|
JPS5917496B2
(en)
*
|
1973-12-24 |
1984-04-21 |
日本電子株式会社 |
Focusing method and device for scanning electron microscope, etc.
|
|
JPS51134556A
(en)
*
|
1975-05-19 |
1976-11-22 |
Hitachi Ltd |
Sample picture indication unit
|
|
JPS51136278A
(en)
*
|
1975-05-21 |
1976-11-25 |
Hitachi Ltd |
Non-spot aberration compensator for electron microscope having electri c field radiation gun
|
|
JPS53966A
(en)
*
|
1977-05-12 |
1978-01-07 |
Akashi Seisakusho Kk |
Electron illuminator
|
|
JPS5462768A
(en)
*
|
1977-10-28 |
1979-05-21 |
Erionikusu Kk |
Method of correcting astigmatism for electron beam application device
|
|
JPS5469374A
(en)
*
|
1977-11-15 |
1979-06-04 |
Nippon Steel Corp |
Automatic focusing method of electron microscope
|
|
JPS5492050A
(en)
*
|
1977-12-29 |
1979-07-20 |
Jeol Ltd |
Method and apparatus for astigmatic correction of scanning electronic microscope and others
|
|
JPS5816746B2
(en)
*
|
1977-12-29 |
1983-04-01 |
日本電子株式会社 |
Focusing method and device in electron beam equipment
|
|
JPS5848989B2
(en)
*
|
1978-01-25 |
1983-11-01 |
日本電子株式会社 |
Focusing device in electron beam equipment
|
|
JPS54107677A
(en)
*
|
1978-02-10 |
1979-08-23 |
Jeol Ltd |
Rotation error detection method of apperture in electronic ray exposure and its unit
|
|
JPS556784A
(en)
*
|
1979-03-28 |
1980-01-18 |
Jeol Ltd |
Method and device for astrigmatism correction in scanning electron microscope
|
|
JPS5918555A
(en)
*
|
1982-07-22 |
1984-01-30 |
Erionikusu:Kk |
Method for handling charged particle ray and its device
|
|
JP2545708B2
(en)
*
|
1985-03-13 |
1996-10-23 |
工業技術院長 |
Coal MHD power generation method
|
|
JPH0210823A
(en)
*
|
1988-06-29 |
1990-01-16 |
Toshiba Corp |
Manufacture of semiconductor device
|