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JP7594215B2 - Porous electrode-supported electrolyte membrane and method for producing the same - Google Patents
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JP7594215B2 - Porous electrode-supported electrolyte membrane and method for producing the same - Google Patents

Porous electrode-supported electrolyte membrane and method for producing the same Download PDF

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JP7594215B2
JP7594215B2 JP2023522159A JP2023522159A JP7594215B2 JP 7594215 B2 JP7594215 B2 JP 7594215B2 JP 2023522159 A JP2023522159 A JP 2023522159A JP 2023522159 A JP2023522159 A JP 2023522159A JP 7594215 B2 JP7594215 B2 JP 7594215B2
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electrolyte membrane
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carbon dioxide
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紗弓 里
裕也 渦巻
晃洋 鴻野
武志 小松
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    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25BELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
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    • C25BELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
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    • C25BELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B3/00Electrolytic production of organic compounds
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    • C25B3/26Reduction of carbon dioxide
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    • C25B9/00Cells or assemblies of cells; Constructional parts of cells; Assemblies of constructional parts, e.g. electrode-diaphragm assemblies; Process-related cell features
    • C25B9/17Cells comprising dimensionally-stable non-movable electrodes; Assemblies of constructional parts thereof
    • C25B9/19Cells comprising dimensionally-stable non-movable electrodes; Assemblies of constructional parts thereof with diaphragms
    • C25B9/23Cells comprising dimensionally-stable non-movable electrodes; Assemblies of constructional parts thereof with diaphragms comprising ion-exchange membranes in or on which electrode material is embedded

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Description

本発明は、多孔質電極支持型電解質膜および多孔質電極支持型電解質膜の製造方法に関する。 The present invention relates to a porous electrode-supported electrolyte membrane and a method for producing a porous electrode-supported electrolyte membrane.

地球温暖化の防止およびエネルギーの安定供給という観点から、二酸化炭素を還元する技術が注目されている。二酸化炭素を還元する技術に関する装置としては、人工光合成技術を利用した還元装置と電解還元技術を利用した還元装置がある。人工光合成技術は、光触媒からなる酸化電極への光照射により、水の酸化反応と二酸化炭素の還元反応を進行させる技術である。電解還元技術は、金属からなる酸化電極と還元電極の間への電圧印加により、水の酸化反応と二酸化炭素の還元反応を進行させる技術である。太陽光を利用した人工光合成技術および再生可能エネルギー由来の電力を利用した電解還元技術は、二酸化炭素を一酸化炭素、ギ酸、エチレン等の炭化水素やメタノール、エタノール等のアルコールに再資源化することが可能な技術として注目され、近年盛んに研究されている。From the viewpoint of preventing global warming and ensuring a stable supply of energy, carbon dioxide reduction technology has been attracting attention. There are reduction devices using artificial photosynthesis technology and reduction devices using electrolytic reduction technology as devices for carbon dioxide reduction technology. Artificial photosynthesis technology is a technology that advances the oxidation reaction of water and the reduction reaction of carbon dioxide by irradiating an oxidation electrode made of a photocatalyst with light. Electrolytic reduction technology is a technology that advances the oxidation reaction of water and the reduction reaction of carbon dioxide by applying a voltage between an oxidation electrode and a reduction electrode made of metal. Artificial photosynthesis technology using sunlight and electrolytic reduction technology using electricity derived from renewable energy have attracted attention as technologies that can recycle carbon dioxide into carbon monoxide, formic acid, hydrocarbons such as ethylene, and alcohols such as methanol and ethanol, and have been actively researched in recent years.

人工光合成技術および二酸化炭素の電解還元技術では、還元電極を水溶液に浸漬させて、水溶液中に溶解させた二酸化炭素を還元電極に供給し、還元する反応系が用いられてきた(非特許文献1,2参照)。しかし、この二酸化炭素の還元方法では、水溶液への二酸化炭素の溶解濃度および水溶液中での二酸化炭素の拡散係数に限界があり、還元電極への二酸化炭素の供給量が制限される。In artificial photosynthesis technology and carbon dioxide electrolytic reduction technology, a reaction system has been used in which a reduction electrode is immersed in an aqueous solution, and carbon dioxide dissolved in the aqueous solution is supplied to the reduction electrode for reduction (see Non-Patent Documents 1 and 2). However, in this carbon dioxide reduction method, there is a limit to the concentration of carbon dioxide dissolved in the aqueous solution and the diffusion coefficient of carbon dioxide in the aqueous solution, which limits the amount of carbon dioxide supplied to the reduction electrode.

この問題に対し、還元電極への二酸化炭素の供給量を増加させるため、還元電極に対して気相の二酸化炭素を供給する研究が進められている。非特許文献3よると、還元電極に対して気相の二酸化炭素を供給できる構造を有する反応装置を用いることで、還元電極への二酸化炭素の供給量が増大し、二酸化炭素の還元反応が促進される。To address this issue, research is being conducted into supplying gaseous carbon dioxide to the reduction electrode in order to increase the amount of carbon dioxide supplied to the reduction electrode. According to Non-Patent Document 3, by using a reaction device having a structure capable of supplying gaseous carbon dioxide to the reduction electrode, the amount of carbon dioxide supplied to the reduction electrode is increased, and the reduction reaction of carbon dioxide is promoted.

Satoshi Yotsuhashi、外6名、“CO2 Conversion with Light and Water by GaN Photoelectrode”、Japanese Journal of Applied Physics、51、2012年、p.02BP07-1-p.02BP07-3Satoshi Yotsuhashi and 6 others, “CO2 Conversion with Light and Water by GaN Photoelectrode”, Japanese Journal of Applied Physics, 51, 2012, p.02BP07-1-p.02BP07-3 Yoshio Hori、外2名、“Formation of Hydrocarbons in the Electrochemical Reduction of Carbone Dioxide at a Copper Electrode in Aqueous Solution”、Journal of the Chemical Society、85(8)、1989年、p.2309-p.2326Yoshio Hori and others, “Formation of Hydrocarbons in the Electrochemical Reduction of Carbone Dioxide at a Copper Electrode in Aqueous Solution”, Journal of the Chemical Society, 85(8), 1989, p.2309-p.2326 Qingxin Jia、外2名、”Direct Gas-phase CO2 Reduction for Solar Methane Generation Using a Gas Diffusion Electrode with a BiVO4:Mo and a Cu-In-Se Photoanode”、Chemistry Letter、47、2018、p.436-439Qingxin Jia and 2 others, “Direct Gas-phase CO2 Reduction for Solar Methane Generation Using a Gas Diffusion Electrode with a BiVO4:Mo and a Cu-In-Se Photoanode”, Chemistry Letter, 47, 2018, p.436-439

式(1)から式(4)に示す二酸化炭素の還元反応は、式(5)に示す水の酸化反応との組み合わせで進行する。The carbon dioxide reduction reaction shown in equations (1) to (4) proceeds in combination with the water oxidation reaction shown in equation (5).

