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JPS5810843B2 - How to manufacture chip resistors - Google Patents
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JPS5810843B2 - How to manufacture chip resistors - Google Patents

How to manufacture chip resistors

Info

Publication number
JPS5810843B2
JPS5810843B2 JP55053261A JP5326180A JPS5810843B2 JP S5810843 B2 JPS5810843 B2 JP S5810843B2 JP 55053261 A JP55053261 A JP 55053261A JP 5326180 A JP5326180 A JP 5326180A JP S5810843 B2 JPS5810843 B2 JP S5810843B2
Authority
JP
Japan
Prior art keywords
electrode
resistor
printing
plating
firing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP55053261A
Other languages
Japanese (ja)
Other versions
JPS56148804A (en
Inventor
泰宏 進藤
幸雄 辻本
清二 津田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP55053261A priority Critical patent/JPS5810843B2/en
Publication of JPS56148804A publication Critical patent/JPS56148804A/en
Publication of JPS5810843B2 publication Critical patent/JPS5810843B2/en
Expired legal-status Critical Current

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Description

【発明の詳細な説明】 本発明は、チップ抵抗器の製造法に関するものである。[Detailed description of the invention] The present invention relates to a method of manufacturing a chip resistor.

最近、電子回路の高密度実装化、それにともなう電子機
器の小形、薄形、軽量化が行われ、それらの要望に合う
電子部品が開発され市場で使われつつある。
BACKGROUND ART Recently, electronic circuits have become more densely packaged, and as a result, electronic devices have become smaller, thinner, and lighter, and electronic components that meet these demands have been developed and are being used in the market.

それらの部品の一つとしてチップ抵抗器があるが、現在
のチップ抵抗器は使う立場より考えてみると改良の余地
があり、それらを改良することが使用者側よシ強く要望
されている。
One of these components is a chip resistor, but if you think about the current chip resistors from the standpoint of using them, there is room for improvement, and there is a strong demand from users to improve them.

本発明者らは、それらの要望を満すために新規なチップ
抵抗器の製造法を発明した。
The present inventors have invented a new method for manufacturing a chip resistor to meet those needs.

以下、従来のチップ抵抗器の製造法と本発明者らの発明
した製造法を比較しながら述べる。
Hereinafter, a conventional method for manufacturing a chip resistor and a manufacturing method invented by the present inventors will be compared and described.

従来のチップ抵抗器の製造工程の概略を第1図に、本発
明者らの発明した製造工程の概略を第2図に示している
FIG. 1 shows an outline of the manufacturing process of a conventional chip resistor, and FIG. 2 shows an outline of the manufacturing process invented by the present inventors.

まず、従来の製造工程は高純度アルミナ基板等の耐熱性
絶縁基板1を受入れる基板工程Aをスタートとし、ここ
で基板1には分割を容易にするだめのスリット2が設け
られている。
First, the conventional manufacturing process starts with a substrate process A in which a heat-resistant insulating substrate 1 such as a high-purity alumina substrate is received, and here the substrate 1 is provided with a slit 2 to facilitate division.

つぎに、上記基板1の表面に後述する抵抗体4を接続す
るために化学的に安定的な導電剤を印刷し焼成して電極
3を形成する電極印刷焼成工程Bを経て、上記電極3に
一部が重なるように抵抗体4を形成するために抵抗材料
を印刷し焼成する抵抗体印刷焼成工程Cが行われる。
Next, in order to connect a resistor 4, which will be described later, to the surface of the substrate 1, a chemically stable conductive agent is printed and fired to form the electrode 3. A resistor printing and firing step C is performed in which resistor material is printed and fired to form the resistor 4 so that the resistors 4 are partially overlapped.

つづいて、上記抵抗体4をガラス膜5で被覆し保護する
ためガラス印刷焼成工程りを経て、上記基板1を上記横
方向のスリット2に沿って分割し後述する端面電極を形
成するための準備工程である1次基板分割工程Eが実施
される。
Next, a glass printing and baking process is performed to cover and protect the resistor 4 with a glass film 5, and the substrate 1 is divided along the horizontal slits 2 to prepare for forming end electrodes to be described later. A primary substrate dividing step E is performed.

