JPS5813487B2 - Kagobutsuno Gouseisouchi - Google Patents
Kagobutsuno GouseisouchiInfo
- Publication number
- JPS5813487B2 JPS5813487B2 JP12610273A JP12610273A JPS5813487B2 JP S5813487 B2 JPS5813487 B2 JP S5813487B2 JP 12610273 A JP12610273 A JP 12610273A JP 12610273 A JP12610273 A JP 12610273A JP S5813487 B2 JPS5813487 B2 JP S5813487B2
- Authority
- JP
- Japan
- Prior art keywords
- arsenic
- differential pressure
- pressure valve
- liquid metal
- vapor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 229910052785 arsenic Inorganic materials 0.000 claims description 37
- RQNWIZPPADIBDY-UHFFFAOYSA-N arsenic atom Chemical compound [As] RQNWIZPPADIBDY-UHFFFAOYSA-N 0.000 claims description 35
- 239000010453 quartz Substances 0.000 claims description 28
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 28
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 claims description 25
- 229910001338 liquidmetal Inorganic materials 0.000 claims description 25
- 150000001875 compounds Chemical class 0.000 claims description 15
- 229910052698 phosphorus Inorganic materials 0.000 claims description 13
- 239000011574 phosphorus Substances 0.000 claims description 12
- 230000015572 biosynthetic process Effects 0.000 claims description 11
- 238000003786 synthesis reaction Methods 0.000 claims description 11
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 claims 1
- 229910052700 potassium Inorganic materials 0.000 claims 1
- 239000011591 potassium Substances 0.000 claims 1
- 229910052751 metal Inorganic materials 0.000 description 17
- 239000002184 metal Substances 0.000 description 17
- 229910052733 gallium Inorganic materials 0.000 description 13
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 description 12
- 239000013078 crystal Substances 0.000 description 7
- 230000002194 synthesizing effect Effects 0.000 description 6
- LULLIKNODDLMDQ-UHFFFAOYSA-N arsenic(3+) Chemical compound [As+3] LULLIKNODDLMDQ-UHFFFAOYSA-N 0.000 description 5
- JBRZTFJDHDCESZ-UHFFFAOYSA-N AsGa Chemical compound [As]#[Ga] JBRZTFJDHDCESZ-UHFFFAOYSA-N 0.000 description 4
- 229910005540 GaP Inorganic materials 0.000 description 4
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 4
- HZXMRANICFIONG-UHFFFAOYSA-N gallium phosphide Chemical compound [Ga]#P HZXMRANICFIONG-UHFFFAOYSA-N 0.000 description 4
- 238000006243 chemical reaction Methods 0.000 description 3
- 229910021478 group 5 element Inorganic materials 0.000 description 3
- 229910052738 indium Inorganic materials 0.000 description 3
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 3
- 230000001276 controlling effect Effects 0.000 description 2
- 238000005538 encapsulation Methods 0.000 description 2
- BHEPBYXIRTUNPN-UHFFFAOYSA-N hydridophosphorus(.) (triplet) Chemical compound [PH] BHEPBYXIRTUNPN-UHFFFAOYSA-N 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 230000001105 regulatory effect Effects 0.000 description 2
- 238000002425 crystallisation Methods 0.000 description 1
- 230000008025 crystallization Effects 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 238000005553 drilling Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 238000001308 synthesis method Methods 0.000 description 1
Landscapes
- Crystals, And After-Treatments Of Crystals (AREA)
Description
【発明の詳細な説明】
本発明は、すくなくとも2種類以上のV族元素を含む■
−■族化合物、特にGaAsP化合物の封管を用いた合
成装置に関するものである。DETAILED DESCRIPTION OF THE INVENTION The present invention provides
The present invention relates to a synthesis apparatus using a sealed tube for -■ group compounds, particularly GaAsP compounds.
