JP7822348B2 - Holding member, cutting table, cutting device, and method for manufacturing semiconductor device - Google Patents
Holding member, cutting table, cutting device, and method for manufacturing semiconductor deviceInfo
- Publication number
- JP7822348B2 JP7822348B2 JP2023121520A JP2023121520A JP7822348B2 JP 7822348 B2 JP7822348 B2 JP 7822348B2 JP 2023121520 A JP2023121520 A JP 2023121520A JP 2023121520 A JP2023121520 A JP 2023121520A JP 7822348 B2 JP7822348 B2 JP 7822348B2
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- Prior art keywords
- cutting
- holding member
- substrate
- cut
- cutting table
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Classifications
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
- H10P72/70—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping
- H10P72/78—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using vacuum or suction, e.g. Bernoulli chucks
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B27/00—Other grinding machines or devices
- B24B27/06—Grinders for cutting-off
- B24B27/0616—Grinders for cutting-off using a tool turning around the workpiece
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B41/00—Component parts such as frames, beds, carriages, headstocks
- B24B41/06—Work supports, e.g. adjustable steadies
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B28—WORKING CEMENT, CLAY, OR STONE
- B28D—WORKING STONE OR STONE-LIKE MATERIALS
- B28D5/00—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
- B28D5/0058—Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B28—WORKING CEMENT, CLAY, OR STONE
- B28D—WORKING STONE OR STONE-LIKE MATERIALS
- B28D5/00—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
- B28D5/0058—Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material
- B28D5/0064—Devices for the automatic drive or the program control of the machines
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B28—WORKING CEMENT, CLAY, OR STONE
- B28D—WORKING STONE OR STONE-LIKE MATERIALS
- B28D5/00—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
- B28D5/0058—Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material
- B28D5/0082—Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material for supporting, holding, feeding, conveying or discharging work
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B28—WORKING CEMENT, CLAY, OR STONE
- B28D—WORKING STONE OR STONE-LIKE MATERIALS
- B28D5/00—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
- B28D5/0058—Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material
- B28D5/0082—Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material for supporting, holding, feeding, conveying or discharging work
- B28D5/0094—Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material for supporting, holding, feeding, conveying or discharging work the supporting or holding device being of the vacuum type
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B28—WORKING CEMENT, CLAY, OR STONE
- B28D—WORKING STONE OR STONE-LIKE MATERIALS
- B28D5/00—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
- B28D5/02—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by rotary tools, e.g. drills
- B28D5/022—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by rotary tools, e.g. drills by cutting with discs or wheels
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P54/00—Cutting or separating of wafers, substrates or parts of devices
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
- H10P72/04—Apparatus for manufacture or treatment
- H10P72/0428—Apparatus for mechanical treatment or grinding or cutting
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
- H10P72/70—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping
- H10P72/76—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using mechanical means, e.g. clamps or pinches
- H10P72/7604—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using mechanical means, e.g. clamps or pinches the wafers being placed on a susceptor, stage or support
- H10P72/7624—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using mechanical means, e.g. clamps or pinches the wafers being placed on a susceptor, stage or support characterised by the mechanical construction of the susceptor, stage or support
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Dicing (AREA)
- Jigs For Machine Tools (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
Description
本発明は、保持部材、切断用テーブル、切断装置、及び、半導体装置の製造方法に関するものである。 The present invention relates to a holding member, a cutting table, a cutting device, and a method for manufacturing a semiconductor device.
従来、特許文献1に示すように、ウェーハを切削する切削装置において、ウェーハを吸着して保持するチャックテーブルが、ポーラスセラミックで構成された円盤状の保持部と、当該保持部の外周を囲繞して設けられた外周リング部とを有する構成が考えられている。そして、外周リング部は、ウェーハの外周縁部に対応して設けられており、表面粗さの小さい石英ガラス層を積層して構成されている。この構成により、ウェーハに切削加工を施す際に生じる切削屑が石英ガラス層の表面に留まることを防止している。 As shown in Patent Document 1, a conventional cutting device for cutting wafers has a chuck table that suction-holds the wafer and includes a disk-shaped holder made of porous ceramic and an outer ring surrounding the holder. The outer ring is positioned to correspond to the outer edge of the wafer and is constructed by laminating quartz glass layers with low surface roughness. This configuration prevents cutting debris generated when cutting the wafer from remaining on the surface of the quartz glass layer.
一方で、耐水性、切断対象物の反りへの追従性や切断対象物の位置ずれ防止等の観点から、切断対象物を保持する保持部材(保持層)に、例えばシリコーン系の樹脂やフッ素系の樹脂等の弾性樹脂が用いられている。また、保持部材には、切断対象物を吸着して保持するための吸着孔が形成されている。 On the other hand, from the standpoints of water resistance, ability to follow warping of the workpiece, and prevention of misalignment of the workpiece, elastic resins such as silicone-based resins and fluorine-based resins are used for the holding member (holding layer) that holds the workpiece. The holding member also has suction holes formed to adsorb and hold the workpiece.
