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JP7623404B2 - Conductive film and display device - Google Patents
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JP7623404B2 - Conductive film and display device - Google Patents

Conductive film and display device Download PDF

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JP7623404B2
JP7623404B2 JP2022572020A JP2022572020A JP7623404B2 JP 7623404 B2 JP7623404 B2 JP 7623404B2 JP 2022572020 A JP2022572020 A JP 2022572020A JP 2022572020 A JP2022572020 A JP 2022572020A JP 7623404 B2 JP7623404 B2 JP 7623404B2
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light
resin
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conductive film
transmitting
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JPWO2022138000A1 (en
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浩 新開
大介 園田
祥久 玉川
康正 張原
智之 五井
謙一 手塚
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TDK Corp
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01BCABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B5/00Non-insulated conductors or conductive bodies characterised by their form
    • H01B5/14Non-insulated conductors or conductive bodies characterised by their form comprising conductive layers or films on insulating-supports

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  • Nonlinear Science (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Laminated Bodies (AREA)
  • Shielding Devices Or Components To Electric Or Magnetic Fields (AREA)

Description

本発明は、導電性フィルム、及び表示装置に関する。 The present invention relates to a conductive film and a display device.

液晶表示装置等の表示装置において、金属細線によって形成された、開口を含むパターンを有する導体部を有する導電部材が用いられることがある。その場合、導体部が設けられた部分と導体部が設けられない部分との境界が視認されることを防ぐために、実際に導体として機能する導体部以外に、ダミー部材としてのメッシュ状のパターンを形成する金属細線が画像表示領域全体にわたって設けられることが一般的である(例えば特許文献1)。In some display devices, such as liquid crystal display devices, a conductive member having a conductor portion formed of thin metal wires and having a pattern including openings is used. In such cases, in order to prevent the boundary between the portion where the conductor portion is provided and the portion where the conductor portion is not provided from being visible, thin metal wires that form a mesh-like pattern as a dummy member are generally provided throughout the entire image display area in addition to the conductor portion that actually functions as a conductor (for example, Patent Document 1).

国際公開第2019/093049号International Publication No. 2019/093049

ダミー部材としてのメッシュ状のパターンを形成する金属細線が画像表示部全体にわたって設けられると、金属細線と表示装置の画素との干渉に起因して、表示画像にモアレが発生することがある。そのため、モアレ抑制の観点からは、フィルム状の基材と、開口を含むパターンを有する導体部とを有し、当該導体部以外の領域においてダミー部材としての金属細線が設けられていない導電性フィルムを、表示装置に組み込むことが有効であると考えられる。特に、導体部の開口を埋める絶縁樹脂部を更に有する導電性フィルムは、その製造が容易であることが期待される。ところがその場合、主に絶縁樹脂部の屈折率と空気の屈折率との差異に起因して、絶縁樹脂部を透過する光と、それ以外の部分を透過する光とで光路長に差異が生じ、そのために正常な画像表示に支障をきたすことがある。When fine metal wires forming a mesh-like pattern as dummy members are provided over the entire image display section, moire may occur in the displayed image due to interference between the fine metal wires and the pixels of the display device. Therefore, from the viewpoint of suppressing moire, it is considered effective to incorporate a conductive film having a film-like substrate and a conductor portion having a pattern including an opening, and in which fine metal wires as dummy members are not provided in areas other than the conductor portion, into the display device. In particular, a conductive film further having an insulating resin portion that fills the openings of the conductor portion is expected to be easy to manufacture. However, in that case, due mainly to the difference between the refractive index of the insulating resin portion and the refractive index of air, a difference occurs in the optical path length between the light that passes through the insulating resin portion and the light that passes through the other portions, which may cause problems in normal image display.

そこで、本発明は、表示装置に組み込まれたときに、表示画像のモアレの発生を抑制するとともに、均一性の高い光路長を確保し易い導電性フィルムを提供する。Therefore, the present invention provides a conductive film that, when incorporated into a display device, suppresses the occurrence of moire in the displayed image and makes it easy to ensure a highly uniform optical path length.

本発明は、フィルム状の光透過性基材と、前記光透過性基材の一方の主面のうちの一部を占める第一領域上に設けられた導電性層と、前記光透過性基材の一方の主面のうち前記第一領域以外の領域を含む第二領域の全体を覆うように設けられた光透過性樹脂層と、を備える導電性フィルムを提供する。前記導電性層は、前記光透過性基材の主面の面内方向に延在し開口を含むパターンを有する部分を含む導体部と、前記導体部の開口内を埋める絶縁樹脂部と、を有する。The present invention provides a conductive film comprising a film-like light-transmitting substrate, a conductive layer provided on a first region occupying a part of one of the main surfaces of the light-transmitting substrate, and a light-transmitting resin layer provided so as to cover the entire second region of one of the main surfaces of the light-transmitting substrate, including the region other than the first region. The conductive layer has a conductor portion including a portion having a pattern including an opening that extends in the in-plane direction of the main surface of the light-transmitting substrate, and an insulating resin portion that fills the opening of the conductor portion.

上記導電性フィルムは、絶縁樹脂部を含む導電性層が設けられた第一領域以外の領域を含む第二領域の全体に光透過性樹脂層が設けられていることから、これが表示装置に組み込まれたときに、ダミー部材に起因するモアレの発生が抑制されるとともに、画像を表示する光のための均一性の高い光路長が確保され易い。 The above-mentioned conductive film has a light-transmitting resin layer provided over the entire second region, including regions other than the first region in which the conductive layer including the insulating resin portion is provided. Therefore, when this is incorporated into a display device, the occurrence of moire caused by the dummy member is suppressed, and a highly uniform optical path length for the light that displays an image is easily ensured.

