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JPS5816746B2 - Focusing method and device in electron beam equipment - Google Patents
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JPS5816746B2 - Focusing method and device in electron beam equipment - Google Patents

Focusing method and device in electron beam equipment

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Publication number
JPS5816746B2
JPS5816746B2 JP52157792A JP15779277A JPS5816746B2 JP S5816746 B2 JPS5816746 B2 JP S5816746B2 JP 52157792 A JP52157792 A JP 52157792A JP 15779277 A JP15779277 A JP 15779277A JP S5816746 B2 JPS5816746 B2 JP S5816746B2
Authority
JP
Japan
Prior art keywords
electron beam
sample
focusing
scanning
lens
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP52157792A
Other languages
Japanese (ja)
Other versions
JPS5492051A (en
Inventor
生江隆男
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Jeol Ltd
Original Assignee
Nihon Denshi KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nihon Denshi KK filed Critical Nihon Denshi KK
Priority to JP52157792A priority Critical patent/JPS5816746B2/en
Publication of JPS5492051A publication Critical patent/JPS5492051A/en
Publication of JPS5816746B2 publication Critical patent/JPS5816746B2/en
Expired legal-status Critical Current

Links

Description

【発明の詳細な説明】 本発明は例えば走査電子顕微鏡等の電子線装置における
焦点合わせ方法及び装置に関するものである。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a focusing method and apparatus for an electron beam apparatus such as a scanning electron microscope.

一般に電子線装置においては電子線束を試料上に所望の
細さに収束して照射する必要がある。
In general, in an electron beam apparatus, it is necessary to irradiate a sample with an electron beam bundle converging to a desired narrowness.

例えば走査電子顕微鏡にあっては電子線束をいかに細く
できるかによって分解能が決定される。
For example, in a scanning electron microscope, the resolution is determined by how narrow the electron beam flux can be.

電子線束を細く収束するための最も重要な要素として;
は電子レンズの焦点合わせがあり、従来その操作は操作
者の経験に頼っていた。
The most important element for narrowly converging the electron beam flux;
has an electronic lens focusing system, whose operation traditionally relied on the operator's experience.

即ち走査電子顕微鏡では2次電子走査像や反射電子像を
観察して、それがいかにきめ細かな像になっているかを
操作者が判断して電子レンズの焦点合わせの目安として
おり、従って操作が繁雑となり又熟練を必要とした。
In other words, in a scanning electron microscope, the operator observes a secondary electron scanning image or a backscattered electron image, and judges how detailed the image is to use as a guide for focusing the electron lens, which makes the operation complicated. It also required skill.

そこで近時焦点合わせを自動化する研究がさかんに行わ
れ、その一例として検出信号を時間微分してその微分値
が最大になるように電子レンズの1励磁電流を制御する
装置や、所定時間内における検出信号の変化分の大きさ
を積算しその積算値が最大になるように電子レンズの励
磁電流を制御する装置が提案されている。
Therefore, research on automating focusing has been actively conducted recently, and examples include a device that differentiates the detection signal over time and controls the excitation current of an electron lens so that the differential value is maximized, and A device has been proposed that integrates the magnitude of change in a detection signal and controls the excitation current of an electron lens so that the integrated value is maximized.

しかしながらこの様な自動焦点合わせ装置では非点性の
収差が存在し、その方向が電子線の走査方向に垂直な方
向に近いと、その方向の電子線束の太さが最も小さい時
即ち電子線束が焦線を結ぶ状態のとき上記微分値や積分
値が最大となってしまい、その結果得られる走査像は一
方向に流れた非点性収差を含んでしまうという不都合が
あった。
However, in such an automatic focusing device, astigmatic aberration exists, and if the direction is close to the direction perpendicular to the scanning direction of the electron beam, the thickness of the electron beam in that direction is the smallest, that is, the electron beam When the focal line is connected, the differential value and the integral value become maximum, and the resulting scanned image contains an astigmatic aberration that flows in one direction.

本発明は上述した従来の問題点に鑑みてなされたもので
あり、電子線束が非点性収差を含んでいても常に試料に
最小錯乱円の状態で電子線束を照射することのできる焦
点合わせ方法及び装置を提供することを目的とするもの
である。
The present invention has been made in view of the above-mentioned conventional problems, and provides a focusing method that can always irradiate a sample with an electron beam in a state of a circle of least confusion even if the electron beam includes astigmatism. The purpose of the invention is to provide a device for

この様な目的を達成するために本発明では焦点合わせ操
作を少なくとも異なった2方向(例えばX、Y方向)の
電子線走査方向について行い、その各走査方向における
焦点合わせにより決定された電子レンズの励磁電流値の
平均を求め、その平均値に応じた励磁型、流を電子レン
ズに送ることを特徴としている。
In order to achieve such an object, in the present invention, focusing operations are performed in at least two different electron beam scanning directions (for example, X and Y directions), and the electron lens determined by focusing in each scanning direction is It is characterized by calculating the average value of the excitation current and sending an excitation type and current corresponding to the average value to the electron lens.