しかしながら、上記の保持部材では、切断対象物を弾性樹脂に密着させて保持しているので、切断対象物を切断して生じる非製品部が、保持部材に張り付いてしまうという問題がある。保持部材に張り付いた非製品部を切削水等の加工液で押し流すこともされているが、非製品部を押し流すことができない場合がある。また、被製品部が保持部材に張り付いたままであると、切断機構の回転刃が破損する恐れもある。 However, because the above-mentioned holding member holds the workpiece in close contact with the elastic resin, there is a problem in that non-product parts that are produced when the workpiece is cut can stick to the holding member. While it is possible to wash away non-product parts that have stuck to the holding member with machining fluid such as cutting water, there are cases in which the non-product parts cannot be washed away. Furthermore, if the workpiece remains stuck to the holding member, there is a risk that the rotating blade of the cutting mechanism may be damaged.
そこで本発明は、上記問題点を解決すべくなされたものであり、切断対象物を切断して生じる非製品部が保持部材に張り付くことを防止することをその主たる課題とするものである。 The present invention was developed to solve the above problems, and its main objective is to prevent non-product parts resulting from cutting the object from sticking to the holding member.
すなわち本発明に係る保持部材は、切断用テーブルにおいて切断対象物を吸着して保持する保持部材であって、前記切断対象物を切断して生じる非製品部に接触する接触領域の表面に複数の凹部が形成されており、前記複数の凹部は、前記接触領域の外側に連通していることを特徴とする。 In other words, the holding member of the present invention is a holding member that adsorbs and holds the workpiece on the cutting table, and is characterized in that multiple recesses are formed on the surface of the contact area that comes into contact with the non-product parts that are produced when the workpiece is cut, and the multiple recesses are connected to the outside of the contact area.
このように構成した本発明によれば、切断対象物を切断して生じる非製品部が保持部材に張り付くことを防止することができる。 This invention, configured in this way, can prevent non-product parts that are generated when cutting the object to be cut from sticking to the holding member.
次に、本発明に係る技術について、例を挙げてさらに詳細に説明する。ただし、本発明は、以下の技術により限定されない。 Next, the technology related to the present invention will be explained in more detail using examples. However, the present invention is not limited to the following technology.
本発明に係る技術1の保持部材は、切断用テーブルにおいて切断対象物を吸着して保持する保持部材であって、前記切断対象物を切断して生じる非製品部に接触する接触領域の表面に複数の凹部が形成されており、前記複数の凹部は、前記接触領域の外側に連通していることを特徴とする。 The holding member of Technology 1 of the present invention is a holding member that adsorbs and holds an object to be cut on a cutting table, and is characterized in that multiple recesses are formed on the surface of the contact area that comes into contact with the non-product parts that are produced when the object to be cut is cut, and the multiple recesses are connected to the outside of the contact area.
この保持部材であれば、非製品部に接触する接触領域の表面に複数の凹部が形成されているので、保持部材と非製品部との接触面積を低減して張り付き力を低減し、非製品部を容易に取り除くことができる。また、複数の凹部が接触領域の外側に連通しているので、加工液が保持部材と非製品部との間に流入しやすくなり、非製品部を容易に取り除くことができる。したがって、切断対象物を切断して生じる非製品部が保持部材に張り付くことを防止することができる。また、加工液の供給量を少なくすることもでき、加工液を節約することができる。 With this holding member, multiple recesses are formed on the surface of the contact area that comes into contact with the non-product parts, reducing the contact area between the holding member and the non-product parts, thereby reducing the sticking force and making it easier to remove the non-product parts. Furthermore, because the multiple recesses are connected to the outside of the contact area, processing fluid can easily flow between the holding member and the non-product parts, making it easier to remove the non-product parts. Therefore, non-product parts resulting from cutting the workpiece can be prevented from sticking to the holding member. Furthermore, the amount of processing fluid supplied can be reduced, thereby conserving processing fluid.
保持部材の具体的な実施の態様としては、複数の凹部が規則的に形成されている構成、複数の凹部が不規則に形成されている構成、又は、複数の凹部が不定形で形成されている構成が考えられる。ここで、複数の凹部が規則的に形成されている構成は、保持部材への加工処理を行いやすくできる。このため、本発明に係る技術2の保持部材は、上記の技術1の構成に加えて、前記複数の凹部が、平面視において格子状、ストライプ状又はドット状をなすものであることが望ましい。 Specific embodiments of the holding member include a configuration in which multiple recesses are formed in a regular pattern, a configuration in which multiple recesses are formed irregularly, or a configuration in which multiple recesses are formed in an irregular shape. A configuration in which multiple recesses are formed in a regular pattern makes it easier to process the holding member. Therefore, in addition to the configuration of Technology 1 above, the holding member of Technology 2 according to the present invention preferably has multiple recesses that form a grid, stripe, or dot pattern in a planar view.
本発明に係る技術3の切断用テーブルは、切断対象物を吸着して保持する切断用テーブルであって、上記の技術1又は2の構成である保持部材を有することを特徴とする。
この構成であれば、切断対象物を切断して生じる非製品部が保持部材に張り付くことを防止することができるので、切断用テーブルから非製品部を容易に取り除くことができる。
The cutting table of the third aspect of the present invention is a cutting table that holds an object by suction, and is characterized by having a holding member having the configuration of the first or second aspect of the present invention.
