Deprecated: The each() function is deprecated. This message will be suppressed on further calls in /home/zhenxiangba/zhenxiangba.com/public_html/phproxy-improved-master/index.php on line 456
JP7603323B2 - Manufacturing method of sliding electrode - Google Patents
[go: Go Back, main page]

JP7603323B2 - Manufacturing method of sliding electrode - Google Patents

Manufacturing method of sliding electrode Download PDF

Info

Publication number
JP7603323B2
JP7603323B2 JP2022066424A JP2022066424A JP7603323B2 JP 7603323 B2 JP7603323 B2 JP 7603323B2 JP 2022066424 A JP2022066424 A JP 2022066424A JP 2022066424 A JP2022066424 A JP 2022066424A JP 7603323 B2 JP7603323 B2 JP 7603323B2
Authority
JP
Japan
Prior art keywords
metallic bonding
bonding phase
cemented carbide
sliding electrode
sliding
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2022066424A
Other languages
Japanese (ja)
Other versions
JP2023156829A (en
Inventor
堅志 佐藤
幹雄 大澤
泰夫 武本
史和 大澤
Original Assignee
九州瑞穂株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 九州瑞穂株式会社 filed Critical 九州瑞穂株式会社
Priority to JP2022066424A priority Critical patent/JP7603323B2/en
Publication of JP2023156829A publication Critical patent/JP2023156829A/en
Application granted granted Critical
Publication of JP7603323B2 publication Critical patent/JP7603323B2/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Landscapes

  • Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • ing And Chemical Polishing (AREA)

Description

本発明は、長寿命化を可能とする、導通金属線のすべり電極の製造方法に関する。 The present invention relates to a method for manufacturing a sliding electrode of a conductive metal wire that enables a longer life.

導通金属線が工業的に使用される用途の一つに、ワイヤ放電加工技術がある。これは、ワイヤの放電熱によって材料を切断する加工方法であり、溶液環境で絶縁状態にあるワイヤと工作物が接近してパルス電流が流れて、何千℃程の温度となり、工作物が融解して所定形状に切断される加工プロセスによるものである。 One of the industrial applications of conductive metal wire is wire electric discharge machining. This is a machining method that cuts materials using the heat of the wire's discharge. The wire, which is insulated in a liquid environment, is brought close to the workpiece and a pulsed current flows through it, raising the temperature to several thousand degrees Celsius, melting the workpiece and cutting it into the desired shape.

図1に、ワイヤ放電加工のプロセスを模式図で示す。上下方向に間隔をおいて、2個のすべり電極1が設けられ、すべり電極1は電源装置2に接続されている。すべり電極1に対して、ワイヤ放電加工機で使用する導通金属線3を接触させ、導通金属線3を、図1に矢印で示す一方向に、所望の速度で連続的に移動させる。 Figure 1 shows a schematic diagram of the wire electric discharge machining process. Two sliding electrodes 1 are provided spaced apart in the vertical direction, and the sliding electrodes 1 are connected to a power supply unit 2. A conductive metal wire 3 used in a wire electric discharge machine is brought into contact with the sliding electrode 1, and the conductive metal wire 3 is moved continuously at a desired speed in one direction as indicated by the arrow in Figure 1.

このワイヤ放電加工プロセスに使用される導通金属線3は、材料として銅合金やモリブデン合金線が用いられており、一定の張力を与えた状態で、一定の速度で溶断対象部の前面を通過する。電流は、工作物の上下に設置した高電圧のすべり電極1と接触することによって給電される。常に張力を持った導通金属線3がすべり電極上を通過する際、微視的に見ると、常時微小な間隙が生じて放電が起きやすくなる。 The conductive metal wire 3 used in this wire electric discharge machining process is made of a copper alloy or molybdenum alloy wire, and passes in front of the part to be cut at a constant speed while being subjected to a constant tension. Electric current is supplied by contact with high-voltage sliding electrodes 1 installed above and below the workpiece. When the conductive metal wire 3, which is constantly under tension, passes over the sliding electrodes, a microscopic view shows that a tiny gap is constantly created, making it easier for discharge to occur.

このような環境であるため、すべり電極1のワイヤ通過部は、摺動と放電によって徐々に摩耗が進行し、溝状の窪みが形成される。その後継続してこの箇所を使用すると、ワイヤの断線リスクが高まるため、ある程度窪みが深くなったところで寿命と判断して、電極の位置をずらすか交換することによって、新規の平滑面を通過させて、給電を再開し加工を継続する。 In this environment, the wire passage area of the sliding electrode 1 gradually wears away due to sliding and discharge, forming a groove-like depression. If this area is continued to be used thereafter, the risk of the wire breaking increases, so when the depression deepens to a certain depth, it is determined that the wire has reached the end of its life, and the electrode is shifted or replaced, allowing it to pass over a new smooth surface, power supply is resumed, and machining continues.

このような使用環境下にあるすべり電極の素材として、耐摩耗性と耐熱性に優れる炭化タングステンを主とする硬質粒子と、CoまたはNiを主成分とする金属結合相からなる超硬合金が用いられてきた。 As a material for sliding electrodes in such operating environments, cemented carbide consisting of hard particles mainly made of tungsten carbide, which has excellent wear resistance and heat resistance, and a metallic bonding phase mainly made of Co or Ni, has been used.

