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JP7696565B2 - Method for evaluating the effect of ground improvement using chemical grouting method - Google Patents
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JP7696565B2 - Method for evaluating the effect of ground improvement using chemical grouting method - Google Patents

Method for evaluating the effect of ground improvement using chemical grouting method Download PDF

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JP7696565B2
JP7696565B2 JP2021132839A JP2021132839A JP7696565B2 JP 7696565 B2 JP7696565 B2 JP 7696565B2 JP 2021132839 A JP2021132839 A JP 2021132839A JP 2021132839 A JP2021132839 A JP 2021132839A JP 7696565 B2 JP7696565 B2 JP 7696565B2
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賢二 下坂
芳信 村田
敬三 苅谷
厚 八嶋
有紀 花田
圭吾 山本
康年 大野
孝芳 伊藤
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特許法第30条第2項適用 第30回調査・設計・施工技術報告会論文集 2021年6月、公益社団法人地盤工学会中部支部、「薬液注入改良体の電気比抵抗を用いた出来高確認 -沿岸部埋立地における現地実証実験-」、令和3年6月10日(頒布日)Article 30, Paragraph 2 of the Patent Act, Proceedings of the 30th Survey, Design and Construction Technology Report Session, June 2021, Chubu Branch of the Japan Geotechnical Society, "Confirmation of progress using electrical resistivity of chemical injection improvement body - Field demonstration experiment on coastal reclaimed land -", June 10, 2021 (distribution date)

本発明は、液状化対策を主目的とした薬液注入工法による地盤改良効果の評価方法に関する。 The present invention relates to a method for evaluating the effectiveness of ground improvement using a chemical injection method, the main purpose of which is to prevent liquefaction.

従来より、埋立て地等の軟弱地盤の地盤強化のために、水ガラス(珪酸ナトリウム)などからなる薬液を地盤に注入する薬液注入工法によって地盤改良工事が行われている。前記薬液注入工法による地盤改良工事では、施行後に、薬液が対象地盤に満遍なく行き渡っているかを確認する施工確認調査が行われる。 Traditionally, to strengthen soft ground such as reclaimed land, ground improvement work has been carried out using a chemical injection method in which a chemical solution made of water glass (sodium silicate) or the like is injected into the ground. After construction using the chemical injection method, a construction inspection is carried out to check whether the chemical solution has been evenly distributed throughout the target ground.

薬液注入工法の施工確認調査として最も一般的な方法は、改良土を一軸圧縮強さ(qu)により評価する方法である。しかし、薬液注入による改良土の一軸圧縮強さは、qu=50~100kPa程度と小さく、対象地盤によっては強度のバラツキが生じ適正に評価されない場合があった。すなわち、前記一軸圧縮強さquによる評価において、quが50~100kPa程度の小さな地盤の場合、事後調査における試料採取時や供試体作成時に、強度低下に繋がる乱れが生じやすい。また、対象地盤によっては供試体内に貝殻、木片、シルト、有機質土等が混入することにより、強度のバラツキが生じて適正に評価できない場合があった。 The most common method for construction confirmation surveys of the chemical grouting method is to evaluate the improved soil using its unconfined compressive strength (qu). However, the unconfined compressive strength of soil improved by chemical grouting is small, at around qu = 50 to 100 kPa, and depending on the target ground, there are cases where the strength varies and the soil is not properly evaluated. In other words, when evaluating using the unconfined compressive strength qu, in cases where the ground has a small qu of around 50 to 100 kPa, disturbances that lead to a decrease in strength are likely to occur when taking samples or preparing test specimens in follow-up surveys. Also, depending on the target ground, there are cases where the test specimens contain shells, wood chips, silt, organic soil, etc., which causes strength variations and makes it impossible to properly evaluate the soil.

このような一軸圧縮強さ試験以外の方法により改良地盤の品質を直接的に評価する方法として、国土交通省の埋立地等における薬液注入工法による地盤改良工事に関する検討委員会等において、ピエゾドライブコーン(PDC)などのように間隙水圧が測定できる動的コーン貫入試験が提唱されている。前記ピエゾドライブコーンは、圧力センサを内蔵したコーンをハンマーの打撃で地盤に貫入し、1打撃毎の貫入量と貫入時の間隙水圧の応答値を計測するものである。貫入量からは、標準貫入試験のN値に相当する地盤の動的な貫入抵抗値(Nd値)が1打撃毎に算出される。また、打撃貫入で生ずる地盤内の間隙水圧から、細粒分含有率Fcが推定されるとともに、この間隙水圧を用いて得られる累積過剰間隙水圧比が薬液の地盤への浸透を評価する指標となり得ることなどが上記の検討委員会等で提案されている。 As a method to directly evaluate the quality of improved ground other than the uniaxial compressive strength test, the Ministry of Land, Infrastructure, Transport and Tourism's review committee on ground improvement work using chemical injection methods on reclaimed land, etc. has proposed a dynamic cone penetration test that can measure pore water pressure, such as a piezo-driven cone (PDC). The piezo-driven cone penetrates a cone with a built-in pressure sensor into the ground by striking it with a hammer, and measures the penetration amount and the pore water pressure response value at the time of penetration for each strike. From the penetration amount, the dynamic penetration resistance value (Nd value) of the ground, which corresponds to the N value of the standard penetration test, is calculated for each strike. In addition, the above review committee has proposed that the fine grain content Fc can be estimated from the pore water pressure in the ground generated by the strike penetration, and that the cumulative excess pore water pressure ratio obtained using this pore water pressure can be an index for evaluating the penetration of chemicals into the ground.

また、薬液注入工法の施工確認調査の他の方法として、電気検層が挙げられる。電気検層は、薬液注入工法では地盤の間隙水が薬液に置き換えられ地盤の圧縮率が変化するとともに、薬液が固化することで地盤の強度が増加することから、改良後の地盤は電気伝導度の特性が変化することを利用したものである。この電気検層では、施工前後における電気比抵抗値の低下によって、改良効果の定性的判断が可能になる。前記電気検層の測定手順は、ボーリング孔内に、上下方向に所定の間隔で複数の電極が備えられた測定プローブを挿入した後、電流電極に通電し、電極間の電位差から比抵抗を求める。 Another method for confirming the construction of the liquid injection method is electrical logging. Electrical logging takes advantage of the fact that in the liquid injection method, the pore water in the ground is replaced with a liquid chemical, changing the compressibility of the ground, and the strength of the ground increases as the liquid solidifies, resulting in a change in the electrical conductivity characteristics of the improved ground. With electrical logging, a qualitative assessment of the improvement effect can be made by checking the decrease in electrical resistivity before and after construction. The measurement procedure for electrical logging involves inserting a measurement probe equipped with multiple electrodes at a specified interval in the vertical direction into the borehole, then passing electricity through the current electrodes and determining the resistivity from the potential difference between the electrodes.

このような電気検層による地盤改良工事の品質確認方法として、下記特許文献1においては、外面に環状の電極が取り付けられた電極取付体を改良体内に挿入し、電極取付体の周囲に造成された改良体に通電し、かかる状態で計測された電流電極間の電流及び電位電極間の電位差を用いて比抵抗を求める方法が開示されている。また、非特許文献1においては、薬液注入前後の電気比抵抗の変化から、薬液充填率を求める方法が開示されている。 As a method for checking the quality of ground improvement work using such electrical logging, the following Patent Document 1 discloses a method in which an electrode attachment body with a ring-shaped electrode attached to its outer surface is inserted into the improvement body, electricity is passed through the improvement body constructed around the electrode attachment body, and resistivity is calculated using the current between the current electrodes and the potential difference between the potential electrodes measured in this state. In addition, Non-Patent Document 1 discloses a method for calculating the chemical solution filling rate from the change in electrical resistivity before and after chemical solution injection.

本出願人等においても、下記特許文献2において、バラツキが少なく、改良地盤の品質が直接的に確認できる地盤改良効果の確認方法として、薬液注入工法による地盤改良効果の確認方法であって、地盤改良後において、小型動的コーン貫入試験により深度とNd値との関係を示したNd値の深度分布図を得て、地盤改良前後における前記Nd値の増分量から地盤改良効果を確認する1次的効果確認を行い、前記1次的効果確認によって地盤改良効果が認められない場合に、前記小型動的コーン貫入試験の貫入孔に電極を備えた測定プローブを挿入して比抵抗を測定する電気検層を行い、深度と比抵抗との関係を示した比抵抗の深度分布図を得て、地盤改良前後における前記比抵抗の減分量から地盤改良効果を確認する2次的効果確認を行うようにする地盤改良効果の確認方法を提案した。 The present applicants have also proposed in Patent Document 2 below a method for confirming the effect of ground improvement using a chemical injection method, as a method for confirming the effect of ground improvement with little variation and allowing direct confirmation of the quality of the improved ground, in which after ground improvement, a small dynamic cone penetration test is used to obtain a depth distribution map of Nd values showing the relationship between depth and Nd value, and a primary effect confirmation is performed to confirm the effect of ground improvement from the increment in the Nd value before and after ground improvement. If the effect of ground improvement is not confirmed by the primary effect confirmation, an electrical logging is performed to measure resistivity by inserting a measuring probe equipped with an electrode into the penetration hole of the small dynamic cone penetration test, a depth distribution map of resistivity showing the relationship between depth and resistivity is obtained, and a secondary effect confirmation is performed to confirm the effect of ground improvement from the decrement in resistivity before and after ground improvement.

特開2000-46510号公報JP 2000-46510 A 特開2021-4473号公報JP 2021-4473 A

小峯秀雄、「電気比抵抗による薬液注入改良部の充填率の評価方法」、土木学会論文集、No.463/III-22、p.153-162、1993年3月Hideo Komine, "Evaluation method of filling rate of improved part by grouting using electrical resistivity", Journal of Japan Society of Civil Engineers, No. 463/III-22, pp. 153-162, March 1993 菅野高弘等、「液状化対策として薬液を注入した地盤の原位置調査による強度評価法」、港湾空港技術研究所資料、No.1366,pp.2020Takahiro Kanno et al., "Strength evaluation method for in-situ investigation of ground injected with chemicals as a liquefaction countermeasure", Port and Airport Research Institute Materials, No. 1366, pp. 2020

しかしながら、前記特許文献1に係る方法は、計測した比抵抗から改良体の出来高、すなわち断面積、大きさ、直径等を算出するものであり、前記非特許文献1に係る方法は、電気比抵抗から薬液充填率を算出するものであり、前記特許文献2に係る方法は、Nd値の増分量だけでは地盤改良効果が判断できない場合でも、比抵抗の減量分から地盤改良固結体の存在を確認できるようにしたものである。 However, the method of Patent Document 1 calculates the volume of the improved body, i.e., cross-sectional area, size, diameter, etc., from the measured resistivity, while the method of Non-Patent Document 1 calculates the chemical solution filling rate from the electrical resistivity, and the method of Patent Document 2 makes it possible to confirm the presence of a ground improvement body from the decrease in resistivity even when the effect of ground improvement cannot be determined from the increase in the Nd value alone.

前述したように、薬液注入工法による地盤改良効果の1次的評価方法は、一軸圧縮強さquにより評価する方法であるにも拘わらず、前述の従来技術はいずれも固結体の強度を直接的な評価対象とするものではない。また、前記特許文献2では、地盤改良前後における電気比抵抗の計測を行って改良効果を評価しているが、改良前の比抵抗の計測値は、場所毎の誤差が大きくなることがあり、改良前後の電気比抵抗の差では正確に改良効果を判断することができないこともあった。 As mentioned above, the primary method for evaluating the effect of ground improvement using chemical injection methods is to evaluate the uniaxial compressive strength qu, but none of the above-mentioned conventional techniques directly evaluate the strength of the solidified body. Furthermore, in Patent Document 2, the improvement effect is evaluated by measuring the electrical resistivity before and after ground improvement, but the measured resistivity before improvement can have large errors from location to location, and it is sometimes impossible to accurately judge the improvement effect based on the difference in electrical resistivity before and after improvement.