With this configuration, it is possible to prevent non-product parts that are generated when the object to be cut is cut from sticking to the holding member, and therefore it is possible to easily remove the non-product parts from the cutting table.
本発明に係る技術4の切断装置は、切断対象物を吸着して保持する切断用テーブルと、前記切断用テーブルに保持された前記切断対象物を切断する切断機構とを備え、前記切断用テーブルは、上記の技術1又は2の構成である保持部材を有することを特徴とする。
この構成であれば、切断対象物を切断して生じる非製品部が保持部材に張り付くことを防止することができるので、切断用テーブルから非製品部を容易に取り除くことができる。また、非製品部の張り付きを防止できるので、非製品部が張り付くことにより生じる切断機構の回転刃の破損等を防止することもできる。
A cutting device according to Technology 4 of the present invention includes a cutting table that adsorbs and holds an object to be cut, and a cutting mechanism that cuts the object held on the cutting table, and the cutting table has a holding member having the configuration of Technology 1 or 2 above.
This configuration prevents non-product parts that are generated when the cutting object is cut from sticking to the holding member, making it easy to remove the non-product parts from the cutting table. Furthermore, preventing non-product parts from sticking also prevents damage to the rotary blade of the cutting mechanism that may result from the non-product parts sticking.
本発明に係る技術5の半導体装置の製造方法は、複数の半導体装置が形成された基板を上記の技術4の切断装置を用いて切断して、個片化された半導体装置を製造する半導体装置の製造方法であって、前記基板を前記切断用テーブルで保持し、前記切断用テーブルに保持された前記基板を前記切断機構により切断することを特徴とする。 Technical Technique 5 of the present invention is a semiconductor device manufacturing method that uses the cutting device of Technical Technique 4 described above to cut a substrate on which multiple semiconductor devices are formed to produce individual semiconductor devices, and is characterized in that the substrate is held on the cutting table, and the substrate held on the cutting table is cut by the cutting mechanism.
<本発明の一実施形態>
以下に、本発明に係る切断装置の一実施形態について、図面を参照して説明する。
なお、以下に示すいずれの図についても、わかりやすくするために、適宜省略し又は誇張して模式的に描かれている。同一の構成要素については、同一の符号を付して説明を適宜省略する。
<One embodiment of the present invention>
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment of a cutting device according to the present invention will be described below with reference to the drawings.
In addition, in all of the drawings shown below, for the sake of clarity, some parts are omitted or exaggerated as appropriate, and the same components are denoted by the same reference numerals, and the description thereof will be omitted as appropriate.
<切断装置100の全体構成>
本実施形態の切断装置100は、切断対象物である基板Wを切断して複数の切断品Pに個片化するものである。
ここで、基板Wとしては、例えばフリップチップ用基板又は封止済基板等を挙げることができる。フリップチップ用基板とは、半導体チップ、抵抗素子、キャパシタ素子等の電子素子がフリップチップ接続される基板である。また、封止済基板とは、半導体チップ、抵抗素子、キャパシタ素子等の電子素子が接続された基板に対して、少なくとも電子素子を樹脂封止するように樹脂成形したものである。封止済基板を構成する基板としては、リードフレーム、プリント配線板を用いることができ、これら以外にも、半導体製基板(シリコンウェーハ等の半導体ウェーハを含む)、金属製基板、セラミック製基板、ガラス製基板、樹脂製基板等を用いることができる。また、封止済基板を構成する基板には、配線が施されていても施されていなくてもよい。
<Overall configuration of cutting device 100>
The cutting apparatus 100 of this embodiment cuts a substrate W, which is an object to be cut, into a plurality of cut products P.
Here, examples of the substrate W include a flip-chip substrate or a sealed substrate. A flip-chip substrate is a substrate to which electronic elements such as semiconductor chips, resistor elements, and capacitor elements are flip-chip connected. A sealed substrate is a substrate to which electronic elements such as semiconductor chips, resistor elements, and capacitor elements are connected, and which is molded with resin so as to seal at least the electronic elements. Examples of substrates that constitute the sealed substrate include lead frames and printed wiring boards, and other substrates that may also be used, such as semiconductor substrates (including semiconductor wafers such as silicon wafers), metal substrates, ceramic substrates, glass substrates, and resin substrates. Furthermore, the substrates that constitute the sealed substrate may or may not be wired.
具体的に切断装置100は、図1に示すように、基板Wを供給する供給モジュール100Aと、基板Wを切断する切断モジュール100Bと、切断されて個片化された切断品Pを検査する検査モジュール100Cとを、それぞれ構成要素として備えている。各構成要素は、それぞれ他の構成要素に対して着脱可能かつ交換可能である。なお、基板Wが複数の半導体装置が形成された基板である場合、切断装置100は、個片化された半導体装置を製造する半導体製造装置ということができる。 Specifically, as shown in FIG. 1, the cutting device 100 comprises, as its components, a supply module 100A that supplies substrates W, a cutting module 100B that cuts the substrates W, and an inspection module 100C that inspects the cut products P that have been cut and separated. Each component is detachable and replaceable with respect to the other components. Note that when the substrates W are substrates on which multiple semiconductor devices are formed, the cutting device 100 can be considered a semiconductor manufacturing device that produces separated semiconductor devices.