前記第一領域の面積が、前記第二領域の面積よりも小さくてもよい。第一領域の面積が相対的に小さいと、画像表示への影響をより小さくしながら、導体部を設けることができる。The area of the first region may be smaller than the area of the second region. When the area of the first region is relatively small, the conductor portion can be provided while minimizing the effect on the image display.

前記導体部の開口を含むパターンが、メッシュ状のパターンであってもよい。メッシュ状のパターンを有する部分の導体部は、例えばアンテナの放射素子として良好に機能することができる。The pattern including the openings of the conductor may be a mesh pattern. The conductor portion having the mesh pattern can function well as, for example, a radiating element of an antenna.

前記透明樹脂層及び前記絶縁樹脂部が硬化性樹脂組成物の硬化物であってもよい。硬化性樹脂組成物の硬化物を透明樹脂層及び絶縁樹脂部として有する導電性フィルムは、良好な光透過性を有し易く、また、その製造も容易である。The transparent resin layer and the insulating resin portion may be a cured product of a curable resin composition. A conductive film having a transparent resin layer and an insulating resin portion made of a curable resin composition tends to have good light transmittance and is easy to manufacture.

前記透明樹脂層と前記絶縁樹脂部とが同じ樹脂によって形成されていてもよい。同じ樹脂によって形成された透明樹脂層及び絶縁樹脂部は屈折率が等しいことから、当該導電性フィルムを透過する光路長がより一層安定することができる。同様の観点から、前記導体部、前記絶縁樹脂部、及び前記光透過性樹脂層が実質的に同じ厚みを有していてもよい。The transparent resin layer and the insulating resin portion may be formed from the same resin. Since the transparent resin layer and the insulating resin portion formed from the same resin have the same refractive index, the optical path length passing through the conductive film can be further stabilized. From the same viewpoint, the conductor portion, the insulating resin portion, and the light-transmitting resin layer may have substantially the same thickness.

前記光透過性基材の屈折率と、前記光透過性樹脂層の屈折率との差が0.1以下であってもよい。これにより、表示画像の良好な視認性がより一層確保され易い。The difference between the refractive index of the light-transmitting substrate and the refractive index of the light-transmitting resin layer may be 0.1 or less. This makes it easier to ensure good visibility of the displayed image.

本発明の別の一側面は、上記導電性フィルムを具備する表示装置を提供する。Another aspect of the present invention provides a display device comprising the above-mentioned conductive film.

本発明の一側面に係る導電性フィルムは、表示装置に組み込まれたときに、表示画像のモアレの発生を抑制するとともに、光路長の高い均一性を確保することができる。 When incorporated into a display device, the conductive film of one aspect of the present invention can suppress the occurrence of moire in the displayed image while ensuring high uniformity in the optical path length.

導電性フィルムの一実施形態を示す平面図である。FIG. 1 is a plan view illustrating an embodiment of a conductive film. 図1のII-II線に沿う断面図である。2 is a cross-sectional view taken along line II-II in FIG. 導電性層の一例を示す平面図である。FIG. 2 is a plan view illustrating an example of a conductive layer. 導電性層の一例の一部を示す拡大断面図である。FIG. 2 is an enlarged cross-sectional view showing a portion of an example of a conductive layer. 表示装置の一実施形態を示す断面図である。FIG. 1 is a cross-sectional view showing an embodiment of a display device.

以下、本発明のいくつかの実施形態について詳細に説明する。ただし、本発明は以下の実施形態に限定されるものではない。Several embodiments of the present invention are described in detail below. However, the present invention is not limited to the following embodiments.

図1は導電性フィルムの一実施形態を示す平面図であり、図2は図1のII-II線に沿う断面図である。図1及び図2に示される導電性フィルム20は、フィルム状の光透過性基材1と、光透過性基材1の一方の主面1Sのうちの一部を占める第一領域SA上に設けられた導電性層5と、光透過性基材1の一方の主面1Sのうち第一領域SA以外の領域を含む第二領域SBの全体を覆うように設けられた光透過性樹脂層7Bとを備える。導電性層5は、光透過性基材1の主面1Sの面内方向に延在し複数の開口3aを含むパターンを有する部分を含む導体部3と、導体部3の開口3a内を埋める絶縁樹脂部7Aとを有する。1 is a plan view showing one embodiment of a conductive film, and FIG. 2 is a cross-sectional view taken along line II-II in FIG. 1. The conductive film 20 shown in FIGS. 1 and 2 comprises a film-like light-transmitting substrate 1, a conductive layer 5 provided on a first region SA occupying a part of one main surface 1S of the light-transmitting substrate 1, and a light-transmitting resin layer 7B provided so as to cover the entire second region SB including the region other than the first region SA of one main surface 1S of the light-transmitting substrate 1. The conductive layer 5 has a conductor portion 3 including a portion having a pattern including a plurality of openings 3a extending in the in-plane direction of the main surface 1S of the light-transmitting substrate 1, and an insulating resin portion 7A filling the openings 3a of the conductor portion 3.