近年、工作物の大型化が進み、無人連続運転化が進むにつれて、ワイヤ放電加工機のすべり電極の寿命が問題となっている。電極位置をずらす作業や、電極そのものの交換作業が少ないほど、長時間連続運転が可能になり、低コスト化を図ることができるため、長寿命化を実現する手法が求められている。 In recent years, as workpieces have become larger and unmanned continuous operation has become more common, the lifespan of the sliding electrodes in wire EDM machines has become an issue. The less work required to shift the electrode position or replace the electrode itself, the longer the continuous operation will be possible and the lower the cost will be, so there is a demand for methods to achieve a longer lifespan.

このようなすべり電極の寿命向上対策の一例として、特許文献1に開示されているように、硬質粒子の粒度調整と金属結合相の相比と成分調整により、耐摩耗性と耐熱性を向上させる取り組みがなされてきた。 As an example of a measure to improve the lifespan of such sliding electrodes, as disclosed in Patent Document 1, efforts have been made to improve wear resistance and heat resistance by adjusting the particle size of the hard particles and the phase ratio and composition of the metallic bonding phase.

特開2003-266243号公報JP 2003-266243 A

これまでワイヤ放電加工機のすべり電極が通電加工中に摩耗が生じて窪みとなり、寿命に至る現象に関して、上述のように超硬合金の硬質粒子の粒度調整、および金属結合相の相比と成分調整については検討されてきたが、窪みが発生するメカニズムそのものを理解する十分な研究が行われてこなかった。 As mentioned above, adjustments to the particle size of the hard particles in the cemented carbide and adjustments to the phase ratio and composition of the metallic bonding phase have been investigated in relation to the phenomenon in which the sliding electrode of a wire EDM machine wears out during electrical current machining, forming dents and ultimately shortening its lifespan. However, there has not been sufficient research done to understand the mechanism by which the dents form.

高電圧化で常に電流を供給するすべり電極の損耗現象については、金属線との摺動が発生する環境ではあるものの、その押しつけ力は、超硬合金製ダイスが金属線の引き抜き加工で受ける高速・高圧の摺動に比べて、はるかにその環境が優しいことを考慮して、本発明者は、放電現象に着目して検討を行った。 Regarding the wear phenomenon of the sliding electrode that constantly supplies current at high voltage, the environment in which sliding with the metal wire occurs, the pressing force is much gentler than the high-speed, high-pressure sliding that a cemented carbide die experiences during the drawing process of a metal wire. Considering this, the inventors conducted an investigation focusing on the discharge phenomenon.

本発明は、このような事情を考慮してなされたもので、通電加工中における摩耗の発生を抑制して、長寿命化を可能とする、導通金属線のすべり電極の製造方法を提供することを目的とする。 The present invention was made in consideration of these circumstances, and aims to provide a method for manufacturing a sliding electrode of a conductive metal wire that suppresses the occurrence of wear during electric current processing and enables a longer life.

以上の課題を解決するために、本発明は、硬質粒子相と金属結合相とを含む超硬合金によって構成されて、導通金属線によるワイヤ放電加工に用いられるすべり電極の製造方法であって、使用開始前の平滑化プロセスの最終仕上げ工程において超硬合金表面に対してラップ処理を行うことを特徴とするすべり電極の製造方法である。このラップ処理後の超硬合金表面の表面粗さは、Raで0.01μm以下であることが好ましい。 In order to solve the above problems, the present invention is a method for manufacturing a sliding electrode that is made of a cemented carbide containing a hard particle phase and a metallic bonding phase and is used in wire electric discharge machining using a conductive metal wire, characterized in that a lapping process is performed on the cemented carbide surface in the final finishing step of the smoothing process before use. The surface roughness of the cemented carbide surface after this lapping process is preferably 0.01 μm or less in terms of Ra.

本発明においては、前記超硬合金の表面において金属結合相のみを選択腐食して、金属結合相が導通金属線と直接的に接触しない構造とすることが好ましい。 In the present invention, it is preferable to selectively etch only the metallic bonding phase on the surface of the cemented carbide, so that the metallic bonding phase does not come into direct contact with the conductive metal wire.

これにより、通電加工中における摩耗の発生を抑制することができ、長寿命化が可能となる。そのため、電極位置をずらす作業や、電極そのものの交換作業を少なくして、長時間連続運転が可能となる。 This makes it possible to suppress wear during electric current machining and extend the tool's life. This reduces the need to shift the electrode position or replace the electrode itself, making it possible to operate continuously for long periods of time.

また、本発明においては、前記金属結合相のみを選択腐食する際の金属結合相の欠乏深さは、超硬合金母体の組成と、その超硬合金母体をすべり電極に加工して金属結合相を選択腐食した後で上面から特性X線分析で計測した組成と、選択腐食された金属結合相の欠乏領域で硬質粒子間にわずかに残存する金属結合相の組成と、特性X線分析で特性X線が放出されることにより計測される分析深さの4つの情報から算出することができる。 In addition, in the present invention, the depletion depth of the metallic bonding phase when only the metallic bonding phase is selectively etched can be calculated from four pieces of information: the composition of the cemented carbide base material, the composition measured by characteristic X-ray analysis from the top surface after the cemented carbide base material is processed into a sliding electrode and the metallic bonding phase is selectively etched, the composition of the metallic bonding phase remaining slightly between the hard particles in the depleted region of the selectively etched metallic bonding phase, and the analysis depth measured by the emission of characteristic X-rays in the characteristic X-ray analysis.