以下に示す各モジュール100A~100Cを含む切断装置100の動作制御は、供給モジュール100Aに設けた制御部CTLが行う。この制御部CTLは、供給モジュール100A以外の他のモジュール100B、100Cに設けてもよい。また、制御部CTLは、複数に分割して、供給モジュール100A、切断モジュール100B及び検査モジュール100Cのうちの少なくとも2つのモジュールに設けてもよい。 Operational control of the cutting device 100, which includes the modules 100A-100C described below, is performed by a control unit CTL provided in the supply module 100A. This control unit CTL may also be provided in modules 100B and 100C other than the supply module 100A. Furthermore, the control unit CTL may be divided into multiple units and provided in at least two of the supply module 100A, cutting module 100B, and inspection module 100C.
供給モジュール100Aは、切断される基板Wが外部から供給されて、基板Wを収容するものである。この供給モジュール100Aには、基板Wを収容する基板収容部2が設けられる。基板Wは、搬送機構(ローダ)3によって、供給モジュール100Aから切断モジュール100Bに搬送される。なお、ローダ3は、ガイドレール31を用いて基板Wを切断モジュール100Bに搬送するものである。本実施形態の切断装置100は、基板収容部2を3つ備えているが、基板収容部2の個数は特に限定されない。 The supply module 100A receives the substrates W to be cut from the outside and accommodates the substrates W. This supply module 100A is provided with a substrate accommodation section 2 that accommodates the substrates W. The substrates W are transported from the supply module 100A to the cutting module 100B by a transport mechanism (loader) 3. The loader 3 transports the substrates W to the cutting module 100B using guide rails 31. The cutting device 100 of this embodiment is equipped with three substrate accommodation sections 2, but the number of substrate accommodation sections 2 is not particularly limited.
切断モジュール100Bは、基板Wを切断して複数の切断品Pに個片化するものである。この切断モジュール100Bは、基板Wを吸着して保持する切断用テーブル4と、切断用テーブル4に保持された基板Wを切断する切断機構5とを有している。 The cutting module 100B cuts the substrate W into a plurality of cut pieces P. This cutting module 100B has a cutting table 4 that holds the substrate W by suction, and a cutting mechanism 5 that cuts the substrate W held on the cutting table 4.
切断機構5は、スピンドル51に回転刃52が装着されることにより構成されている。そして、切断用テーブル4と切断機構5とを相対的に移動させることによって、基板Wが回転刃52によって切断されて切断品Pに個片化される。ここで、回転刃52及び基板Wには、基板Wの切断時に発生する摩擦熱を抑えるために加工液である切削水が加工液供給部50により供給される。その後、個片化された切断品Pは、搬送機構(アンローダ)6によって、切断モジュール100Bから検査モジュール100Cに搬送される。なお、アンローダ6は、複数の切断品Pを個別に吸着して保持する保持部61と、当該保持部61を移動させる移動機構62とを有している。本実施形態の切断装置100は、切断機構5を2つ備えているが、切断機構5は1つであってもよい。 The cutting mechanism 5 is configured by attaching a rotary blade 52 to a spindle 51. The cutting table 4 and the cutting mechanism 5 are moved relative to each other, causing the rotary blade 52 to cut the substrate W into individual pieces P. A machining fluid supply unit 50 supplies cutting water, a machining fluid, to the rotary blade 52 and the substrate W to suppress frictional heat generated when the substrate W is cut. The individual pieces P are then transported from the cutting module 100B to the inspection module 100C by a transport mechanism (unloader) 6. The unloader 6 has a holder 61 that individually suctions and holds multiple pieces P, and a moving mechanism 62 that moves the holder 61. The cutting device 100 of this embodiment is equipped with two cutting mechanisms 5, but may also have a single cutting mechanism 5.
検査モジュール100Cは、切断モジュール100Bにより個片化された切断品Pを撮像して検査するものである。この検査モジュール100Cは、複数の切断品Pを吸着して保持する検査用テーブル7と、検査用テーブル7に保持された複数の切断品Pを撮像する検査カメラ8とを備えている。そして、検査モジュール100Cでは、検査カメラ8により得られた画像に基づいて、個片化された切断品Pを良品と不良品とに区別する。そして、移送機構(図示なし)によって良品は良品用トレイ9aに、不良品は不良品用トレイ9bにそれぞれ移送されて収納される。(図1参照) Inspection module 100C inspects and captures images of the cut products P singulated by cutting module 100B. This inspection module 100C includes an inspection table 7 that holds multiple cut products P by suction, and an inspection camera 8 that captures images of the multiple cut products P held on the inspection table 7. Based on the images captured by the inspection camera 8, inspection module 100C then classifies the cut products P into good and defective products. A transport mechanism (not shown) then transports and stores the good products in a tray 9a for good products and the defective products in a tray 9b for defective products. (See Figure 1)
<切断用テーブル4の構成>
そして、本実施形態では、図2~図5に示すように、切断用テーブル4が、基板Wを吸着して保持する保持部材10を有している。この保持部材10には、切断時に回転刃52を避けるための刃避け溝10Mが形成されている。保持部材10は、例えばシリコーン系の樹脂やフッ素系の樹脂等の弾性樹脂(ラバー材)により構成されている。
<Configuration of cutting table 4>
2 to 5, the cutting table 4 has a holding member 10 that adsorbs and holds the substrate W. A blade avoidance groove 10M is formed in the holding member 10 to avoid the rotary blade 52 during cutting. The holding member 10 is made of an elastic resin (rubber material), such as a silicone-based resin or a fluorine-based resin.