次に図面を用いて本発明を詳述する。Next, the present invention will be explained in detail using the drawings.

第1図は非点性収差がある場合の電子線束の焦点付近に
おける形状の変化をあられす。
Figure 1 shows the change in the shape of the electron beam near the focal point when there is astigmatism.

同図において1は磁界レンズの絞り穴であり、該絞り穴
1はZ−0においてX−Y平向上の円であられされる。
In the figure, reference numeral 1 denotes the aperture hole of the magnetic field lens, and the aperture hole 1 is a circle on the X-Y plane at Z-0.

この絞り面においてX軸上から出た電子線はZ=Fxの
位置で焦点を結ひ又X軸上から出た電子線はZ=Fyの
位置で焦点を結ぶ。
In this aperture plane, the electron beam emitted from the X-axis is focused at the position Z=Fx, and the electron beam emitted from the X-axis is focused at the position Z=Fy.

従って電子線はZ=FxでY方向の焦線2を、Z=Fy
でX方向の焦線3を形成する。
Therefore, the electron beam has focal line 2 in the Y direction at Z=Fx, and Z=Fy
A focal line 3 in the X direction is formed.

そしてこの2つの焦線の中間に最小錯乱円4が存在する
A circle of least confusion 4 exists between these two focal lines.

この時第1図で8の位置に試料があるとすれば磁界レン
ズの励磁電流を増加させてレンズ強度を強くしてゆくと
、試料面上電子線束の形状は第2図に示す様に楕円8→
焦線2→楕円7→最小錯乱円4→楕円6→焦線3→楕円
5と連続的に変化する。
At this time, if the sample is located at position 8 in Figure 1, if the excitation current of the magnetic field lens is increased to strengthen the lens strength, the shape of the electron beam on the sample surface will become an ellipse as shown in Figure 2. 8→
It changes continuously as focal line 2 → ellipse 7 → circle of least confusion 4 → ellipse 6 → focal line 3 → ellipse 5.

そこで今第3図に示すような楕円形の電子線束を試料面
上で楕円軸X、yに対して任意の角度θ傾いた方向lに
走査しながら前述した自動焦点合わせ装置を働かせる場
合について考える。
Now, let us consider the case where the above-mentioned automatic focusing device is operated while scanning an elliptical electron beam as shown in Fig. 3 on the sample surface in a direction l tilted at an arbitrary angle θ with respect to the ellipse axes X and y. .

楕円の接線のうちl軸と直角に交わるものを考えその交
点をA、A′とすると、このAA’の長さがで軸方向に
走査した時の電子線束の太さに対応する。
If we consider the tangents of the ellipse that intersect at right angles to the l-axis and let their intersection points be A and A', the length of AA' corresponds to the thickness of the electron beam when scanning in the axial direction.

そして自動焦点合わせ装置が励磁電流を徐々に変えてレ
ンズ強度を除々に段階的に変化させると電子線束の形状
は第2図に示す様に変化し、Kτは例えば焦線2と最小
錯乱円4との間で必ず最小値を持つ。
Then, when the automatic focusing device gradually changes the excitation current and gradually changes the lens strength, the shape of the electron beam changes as shown in Fig. 2, and Kτ is, for example, the focal line 2 and the circle of least confusion 4. It always has a minimum value between.

しかも自動焦点合わせ装置は先に述べた様に電子線の走
査方向の太さ即ちAA’がその最小値の時に前記微分値
或いは積算値が最大となり、焦点合わせ動作が停止され
レンズの励磁電流はその時の電流値I7に固定される。
Moreover, as mentioned above, in the automatic focusing device, when the width of the electron beam in the scanning direction, that is, AA', is at its minimum value, the differential value or the integrated value becomes the maximum, the focusing operation is stopped, and the excitation current of the lens is reduced. The current value I7 at that time is fixed.

即ち自動焦点合わせ装置によってAA′が最小となる時
の励磁電流値を求めることができる。
That is, the excitation current value at which AA' is minimum can be determined by the automatic focusing device.