第一領域SAは、光透過性基材1の主面1Sのうち、図2においてAで示される範囲に相当する部分であり、ここに導電性層5が設けられている。第二領域SBは、光透過性基材1の主面1Sのうち、図2においてBで示される範囲に相当する部分であり、ここに光透過性樹脂層7Bが設けられている。導体部3のうち、主面1Sに垂直な方向から見たときに最も外側に位置する側面に沿う閉じた1本の線を、第一領域SAの外縁とみなすことができる。図2に示されるように、第一領域SAの外縁上に位置する導体部3の側面に、光透過性樹脂層7Bが隣接していてもよい。The first region SA is a portion of the main surface 1S of the light-transmitting substrate 1 corresponding to the range indicated by A in FIG. 2, and a conductive layer 5 is provided therein. The second region SB is a portion of the main surface 1S of the light-transmitting substrate 1 corresponding to the range indicated by B in FIG. 2, and a light-transmitting resin layer 7B is provided therein. A closed line along the side surface of the conductor portion 3 that is located on the outermost side when viewed from a direction perpendicular to the main surface 1S can be regarded as the outer edge of the first region SA. As shown in FIG. 2, the light-transmitting resin layer 7B may be adjacent to the side surface of the conductor portion 3 located on the outer edge of the first region SA.

図1及び図2に例示される導電性フィルム20の場合、光透過性基材1の主面1Sのうち第一領域SAを除く部分の全体が第二領域SBであり、第二領域SBの全体を覆うように光透過性樹脂層7Bが設けられている。ただし、光透過性基材1の主面1Sは、第一領域SA及び第二領域SB以外の部分、すなわち導電性層5及び光透過性樹脂層7Bが設けられていない領域も含み得る。例えば、第二領域SBの周囲に導電性層5及び光透過性樹脂層7Bが設けられていない領域があってもよい。第二領域SBは、導電性フィルム20が表示装置に組み込まれたときに、表示装置の画像表示領域に相当する領域を含んでいてもよい。光透過性基材1の主面1Sのうち、第一領域SA及び第二領域SBの合計の割合が、例えば80~100面積%、90~100面積%、95~100面積%、又は100面積%であってもよい。In the case of the conductive film 20 illustrated in FIG. 1 and FIG. 2, the entire portion of the main surface 1S of the light-transmitting substrate 1 excluding the first region SA is the second region SB, and the light-transmitting resin layer 7B is provided so as to cover the entire second region SB. However, the main surface 1S of the light-transmitting substrate 1 may also include a portion other than the first region SA and the second region SB, that is, a region in which the conductive layer 5 and the light-transmitting resin layer 7B are not provided. For example, there may be a region around the second region SB in which the conductive layer 5 and the light-transmitting resin layer 7B are not provided. The second region SB may include a region that corresponds to the image display region of the display device when the conductive film 20 is incorporated into the display device. The total ratio of the first region SA and the second region SB to the main surface 1S of the light-transmitting substrate 1 may be, for example, 80 to 100 area%, 90 to 100 area%, 95 to 100 area%, or 100 area%.

第一領域SAの面積が、第二領域SBの面積よりも小さくてもよい。第一領域SAの面積が相対的に小さいと、画像表示への影響をより小さくしながら、導電性層5を設けることができる。同様の観点から、光透過性基材1の主面1Sの面積に対する、第一領域SAの面積、すなわち導電性層5の面積の割合が、30面積%以下、20面積%以下、10面積%以下、又は5面積%以下であってもよく、1面積%以上であってもよい。光透過性基材1の主面1Sにおける第一領域SAの位置は特に制限されないが、図1及び図2に例示されるように主面1Sの外縁近傍に第一領域SAが配置され、第二領域SBが主面1Sの中央部を含んでいてもよい。The area of the first region SA may be smaller than the area of the second region SB. When the area of the first region SA is relatively small, the conductive layer 5 can be provided while reducing the influence on image display. From the same viewpoint, the ratio of the area of the first region SA, i.e., the area of the conductive layer 5, to the area of the main surface 1S of the light-transmitting substrate 1 may be 30 area% or less, 20 area% or less, 10 area% or less, or 5 area% or less, or may be 1 area% or more. The position of the first region SA on the main surface 1S of the light-transmitting substrate 1 is not particularly limited, but as exemplified in Figures 1 and 2, the first region SA may be disposed near the outer edge of the main surface 1S, and the second region SB may include the center of the main surface 1S.

光透過性基材1は、導電性フィルム20が表示装置に組み込まれたときに必要とされる程度の光透過性を有する。具体的には、光透過性基材1の全光線透過率が90~100%であってもよい。光透過性基材1のヘイズが0~5%であってもよい。The light-transmitting substrate 1 has a degree of light transparency required when the conductive film 20 is incorporated into a display device. Specifically, the total light transmittance of the light-transmitting substrate 1 may be 90 to 100%. The haze of the light-transmitting substrate 1 may be 0 to 5%.

光透過性基材1は、例えば透明樹脂フィルムであってもよく、その例としては、ポリエチレンテレフタレート(PET)、ポリカーボネート(PC)、ポリエチレンナフタレート(PEN)、シクロオレフィンポリマー(COP)、又はポリイミド(PI)のフィルムが挙げられる。あるいは、光透過性基材1がガラス基板であってもよい。The light-transmitting substrate 1 may be, for example, a transparent resin film, examples of which include a film of polyethylene terephthalate (PET), polycarbonate (PC), polyethylene naphthalate (PEN), cycloolefin polymer (COP), or polyimide (PI). Alternatively, the light-transmitting substrate 1 may be a glass substrate.