この保持部材10は、基板W又は複数の切断品Pを吸着して保持する吸着孔10aが形成されている。本実施形態では、吸着孔10aによる吸着力を増強するために、吸着孔10aの吸着側開口部の開口サイズを大きくしてポケット部10bを形成している。なお、図2~図5のポケット部10bは、平面視において矩形状をなすものであるが、ポケット部10bの平面視における形状はこれに限られない。 This holding member 10 is formed with suction holes 10a that suction-hold the substrate W or multiple cut pieces P. In this embodiment, to increase the suction force of the suction holes 10a, the opening size of the suction-side opening of the suction holes 10a is enlarged to form pocket portions 10b. Note that while the pocket portions 10b in Figures 2 to 5 are rectangular in plan view, the shape of the pocket portions 10b in plan view is not limited to this.
ここで、基板Wは、図3(a)に示すように、切断後に製品として用いられる製品部Wxと、切断後に製品として用いられない非製品部Wyとを有している。本実施形態では、複数の製品部Wxが例えば縦横マトリックス状(全体として矩形状)等により中央部に配置されており、それら複数の製品部Wxの外周部に非製品部Wyが配置されている。なお、製品部Wx及び非製品部Wyそれぞれの配置態様は前述に限られない。例えば、非製品部Wyが基板Wの外周部以外に配置されていても良い。 As shown in FIG. 3(a), the substrate W has product portions Wx that are used as products after cutting, and non-product portions Wy that are not used as products after cutting. In this embodiment, multiple product portions Wx are arranged in the center, for example, in a vertical and horizontal matrix pattern (overall rectangular shape), and non-product portions Wy are arranged on the periphery of the multiple product portions Wx. Note that the arrangement of the product portions Wx and non-product portions Wy is not limited to the above. For example, the non-product portions Wy may be arranged somewhere other than the periphery of the substrate W.
このため、図3(b)及び図4に示すように、刃避け溝10Mは、製品部Wx及び非製品部Wyに対応して格子状に形成されており、刃避け溝10Mに取り囲まれた矩形状の領域が基板Wの各製品部Wxを保持する保持領域10R(図3(b)参照)となる。また、保持部材10において複数の保持領域10Rを取り囲む4辺部に非製品部Wyに接触する接触領域10S(図4参照)が形成される。 For this reason, as shown in Figures 3(b) and 4, the blade protection grooves 10M are formed in a grid pattern corresponding to the product portions Wx and non-product portions Wy, and the rectangular areas surrounded by the blade protection grooves 10M become holding areas 10R (see Figure 3(b)) that hold each product portion Wx of the substrate W. In addition, contact areas 10S (see Figure 4) that come into contact with the non-product portions Wy are formed on the four sides of the holding member 10 surrounding the multiple holding areas 10R.
そして、保持部材10には、図5及び図6に示すように、基板Wを切断して生じる非製品部Wyに接触する接触領域10Sの表面に複数の凹部10cが形成されている。複数の凹部10cは、接触領域10Sの表面と非製品部Wyとの接触面積を低減するものである。複数の凹部10cを形成することによって、凹部10cを形成しない場合の接触面積を100%とした場合に、接触面積を例えば20%~30%としている。 As shown in Figures 5 and 6, the holding member 10 has multiple recesses 10c formed on the surface of the contact region 10S that comes into contact with the non-product portion Wy resulting from cutting the substrate W. The multiple recesses 10c reduce the contact area between the surface of the contact region 10S and the non-product portion Wy. By forming the multiple recesses 10c, the contact area is reduced to, for example, 20% to 30%, assuming that the contact area would be 100% if the recesses 10c were not formed.
また、複数の凹部10cは、図5及び図6に示すように、非製品部Wyが接触領域10Sに接触した状態において、接触領域10Sの外側に連通している。これにより、加工液供給部50により供給された加工液が、非製品部Wy及び接触領域10Sの間に流入する(図6参照)。 Furthermore, as shown in Figures 5 and 6, the multiple recesses 10c are connected to the outside of the contact area 10S when the non-product area Wy is in contact with the contact area 10S. This allows the machining fluid supplied by the machining fluid supply unit 50 to flow between the non-product area Wy and the contact area 10S (see Figure 6).