CO2+ 2H+ + 2e- → CO + H2O (1)
CO2+ 2H+ + 2e- → HCOOH (2)
CO2+ 6H+ + 6e- → CH3OH + H2O (3)
CO2+ 8H+ + 8e- → CH4 + 2H2O (4)
2H2O + 4h+ → O2 + 4H+ (5)
CO 2 + 2H + + 2e - → CO + H 2 O (1)
CO 2 + 2H + + 2e - → HCOOH (2)
CO 2 + 6H + + 6e - → CH 3 OH + H 2 O (3)
CO 2 + 8H + + 8e - → CH 4 + 2H 2 O (4)
2H 2 O + 4h + → O 2 + 4H + (5)

二酸化炭素の気相還元装置では、還元槽内の水溶液を排除して気相の二酸化炭素を充填するが、気相の二酸化炭素を充填しただけではプロトン(H+)が気相中を移動できないため、電解質膜と還元電極を接合する必要がある。さらに、板状の還元電極を電解質膜に接合しただけでは気相の二酸化炭素が還元電極と電解質膜の界面に到達できないため、還元電極を多孔質にして、気相の二酸化炭素が還元電極と電解質膜の界面に到達できるようにする必要がある。この多孔質還元電極について、その気孔径が小さいと電極内での二酸化炭素の拡散抵抗が大きく、二酸化炭素の還元反応の効率が低下するという問題があった。 In a gas-phase carbon dioxide reduction device, the aqueous solution in the reduction tank is removed and gas-phase carbon dioxide is filled in, but since protons (H + ) cannot move in the gas phase simply by filling the tank with gas-phase carbon dioxide, it is necessary to join the electrolyte membrane and the reduction electrode. Furthermore, since gas-phase carbon dioxide cannot reach the interface between the reduction electrode and the electrolyte membrane simply by joining a plate-shaped reduction electrode to the electrolyte membrane, it is necessary to make the reduction electrode porous so that gas-phase carbon dioxide can reach the interface between the reduction electrode and the electrolyte membrane. With this porous reduction electrode, there was a problem that if the pore size was small, the diffusion resistance of carbon dioxide within the electrode was large, reducing the efficiency of the carbon dioxide reduction reaction.

電解質膜をプロトン交換膜として利用する際には一般的に、電解質膜のプロトン移動度を向上させるために、沸騰硝酸および沸騰純水への浸漬処理が行われる。これらの処理は、電解質膜中のプロトン交換基をH+で置換する処理であるが、この処理によって電解質膜が過剰に水分を含み膨潤した状態となってしまう。これは、電解質膜は高分子の逆ミセル構造を有しているために、膨潤し含水率が高まるためである。 When using an electrolyte membrane as a proton exchange membrane, it is generally immersed in boiling nitric acid or boiling pure water to improve the proton mobility of the electrolyte membrane. These treatments replace the proton exchange groups in the electrolyte membrane with H + , but these treatments cause the electrolyte membrane to absorb excess water and become swollen. This is because the electrolyte membrane has a reverse micelle structure of polymer, which causes it to swell and increase its water content.

この膨潤した電解質膜を多孔質還元電極に接合して気相還元装置の多孔質電極支持型電解質膜として使用すると、二酸化炭素の還元反応進行中に徐々に酸化槽の水溶液が還元電極側に浸透してきてしまう。これにより、本来気相の二酸化炭素が供給されるべきである多孔質電極の表面を水溶液が覆い、二酸化炭素の還元反応の効率が経時的に劣化するという問題があった。 When this swollen electrolyte membrane is bonded to a porous reduction electrode and used as a porous electrode-supported electrolyte membrane in a gas-phase reduction device, the aqueous solution in the oxidation tank gradually permeates into the reduction electrode as the carbon dioxide reduction reaction progresses. This causes the aqueous solution to cover the surface of the porous electrode, where gas-phase carbon dioxide should be supplied, resulting in a problem of the efficiency of the carbon dioxide reduction reaction deteriorating over time.

本発明は、上記に鑑みてなされたものであり、二酸化炭素の気相還元効率を向上させることを目的とする。 The present invention has been made in consideration of the above, and aims to improve the efficiency of gas-phase reduction of carbon dioxide.

本発明の一態様の多孔質電極支持型電解質膜は、二酸化炭素を還元する気相還元装置に用いられる多孔質電極支持型電解質膜であって、電解質膜と、前記電解質膜上に直接接合された多孔質還元電極を有し、前記多孔質還元電極の平均気孔径が1μm以上97μm以下であり、前記電解質膜と前記多孔質還元電極を重ねて熱圧着した A porous electrode-supported electrolyte membrane according to one embodiment of the present invention is a porous electrode-supported electrolyte membrane used in a gas-phase reduction device that reduces carbon dioxide, and includes an electrolyte membrane and a porous reduction electrode directly bonded onto the electrolyte membrane, the porous reduction electrode having an average pore diameter of 1 μm or more and 97 μm or less , and the electrolyte membrane and the porous reduction electrode are overlapped and thermocompression-bonded .

本発明の一態様の多孔質電極支持型電解質膜の製造方法は、二酸化炭素を還元する気相還元装置に用いられる多孔質電極支持型電解質膜の製造方法であって、電解質膜を沸騰硝酸および沸騰純水へ浸漬する工程と、前記電解質膜の表面上に多孔質還元電極を重ねて熱圧着する工程を有し、熱圧着後の前記多孔質還元電極の平均気孔径が1μm以上97μm以下である。 A method for producing a porous electrode-supported electrolyte membrane according to one embodiment of the present invention is a method for producing a porous electrode-supported electrolyte membrane used in a gas-phase reduction device that reduces carbon dioxide, the method comprising the steps of immersing an electrolyte membrane in boiling nitric acid and boiling pure water, and superimposing a porous reduction electrode on a surface of the electrolyte membrane and thermocompression bonding the porous reduction electrode, wherein the porous reduction electrode after thermocompression bonding has an average pore diameter of 1 μm or more and 97 μm or less .

本発明によれば、二酸化炭素の気相還元効率を向上できる。 According to the present invention, the efficiency of gas-phase reduction of carbon dioxide can be improved.

図1は、本実施形態の多孔質電極支持型電解質膜の構成の一例を示す断面図である。FIG. 1 is a cross-sectional view showing an example of the configuration of a porous electrode-supported electrolyte membrane according to this embodiment. 図2は、多孔質電極支持型電解質膜の製造方法の一例を示すフローチャートである。FIG. 2 is a flow chart showing an example of a method for producing a porous electrode-supported electrolyte membrane. 図3は、多孔質電極支持型電解質膜を製造する際に熱圧着する様子の一例を示す図である。FIG. 3 is a diagram showing an example of a state in which thermocompression bonding is performed in the production of a porous electrode-supported electrolyte membrane. 図4は、多孔質電極支持型電解質膜を備える二酸化炭素の気相還元装置の構成の一例を示す図である。FIG. 4 is a diagram showing an example of the configuration of a gas-phase reduction device for carbon dioxide having a porous electrode-supported electrolyte membrane. 図5は、多孔質電極支持型電解質膜を備える別の二酸化炭素の気相還元装置の構成の一例を示す図である。FIG. 5 is a diagram showing an example of the configuration of another gas-phase reduction device for carbon dioxide having a porous electrode-supported electrolyte membrane.

以下、本発明の実施の形態について図面を用いて説明する。本発明は、以下に記載の実施形態に限定されるものではなく、本発明の趣旨を逸脱しない範囲において変更を加えてもよい。Hereinafter, the embodiment of the present invention will be described with reference to the drawings. The present invention is not limited to the embodiment described below, and modifications may be made without departing from the spirit of the present invention.

[多孔質電極支持型電解質膜の構成]
図1の断面図を参照し、本実施形態の多孔質電極支持型電解質膜20について説明する。
[Configuration of porous electrode-supported electrolyte membrane]
A porous electrode-supported electrolyte membrane 20 of this embodiment will be described with reference to the cross-sectional view of FIG.