これにより、選択腐食がなされた後の欠乏層内において、硬質粒子間にわずかに金属結合相が残存することによって、界面でなだらかに変化する金属結合相量を効率的に算出して、非破壊で腐食深さを正しく算出することが可能となる。なお、選択腐食の深さは、強度保持の観点から、硬質粒子の平均粒径と同程度の深さとすることを前提としている。 As a result, a small amount of metallic bonding phase remains between the hard particles in the depleted layer after selective corrosion has occurred, making it possible to efficiently calculate the amount of metallic bonding phase that changes smoothly at the interface, and accurately calculate the corrosion depth non-destructively. Note that, from the perspective of strength retention, it is assumed that the depth of selective corrosion is approximately the same as the average grain size of the hard particles.

本発明によると、通電加工中における摩耗の発生を抑制して、長寿命化を可能とする、導通金属線のすべり電極を製造することができる。 According to the present invention, it is possible to manufacture a sliding electrode of a conductive metal wire that suppresses wear during electrical current processing and enables a longer life.

ワイヤ放電加工のプロセスを示す模式図である。FIG. 1 is a schematic diagram showing a wire electric discharge machining process. 研磨後の平滑表面と、金属結合相の選択腐食後の表面を示す図である。FIG. 2 shows a smooth surface after polishing and a surface after selective etching of the metallic bonding phase. 超硬合金製工具の表面の金属結合相の選択腐食後の断面と、その際の金属結合相の主成分であるC量の変化を模式的に示した図である。FIG. 2 is a schematic diagram showing a cross section of a surface of a cemented carbide tool after selective etching of a metallic bonding phase, and a change in the amount of CO, which is a main component of the metallic bonding phase, during the selective etching. 金属結合相の欠乏深さを定義するための図である。FIG. 2 is a diagram for defining the depletion depth of a metallic bonding phase. 超硬合金中の表面金属結合相の欠乏深さ測定方法のフローチャートである。1 is a flow chart of a method for measuring the depletion depth of a surface metal binder phase in a cemented carbide. 超硬合金表面を走査型電子顕微鏡で撮影した画像である。This is an image of the surface of a cemented carbide alloy taken with a scanning electron microscope. 放電耐電圧試験の試験結果を示す図である。FIG. 11 is a diagram showing test results of a discharge withstand voltage test. 放電耐電圧試験の試験結果を示す図である。FIG. 11 is a diagram showing test results of a discharge withstand voltage test. 超硬合金表面の選択腐食処理の有無によるすべり電極の摩耗量を、摩耗による断面積として模式的に示した図である。FIG. 1 is a diagram showing the amount of wear of a sliding electrode in terms of cross-sectional area due to wear, depending on whether or not the surface of a cemented carbide alloy is subjected to selective etching treatment. 摩耗断面積に関する試験結果を示す図である。FIG. 13 is a diagram showing test results regarding the wear cross-sectional area. 摩耗断面積に関する試験結果を示す図である。FIG. 13 is a diagram showing test results regarding the wear cross-sectional area. 摩耗断面積に関する試験の導通金属線とすべり電極の接触状態を示す模式図である。FIG. 2 is a schematic diagram showing the contact state between a conductive metal wire and a sliding electrode in a test regarding a wear cross-sectional area.

以下に、本発明に係るすべり電極の製造方法を、その実施形態に基づいて説明する。
本発明のすべり電極の製造方法は、硬質粒子相と金属結合相とを含む超硬合金によって構成されて、導通金属線によるワイヤ放電加工に用いられるすべり電極の製造方法であって、使用開始前の平滑化プロセスの最終仕上げ工程において超硬合金表面に対してラップ処理を行うものであり、超硬合金の表面において金属結合相のみを選択腐食して、金属結合相が導通金属線と直接的に接触しない構造とするものである。
Hereinafter, a method for manufacturing a sliding electrode according to the present invention will be described based on an embodiment thereof.
The method for manufacturing a sliding electrode of the present invention is a method for manufacturing a sliding electrode composed of a cemented carbide containing a hard particle phase and a metallic bonding phase, and used in wire electric discharge machining with a conductive metal wire, in which a lapping treatment is performed on the cemented carbide surface in the final finishing step of the smoothing process before use, and selectively corrodes only the metallic bonding phase on the surface of the cemented carbide, resulting in a structure in which the metallic bonding phase does not come into direct contact with the conductive metal wire.

ここで、ラップ処理とは、工具と工作物の表面との間に砥粒、油などを混合したラップ剤を介在させて、両者を適当な圧力で押し付けながら相対運動を与え、ラップ剤により工作物の表面から微量の材料を除去して、平滑で寸法精度のよい仕上げ面を得る研磨加工方法である。このラップ処理を行うにあたって、ラップ処理後の超硬合金表面の表面粗さは、Raで0.01μm以下であることが好ましい。 Here, lapping is a polishing method in which a lapping agent, a mixture of abrasive grains, oil, etc., is placed between the tool and the surface of the workpiece, and the two are pressed together with an appropriate pressure while being subjected to relative motion, removing a small amount of material from the surface of the workpiece with the lapping agent, resulting in a smooth, finished surface with good dimensional accuracy. When carrying out this lapping, it is preferable that the surface roughness of the cemented carbide surface after lapping be 0.01 μm or less in Ra.