そして、1次基板分割された分割基板1′の端面部に端
面電極6を形成するだめの端面電極印刷焼成工程Fがつ
づいて行われ、その後上記電極3および端面電極6上に
はんだ付による電極くわれ防止およびはんだ付性の信頼
性を維持するためにメッキ膜7を形成する電極メッキ工
程Gが実施される。
Then, a final end-face electrode printing and baking step F is performed to form end-face electrodes 6 on the end faces of the divided substrate 1' obtained by dividing the primary substrate, and then electrodes are soldered onto the electrodes 3 and end-face electrodes 6. Electrode plating step G is performed to form a plating film 7 in order to prevent curling and maintain reliability of solderability.

つづいて、上記分割基板1′を土肥縦力向のスリット2
に沿って未修正チップ抵抗器単独品8に分割する2次基
板分割工程Hが行われ、その後上記抵抗体4の特性をそ
ろえるだめの抵抗値修正工程■が実施される。
Next, the divided substrate 1' is slit 2 in the direction of the vertical force.
A secondary substrate dividing step H is performed to divide the resistor into individual unmodified chip resistors 8 along the lines, and then a resistance value modifying step (2) is performed to make the characteristics of the resistor 4 uniform.

9はガラス膜5上より抵抗値修正を行った修正部分10
を有するチップ抵抗器であシ、この完成品の外観状態、
各種電気的特性等の各種チェック工程Jを通過したもの
が良品として市場へ送り出されることになる。
9 is a modified part 10 where the resistance value was modified from above the glass film 5.
The appearance condition of this finished product is a chip resistor with
Products that pass various check processes J for various electrical characteristics, etc. are sent to the market as non-defective products.

一方、本発明の製造工程について上記と同一工程、同一
箇所には同一記号、同一数字を付して第2図とともに説
明すると、基板受入工程A→電極印刷焼成工程B→抵抗
体印刷焼成工程Cまでは従来と同一工程で行われる。
On the other hand, the manufacturing process of the present invention will be explained with reference to FIG. 2, with the same steps as above, the same symbols and numbers assigned to the same parts, and the following: Substrate receiving process A → Electrode printing and firing process B → Resistor printing and firing process C The process up to this point is the same as before.

そして、本発明では抵抗体印刷焼成工程Cの後に抵抗値
修正工程■が行われ、修正部分10′は抵抗体4に直接
節されている。
In the present invention, the resistance value modification step (2) is performed after the resistor printing and firing step C, and the modified portion 10' is directly connected to the resistor 4.

その後、ガラス印刷焼成工程りを経て1次基板分割工程
Eが行われ、つづいて端面電極印刷焼成工程Fが実施さ
れる。
Thereafter, a glass printing and firing process is performed, a primary substrate dividing process E is performed, and then an end face electrode printing and firing process F is performed.

ここで、分割基板11には上述したように既に個々の抵
抗体4の抵抗値修正が行われている。
Here, the resistance values of the individual resistors 4 have already been corrected in the divided substrate 11 as described above.

つぎに、2次基板分割工程Hが行われ、電極メッキされ
ていないチップ抵抗器単独品11が得られる。
Next, a secondary substrate dividing step H is performed, and a single chip resistor product 11 without electrode plating is obtained.

つづいて、このチップ抵抗器単独品11の電極3および
端面電極6上にメッキ膜7′を形成する電極メッキ工程
Gが行われ、チップ抵抗器12の完成品が製作される。
Subsequently, an electrode plating step G is performed to form a plating film 7' on the electrode 3 and end surface electrode 6 of this single chip resistor product 11, and a completed chip resistor 12 is manufactured.

との後、各種チェック工程Jを経て良品が市場へ送シ出
されることになる。
After that, non-defective products are sent to the market after going through various check processes.

従来の製造工程と本発明の製造工程の違いは、上述の説
明より明らかなように抵抗値修正工程Iおよび電極メッ
キ工程Gの順序が違っていることである。
The difference between the conventional manufacturing process and the manufacturing process of the present invention is that, as is clear from the above explanation, the order of the resistance value correction process I and the electrode plating process G is different.

すなわち、従来の工程では第1図に示すように抵抗値修
正工程■は、チェック工程J前の最終工程になっている
That is, in the conventional process, the resistance value correction process (2) is the final process before the checking process J, as shown in FIG.