図1の多孔質電極支持型電解質膜20は、電解質膜6と、電解質膜6の表面上に直接接合された多孔質還元電極5とを備える。The porous electrode-supported electrolyte membrane 20 in Figure 1 comprises an electrolyte membrane 6 and a porous reduction electrode 5 directly bonded onto the surface of the electrolyte membrane 6.

多孔質還元電極5は、電解質膜6に直接重ねて熱圧着されて、接合される。多孔質還元電極5は、熱圧着後の平均気孔径が1μm以上であるとよい。多孔質還元電極5は、例えば、銅、白金、金、銀、インジウム、パラジウム、ガリウム、ニッケル、スズ、カドミウム、それらの合金の多孔質体、または、酸化銀、酸化銅、酸化銅(II)、酸化ニッケル、酸化インジウム、酸化スズ、酸化タングステン、酸化タングステン(VI)、酸化銅などの多孔質体、もしくは金属イオンとアニオン性配位子を有する多孔性金属錯体である。The porous reduction electrode 5 is directly laminated on the electrolyte membrane 6 and bonded by thermocompression. The porous reduction electrode 5 preferably has an average pore diameter of 1 μm or more after thermocompression. The porous reduction electrode 5 is, for example, a porous body of copper, platinum, gold, silver, indium, palladium, gallium, nickel, tin, cadmium, or an alloy thereof, or a porous body of silver oxide, copper oxide, copper (II) oxide, nickel oxide, indium oxide, tin oxide, tungsten oxide, tungsten (VI) oxide, copper oxide, or the like, or a porous metal complex having a metal ion and an anionic ligand.

電解質膜6は、例えば、炭素-フッ素からなる骨格を持つパーフルオロカーボン材料であるナフィオン(商標登録)、フォアブルー、またはアクイヴィオンである。The electrolyte membrane 6 is, for example, Nafion (registered trademark), Forblue, or Aquivion, which is a perfluorocarbon material having a carbon-fluorine skeleton.

[多孔質電極支持型電解質膜の製造方法]
図2のフローチャートを参照し、本実施形態の多孔質電極支持型電解質膜20の製造方法の一例について説明する。
[Method of manufacturing a porous electrode-supported electrolyte membrane]
An example of a method for manufacturing the porous electrode-supported electrolyte membrane 20 of this embodiment will be described with reference to the flow chart of FIG.

ステップS1にて、電解質膜6のプロトン伝導の抵抗を低減させるために、電解質膜6を沸騰硝酸と沸騰純水のそれぞれに浸漬する。In step S1, the electrolyte membrane 6 is immersed in boiling nitric acid and boiling pure water to reduce the resistance of proton conduction in the electrolyte membrane 6.

ステップS2にて、電解質膜6の上に多孔質還元電極5を重ねて熱圧着装置(例えばホットプレス機)で熱圧着する。具体的には、図3に示すように、電解質膜6の上に多孔質還元電極5を重ねて2枚の銅板40a,40bの間に配置し、電解質膜6と多孔質還元電極5を銅板40a,40bとともに熱圧着装置で熱圧着する。熱圧着の際、加熱温度を100℃以上180℃未満にするとよい。In step S2, the porous reduction electrode 5 is placed on top of the electrolyte membrane 6 and thermocompression-bonded using a thermocompression bonding device (e.g., a hot press machine). Specifically, as shown in Fig. 3, the porous reduction electrode 5 is placed on top of the electrolyte membrane 6 and disposed between two copper plates 40a, 40b, and the electrolyte membrane 6 and the porous reduction electrode 5 are thermocompression-bonded together with the copper plates 40a, 40b using a thermocompression bonding device. During thermocompression bonding, the heating temperature should be set to 100°C or higher and lower than 180°C.

熱圧着後、素早く冷却して、電解質膜6と多孔質還元電極5とを接合した多孔質電極支持型電解質膜20が得られる。After thermocompression bonding, the material is quickly cooled to obtain a porous electrode-supported electrolyte membrane 20 in which the electrolyte membrane 6 and the porous reduction electrode 5 are bonded.

[気相還元装置(人工光合成)]
次に、図4を参照し、本実施形態の多孔質電極支持型電解質膜20を備えた二酸化炭素の気相還元装置100について説明する。図4に示す気相還元装置100は、光照射により二酸化炭素を還元する人工光合成技術を利用した還元装置である。
[Gas-phase reduction device (artificial photosynthesis)]
Next, a gas-phase reduction device 100 for carbon dioxide having the porous electrode-supported electrolyte membrane 20 of this embodiment will be described with reference to Fig. 4. The gas-phase reduction device 100 shown in Fig. 4 is a reduction device that utilizes artificial photosynthesis technology to reduce carbon dioxide by light irradiation.

気相還元装置100は、筐体内の内部空間を多孔質電極支持型電解質膜20で二分して形成された酸化槽1と還元槽4を備える。多孔質電極支持型電解質膜20は、電解質膜6を酸化槽1に向け、還元電極5を還元槽4に向けて配置される。The gas-phase reduction device 100 includes an oxidation tank 1 and a reduction tank 4 formed by dividing the internal space in a housing in two with a porous electrode-supported electrolyte membrane 20. The porous electrode-supported electrolyte membrane 20 is arranged with the electrolyte membrane 6 facing the oxidation tank 1 and the reduction electrode 5 facing the reduction tank 4.

酸化槽1は水溶液3で満たされる。水溶液3中に半導体または金属錯体からなる酸化電極2が挿入される。The oxidation tank 1 is filled with an aqueous solution 3. An oxidation electrode 2 made of a semiconductor or a metal complex is inserted into the aqueous solution 3.

酸化電極2は、例えば、窒化物半導体、酸化チタン、アモルファスシリコン、ルテニウム錯体、レニウム錯体のような光活性およびレドックス活性を示す化合物である。酸化電極2は、導線7によって多孔質還元電極5と電気的に接続される。The oxidation electrode 2 is a compound that exhibits photoactivity and redox activity, such as a nitride semiconductor, titanium oxide, amorphous silicon, a ruthenium complex, or a rhenium complex. The oxidation electrode 2 is electrically connected to the porous reduction electrode 5 by a conductor 7.

水溶液3は、例えば、炭酸水素カリウム水溶液、炭酸水素ナトリウム水溶液、塩化カリウム水溶液、塩化ナトリウム水溶液、水酸化ナトリウム水溶液、水酸化カリウム水溶液、水酸化ルビジウム水溶液、または水酸化セシウム水溶液である。還元反応中、水溶液3には、チューブ8からヘリウムガスが供給される。 The aqueous solution 3 is, for example, an aqueous solution of potassium bicarbonate, sodium bicarbonate, potassium chloride, sodium chloride, sodium hydroxide, potassium hydroxide, rubidium hydroxide, or cesium hydroxide. During the reduction reaction, helium gas is supplied to the aqueous solution 3 from the tube 8.

還元槽4は、気体入力口10から二酸化炭素が供給されて、二酸化炭素または二酸化炭素を含む気体で満たされる。Carbon dioxide is supplied through the gas input port 10 to the reduction tank 4, which is filled with carbon dioxide or a gas containing carbon dioxide.

光源9が、酸化電極2に光が照射されるように配置される。光源9は、例えば、キセノンランプ、擬似太陽光源、ハロゲンランプ、水銀ランプ、および太陽光である。光源9は、これら組み合わせて構成してもよい。The light source 9 is arranged so that light is irradiated onto the oxidation electrode 2. The light source 9 is, for example, a xenon lamp, a pseudo-sun light source, a halogen lamp, a mercury lamp, or sunlight. The light source 9 may be a combination of these.