光透過性基材1は、光透過性の支持フィルムと、支持フィルム上に設けられた下地層とを有する積層体であってもよい。支持フィルムは上記透明樹脂フィルムであることができる。下地層は無電解めっき等によって導体部3を形成するために設けられる層である。他の方法によって導体部3を形成する場合、下地層は必ずしも設けられなくてもよい。The light-transmitting substrate 1 may be a laminate having a light-transmitting support film and an underlayer provided on the support film. The support film may be the transparent resin film described above. The underlayer is a layer provided for forming the conductor portion 3 by electroless plating or the like. When the conductor portion 3 is formed by another method, the underlayer does not necessarily have to be provided.

光透過性基材1又はこれを構成する支持フィルムの厚みは、10μm以上、20μm以上、又は35μm以上であってよく、500μm以下、200μm以下、又は100μm以下であってよい。The thickness of the light-transmitting substrate 1 or the supporting film constituting it may be 10 μm or more, 20 μm or more, or 35 μm or more, and may be 500 μm or less, 200 μm or less, or 100 μm or less.

下地層は、触媒及び樹脂を含有する層であってもよい。樹脂は、硬化性樹脂組成物の硬化物であってもよい。硬化性樹脂組成物に含まれる硬化性樹脂の例としては、アミノ樹脂、シアネート樹脂、イソシアネート樹脂、ポリイミド樹脂、エポキシ樹脂、オキセタン樹脂、ポリエステル、アリル樹脂、フェノール樹脂、ベンゾオキサジン樹脂、キシレン樹脂、ケトン樹脂、フラン樹脂、COPNA樹脂、ケイ素樹脂、ジクロペンタジエン樹脂、ベンゾシクロブテン樹脂、エピスルフィド樹脂、エン-チオール樹脂、ポリアゾメチン樹脂、ポリビニルベンジルエーテル化合物、アセナフチレン、及び不飽和二重結合、並びに、環状エーテル、ビニルエーテル等の紫外線で重合反応を起こす官能基を含む紫外線硬化樹脂が挙げられる。触媒及び樹脂を含有する下地層と、光透過性基材1との間に、光透過性基材1と下地層との密着性を向上させる樹脂層が設けられていてもよい。The underlayer may be a layer containing a catalyst and a resin. The resin may be a cured product of a curable resin composition. Examples of the curable resin contained in the curable resin composition include amino resins, cyanate resins, isocyanate resins, polyimide resins, epoxy resins, oxetane resins, polyesters, allyl resins, phenolic resins, benzoxazine resins, xylene resins, ketone resins, furan resins, COPNA resins, silicon resins, dicyclopentadiene resins, benzocyclobutene resins, episulfide resins, ene-thiol resins, polyazomethine resins, polyvinylbenzyl ether compounds, acenaphthylene, and ultraviolet-curable resins containing unsaturated double bonds, as well as functional groups that undergo a polymerization reaction under ultraviolet light, such as cyclic ethers and vinyl ethers. A resin layer that improves the adhesion between the light-transmitting substrate 1 and the underlayer and the underlayer containing the catalyst and resin may be provided between the light-transmitting substrate 1 and the underlayer.

下地層に含まれる触媒は、無電解めっき触媒であってもよい。無電解めっき触媒は、Pd、Cu、Ni、Co、Au、Ag、Pd、Rh、Pt、In、及びSnから選ばれる金属であってよく、Pdであってもよい。触媒は、1種類単独若しくは2種類以上の組合せであってもよい。通常、触媒は触媒粒子として樹脂中に分散している。The catalyst contained in the underlayer may be an electroless plating catalyst. The electroless plating catalyst may be a metal selected from Pd, Cu, Ni, Co, Au, Ag, Pd, Rh, Pt, In, and Sn, or may be Pd. The catalyst may be one type alone or a combination of two or more types. Typically, the catalyst is dispersed in the resin as catalyst particles.

下地層における触媒の含有量は、下地層全量を基準として、3質量%以上、4質量%以上、又は5質量%以上であってもよく、50質量%以下、40質量%以下、又は25質量%以下であってもよい。The catalyst content in the undercoat layer may be 3% by mass or more, 4% by mass or more, or 5% by mass or more, and may be 50% by mass or less, 40% by mass or less, or 25% by mass or less, based on the total amount of the undercoat layer.

下地層の厚みは、10nm以上、20nm以上、又は30nm以上であってもよく、500nm以下、300nm以下、又は150nm以下であってもよい。The thickness of the underlayer may be 10 nm or more, 20 nm or more, or 30 nm or more, and may be 500 nm or less, 300 nm or less, or 150 nm or less.

導電性層5を構成する導体部3は、開口3aを含むパターンを有する部分を含む。開口3aを含むパターンは、互いに交差する複数の線状部によって形成された、規則的に配置された複数の開口3aを含むメッシュ状のパターンであってもよい。メッシュ状のパターンを有する導体部3は、例えばアンテナの放射素子として良好に機能することができる。導体部3は、開口3aを含むパターンを有する部分の他に、グランド端子、給電端子等の導電部材に相当する部分を有していてもよい。The conductor portion 3 constituting the conductive layer 5 includes a portion having a pattern including openings 3a. The pattern including openings 3a may be a mesh-like pattern including a plurality of regularly arranged openings 3a formed by a plurality of linear portions intersecting each other. The conductor portion 3 having a mesh-like pattern can function well, for example, as a radiating element of an antenna. In addition to the portion having a pattern including openings 3a, the conductor portion 3 may have a portion corresponding to a conductive member such as a ground terminal or a power supply terminal.