また、電極メッキ工程Gは端面電極印刷焼成工程F後、
そのままの状態で電極メッキを行う工程となっている。
In addition, the electrode plating process G is performed after the end face electrode printing and baking process F.
This is a process in which electrode plating is performed in that state.

これに対し、本発明の工程では、第2図に示すように抵
抗印刷焼成工程c後に抵抗値修正工程■を行っている。
On the other hand, in the process of the present invention, as shown in FIG. 2, the resistance value correction step (2) is performed after the resistance printing and firing step (c).

また、電極メッキ工程Gは、2次基板分割工程H後に電
極メッキを行う工程となっている。
Further, the electrode plating step G is a step in which electrode plating is performed after the secondary substrate dividing step H.

以上のように本発明の製造法は従来の製造工程と工程の
順序を変えていることにより、チップ固定抵抗器の構造
および電気的特性が以下に述べるように大きく違ってぐ
るのである。
As described above, the manufacturing method of the present invention changes the conventional manufacturing process and the order of the steps, so that the structure and electrical characteristics of the chip fixed resistor are significantly different as described below.

つぎに、本発明の工程で製造した製品と従来の工程で製
造した製品との各種特性比較の具体例を以下に示す。
Next, specific examples of comparisons of various characteristics between products manufactured by the process of the present invention and products manufactured by conventional processes will be shown below.

比較例 1 第3図に示すように、チップ抵抗器13のガラス膜(被
覆面)14の中央に幅2mの金属片15を置き、チップ
抵抗器13の電極部16と金属片15の間に交流電圧を
印加し、1秒間に50Vの割合で電圧を上昇し、破壊す
るまでの電圧を測定した。
Comparative Example 1 As shown in FIG. 3, a metal piece 15 with a width of 2 m is placed in the center of the glass film (coated surface) 14 of the chip resistor 13, and a metal piece 15 with a width of 2 m is placed between the electrode part 16 of the chip resistor 13 and the metal piece 15. An alternating current voltage was applied, the voltage was increased at a rate of 50 V per second, and the voltage until breakdown was measured.

そのガラス膜面耐圧試験結果を第4図に示す(試料数は
ともに20個である。
The results of the pressure resistance test on the glass membrane surface are shown in FIG. 4 (the number of samples was 20 in each case).

)。この結果よシ明らかなように、試験結果をX点で7
0ツトした従来の工程で製造したチップ抵抗器の特性イ
は最終工程で抵抗値修正を行っている関係上、抵抗体を
修正するためにはガラス被覆も削り取らなければならず
、抵抗体が露出しているだめ耐圧は250■以下である
). As is clear from this result, the test result is 7 with X points.
The characteristic of chip resistors manufactured using the conventional process is that the resistance value is modified in the final process, so in order to modify the resistor, the glass coating must also be removed, exposing the resistor. The withstand voltage of the product is 250μ or less.

しかし、試験結果を黒点でプロットした本発明者らの発
明した工程で製造したチップ抵抗器の特性イは、抵抗体
は完全に密封されており、ガラス被覆の電圧による絶縁
破壊まで充分に耐える構造になっており、全て750■
以上の耐圧がある。
However, the characteristics of the chip resistor manufactured by the process invented by the inventors, whose test results are plotted with black dots, are that the resistor is completely sealed and has a structure that can sufficiently withstand dielectric breakdown caused by the voltage of the glass coating. The total price is 750■
It has a withstand pressure of more than

比較例 2 従来の工程で製造したチップ抵抗器と本発明者らの発明
した工程で製造したチップ抵抗器との加速寿命の比較を
行った。
Comparative Example 2 A comparison was made in terms of accelerated life between a chip resistor manufactured using a conventional process and a chip resistor manufactured using a process invented by the present inventors.

すなわち、上記両チップ抵抗器(抵抗値は10Ω)を純
水中で煮沸し、時間の経過とともに抵抗値変化率を調べ
た。
That is, both of the above chip resistors (resistance value: 10Ω) were boiled in pure water, and the rate of change in resistance value was examined over time.

その加速寿命試験結果を第5図に示す。The accelerated life test results are shown in FIG.