本発明者等は、かねてより、すくなくとも2種類以上の
V族元素を含む■−■族化合物を合成する技術の開発に
努めており、その成果を先に特願昭48−63631号
特開昭50−10796号公報として提案した。The present inventors have been working for some time to develop a technology for synthesizing ■-■ group compounds containing at least two or more types of group V elements, and the results were first published in Japanese Patent Application No. 48-63631. It was proposed as Publication No. 50-10796.
この特願昭48−63631号発明の要旨は、[すくな
くとも2種類以上の■族元素を含む■−v族化合物の封
管を用いた合成法において、■族元素のすくなくとも1
種類を差圧弁を通じ、加熱された■族元素の収容された
封管中に導き、これとあらかじめ同封管中に封入された
他種の■族元素とを同時に、■族元素に吸収させ均一組
成からなる多成分を含むI−V族化合物を合成すること
を特徴とする化合物の合成方法。The gist of the invention of Japanese Patent Application No. 48-63631 is that [a synthesis method using a sealed tube of a ■-V group compound containing at least two or more types of group ■ elements,
The type is introduced through a differential pressure valve into a sealed tube containing a heated group III element, and this and other group III elements previously sealed in the sealed tube are simultaneously absorbed into the group III element to create a uniform composition. 1. A method for synthesizing a compound, which comprises synthesizing a group IV compound containing multiple components.
」であり、差圧弁を用いるという技術的思想を創作する
ことによって均質な組成を持つ化合物を合成することを
可能としたものである。'', which made it possible to synthesize a compound with a homogeneous composition by creating the technical idea of using a differential pressure valve.
さてこの特願昭48−63631号発明の実施に必要な
差圧弁は、その機能さえ満足するものであれば、特定の
構造に限定する必要がないのは当然である。It goes without saying that the differential pressure valve necessary for carrying out the invention of Japanese Patent Application No. 48-63631 need not be limited to a particular structure as long as it satisfies its function.
本発明者等も公知の種々の差圧弁を試用し、それぞれ妥
当な結果を得た。The inventors also tried various known differential pressure valves and obtained reasonable results with each.
しかし合成された化合物に取り込まれる不純物の観点、
操作性の観点、合成装置としての構造の観点など多くの
観点から見て全てに完全な差圧弁は無いと言ってよかっ
た。However, from the perspective of impurities incorporated into the synthesized compound,
It is safe to say that there is no perfect differential pressure valve from many points of view, including operability and the structure of the synthesizer.
比較的満足すべき結果を与えた差圧弁は、石英板に孔を
穿ったオリフイスであらたか、微小な差圧を容易に制御
するという観点から見ると不充分なものであった。The differential pressure valves that gave relatively satisfactory results were either orifices made by drilling holes in quartz plates, or they were inadequate from the viewpoint of easily controlling minute differential pressures.
本発明の目的は、Ga,As,Pからなる化合物の合成
に適して化合物の合成装置を提供することにある。An object of the present invention is to provide a compound synthesis apparatus suitable for synthesizing compounds consisting of Ga, As, and P.
本発明による合成装置の基本的構成は、第1図aに例示
したようである。The basic configuration of the synthesis apparatus according to the present invention is as illustrated in FIG. 1a.
第1図aは、特願昭48−63631号の第3図aに示
した合成装置の1例とは、上下方向の配置が逆転してい
るが、それらの間に何ら本質的な差違はない。Although the vertical arrangement of FIG. 1a is reversed from that of the example of the synthesis apparatus shown in FIG. 3a of Japanese Patent Application No. 48-63631, there is no essential difference between them. do not have.
さて第1図aに例示した合成装置は上部から、■族元素
Iを収容する室、V族元素2を収容する室、差圧弁4、
そして他の■族元素3を収容する室と配置されて構成さ
れる。Now, from the top, the synthesis apparatus illustrated in FIG.
It is arranged and configured with a chamber for accommodating other group Ⅰ elements.