導体部3は、金属を含んでいてもよい。導体部3は、銅、ニッケル、コバルト、パラジウム、銀、金、白金及びスズから選ばれる少なくとも1種の金属を含んでいてもよく、銅を含んでいてもよい。導体部3は、めっき法によって形成された金属めっきであってもよい。導体部3は、適切な導電性が維持される範囲で、リン等の非金属元素を更に含んでいてもよい。The conductor portion 3 may contain a metal. The conductor portion 3 may contain at least one metal selected from copper, nickel, cobalt, palladium, silver, gold, platinum, and tin, or may contain copper. The conductor portion 3 may be a metal plating formed by a plating method. The conductor portion 3 may further contain a non-metallic element such as phosphorus to the extent that appropriate conductivity is maintained.

絶縁樹脂部7Aは、導体部3の開口3aを埋めるように設けられており、絶縁樹脂部7Aと導体部3とで平坦な表面が形成されていてもよい。The insulating resin part 7A is arranged to fill the opening 3a of the conductor part 3, and the insulating resin part 7A and the conductor part 3 may form a flat surface.

光透過性樹脂層7Bは、光透過性を有する樹脂によって形成されている。光透過性樹脂層7Bの全光線透過率が90~100%であってもよい。光透過性樹脂層7Bのヘイズが0~5%であってもよい。The light-transmitting resin layer 7B is formed of a resin having light transmittance. The light-transmitting resin layer 7B may have a total light transmittance of 90 to 100%. The light-transmitting resin layer 7B may have a haze of 0 to 5%.

光透過性基材1(又は光透過性基材1を構成する支持フィルムの屈折率)と、光透過性樹脂層7Bの屈折率との差が0.1以下であってもよい。これにより、表示画像の良好な視認性がより一層確保され易い。光透過性樹脂層7Bの屈折率(nd25)は、例えば、1.0以上であってもよく、1.7以下、1.6以下、又は1.5以下であってよい。屈折率は、反射分光膜厚計により測定することができる。The difference between the refractive index of the light-transmitting substrate 1 (or the refractive index of the support film constituting the light-transmitting substrate 1) and the refractive index of the light-transmitting resin layer 7B may be 0.1 or less. This makes it easier to ensure good visibility of the displayed image. The refractive index (nd25) of the light-transmitting resin layer 7B may be, for example, 1.0 or more, 1.7 or less, 1.6 or less, or 1.5 or less. The refractive index can be measured by a reflection spectroscopic film thickness meter.

絶縁樹脂部7A及び光透過性樹脂層7Bを形成する樹脂は、硬化性樹脂組成物(光硬化性樹脂組成物又は熱硬化性樹脂組成物)の硬化物であってもよい。絶縁樹脂部7A及び/又は光透過性樹脂層7Bを形成する硬化性樹脂組成物は、硬化性樹脂を含み、その例としては、アクリル樹脂、アミノ樹脂、シアネート樹脂、イソシアネート樹脂、ポリイミド樹脂、エポキシ樹脂、オキセタン樹脂、ポリエステル、アリル樹脂、フェノール樹脂、ベンゾオキサジン樹脂、キシレン樹脂、ケトン樹脂、フラン樹脂、COPNA樹脂、ケイ素樹脂、ジクロペンタジエン樹脂、ベンゾシクロブテン樹脂、エピスルフィド樹脂、エン-チオール樹脂、ポリアゾメチン樹脂、ポリビニルベンジルエーテル化合物、アセナフチレン、並びに、不飽和二重結合、環状エーテル及びビニルエーテル等の紫外線で重合反応を起こす官能基を含む紫外線硬化樹脂が挙げられる。The resin forming the insulating resin portion 7A and the light-transmitting resin layer 7B may be a cured product of a curable resin composition (a photocurable resin composition or a thermosetting resin composition). The curable resin composition forming the insulating resin portion 7A and/or the light-transmitting resin layer 7B includes a curable resin, examples of which include acrylic resin, amino resin, cyanate resin, isocyanate resin, polyimide resin, epoxy resin, oxetane resin, polyester, allyl resin, phenol resin, benzoxazine resin, xylene resin, ketone resin, furan resin, COPNA resin, silicon resin, dicyclopentadiene resin, benzocyclobutene resin, episulfide resin, ene-thiol resin, polyazomethine resin, polyvinylbenzyl ether compound, acenaphthylene, and ultraviolet-curable resins containing functional groups that undergo a polymerization reaction with ultraviolet light, such as unsaturated double bonds, cyclic ethers, and vinyl ethers.

絶縁樹脂部7Aを形成する樹脂と光透過性樹脂層7Bを形成する樹脂とが同じであってもよい。同じ樹脂によって形成された絶縁樹脂部7A及び光透過性樹脂層7Bは屈折率が等しいことから、導電性フィルム20を透過する光路長の均一性がより一層向上することができる。絶縁樹脂部7Aを形成する樹脂と光透過性樹脂層7Bを形成する樹脂とが同じである場合、例えば1層の硬化性樹脂層からインプリント法等によってパターン形成することによって、絶縁樹脂部7A及び光透過性樹脂層7Bを容易に一括して形成することができる。The resin forming the insulating resin part 7A and the resin forming the light-transmitting resin layer 7B may be the same. Since the insulating resin part 7A and the light-transmitting resin layer 7B formed from the same resin have the same refractive index, the uniformity of the optical path length passing through the conductive film 20 can be further improved. When the resin forming the insulating resin part 7A and the resin forming the light-transmitting resin layer 7B are the same, the insulating resin part 7A and the light-transmitting resin layer 7B can be easily formed together, for example, by forming a pattern from a single curable resin layer by an imprinting method or the like.

