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JP7714892B2 - Method for manufacturing RTB based sintered magnet - Google Patents
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JP7714892B2 - Method for manufacturing RTB based sintered magnet - Google Patents

Method for manufacturing RTB based sintered magnet

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JP7714892B2
JP7714892B2 JP2021049199A JP2021049199A JP7714892B2 JP 7714892 B2 JP7714892 B2 JP 7714892B2 JP 2021049199 A JP2021049199 A JP 2021049199A JP 2021049199 A JP2021049199 A JP 2021049199A JP 7714892 B2 JP7714892 B2 JP 7714892B2
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support plate
compact
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sintered magnet
sintering
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JP2022147795A (en
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剛志 村田
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Proterial Ltd
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    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
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Description

本発明はR-T-B系焼結磁石の製造方法に関する。 The present invention relates to a method for producing R-T-B based sintered magnets.

近年、希土類系焼結磁石は、高い需要を示しており、その中でも、R-T-B系焼結磁石(Rは希土類元素のうち少なくとも1種であり、NdおよびPrの少なくとも1種を含む。Tは主にFeであり、Bは硼素である)は、最も高性能な磁石として知られており、ハードディスクドライブのボイスコイルモータ(VCM)、電気自動車用(EV、HV、PHVなど)モータ、産業機器用モータなどの各種モータや家電製品などに使用されている。R-T-B系焼結磁石は、各種モータ等の小型、軽量化を通じて、省エネルギー、環境負荷低減に貢献している。 Rare earth sintered magnets have been in high demand in recent years, and among them, R-T-B sintered magnets (R is at least one rare earth element, including at least one of Nd and Pr; T is primarily Fe; B is boron) are known as the highest performance magnets, and are used in a variety of motors and home appliances, including voice coil motors (VCMs) for hard disk drives, motors for electric vehicles (EVs, HVs, PHVs, etc.), and motors for industrial equipment. R-T-B sintered magnets contribute to energy conservation and reduced environmental impact by making various motors smaller and lighter.

このようなR-T-B系焼結磁石は、例えば、R-T-B系合金粉末を準備する工程、前記R-T-B系合金粉末を成形することによって成形体を作製する工程、前記成形体を焼結する工程を経て製造される。前記成形体を焼結する場合には、例えばモリブデン等の高融点金属材料で形成された支持板上に前記成形体が載置された焼結容器を1000℃~1100℃程度の温度に加熱して焼結処理を施す。この時、例えば焼結容器の直接的影響の他、酸素や炭素等の影響によって、焼結体の変形を引き起こす場合がある。 Such R-T-B based sintered magnets are manufactured, for example, through the steps of preparing an R-T-B based alloy powder, forming the R-T-B based alloy powder into a compact, and sintering the compact. When sintering the compact, the compact is placed on a support plate made of a high-melting-point metal material such as molybdenum and the sintering container is heated to a temperature of approximately 1000°C to 1100°C. During this process, deformation of the sintered body may occur due to the direct influence of the sintering container, as well as the influence of oxygen, carbon, etc.

特許文献1には、焼結雰囲気中の酸素を除去するために焼結ケースにゲッタ材を配置しこれにより焼結後の希土類焼結磁石における焼結体の変形を抑制することが提案されている。 Patent Document 1 proposes placing a getter material in the sintering case to remove oxygen from the sintering atmosphere, thereby suppressing deformation of the sintered body of a rare earth sintered magnet after sintering.

特開2002-25842号公報Japanese Patent Application Laid-Open No. 2002-25842

特許文献1に記載の方法により酸素や炭素の影響を低下させることが可能になるものの、焼結体の変形防止には不十分な場合があった。
本開示の実施形態は、焼結後の希土類焼結磁石における焼結体の変形を抑制するR-T-B系焼結磁石の製造方法を提供する。
Although the method described in Patent Document 1 can reduce the effects of oxygen and carbon, it may not be sufficient to prevent deformation of the sintered body.
An embodiment of the present disclosure provides a method for producing an RTB based sintered magnet that suppresses deformation of the sintered body of a rare earth sintered magnet after sintering.