そこで、本発明の主たる課題は、改良後の電気比抵抗の計測によって、改良体の一軸圧縮強さを評価可能とした電気検層を用いた薬液注入工法による地盤改良効果の評価方法を提供することにある。 The main objective of the present invention is to provide a method for evaluating the effectiveness of ground improvement using a chemical injection method with electrical logging that makes it possible to evaluate the uniaxial compressive strength of the improved body by measuring the electrical resistivity after improvement.

上記課題を解決するために請求項1に係る本発明として、薬液注入工法による地盤改良効果の評価方法であって、
事前に、破壊ひずみε f <2%の試験結果を用いてシリカ濃度(SiO2)と一軸圧縮強さ(qu)との第1相関図を得るとともに、シリカ濃度(SiO2)と電気比抵抗(R)との第2相関図を得る1手順と、
前記第1相関図に基づいて、目標とする一軸圧縮強さ(quck)から目標とするシリカ濃度(SiO2)を求め、次いで前記第2相関図に基づいて、前記目標とするシリカ濃度(SiO2)から目標とする電気比抵抗(Rk)を設定する第2手順と、
地盤改良後に、地盤に縦方向に形成した貫入孔を用いて電気検層による電気比抵抗(Rimp)を計測し、改良地盤の電気比抵抗(Rimp)が前記目標とする電気比抵抗(Rk)以下である条件を満たすかどうかで、目標とする一軸圧縮強さ(quck)が確保されているかを判断する第3手順とからなることを特徴とする薬液注入工法による地盤改良効果の評価方法が提供される。
In order to solve the above problems, the present invention relates to a method for evaluating a ground improvement effect by a chemical injection method,
A procedure of obtaining a first correlation diagram between silica concentration (SiO 2 ) and uniaxial compressive strength (q u ) in advance using the test results of fracture strain ε f <2%, and obtaining a second correlation diagram between silica concentration (SiO 2 ) and electrical resistivity (R);
A second step of determining a target silica concentration (SiO 2 ) from a target unconfined compressive strength (quck) based on the first correlation diagram, and then setting a target electrical resistivity (Rk) from the target silica concentration (SiO 2 ) based on the second correlation diagram;
The present invention provides a method for evaluating the effect of ground improvement using a chemical injection method, characterized in that after the ground improvement, electrical resistivity (Rimp) is measured by electrical logging using a penetration hole formed vertically in the ground, and a third step is used to determine whether the target uniaxial compressive strength (quck) has been secured based on whether the condition that the electrical resistivity (Rimp) of the improved ground is equal to or lower than the target electrical resistivity (Rk) is satisfied.

上記請求項1記載の発明では、薬液注入工法による地盤改良効果(一軸圧縮強さ)を評価するに当たって、原位置土を用いた室内実験によって、事前に、破壊ひずみε f <2%の試験結果を用いてシリカ濃度(SiO2)と一軸圧縮強さ(qu)との第1相関図を得るとともに、シリカ濃度(SiO2)と電気比抵抗(R)との第2相関図を得るようにする(第1手順)。 In the invention described in claim 1 above, when evaluating the effect of ground improvement (unconfined compressive strength) using the chemical grouting method, a first correlation diagram between silica concentration ( SiO2 ) and unconfined compressive strength (qu) is obtained in advance using test results for a fracture strain εf < 2% by indoor experiments using in-situ soil, and a second correlation diagram between silica concentration ( SiO2 ) and electrical resistivity (R) is obtained in advance (first procedure).

次に、前記第1相関図に基づいて、目標とする一軸圧縮強さ(quck)から目標とするシリカ濃度(SiO2)を求め、次いで前記第2相関図に基づいて、前記目標とするシリカ濃度(SiO2)から目標とする電気比抵抗(Rk)を設定する(第2手順)。すなわち、シリカ濃度(SiO2)を介して、目標とする一軸圧縮強さ(quck)を得るための電気比抵抗(Rk)を設定するようにする。測定した電気比抵抗(Rimp)が電気比抵抗(Rk)よりも小さい場合は、目標とする一軸圧縮強さ(quck)が確保されていることになる。 Next, the target silica concentration ( SiO2 ) is calculated from the target unconfined compressive strength (quck) based on the first correlation diagram, and then the target electrical resistivity (Rk) is set from the target silica concentration ( SiO2 ) based on the second correlation diagram (second procedure). That is, the electrical resistivity (Rk) for obtaining the target unconfined compressive strength (quck) is set via the silica concentration ( SiO2 ). If the measured electrical resistivity (Rimp) is smaller than the electrical resistivity (Rk), the target unconfined compressive strength (quck) is ensured.

あとは、地盤改良を行った後に、地盤に縦方向に形成した貫入孔を用いて電気検層による電気比抵抗(Rimp)を計測し、改良地盤の電気比抵抗(Rimp)が前記目標とする電気比抵抗(Rk)以下である条件を満たすかどうかで、目標とする一軸圧縮強さ(quck)が確保されているかを判断する(第3手順)。 After carrying out ground improvement work, the electrical resistivity (Rimp) is measured by electrical logging using a penetration hole drilled vertically in the ground, and it is determined whether the target unconfined compressive strength (quck) has been achieved based on whether the electrical resistivity (Rimp) of the improved ground satisfies the condition that it is less than the target electrical resistivity (Rk) (third step).

本発明では、地盤改良後の電気比抵抗の計測値のみをもって所定の一軸圧縮強さ(quck)が確保されているかどうかを判断できる。すなわち、従来は改良前後の電気比抵抗の比較により薬液が充填されているかどうかの定性的な評価であったが、本発明によれば、改良後の電気比抵抗から改良後の一軸圧縮強さを把握することが可能になり、改良効果を定量的に評価することが可能になる。また、誤差の原因となる地盤改良前の電気比抵抗を用いることなく、地盤改良効果の確認を行うため、その分、作業(計測)の省力化が図れるとともに、効果確認の精度向上を図ることが可能になる。 In the present invention, it is possible to determine whether a specified unconfined compressive strength (quck) has been achieved based solely on the measured value of electrical resistivity after ground improvement. In other words, while in the past, a qualitative assessment was made as to whether or not a chemical solution had been filled by comparing the electrical resistivity before and after improvement, the present invention makes it possible to grasp the unconfined compressive strength after improvement from the electrical resistivity after improvement, and quantitatively evaluate the improvement effect. In addition, since the effect of ground improvement can be confirmed without using the electrical resistivity before ground improvement, which can cause errors, it is possible to reduce the amount of work (measurement) required and improve the accuracy of effect confirmation.

請求項2に係る本発明として、薬液注入工法による地盤改良効果の評価方法であって、
事前に、破壊ひずみε f <2%の試験結果を用いてシリカ濃度(SiO2)と液状化強度比(RL)又は粘着力(c)との第1相関図を得るとともに、シリカ濃度(SiO2)と電気比抵抗(R)との第2相関図を得る1手順と、
前記第1相関図に基づいて、目標とする液状化強度比(RL)又は粘着力(c)から目標とするシリカ濃度(SiO2)を求め、次いで前記第2相関図に基づいて、前記目標とするシリカ濃度(SiO2)から目標とする電気比抵抗(Rk)を設定する第2手順と、
地盤改良後に、地盤に縦方向に形成した貫入孔を用いて電気検層による電気比抵抗(Rimp)を計測し、改良地盤の電気比抵抗(Rimp)が前記目標とする電気比抵抗(Rk)以下である条件を満たすかどうかで、目標とする一軸圧縮強さ(quck)が確保されているかを判断する第3手順とからなることを特徴とする薬液注入工法による地盤改良効果の評価方法が提供される。
According to a second aspect of the present invention, there is provided a method for evaluating a ground improvement effect by a chemical injection method, comprising the steps of:
A procedure of obtaining a first correlation diagram between silica concentration ( SiO2 ) and liquefaction resistance ratio (RL) or cohesion (c) in advance using the test results for fracture strain εf < 2%, and obtaining a second correlation diagram between silica concentration ( SiO2 ) and electrical resistivity (R);
A second step of determining a target silica concentration (SiO2) from a target liquefaction strength ratio (RL) or cohesion (c) based on the first correlation diagram, and then setting a target electrical resistivity (Rk) from the target silica concentration ( SiO2 ) based on the second correlation diagram;
The present invention provides a method for evaluating the effect of ground improvement using a chemical injection method, characterized in that after the ground improvement, electrical resistivity (Rimp) is measured by electrical logging using a penetration hole formed vertically in the ground, and a third step is used to determine whether the target uniaxial compressive strength (quck) has been secured based on whether the condition that the electrical resistivity (Rimp) of the improved ground is equal to or lower than the target electrical resistivity (Rk) is satisfied.

上記請求項2記載の発明では、一軸圧縮強さ(qu)と液状化強度比(RL)とは一定の換算式によって変換が可能であること、一軸圧縮強さ(qu)と粘着力(c)とは一定の換算式によって変換が可能であることに鑑み、前記第1相関図の一軸圧縮強さの軸を液状化強度比(RL)又は粘着力(c)に代えた相関図とし、これに基づいて、地盤改良効果を評価するものである。 In the invention described in claim 2 above, in consideration of the fact that unconfined compressive strength (qu) and liquefaction strength ratio (RL) can be converted using a certain conversion formula, and that unconfined compressive strength (qu) and cohesion strength (c) can be converted using a certain conversion formula, the axis of unconfined compressive strength in the first correlation diagram is replaced with the axis of liquefaction strength ratio (RL) or cohesion strength (c), and the effect of ground improvement is evaluated based on this correlation diagram.

請求項3に係る本発明として、薬液注入工法による地盤改良効果の評価方法であって、
事前に、破壊ひずみε f <2%の試験結果を用いてシリカ濃度(SiO2)と一軸圧縮強さ(qu)との第1相関図を得るとともに、シリカ濃度(SiO2)と導電率(σ)との第2相関図を得る1手順と、
前記第1相関図に基づいて、目標とする一軸圧縮強さ(quck)から目標とするシリカ濃度(SiO2)を求め、次いで前記第2相関図に基づいて、前記目標とするシリカ濃度(SiO2)から目標とする導電率(σc)を設定する第2手順と、
地盤改良後に、地盤に縦方向に形成した貫入孔を用いて電気検層による電気比抵抗(Rimp)を計測し、これから地盤改良後の導電率(σimp)を算出し、改良地盤の導電率(σimp)が前記目標とする導電率(σc)以上である条件を満たすかどうかで、目標とする一軸圧縮強さ(quck)が確保されているかを判断する第3手順とからなることを特徴とする薬液注入工法による地盤改良効果の評価方法が提供される。
As a third aspect of the present invention, there is provided a method for evaluating a ground improvement effect by a chemical injection method, comprising the steps of:
A procedure of obtaining a first correlation diagram between silica concentration (SiO 2 ) and uniaxial compressive strength (q u ) in advance using the test results of fracture strain ε f <2%, and obtaining a second correlation diagram between silica concentration (SiO 2 ) and electrical conductivity (σ);
A second step of determining a target silica concentration (SiO 2 ) from a target unconfined compressive strength (q uck ) based on the first correlation diagram, and then setting a target electrical conductivity (σ c ) from the target silica concentration (SiO 2 ) based on the second correlation diagram;
The present invention provides a method for evaluating the effect of ground improvement using a chemical injection method, which comprises a third step of measuring the electrical resistivity (Rimp) by electrical logging using a penetration hole formed vertically in the ground after the ground improvement, calculating the electrical conductivity (σimp) after the ground improvement from the measured electrical resistivity, and judging whether the target uniaxial compressive strength (quck) has been secured based on whether the electrical conductivity (σimp) of the improved ground satisfies the condition that it is equal to or greater than the target electrical conductivity (σc).