[多孔質電極支持型電解質膜の実施例]
上記の気相還元装置100に配置する多孔質電極支持型電解質膜20として、平均気孔径または熱圧着処理時の加熱温度を変えた実施例1-6を作製し、後述の気相還元試験を行った。以下、実施例1-6の多孔質電極支持型電解質膜について説明する。
[Example of Porous Electrode-Supported Electrolyte Membrane]
As the porous electrode-supported electrolyte membrane 20 to be disposed in the above-mentioned gas-phase reduction device 100, Examples 1-6 were prepared by changing the average pore diameter or the heating temperature during the thermocompression bonding process, and a gas-phase reduction test described below was carried out. The porous electrode-supported electrolyte membrane of Example 1-6 will be described below.

<実施例1>
実施例1では、多孔質還元電極5の材料として厚み0.2mm、気孔率65%の銅多孔質体を用い、電解質膜6の材料としてプロトン交換膜であるナフィオンを用いた。
Example 1
In Example 1, the material of the porous reduction electrode 5 was a copper porous body having a thickness of 0.2 mm and a porosity of 65%, and the material of the electrolyte membrane 6 was Nafion, which is a proton exchange membrane.

ステップS1にて、プロトン伝導の抵抗を低減させるために、電解質膜6を沸騰硝酸と沸騰純水にそれぞれ浸漬した。この処理により電解質膜6のプロトン伝導の抵抗が3.0から3.5Ωまで低減されることを確認した。In step S1, the electrolyte membrane 6 was immersed in boiling nitric acid and boiling pure water to reduce the resistance of proton conduction. It was confirmed that this treatment reduced the resistance of proton conduction of the electrolyte membrane 6 to 3.0 to 3.5 Ω.

ステップS2にて、電解質膜6の上に多孔質還元電極5を重ねたサンプルを2枚の銅板とホットプレス機で挟み、加熱温度150℃の条件で、多孔質還元電極5の表面に対して垂直方向に圧力を加えて3分放置した。その後、サンプルを素早く冷却して取り出し、電解質膜6と多孔質還元電極5が接合した多孔質電極支持型電解質膜20を得た。In step S2, the sample in which the porous reduction electrode 5 was layered on the electrolyte membrane 6 was sandwiched between two copper plates and a hot press machine, and pressure was applied vertically to the surface of the porous reduction electrode 5 at a heating temperature of 150° C., and the sample was left for 3 minutes. The sample was then quickly cooled and removed, yielding a porous electrode-supported electrolyte membrane 20 in which the electrolyte membrane 6 and the porous reduction electrode 5 were bonded.

熱圧着後の多孔質還元電極5の厚みは0.14mm、気孔率は50%、平均気孔径は1.3μmであった。After thermocompression bonding, the thickness of the porous reduction electrode 5 was 0.14 mm, the porosity was 50%, and the average pore diameter was 1.3 μm.

<実施例2>
実施例2では、多孔質還元電極5の材料として厚み0.2mm、気孔率79%の銅多孔質体を用いて多孔質電極支持型電解質膜20を作製した。熱圧着後の多孔質還元電極5の厚みは0.14mm、気孔率は70%、平均気孔径は15μmであった。それ以外の条件は全て実施例1と同様である。
Example 2
In Example 2, a porous electrode-supported electrolyte membrane 20 was produced using a copper porous body having a thickness of 0.2 mm and a porosity of 79% as the material for the porous reduction electrode 5. The thickness of the porous reduction electrode 5 after thermocompression bonding was 0.14 mm, the porosity was 70%, and the average pore diameter was 15 μm. All other conditions were the same as those in Example 1.

<実施例3>
実施例3では、多孔質還元電極5の材料として厚み0.2mm、気孔率93%の銅多孔質体を用いて多孔質電極支持型電解質膜20を作製した。熱圧着後の多孔質還元電極5の厚みは0.14mm、気孔率は90%、平均気孔径は97μmであった。それ以外の条件は全て実施例1と同様である。
Example 3
In Example 3, a porous electrode supported electrolyte membrane 20 was produced using a copper porous body having a thickness of 0.2 mm and a porosity of 93% as the material for the porous reduction electrode 5. The thickness of the porous reduction electrode 5 after thermocompression bonding was 0.14 mm, the porosity was 90%, and the average pore diameter was 97 μm. All other conditions were the same as those in Example 1.

<実施例4>
実施例4では、実施例3と同様に、多孔質還元電極5の材料として厚み0.2mm、気孔率93%の銅多孔質体を用いて多孔質電極支持型電解質膜20を作製した。ホットプレス機で圧力を加える際の加熱温度を100℃とした。加熱温度以外の条件は全て実施例3と同様である。
Example 4
In Example 4, similarly to Example 3, a porous electrode-supported electrolyte membrane 20 was produced using a copper porous body having a thickness of 0.2 mm and a porosity of 93% as the material for the porous reduction electrode 5. The heating temperature when applying pressure with the hot press was set to 100° C. All conditions other than the heating temperature were the same as those in Example 3.

<実施例5>
実施例5では、実施例3と同様に、多孔質還元電極5の材料として厚み0.2mm、気孔率93%の銅多孔質体を用いて多孔質電極支持型電解質膜20を作製した。ホットプレス機で圧力を加える際の加熱温度を120℃とした。加熱温度以外の条件は全て実施例3と同様である。
Example 5
In Example 5, similarly to Example 3, a porous electrode-supported electrolyte membrane 20 was produced using a copper porous body having a thickness of 0.2 mm and a porosity of 93% as the material for the porous reduction electrode 5. The heating temperature when applying pressure with the hot press was set to 120° C. All conditions other than the heating temperature were the same as those in Example 3.

<実施例6>
実施例6では、実施例3と同様に、多孔質還元電極5の材料として厚み0.2mm、気孔率93%の銅多孔質体を用いて多孔質電極支持型電解質膜20を作製した。ホットプレス機で圧力を加える際の加熱温度を180℃とした。加熱温度以外の条件は全て実施例3と同様である。
Example 6
In Example 6, similarly to Example 3, a porous electrode-supported electrolyte membrane 20 was produced using a copper porous body having a thickness of 0.2 mm and a porosity of 93% as the material for the porous reduction electrode 5. The heating temperature when applying pressure with the hot press was set to 180° C. All conditions other than the heating temperature were the same as those in Example 3.

[電気化学測定およびガス・液体生成量測定]
実施例1-6の多孔質電極支持型電解質膜20のそれぞれを図4の気相還元装置100に取り付けて以下の還元反応試験を行った。
[Electrochemical measurements and gas/liquid production measurements]
Each of the porous electrode-supported electrolyte membranes 20 of Examples 1 to 6 was attached to the gas-phase reduction device 100 of FIG. 4, and the following reduction reaction test was carried out.

酸化槽1を水溶液3で満たした。水溶液3は、1.0mol/Lの水酸化カリウム水溶液とした。The oxidation tank 1 was filled with aqueous solution 3. Aqueous solution 3 was a 1.0 mol/L aqueous potassium hydroxide solution.

酸化電極2を水溶液3に浸水するように酸化槽1内に設置した。酸化電極2には、次のように作製した半導体光電極を用いた。サファイア基板上にn型半導体であるGaNの薄膜とAlGaNを順にエピタキシャル成長させ、AlGaN上にNiを真空蒸着して熱処理を行ってNiOの助触媒薄膜を形成した半導体光電極を作製した。The oxidation electrode 2 was placed in the oxidation tank 1 so that it was submerged in the aqueous solution 3. A semiconductor photoelectrode prepared as follows was used for the oxidation electrode 2. A thin film of n-type semiconductor GaN and AlGaN were epitaxially grown in that order on a sapphire substrate, and Ni was vacuum-deposited on the AlGaN and heat-treated to form a NiO promoter thin film to produce a semiconductor photoelectrode.