次に電子線束の走査方向をl軸に直角なm軸方向とし、
再度自動焦点合わせ装置を働かせれば、m軸方向の電子
線束の太さ即ちB B’は焦線3と最小錯乱円4との間
で必ず最小値を持つため、l軸方向走査の場合と全く同
様にその時の励磁電流値Imを求めることができる。
Next, the scanning direction of the electron beam flux is set to the m-axis direction perpendicular to the l-axis,
If the automatic focusing device is operated again, the thickness of the electron beam in the m-axis direction, ie, B B', will always have a minimum value between the focal line 3 and the circle of least confusion 4, so The excitation current value Im at that time can be determined in exactly the same manner.

ところで、励磁電流I7の時の試料上での電子線束の形
状が例えば7であり、励磁電流Imの時が6であるとす
れば、最小錯乱円は両者の中間にとにより試料上での電
子線束の形状を最小錯乱円4の状態にすることができる
By the way, if the shape of the electron beam on the sample when the excitation current I7 is, for example, 7, and when the excitation current Im is 6, then the circle of least confusion is between the two, and the shape of the electron beam on the sample is The shape of the beam bundle can be made into the state of the circle of least confusion 4.

従ってこの状態で電子線束を通常の二次元走査に戻せは
一方向に流れることのない鮮明な走査電子顕微鏡像を得
ることができる。
Therefore, if the electron beam flux is returned to normal two-dimensional scanning in this state, a clear scanning electron microscope image without flowing in one direction can be obtained.

尚θ−90°Xn (n=0,1,2.・・・・・・)
の場合にはIA、Imは電子線束が焦線2,3を結ぶ時
の励磁電流で与えられることは言う丑でもない。
Note that θ-90°Xn (n=0, 1, 2...)
Needless to say, in the case of , IA and Im are given by the excitation current when the electron beam connects the focal lines 2 and 3.

第4図は上述した本発明による方法を実施した走査電子
顕微鏡の一例を示す構成図であり、同図において11は
被観察試料である。
FIG. 4 is a configuration diagram showing an example of a scanning electron microscope that implements the method according to the present invention described above, and in the figure, 11 is a sample to be observed.

該試料11には図示しない電子銃から発生した電子線E
Bが対物レンズ12によって細く集束される。
The sample 11 contains an electron beam E generated from an electron gun (not shown).
B is narrowly focused by the objective lens 12.

13X。13Yは上記電子7iEBを試料11上で走査
するための偏向コイルである。
13X. 13Y is a deflection coil for scanning the electron 7iEB on the sample 11.

電子線照射によって試料11から発生した2次電子等の
情報は検出器14によって検出され、得られた検出信号
は増巾器15を介して自動焦点合わせ装置16へ送られ
る。
Information such as secondary electrons generated from the sample 11 by electron beam irradiation is detected by the detector 14, and the obtained detection signal is sent to the automatic focusing device 16 via the amplifier 15.

該自動焦点合わせ装置16はタイミング回路17からの
スタート信号aによって動作を開始し、逆に停止信号す
を上記タイミング回路17へ送って動作を終了する。
The automatic focusing device 16 starts its operation in response to a start signal a from a timing circuit 17, and conversely sends a stop signal A to the timing circuit 17 to end its operation.

動作中、自動焦点合わせ装置16は対物レンズ電流指定
信号Cを切換回路18を介して対物レンズ駆動回路19
へ送り対物レンズ電流を徐々に段階的に変化させる。
During operation, the automatic focusing device 16 passes the objective lens current designation signal C to the objective lens drive circuit 19 via the switching circuit 18.
The objective lens current is gradually changed step by step.

20及び21は記憶回路であり、該記憶回路20.21
にはスイッチ22.23を介して動作終了時の対物レン
ズ電流指定信号Cの値が記憶される。
20 and 21 are memory circuits, and the memory circuits 20 and 21
The value of the objective lens current designation signal C at the end of the operation is stored in via the switches 22 and 23.

24は平均回路であり、該平均回路24は上記記憶回路
20,21に記憶されている信号値の平均値dを求め、
該平均値dを前記切換回路18を介して前記1駆動回路
19へ送る。
24 is an averaging circuit, which calculates the average value d of the signal values stored in the storage circuits 20 and 21;
The average value d is sent to the first drive circuit 19 via the switching circuit 18.

25X、25Yは走査信号発生器であり、該発生器から
のX、Y走査信号は夫々切換回路26X。
25X and 25Y are scanning signal generators, and the X and Y scanning signals from the generators are respectively sent to a switching circuit 26X.

26Yを介して偏向コイル駆動回路27X、27Yへ送
られる。
The signal is sent to deflection coil drive circuits 27X and 27Y via 26Y.