ここで、接触領域10Sの外側に連通しているとは、(1)平面視において凹部10cが非製品部Wy(接触領域10S)の外側に延び、凹部10cが保持部材10の表面に開口していること、又は、(2)平面視において凹部10cが非製品部Wyに覆われているが、凹部10cが保持部材10の側面又は刃避け溝10Mの内面に開口していること等を含む。また、平面視において、凹部10cの両端部が接触領域10Sの外側に連通する構成であっても良いし、凹部10cの一端部が接触領域10Sの外側に連通する構成であっても良い。なお、凹部10cの一端部が接触領域10Sの外側に連通する構成の場合には、加工液が流入しやすいように、例えば加工液が供給される側の一端部が接触領域10Sの外側に連通する構成とすることが望ましい。 Here, "communicating with the outside of the contact area 10S" includes (1) when viewed from above, the recess 10c extends outside the non-product portion Wy (contact area 10S) and opens onto the surface of the holding member 10, or (2) when viewed from above, the recess 10c is covered by the non-product portion Wy but opens onto the side of the holding member 10 or the inner surface of the blade groove 10M. Also, when viewed from above, both ends of the recess 10c may be configured to communicate with the outside of the contact area 10S, or one end of the recess 10c may be configured to communicate with the outside of the contact area 10S. Note that if one end of the recess 10c is configured to communicate with the outside of the contact area 10S, it is desirable to configure, for example, the end on the side where the machining fluid is supplied to communicate with the outside of the contact area 10S so that machining fluid can easily flow in.
具体的に複数の凹部10cは、図5及び図6に示すように、平面視において格子状、ストライプ状又はドット状をなすものである。なお、図5及び図6には複数の凹部10cを格子状とした例を示している。複数の凹部10cを格子状とすることにより、加工液の流入箇所を増やして加工液を流入しやすくできる。なお、複数の凹部10cは、基板Wの種類、保持部材10の材質、又は、加工液の水流条件(例えば流量又は供給方向等)によって、格子状の他に、ストライプ状又はドット状の種々の形状にすることができる。 Specifically, as shown in Figures 5 and 6, the multiple recesses 10c are arranged in a grid, stripe, or dot pattern in plan view. Note that Figures 5 and 6 show an example in which the multiple recesses 10c are arranged in a grid pattern. By arranging the multiple recesses 10c in a grid pattern, the number of inflow points for the processing liquid can be increased, making it easier for the processing liquid to flow in. Note that the multiple recesses 10c can be arranged in various shapes, such as a grid pattern, stripe pattern, or dot pattern, depending on the type of substrate W, the material of the holding member 10, or the water flow conditions of the processing liquid (e.g., flow rate or supply direction, etc.).
各凹部10cの幅及び深さは、凹部10c内に異物が捕集されない程度に小さくし、かつ、基板Wの切断(切断品Pの生産)及び清掃による摩耗の影響を受けない程度のサイズが望ましい。具体的に各凹部10cの幅及び深さはそれぞれ、例えば数10~数100μmとすることが考えられる。複数の凹部10cのピッチは、例えば数10μmとすることが考えられる。これら複数の凹部10cは、レーザ光を照射して形成しても良いし、切削等の機械加工により形成しても良いし、薬液を用いた化学処理により形成しても良いし、型転写成形により形成しても良い。 The width and depth of each recess 10c should be small enough to prevent foreign matter from being trapped within the recess 10c, and should be large enough to avoid wear caused by cutting the substrate W (producing the cut product P) and cleaning. Specifically, the width and depth of each recess 10c may be, for example, several tens to several hundreds of microns. The pitch between multiple recesses 10c may be, for example, several tens of microns. These multiple recesses 10c may be formed by irradiating them with laser light, by machining such as cutting, by chemical treatment using a chemical solution, or by mold transfer molding.
<本実施形態の効果>
本実施形態の切断装置100によれば、非製品部Wyに接触する接触領域10Sの表面に複数の凹部10cが形成されているので、保持部材10と非製品部Wyとの接触面積を低減して張り付き力を低減し、非製品部Wyを容易に取り除くことができる。また、複数の凹部10cが接触領域10Sの外側に連通しているので、加工液が保持部材10と非製品部Wyとの間に流入しやすくなり、非製品部Wyを容易に取り除くことができる。したがって、基板Wを切断して生じる非製品部Wyが保持部材10に張り付くことを防止することができる。また、加工液の供給量を少なくすることもでき、加工液を節約することができる。
<Effects of this embodiment>
According to the cutting device 100 of this embodiment, multiple recesses 10c are formed on the surface of the contact region 10S that contacts the non-product portion Wy. This reduces the contact area between the holding member 10 and the non-product portion Wy, reducing the sticking force and making it easier to remove the non-product portion Wy. Furthermore, since the multiple recesses 10c are connected to the outside of the contact region 10S, processing liquid can easily flow between the holding member 10 and the non-product portion Wy, making it easier to remove the non-product portion Wy. This prevents the non-product portion Wy resulting from cutting the substrate W from sticking to the holding member 10. Furthermore, the amount of processing liquid supplied can be reduced, thereby saving processing liquid.
<その他の変形実施形態>
なお、本発明は前記実施形態に限られるものではない。
<Other Modified Embodiments>
The present invention is not limited to the above-described embodiment.