本開示のR-T-B系焼結磁石の製造方法は、例示的な実施形態において、R-T-B系(Rは希土類元素であり、Nd、PrおよびCeからなる群から選択された少なくとも1つを必ず含み、Tは遷移金属元素のうち少なくとも1種であり、Feを必ず含む)合金粉末を準備する工程と、前記R-T-B系合金粉末を成形することによって直方体状の成形体を作製する工程と、前記成形体の少なくとも1つの面の辺端部を面取りする工程と、
前記辺端部を面取りした面と支持板とが接触するように面取り後の成形体を前記支持板上に載置する工程と、前記支持板上に載置された成形体を焼結する工程と、を含む。
In an exemplary embodiment, a method for producing an R-T-B based sintered magnet according to the present disclosure includes the steps of: preparing an R-T-B based alloy powder (R is a rare earth element and always includes at least one selected from the group consisting of Nd, Pr, and Ce; T is at least one transition metal element and always includes Fe); compacting the R-T-B based alloy powder to produce a rectangular parallelepiped compact; and chamfering an edge of at least one surface of the compact.
The method includes a step of placing the chamfered molded body on a support plate so that the chamfered surface of the edge portion comes into contact with the support plate, and a step of sintering the molded body placed on the support plate.

ある実施形態において、前記直方体状の成形体の最も短い辺を厚さとするとき、前記辺部を面取りした面は前記厚さ方向に垂直な面である。 In one embodiment, when the shortest side of the rectangular parallelepiped molded body is defined as the thickness, the chamfered surface of the edge is a surface perpendicular to the thickness direction.

ある実施形態において、前記厚さは7mm以下である。 In one embodiment, the thickness is 7 mm or less.

本開示の実施形態によれば、焼結後の希土類焼結磁石における焼結体の変形を抑制するR-T-B系焼結磁石の製造方法を提供することができる。 Embodiments of the present disclosure can provide a method for manufacturing an R-T-B based sintered magnet that suppresses deformation of the sintered body of a rare earth sintered magnet after sintering.

本開示における直方体状の成形体の例を示す説明図である。FIG. 2 is an explanatory diagram showing an example of a rectangular parallelepiped molded body according to the present disclosure. 面取り前における、直方体状の成形体の例を示す説明図である。FIG. 2 is an explanatory diagram showing an example of a rectangular parallelepiped molded body before chamfering. 面取り後における、直方体状の成形体の例を示す説明図である。FIG. 10 is an explanatory diagram showing an example of a rectangular parallelepiped molded body after chamfering. 辺端部を面取りした面と支持板とが接触するように成形体を支持板上に載置した状態を示す説明図である。FIG. 10 is an explanatory diagram showing a state in which the molded body is placed on a support plate so that the chamfered edge surface comes into contact with the support plate.

本発明者は、直方体状の成形体を焼結する場合において、焼結時の酸化の影響を詳細に検討した所、成形体の端部の方が中央部の方よりも酸化しやすいために、辺端部の厚みが中央部の厚みよりも大きくなることが分かった。そのため、焼結時に成形体を載置する支持板と接触する成形体の面の辺端部(支持板と接触する成形体の面の周囲にあるすべての辺)を支点として成形体中央部が持ちあげられ、焼結中に中央部が自重で垂れ下がることにより、得られた焼結体に変形(反り)が発生することが分かった。また、これらの傾向は厚さの薄く(7mm以下)扁平な直方体状のときに特に顕著にみられることが分かった。これらの知見をもとに更に検討した結果、成形体の少なくとも1つの面の辺端部に対して面取りを行い、面取りを行った面と支持板とが接触するように成形体を支持板上に載置することにより、厚さの薄い(7mm以下)の扁平な直方体状の成形体であっても変形を抑制することができることを見出した。これは、支持板と接触する成形体の面の辺端部を面取りすることにより、成形体中央部に持ちあげる支点をなくすことが出来るからだと考えられる。 The inventors conducted a detailed study of the effects of oxidation during sintering of rectangular solid bodies. They found that because the edges of the body are more susceptible to oxidation than the center, the thickness of the edge portions is greater than the thickness of the center. Therefore, the center of the body is lifted using the edge portions (all edges around the surface of the body that contacts the support plate) of the surface of the body that contacts the support plate on which the body is placed during sintering as fulcrums. This center portion sags under its own weight during sintering, resulting in deformation (warping) of the resulting sintered body. Furthermore, they found that this tendency is particularly pronounced in thin (7 mm or less) flat rectangular solids. Based on these findings, further study revealed that deformation can be suppressed even for thin (7 mm or less) flat rectangular solids by chamfering at least one edge of the body and placing the body on the support plate so that the chamfered surface contacts the support plate. This is thought to be because by chamfering the edges of the surface of the molded body that comes into contact with the support plate, it is possible to eliminate the fulcrum at the center of the molded body that lifts it up.