光源9には、300Wの高圧キセノンランプ(波長450nm以上をカット、照度6.6mW/cm)を用いた。光源9は、酸化電極2の酸化助触媒が形成されている面が照射面となるように固定した。酸化電極2の光照射面積を2.5cmとした。 A 300 W high-pressure xenon lamp (cutting off wavelengths of 450 nm or more, illuminance 6.6 mW/ cm2 ) was used as the light source 9. The light source 9 was fixed so that the surface of the oxidation electrode 2 on which the oxidation promoter was formed was the irradiated surface. The light irradiation area of the oxidation electrode 2 was set to 2.5 cm2 .

酸化槽1に対してはチューブ8からヘリウム(He)を、還元槽4に対しては気体入力口10から二酸化炭素(CO)を、それぞれ流量5ml/minかつ圧力0.18MPaで流した。この系では、多孔質電極支持型電解質膜20内の[電解質膜-銅-気相の二酸化炭素]からなる三相界面において、二酸化炭素の還元反応を進行させることができる。多孔質還元電極5の二酸化炭素が直接供給される見かけ面積は、約6.25cmである。 Helium (He) was fed from a tube 8 to the oxidation tank 1, and carbon dioxide (CO 2 ) was fed from a gas inlet 10 to the reduction tank 4, each at a flow rate of 5 ml/min and a pressure of 0.18 MPa. In this system, the reduction reaction of carbon dioxide can proceed at the three-phase interface consisting of [electrolyte membrane-copper-gas-phase carbon dioxide] in the porous electrode-supported electrolyte membrane 20. The apparent area of the porous reduction electrode 5 to which carbon dioxide is directly supplied is approximately 6.25 cm 2 .

酸化槽1および還元槽4をヘリウムと二酸化炭素で十分に置換した後、光源9を用いて酸化電極2に均一に光を照射した。光照射により、酸化電極2と多孔質還元電極5との間に電子が流れる。After the oxidation tank 1 and reduction tank 4 were fully replaced with helium and carbon dioxide, light was uniformly irradiated onto the oxidation electrode 2 using a light source 9. Electrons flow between the oxidation electrode 2 and the porous reduction electrode 5 due to the light irradiation.

光照射時の酸化電極2と多孔質還元電極5との間の電流値を、電気化学測定装置(Solartron社製、1287型ポテンショガルバノスタット)を用いて測定した。また、光照射中任意の時間に、酸化槽1および還元槽4内のガスと液体を採取し、ガスクロマトグラフ、液体クロマトグラフ、およびガスクロマトグラフ質量分析計にて反応生成物を分析した。その結果、酸化槽1内では酸素が、還元槽4内では、水素、一酸化炭素、ギ酸、メタン、メタノール、エタノール、エチレンが生成していることを確認した。The current value between the oxidation electrode 2 and the porous reduction electrode 5 during light irradiation was measured using an electrochemical measuring device (Solartron, 1287-type potentiogalvanostat). In addition, gas and liquid in the oxidation tank 1 and reduction tank 4 were sampled at any time during light irradiation, and the reaction products were analyzed using a gas chromatograph, liquid chromatograph, and gas chromatograph mass spectrometer. As a result, it was confirmed that oxygen was produced in the oxidation tank 1, and hydrogen, carbon monoxide, formic acid, methane, methanol, ethanol, and ethylene were produced in the reduction tank 4.

なお、実施例1-6の試験結果は、下記の実施例7-14および比較対象例1-4の試験結果とともに後述する。The test results for Examples 1-6 will be described below along with the test results for Examples 7-14 and Comparative Examples 1-4.

[気相還元装置(電解還元)]
次に、図5を参照し、本実施形態の多孔質電極支持型電解質膜20を備えた二酸化炭素の気相還元装置200について説明する。図5に示す気相還元装置200は、酸化電極と還元電極との間に電流を流して二酸化炭素を還元する電解還元技術を利用した還元装置である。
[Gas phase reduction device (electrolytic reduction)]
Next, a gas-phase reduction device 200 for carbon dioxide having the porous electrode-supported electrolyte membrane 20 of this embodiment will be described with reference to Fig. 5. The gas-phase reduction device 200 shown in Fig. 5 is a reduction device that utilizes an electrolytic reduction technique in which a current is passed between an oxidation electrode and a reduction electrode to reduce carbon dioxide.

気相還元装置200は、筐体内の内部空間を多孔質電極支持型電解質膜20で二分して形成された酸化槽1と還元槽4を備える。多孔質電極支持型電解質膜20は、電解質膜6側を酸化槽1に向け、還元電極5側を還元槽4に向けて配置される。The gas-phase reduction device 200 includes an oxidation tank 1 and a reduction tank 4 formed by dividing the internal space in the housing in two with a porous electrode-supported electrolyte membrane 20. The porous electrode-supported electrolyte membrane 20 is arranged with the electrolyte membrane 6 side facing the oxidation tank 1 and the reduction electrode 5 side facing the reduction tank 4.

酸化槽1は水溶液3で満たされる。水溶液3中に半導体または金属錯体からなる酸化電極2が挿入される。The oxidation tank 1 is filled with an aqueous solution 3. An oxidation electrode 2 made of a semiconductor or a metal complex is inserted into the aqueous solution 3.

酸化電極2は、例えば、白金、金、銀、銅、インジウム、ニッケルである。 The oxidation electrode 2 is, for example, platinum, gold, silver, copper, indium, or nickel.

水溶液3は、図4の気相還元装置100と同様である。 The aqueous solution 3 is similar to that of the gas phase reduction device 100 in Figure 4.

還元槽4は、気体入力口10から二酸化炭素が供給されて、二酸化炭素または二酸化炭素を含む気体で満たされる。Carbon dioxide is supplied through the gas input port 10 to the reduction tank 4, which is filled with carbon dioxide or a gas containing carbon dioxide.

電源11が、導線7によって酸化電極2と多孔質還元電極5とに電気的に接続される。 A power source 11 is electrically connected to the oxidation electrode 2 and the porous reduction electrode 5 by a conductor 7.

[多孔質電極支持型電解質膜の実施例]
上記の気相還元装置200に配置する多孔質電極支持型電解質膜20として、平均気孔径または熱圧着処理時の温度を変えた実施例7-12を作製し、後述の気相還元試験を行った。以下、実施例7-12の多孔質電極支持型電解質膜について説明する。なお、実施例7-12の多孔質電極支持型電解質膜20は、実施例1-6の多孔質電極支持型電解質膜20と同様に作製した。
[Example of Porous Electrode-Supported Electrolyte Membrane]
As the porous electrode-supported electrolyte membrane 20 to be placed in the gas-phase reduction device 200, Examples 7-12 were prepared by changing the average pore size or the temperature during the thermocompression treatment, and a gas-phase reduction test described below was performed. The porous electrode-supported electrolyte membrane of Examples 7-12 will be described below. The porous electrode-supported electrolyte membrane 20 of Examples 7-12 was prepared in the same manner as the porous electrode-supported electrolyte membrane 20 of Examples 1-6.