その結果は、比較例1で述べたと同じ理由によシ従来の
製造工程で製造したチップ抵抗器の特性イは抵抗体が露
出しているため抵抗値変化率が非常に犬になっているこ
とが明らかである。
The result is that for the same reason as mentioned in Comparative Example 1, the characteristic A of the chip resistor manufactured using the conventional manufacturing process is that the rate of change in resistance value is extremely low because the resistor is exposed. is clear.

それに比較して、本発明者らの発明した工程で製造した
チップ抵抗器の特性口は抵抗値変化率が極小である。
In comparison, the characteristics of the chip resistor manufactured by the process invented by the present inventors have an extremely small rate of change in resistance value.

比較例 3 1 チップ抵抗器の製造工程のうち、電極メッキ工程が
従来の工程と本発明者らの発明した工程とでは異ってい
るのは上述した通りである。
Comparative Example 3 1 Among the manufacturing processes of a chip resistor, the electrode plating process is different between the conventional process and the process invented by the present inventors, as described above.

ここで電極メッキの目的は、チップ抵抗器の電極はグレ
ーズ系導電材料を使用している関係でそのままの状態で
使用すると、はんだ付の際にはんだ付温度が高かったり
、またはんだ何時間が長くかかる場合には電極がはんだ
にくわれる現象が起り、そのためにグレーズ系導電材料
の上に銅あるいはニッケル等のはんだに耐える金属メッ
キを行うが、それらのメッキ膜のみでははんだ付の信頼
性を確保することが困難なため、そのメッキ膜上にスズ
またははんだメッキを実施しているのである。
The purpose of electrode plating is that the electrodes of chip resistors use a glaze-based conductive material, so if they are used as is, the soldering temperature may be high during soldering, or the soldering time may take longer. In such cases, a phenomenon occurs in which the electrodes get caught in the solder, so a metal plating such as copper or nickel that is resistant to solder is applied on top of the glaze-based conductive material, but these plating films alone cannot ensure reliability of soldering. Since it is difficult to do so, tin or solder plating is performed on the plating film.

しかし、チップ抵抗器の電極部分のメッキ方法が異なる
と電極構造が異なり、以下のように特性の違いが起るの
である。
However, if the plating method of the electrode portion of the chip resistor is different, the electrode structure will be different, and the characteristics will differ as shown below.

この特注の違いを明らかにするため、以下のような試験
を実施した。
In order to clarify the differences in this custom-made product, we conducted the following tests.

すなわち、チップ抵抗器の試験用プリント基板に、従来
の製造工程で製造した100にΩのチップ抵抗器と本発
明者らの発明した工程で製造した100にΩのチップ抵
抗器をはんだ付でプリント基板の銅箔と接続し、それら
チップ抵抗器のそれぞれの上に純水をチップ抵抗器が完
全に沈んでしまうまで補給し、その後直流電圧20Vを
60秒間印加した。
That is, a 100-ohm chip resistor manufactured using the conventional manufacturing process and a 100-ohm chip resistor manufactured using the process invented by the present inventors were soldered onto a printed circuit board for chip resistor testing. It was connected to the copper foil of the substrate, and pure water was supplied onto each of the chip resistors until the chip resistors were completely submerged, and then a DC voltage of 20 V was applied for 60 seconds.

その結果、従来の工程で製造したチック抵抗器は直流電
圧のプラス側で電極材料が溶出していることが確認され
た。
As a result, it was confirmed that the electrode material of the tick resistor manufactured using the conventional process was eluted on the positive side of the DC voltage.

一方、本発明者らの発明した工程で製造したチップ抵抗
器はそのような現象は発生していないことが確認できた
On the other hand, it was confirmed that such a phenomenon did not occur in the chip resistor manufactured by the process invented by the present inventors.

この理由は、従来の製造工程の電極メッキは、第1図に
示すように端面電極印刷焼成工程後のそのままの形状、
すなわちチップ抵抗器が横に連続している状態で行われ
ており、その後にチップ抵抗器を単独に分割しているの
で、断面部分はアルミナ基板よりブレース系導電材料、
ニッケルメッキ膜、はんだメッキ膜の順で層状に露出し
ているためである。
The reason for this is that the electrode plating in the conventional manufacturing process does not have the same shape after the end face electrode printing and firing process as shown in Figure 1.
In other words, since the chip resistor is installed in a horizontally continuous state, and then the chip resistor is divided into individual pieces, the cross section is made of a brace type conductive material, rather than an alumina substrate.
This is because the nickel plating film and the solder plating film are exposed in layers in this order.