上記請求項3記載の発明では、電気比抵抗(R)と導電率(σ)とは換算式(R=1/σ)によって変換が可能であることに鑑み、前記第2相関図の電気比抵抗(R)の軸を導電率(σ)に代えた相関図とし、これに基づいて、地盤改良効果を評価するものである。 In the invention described in claim 3 above, in view of the fact that electrical resistivity (R) and electrical conductivity (σ) can be converted using a conversion formula (R = 1/σ), the axis of electrical resistivity (R) in the second correlation diagram is replaced with the axis of electrical conductivity (σ), and the effect of ground improvement is evaluated based on this correlation diagram.

請求項4に係る本発明として、地盤改良前後において、小型動的コーン貫入試験により深度とNd値との関係を示したNd値の深度分布図を得て、地盤改良前後における前記Nd値の増分量から地盤改良効果を評価する1次的効果確認を行い、
前記1次的効果確認によって地盤改良効果が明確でない場合に、2次的効果確認として、前記小型動的コーン貫入試験の貫入孔を用いて電気比抵抗(Rimp)を計測し、請求項1~3いずれかに記載の方法によって地盤改良効果を評価することを特徴とする薬液注入工法による地盤改良効果の評価方法が提供される。
As the present invention according to claim 4, a depth distribution map of the Nd value showing the relationship between depth and Nd value is obtained by a small dynamic cone penetration test before and after ground improvement, and a primary effect confirmation is performed to evaluate the effect of ground improvement from the increment of the Nd value before and after ground improvement,
When the ground improvement effect is not clear by the primary effect confirmation, a method for evaluating the ground improvement effect by a chemical injection method is provided, characterized in that, as a secondary effect confirmation, electrical resistivity (Rimp) is measured using the penetration hole of the small dynamic cone penetration test, and the ground improvement effect is evaluated by a method described in any one of claims 1 to 3.

上記請求項4記載の発明では、小型動的コーン貫入試験による1次的効果確認と、電気比抵抗による2次的効果確認とによる段階的評価としたものである。すべてのケースにおいて、電気比抵抗による効果確認を行うのではなく、前記一次的効果確認を行った上で、それでは地盤改良効果が明確に確認できないケースに限って前記2次的効果確認を行うことで、全体の作業工程を省力化することが可能になる。 The invention described in claim 4 above involves a step-by-step evaluation that involves a primary confirmation of effects using a small dynamic cone penetration test, and a secondary confirmation of effects using electrical resistivity. Rather than confirming effects using electrical resistivity in all cases, the primary confirmation of effects is performed, and then the secondary confirmation of effects is performed only in cases where the ground improvement effect cannot be clearly confirmed, thereby making it possible to reduce the labor required for the entire work process.

以上詳説のとおり本発明によれば、改良後の電気比抵抗の計測によって、改良体の一軸圧縮強さを評価可能とした電気検層を用いた薬液注入工法による地盤改良効果の評価方法を提供することができる。 As explained above in detail, the present invention provides a method for evaluating the effect of ground improvement using a chemical injection method with electrical logging that makes it possible to evaluate the uniaxial compressive strength of the improved body by measuring the electrical resistivity after improvement.

本発明に係る地盤改良効果の評価方法のフロー図である。FIG. 2 is a flow diagram of a method for evaluating a ground improvement effect according to the present invention. 電気検層に用いる測定機器の概略を示す縦断面図である。FIG. 2 is a vertical cross-sectional view showing an outline of a measuring device used for electrical logging. 外装スリーブ8が取り付けられた測定プローブ2の正面図である。FIG. 2 is a front view of the measurement probe 2 with the outer sleeve 8 attached. 外装スリーブ本体12を示す、(A)は正面図、(B)はB-B断面図、(C)は裏面図、(D)はD-D断面図である。1A shows an exterior sleeve main body 12, in which (A) is a front view, (B) is a cross-sectional view taken along line B-B, (C) is a back view, and (D) is a cross-sectional view taken along line D-D. 外装スリーブ先端13を示す、(A)は正面図、(B)は上面図である。1 shows the outer sleeve tip 13, in which (A) is a front view and (B) is a top view. 2次的効果確認方法の説明図である。FIG. 13 is an explanatory diagram of a method for confirming secondary effects. 実施例における改良体の平面図、断面図及び調査位置図である。1 shows a plan view, a cross-sectional view and an investigation location diagram of the improved body in the embodiment. 土質柱状図とN値を示す図である。FIG. 1 shows soil log and N values. 原位置土の粒径加積曲線を示す図である。FIG. 13 is a graph showing the particle size accumulation curve of in-situ soil. 地下水の塩分濃度・電気比抵抗を示す図である。This is a graph showing the salinity and electrical resistivity of groundwater. 電気比抵抗と間隙水の塩分濃度の関係を示す図である。FIG. 1 is a graph showing the relationship between electrical resistivity and the salinity of pore water. 改良体の粒径加積曲線を示す図である。FIG. 1 shows the particle size accumulation curve of the improved product. 繰返し三軸試験結果を示す図である。FIG. 13 is a diagram showing the results of a repeated triaxial test. 一軸圧縮強さ(qu)と薬液シリカ濃度(SiO2)との関係を示す相関図である。FIG. 1 is a correlation diagram showing the relationship between unconfined compressive strength (qu) and liquid silica concentration (SiO 2 ). 電気比抵抗(R)と薬液シリカ濃度(SiO2)との関係を示す相関図である。FIG. 1 is a correlation diagram showing the relationship between electrical resistivity (R) and chemical solution silica concentration (SiO 2 ). 改良体No.3のNd値の深度分布図である。This is a depth distribution diagram of the Nd value of improved body No. 3. 改良体No.3の電気比抵抗Rの深度分布図である。This is a depth distribution map of electrical resistivity R of improved body No. 3. 改良体No.4のNd値の深度分布図である。This is a depth distribution diagram of the Nd value of improved body No. 4. 改良体No.4の電気比抵抗Rの深度分布図である。This is a depth distribution map of electrical resistivity R of improved body No. 4. 一軸圧縮強さ(qu)と液状化強度比(RL)との間の相関式を示す図である。FIG. 1 shows the correlation between unconfined compressive strength (qu) and liquefaction strength ratio (RL). 一軸圧縮強さ(qu)と粘着力(c)との間の相関式を示す図である。FIG. 1 shows the correlation between unconfined compressive strength (qu) and adhesive strength (c).

以下、本発明の実施の形態について図面を参照しながら詳述する。 The following describes in detail the embodiments of the present invention with reference to the drawings.

本発明は、埋立地等の軟弱地盤の地盤強化のために、水ガラス(珪酸ナトリウム)などからなる薬液を地盤に注入する薬液注入工法による地盤改良効果の評価方法であり、具体的には以下の手順によるものである。 The present invention is a method for evaluating the effect of ground improvement using a chemical injection method in which a chemical solution made of water glass (sodium silicate) or the like is injected into the ground to strengthen soft ground such as reclaimed land, and specifically, the method involves the following steps.

図1に示されるように、地盤改良前後において、小型動的コーン貫入試験により深度とNd値との関係を示したNd値の深度分布図を得て、地盤改良前後における前記Nd値の増分量から地盤改良効果を評価する1次的効果確認を行い、
前記1次的効果確認によって地盤改良効果が明確でない場合に、2次的効果確認として、前記小型動的コーン貫入試験の貫入孔を用いた電気検層を行って目標とする一軸圧縮強さ(quck)が確保されているかを判断するものである。
As shown in Figure 1, a depth distribution map of the Nd value showing the relationship between depth and Nd value was obtained by a small dynamic cone penetration test before and after ground improvement, and a primary effect confirmation was performed to evaluate the effect of ground improvement from the increment in the Nd value before and after ground improvement.
If the effect of ground improvement is not clear from the above-mentioned primary effect confirmation, as a secondary effect confirmation, electrical logging is carried out using the penetration hole of the above-mentioned small dynamic cone penetration test to determine whether the target uniaxial compressive strength (quck) has been secured.

前記2次的効果確認は、事前に、シリカ濃度(SiO2)と一軸圧縮強さ(qu)との第1相関図を得るとともに、シリカ濃度(SiO2)と電気比抵抗(R)との第2相関図を得る1手順と、
前記第1相関図に基づいて、目標とする一軸圧縮強さ(quck)から目標とするシリカ濃度(SiO2)を求め、次いで前記第2相関図に基づいて、前記目標とするシリカ濃度(SiO2)から目標とする電気比抵抗(Rk)を設定する第2手順と、
地盤改良後に、地盤に縦方向に形成した貫入孔を用いて電気検層による電気比抵抗(Rimp)を計測し、改良地盤の電気比抵抗(Rimp)が前記目標とする電気比抵抗(Rk)以下である条件を満たすかどうかで、目標とする一軸圧縮強さ(quck)が確保されているかを判断する第3手順とからなるものである。
The secondary effect confirmation includes a procedure of obtaining a first correlation diagram between silica concentration ( SiO2 ) and uniaxial compressive strength (qu) and a second correlation diagram between silica concentration ( SiO2 ) and electrical resistivity (R) in advance;
A second step of determining a target silica concentration (SiO 2 ) from a target unconfined compressive strength (quck) based on the first correlation diagram, and then setting a target electrical resistivity (Rk) from the target silica concentration (SiO 2 ) based on the second correlation diagram;
After the ground improvement, the electrical resistivity (Rimp) is measured by electrical logging using a penetration hole drilled vertically in the ground, and a third step is performed to determine whether the target unconfined compressive strength (quck) has been achieved based on whether the electrical resistivity (Rimp) of the improved ground satisfies the condition that it is less than the target electrical resistivity (Rk).

以下に、具体的に詳述する。 The specific details are provided below.

<1次的効果確認>
前記小型動的コーン貫入試験は、いわゆるPENNYと呼ばれるイタリアのTecnotest社製の小型動的コーン貫入試験機を用いて行う貫入試験である。試験方法は、質量294N(30kgf)のハンマーを油圧モータを利用して自動で高さ20cmの位置から自由落下させて、断面積10cm2、先端角60°の先端コーンを10cm貫入するのに必要な打撃回数(Nd値)を連続的に測定する。1mごとにロッドの回転トルクを測定し、ロッドに作用する摩擦力の影響を補正することで、標準貫入試験のN値と等価なNd値に換算できるようになっている。標準貫入試験と対比した場合の小型動的コーン貫入試験の利点としては、以下の点が挙げられる。
(1)標準貫入試験では測定点が1mピッチであるため、薬液注入の層厚が1~2m程度だと計測点を確保できないのに対して、小型動的コーン貫入試験は10cm毎に計測できる。
(2)改良土の一軸圧縮強さquは50~100kPa程度であるため、標準貫入試験だと打撃エネルギーが大きすぎて精度が出ないのに対して、小型動的コーン貫入試験は打撃エネルギーが小さく(対象の強度レンジに対して丁度良く)、測定精度が確保できる。標準貫入試験の場合ハンマー質量63.5kg、落下高さ76cmの自由落下エネルギーは473Jであるのに対し、小型動的コーン貫入試験ではハンマー質量30kg、落下高さ20cmの自由落下エネルギーが58.8Jと、およそ12%の打撃エネルギーとなっている。
(3)落下作業が全自動のため、打撃エネルギーにバラツキが少ない。
(4)試験機が軽く、ハンドリング性が良い。
<Primary effect confirmation>
The small dynamic cone penetration test is a penetration test performed using a small dynamic cone penetration tester manufactured by Tecnotest, Italy, called PENNY. The test method involves automatically free-falling a hammer with a mass of 294 N (30 kgf) from a height of 20 cm using a hydraulic motor, and continuously measuring the number of blows (Nd value) required to penetrate a tip cone with a cross-sectional area of 10 cm2 and a tip angle of 60° 10 cm. The rotational torque of the rod is measured every 1 m, and the effect of the frictional force acting on the rod is corrected, making it possible to convert the value into an Nd value equivalent to the N value of the standard penetration test. The advantages of the small dynamic cone penetration test compared to the standard penetration test are as follows.
(1) In the standard penetration test, measurement points are spaced at 1-m intervals, so if the layer thickness of the injected chemical solution is around 1 to 2 m, it is not possible to secure measurement points. In contrast, the small dynamic cone penetration test allows measurements to be taken every 10 cm.
(2) The uniaxial compressive strength qu of the improved soil is about 50 to 100 kPa, so the impact energy is too large for the standard penetration test to be accurate, whereas the impact energy of the small dynamic cone penetration test is small (just right for the target strength range), ensuring measurement accuracy. In the standard penetration test, the hammer mass is 63.5 kg and the free fall energy is 473 J with a drop height of 76 cm, whereas in the small dynamic cone penetration test, the hammer mass is 30 kg and the free fall energy is 58.8 J with a drop height of 20 cm, which is about 12% of the impact energy.
(3) Since the dropping process is fully automatic, there is little variation in impact energy.
(4) The testing machine is light and easy to handle.

