis of alkali-soluble resin B-4 A flask equipped with a stirrer, a thermometer, a reflux condenser, a dropping funnel and a nitrogen inlet tube was prepared. Further, 100 parts by weight of a monomer consisting of 5 mol % of N-benzylmaleimide, 5 mol % of cyclohexyl methacrylate, 10 mol % of methyl methacrylate, 10 mol % of rosin methacrylate and 70 mol % of acrylic acid was charged with 40 parts by weight of propylene glycol monomethyl ether acetate (hereinafter also referred to as PGMEA), and then stirred and mixed to prepare a monomer dropping funnel. Further, 6 parts by weight of n-dodecanediol and 24 parts by weight of PGMEA were charged and stirred and mixed to prepare a chain transfer agent dropping funnel.

Next, 395 parts by weight of PGMEA was introduced into the flask, the atmosphere in the flask was replaced with nitrogen from air, and the temperature of the flask was raised to 90°C while stirring. Next, the dropping of the monomer and chain transfer agent from the dropping funnel was started. The dropping proceeded for 2 hours while maintaining the temperature at 90°C, and after 1 hour, the temperature was raised to 110°C and maintained for 3 hours. After that, a gas inlet tube was introduced and bubbling of a mixed gas of oxygen/nitrogen = 5/95 (v/v) was started.

Next, 60 mol % of glycidyl methacrylate, 0.4 parts by weight of 2,2'-methylenebis(4-methyl-6-t-butylphenol), and 0.8 parts by weight of triethylamine were added to the flask relative to 100 mol % of the monomer, and the reaction was continued at 110°C for 6 hours. After that, the mixture was cooled to room temperature to obtain an alkali-soluble resin with a weight average molecular weight of 12,300 and a solid content standard acid value of 74 mgKOH/g.

Examples and Comparative Examples: Preparation of Photosensitive Resin Composition Photosensitive resin compositions were prepared by mixing the components according to the formulation in Table 1 below (wt %).

(A) Scattering particles (white particles): TiO ₂ (manufactured by DuPont, R102, 210 nm)
(B-1) Alkali-soluble resin: Synthesis example 1
(B-2) Alkali-soluble resin: Synthesis Example 2
(B-3) Alkali-soluble resin: Synthesis Example 3
(B-4) Alkali-soluble resin: Synthesis Example 4
(C-1) Photopolymerizable compound: dipentaerythritol hexaacrylate (Kayarad DPHA, manufactured by Nippon Kayaku Co., Ltd.)
(D-1) Photopolymerization initiator: Irgacure OXE01 (manufactured by BASF), λmax: 327 nm
(D-2) Photoinitiator: NCI-831 (ADEKA), λmax: 365 nm
(F-1) Antioxidant: Sumilizer GP (Sumitomo Chemical Co., Ltd.)
(F-2) Epoxy resin: ESCN 195XL (manufactured by Sumitomo Chemical Co., Ltd.)
(F-3) Leveling agent: F-554 (manufactured by DIC Corporation)
(E-1) Solvent: Propylene glycol monomethyl ether acetate (PGMEA)
Experimental example:
The light-scattering pixel layers were prepared using the photosensitive resin compositions prepared in the Examples and Comparative Examples as described below. The surface roughness and luminance for a blue light source were measured as described below. The results are shown in Table 2 below.

<Manufacture of Light-Scattering Pixel Layer Substrate>
A light-scattering pixel layer substrate was manufactured using the photosensitive resin compositions prepared in the examples and comparative examples. That is, each of the photosensitive resin compositions was applied onto a glass substrate by spin coating, and then placed on a heating plate and maintained at 100° C. for 3 minutes to remove the solvent and form a coating film.

Next, a test photomask with a square transmission pattern measuring 20 mm x 20 mm and a line pattern of 1 to 100 μm was placed on the coating film, and ultraviolet light was irradiated with a distance of 100 μm from the test photomask.

At this time, an ultra-high pressure mercury lamp (product name: USH-250D) manufactured by Ushio Inc. was used as the ultraviolet light source, and light irradiation was performed in an air atmosphere with an exposure dose of 200 mJ/ ^cm2 (based on 365 nm), and no special optical filter was used.

The coating film irradiated with ultraviolet light was developed by immersing it in a KOH aqueous solution developer with a pH of 10.5. The substrate on which the coating film was formed was washed with distilled water, dried by blowing nitrogen gas onto it, and heated in a heating oven at 230°C for 20 minutes to produce a light-scattering pixel layer substrate. The thickness of the light-scattering pixel layer produced in this way was 10 μm.

(1) Surface Roughness The surface roughness of the light-scattering pixel layer was measured using a DEKTAK (Veeco) surface roughness measuring device (unit: Å).

(2) Brightness to Blue Light Source A blue light emitting element was disposed on the substrate surface of the light scattering pixel layer substrate prepared using the photosensitive resin composition prepared in the Examples and Comparative Examples, and the brightness to a blue light source was measured using a brightness meter (CAS 140 CT, manufactured by Instrument System Co., Ltd.) The brightness was calculated as a relative value relative to the brightness value measured when only a blue light source was placed without a light scattering pixel layer substrate and the brightness value was set to 100%.

As shown in Table 2, the photosensitive resin compositions of Examples 1 to 3, in which the surface roughness of the light-scattering pixel layer according to the present invention is 50 Å or more, have been confirmed to have increased brightness with respect to a blue light source compared to the photosensitive resin compositions of Comparative Examples 1 and 2, in which the surface roughness of the light-scattering pixel layer is less than 50 Å.

Although specific parts of the present invention have been described in detail above, it is clear to those skilled in the art that such specific descriptions are merely preferred embodiments and do not limit the scope of the present invention. Those skilled in the art will be able to make various applications and modifications within the scope of the present invention based on the above contents.
Therefore, the true scope of the invention is to be defined by the following claims and their equivalents.

Claims (9)

A photosensitive resin composition for forming a light-scattering pixel layer,
The photosensitive resin composition includes scattering particles, an alkali-soluble resin, a photopolymerizable compound, a photopolymerization initiator, and a solvent;
the alkali-soluble resin has a substituent derived from glycidyl (meth)acrylate, and the repeating unit having the substituent derived from glycidyl (meth)acrylate is contained in an amount of 15 to 45 mol % relative to 100 mol % of the total repeating units constituting the alkali-soluble resin;
The photopolymerization initiator has a maximum absorption wavelength (λmax) at a wavelength of 360 nm or less,
A photosensitive resin composition, the light-scattering pixel layer formed from the photosensitive resin composition having a surface roughness of 50 Å or more (excluding cases where the photosensitive resin composition contains quantum dots). The photosensitive resin composition according to claim 1, wherein the light-scattering pixel layer formed from the photosensitive resin composition has a luminance of 60% or more relative to a light source based on a thickness of 10 μm. The photosensitive resin composition according to claim 2, wherein the light source is a blue light source. The photosensitive resin composition according to claim 3, wherein the wavelength of the blue light source is in the range of 380 nm to 530 nm. The photosensitive resin composition according to claim 1 , wherein the scattering particles satisfy the following mathematical formula 1:
The photosensitive resin composition according to claim 1 , wherein the repeating unit having a substituent derived from glycidyl (meth)acrylate is a repeating unit represented by the following chemical formula 1:

In the above formula,
Ra and Rb are each independently hydrogen or methyl. A light-scattering pixel layer formed from the photosensitive resin composition according to any one of claims 1 to 6 . A color filter comprising the light-scattering pixel layer of claim 7 . An image display device comprising the color filter according to claim 8 .