これに対して、本発明者らの発明の電極メッキ工程は第
2図の工程図に示しているように2次基板分割後、すな
わちチップ抵抗器単独に分割してから電極メッキを行う
ので、グレーズ系導電材料をニッケルメッキ膜で完全に
被覆し、そのニッケル膜上をまたはんだメッキ膜で完全
に被覆しており、グレーズ系導電材料を完全に密封した
構造になっているからである。
On the other hand, in the electrode plating process of the present inventors' invention, as shown in the process diagram of FIG. 2, electrode plating is performed after dividing the secondary board, that is, after dividing it into individual chip resistors. This is because the glaze-based conductive material is completely covered with a nickel plating film, and the nickel film is completely covered with a plating film that extends over the nickel film, resulting in a structure in which the glaze-based conductive material is completely sealed.

比較例 4 比較例3と同じ方法で直流電圧をIOVに設定し、印加
時間を5分より20分まで変化させ、従来の製造工程と
本発明者らの発明した製造工程とで製造したそれぞれの
チップ抵抗器を各試験条件で各10個ずつ試験を行い、
電極材料の溶出状態を調べた。
Comparative Example 4 The DC voltage was set to IOV in the same manner as Comparative Example 3, and the application time was varied from 5 minutes to 20 minutes, and each of the samples manufactured using the conventional manufacturing process and the manufacturing process invented by the present inventors was Ten chip resistors were tested under each test condition,
The elution state of the electrode material was investigated.

その結果を第6図に示しており、ハツチングで示される
個数が電極材料の溶出したものである。
The results are shown in FIG. 6, and the number indicated by hatching indicates the amount of electrode material eluted.

この結果、イで示す従来の工程で製造したチップ抵抗器
は、時間とともに電極の溶出個数は増加しているが、口
で示す本発明の工程で製造したチップ抵抗器は上記のよ
うな現象は全く発生していないことが明らかである。
As a result, the number of eluted electrodes increases over time in chip resistors manufactured using the conventional process shown in ``A'', but the above phenomenon does not occur in chip resistors manufactured using the process of the present invention shown in ``A''. It is clear that this has not occurred at all.

本発明の製造工程で製造したチップ抵抗器は、以上の比
較例および第1図、第2図の製造工程図よりその特長は
明らかであるが、再度以下にその特長を列挙する。
The characteristics of the chip resistor manufactured by the manufacturing process of the present invention are clear from the above comparative example and the manufacturing process diagrams of FIGS. 1 and 2, and the characteristics will be listed again below.

(1)抵抗値修正を分割しない基板状態で行うので、抵
抗値の測定の容易さおよび測定速度が速くなるとともに
、抵抗値修正を実施する場合に一定間隔で規則正しく整
列しているので修正速度が非常に速くなる。
(1) Resistance value correction is carried out on an undivided board, making it easier and faster to measure resistance values, and when performing resistance value correction, since they are arranged regularly at regular intervals, the correction speed is faster. becomes very fast.

例えば、レーザ修正法と組合せれば従来の工程の10倍
以上の生産性の向上になる。
For example, when combined with a laser modification method, productivity can be improved by more than 10 times compared to conventional processes.

(2)抵抗体の上にガラス被覆がないので抵抗体の修正
を正確に行うことができ、また修正状態が正確に確認で
きるとともに修正するだめのエネルギーおよび材料がガ
ラス被覆を行っているよりも少なくて済み、省資源、省
エネルギー化につながる。
(2) Since there is no glass coating on the resistor, it is possible to correct the resistance element accurately, and the correction status can be confirmed accurately, and the energy and materials required for correction are lower than when the resistor is covered with glass. It requires less, leading to resource and energy savings.

(3)チップ抵抗体単独に分割してから電極メッキを行
うので、メッキ作業として従来の方法をそのまま使用で
き、特殊な設備等を必要としないので非常に経済的であ
る。
(3) Since electrode plating is performed after dividing the chip resistor into individual chip resistors, conventional methods can be used for plating as is, and no special equipment is required, making it very economical.