このように、小型動的コーン貫入試験を用いてNd値を測定することにより、標準貫入試験に比べて、狭小な設置スペースで、可搬性に優れ、全自動のため打撃エネルギーのバラツキが少なく、そのためバラツキの生じやすい不均一な埋立て地盤等でも地盤改良効果が確実に確認できる。 In this way, by measuring the Nd value using a small dynamic cone penetration test, it requires a smaller installation space than a standard penetration test, is highly portable, and is fully automated, so there is less variation in impact energy. Therefore, the effects of ground improvement can be reliably confirmed even in uneven reclaimed land where variation is likely to occur.

前記小型動的コーン貫入試験によって、深度とNd値との関係を示したNd値の深度分布図が得られる(図16及び図18参照。)。 The small dynamic cone penetration test produces a depth distribution map of Nd values showing the relationship between depth and Nd value (see Figures 16 and 18).

上記小型動的コーン貫入試験によって得られたNd値の深度分布図を用いて、地盤改良効果を確認する1次的効果確認を行う。この1次的効果確認における地盤改良効果の確認方法は、図16及び図18に示されるように、Nd値-深度のグラフに地盤改良前Nd値を書き込むとともに、地盤改良後Nd値を重ねて書き込んで、地盤改良前後におけるNd値の増分量を確認することにより行う。
1次的効果確認の判断は、図1に示されるように、Nd値の増分が確認されて改良後のNd値から液状化しないと判断できる場合や、改良地盤の物理特性より粘土層或いは粘土が多い等の理由により液状化しないと判断できる土層である場合などが挙げられる。
A primary effect check is performed to confirm the effect of ground improvement using the depth distribution map of the Nd value obtained by the above-mentioned small dynamic cone penetration test. The method of checking the effect of ground improvement in this primary effect check is to write the Nd value before ground improvement on the Nd value-depth graph as shown in Figures 16 and 18, and write the Nd value after ground improvement on top of it, and check the increase in the Nd value before and after ground improvement.
The primary effectiveness can be judged as shown in Figure 1, when an increase in the Nd value is confirmed and it is determined that liquefaction will not occur based on the Nd value after improvement, or when the soil layer is determined not to liquefy due to the physical characteristics of the improved ground, such as being a clay layer or having a large amount of clay.

Nd値の増分量は、地盤改良前のNd値が目標改良強度に近い地盤などでは、あまり大きくなく、このNd値による地盤の改良効果が認められない場合がある。その場合には、次述の電気検層による2次的効果確認が行われる。 In cases where the Nd value before ground improvement is close to the target improvement strength, the increase in the Nd value is not very large, and the ground improvement effect of this Nd value may not be recognized. In such cases, a secondary effect confirmation is performed using electrical logging as described below.

<2次的効果確認>
2次的効果確認では、先ず、前記小型動的コーン貫入試験の後、その貫入孔Hを利用して電気検層を行う。前記電気検層は、図2に示される圧入装置1によって、前記小型動的コーン貫入試験の貫入孔Hに、図2及び図3に示されるように、1つの電流電極3及び2つの電位電極4、4を備えた測定プローブ2を挿入し、孔壁にこれらの電極3、4を接触させながら、電流電極3に電流を流したときの電位を電位電極4によって検出し、孔壁近傍の地盤の電気比抵抗Rを深度方向に連続的に測定する物理探査手法である。
<Secondary effect confirmation>
In the secondary effect confirmation, first, after the small dynamic cone penetration test, electrical logging is performed using the penetration hole H. The electrical logging is a geophysical exploration method in which a measurement probe 2 equipped with one current electrode 3 and two potential electrodes 4, 4 is inserted into the penetration hole H of the small dynamic cone penetration test by an injection device 1 shown in Fig. 2, as shown in Fig. 2 and Fig. 3, and the potential when a current is passed through the current electrode 3 is detected by the potential electrode 4 while these electrodes 3, 4 are in contact with the hole wall, and the electrical resistivity R of the ground near the hole wall is continuously measured in the depth direction.

前記圧入装置1は、図2に示されるように、貫入孔Hの直上の地表面に、貫入孔Hの両側にそれぞれ上下方向に沿って伸縮自在とされたピストン20、20が配置され、これらピストン20、20の上端同士に跨設された架台21の中央部に、下端に測定プローブ2が連結された貫入ロッド5を挟持するチャック22が備えられるとともに、前記ピストン20、20の動作を制御するコントロールユニット23が備えられたものである。また、前記コントロールユニット23には、エンジン及び油圧ポンプからなる油圧ユニット24が接続されている。 As shown in FIG. 2, the press-in device 1 is configured such that pistons 20, 20 that are extendable and retractable in the vertical direction are arranged on both sides of the penetration hole H on the ground surface directly above the penetration hole H, and a chuck 22 that holds a penetration rod 5 with a measurement probe 2 connected to its lower end is provided in the center of a stand 21 that straddles the upper ends of the pistons 20, 20, as well as a control unit 23 that controls the operation of the pistons 20, 20. A hydraulic unit 24 consisting of an engine and a hydraulic pump is connected to the control unit 23.

前記圧入装置1では、両側のピストン20、20が同調して伸縮し、前記架台21が上下方向に移動することにより、前記チャック22によって挟持された貫入ロッド5が上下方向に移動し、測定プローブ2の貫入孔Hへの押し込み及び引き抜きが行われるようになっている。 In the press-fitting device 1, the pistons 20 on both sides expand and contract in unison, and the base 21 moves vertically, causing the penetration rod 5 clamped by the chuck 22 to move vertically, and the measurement probe 2 is pushed into and pulled out of the penetration hole H.

電気検層に用いる測定装置は、図3に示されるように、前記電極3、4…が備えられた測定プローブ2と、この測定プローブ2の上端から延び、前記測定プローブ2の内部において先端が前記電極3、4…に接続された電気ケーブル7と、前記測定プローブ2が着脱可能に挿嵌される中空状の外装スリーブ8とを含んでいる。前記電気ケーブル7は、中空円筒状に形成された貫入ロッド5の中空部を通って地上まで延出され、地上において、先端が測定装置に接続されるようになっている。 As shown in Fig. 3, the measuring device used for electrical logging includes a measuring probe 2 equipped with the electrodes 3, 4, an electric cable 7 extending from the upper end of the measuring probe 2 and having its tip connected to the electrodes 3, 4 inside the measuring probe 2, and a hollow exterior sleeve 8 into which the measuring probe 2 is removably inserted. The electric cable 7 is extended to the ground through the hollow part of a hollow cylindrical penetration rod 5, where its tip is connected to the measuring device.

前記測定プローブ2は、断面略円形の棒状の外観を成し、上端部には、貫入ロッド5を連結するための雄ねじ部6が形成され、貫入ロッド5の下端部に設けられた雌ねじ部が螺合できるようになっている。また、前記雄ねじ部6の下端に連続して、中間部を介して、複数の電極が軸方向(上下方向)に所定の間隔を空けて配列された本体部10が設けられるとともに、この本体部10の下端に連続して、前記本体部10より小径の先端部11が設けられている。 The measurement probe 2 has a rod-like appearance with a roughly circular cross section, and at its upper end is formed a male threaded section 6 for connecting a penetration rod 5, which is adapted to be screwed into a female threaded section provided at the lower end of the penetration rod 5. In addition, a main body section 10 is provided, which is connected to the lower end of the male threaded section 6 via an intermediate section, and in which a number of electrodes are arranged at predetermined intervals in the axial direction (vertical direction), and a tip section 11 having a smaller diameter than the main body section 10 is provided to continue to the lower end of the main body section 10.

前記電気検層の電極配置は、4極法や3極法でもよいが、2極法とするのが好ましい。2極法の電極配置は、図2及び図3に示されるように、上下方向に所定の間隔を空けて1つの電流電極3及び2つの電位電極4、4を配置し、地表付近に設置した電流遠電極(図示せず)に電流のリターンをとり、同じく地表付近に設置した電位遠電極(図示せず)を基準として、電流電極3から一定電流を流しながら電位電極4、4で電位を測定するものである。4極法や3極法の電極配置に比べて、地盤の改良効果がより明確に把握できるようになる。 The electrode arrangement for the electrical logging may be a four-pole or three-pole method, but a two-pole method is preferable. In the two-pole electrode arrangement, as shown in Figures 2 and 3, one current electrode 3 and two potential electrodes 4, 4 are arranged at a predetermined interval in the vertical direction, and the current is returned to a current remote electrode (not shown) installed near the ground surface. The potential is measured by the potential electrodes 4, 4 while a constant current is passed from the current electrode 3, based on the potential remote electrode (not shown) also installed near the ground surface. Compared to the four-pole and three-pole electrode arrangements, the effect of ground improvement can be more clearly understood.

図3に示されるように、測定プローブ2の本体部10に設けられた3つの電極のうち、最上部に配置された電極が電流電極3であり、その下側に配置された2つの電極がそれぞれ電位電極4である。前記電流電極3と上側の電位電極4との電極間隔aは2.5cm、電流電極3と下側の電位電極4との電極間隔bは5cmとするのが好ましい。このように、電流電極3との電極間隔が異なる2つの電位電極4、4を配置することにより、電極間隔が異なる2つの電位差を同時に測定することができるため、測定精度が向上するとともに、測定時間が短縮化できる。 As shown in FIG. 3, of the three electrodes provided on the main body 10 of the measurement probe 2, the electrode located at the top is the current electrode 3, and the two electrodes located below it are potential electrodes 4. It is preferable that the electrode spacing a between the current electrode 3 and the upper potential electrode 4 is 2.5 cm, and the electrode spacing b between the current electrode 3 and the lower potential electrode 4 is 5 cm. In this way, by arranging the two potential electrodes 4, 4 with different electrode spacings from the current electrode 3, two potential differences with different electrode spacings can be measured simultaneously, improving measurement accuracy and shortening measurement time.

前記電極3、4…は導電性の金属材からなり、測定プローブ2の内部から外面まで貫通して設けられ、測定プローブ2の内部でそれぞれ電気ケーブル7の先端が接続している。 The electrodes 3, 4, etc. are made of a conductive metal material and extend from the inside to the outer surface of the measurement probe 2, and the tips of the electrical cables 7 are connected to each of them inside the measurement probe 2.

次いで、前記測定プローブ2を貫入孔Hに貫入する際、前記測定プローブ2の先端側に取り付けられる外装スリーブ8について説明する。前記外装スリーブ8は、製作を容易化するため、図4に示されるように、測定プローブ2の本体部10に外嵌される外装スリーブ本体12と、測定プローブ2の先端部11に外嵌される外装スリーブ先端13とに分割して構成するのが好ましい。 Next, we will explain the outer sleeve 8 that is attached to the tip side of the measurement probe 2 when the measurement probe 2 is inserted into the insertion hole H. In order to facilitate manufacture, it is preferable to divide the outer sleeve 8 into an outer sleeve main body 12 that is fitted onto the main body 10 of the measurement probe 2, and an outer sleeve tip 13 that is fitted onto the tip 11 of the measurement probe 2, as shown in FIG. 4.