光路長の均一性の観点から、導体部3、絶縁樹脂部7A、及び光透過性樹脂層7Bが実質的に同じ厚みを有していてもよい。例えば、導体部3、絶縁樹脂部7A及び光透過性樹脂層7Bの厚みの平均値がTであるとき、導体部3、絶縁樹脂部7A及び光透過性樹脂層7Bの厚みが、Tに対して±3μm以内、±2μm以内、±1μm以内、±0.5μm以内、又は±0.3μm以内であってもよい。導体部3、絶縁樹脂部7A、及び光透過性樹脂層7Bの厚みが、0.8μm以上、1.0μm以上、又は1.2μm以上であってもよく、5μm以下、4μm以下、又は3μm以下であってもよい。From the viewpoint of uniformity of the optical path length, the conductor part 3, the insulating resin part 7A, and the light-transmitting resin layer 7B may have substantially the same thickness. For example, when the average value of the thicknesses of the conductor part 3, the insulating resin part 7A, and the light-transmitting resin layer 7B is T, the thicknesses of the conductor part 3, the insulating resin part 7A, and the light-transmitting resin layer 7B may be within ±3 μm, ±2 μm, ±1 μm, ±0.5 μm, or ±0.3 μm of T. The thicknesses of the conductor part 3, the insulating resin part 7A, and the light-transmitting resin layer 7B may be 0.8 μm or more, 1.0 μm or more, or 1.2 μm or more, and may be 5 μm or less, 4 μm or less, or 3 μm or less.

図3は、導体性層の一例を示す平面図である。図3に示される導電性層5は、導体部3、絶縁樹脂部7A、及び給電端子8を有する。導体部3は、複数の線状部を含むメッシュ状のパターンを有し、放射素子を含む配線部31と、グランド電極33と、端子部6とを有する。端子部6は、2つのグランド端子32と、配線部31の外側に向けて延出した導体部3である端子パターン部80とを含む。グランド電極33は、配線部31の放射素子を囲みながら、2つのグランド端子32の間にわたって設けられている。グランド電極33を構成する線状部の幅及び形状は、配線部31を構成する線状部の幅及び形状と同様であることができる。給電端子8は、端子パターン部80の一部を覆うように平面状に延在する。給電端子8はベタの形態を有する導体層である。平面視において、給電端子8の外縁は、端子パターン部80(導体部3)の外縁より内側に位置していてもよい。この場合、給電端子8の外縁が導体部3の外縁からはみ出ることが抑制され、それにより、配線部31が端子部6に隣り合う他の端子部とショートすることを抑制できる。また、給電端子8が電極側にはみ出すことで導電性フィルムの視認性が向上してしまうことを抑制できる。給電端子8によって覆われた端子パターン部80(導体部3)が、給電端子8によって覆われていない導体部3と同様のメッシュ状のパターンを有していてもよい。3 is a plan view showing an example of a conductive layer. The conductive layer 5 shown in FIG. 3 has a conductor portion 3, an insulating resin portion 7A, and a power supply terminal 8. The conductor portion 3 has a mesh-like pattern including a plurality of linear portions, and has a wiring portion 31 including a radiating element, a ground electrode 33, and a terminal portion 6. The terminal portion 6 includes two ground terminals 32 and a terminal pattern portion 80 which is a conductor portion 3 extending toward the outside of the wiring portion 31. The ground electrode 33 is provided between the two ground terminals 32 while surrounding the radiating element of the wiring portion 31. The width and shape of the linear portion constituting the ground electrode 33 can be the same as the width and shape of the linear portion constituting the wiring portion 31. The power supply terminal 8 extends in a plane so as to cover a part of the terminal pattern portion 80. The power supply terminal 8 is a conductor layer having a solid form. In a plan view, the outer edge of the power supply terminal 8 may be located inside the outer edge of the terminal pattern portion 80 (conductor portion 3). In this case, the outer edge of the power supply terminal 8 is prevented from protruding beyond the outer edge of the conductor portion 3, thereby preventing the wiring portion 31 from shorting out with another terminal portion adjacent to the terminal portion 6. In addition, it is possible to prevent the power supply terminal 8 from protruding toward the electrode side, thereby preventing the visibility of the conductive film from improving. The terminal pattern portion 80 (conductor portion 3) covered by the power supply terminal 8 may have a mesh-like pattern similar to that of the conductor portion 3 that is not covered by the power supply terminal 8.

図4は図3の導電性層5のうち給電端子8が設けられた部分を示す拡大断面図である。図3及び図4に示される給電端子8は、端子パターン部80(導体部3)の表面、及び端子パターン部80の開口を埋める絶縁樹脂部7Aの表面を覆うように形成されている。図3及び図4に示す例では、給電端子8は、その外縁で囲まれる領域において隙間無く一体的に形成されている。給電端子8は、複数の領域に分割されてもよく、分割された領域間では、端子パターン部80(導体部3)及び絶縁樹脂部7Aがスリット状に露出してもよい。 Figure 4 is an enlarged cross-sectional view showing a portion of the conductive layer 5 in Figure 3 where the power supply terminal 8 is provided. The power supply terminal 8 shown in Figures 3 and 4 is formed so as to cover the surface of the terminal pattern portion 80 (conductor portion 3) and the surface of the insulating resin portion 7A filling the opening of the terminal pattern portion 80. In the example shown in Figures 3 and 4, the power supply terminal 8 is formed integrally without gaps in the area surrounded by its outer edge. The power supply terminal 8 may be divided into multiple areas, and the terminal pattern portion 80 (conductor portion 3) and the insulating resin portion 7A may be exposed in a slit shape between the divided areas.