図2に、研磨後の平滑表面4と、金属結合相7の選択腐食後の表面5を示す。硬質粒子6の密着部には、残存する金属結合相8が存在している。
以下に、金属結合相の選択腐食における腐食深さの算出方法について説明する。
2 shows a smooth surface 4 after polishing and a surface 5 after selective etching of the metallic bonding phase 7. In the contact areas of the hard particles 6, the metallic bonding phase 8 remains.
A method for calculating the corrosion depth in the selective corrosion of the metallic bonding phase will be described below.

図3は、超硬合金製工具の表面の金属結合相の選択腐食後の断面と、その際の金属結合相の主成分であるC量の変化を模式的に示したものである。選択腐食がなされた後の欠乏層内では、硬質粒子間にわずかに金属結合相が残存するために、C量は完全にゼロとはならない値で変動を持って推移する。金属結合相が腐食によって除去された領域から、未反応の領域ではなだらかなC量の遷移が起きており、この領域で欠乏深さを定義する必要がある。 Fig. 3 shows a schematic diagram of a cross section of the metallic bonding phase on the surface of a cemented carbide tool after selective etching and the change in the amount of CO, the main component of the metallic bonding phase, during the selective etching. In the depletion zone after selective etching, a small amount of metallic bonding phase remains between the hard particles, so the amount of CO fluctuates and does not become completely zero. A gradual transition in the amount of CO occurs from the region where the metallic bonding phase has been removed by etching to the unreacted region, and it is necessary to define the depletion depth in this region.

そこで本発明者は、図4に示す直線的な成分変化を仮定し、金属結合相の欠乏深さを定義することとした。母体のC量をm1、硬質粒子間に残る少量のC量をm2とし、m2、m1はそれぞれ一定値、m2からm1への遷移は、図4に示すように、直線的な変化が起きるものと仮定する。 Therefore, the inventors have decided to define the depletion depth of the metallic bonding phase by assuming a linear change in components as shown in Fig. 4. The amount of CO in the matrix is m1, and the small amount of CO remaining between the hard particles is m2. It is assumed that m2 and m1 are constant values, and that the transition from m2 to m1 occurs linearly as shown in Fig. 4.

この直線的な変化が起きるC量の遷移位置を、金属結合相の欠乏深さdと定義する。これらの定義と、特性X線分析で照射するX線が計測する分析深さD、実際に特性X線分析で測定したCo量mxを用いて、Co量の質量保存で等式を作ると、以下の式(1)が得られる。 The transition position of the CO amount where this linear change occurs is defined as the depletion depth d of the metallic bonding phase. Using these definitions, the analysis depth D measured by the X-rays irradiated in the characteristic X-ray analysis, and the amount of Co mx actually measured by the characteristic X-ray analysis, an equation is created based on the conservation of mass of the amount of Co, and the following equation (1) is obtained.

Figure 0007603323000001
Figure 0007603323000001

式(1)を欠乏深さdで解けば、式(2)が得られる。 By solving equation (1) with respect to the deficiency depth d, we obtain equation (2).

Figure 0007603323000002
Figure 0007603323000002

ここで、硬質粒子間に残る金属結合相の濃度は、あらかじめ、走査型電子顕微鏡に付属する分析方法等でその残分を推定しておく必要がある。また分析深さは、使用する特性X線分析装置のX線強度と、分析される超硬合金の組成で定まる。 Here, the concentration of the metallic bonding phase remaining between the hard particles must be estimated in advance using an analysis method attached to the scanning electron microscope. The analysis depth is determined by the X-ray intensity of the characteristic X-ray analyzer used and the composition of the cemented carbide being analyzed.

特性X線分析装置とは、エネルギー分散型特性X線分析装置(EDS)や、波長分散型特性X線分析装置(WDS)などを指す。いずれの装置も、試料表面から放出される特性X線を検出することにより、試料の化学組成を測定する装置であり、EDSは特性X線のエネルギーを測定するものであり、WDSは特性X線の波長を測定するものである。 Characteristic X-ray analyzers include energy dispersive X-ray analyzers (EDS) and wavelength dispersive X-ray analyzers (WDS). Both instruments measure the chemical composition of a sample by detecting characteristic X-rays emitted from the sample surface, with EDS measuring the energy of characteristic X-rays and WDS measuring the wavelength of characteristic X-rays.

EDSは、特性X線の反応領域が、深さ方向に数μmと比較的浅い一方、WDSは10μmを超える分析深さを有している。本発明においては、被分析素材が数μm程度の硬質粒子径を持つことを考えると、複数粒子分の深さが測定できる波長分散型特性X線分析装置(WDS)の方が、より望ましい分析装置であると言える。 In EDS, the reaction region of characteristic X-rays is relatively shallow at a depth of a few μm, while WDS has an analysis depth of more than 10 μm. In the present invention, considering that the material to be analyzed has hard particle diameters of about a few μm, it can be said that a wavelength dispersive characteristic X-ray analyzer (WDS), which can measure the depth of multiple particles, is a more desirable analytical device.

このような単純化された定義の欠乏深さではあるが、この欠乏深さは算術上、一義的に定まるものであり、またCo量の遷移領域と必ず交わるために、取り決めとして仕様書などにうたう場合に、大変扱いやすい定義となる。またこの測定方法は非破壊であるために、直接的に出荷検査に用いることが可能になり、同時に異常時の原因分析に用いることもできる。 Although this is a simplified definition of the deficiency depth, it is arithmetically uniquely determined and always intersects with the transition region of the Co content, making it a very easy definition to use when specifying it as an agreement in specifications. Furthermore, because this measurement method is non-destructive, it can be used directly for shipping inspections, and at the same time, it can also be used to analyze the cause of abnormalities.