前記外装スリーブ本体12は、図4に示されるように、軸方向の両端に開放した略円筒状に形成され、図3に示されるように、測定プローブ2に挿嵌した状態で、外径が測定プローブ2の外径より大きくなるように形成されている。外装スリーブ8の外径を測定プローブ2の外径より大きくすることにより、貫入孔Hに貫入した際、外装スリーブ8が孔壁に接触しやすくなり、測定精度が向上するとともに、測定プローブ2の損傷が抑制できる。前記外装スリーブ8の外径は、小型動的コーン貫入試験に使用される先端コーンの外径とほぼ同等とするのが好ましい。 The outer sleeve body 12 is formed in a generally cylindrical shape with open ends in the axial direction as shown in FIG. 4, and is formed so that its outer diameter is larger than that of the measurement probe 2 when inserted into the measurement probe 2 as shown in FIG. 3. By making the outer diameter of the outer sleeve 8 larger than that of the measurement probe 2, the outer sleeve 8 is more likely to come into contact with the hole wall when it penetrates the penetration hole H, improving measurement accuracy and suppressing damage to the measurement probe 2. It is preferable that the outer diameter of the outer sleeve 8 is approximately equal to the outer diameter of the tip cone used in the small dynamic cone penetration test.

前記外装スリーブ先端13は、図5に示されるように、上側部分が上方に開放した有底円筒形に形成され、下側部分の外形が下方に向けて尖った円錐形(コーン形)に形成されている。上側の有底円筒形部分の外径は、前記外装スリーブ本体12の外径とほぼ同等に形成されている。コーン先端角は45°~90°程度が好ましく、60°がより好ましい。 As shown in FIG. 5, the outer sleeve tip 13 has an upper portion formed in a bottomed cylindrical shape that opens upward, and a lower portion formed in a cone shape that is pointed downward. The outer diameter of the upper bottomed cylindrical portion is formed to be approximately equal to the outer diameter of the outer sleeve body 12. The cone tip angle is preferably about 45° to 90°, and more preferably 60°.

前記外装スリーブ8は、図4及び図5に示されるように、前記測定プローブ2が貫入孔1への挿入先端側から電極3、4…の取付位置を含む範囲に亘って挿嵌される中空部14と、前記測定プローブ2の電極3、4…に対応する位置に、前記中空部14内から外面まで連続して貫通するとともに、前記測定プローブ2を前記中空部14に挿嵌した状態で内側の先端がそれぞれ前記電極3、4…に接触する外側電極15、16、16とが備えられている。測定プローブ2に備えられた電極3、4…と、外装スリーブ8に備えられた外側電極15、16…とは対応しており、最も上側に配置された外側電極15が電流電極であり、その下側に配置された2つの外側電極16、16が電位電極である。 As shown in Figs. 4 and 5, the outer sleeve 8 has a hollow portion 14 into which the measurement probe 2 is inserted over a range including the attachment positions of the electrodes 3, 4, etc. from the insertion tip side into the penetration hole 1, and outer electrodes 15, 16, 16 that penetrate continuously from inside the hollow portion 14 to the outer surface at positions corresponding to the electrodes 3, 4, etc. of the measurement probe 2, and whose inner tips contact the electrodes 3, 4, etc. when the measurement probe 2 is inserted into the hollow portion 14. The electrodes 3, 4, etc. of the measurement probe 2 correspond to the outer electrodes 15, 16, etc. of the outer sleeve 8, and the outer electrode 15 arranged at the top is a current electrode, and the two outer electrodes 16, 16 arranged below it are potential electrodes.

前記外装スリーブ8が取り付けられた測定プローブ2を前記圧入装置1によって貫入孔Hに貫入して電気検層を行った後、貫入孔Hから測定プローブ2を引き抜くことが困難になった場合に、引抜き抵抗により前記測定プローブ2が外装スリーブ8から抜けて、測定プローブ2が回収できるようになっている。このように、測定プローブ2を引き抜く際の引抜き抵抗により、外装スリーブ8が抜けて地中に残置されるとともに、外装スリーブ8から抜けた測定プローブ2が確実に回収できるため、電気検層における高価な測定プローブ2の回収不能リスクが無くなる。前述の通り、前記測定プローブ2は、前記外装スリーブ8より外径が小さく形成されているため、外装スリーブ8を取り付けた状態で圧入された貫入孔Hから比較的スムーズに引き抜くことができるようになる。 After the measurement probe 2 with the outer sleeve 8 attached is inserted into the penetration hole H by the pressing device 1 to perform electrical logging, if it becomes difficult to pull out the measurement probe 2 from the penetration hole H, the measurement probe 2 can be removed from the outer sleeve 8 by the pulling resistance, and the measurement probe 2 can be recovered. In this way, the outer sleeve 8 is removed and left in the ground due to the pulling resistance when pulling out the measurement probe 2, and the measurement probe 2 that has been removed from the outer sleeve 8 can be reliably recovered, eliminating the risk of being unable to recover the expensive measurement probe 2 in electrical logging. As described above, the measurement probe 2 is formed with an outer diameter smaller than the outer sleeve 8, so it can be relatively smoothly pulled out from the penetration hole H into which it was pressed with the outer sleeve 8 attached.

前記外装スリーブ8は、貫入孔Hに挿入した際、外側電極15、16…を孔壁に接触させるため、外側電極15、16…の反対側の外面に、外方に突出した接触促進用凸部17が設けられるようにするのが好ましい。前記接触促進用凸部17は、外装スリーブ8の軸方向に対して外側電極15、16…の配置区間の全長を含む範囲に形成された縦長の凸部である。高さは1~8mmが好ましく、3~5mmがより好ましい。前記接触促進用凸部17を設けることによって、外装スリーブ8に備えられた外側電極15、16…が貫入孔1の孔壁により確実に接触でき、電気検層の測定精度が更に向上できる。 When the outer sleeve 8 is inserted into the penetration hole H, the outer electrodes 15, 16... are preferably provided with a contact-promoting protrusion 17 that protrudes outward on the outer surface opposite the outer electrodes 15, 16... in order to bring the outer electrodes 15, 16... into contact with the hole wall. The contact-promoting protrusion 17 is a vertically elongated protrusion formed in a range including the entire length of the arrangement section of the outer electrodes 15, 16... in the axial direction of the outer sleeve 8. The height is preferably 1 to 8 mm, and more preferably 3 to 5 mm. By providing the contact-promoting protrusion 17, the outer electrodes 15, 16... provided on the outer sleeve 8 can be more reliably contacted with the hole wall of the penetration hole 1, and the measurement accuracy of electrical logging can be further improved.

図4に示されるように、測定プローブ2の周面に周方向固定用凸部18が設けられ、この周方向固定用凸部18が外装スリーブ8に設けられた嵌合部19に嵌合することにより、外装スリーブ8と測定プローブ2との周方向への回転が固定されるようにするのが好ましい。前記周方向固定用凸部18は、測定プローブ2の本体部10の上端部に形成され、前記嵌合部19は、外装スリーブ8の外装スリーブ本体12の上端部に形成されている。前記周方向固定用凸部18を嵌合部19に嵌合することにより、測定プローブ2と、外装スリーブ8のうち外装スリーブ本体12との周方向の回転が防止され、測定プローブ2を貫入孔1に貫入する際などにおいて、測定プローブ2の電極3、4…と外装スリーブ8の外側電極15、16…との位置ずれが生じなくなる。 As shown in FIG. 4, it is preferable that a circumferential fixing protrusion 18 is provided on the peripheral surface of the measurement probe 2, and the circumferential rotation of the outer sleeve 8 and the measurement probe 2 is fixed by fitting the circumferential fixing protrusion 18 into a fitting portion 19 provided on the outer sleeve 8. The circumferential fixing protrusion 18 is formed on the upper end of the main body 10 of the measurement probe 2, and the fitting portion 19 is formed on the upper end of the outer sleeve main body 12 of the outer sleeve 8. By fitting the circumferential fixing protrusion 18 into the fitting portion 19, the circumferential rotation of the measurement probe 2 and the outer sleeve main body 12 of the outer sleeve 8 is prevented, and when the measurement probe 2 is inserted into the insertion hole 1, the electrodes 3, 4... of the measurement probe 2 and the outer electrodes 15, 16... of the outer sleeve 8 are not misaligned.

前記電気検層の手順は、前記小型動的コーン貫入試験を行った後、その貫入孔Hの直上の地表面に、図2に示される圧入装置1を設置し、前記外装スリーブ8が取り付けられた測定プローブ2を貫入孔Hに挿入し、測定プローブ2を徐々に圧入しながら深度方向に連続的に電気比抵抗Rの測定を行う。電気比抵抗Rの測定間隔は任意であるが、10cm以下、好ましくは5cm以下、より好ましくは1cmとするのがよい。所定の深度まで測定が終了したら、測定プローブ2を貫入孔Hから引き抜いて回収する。 The procedure for the electrical logging is as follows: after the small dynamic cone penetration test, the pressing device 1 shown in FIG. 2 is installed on the ground surface directly above the penetration hole H, the measurement probe 2 with the outer sleeve 8 attached is inserted into the penetration hole H, and the measurement probe 2 is gradually pressed in while continuously measuring the electrical resistivity R in the depth direction. The measurement interval for the electrical resistivity R is arbitrary, but should be 10 cm or less, preferably 5 cm or less, and more preferably 1 cm. When measurements have been completed up to the specified depth, the measurement probe 2 is withdrawn from the penetration hole H and recovered.

前記電気検層に先立って、本発明では、事前に、シリカ濃度(SiO2)と一軸圧縮強さ(qu)との第1相関図を得るとともに、シリカ濃度(SiO2)と電気比抵抗(R)との第2相関図を得るようにする(第1手順)。具体的には、現地土砂を用いた改良砂の配合試験、すなわち薬液シリカ濃度を変えながら一軸圧縮強さ試験を行って、図6に示されるシリカ濃度(SiO2)と一軸圧縮強さ(qu)との第1相関図を得るとともに、薬液シリカ濃度を変えながら電気比抵抗試験を行って、図6に示されるシリカ濃度(SiO2)と電気比抵抗(R)との第2相関図を得るようにする。 Prior to the electrical logging, in the present invention, a first correlation diagram between silica concentration ( SiO2 ) and uniaxial compressive strength (qu) is obtained in advance, and a second correlation diagram between silica concentration ( SiO2 ) and electrical resistivity (R) is obtained in advance (first procedure). Specifically, a blending test of improved sand using on-site soil and sand, i.e., a uniaxial compressive strength test is performed while changing the silica concentration of the chemical solution, to obtain the first correlation diagram between silica concentration ( SiO2 ) and uniaxial compressive strength (qu) shown in Fig. 6 , and an electrical resistivity test is performed while changing the silica concentration of the chemical solution to obtain the second correlation diagram between silica concentration ( SiO2 ) and electrical resistivity (R) shown in Fig. 6 .

なお、これら第1相関図と第2相関図とは、横軸のシリカ濃度(SiO2)のスケールを合わせると、図6に示されるように、両相関図を合体させることができる。この合体図によれば、一軸圧縮強さ(qu)と、電気比抵抗(R)と、シリカ濃度(SiO2)との関係が一目で理解できるように図化することができる。 Incidentally, the first and second correlation diagrams can be combined by adjusting the scale of the silica concentration ( SiO2 ) on the horizontal axis, as shown in Fig. 6. This combined diagram makes it possible to plot the relationship between the uniaxial compressive strength (qu), electrical resistivity (R), and silica concentration ( SiO2 ) so that it can be understood at a glance.