例えば、凹部10cにおいて接触領域10Sと連通する端部の開口(例えば幅又は深さ)を大きくすることによって、加工液が流入し易い形状としても良い。 For example, the opening (e.g., width or depth) at the end of the recess 10c that communicates with the contact area 10S may be enlarged to allow the machining fluid to flow in more easily.
また、図7及び図8に示すように、保持部材10において、基板Wの製品部Wxを保持する保持領域10Rの表面に複数の第2凹部10eを形成しても良い。この複数の第2凹部10eは、保持領域10Rの表面と製品部Wx(切断品P)との接触面積を低減するものである。複数の第2凹部10eを形成することによって、第2凹部10eを形成しない場合の接触面積を100%とした場合に、接触面積を例えば50%~60%としている。なお、図7では、前記実施形態の接触領域10Sにおける凹部10cの図示を省略している。 Also, as shown in Figures 7 and 8, the holding member 10 may have multiple second recesses 10e formed on the surface of the holding region 10R that holds the product portion Wx of the substrate W. These multiple second recesses 10e reduce the contact area between the surface of the holding region 10R and the product portion Wx (cut product P). By forming multiple second recesses 10e, the contact area is reduced to, for example, 50% to 60%, assuming that the contact area when the second recesses 10e are not formed is 100%. Note that Figure 7 does not show the recesses 10c in the contact region 10S of the above embodiment.
また、複数の第2凹部10eは、基板W又は複数の切断品Pを保持した状態において、吸着孔10a及び保持領域10Rの外側空間が連通しないように形成されている。具体的に複数の第2凹部10eは、平面視において格子状、ストライプ状又はドット状をなすものである。なお、図7及び図8には複数の第2凹部10eをドット状とした例を示している。ここで、各第2凹部10eの幅及び深さは、第2凹部10e内に異物が捕集されない程度に小さくし、かつ、基板Wの切断(切断品Pの生産)及び清掃による摩耗の影響を受けない程度のサイズが望ましい。具体的に各第2凹部10eの幅及び深さはそれぞれ、例えば数10~数100μmとすることが考えられる。これら複数の第2凹部10eは、レーザ光を照射して形成しても良いし、切削等の機械加工により形成しても良いし、薬液を用いた化学処理により形成しても良いし、型転写成形により形成しても良い。 The second recesses 10e are formed so that the suction holes 10a and the outer space of the holding area 10R are not connected when the substrate W or the cut pieces P is held therein. Specifically, the second recesses 10e are arranged in a grid, stripe, or dot pattern in plan view. Figures 7 and 8 show an example in which the second recesses 10e are arranged in a dot pattern. The width and depth of each second recess 10e are preferably small enough to prevent foreign matter from being trapped within the second recess 10e, and large enough to be unaffected by wear caused by cutting the substrate W (producing the cut pieces P) and cleaning. Specifically, the width and depth of each second recess 10e may be several tens to several hundreds of micrometers. These second recesses 10e may be formed by laser irradiation, machining such as cutting, chemical treatment using a chemical solution, or mold transfer molding.
さらに、図7及び図8に示すように、保持部材10の保持領域10Rにおいて複数の第2凹部10e以外の表面を粗化面10dとしても良い。この粗化面10dは、真空張り付きに対する引き剥がしを向上させるものである。粗化面10dは、第2凹部10eの幅及び深さよりも小さい凹凸を有するものであり、例えば数10μmピッチのストライプ状をなすものである。粗化面10dの形成方法としては、レーザ光を照射して形成しても良いし、切削等の機械加工により形成しても良いし、ブラストにより形成しても良いし、型転写成形により形成しても良い。 Furthermore, as shown in Figures 7 and 8, the surface of the holding region 10R of the holding member 10 other than the multiple second recesses 10e may be made into a roughened surface 10d. This roughened surface 10d improves peeling against vacuum adhesion. The roughened surface 10d has irregularities smaller than the width and depth of the second recesses 10e, for example, in a striped pattern with a pitch of several tens of micrometers. The roughened surface 10d may be formed by irradiation with laser light, by machining such as cutting, by blasting, or by mold transfer molding.
その上、前記実施形態では、保持部材10がポケット部10bを有する構成であったが、ポケット部10bを有さない構成であっても良い。 Furthermore, in the above embodiment, the holding member 10 is configured to have a pocket portion 10b, but it may also be configured without the pocket portion 10b.
その他、本発明は前記実施形態に限られず、その趣旨を逸脱しない範囲で種々の変形が可能であるのは言うまでもない。 It goes without saying that the present invention is not limited to the above-described embodiment, and various modifications are possible without departing from the spirit of the invention.