上述したように、超硬合金母体の組成m1、これと同一の母体をすべり電極に加工し、金属結合相を選択腐食した後で上面から特性X線分析で計測した組成mx、選択腐食された金属結合相の欠乏領域で硬質粒子間にわずかに残存する金属結合相の組成m2、および特性X線分析で特性X線が放出されることにより計測する分析深さDの4つの情報から、金属結合相の欠乏深さdを算出することが可能となる。 As described above, it is possible to calculate the depletion depth d of the metallic bonding phase from four pieces of information: the composition m1 of the cemented carbide base body, the composition mx measured from the top surface by characteristic X-ray analysis after processing the same base body into a sliding electrode and selectively etching the metallic bonding phase, the composition m2 of the metallic bonding phase remaining in small amounts between the hard particles in the depleted area of the selectively etched metallic bonding phase, and the analysis depth D measured by the emission of characteristic X-rays in characteristic X-ray analysis.

図5に、以上説明した、超硬合金中の表面金属結合相の欠乏深さ測定方法のフローチャートを示す。この処理を行うことにより、超硬合金の金属結合相を表面からエッチングで除去していくと、金属結合相は、硬質粒子相を網の目状に残して、トンネル状に選択腐食が進んでいくという状況下であっても、計算された腐食深さは、実際には境界があいまいな腐食前面の深さを非破壊で一義的に定義できる。 Figure 5 shows a flowchart of the method for measuring the depletion depth of the surface metallic bonding phase in a cemented carbide, as explained above. By carrying out this process, when the metallic bonding phase of a cemented carbide is removed from the surface by etching, the metallic bonding phase leaves behind a mesh-like hard particle phase, and selective corrosion progresses in a tunnel-like manner. Even in this situation, the calculated corrosion depth can non-destructively and unambiguously define the depth of the corrosion front, whose boundary is actually ambiguous.

上述した欠乏深さの計算値と実測値との対比試験を、粒子径が異なる3つの材種(細粒、中粒、粗粒)を対象として、細粒、中粒、粗粒のそれぞれについてサンプルを製作して実施した。それぞれの平均粒径は、細粒が0.6~1.0μm、中粒が2.0~4.0μm、粗粒が5.0μm以上である。実測値は、波長分散型特性X線分析装置(WDS)を用いて、数か所について実測を行い、その平均値とした。 A comparison test between the calculated and measured values of the above-mentioned defect depth was carried out for three material types with different particle sizes (fine, medium, and coarse), by producing samples for each of the fine, medium, and coarse grains. The average particle size of each was 0.6 to 1.0 μm for fine grains, 2.0 to 4.0 μm for medium grains, and 5.0 μm or more for coarse grains. The actual measurements were taken at several locations using a wavelength dispersive X-ray analyzer (WDS) and the average values were calculated.

試験の結果、欠乏深さの計算値と実測値との差は、細粒、中粒、粗粒のいずれの場合についても、硬質粒子の粒子径の半分よりも極めて小さい値となった。硬質粒子の粒子径の半分という数値は、硬質粒子が脱落するか否かを定める境界値であると認識でき、欠乏深さの計算値と実測値との差が硬質粒子の粒子径の半分を超えると、選択腐食を行うにあたって、超硬合金によって構成された部品や工具の機能に悪影響を与えることになる。しかし、試験結果によると、欠乏深さの計算値が、実測値に対して硬質粒子の粒子径の半分よりも極めて小さい差しか生じないことから、本発明による欠乏深さの計算値の算出手法は極めて有効であることを確認できた。 As a result of the test, the difference between the calculated and measured deficiency depths was much smaller than half the particle diameter of the hard particles for all the fine, medium, and coarse grains. The value of half the particle diameter of the hard particles can be recognized as a boundary value that determines whether or not the hard particles will fall off, and if the difference between the calculated and measured deficiency depths exceeds half the particle diameter of the hard particles, it will have a negative effect on the function of parts and tools made of cemented carbide when selective corrosion is performed. However, according to the test results, the difference between the calculated deficiency depth and the measured value was much smaller than half the particle diameter of the hard particles, so it was confirmed that the method of calculating the calculated deficiency depth according to the present invention is extremely effective.

この手法を用いることにより、すべり電極を構成する超硬合金の表面において金属結合相のみを選択腐食して、金属結合相が導通金属線と直接的に接触しない構造とするにあたって、非破壊で腐食深さを正しく算出することが可能となる。 By using this method, it is possible to selectively corrode only the metallic bonding phase on the surface of the cemented carbide that constitutes the sliding electrode, creating a structure in which the metallic bonding phase does not come into direct contact with the conductive metal wire, and it is possible to accurately calculate the corrosion depth non-destructively.