(4)グレーズ系電極部分が完全にメッキ膜で密封され
た状態になっているので、はんだ何時の電極くわれがま
ったくなく、まだはんだ術後の電極溶出を完全に防止し
ている。
(4) Since the glaze-based electrode part is completely sealed with a plating film, there is no damage to the electrode during soldering, and electrode elution after soldering is completely prevented.

(5)抵抗値修正をガラス印刷前に行っているので抵抵
体を完全にガラス被覆することができ、悪環境下でもそ
れらの雰囲気に抵抗体が影響されることなく、極めて信
頼性の高いチップ抵抗器を製造することができる。
(5) Since the resistance value is corrected before glass printing, the resistor can be completely coated with glass, and the resistor will not be affected by the atmosphere even in adverse environments, making it extremely reliable. Chip resistors can be manufactured.

(6)特長(4)および(5)を兼ね備えているので、
はんだ付条件を選ばずはんだ付が可能で、しかもチップ
抵抗器の取付は表材および裏付(抵抗体はガラス被膜で
絶縁が完全にできているため)が可能である。
(6) Since it combines features (4) and (5),
Soldering is possible regardless of the soldering conditions, and chip resistors can be mounted on either the front or the back (because the resistor is completely insulated with a glass coating).

(7)チップ抵抗器に品番を表示する場合、表面、裏面
とも可能である。
(7) When displaying the product number on a chip resistor, it can be displayed on both the front and back sides.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は従来におけるチップ抵抗器の製造工程を示す概
略図、第2図は本発明におけるチップ抵抗器の製造工程
を示す概略図、第3図はチップ抵抗器の耐電圧測定法を
説明するだめの概略図、第4図は本発明方法と従来方法
によシ得られたチップ抵抗器のガラス膜面耐圧試験結果
を比較した図、第5図は同じく加速寿命試験(煮沸テス
ト)結果を比較した図、第6図は同じく電極材料溶出試
験結果を比較した図である。 1……耐熱姓絶縁基板、1”……分割基板、3……電極
、4……抵抗体、5……ガラス膜、6……端面電極、7
’……メツキ膜、10′……抵抗修正部分、12……チ
ツプ抵抗器。
Fig. 1 is a schematic diagram showing a conventional manufacturing process of a chip resistor, Fig. 2 is a schematic diagram showing a manufacturing process of a chip resistor according to the present invention, and Fig. 3 explains a method for measuring withstand voltage of a chip resistor. Figure 4 is a diagram comparing the results of the glass membrane surface pressure test of chip resistors obtained by the method of the present invention and the conventional method, and Figure 5 is a diagram showing the results of the accelerated life test (boiling test). The comparison diagram, FIG. 6, is a diagram also comparing the electrode material elution test results. DESCRIPTION OF SYMBOLS 1...Heat-resistant insulating substrate, 1"...Divided substrate, 3...Electrode, 4...Resistor, 5...Glass film, 6...End surface electrode, 7
'...Metallic film, 10'...Resistance correction part, 12...Chip resistor.

Claims (1)

【特許請求の範囲】[Claims] 1 耐熱性絶縁基板の表面に抵抗体を接続するだめの電
極として化学的に安定な導電剤を印刷し焼成する工程と
、前記電極に一部が重なるように抵抗体を形成するため
に抵抗材料を印刷し焼成する工程と、前記抵抗体の特性
をそろえるだめの抵抗値修正工程と、前記抵抗体および
抵抗修正部分をガラス被覆し保護するだめのガラス印刷
焼成工程と、端面電極を形成するだめの準備工程である
1次基板分割工程と、この分割基板の端面部の電極形成
を行うだめの端面電極印刷焼成工程と、電極メッキの準
備工程である2次基板分割工程と、前記電極および端面
電極上にメッキ膜を形成しはんだ付による電極くわれ防
止およびはんだ付性の信頼性を確保するための電極メッ
キ工程とを順次行うことを特徴とするチップ抵抗器の製
造法。
1. A step of printing and firing a chemically stable conductive agent as an electrode for connecting a resistor on the surface of a heat-resistant insulating substrate, and a step of printing a resistive material to form a resistor so as to partially overlap the electrode. a step of printing and firing the resistor, a step of modifying the resistance value to match the characteristics of the resistor, a step of printing and firing glass to cover and protect the resistor and the resistance modifying portion with glass, and a step of forming the end electrode. a primary substrate dividing step which is a preparatory step, a final end surface electrode printing and firing step for forming electrodes on the end surfaces of the divided substrates, a secondary substrate dividing step which is a preparatory step for electrode plating, and a secondary substrate dividing step which is a preparatory step for electrode plating. A method for manufacturing a chip resistor, which comprises sequentially performing an electrode plating process to form a plating film on an electrode and to prevent the electrode from being bent during soldering and to ensure reliability of solderability.
JP55053261A 1980-04-22 1980-04-22 How to manufacture chip resistors Expired JPS5810843B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP55053261A JPS5810843B2 (en) 1980-04-22 1980-04-22 How to manufacture chip resistors