<実施例7>
実施例7の多孔質電極支持型電解質膜20は、実施例1と同様の手順で作製した。熱圧着時の加熱温度は150℃であり、熱圧着後の多孔質還元電極5の厚みは0.14mm、気孔率は50%、平均気孔径は1.3μmであった。
Example 7
The porous electrode-supported electrolyte membrane 20 of Example 7 was produced in the same manner as in Example 1. The heating temperature during thermocompression bonding was 150° C., and the porous reduction electrode 5 after thermocompression bonding had a thickness of 0.14 mm, a porosity of 50%, and an average pore diameter of 1.3 μm.

<実施例8>
実施例8では、多孔質還元電極5の材料として厚み0.2mm、気孔率79%の銅多孔質体を用いて多孔質電極支持型電解質膜20を作製した。熱圧着後の多孔質還元電極5の厚みは0.14mm、気孔率は70%、平均気孔径は15μmであった。それ以外の条件は全て実施例7と同様である。
Example 8
In Example 8, a porous electrode-supported electrolyte membrane 20 was produced using a copper porous body having a thickness of 0.2 mm and a porosity of 79% as the material for the porous reduction electrode 5. The thickness of the porous reduction electrode 5 after thermocompression bonding was 0.14 mm, the porosity was 70%, and the average pore diameter was 15 μm. All other conditions were the same as those in Example 7.

<実施例9>
実施例9では、多孔質還元電極5の材料として厚み0.2mm、気孔率93%の銅多孔質体を用いて多孔質電極支持型電解質膜20を作製した。熱圧着後の多孔質還元電極5の厚みは0.14mm、気孔率は90%、平均気孔径は97μmであった。それ以外の条件は全て実施例7と同様である。
<Example 9>
In Example 9, a porous electrode-supported electrolyte membrane 20 was produced using a copper porous body having a thickness of 0.2 mm and a porosity of 93% as the material for the porous reduction electrode 5. The thickness of the porous reduction electrode 5 after thermocompression bonding was 0.14 mm, the porosity was 90%, and the average pore diameter was 97 μm. All other conditions were the same as those in Example 7.

<実施例10>
実施例10では、実施例9と同様に、多孔質還元電極5の材料として厚み0.2mm、気孔率93%の銅多孔質体を用いて多孔質電極支持型電解質膜20を作製した。ホットプレス機で圧力を加える際の加熱温度を100℃とした。加熱温度以外の条件は全て実施例9と同様である。
Example 10
In Example 10, similarly to Example 9, a porous electrode-supported electrolyte membrane 20 was produced using a copper porous body having a thickness of 0.2 mm and a porosity of 93% as the material for the porous reduction electrode 5. The heating temperature when applying pressure with the hot press was set to 100° C. All conditions other than the heating temperature were the same as those in Example 9.

<実施例11>
実施例11では、実施例9と同様に、多孔質還元電極5の材料として厚み0.2mm、気孔率93%の銅多孔質体を用いて多孔質電極支持型電解質膜20を作製した。ホットプレス機で圧力を加える際の加熱温度を120℃とした。加熱温度以外の条件は全て実施例9と同様である。
Example 11
In Example 11, similarly to Example 9, a porous electrode-supported electrolyte membrane 20 was produced using a copper porous body having a thickness of 0.2 mm and a porosity of 93% as the material for the porous reduction electrode 5. The heating temperature when applying pressure with the hot press was set to 120° C. All conditions other than the heating temperature were the same as those in Example 9.

<実施例12>
実施例12では、実施例9と同様に、多孔質還元電極5の材料として厚み0.2mm、気孔率93%の銅多孔質体を用いて多孔質電極支持型電解質膜20を作製した。ホットプレス機で圧力を加える際の加熱温度を180℃とした。加熱温度以外の条件は全て実施例9と同様である。
Example 12
In Example 12, similarly to Example 9, a porous electrode-supported electrolyte membrane 20 was produced using a copper porous body having a thickness of 0.2 mm and a porosity of 93% as the material for the porous reduction electrode 5. The heating temperature when applying pressure with the hot press was set to 180° C. All conditions other than the heating temperature were the same as those in Example 9.

[電気化学測定およびガス・液体生成量測定]
実施例7-12の多孔質電極支持型電解質膜20のそれぞれを図5の気相還元装置200に取り付けて以下の還元反応試験を行った。
[Electrochemical measurements and gas/liquid production measurements]
Each of the porous electrode-supported electrolyte membranes 20 of Examples 7 to 12 was attached to the gas-phase reduction device 200 of FIG. 5, and the following reduction reaction test was carried out.

酸化槽1を水溶液3で満たした。水溶液3は、1.0mol/Lの水酸化カリウム水溶液とした。The oxidation tank 1 was filled with aqueous solution 3. Aqueous solution 3 was a 1.0 mol/L aqueous potassium hydroxide solution.

酸化電極2を表面積の約0.55cmが水溶液3に浸水するように酸化槽1に設置した。酸化電極2には白金(ニラコ社製)を用いた。 The oxidation electrode 2 was placed in the oxidation tank 1 so that its surface area of about 0.55 cm2 was submerged in the aqueous solution 3. The oxidation electrode 2 was made of platinum (manufactured by Nilaco Corporation).

酸化槽1に対してはチューブ8からヘリウム(He)を、還元槽4に対しては気体入力口10から二酸化炭素(CO)を、それぞれ流量5ml/minかつ圧力0.18MPaで流した。この系では、多孔質電極支持型電解質膜20内の[電解質膜-銅-気相の二酸化炭素]からなる三相界面において、二酸化炭素の還元反応を進行させることができる。多孔質還元電極5の二酸化炭素が直接供給される見かけ面積は、約6.25cmである。 Helium (He) was fed from a tube 8 to the oxidation tank 1, and carbon dioxide (CO 2 ) was fed from a gas inlet 10 to the reduction tank 4, each at a flow rate of 5 ml/min and a pressure of 0.18 MPa. In this system, the reduction reaction of carbon dioxide can proceed at the three-phase interface consisting of [electrolyte membrane-copper-gas-phase carbon dioxide] in the porous electrode-supported electrolyte membrane 20. The apparent area of the porous reduction electrode 5 to which carbon dioxide is directly supplied is approximately 6.25 cm 2 .

酸化槽1および還元槽4をヘリウムと二酸化炭素で十分に置換した後、電源11により電圧2.0Vを印加して酸化電極2と多孔質還元電極5との間に電子を流した。After the oxidation cell 1 and reduction cell 4 were thoroughly replaced with helium and carbon dioxide, a voltage of 2.0 V was applied from the power source 11 to allow electrons to flow between the oxidation electrode 2 and the porous reduction electrode 5.

電圧印加時の酸化電極2と多孔質還元電極5との間の電流値を、電気化学測定装置を用いて測定した。 The current value between the oxidation electrode 2 and the porous reduction electrode 5 when voltage was applied was measured using an electrochemical measurement device.

また、電圧印加時の任意の時間に、酸化槽1および還元槽4内のガスと液体を採取し、ガスクロマトグラフ、液体クロマトグラフ、およびガスクロマトグラフ質量分析計にて反応生成物を分析した。その結果、酸化槽1内では酸素が、還元槽4内では、水素、一酸化炭素、ギ酸、メタン、メタノール、エタノール、エチレンが生成していることを確認した。In addition, gas and liquid samples were taken from the oxidation tank 1 and reduction tank 4 at any time during voltage application, and the reaction products were analyzed using a gas chromatograph, liquid chromatograph, and gas chromatograph mass spectrometer. As a result, it was confirmed that oxygen was produced in the oxidation tank 1, and hydrogen, carbon monoxide, formic acid, methane, methanol, ethanol, and ethylene were produced in the reduction tank 4.