(R-T-B系焼結磁石)
本開示のR-T-B系焼結磁石は、例えば以下の組成を有する。
R:27~35mass%、
B:0.80~1.20mass%、
Ga:0~1.0mass%、
Cu:0~0.5mass%、
T:60mass%以上を含有する。
(RTB based sintered magnet)
The RTB based sintered magnet of the present disclosure has, for example, the following composition.
R: 27-35 mass%,
B: 0.80 to 1.20 mass%,
Ga: 0 to 1.0 mass%,
Cu: 0 to 0.5 mass%,
T: Contains 60 mass% or more.

(R:27~35mass%)
Rは希土類元素であり、Nd、PrおよびCeからなる群から選択された少なくとも1つを必ず含む。Rが27mass%未満では焼結過程で液相が十分に生成せず、焼結体を充分に緻密化することが困難になる可能性がある。一方、Rが35mass%を超えると焼結時に粒成長が起こり、HcJが低下する可能性がある。Rの含有量は、好ましくは29.5~33.0mass%である。Rがこのような範囲であれば、より高いBを得ることができる。
(R: 27-35 mass%)
R is a rare earth element and must contain at least one element selected from the group consisting of Nd, Pr, and Ce. If the R content is less than 27 mass%, a liquid phase may not be sufficiently generated during the sintering process, making it difficult to sufficiently densify the sintered body. On the other hand, if the R content exceeds 35 mass%, grain growth may occur during sintering, potentially reducing HcJ . The R content is preferably 29.5 to 33.0 mass%. If the R content is within this range, a higher B r can be obtained.

(B:0.80~1.20mass%)
Bが0.80mass%未満であると、Bが低下する可能性がある。一方、Bが1.20mass%を超えるとHcJが低下する可能性がある。Bの含有量は、好ましくは0.88~0.90mass%である。Bがこのような範囲であれば、より高いHcJが得られる。
(B:0.80~1.20mass%)
If B is less than 0.80 mass%, B r may decrease. On the other hand, if B exceeds 1.20 mass%, H cJ may decrease. The B content is preferably 0.88 to 0.90 mass%. If B is in this range, a higher H cJ can be obtained.

(Ga:0~1.0mass%)
Gaの含有量は、0~1.0mass%が好ましく、より好ましくは、0.2~0.7mass%である。Gaがこのような範囲であれば、より高いHcJが得られる。
(Ga: 0 to 1.0 mass%)
The Ga content is preferably 0 to 1.0 mass%, more preferably 0.2 to 0.7 mass%, and within this range, a higher HcJ can be obtained.

(Cu:0~0.50mass%)
Cuの含有量は、0~0.50mass%が好ましく、より好ましくは0.05~0.30mass%である。Cuがこのような範囲であれば、より高いHcJが得られる。
(Cu: 0 to 0.50 mass%)
The Cu content is preferably 0 to 0.50 mass%, more preferably 0.05 to 0.30 mass%. If the Cu content is in this range, a higher HcJ can be obtained.

(T:60mass%以上)
Tは遷移金属元素のうち少なくとも1種であり、Feを必ず含む。
焼結磁石中のTの含有量が60mass%未満であると、磁気特性が大幅に低下する可能性がある。Tの含有量は61.5~69.5mass%が好ましい。また、Tの全量を100mass%としたとき、その10mass%以下をCoで置換できる。例えば、Tの全量の90mass%がFeであり、10mass%がCoであり得る。また、Tの全量(100mass%)をFeにしてもよい。Coを含有することにより耐食性を向上させることができるが、Coの置換量がFeの10mass%を超えると、高いBが得られない可能性がある。
本発明の焼結磁石は、任意のその他の元素を更に含んでよい。
(T: 60mass% or more)
T is at least one transition metal element, and always includes Fe.
If the T content in the sintered magnet is less than 60 mass%, the magnetic properties may be significantly degraded. The T content is preferably 61.5 to 69.5 mass%. Furthermore, when the total amount of T is 100 mass%, up to 10 mass% of that can be substituted with Co. For example, 90 mass% of the total amount of T can be Fe and 10 mass% can be Co. Alternatively, the total amount of T (100 mass%) may be Fe. Although the inclusion of Co can improve corrosion resistance, if the amount of Co substituted exceeds 10 mass% of Fe, a high Br may not be obtained.
The sintered magnet of the present invention may further contain any other elements.