以下に、本発明による効果を実証するための実験結果について説明する。
具体的には、すべり電極に用いられる超硬合金の品種と、すべり電極表面の微小粗さの変化と、超硬合金の主たる導通を担う金属結合相をエッチング処理で選択除去した際のすべり電極表面からの距離とを変数として、放電耐電圧試験を行った。
The results of experiments carried out to verify the effects of the present invention will now be described.
Specifically, discharge voltage withstand tests were conducted using the following variables as the type of cemented carbide used in the sliding electrode, the change in micro-roughness on the sliding electrode surface, and the distance from the sliding electrode surface when the metallic bonding phase, which is mainly responsible for the electrical conductivity of the cemented carbide, was selectively removed by etching treatment.

実験条件は以下の通りである。
・表1に示す3つの品種について、表面研磨肌2種(#800とラップ仕上げ)と、選択腐食有無の2種で、絶縁破壊実験を実施
The experimental conditions are as follows.
・For the three varieties shown in Table 1, dielectric breakdown tests were conducted with two types of surface polishing (#800 and lap finish) and two types with and without selective corrosion.

Figure 0007603323000003
Figure 0007603323000003

・仕上げ肌2条件でRaを測定
・選択腐食深さは、X線波長分光分析から計算
・絶縁破壊実験条件:常温(20℃±15℃)-常湿(45-85%)
・耐電圧評価方法:90°のテーパーで先端がR1の真鍮製電極と超硬合金製のすべり電極を、真鍮製電極の先端と超硬合金製すべり電極の摺動面を0.05mmの間隔をあけて設置し、電圧を印加して、電極間で絶縁破壊が起きた時点の電圧を測定し、耐電圧として評価する。
・Measure Ra under two finish conditions ・Selective corrosion depth is calculated from X-ray wavelength spectroscopy ・Insulation breakdown test conditions: Room temperature (20℃±15℃) - Room humidity (45-85%)
- Voltage resistance evaluation method: A brass electrode with a 90° taper and a tip of R1 and a sliding electrode made of cemented carbide were placed with a gap of 0.05 mm between the tip of the brass electrode and the sliding surface of the sliding electrode made of cemented carbide. A voltage was applied and the voltage at the point when dielectric breakdown occurred between the electrodes was measured and evaluated as the voltage resistance.

図6は、超硬合金表面を走査型電子顕微鏡で撮影した画像であり、(a)が研磨のままであり、(b)が選択腐食後のものである。 Figure 6 shows images of the cemented carbide surface taken with a scanning electron microscope, (a) as polished and (b) after selective etching.

図7、図8に、試験結果を示す。図7(a)が本発明に関するデータであり、図7(b)が比較例に関するデータである。
試料Noで、1と7、3と9、5と11の比較から、超硬合金表面をラップ仕上げすることにより、#800に比べて、3つの品種とも耐電圧が高くなるとともに、安定化が実現している。また、試料Noで、1と2、3と4、5と6の比較から、金属結合相の選択腐食により、ラップ処理を行ったものは、大幅に耐電圧が向上している。その一方、試料Noで、7と8、9と10、11と12を比較すると、#800のように初期の肌が粗いと選択腐食による効果は現れていない。
The test results are shown in Figures 7 and 8. Figure 7(a) shows data relating to the present invention, and Figure 7(b) shows data relating to a comparative example.
Comparisons of sample numbers 1 and 7, 3 and 9, and 5 and 11 show that lapping the cemented carbide surface increases and stabilizes the withstand voltage of all three varieties compared to #800. Comparisons of sample numbers 1 and 2, 3 and 4, and 5 and 6 show that the selective corrosion of the metallic bonding phase causes the lapping process to significantly improve the withstand voltage. On the other hand, comparisons of sample numbers 7 and 8, 9 and 10, and 11 and 12 show that the effect of selective corrosion is not apparent in samples with a rough initial surface like #800.

このことから、超硬合金表面の表面粗さを、Raで0.01μm以下のレベルにしておくことが重要であり、その状態で、超硬合金表面の金属結合相のみを選択腐食することにより、さらに顕著な効果が得られることが確認された。 This shows that it is important to keep the surface roughness of the cemented carbide surface at a level of 0.01 μm or less in terms of Ra, and that by selectively corroding only the metallic bonding phase of the cemented carbide surface in this state, even more remarkable effects can be obtained.

次に、超硬合金表面の選択腐食処理を行うことによるすべり電極の摩耗量についての試験結果について説明する。
図9は、超硬合金表面の選択腐食処理の有無によるすべり電極の摩耗量を、摩耗による断面積として模式的に示したものである。すべり電極は、図1にすべり電極として示すように、工作物の上下にそれぞれ配置されており、図9(a)は、パターン1(P1)についてのものであり、上側のすべり電極に対して選択腐食処理有り(「上有」と略す)の場合の摩耗断面積をXとし、下側のすべり電極に対して選択腐食処理無し(「下無」と略す)の場合の摩耗断面積をYとしている。これについての断面積比率はX/Yとなる。
Next, the results of tests on the amount of wear of the sliding electrode caused by selective etching of the cemented carbide surface will be described.
Fig. 9 is a schematic diagram showing the wear amount of the sliding electrode with and without selective etching treatment of the cemented carbide surface as a cross-sectional area due to wear. As shown as the sliding electrodes in Fig. 1, the sliding electrodes are arranged above and below the workpiece, and Fig. 9(a) is for pattern 1 (P1), where the wear cross-sectional area when the upper sliding electrode is selectively etched (abbreviated as "upper with") is X, and the wear cross-sectional area when the lower sliding electrode is not selectively etched (abbreviated as "lower without") is Y. The cross-sectional area ratio for this is X/Y.