そして、前記第1相関図に基づいて、目標とする一軸圧縮強さ(quck)から目標とするシリカ濃度(SiO2)を求める。次いで、前記第2相関図に基づいて、前記目標とするシリカ濃度(SiO2)から目標とする電気比抵抗(Rk)を設定する(第2手順)。 Then, a target silica concentration ( SiO2 ) is calculated from a target unconfined compressive strength (quck) based on the first correlation diagram. Next, a target electrical resistivity (Rk) is set from the target silica concentration ( SiO2 ) based on the second correlation diagram (second procedure).

すなわち、前記第1相関図と第2相関図とから、目標とする一軸圧縮強さ(quck)を満足させるための電気比抵抗(Rk)の数値が設定される。仮に、測定した電気比抵抗(Rimp)が電気比抵抗(Rk)よりも小さい場合は、目標とする一軸圧縮強さ(quck)よりも大きい一軸圧縮強さ(q)が確保されていることになり、測定した電気比抵抗(R)が電気比抵抗(Rimp)よりも大きい場合は、目標とする一軸圧縮強さ(quck)が確保されていないことになる。 In other words, the value of electrical resistivity (Rk) is set to satisfy the target uniaxial compressive strength (quck) from the first and second correlation diagrams. If the measured electrical resistivity (Rimp) is smaller than the electrical resistivity (Rk), then the uniaxial compressive strength (q) greater than the target uniaxial compressive strength (quck) is ensured, and if the measured electrical resistivity (R) is greater than the electrical resistivity (Rimp), then the target uniaxial compressive strength (quck) is not ensured.

従って、地盤改良後に、地盤に縦方向に形成した貫入孔Hを用いて電気検層による電気比抵抗(Rimp)を計測し、改良地盤の電気比抵抗(Rimp)が前記目標とする電気比抵抗(Rk)以下である条件を満たすかどうかで、目標とする一軸圧縮強さ(quck)が確保されているかを判断する(第3手順)。 Therefore, after ground improvement, the electrical resistivity (Rimp) is measured by electrical logging using a penetration hole H drilled vertically in the ground, and whether the target uniaxial compressive strength (quck) has been secured is determined based on whether the condition that the electrical resistivity (Rimp) of the improved ground is equal to or less than the target electrical resistivity (Rk) is satisfied (third step).

〔他の形態例〕
(1)上記形態例では、小型動的コーン貫入試験による1次的効果確認を行い、この次的効果確認によって地盤改良効果が明確でない場合に、前記2次的効果確認を行う2段階の効果確認方法を説明したが、前記1次的効果確認を省略して、2次的効果確認のみで地盤改良効果を確認するようにしてもよい。
[Other examples]
(1) In the above example, a two-stage effect confirmation method was described in which a primary effect confirmation was performed using a small dynamic cone penetration test, and if the ground improvement effect was not clear through this secondary effect confirmation, the secondary effect confirmation was performed. However, the primary effect confirmation may be omitted and the ground improvement effect may be confirmed only through the secondary effect confirmation.

(2)上記形態例では、第1相関図としてシリカ濃度(SiO2)と一軸圧縮強さ(qu)との相関図を用いたが、一軸圧縮強さ(qu)と液状化強度比(RL)とは一定の換算式によって変換が可能である。また、一軸圧縮強さ(qu)と粘着力(c)とも一定の換算式によって変換が可能である。具体的に、一軸圧縮強さ(qu)と液状化強度比(RL)との相関式を図20に示し(出典:浸透固化処理方法 技術マニュアル改訂版 R2年7月 一般財団法人沿岸技術研究センター)、一軸圧縮強さ(qu)と粘着力(c)との相関式を図21に示す(出典:浸透固化処理方法 技術マニュアル改訂版 R2年7月 一般財団法人沿岸技術研究センター)。従って、第1相関図として、シリカ濃度(SiO2)と液状化強度比(RL)又は粘着力(c)との相関図を用いて、前記2次的効果確認を行うようにしてもよい。 (2) In the above embodiment, the correlation diagram between silica concentration (SiO 2 ) and uniaxial compressive strength (qu) was used as the first correlation diagram, but the uniaxial compressive strength (qu) and the liquefaction strength ratio (RL) can be converted using a certain conversion formula. The uniaxial compressive strength (qu) and the cohesive strength (c) can also be converted using a certain conversion formula. Specifically, the correlation formula between the uniaxial compressive strength (qu) and the liquefaction strength ratio (RL) is shown in Figure 20 (Source: Penetration Solidification Treatment Method Technical Manual Revised Edition July 2020, Coastal Technology Research Center, General Incorporated Foundation), and the correlation formula between the uniaxial compressive strength (qu) and the cohesive strength (c) is shown in Figure 21 (Source: Penetration Solidification Treatment Method Technical Manual Revised Edition July 2020, Coastal Technology Research Center, General Incorporated Foundation). Therefore, the above-mentioned secondary effect confirmation may be performed using the correlation diagram between silica concentration (SiO 2 ) and the liquefaction strength ratio (RL) or the cohesive strength (c) as the first correlation diagram.

(3)上記形態例では、第2相関図として、シリカ濃度(SiO2)と電気比抵抗(R)との相関図を用いたが、電気比抵抗と導電率とは換算式によって変換が可能である。具体的に、電気比抵抗(R)と導電率(σ)とは、R(Ω・m)=1/σ(S/m)の関係にある。従って、第2相関図として、シリカ濃度(SiO2)と導電率(σ)との相関図を用いて、前記2次的効果確認を行うようにしてもよい。 (3) In the above embodiment, a correlation diagram between silica concentration ( SiO2 ) and electrical resistivity (R) is used as the second correlation diagram, but electrical resistivity and electrical conductivity can be converted using a conversion formula. Specifically, electrical resistivity (R) and electrical conductivity (σ) have a relationship of R (Ω·m) = 1/σ (S/m). Therefore, the secondary effect may be confirmed by using a correlation diagram between silica concentration ( SiO2 ) and electrical conductivity (σ) as the second correlation diagram.

以下に、地盤改良効果の評価方法に関して、現場で行った具体的な実施例を用いて説明する。 Below, we will explain how to evaluate the effectiveness of ground improvement using specific examples carried out on-site.

現地実験は、某埋立地にて行った。実験は、岸壁から約25m背後位置に直径2.5mの薬液改良体を4体(改良土量:8m3×4体 = 32m3)を造成し、本手法により改良体の改良効果確認を行った。図7に改良体の平面・断面図および調査位置を示す。改良体の仕様は、特殊シリカ液濃度9wt%、注入率40.5%、設計基準強度qu=100kPa(平均値)である。 The field experiment was carried out at a certain reclaimed land. Four chemical improvement bodies with a diameter of 2.5m (improved soil volume: 8m3 x 4 bodies = 32m3 ) were constructed approximately 25m behind the quay, and the improvement effect of the improvement bodies was confirmed using this method. Figure 7 shows the plan and cross-sectional view of the improvement bodies and the survey location. The specifications of the improvement bodies were special silica liquid concentration 9wt%, injection rate 40.5%, and design standard strength qu=100kPa (average value).

1. 実験サイトの概要
図8にBor.事前-1~3の土質柱状図とN値を示し、図9にBor.事前-1の深度毎の粒径加積曲線を示す。地層は地表面から礫混り砂、砂質シルト、礫混り砂、シルト質細砂が堆積する。薬液改良対象層の礫混じり砂は、平均粒径D50=0.89mm、細粒分含有率Fc=3.8%、均等係数Uc=5.14の粗砂で、GL-3m以深には粘土およびシルト層を層状に含む。
1. Overview of the experimental site Figure 8 shows the soil columnar diagrams and N values for Bor. Advance-1 to 3, and Figure 9 shows the grain size accumulation curve for each depth for Bor. Advance-1. From the surface, the strata consist of gravel-mixed sand, sandy silt, gravel-mixed sand, and silty fine sand. The gravel-mixed sand in the layer targeted for chemical improvement is coarse sand with an average grain size D50 = 0.89 mm, fine grain content Fc = 3.8%, and uniformity coefficient Uc = 5.14, and contains layers of clay and silt at depths of GL-3m and below.

図10に地下水の塩分濃度および電気比抵抗の深度分布を示す。地下水の塩分濃度は、図11に示されるように、実験ヤード近くで採取した海水の塩分濃度24,500ppmに対して、700~7,400ppmの範囲にある。 Figure 10 shows the depth distribution of groundwater salinity and electrical resistivity. As shown in Figure 11, the salinity of the groundwater is in the range of 700 to 7,400 ppm, compared to the salinity of 24,500 ppm for seawater collected near the experimental yard.

2. 実験方法
実験は、図7に示す測定位置にて未改良、薬液注入直後(材令0日)および注入後14日(材令14日)に小型動的コーン貫入試験と電気検層を実施した。また、試験終了後、改良体をGL-2.0mまで発掘し、出来形形状を確認するとともに、改良体をブロックサンプリングし、一軸圧縮試験、繰返し三軸試験、三軸CUB試験等を実施し、改良強度を確認した。
2. Experimental method The experiment was carried out at the measurement positions shown in Figure 7, with small dynamic cone penetration tests and electrical logging carried out on the unimproved soil, immediately after injection (material age 0 days), and 14 days after injection (material age 14 days). After the test was completed, the improved soil was excavated to GL-2.0m to confirm the finished shape, and block samples were taken of the improved soil and uniaxial compression tests, cyclic triaxial tests, triaxial CUB tests, etc. were carried out to confirm the improvement strength.

本手法による改良効果確認は、図1に示すフローに従って行った。具体的には、室内試験(配合試験(一軸圧縮強さ試験)、電気比抵抗試験)により、図6に示されるように、事前に、シリカ濃度(SiO2)と一軸圧縮強さ(qu)との第1相関図を得るとともに、シリカ濃度(SiO2)と電気比抵抗(R)との第2相関図を得るようにする。 The improvement effect of this method was confirmed according to the flow shown in Figure 1. Specifically, by performing laboratory tests (mixing test (unconfined compressive strength test), electrical resistivity test), a first correlation diagram between silica concentration ( SiO2 ) and unconfined compressive strength (qu) was obtained in advance, as shown in Figure 6, and a second correlation diagram between silica concentration ( SiO2 ) and electrical resistivity (R).

そして、改良体の一軸圧縮強さ(qu)~薬液シリカ濃度(SiO2)の関係(第1相関図)から設計基準強度(quck)に相当する薬液シリカ濃度(SiO2)を求めた後、電気比抵抗~薬液シリカ濃度(SiO2)の関係(第2相関図)より設計基準強度(quck)に相当する薬液シリカ濃度(SiO2)に相当する電気比抵抗値(Rk)を求める。
すなわち、電気比抵抗(Rk)は、設計基準強度(quck)を満足する電気比抵抗値に相当する。したがって、現地で測定される改良体の電気比抵抗(Rimp)が電気比抵抗(Rk)以下であることが設計基準強度(quck)を満足する改良体であると判断する。本実験では、Bor.事前-3より採取した礫混り砂を用いて、薬液シリカ濃度3,5,7,9wt%の改良砂を現地盤の密度条件にて作製し、配合試験および電気比抵抗試験を実施した。
Then, the chemical solution silica concentration (SiO 2 ) equivalent to the design standard strength (quck) is determined from the relationship between the uniaxial compressive strength (qu) of the improved body and the chemical solution silica concentration (SiO 2 ) (first correlation diagram), and the electrical resistivity value (Rk) equivalent to the chemical solution silica concentration (SiO 2 ) equivalent to the design standard strength (quck) is determined from the relationship between electrical resistivity and the chemical solution silica concentration (SiO 2 ) (second correlation diagram).
In other words, the electrical resistivity (Rk) is equivalent to the electrical resistivity value that satisfies the design standard strength (quck). Therefore, an improved body is judged to satisfy the design standard strength (quck) if the electrical resistivity (Rimp) of the improved body measured on-site is equal to or less than the electrical resistivity (Rk). In this experiment, gravel-mixed sand collected from Bor. Advance-3 was used to prepare improved sand with chemical silica concentrations of 3, 5, 7, and 9 wt% under the density conditions of the on-site ground, and a mix test and electrical resistivity test were carried out.