図4の断面図に示されるように、給電端子8によって覆われる部分の端子パターン部80(導体部3)の光透過性基材1の主面1Sからの高さが、絶縁樹脂部7Aの主面1Sからの高さよりも大きくてもよい。給電端子8の導体部3とは反対側の表面8Sが、粗面化されていてもよい。言い換えると、表面8Sの表面粗さが、導体部3の表面粗さよりも大きくてもよい。表面8Sが粗面化されていると、外部の接続端子との接続強度が向上され得る。ここでの表面粗さは、例えば、算術平均粗さ Raであってもよい。給電端子8の厚みが、導体部3の厚みよりも大きくてもよい。As shown in the cross-sectional view of FIG. 4, the height of the terminal pattern portion 80 (conductor portion 3) covered by the power supply terminal 8 from the main surface 1S of the light-transmitting substrate 1 may be greater than the height from the main surface 1S of the insulating resin portion 7A. The surface 8S of the power supply terminal 8 opposite the conductor portion 3 may be roughened. In other words, the surface roughness of the surface 8S may be greater than the surface roughness of the conductor portion 3. If the surface 8S is roughened, the connection strength with an external connection terminal may be improved. The surface roughness here may be, for example, the arithmetic mean roughness Ra. The thickness of the power supply terminal 8 may be greater than the thickness of the conductor portion 3.

グランド端子が、基材の主面上に延在する導体部とは別に設けられていてもよい。例えば、グランド端子が、開口を含むパターンを有する端子部としての端子パターン部を覆うように平面状に延在し、ベタの形態を有する導体層であってもよい。この場合、平面視において、グランド端子の外縁が、その下部に位置する端子パターン部(端子部、導体部)の外縁より内側に位置していてもよい。これにより、グランド端子が導体部の外縁からはみ出ることが抑制され、それにより、グランド端子が隣り合う他の端子部とショートすることを抑制できる。また、グランド端子が電極側にはみ出すことで導体部の視認性が向上してしまうことを抑制できる。ベタの形態を有するグランド端子によって覆われた端子パターン部が、グランド端子によって覆われていない部分の導体部と同様のメッシュ状のパターンを有していてもよい。導電性フィルムは、以上説明したような、端子部(端子パターン部)を覆うベタの形態を有する給電端子、端子部(端子パターン部)を覆うベタの形態を有するグランド端子、又はこれらの両方を有していてもよい。The ground terminal may be provided separately from the conductor portion extending on the main surface of the substrate. For example, the ground terminal may be a conductor layer extending in a plane so as to cover the terminal pattern portion as a terminal portion having a pattern including an opening, and having a solid form. In this case, in a planar view, the outer edge of the ground terminal may be located inside the outer edge of the terminal pattern portion (terminal portion, conductor portion) located below it. This prevents the ground terminal from protruding from the outer edge of the conductor portion, thereby preventing the ground terminal from shorting with other adjacent terminal portions. In addition, it is possible to prevent the ground terminal from protruding to the electrode side, thereby improving the visibility of the conductor portion. The terminal pattern portion covered by the ground terminal having a solid form may have a mesh-like pattern similar to the conductor portion of the portion not covered by the ground terminal. The conductive film may have a power supply terminal having a solid form covering the terminal portion (terminal pattern portion), a ground terminal having a solid form covering the terminal portion (terminal pattern portion), or both of these, as described above.

導電性フィルム20は、例えばインプリント法によるパターン形成を含む方法によって製造することができる。導電性フィルム20を製造する方法の一例は、支持フィルムと支持フィルムの一方の主面上に設けられた、触媒を含有する下地層とを有する光透過性基材1を準備することと、光透過性基材1の下地層側の主面1S上に、硬化性樹脂層を形成させることと、凸部を有するモールドを用いたインプリント法により、下地層が露出するトレンチを形成させることと、トレンチを充填する導体部3を、下地層から金属めっきを成長させる無電解めっき法により形成することとを含む。硬化性樹脂層にモールドが押し込まれた状態で硬化性樹脂層を硬化させることにより、モールドの凸部の反転形状を有する開口を含むパターンを有する絶縁樹脂部7Aと光透過性樹脂層7Bとが一括して形成される。開口を含むパターンを有する絶縁樹脂部7Aを形成する方法は、インプリント法に限られず、フォトリソグラフィー等の任意の方法を適用できる。The conductive film 20 can be manufactured by a method including pattern formation by imprinting, for example. One example of a method for manufacturing the conductive film 20 includes preparing a light-transmitting substrate 1 having a support film and a catalyst-containing underlayer provided on one of the main surfaces of the support film, forming a curable resin layer on the main surface 1S of the light-transmitting substrate 1 on the underlayer side, forming a trench in which the underlayer is exposed by an imprinting method using a mold having a convex portion, and forming a conductor portion 3 filling the trench by an electroless plating method in which metal plating is grown from the underlayer. By curing the curable resin layer with the mold pressed into the curable resin layer, an insulating resin portion 7A having a pattern including an opening having an inverted shape of the convex portion of the mold and a light-transmitting resin layer 7B are formed at the same time. The method for forming the insulating resin portion 7A having a pattern including an opening is not limited to the imprinting method, and any method such as photolithography can be applied.