図9(b)は、パターン2(P2)についてのものであり、上側のすべり電極に対して選択腐食処理無し(「上無」と略す)の場合の摩耗断面積を1.25Xとし、下側のすべり電極に対して選択腐食処理有り(「下有」と略す)の場合の摩耗断面積を0.8Yとしている。これは、選択腐食処理による摩耗量削減の効果が20%減であるとして、この場合の断面積比率は、1.25X/0.8Y=1.5625X/Yとなる。このような設定で、(上有/下無)<(上無/下有)という結果が得られれば、選択腐食処理による摩耗量削減の効果があると考えられる。 Figure 9 (b) is for pattern 2 (P2), where the wear cross-sectional area when the upper sliding electrode is not subjected to selective corrosion treatment (abbreviated as "upper no") is 1.25X, and the wear cross-sectional area when the lower sliding electrode is subjected to selective corrosion treatment (abbreviated as "lower with") is 0.8Y. This assumes that the effect of selective corrosion treatment in reducing the amount of wear is reduced by 20%, so the cross-sectional area ratio in this case is 1.25X/0.8Y = 1.5625X/Y. With these settings, if the result is (upper with/lower without) < (upper without/lower with), it is considered that selective corrosion treatment is effective in reducing the amount of wear.

以上の観点に基づいて、実施した、摩耗断面積に関する試験結果を、図10、図11に示す。
図10、図11において、上側のすべり電極に対して選択腐食処理有り(上有)であって、下側のすべり電極に対して選択腐食処理無し(下無)のケースがパターン1(P1)である。また、上側のすべり電極に対して選択腐食処理無し(上無)であって、下側のすべり電極に対して選択腐食処理有り(下有)のケースがパターン2(P2)である。導通金属線とすべり電極は、図12(a)、(b)に示す状態で設置し、使用時間は、15時間と100時間とした。
The results of tests on the cross-sectional wear area conducted based on the above viewpoints are shown in FIG. 10 and FIG.
10 and 11, the case where the upper sliding electrode was selectively corroded (with upper) and the lower sliding electrode was not selectively corroded (with lower) is pattern 1 (P1). The case where the upper sliding electrode was not selectively corroded (with upper) and the lower sliding electrode was selectively corroded (with lower) is pattern 2 (P2). The conductive metal wire and the sliding electrode were installed as shown in Fig. 12(a) and (b), and the usage times were 15 hours and 100 hours.

試験結果によると、(上有/下無)<(上無/下有)の関係を満たしており、これにより、選択腐食処理による摩耗量削減の効果が表れていることが確認できた。 The test results showed that the relationship (top present/bottom absent) < (top absent/bottom present) was met, confirming that selective corrosion treatment was effective in reducing wear.

上記の試験の導通金属線とすべり電極の接触状態を、図12(a)、(b)に示す。 The contact state between the conductive metal wire and the sliding electrode in the above test is shown in Figures 12(a) and (b).

本発明は、通電加工中における摩耗の発生を抑制することができるため、長寿命化が可能な、導通金属線のすべり電極の製造方法として、広く利用することができる。 The present invention can be widely used as a manufacturing method for sliding electrodes of conductive metal wires that can suppress the occurrence of wear during electrical current processing and therefore have a long service life.

1 すべり電極
2 電源
3 金属導通線
4 研磨後の平滑表面
5 金属結合相の選択腐食後の表面
6 硬質粒子
7 金属結合相
8 硬質粒子密着部に残存する金属結合相
1 sliding electrode 2 power supply 3 metal conducting wire 4 smooth surface after polishing 5 surface after selective corrosion of metallic bonding phase 6 hard particles 7 metallic bonding phase 8 metallic bonding phase remaining in hard particle contact area

Claims (3)

硬質粒子相と金属結合相とを含む超硬合金によって構成されて、導通金属線によるワイヤ放電加工に用いられるすべり電極の製造方法であって、使用開始前の平滑化プロセスの最終仕上げ工程において超硬合金表面に対してラップ処理を行い、前記超硬合金の表面において金属結合相のみを選択腐食して、金属結合相が導通金属線と直接的に接触しない構造とすることを特徴とするすべり電極の製造方法。 A method for manufacturing a sliding electrode made of a cemented carbide containing a hard particle phase and a metallic bonding phase and used in wire electric discharge machining using a conductive metal wire, characterized in that in a final finishing step of a smoothing process before use, the cemented carbide surface is subjected to a lapping treatment, and only the metallic bonding phase on the surface of the cemented carbide is selectively etched, resulting in a structure in which the metallic bonding phase does not come into direct contact with the conductive metal wire . 前記ラップ処理後の超硬合金表面の表面粗さが、Raで0.01μm以下であることを特徴とする請求項1記載のすべり電極の製造方法。 The method for manufacturing a sliding electrode according to claim 1, characterized in that the surface roughness of the cemented carbide surface after the lapping process is 0.01 μm or less in terms of Ra. 前記金属結合相のみを選択腐食する際の金属結合相の欠乏深さは、超硬合金母体の組成と、その超硬合金母体をすべり電極に加工して金属結合相を選択腐食した後で上面から特性X線分析で計測した組成と、選択腐食された金属結合相の欠乏領域で硬質粒子間にわずかに残存する金属結合相の組成と、特性X線分析で特性X線が放出されることにより計測される分析深さの4つの情報から算出することを特徴とする請求項1記載のすべり電極の製造方法。 2. The method for manufacturing a sliding electrode according to claim 1, characterized in that the depletion depth of the metallic bonding phase when only the metallic bonding phase is selectively etched is calculated from four pieces of information: the composition of the cemented carbide base, the composition measured by characteristic X-ray analysis from the top surface after the cemented carbide base is processed into a sliding electrode and the metallic bonding phase is selectively etched, the composition of the metallic bonding phase remaining slightly between the hard particles in the depleted region of the selectively etched metallic bonding phase, and the analysis depth measured by emission of characteristic X-rays in the characteristic X-ray analysis.
JP2022066424A 2022-04-13 2022-04-13 Manufacturing method of sliding electrode Active JP7603323B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2022066424A JP7603323B2 (en) 2022-04-13 2022-04-13 Manufacturing method of sliding electrode