[比較対象例]
実施例とは平均気孔径または熱圧着処理時の温度が異なる比較対象例1-4を作製し、比較対象例1,2を図4の気相還元装置100の多孔質電極支持型電解質膜20として配置し、比較対象例3,4を図5の気相還元装置200の多孔質電極支持型電解質膜20として配置して実施例1-6および実施例7-12と同様の試験を行った。
[Comparison example]
Comparative Examples 1 to 4 were prepared which were different from the Examples in terms of the average pore diameter or the temperature during the thermocompression bonding treatment. Comparative Examples 1 and 2 were arranged as the porous electrode-supported electrolyte membrane 20 in the gas-phase reduction device 100 of FIG. 4, and Comparative Examples 3 and 4 were arranged as the porous electrode-supported electrolyte membrane 20 in the gas-phase reduction device 200 of FIG. 5, and tests similar to those of Examples 1 to 6 and Examples 7 to 12 were performed.

<比較対象例1>
比較対象例1では、厚み0.2mm、気孔率51%の銅多孔質体を用いて実施例1と同様に多孔質電極支持型電解質膜を作製した。熱圧着後の多孔質還元電極の厚みは0.14mm、気孔率は30%、平均気孔径は0.11μmであった。それ以外の条件は全て実施例1と同様である。
<Comparative Example 1>
In Comparative Example 1, a porous electrode-supported electrolyte membrane was produced in the same manner as in Example 1, using a copper porous body having a thickness of 0.2 mm and a porosity of 51%. The thickness of the porous reduction electrode after thermocompression bonding was 0.14 mm, the porosity was 30%, and the average pore diameter was 0.11 μm. All other conditions were the same as in Example 1.

<比較対象例2>
比較対象例2では、熱圧着時の加熱温度を80℃とした。加熱温度以外の条件は全て実施例3と同様である。
<Comparative Example 2>
In Comparative Example 2, the heating temperature during thermocompression bonding was set to 80° C. All other conditions were the same as those in Example 3.

<比較対象例3>
比較対象例3では、厚み0.2mm、気孔率51%の銅多孔質体を用いて実施例7と同様に多孔質電極支持型電解質膜を作製した。熱圧着後の多孔質還元電極の厚みは0.14mm、気孔率は30%、平均気孔径は0.11μmであった。それ以外の条件は全て実施例7と同様である。
<Comparative Example 3>
In Comparative Example 3, a porous electrode-supported electrolyte membrane was produced in the same manner as in Example 7, using a copper porous body having a thickness of 0.2 mm and a porosity of 51%. The thickness of the porous reduction electrode after thermocompression bonding was 0.14 mm, the porosity was 30%, and the average pore diameter was 0.11 μm. All other conditions were the same as in Example 7.

<比較対象例4>
比較対象例4では、熱圧着時の加熱温度を80℃とした。加熱温度以外の条件は全て実施例9と同様である。
<Comparative Example 4>
In Comparative Example 4, the heating temperature during thermocompression bonding was 80° C. All other conditions were the same as those in Example 9.

[実施例と比較対象例の評価]
次に、実施例1-12と比較対象例1-4の試験結果について説明する。表1に、実施例1-12および比較対象例1-4に関して、1時間後の二酸化炭素還元反応のファラデー効率および20時間後の二酸化炭素還元反応のファラデー効率維持率を示す。
[Evaluation of Examples and Comparative Examples]
Next, the test results of Examples 1-12 and Comparative Examples 1-4 will be described. Table 1 shows the Faraday efficiency of the carbon dioxide reduction reaction after 1 hour and the Faraday efficiency maintenance rate of the carbon dioxide reduction reaction after 20 hours for Examples 1-12 and Comparative Examples 1-4.

ファラデー効率とは、式(6)に示すように、光照射時または電圧印加時に電極間に流れた電流値に対して、各還元反応に使われた電流値の割合を示すものである。 Faraday efficiency, as shown in equation (6), indicates the ratio of the current value used in each reduction reaction to the current value flowing between the electrodes when light is irradiated or voltage is applied.

各還元反応のファラデー効率[%]=(各還元反応に消費された電荷)/(酸化電極-還元電極間を流れた電荷)×100 (6)Faraday efficiency of each reduction reaction [%] = (charge consumed in each reduction reaction) / (charge flowing between the oxidation electrode and reduction electrode) x 100 (6)

ここで、式(6)の「各還元反応に消費された電荷」は、各還元反応の反応生成物量の測定値を、その還元反応に必要な電荷に換算することで求めることができる。各還元反応の反応生成物量をA[mol]、還元反応に必要な電子数をZ、ファラデー定数をF[C/mol]としたとき、式(7)を用いて算出した。Here, the "electric charge consumed in each reduction reaction" in formula (6) can be calculated by converting the measured amount of reaction product of each reduction reaction into the electric charge required for that reduction reaction. When the amount of reaction product of each reduction reaction is A [mol], the number of electrons required for the reduction reaction is Z, and the Faraday constant is F [C/mol], it was calculated using formula (7).

各還元反応に消費された電荷[C]=A×Z×F (7)Charge consumed in each reduction reaction [C] = A x Z x F (7)

また、20時間後の各還元反応のファラデー効率維持率は下記の式(8)の通り定義し、算出した。 In addition, the Faraday efficiency maintenance rate of each reduction reaction after 20 hours was defined and calculated according to the following formula (8).

20時間後の各還元反応のファラデー効率維持率[%]=(20時間後の各還元反応のファラデー効率)/(1時間後の各還元反応のファラデー効率)×100 (8)Faraday efficiency maintenance rate [%] of each reduction reaction after 20 hours = (Faraday efficiency of each reduction reaction after 20 hours) / (Faraday efficiency of each reduction reaction after 1 hour) × 100 (8)

1時間後の二酸化炭素還元反応のファラデー効率について、実施例1-5と比較対象例1、実施例7-11と比較対象例3をそれぞれ比較すると、実施例1-5,7-11の方が比較対象例1,3よりも1時間後の二酸化炭素還元反応のファラデー効率が高かった。When comparing the Faraday efficiency of the carbon dioxide reduction reaction after one hour between Examples 1-5, Comparative Example 1, Examples 7-11 and Comparative Example 3, it was found that Examples 1-5 and 7-11 had a higher Faraday efficiency of the carbon dioxide reduction reaction after one hour than Comparative Examples 1 and 3.

表1には、気孔径に依存する多孔質電極内での二酸化炭素の拡散係数の評価結果を示している。これによると、気孔径1μmを超える実施例1-5,7-11では、飽和値6.0x10-6-1(自己拡散係数)に達しており、比較対象例1、3のおよそ1.5倍であることが分かった。 Table 1 shows the evaluation results of the diffusion coefficient of carbon dioxide in a porous electrode, which depends on the pore size. According to this, in Examples 1-5 and 7-11, in which the pore size exceeds 1 μm, the saturation value of 6.0×10 −6 m 2 s −1 (self-diffusion coefficient) is reached, which is approximately 1.5 times that of Comparative Examples 1 and 3.

これらのことから、二酸化炭素の拡散係数が飽和値になる平均気孔径1μm以上の多孔質電極で構成される多孔質電極支持型電解質膜20を用いることで、多孔質還元電極5への二酸化炭素供給量が増加し、二酸化炭素還元反応の効率向上を実現できた。 Based on these findings, by using a porous electrode-supported electrolyte membrane 20 composed of porous electrodes with an average pore diameter of 1 μm or more, at which the diffusion coefficient of carbon dioxide reaches a saturated value, the amount of carbon dioxide supplied to the porous reduction electrode 5 can be increased, thereby improving the efficiency of the carbon dioxide reduction reaction.