以下、R-T-B系焼結磁石の製造方法について説明する。
(1)R-T-B系合金粉末を準備する工程
目標組成となるようにそれぞれの元素の金属または合金を準備し、これらをストリップキャスティング法等を用いてフレーク状の合金を製造する。
得られたフレーク状の合金を水素粉砕し、粗粉砕粉のサイズを例えば1.0mm以下とする。次に、粗粉砕粉をジェットミル等により微粉砕することで、例えばメジアン径d50(気流分散法によるレーザー回折法で得られた値)が2.5μm≦d50≦4.5μmの微粉砕粉(合金粉末)を得る。なお、ジェットミル粉砕前の粗粉砕粉、ジェットミル粉砕中およびジェットミル粉砕後の合金粉末に、助剤として公知の潤滑剤を使用してもよい。d50は、気流分散式レーザー回折法(JIS Z 8825:2013年改訂版に準拠する)により測定することができる。すなわち、本開示において、d50は、小粒径側からの積算粒度分布(体積基準)が50%となる粒径(メジアン径)を意味する。
なお本開示におけるd50は、Sympatec社製の粒度分布測定装置「HELOS&RODOS」において
分散圧:4bar
測定レンジ:R2
計算モード:HRLD
の条件にて測定されたd50を示す。
The method for producing a sintered RTB based magnet will now be described.
(1) Step of Preparing RTB-Based Alloy Powder Metals or alloys of the respective elements are prepared so as to achieve the target composition, and these are then subjected to strip casting or the like to produce alloy flakes.
The obtained flake-shaped alloy is subjected to hydrogen pulverization to reduce the size of the coarsely pulverized powder to, for example, 1.0 mm or less. The coarsely pulverized powder is then finely pulverized using a jet mill or the like to obtain a finely pulverized powder (alloy powder) having a median diameter d50 (a value obtained by laser diffraction using an airflow dispersion method) of, for example, 2.5 μm≦d50≦4.5 μm. Note that a known lubricant may be used as an auxiliary agent in the coarsely pulverized powder before jet mill pulverization, and in the alloy powder during and after jet mill pulverization. d50 can be measured using an airflow dispersion laser diffraction method (in accordance with JIS Z 8825: 2013 revised edition). In other words, in this disclosure, d50 refers to the particle size (median diameter) at which the cumulative particle size distribution (volume basis) from the small particle size side is 50%.
In this disclosure, d50 is measured using a particle size distribution measuring device "HELOS &RODOS" manufactured by Sympatec. Dispersion pressure: 4 bar
Measurement range: R2
Calculation mode: HRLD
The d50 measured under the conditions is shown.

(2)直方体状の成形体を作製する工程
得られた合金粉末を用いて磁界中成形を行い、成形体を得る。磁界中成形は、金型のキャビティー内に乾燥した合金粉末を挿入し、磁界を印加しながら成形する乾式成形法、金型のキャビティー内に該合金粉末を分散させたスラリーを注入し、スラリーの分散媒を排出しながら成形する湿式成形法を含む既知の任意の磁界中成形方法を用いてよい。本開示における直方体状の成形体の例を図1に示す。本開示における成形体の少なくとも1つの面の辺端部とは、例えば図1では、成形体100における面1の周囲にあるすべての辺2を辺端部という。また、本開示における厚さとは、直方体の最も短い辺であり、例えば図1では辺3が厚さとなる。直方体状の成形体の寸法は、例えば長さ20mm×幅10mm×厚さ5mmであり得る。本開示では、厚さの薄い扁平な直方体状の成形体に対しても変形を抑制することができるため、成形体の厚さは7mm以下が好ましく、さらに好ましくは5mm以下である。
(2) Step of Preparing a Rectangular Compact: The obtained alloy powder is subjected to magnetic field compaction to obtain a compact. Any known magnetic field compaction method may be used for magnetic field compaction, including a dry compaction method in which dried alloy powder is inserted into a mold cavity and compacted while a magnetic field is applied, and a wet compaction method in which a slurry containing the alloy powder is poured into a mold cavity and compacted while the slurry's dispersion medium is discharged. An example of a rectangular compact in the present disclosure is shown in FIG. 1. The edge portions of at least one surface of the compact in the present disclosure refer to all edges 2 surrounding surface 1 of compact 100 in FIG. 1, for example. Furthermore, the thickness in the present disclosure refers to the shortest side of the rectangular solid, e.g., side 3 in FIG. 1. The dimensions of the rectangular compact may be, for example, 20 mm long x 10 mm wide x 5 mm thick. In the present disclosure, deformation can be suppressed even for thin, flat rectangular compacts, so the thickness of the compact is preferably 7 mm or less, and more preferably 5 mm or less.