上記駆動回路27Yには切換回路26Yを介してX走査
信号も送ることができるように構成されている。
The driving circuit 27Y is configured so that an X scanning signal can also be sent via a switching circuit 26Y.

更に上記走査信号発生器25X、25YはX、Y走査信
号に同期した同期信号も発生し、該同期信号はタイミン
グ回路17へ送られる。
Further, the scanning signal generators 25X and 25Y also generate synchronization signals synchronized with the X and Y scanning signals, and the synchronization signals are sent to the timing circuit 17.

尚上記切換回路18,26X、26Y及びスイッチ22
.23は前記タイミング回路17からのタイミング信号
によって制御される。
In addition, the above switching circuits 18, 26X, 26Y and switch 22
.. 23 is controlled by a timing signal from the timing circuit 17.

上述の如き構成において操作者によってスタートが指令
されると、タイミング回路17は切換回路18を自動焦
点合わせ装置側に、切換回路26X、26Yを端子2に
倒し、その他のスイッチ22,23を″開″の状態とす
る。
When a start is commanded by the operator in the configuration described above, the timing circuit 17 switches the switching circuit 18 to the automatic focusing device side, switches the switching circuits 26X and 26Y to the terminal 2, and opens the other switches 22 and 23. ” state.

次いでタイミング回路17はスタート信号aを自動焦点
合わせ装置16へ送り、焦点合わせ動作を開始させる。
Next, the timing circuit 17 sends a start signal a to the automatic focusing device 16 to start the focusing operation.

即ち自動焦点合わせ装置16は電子線EBがX方向に1
回走査される毎に対物レンズ電流を徐々に段階的に変化
させると共に、1回の水平走査毎に検出器14から得ら
れる検出信号の変化分の大きさを積算し、この積算値が
最も大きくなる対物レンズ電流値の時に停止信号すを発
して対物レンズ電流をその値例えばIxに固定する。
That is, the automatic focusing device 16 adjusts the electron beam EB to 1 in the X direction.
The objective lens current is gradually changed in stages for each horizontal scan, and the magnitude of the change in the detection signal obtained from the detector 14 is integrated for each horizontal scan, and this integrated value is the largest. When the objective lens current value is , a stop signal is issued to fix the objective lens current to that value, for example, Ix.

タイミング回路17は上記停止信号すに同期してスイッ
チ22を短い期間だけ閉じることにより、上記対物レン
ズ電流値Ixに対応する対物レンズ電流指定信号値Cx
を記憶回路20に記憶きせる。
The timing circuit 17 closes the switch 22 for a short period in synchronization with the stop signal, thereby setting the objective lens current designation signal value Cx corresponding to the objective lens current value Ix.
is stored in the memory circuit 20.

該記憶回路20にCxが記憶された後、タイミング回路
17は切換回路26X、26Yを端子3に倒すことによ
り、X走査信号をY方向偏向コイル13Yに送り、電子
線の走査方向をそれ以前と90°異なるY方向とする。
After Cx is stored in the memory circuit 20, the timing circuit 17 turns the switching circuits 26X and 26Y to the terminal 3, sends an X scanning signal to the Y direction deflection coil 13Y, and changes the scanning direction of the electron beam to the previous one. The Y directions differ by 90 degrees.

そしてタイミング回路17ばこの状態で再びスタート信
号aを自動焦点合わせ装置16へ送り、Y方向走査にお
ける焦点合わせを行う。
Then, with the timing circuit 17 activated, the start signal a is again sent to the automatic focusing device 16 to perform focusing in the Y direction scanning.

焦点合わせが終了して停止信号すがタイミング回路17
へ送られると、該タイミング回路17はスイッチ23を
短い期間閉じてその時の対物レンズ電流値■yに対応す
る対物レンズ電流指定信号cyを記憶回路20に記憶さ
せる。
When focusing is completed, a stop signal is sent to the timing circuit 17.
, the timing circuit 17 closes the switch 23 for a short period of time and causes the storage circuit 20 to store the objective lens current designation signal cy corresponding to the objective lens current value y at that time.

上述の様にして記憶回路20,21にCx、Cyが夫々
納められると、タイミング回路17は切換回路26X、
26Yを端子1にもどすと共に、切換回路18を平均回
路24側に倒すことにより送るようにしている。
When Cx and Cy are respectively stored in the memory circuits 20 and 21 as described above, the timing circuit 17 switches to the switching circuit 26X,
26Y is returned to terminal 1, and the switching circuit 18 is turned to the averaging circuit 24 side to send the signal.

従って対物レンズ電流は小錯乱円となる。Therefore, the objective lens current becomes a small circle of confusion.