20時間後の二酸化炭素還元反応のファラデー効率維持率について、実施例1-5と比較対象例2、実施例7-11と比較対象例4をそれぞれ比較すると、実施例1-5,7-11の方が比較対象例2,4よりも20時間後の二酸化炭素還元反応のファラデー効率維持率が高かった。When comparing Examples 1-5, Comparative Example 2, Examples 7-11, and Comparative Example 4 with respect to the Faraday efficiency maintenance rate of the carbon dioxide reduction reaction after 20 hours, Examples 1-5 and 7-11 had a higher Faraday efficiency maintenance rate of the carbon dioxide reduction reaction after 20 hours than Comparative Examples 2 and 4.

実施例1-5,7-11では20時間後の電極表面には目視で確認できるほどの液体の付着はなかった。一方で、比較対象例2,4では20時間後の電極表面に液体が数百μL付着しており、電極表面に直接的に気相の二酸化炭素を供給できなくなったことでファラデー効率維持率が低くなったことが分かった。電極表面に付着した液体は主に、二酸化炭素還元反応進行の有無にかかわらず酸化槽1から電解質膜6を介して浸透してくる水溶液であることを確認した。これは、電解質膜6が過剰な水分をため込んだ膨潤状態になり、酸化槽1内の水溶液3が浸透したことが原因と考えられる。一方で、実施例1-5と実施例7-11では、熱圧着を100℃以上の温度条件で実施することで、電解質膜中に含まれる水分を気化させることができた。これにより、電解質膜を介した水溶液浸透が抑制されて二酸化炭素還元反応の維持率が向上したと考えらえる。In Examples 1-5 and 7-11, there was no visible liquid on the electrode surface after 20 hours. On the other hand, in Comparative Examples 2 and 4, several hundred μL of liquid was attached to the electrode surface after 20 hours, and it was found that the Faraday efficiency maintenance rate was reduced because gaseous carbon dioxide could no longer be directly supplied to the electrode surface. It was confirmed that the liquid attached to the electrode surface was mainly an aqueous solution that permeated from the oxidation tank 1 through the electrolyte membrane 6 regardless of whether the carbon dioxide reduction reaction was progressing. This is thought to be due to the electrolyte membrane 6 becoming swollen with excess moisture, and the aqueous solution 3 in the oxidation tank 1 permeating into it. On the other hand, in Examples 1-5 and 7-11, the moisture contained in the electrolyte membrane was vaporized by performing the thermocompression bonding at a temperature condition of 100°C or higher. It is thought that this suppressed the permeation of the aqueous solution through the electrolyte membrane, improving the maintenance rate of the carbon dioxide reduction reaction.

さらに、表1には、測定した電解質膜6のプロトン伝導の抵抗を示している。実施例1-5と実施例7-11では3.0~3.5Ωと低抵抗であり、熱圧着後もプロトン伝導の抵抗低減の効果が失われていないことが確認できた。一方で、実施例6,12では、電解質膜6のイオン伝導の抵抗が360Ωに増大していた。これにより、電極間の電流値が著しく低く反応生成物量が評価系の検出下限界(3%)を下回ったため記録なしとしている。これは、180℃という高い温度条件で熱圧着処理を実施したことで、電解質膜のプロトン交換基が分解されたためと考えられる。 Furthermore, Table 1 shows the measured resistance of the proton conduction of the electrolyte membrane 6. In Examples 1-5 and 7-11, the resistance was low at 3.0 to 3.5 Ω, and it was confirmed that the effect of reducing the resistance of the proton conduction was not lost even after thermocompression bonding. On the other hand, in Examples 6 and 12, the resistance of the ion conduction of the electrolyte membrane 6 increased to 360 Ω. As a result, the current value between the electrodes was extremely low and the amount of the reaction product was below the detection limit (3%) of the evaluation system, so no record was made. This is thought to be because the proton exchange group of the electrolyte membrane was decomposed by carrying out the thermocompression treatment at a high temperature condition of 180°C.

以上説明したように、本実施形態によれば、本実施形態の多孔質電極支持型電解質膜20は、電解質膜6と、電解質膜6上に直接接合された多孔質還元電極5を有し、多孔質還元電極5の平均気孔径が1μm以上とする。これにより、電極内での二酸化炭素の拡散抵抗を低減し二酸化炭素の気相還元の効率を向上できる。また、電解質膜6と多孔質還元電極5とを接合する工程で、加熱しながら圧力を加えて、電解質膜6の膨潤を抑制することで、多孔質電極支持型電解質膜20の寿命を向上できる。As described above, according to this embodiment, the porous electrode-supported electrolyte membrane 20 of this embodiment has an electrolyte membrane 6 and a porous reduction electrode 5 directly bonded onto the electrolyte membrane 6, and the average pore diameter of the porous reduction electrode 5 is set to 1 μm or more. This reduces the diffusion resistance of carbon dioxide within the electrode and improves the efficiency of gas-phase reduction of carbon dioxide. In addition, in the process of bonding the electrolyte membrane 6 and the porous reduction electrode 5, pressure is applied while heating to suppress swelling of the electrolyte membrane 6, thereby improving the life of the porous electrode-supported electrolyte membrane 20.

多孔質電極支持型電解質膜 20
多孔質還元電極 5
電解質膜 6
Porous electrode supported electrolyte membrane 20
Porous reduction electrode 5
Electrolyte membrane 6

Claims (3)

二酸化炭素を還元する気相還元装置に用いられる多孔質電極支持型電解質膜であって、
電解質膜と、
前記電解質膜上に直接接合された多孔質還元電極を有し、
前記多孔質還元電極の平均気孔径が1μm以上97μm以下であり、
前記電解質膜と前記多孔質還元電極を重ねて熱圧着した
多孔質電極支持型電解質膜。
A porous electrode-supported electrolyte membrane for use in a gas-phase reduction device for reducing carbon dioxide, comprising:
An electrolyte membrane;
A porous reduction electrode is directly bonded onto the electrolyte membrane,
The average pore diameter of the porous reduction electrode is 1 μm or more and 97 μm or less ,
The electrolyte membrane and the porous reduction electrode were laminated and heat-pressed.
Porous electrode-supported electrolyte membrane.
二酸化炭素を還元する気相還元装置に用いられる多孔質電極支持型電解質膜の製造方法であって、
電解質膜を沸騰硝酸および沸騰純水へ浸漬する工程と、
前記電解質膜の表面上に多孔質還元電極を重ねて熱圧着する工程を有し、
熱圧着後の前記多孔質還元電極の平均気孔径が1μm以上97μm以下である
多孔質電極支持型電解質膜の製造方法。
A method for producing a porous electrode-supported electrolyte membrane for use in a gas-phase reduction device for reducing carbon dioxide, comprising the steps of:
Immersing the electrolyte membrane in boiling nitric acid and boiling pure water;
A step of superposing a porous reduction electrode on a surface of the electrolyte membrane and thermocompressing the electrode,
The method for producing a porous electrode-supported electrolyte membrane, wherein the porous reduction electrode after thermocompression bonding has an average pore size of 1 μm or more and 97 μm or less .
請求項に記載の多孔質電極支持型電解質膜の製造方法であって、
前記熱圧着の加熱温度を100℃以上180℃未満とする多孔質電極支持型電解質膜の製造方法。
A method for producing the porous electrode-supported electrolyte membrane according to claim 2 , comprising the steps of:
The method for producing a porous electrode-supported electrolyte membrane, wherein the heating temperature for the thermocompression bonding is 100° C. or higher and lower than 180° C.
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