3. 実験結果
(1) 発掘改良体
図12に未改良砂の粒径加積曲線を示す。GL-2m深度での改良体は箇所によって砂の粒径が異なり、改良体No.1,3は礫混り砂(D50=0.62~0.82mm, Fc=3.8~4.2%)を主体とした改良体、改良体No.2,4はシルト質砂(D50=0.12mm, Fc=38.4%)を主体とした改良体であった。
3. Experimental Results
(1) Excavated and improved bodies Figure 12 shows the grain size accumulation curve of unimproved sand. The grain size of the improved bodies at a depth of GL-2m varies from place to place, with improved bodies No. 1 and 3 being mainly made up of gravel-mixed sand ( D50 = 0.62-0.82mm, Fc = 3.8-4.2%), and improved bodies No. 2 and 4 being mainly made up of silty sand ( D50 = 0.12mm, Fc = 38.4%).

(2) 採取試料の一軸圧縮試験、繰返し三軸試験結果
改良体の一軸圧縮強さ(qu)は、礫混り砂を主体とした改良体(No.1,3)にて、qu = 50~128kPa [平均値:qu=101kPa]、シルト質砂を主体とした改良体(No.4)にて、qu = 82~85 [平均値:qu=83kPa]であった。また、図13のNo.3試料の繰返し三軸試験結果に示すように、改良体No.3の液状化強度比RL20(imp)は、RL20(imp)=1.07で、未改良砂(礫混り砂)の約6倍であった。
(2) Results of uniaxial compression test and cyclic triaxial test of collected samples The uniaxial compressive strength (qu) of the improved bodies was qu = 50-128kPa [average: qu = 101kPa] for the improved bodies mainly composed of gravel-mixed sand (No. 1, 3), and qu = 82-85 [average: qu = 83kPa] for the improved body mainly composed of silty sand (No. 4). As shown in the results of the cyclic triaxial test of sample No. 3 in Figure 13, the liquefaction strength ratio R L20(imp) of the improved body No. 3 was R L20(imp) = 1.07, which was about six times that of the unimproved sand (gravel-mixed sand).

(3) 配合試験・電気比抵抗試験結果
図14に配合試験より得られた改良砂の一軸圧縮強さ(qu)と薬液シリカ濃度(SiO2)の関係を示し、図15に電気比抵抗試験より得られた改良砂の電気比抵抗(R)と薬液シリカ濃度(SiO2)の関係を示す。
(3) Mixing test and electrical resistivity test results Figure 14 shows the relationship between the unconfined compressive strength (qu) of the improved sand obtained from the mixing test and the silica concentration in the chemical solution ( SiO2 ), and Figure 15 shows the relationship between the electrical resistivity (R) of the improved sand obtained from the electrical resistivity test and the silica concentration in the chemical solution ( SiO2 ).

図14に示す配合試験結果は、成形時の試料の乱れを考慮し、破壊ひずみεf<2%の試験結果を用いて、一軸圧縮強さ(qu)と薬液シリカ濃度(SiO2)の相関関係を求めた。図14より、設計基準強度(quck)=100kPaに相当する薬液シリカ濃度は、SiO2 =5wt%程度となる。また、図15より、SiO2 =5wt%に相当する改良体の電気比抵抗値(Rk)は、Rk =5Ω・mとなった。これらの結果より、現地で測定される改良体の電気比抵抗値(平均値)が、Rk (=5Ω・m)以下であれば、改良体の設計基準強度(quck)を満足しているものと判断する。 The results of the blending test shown in Figure 14 were obtained by taking into account the disturbance of the sample during molding and using the test results for fracture strain ε f < 2% to obtain the correlation between the uniaxial compressive strength (qu) and the silica concentration in the chemical solution (SiO 2 ) . From Figure 14, the silica concentration in the chemical solution corresponding to the design standard strength (quck) = 100 kPa is approximately SiO 2 = 5 wt%. Also, from Figure 15, the electrical resistivity value (Rk) of the improved body corresponding to SiO 2 = 5 wt% was Rk = 5 Ω·m. From these results, if the electrical resistivity value (average value) of the improved body measured on-site is Rk (= 5 Ω·m) or less, it is judged that the design standard strength (quck) of the improved body is satisfied.

(4) 小型動的コーン貫入試験・電気検層結果
調査は、図7の調査位置に示すように改良体No.3およびNo.4の改良体中心より、中心近傍位置、中心+60cm位置(改良体半径の1/2)および中心+100cm位置にて行った。改良体の材令は、0日と14日である。図16及び図17に改良体No.3のNd値の深度分布、電気比抵抗(R)の深度分布を示し、図18及び図19に改良体No.4のNd値の深度分布、電気比抵抗(R)の深度分布を示す。
(4) Small dynamic cone penetration test and electrical logging results The surveys were conducted at the near center, +60cm from the center (1/2 the radius of the improvement body), and +100cm from the center of the improvement bodies No.3 and No.4, as shown in Figure 7. The ages of the improvement bodies were 0 days and 14 days. Figures 16 and 17 show the depth distribution of the Nd value and the electrical resistivity (R) of improvement body No.3, and Figures 18 and 19 show the depth distribution of the Nd value and the electrical resistivity (R) of improvement body No.4.

(a)改良体No.3
計画改良深度(GL-1.75m~-3.75m 層厚2m)におけるNd値は、改良体の強度発現が安定する材令14日においてもバラツキが大きい。同材令にて、50cm毎のNd値増分は、概ね1~12の範囲にあるが、GL-3.5m以深では、1程度であった。これは、事前Bor-3等で確認されたGL-3.25m以深に分布する粘性土層の影響が考えられる。
(a) Improved body No.3
The Nd value at the planned improvement depth (GL-1.75m to -3.75m, layer thickness 2m) varies widely even at 14 days of material age, when the strength of the improved body stabilizes. At the same material age, the Nd value increment for every 50cm is generally in the range of 1 to 12, but at depths of GL-3.5m and deeper, it was about 1. This is thought to be due to the influence of the clayey soil layer distributed at depths of GL-3.25m and deeper, which was confirmed in advance by Bor-3 and other studies.

電気比抵抗(Rimp)は、Nd値と比較してバラツキは小さい。前述したように本手法では、25mmと50mmの二種類の電極間隔にて抵抗値を測定し、両電気比抵抗値(Rimp)に大きな差異が無いことで孔壁周辺の乱れがないこと、電極が孔壁へ圧着していることを確認している。材令0日および材令14日の測点No.4では, 二種類の電極間隔から得られる電気比抵抗(Rimp)の差異が大きく、電極の孔壁への圧着不良または測定孔壁周辺の乱れが考えられるため、本改良効果の評価から除外することとする。 Electrical resistivity (Rimp) has less variation compared to Nd values. As mentioned above, with this method, resistance values are measured at two different electrode spacings, 25mm and 50mm, and the lack of a large difference between the two electrical resistivity values (Rimp) confirms that there is no disturbance around the hole wall and that the electrodes are pressed against the hole wall. At measurement point No. 4, where the material is aged 0 days and 14 days, there is a large difference in the electrical resistivity (Rimp) obtained from the two different electrode spacings, which suggests poor adhesion of the electrodes to the hole wall or disturbance around the measurement hole wall, so this point will be excluded from the evaluation of the effects of this improvement.

材令14日測定No.3(改良体中心+100cm)とNo.5(改良体中心近傍)の結果より、GL-1.75m~-3.75mの計画改良深度では、未改良と比較して電気比抵抗(Rimp)が大きく低下していることがわかる。また、GL-1.75m~-3.5mの電気比抵抗(Rimp)は、Rimp=3.1~6.8Ω・mの範囲にあり、平均値は5Ω・mであった。 The results of measurements No. 3 (100cm from the center of the improved body) and No. 5 (near the center of the improved body) taken at 14 days of age show that at the planned improvement depth of GL-1.75m to -3.75m, electrical resistivity (Rimp) is significantly lower than unimproved. In addition, electrical resistivity (Rimp) from GL-1.75m to -3.5m was in the range of Rimp = 3.1 to 6.8 Ω·m, with an average value of 5 Ω·m.

一方、GL-3.5m以深の電気比抵抗値(Rimp)は、粘土層の影響を受け、10Ω・m程度であった。前述した設計規準強度を満足する電気比抵抗値(Rk)より、一軸圧縮強さ(qu)を推定すると、GL-1.75m~-3.5m範囲では一軸圧縮強さ(qu)≧100kPaとなり、目標改良強度を満足すると評価できる。これらの結果は、改良体より採取したブロックサンプリング試料の一軸圧縮強さ(qu)と比較しても概ね妥当である。 Meanwhile, the electrical resistivity value (Rimp) at depths of GL-3.5m and deeper was around 10 Ω·m, influenced by the clay layer. When the unconfined compressive strength (qu) is estimated from the electrical resistivity value (Rk) that satisfies the design criteria strength mentioned above, the unconfined compressive strength (qu) is ≧100 kPa in the range of GL-1.75m to -3.5m, which can be evaluated as satisfying the target improvement strength. These results are generally appropriate when compared with the unconfined compressive strength (qu) of block sampling samples taken from the improved body.

(b)改良体No.4
計画改良深度(GL-1.75m~-3.75m 層厚2m)におけるNd値は、改良体No.3と同様に、材令14日にてバラツキが大きい。また、同材令にて50cm毎のNd値増分は、概ね1~15の範囲にあるが、GL-3.25m以深では、1~2程度であった。これは、粘性土層、シルト質砂層の影響が考えられる。
(b) Improved body No.4
The Nd values at the planned improvement depth (GL-1.75m to -3.75m, layer thickness 2m) showed a large variation at 14 days of material age, similar to that of improvement body No. 3. Also, at the same material age, the Nd value increment per 50cm was generally in the range of 1 to 15, but at depths of GL-3.25m and deeper, it was about 1 to 2. This is thought to be due to the influence of the clayey soil layer and silty sand layer.

電気比抵抗(Rimp)は、材令0測点No.5,6,7および材令14日測点No.7では、改良天端からGL-2.5m~3.0m程度までは、電気比抵抗(Rimp)=5Ω・m程度(平均値)であった。また、電気比抵抗値(Rimp)は材令による差異はほとんどない。
一方、材令0測点No.5,6,7では、GL-3m以深にて改良前後の変化は見られない。また、材令14日測点No.7では、GL-3.25m以深にて改良前後の変化は小さい結果であった。同箇所の改良体は、発掘写真およびブロックサンプリングした試料より、シルト質砂層(Fc=40%程度)を層状に含むことから、これらの影響が考えられる。
At measurement points 5, 6, and 7 where the material age was 0, and at measurement point 7 where the material age was 14 days, the electrical resistivity (Rimp) was about 5 Ω·m (average value) from the top of the improved area to GL-2.5m to GL-3.0m. There was also almost no difference in the electrical resistivity (Rimp) due to material age.
On the other hand, at measurement points 5, 6, and 7, where the material age is 0, no change was observed before and after improvement at depths of GL-3m or deeper. Additionally, at measurement point 7, where the material age is 14 days, the change before and after improvement was small at depths of GL-3.25m or deeper. Excavation photographs and block sample samples show that the improved body at this location contains layers of silty sand (Fc=about 40%), so these influences are thought to be the cause.

なお、前記2次的効果確認でも明確に改良効果が確認できない場合は、別孔で再度電気検層を行ったり、繰り返し三軸試験等を行うことなどを別途検討する。 If the improvement effect cannot be clearly confirmed even after the secondary effect check, we will consider conducting electrical logging again in a separate hole or repeating triaxial tests, etc.