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2022066424A JP7603323B2 (en) 2022-04-13 2022-04-13 Manufacturing method of sliding electrode

Publications (2)

Publication Number Publication Date
JP2023156829A JP2023156829A (en) 2023-10-25
JP7603323B2 true JP7603323B2 (en) 2024-12-20

Family

ID=88468852

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2022066424A Active JP7603323B2 (en) 2022-04-13 2022-04-13 Manufacturing method of sliding electrode

Country Status (1)

Country Link
JP (1) JP7603323B2 (en)

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003266248A (en) 2002-03-18 2003-09-24 Sumitomo Coal Mining Co Ltd Material for energization piece for wire-cut electric discharge machine, energization piece, and method for manufacturing the same
JP2005246540A (en) 2004-03-04 2005-09-15 Hitachi Tool Engineering Ltd Wire guide and/or electrode member for wire-cut electric discharge machining
JP2008184671A (en) 2007-01-31 2008-08-14 Tohoku Univ Nanoporous metal and method for producing the same
JP2011099164A (en) 2005-03-28 2011-05-19 Kyocera Corp Cemented carbide and cutting tool

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003266248A (en) 2002-03-18 2003-09-24 Sumitomo Coal Mining Co Ltd Material for energization piece for wire-cut electric discharge machine, energization piece, and method for manufacturing the same
JP2005246540A (en) 2004-03-04 2005-09-15 Hitachi Tool Engineering Ltd Wire guide and/or electrode member for wire-cut electric discharge machining
JP2011099164A (en) 2005-03-28 2011-05-19 Kyocera Corp Cemented carbide and cutting tool
JP2008184671A (en) 2007-01-31 2008-08-14 Tohoku Univ Nanoporous metal and method for producing the same

Also Published As

Publication number Publication date
JP2023156829A (en) 2023-10-25

Similar Documents

Publication Publication Date Title
Arooj et al. Effect of current in the EDM machining of aluminum 6061 T6 and its effect on the surface morphology
Liew et al. Carbon nanofiber assisted micro electro discharge machining of reaction-bonded silicon carbide
Jeong et al. Deburring microfeatures using micro-EDM
Li et al. Surface integrity evolution and machining efficiency analysis of W-EDM of nickel-based alloy
Ugrasen et al. Optimization of process parameters in wire EDM of HCHCr material using Taguchi's technique
Shabgard et al. Investigation of the surface integrity characteristics in wire electrical discharge machining of Inconel 617
Ganachari et al. A comparative performance study of dry and near dry EDM processes in machining of spring steel material
Carlini et al. WED-machining performance by reciprocating molybdenum wire on Inconel 718 with water or hydrocarbon dielectrics
JP6024739B2 (en) Coated rotating tool and manufacturing method thereof
Sen et al. Study the impact of process parameters and electrode material on wire electric discharge machining performances
JP7603323B2 (en) Manufacturing method of sliding electrode
Hsu et al. The machining characteristics of polycrystalline diamond (PCD) by micro-WEDM
Galindo-Fernandez et al. The prediction of surface finish and cutting speed for wire electro-discharge machining of Polycrystalline Diamond
Shabgard et al. Wire electrical discharge machining of ASP30 tool steel
Kumar et al. Effects of machining parameters on performance characteristics of powder mixed EDM of Inconel-800
Alsoufi et al. Experimental investigation of wire-EDM process parameters for surface roughness in the machining of carbon steel 1017 and aluminum alloy 6060
Ishfaq et al. Exploring the contribution of unconventional parameters on spark gap formation and its minimization during WEDM of layered composite
Kuo et al. Working towards the minimum surface damages and failure analysis of Joule heat effects in manufacturing diamond cutting tools
El-Taweel Parametric study and optimisation of wire electrical discharge machining of Al-Cu-TiC-Si P/M composite
JP7605491B2 (en) A method for selective etching of the metallic bonding phase on the surface of cemented carbide.
Sun et al. An experimental study for evaluating the machining accuracy of LS-WEDT and its application in fabricating micro parts
Kumar et al. Investigation of surface roughness for inconel 718 in blind hole drilling with rotary tool electrode
JP7652427B2 (en) Calculation method for surface depletion depth of metallic bonding phase
JP7659826B2 (en) Manufacturing method for bonded metal parts
Olivier et al. Influence of electrical and thermal conductivity of cemented carbides on the wire EDM process

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20240325

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20241010

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20241016

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20241024

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20241202

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20241203

R150 Certificate of patent or registration of utility model

Ref document number: 7603323

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150