(3)成形体の少なくとも1つの面の辺端部を面取りする工程
得られた成形体の少なくとも1つの面の辺端部に面取りを行う。図2Aは面取り前における、直方体状の成形体の例を示す説明図であり、図2Bは、面取り後における、直方体状の成形体の例を示す説明図である。図2Aおよび図2Bに示すように、図2Aの成形体200における面4の辺端部(面4の周囲にあるすべての辺5)に面取りを行うことで図2Bに示すように成形体200の面4の辺端部が面取りされた状態となる。面取りは、辺端部における角の先端から0.5mm~2mmの深さ(C0.5~C2mm)で切削加工することが好ましい。面取り方法は特に問わない。公知の方法で行えばよい。例えば、ヘラやナイフなどで削ぎ落してもよい。
(3) Step of chamfering the edge of at least one surface of the molded body The edge of at least one surface of the obtained molded body is chamfered. FIG. 2A is an explanatory diagram showing an example of a rectangular parallelepiped molded body before chamfering, and FIG. 2B is an explanatory diagram showing an example of a rectangular parallelepiped molded body after chamfering. As shown in FIGS. 2A and 2B, by chamfering the edge of surface 4 (all edges 5 around surface 4) of molded body 200 in FIG. 2A, the edge of surface 4 of molded body 200 is chamfered as shown in FIG. 2B. The chamfering is preferably performed by cutting to a depth of 0.5 mm to 2 mm (C0.5 to C2 mm) from the tip of the corner of the edge. There is no particular restriction on the chamfering method. It may be performed by a known method. For example, it may be scraped off using a spatula or knife.

(4)成形体を支持板上に載置する工程
前記(3)の工程にて、少なくとも1つの面を面取りした成形体を支持板上に載置する。図3は、辺端部を面取りした面と支持板とが接触するように面取り後の成形体を支持板上に載置した状態を示す説明図である。図3に示すように本開示では、面取りされた辺端部を有する面4を支持板6に接触するように成形体200を支持板6上に載置する。これにより、焼結時に成形体中央部が持ちあげることを抑制することができるため、得られた焼結後の希土類焼結磁石における焼結体の変形を抑制することができる。好ましくは、図3に示すように辺端部を面取りした面は厚さ方向に垂直な面である。もっとも短い辺である厚さの方向に垂直な面がより変形しやすいため、この面を面取りすることで得られた焼結体の変形をより確実に抑制することができる。また、支持板の材料としては、モリブデンおよびステンレス鋼などがあげられる。
(4) Step of Placing the Compacted Body on a Support Plate In step (3), the compacted body with at least one chamfered surface is placed on a support plate. FIG. 3 is an explanatory diagram showing the state in which the chamfered compact is placed on a support plate so that the chamfered edge contacts the support plate. In the present disclosure, as shown in FIG. 3, the compacted body 200 is placed on the support plate 6 so that the surface 4 having the chamfered edge contacts the support plate 6. This prevents the center of the compact from lifting during sintering, thereby suppressing deformation of the resulting sintered rare earth sintered magnet. Preferably, as shown in FIG. 3, the chamfered edge surface is perpendicular to the thickness direction. Because the surface perpendicular to the thickness direction, which is the shortest side, is more susceptible to deformation, chamfering this surface more reliably suppresses deformation of the resulting sintered body. Examples of materials for the support plate include molybdenum and stainless steel.