100・・・切断装置
W ・・・基板(切断対象物)
P ・・・切断品(半導体装置)
4 ・・・切断用テーブル
5 ・・・切断機構
10 ・・・保持部材
10a・・・吸着孔
10S・・・接触領域
10c・・・凹部
100...Cutting device W...Substrate (object to be cut)
P: Cut product (semiconductor device)
4: Cutting table 5: Cutting mechanism 10: Holding member 10a: Suction hole 10S: Contact area 10c: Recess
Claims (5)
前記切断対象物を切断して生じる非製品部に接触する接触領域の表面に沿って延びる溝状の複数の凹部が形成されており、
前記複数の凹部は、前記非製品部が前記接触領域に接触した状態において前記接触領域の外側に開口するように形成されている、保持部材。 A holding member that adsorbs and holds an object to be cut on a cutting table,
a plurality of groove-like recesses are formed along the surface of a contact area that contacts a non-product portion resulting from cutting the object to be cut,
A holding member, wherein the plurality of recesses are formed so as to open to the outside of the contact area when the non-product portion is in contact with the contact area .
請求項1又は2に記載の保持部材を有する、切断用テーブル。 A cutting table that adsorbs and holds an object to be cut,
A cutting table comprising the holding member according to claim 1 or 2.
前記切断用テーブルに保持された前記切断対象物を切断する切断機構とを備え、
前記切断用テーブルは、請求項1又は2に記載の保持部材を有する、切断装置。 a cutting table that adsorbs and holds the workpiece;
a cutting mechanism that cuts the object held on the cutting table,
3. A cutting device, wherein the cutting table comprises the holding member according to claim 1 or 2.
前記基板を前記切断用テーブルで保持し、
前記切断用テーブルに保持された前記基板を前記切断機構により切断する、半導体装置の製造方法。 A method of manufacturing a semiconductor device, comprising: cutting a substrate on which a plurality of semiconductor devices are formed using the cutting device according to claim 4 to manufacture individual semiconductor devices;
The substrate is held by the cutting table;
The method for manufacturing a semiconductor device includes cutting the substrate held on the cutting table by the cutting mechanism.
Priority Applications (4)
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| JP2023121520A JP7822348B2 (en) | 2023-07-26 | 2023-07-26 | Holding member, cutting table, cutting device, and method for manufacturing semiconductor device |
| CN202410956810.8A CN119369551A (en) | 2023-07-26 | 2024-07-17 | Holding member, cutting table and device, and method for manufacturing semiconductor device |
| TW113126819A TWI904764B (en) | 2023-07-26 | 2024-07-18 | Holding member, cutting table, cutting device, and method for manufacturing semiconductor device |
| KR1020240096915A KR102890671B1 (en) | 2023-07-26 | 2024-07-23 | Holding member, cutting table, cutting apparatus, and manufacturing method of semiconductor apparatus |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2018078253A (en) | 2016-11-11 | 2018-05-17 | 株式会社ディスコ | Package board cutting jig table |
| JP2019016700A (en) | 2017-07-07 | 2019-01-31 | Towa株式会社 | Holding member, method for manufacturing holding member, holding device, conveyance device, and device for manufacturing electronic component |
| JP2019047078A (en) | 2017-09-07 | 2019-03-22 | Towa株式会社 | Cutting apparatus and method of transporting semiconductor package |
| JP2019192826A (en) | 2018-04-26 | 2019-10-31 | 株式会社ディスコ | Chuck table and manufacturing method of the chuck table |
| JP2023031668A (en) | 2021-08-25 | 2023-03-09 | 株式会社ディスコ | Cutting device |
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| JP5363746B2 (en) * | 2008-02-29 | 2013-12-11 | Towa株式会社 | Cutting apparatus and cutting method |
| KR101560305B1 (en) * | 2010-09-20 | 2015-10-14 | 한미반도체 주식회사 | Board dicing system and apparatus for supporting board |
| JP5829881B2 (en) | 2011-10-07 | 2015-12-09 | 株式会社ディスコ | Cutting equipment |
| JP6382039B2 (en) * | 2014-09-04 | 2018-08-29 | Towa株式会社 | Cutting apparatus, adsorption mechanism and apparatus using the same |
| JP7013278B2 (en) * | 2017-09-29 | 2022-01-31 | 株式会社 Mtg | Massager |
| JP7734057B2 (en) * | 2021-11-26 | 2025-09-04 | 株式会社ディスコ | Processing method and dicing device |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2018078253A (en) | 2016-11-11 | 2018-05-17 | 株式会社ディスコ | Package board cutting jig table |
| JP2019016700A (en) | 2017-07-07 | 2019-01-31 | Towa株式会社 | Holding member, method for manufacturing holding member, holding device, conveyance device, and device for manufacturing electronic component |
| JP2019047078A (en) | 2017-09-07 | 2019-03-22 | Towa株式会社 | Cutting apparatus and method of transporting semiconductor package |
| JP2019192826A (en) | 2018-04-26 | 2019-10-31 | 株式会社ディスコ | Chuck table and manufacturing method of the chuck table |
| JP2023031668A (en) | 2021-08-25 | 2023-03-09 | 株式会社ディスコ | Cutting device |
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| TWI904764B (en) | 2025-11-11 |
| JP2025018095A (en) | 2025-02-06 |
| CN119369551A (en) | 2025-01-28 |
| KR102890671B1 (en) | 2025-11-26 |
| TW202505618A (en) | 2025-02-01 |
| KR20250017164A (en) | 2025-02-04 |
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