以上例示的に説明された導電性フィルムを、例えば平面状の透明アンテナとして表示装置に組み込むことができる。表示装置は、例えば、液晶表示装置、又は有機EL表示装置であってもよい。図5は、導電性フィルムが組み込まれた表示装置の一実施形態を示す断面図である。図5に示される表示装置100は、画像表示領域10Sを有する画像表示部10と、導電性フィルム20と、偏光板30と、カバーガラス40とを備える。導電性フィルム20、偏光板30、及びカバーガラス40は、画像表示部10の画像表示領域10S側において、画像表示部10側からこの順に積層されている。表示装置の構成は図5の形態に限られず、必要により適宜変更が可能である。例えば、偏光板30が画像表示部10と導電性フィルム20との間に設けられてもよい。画像表示部10は、例えば液晶表示部であってもよい。偏光板30及びカバーガラス40として、表示装置において通常用いられているものを用いることができる。偏光板30及びカバーガラス40は、必ずしも設けられなくてもよい。画像表示部10の画像表示領域10Sから出射される画像表示のための光が、導電性フィルム20を含む均一性の高い光路長の経路を通過する。これにより、モワレが抑制された均一性の高い良好な画像表示が可能である。The conductive film described above can be incorporated into a display device as, for example, a planar transparent antenna. The display device may be, for example, a liquid crystal display device or an organic EL display device. FIG. 5 is a cross-sectional view showing an embodiment of a display device incorporating a conductive film. The display device 100 shown in FIG. 5 includes an image display unit 10 having an image display area 10S, a conductive film 20, a polarizing plate 30, and a cover glass 40. The conductive film 20, the polarizing plate 30, and the cover glass 40 are laminated in this order from the image display unit 10 side on the image display area 10S side of the image display unit 10. The configuration of the display device is not limited to the form shown in FIG. 5, and can be appropriately changed as necessary. For example, the polarizing plate 30 may be provided between the image display unit 10 and the conductive film 20. The image display unit 10 may be, for example, a liquid crystal display unit. As the polarizing plate 30 and the cover glass 40, those that are normally used in display devices can be used. The polarizing plate 30 and the cover glass 40 do not necessarily have to be provided. Light for image display emitted from the image display region 10S of the image display unit 10 passes through a path with a highly uniform optical path length that includes the conductive film 20. This makes it possible to display a good image with a high degree of uniformity and with suppressed moire.

1…光透過性基材、1S…基材の主面、3…導体部、3a…開口、5…導電性層、7A…絶縁樹脂部、7B…光透過性樹脂層、20…導電性フィルム、30…偏光板、40…カバーガラス、100…表示装置、SA…第一領域、SB…第二領域。 1...light-transmitting substrate, 1S...main surface of substrate, 3...conductor portion, 3a...opening, 5...conductive layer, 7A...insulating resin portion, 7B...light-transmitting resin layer, 20...conductive film, 30...polarizing plate, 40...cover glass, 100...display device, SA...first region, SB...second region.

Claims (7)

フィルム状の光透過性基材と、
前記光透過性基材の一方の主面のうちの一部を占める第一領域上に設けられた導電性層と、
前記光透過性基材の一方の主面のうち前記第一領域以外の領域を含む第二領域の全体を覆うように設けられた光透過性樹脂層と、
を備え、
前記導電性層が、前記光透過性基材の主面の面内方向に延在し開口を含むパターンを有する部分を含む導体部と、前記導体部の開口内を埋める絶縁樹脂部と、を有
前記導体部、前記絶縁樹脂部、及び前記光透過性樹脂層が実質的に同じ厚みを有する、
導電性フィルム。
A film-like light-transmitting substrate;
a conductive layer provided on a first region occupying a part of one main surface of the light-transmitting substrate;
a light-transmitting resin layer provided so as to cover the entire second region including a region other than the first region on one main surface of the light-transmitting base material;
Equipped with
the conductive layer has a conductor portion including a portion having a pattern including an opening extending in an in-plane direction of a main surface of the light-transmitting substrate, and an insulating resin portion filling the opening of the conductor portion,
the conductor portion, the insulating resin portion, and the light-transmitting resin layer have substantially the same thickness;
Conductive film.
前記第一領域の面積が、前記第二領域の面積よりも小さい、請求項1に記載の導電性フィルム。 The conductive film according to claim 1, wherein the area of the first region is smaller than the area of the second region. 前記導体部の開口を含むパターンが、メッシュ状のパターンである、請求項1又は2に記載の導電性フィルム。 The conductive film according to claim 1 or 2, wherein the pattern including the openings of the conductor portion is a mesh-like pattern. 前記光透過性樹脂層及び前記絶縁樹脂部が硬化性樹脂組成物の硬化物である、請求項1~3のいずれか一項に記載の導電性フィルム。 The conductive film according to any one of claims 1 to 3, wherein the light-transmitting resin layer and the insulating resin portion are cured products of a curable resin composition. 前記光透過性樹脂層と前記絶縁樹脂部とが同じ樹脂によって形成されている、請求項1~4のいずれか一項に記載の導電性フィルム。 The conductive film according to any one of claims 1 to 4, wherein the light-transmitting resin layer and the insulating resin portion are formed from the same resin. 前記光透過性基材の屈折率と、前記光透過性樹脂層の屈折率との差が0.1以下である、請求項1~のいずれか一項に記載の導電性フィルム。 The conductive film according to any one of claims 1 to 5 , wherein a difference between a refractive index of the light-transmitting substrate and a refractive index of the light-transmitting resin layer is 0.1 or less. 請求項1~のいずれか一項に記載の導電性フィルムを具備する表示装置。 A display device comprising the conductive film according to any one of claims 1 to 6 .
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JP2013005013A (en) 2011-06-13 2013-01-07 Dainippon Printing Co Ltd Transparent antenna, and image display device
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JP2017175542A (en) 2016-03-25 2017-09-28 大日本印刷株式会社 antenna
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