(5)焼結する工程
支持板上に載置された成形体を焼結する。焼結は公知の方法で行えばよい。例えば、支持板上の載置された成形体を焼結容器にいれて、1000℃~1100℃に加熱して焼結する。焼結時の雰囲気による酸化を防止するために、焼結は、真空雰囲気中または雰囲気ガス中で行うことが好ましい。雰囲気ガスは、ヘリウム、アルゴンなどの不活性ガスを用いることが好ましい。
(5) Sintering Step The compact placed on the support plate is sintered. Sintering may be performed by a known method. For example, the compact placed on the support plate is placed in a sintering vessel and heated to 1000°C to 1100°C for sintering. In order to prevent oxidation due to the atmosphere during sintering, sintering is preferably performed in a vacuum atmosphere or in an atmospheric gas. The atmospheric gas used is preferably an inert gas such as helium or argon.

(6)熱処理をする工程
本開示の実施形態によって得られた焼結磁石に対して、更に磁気特性を向上させることを目的として熱処理を行ってもよい。例えば、焼結温度よりも低い温度(400℃以上600℃以下)で一段熱処理を行ってもよい。あるいは、相対的に高い温度(700℃以上焼結温度以下)で第一熱処理を行った後、相対的に低い温度(400℃以上600℃以下)で第二熱処理を行ってもよい(二段熱処理)。二段熱処理の具体例は、750℃以上850℃以下の温度で5分から500分程度の第一熱処理、および、440℃以上550℃以下の温度で5分から500分程度の第二熱処理を含み得る。第一熱処理と第二熱処理との間において、室温まで冷却したり、または、440℃以上550℃以下の温度まで冷却してもよい。
(6) Heat Treatment Step The sintered magnet obtained according to the embodiment of the present disclosure may be subjected to a heat treatment to further improve its magnetic properties. For example, a first-stage heat treatment may be performed at a temperature lower than the sintering temperature (400°C to 600°C). Alternatively, a first heat treatment may be performed at a relatively high temperature (700°C to the sintering temperature) followed by a second heat treatment at a relatively low temperature (400°C to 600°C) (two-stage heat treatment). A specific example of a two-stage heat treatment may include a first heat treatment at a temperature of 750°C to 850°C for approximately 5 to 500 minutes, and a second heat treatment at a temperature of 440°C to 550°C for approximately 5 to 500 minutes. Between the first and second heat treatments, the magnet may be cooled to room temperature or to a temperature of 440°C to 550°C.

最終的な製品形状にするなどの目的で、得られた焼結磁石に研削などの機械加工を施してもよい。その場合、熱処理は機械加工前でも機械加工後でもよい。さらに、得られた焼結磁石に、表面処理を施してもよい。表面処理は、既知の表面処理であってもよく、例えばAl蒸着や電気Niめっきや樹脂塗料などの表面処理を行うことができる。 The resulting sintered magnet may be subjected to machining such as grinding to achieve the final product shape. In this case, heat treatment may be performed before or after machining. Furthermore, the resulting sintered magnet may be subjected to a surface treatment. This surface treatment may be any known surface treatment, such as Al vapor deposition, Ni electroplating, or resin paint.

実施例によりさらに詳細に説明するが、本開示はそれらに限定されるものではない。 The following examples provide further details, but the present disclosure is not limited to them.

実施例1
Nd:24.5mass%、Pr:5.5mass%、B:0.93mass%、Cu:0.3mass%、Ga:0.5mass%、Co:0.45mass%、Al:0.12mass%、Zr:0.05mass%、残部Feの組成を有するR-T-B系合金粉末を準備した。粉末の粒径d50は、3.2μmであった。これらの粉末を用いて湿式プレス装置で成形体を作製した。得られた成形体の寸法は、長さ82.3mm×幅49.0mm×厚さ5.3mmの直方体状であった。得られた成形体の密度は、4.3Mg/m程度であった。得られた成形体の長さ82.3mm×幅49.0mmの面(厚さ方向に垂直な面)の辺端部に面取りを行った。面取りは、辺端部における角の先端から1.0mmの深さ(C1.0mm)をヘラで削ることにより行った。そして、辺端部を面取りした面と支持板とが接触するように面取り後の成形体をモリブデン製の支持板上に載置した。そして、支持板上に載置された成形体を焼結(焼結による緻密化が十分起こる温度を選定)して本発明例である焼結体A(R-T-B系焼結磁石)を作製した。また、比較例として成形体に面取りを施さない以外は同様な方法で焼結体B(R-T-B系焼結磁石)を作製した。
Example 1
An R-T-B alloy powder having a composition of Nd: 24.5 mass%, Pr: 5.5 mass%, B: 0.93 mass%, Cu: 0.3 mass%, Ga: 0.5 mass%, Co: 0.45 mass%, Al: 0.12 mass%, Zr: 0.05 mass%, and the balance Fe was prepared. The particle size d50 of the powder was 3.2 μm. A compact was produced using these powders in a wet press. The dimensions of the obtained compact were a rectangular parallelepiped with a length of 82.3 mm, a width of 49.0 mm, and a thickness of 5.3 mm. The density of the obtained compact was approximately 4.3 Mg/m 3. The edge portions of the 82.3 mm long x 49.0 mm wide surface (the surface perpendicular to the thickness direction) of the obtained compact were chamfered. The chamfering was performed by using a spatula to remove a 1.0 mm depth (C1.0 mm) from the tip of the corner at the edge. The chamfered compact was then placed on a molybdenum support plate so that the chamfered surface of the edge was in contact with the support plate. The compact placed on the support plate was then sintered (a temperature was selected that would sufficiently cause densification by sintering) to produce sintered compact A (RTB-based sintered magnet), an example of the present invention. As a comparative example, sintered compact B (RTB-based sintered magnet) was produced in a similar manner, except that the compact was not chamfered.