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP55053261A JPS5810843B2 (en) 1980-04-22 1980-04-22 How to manufacture chip resistors

Publications (2)

Publication Number Publication Date
JPS56148804A JPS56148804A (en) 1981-11-18
JPS5810843B2 true JPS5810843B2 (en) 1983-02-28

Family

ID=12937826

Family Applications (1)

Application Number Title Priority Date Filing Date
JP55053261A Expired JPS5810843B2 (en) 1980-04-22 1980-04-22 How to manufacture chip resistors

Country Status (1)

Country Link
JP (1) JPS5810843B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59166881U (en) * 1983-04-22 1984-11-08 セイレイ工業株式会社 Automatic wind control device for grain wind sorter

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58212103A (en) * 1982-06-02 1983-12-09 立山科学工業株式会社 Method of producing chip resistor
JPS6022303A (en) * 1983-07-18 1985-02-04 ロ−ム株式会社 Method of coating electrode film in chip resistor
JPS6081802A (en) * 1983-10-12 1985-05-09 興亜電工株式会社 Method of producing chip resistor
JPS6081801A (en) * 1983-10-12 1985-05-09 興亜電工株式会社 Method of producing chip resistor
JPS60116108A (en) * 1983-11-28 1985-06-22 株式会社タイセー Method of producing leadless cylindrical metal film resistor
JPS6351662A (en) * 1986-08-21 1988-03-04 Toshiba Corp Aluminum nitride substrate and manufacture thereof
JPS63209105A (en) * 1987-02-25 1988-08-30 ロ−ム株式会社 Method of trimming chip resistor
JPH0646602B2 (en) * 1987-03-13 1994-06-15 松下電器産業株式会社 Manufacturing method of chip resistor
JPH0673324B2 (en) * 1987-03-13 1994-09-14 松下電器産業株式会社 Manufacturing method of chip resistor
JPS63226004A (en) * 1987-03-13 1988-09-20 松下電器産業株式会社 Manufacturing method of chip resistor
JPH0350703A (en) * 1989-07-18 1991-03-05 Matsushita Electric Ind Co Ltd Manufacture of chip resistor
JP2535441B2 (en) * 1990-08-21 1996-09-18 ローム株式会社 Manufacturing method of chip resistor
JPH0618121B2 (en) * 1991-07-12 1994-03-09 ローム株式会社 Chip resistor
WO2003046934A1 (en) 2001-11-28 2003-06-05 Rohm Co.,Ltd. Chip resistor and method for producing the same
JP4904825B2 (en) * 2006-01-19 2012-03-28 パナソニック株式会社 Manufacturing method of chip resistor
JP5360330B2 (en) 2011-02-24 2013-12-04 パナソニック株式会社 Chip resistor and manufacturing method thereof

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5132553B2 (en) * 1973-05-19 1976-09-13
JPS5823753B2 (en) * 1975-05-01 1983-05-17 日東電工株式会社 Cairo Banzai Ryo
JPS5426457A (en) * 1977-07-29 1979-02-28 Matsushita Electric Industrial Co Ltd Method of making tip resistor

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59166881U (en) * 1983-04-22 1984-11-08 セイレイ工業株式会社 Automatic wind control device for grain wind sorter

Also Published As

Publication number Publication date
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