そしてこの状態で電子線はX。Y走査信号によって試料
上で2次元的に走査されるため、検出信号を図示しない
表示装置へ供給すれば一方向に流れることのない鮮明な
走査電子顕微鏡像を得ることができる。
In this state, the electron beam is X. Since the sample is scanned two-dimensionally by the Y scanning signal, by supplying the detection signal to a display device (not shown), it is possible to obtain a clear scanning electron microscope image that does not flow in one direction.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図及び第2図は非点性収差を説明するための図、第
3図は電子線束の走査方向の太さを説明するための図、
第4図は本発明を実施した装置の一例を示す構成図であ
る。 12:対物レンズ、13X、13Y:偏向コイル、14
:検出器、16:自動焦点合わせ装置、17:タイミン
グ回路、18,26X、26Y:切換回路、20,21
:記憶回路、22、23 :スイッチ、24:平均回路
、25X、25Y:走査信号発生器。
Figures 1 and 2 are diagrams for explaining astigmatism, Figure 3 is a diagram for explaining the thickness of the electron beam in the scanning direction,
FIG. 4 is a configuration diagram showing an example of an apparatus implementing the present invention. 12: Objective lens, 13X, 13Y: Deflection coil, 14
: Detector, 16: Automatic focusing device, 17: Timing circuit, 18, 26X, 26Y: Switching circuit, 20, 21
: Memory circuit, 22, 23: Switch, 24: Average circuit, 25X, 25Y: Scanning signal generator.

Claims (1)

【特許請求の範囲】 1 電子線を集束レンズにより試料上に細く集束させて
照射する電子線装置において、電子線を試料上で少くと
も異なる2方向に走査し、走査に伴なって試料より発生
する情報に基づいて電子線のそれぞれの走査方向におけ
る太さが最小になる集束レンズ電流値をそれぞれ求め、
求めた複数のレンズ電流値の平均値に前記集束レンズの
レンズ電流を設定するようにしたことを特徴とする焦点
合わせ方法。 2 電子線を試料上に細く集束するだめの集束レンズと
、電子線を試料上で少くとも2方向に走査するための偏
向手段と、電子線走査に伴なって試料より発生する情報
に基づいて電子線の走査方向における太さが最小となる
集束レンズ電流値を検出する手段と、該検出手段によっ
て少くとも2つの異なる走査方向について求めたそれぞ
れの方向における電子線の太さを最小とする集束レンズ
電流値の平均値を求める手段とを備え、該平均値に応じ
たレンズ電流を前記集束レンズに供給するように構成し
たことを特徴とする電子線装置における焦点合わせ装置
[Claims] 1. In an electron beam device that narrowly focuses and irradiates an electron beam onto a sample using a focusing lens, the electron beam is scanned in at least two different directions on the sample, and the electron beam generated from the sample is scanned in at least two different directions on the sample. Based on the information obtained, find the focusing lens current value that minimizes the thickness of the electron beam in each scanning direction, and
A focusing method characterized in that the lens current of the focusing lens is set to the average value of the plurality of lens current values obtained. 2. A focusing lens for narrowly focusing the electron beam on the sample, a deflection means for scanning the electron beam in at least two directions on the sample, and a system based on information generated from the sample as the electron beam scans. means for detecting a focusing lens current value that minimizes the thickness of the electron beam in the scanning direction; and focusing that minimizes the thickness of the electron beam in each direction determined by the detection means in at least two different scanning directions. 1. A focusing device for an electron beam apparatus, comprising means for determining an average value of lens current values, and configured to supply a lens current corresponding to the average value to the focusing lens.
JP52157792A 1977-12-29 1977-12-29 Focusing method and device in electron beam equipment Expired JPS5816746B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP52157792A JPS5816746B2 (en) 1977-12-29 1977-12-29 Focusing method and device in electron beam equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP52157792A JPS5816746B2 (en) 1977-12-29 1977-12-29 Focusing method and device in electron beam equipment

Publications (2)

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JPS5492051A JPS5492051A (en) 1979-07-20
JPS5816746B2 true JPS5816746B2 (en) 1983-04-01

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JP52157792A Expired JPS5816746B2 (en) 1977-12-29 1977-12-29 Focusing method and device in electron beam equipment

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Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5766637A (en) * 1980-10-14 1982-04-22 Toshiba Corp Exposure device for electron beam

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5427703B2 (en) * 1971-09-06 1979-09-11
JPS5049442A (en) * 1973-09-06 1975-05-02
JPS5212560A (en) * 1975-07-21 1977-01-31 Hitachi Ltd Electronic beam probe control device

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JPS5492051A (en) 1979-07-20

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