得られたR-T-B系焼結磁石の変形量を調べた。変形量は三次元測定機(Nikon製NEXIV)によって測定した。測定したところ、成形体に面取りをおこなった本発明例の焼結体Aの変形量は、0.2mmであったのに対し、成形体に面取りを行わなかった比較例の焼結体Bの変形量は、0.6mmであった。このため、本発明例(焼結体A)の方が比較例(焼結体B)と比べて大幅に焼結体の変形が抑制されている。 The amount of deformation of the resulting R-T-B based sintered magnets was examined. The amount of deformation was measured using a three-dimensional measuring machine (Nikon NEXIV). The measurement showed that the amount of deformation of sintered body A, an example of the present invention in which the compact was chamfered, was 0.2 mm, while the amount of deformation of sintered body B, a comparative example in which the compact was not chamfered, was 0.6 mm. Therefore, the deformation of the sintered body of the example of the present invention (sintered body A) is significantly suppressed compared to the comparative example (sintered body B).

1、4 面
2、3、5 辺
6 支持板
100、200 成形体
1, 4 Faces 2, 3, 5 Side 6 Support plate 100, 200 Molded body

Claims (2)

R-T-B系(Rは希土類元素であり、Nd、PrおよびCeからなる群から選択された少なくとも1つを必ず含み、Tは遷移金属元素のうち少なくとも1種であり、Feを必ず含む)合金粉末を準備する工程と、
前記R-T-B系合金粉末を磁界を印加しながら成形することによって厚さ5mm以上7mm以下の扁平な直方体状の成形体を作製する工程と、
前記成形体の厚さ方向に垂直な少なくとも1つの面と厚さ方向に平行な面とが交わる角の全てを、角の先端から0.5mm~2mmの深さで面取りする工程と、
前記全ての角を面取りした厚さ方向に垂直な面と支持板とが接触するように前記成形体を前記支持板上に載置する工程と、
前記支持板上に載置された前記成形体を焼結する工程と、
を含む、R-T-B系焼結磁石の製造方法。
A step of preparing an R-T-B system alloy powder (R is a rare earth element and must contain at least one selected from the group consisting of Nd, Pr, and Ce, and T is at least one transition metal element and must contain Fe);
a step of forming a flat rectangular parallelepiped compact having a thickness of 5 mm to 7 mm by compacting the R-T-B based alloy powder while applying a magnetic field ;
chamfering all corners where at least one surface perpendicular to the thickness direction of the molded body intersects with a surface parallel to the thickness direction to a depth of 0.5 mm to 2 mm from the tip of the corner;
placing the molded body on a support plate so that the surface perpendicular to the thickness direction, all of the corners of which have been chamfered, comes into contact with the support plate;
sintering the compact placed on the support plate;
A method for producing an RTB based sintered magnet, comprising:
前記面取りがC面取りである請求項1に記載のR-T-B系焼結磁石の製造方法。 The method for producing an R-T-B based sintered magnet according to claim 1, wherein the chamfer is a C-chamfer.
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Citations (1)

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Publication number Priority date Publication date Assignee Title
JP2004207578A (en) 2002-12-26 2004-07-22 Hitachi Metals Ltd Working method of molding

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004207578A (en) 2002-12-26 2004-07-22 Hitachi Metals Ltd Working method of molding

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