4. まとめ
本実験では、沿岸域埋立地の薬液改良体を対象に小型動的コーンと電気検層を組み合わせた本手法を適用し、電気検層の適用範囲の検証と本手法による改良効果の評価を行った。以下に結論を示す。
(1)小型動的コーン貫入試験より得られた改良後のNd値は、バラツキが大きいものの、計画改良深度にてNd値の増分が確認された。また、材令0日と14日の差異はほとんど見られず、バラツキの影響は大きいと考えられる。
4. Summary In this experiment, we applied this method, which combines a small dynamic cone and electrical logging, to the chemically improved body of a coastal reclaimed land, to verify the scope of application of electrical logging and to evaluate the improvement effect of this method. The conclusions are as follows.
(1) The Nd values obtained from the small dynamic cone penetration test after improvement showed a large variation, but an increase in the Nd value was confirmed at the planned improvement depth. In addition, there was almost no difference between the material ages of 0 and 14 days, and it is considered that the influence of variation is large.

(2)押込型マイクロ電気検層法(点電極、二極法、電極間隔25,50mmの二種類)より得られた改良地盤の電気比抵抗(Rimp)は、地下水の塩分濃度が700~7,400ppmの範囲にある当該地にて、薬液注入前後の比抵抗変化が明確に見られた。 (2) The electrical resistivity (Rimp) of the improved ground obtained by the push-in type micro-electrical logging method (two types: point electrode and two-pole method, electrode spacing 25 and 50 mm) showed a clear change in resistivity before and after the injection of chemicals in the area where the groundwater salinity was in the range of 700 to 7,400 ppm.

(3)本手法による改良効果の評価は、現地砂を用いた配合試験および電気比抵抗試験より得られる一軸圧縮強さ~薬液シリカ濃度関係(第1相関図)および電気比抵抗~薬液シリカ濃度関係(第2相関図)に基づき、本電気検層より得られる電気比抵抗値(Rimp)から改良効果の評価が可能である。 (3) The improvement effect of this method can be evaluated from the electrical resistivity value (Rimp) obtained from this electrical logging based on the relationship between unconfined compressive strength and chemical solution silica concentration (first correlation diagram) and the relationship between electrical resistivity and chemical solution silica concentration (second correlation diagram) obtained from mix tests and electrical resistivity tests using local sand.

(4)本電気検層法は、間隔の異なる電極を用いることで測定データの検証を行う。本実験の測定データにおいても、一部、異なる電極間隔の測定結果に乖離がある箇所も見られたが、多くの測定値は、本チェック機能によりデータの信頼性は高いと考えられる。 (4) This electrical logging method verifies the measurement data by using electrodes with different spacing. Even in the measurement data from this experiment, there were some areas where the measurement results for different electrode spacings showed discrepancies, but the reliability of most of the measurement data is considered to be high thanks to this checking function.

以上より、小型動的コーン試験と押込型マイクロ検層を併用した本改良効果確認手法は、電気検層に測定データのチェック機能を備えることで、データの信頼性が高く、薬液注入工法の改良効果確認に有効であることがわかった。 From the above, it was found that this method of confirming the improvement effect, which combines small dynamic cone testing and push-type micro logging, is effective in confirming the improvement effect of the chemical injection method because it provides a function to check the measurement data in the electrical logging, and the data is highly reliable.

1…圧入装置、2…測定プローブ、3…電流電極、4…電位電極、5…貫入ロッド、6…雄ねじ部、7…電気ケーブル、8…外装スリーブ、9…中間部、10…本体部、11…先端部、12…外装スリーブ本体、13…外装スリーブ先端、14…中空部、15…外側電極(電流電極)、16…外側電極(電位電極)、17…接触促進用凸部、18…周方向固定用凸部、19…嵌合部、20…ピストン、21…架台、22…チャック、23…コントロールユニット、24…油圧ユニット、H…貫入孔 1... Press-in device, 2... Measurement probe, 3... Current electrode, 4... Potential electrode, 5... Penetration rod, 6... Male threaded portion, 7... Electric cable, 8... Outer sleeve, 9... Middle portion, 10... Main body, 11... Tip portion, 12... Outer sleeve main body, 13... Outer sleeve tip, 14... Hollow portion, 15... Outer electrode (current electrode), 16... Outer electrode (potential electrode), 17... Contact promoting protrusion, 18... Circumferential fixing protrusion, 19... Fitting portion, 20... Piston, 21... Stand, 22... Chuck, 23... Control unit, 24... Hydraulic unit, H... Penetration hole

Claims (4)

薬液注入工法による地盤改良効果の評価方法であって、
事前に、破壊ひずみε f <2%の試験結果を用いてシリカ濃度(SiO2)と一軸圧縮強さ(qu)との第1相関図を得るとともに、シリカ濃度(SiO2)と電気比抵抗(R)との第2相関図を得る1手順と、
前記第1相関図に基づいて、目標とする一軸圧縮強さ(quck)から目標とするシリカ濃度(SiO2)を求め、次いで前記第2相関図に基づいて、前記目標とするシリカ濃度(SiO2)から目標とする電気比抵抗(Rk)を設定する第2手順と、
地盤改良後に、地盤に縦方向に形成した貫入孔を用いて電気検層による電気比抵抗(Rimp)を計測し、改良地盤の電気比抵抗(Rimp)が前記目標とする電気比抵抗(Rk)以下である条件を満たすかどうかで、目標とする一軸圧縮強さ(quck)が確保されているかを判断する第3手順とからなることを特徴とする薬液注入工法による地盤改良効果の評価方法。
A method for evaluating the effect of ground improvement using a chemical grouting method, comprising:
A procedure of obtaining a first correlation diagram between silica concentration (SiO 2 ) and uniaxial compressive strength (q u ) in advance using the test results of fracture strain ε f <2%, and obtaining a second correlation diagram between silica concentration (SiO 2 ) and electrical resistivity (R);
A second step of determining a target silica concentration (SiO 2 ) from a target unconfined compressive strength (quck) based on the first correlation diagram, and then setting a target electrical resistivity (Rk) from the target silica concentration (SiO 2 ) based on the second correlation diagram;
A method for evaluating the effect of ground improvement using a chemical injection method, characterized in that it comprises a third step of measuring the electrical resistivity (Rimp) by electrical logging using a penetration hole formed vertically in the ground after the ground improvement, and determining whether the target uniaxial compressive strength (quck) has been secured based on whether the electrical resistivity (Rimp) of the improved ground satisfies the condition that it is equal to or lower than the target electrical resistivity (Rk).
薬液注入工法による地盤改良効果の評価方法であって、
事前に、破壊ひずみε f <2%の試験結果を用いてシリカ濃度(SiO2)と液状化強度比(RL)又は粘着力(c)との第1相関図を得るとともに、シリカ濃度(SiO2)と電気比抵抗(R)との第2相関図を得る1手順と、
前記第1相関図に基づいて、目標とする液状化強度比(RL)又は粘着力(c)から目標とするシリカ濃度(SiO2)を求め、次いで前記第2相関図に基づいて、前記目標とするシリカ濃度(SiO2)から目標とする電気比抵抗(Rk)を設定する第2手順と、
地盤改良後に、地盤に縦方向に形成した貫入孔を用いて電気検層による電気比抵抗(Rimp)を計測し、改良地盤の電気比抵抗(Rimp)が前記目標とする電気比抵抗(Rk)以下である条件を満たすかどうかで、目標とする一軸圧縮強さ(quck)が確保されているかを判断する第3手順とからなることを特徴とする薬液注入工法による地盤改良効果の評価方法。
A method for evaluating the effect of ground improvement using a chemical grouting method, comprising:
A procedure of obtaining a first correlation diagram between silica concentration ( SiO2 ) and liquefaction resistance ratio (RL) or cohesion (c) in advance using the test results for fracture strain εf < 2%, and obtaining a second correlation diagram between silica concentration ( SiO2 ) and electrical resistivity (R);
A second step of determining a target silica concentration (SiO2) from a target liquefaction strength ratio (RL) or cohesion (c) based on the first correlation diagram, and then setting a target electrical resistivity (Rk) from the target silica concentration ( SiO2 ) based on the second correlation diagram;
A method for evaluating the effect of ground improvement using a chemical injection method, characterized in that it comprises a third step of measuring the electrical resistivity (Rimp) by electrical logging using a penetration hole formed vertically in the ground after the ground improvement, and determining whether the target uniaxial compressive strength (quck) has been secured based on whether the electrical resistivity (Rimp) of the improved ground satisfies the condition that it is equal to or lower than the target electrical resistivity (Rk).
薬液注入工法による地盤改良効果の評価方法であって、
事前に、破壊ひずみε f <2%の試験結果を用いてシリカ濃度(SiO2)と一軸圧縮強さ(qu)との第1相関図を得るとともに、シリカ濃度(SiO2)と導電率(σ)との第2相関図を得る1手順と、
前記第1相関図に基づいて、目標とする一軸圧縮強さ(quck)から目標とするシリカ濃度(SiO2)を求め、次いで前記第2相関図に基づいて、前記目標とするシリカ濃度(SiO2)から目標とする導電率(σc)を設定する第2手順と、
地盤改良後に、地盤に縦方向に形成した貫入孔を用いて電気検層による電気比抵抗(Rimp)を計測し、これから地盤改良後の導電率(σimp)を算出し、改良地盤の導電率(σimp)が前記目標とする導電率(σc)以上である条件を満たすかどうかで、目標とする一軸圧縮強さ(quck)が確保されているかを判断する第3手順とからなることを特徴とする薬液注入工法による地盤改良効果の評価方法。
A method for evaluating the effect of ground improvement using a chemical grouting method, comprising:
A procedure of obtaining a first correlation diagram between silica concentration (SiO 2 ) and uniaxial compressive strength (q u ) in advance using the test results of fracture strain ε f <2%, and obtaining a second correlation diagram between silica concentration (SiO 2 ) and electrical conductivity (σ);
A second step of determining a target silica concentration (SiO 2 ) from a target unconfined compressive strength (q uck ) based on the first correlation diagram, and then setting a target electrical conductivity (σ c ) from the target silica concentration (SiO 2 ) based on the second correlation diagram;
This method for evaluating the effect of ground improvement using a chemical injection method is characterized by comprising a third step of measuring the electrical resistivity (Rimp) by electrical logging using a penetration hole formed vertically in the ground after the ground improvement, calculating the electrical conductivity (σimp) after the ground improvement from this, and judging whether the target uniaxial compressive strength (quck) has been secured based on whether the electrical conductivity (σimp) of the improved ground satisfies the condition that it is equal to or greater than the target electrical conductivity (σc).
地盤改良前後において、小型動的コーン貫入試験により深度とNd値との関係を示したNd値の深度分布図を得て、地盤改良前後における前記Nd値の増分量から地盤改良効果を評価する1次的効果確認を行い、
前記1次的効果確認によって地盤改良効果が明確でない場合に、2次的効果確認として、前記小型動的コーン貫入試験の貫入孔を用いて電気比抵抗(Rimp)を計測し、請求項1~3いずれかに記載の方法によって地盤改良効果を評価することを特徴とする薬液注入工法による地盤改良効果の評価方法。
Before and after ground improvement, a small dynamic cone penetration test was used to obtain a depth distribution map of the Nd value showing the relationship between depth and the Nd value, and a primary effect confirmation was performed to evaluate the effect of the ground improvement from the increment in the Nd value before and after the ground improvement.
A method for evaluating the effect of ground improvement using a liquid injection method, characterized in that, when the effect of ground improvement is not clear by the primary effect confirmation, as a secondary effect confirmation, electrical resistivity (Rimp) is measured using the penetration hole of the small dynamic cone penetration test, and the effect of ground improvement is evaluated by a method according to any one of claims 1 to 3.
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