以下、説明を明確にするために、■族元素1としてガリ
ウムを、■族元素2として金属砒素を、V族元素3とし
て赤燐を用い、燐化砒化ガリウムを合成する場合を例に
とって詳述する。In order to make the explanation clear, the following will explain in detail the case where gallium phosphide arsenide is synthesized using gallium as the group ■ element 1, metallic arsenic as the group ■ element 2, and red phosphorus as the group V element 3. do.
このように使用する■族元素、V族元素が特定されれば
、それぞれの元素を収容する室の設定温度は特定され、
この場合は第1図aと並べて示した第1図bのような温
度分布が例示される。Once the group ■ elements and group V elements to be used are identified in this way, the set temperature of the chamber containing each element is determined.
In this case, a temperature distribution as shown in FIG. 1b shown side by side with FIG. 1a is exemplified.
さて本発明による合成装置の特徴は差圧弁の構成にある
。Now, the feature of the synthesis apparatus according to the present invention lies in the configuration of the differential pressure valve.
本発明者等は、前記石英板に孔を穿ったオリフイスの欠
点を改良するために、孔に替えて石英毛細管を使用し、
石英毛細管の形状や内径や長さなどで差圧弁のコンダク
タンスを制御することを考えた。The present inventors used a quartz capillary tube instead of the hole in order to improve the drawbacks of the orifice in which a hole was made in the quartz plate,
We considered controlling the conductance of the differential pressure valve by changing the shape, inner diameter, and length of the quartz capillary.
すなわち第2図に縦断面を示したような構成で、石英板
5に封着した石英毛細管6からなるものである。That is, it has a configuration as shown in the longitudinal section in FIG. 2, and consists of a quartz capillary tube 6 sealed to a quartz plate 5.
7は金属砒素で合成装置に収容された場合の様子を示し
ており、第1図aの2に相当する。7 shows the situation when metal arsenic is housed in a synthesis apparatus, and corresponds to 2 in FIG. 1a.
第2図に示した差圧弁を備えた第1図aの構成をもった
合成装置を使用することにより均一な組成を持つ砒化燐
化ガリウム結晶を得ることができた。By using a synthesis apparatus having the configuration shown in FIG. 1a and equipped with the differential pressure valve shown in FIG. 2, it was possible to obtain gallium arsenide phosphide crystals having a uniform composition.
この場合上記の石英板5に封着した石英毛細管6は、燐
蒸気がガリウムおよび金属砒素収容室に送入されること
を許すが、砒素蒸気牟赤燐収容室へ私散することを防ぐ
役目をするものである。In this case, the quartz capillary tube 6 sealed to the quartz plate 5 allows phosphorus vapor to be introduced into the gallium and metal arsenic storage chamber, but serves to prevent the arsenic vapor from dispersing into the red phosphorus storage chamber. It is something.
何故ならば赤燐の蒸気圧を砒素の蒸気圧よりも大きくし
てあるからである。This is because the vapor pressure of red phosphorus is higher than that of arsenic.
しかしながらその後差圧弁、石英板5に封着した石英毛
細管6(第2図)を使用した実験を続けた結果、石英毛
細管の管径が0.2朋φ以下、長さ50mm以上である
と結晶の大部分は均一な組成であるが、合成して得た化
合物のインゴットの先端部で燐化ガリウムの濃度が減少
することが判った(第5図−a)。However, as a result of continuing experiments using a differential pressure valve and a quartz capillary tube 6 (Fig. 2) sealed to a quartz plate 5, it was found that if the diameter of the quartz capillary tube was 0.2 mm or less and the length was 50 mm or more, crystallization occurred. Most of the composition was uniform, but it was found that the concentration of gallium phosphide decreased at the tip of the ingot of the synthesized compound (Figure 5-a).
これは石英毛細管か細すぎて、燐蒸気のガリウム収容室
への流入時間が長くかかり、燐蒸気と砒素蒸気とが平衡
に達しないうちに砒化燐化ガリウム結晶が成長してしま
うためであった。This was because the quartz capillary was too thin and it took a long time for the phosphorus vapor to flow into the gallium storage chamber, causing gallium arsenide phosphide crystals to grow before the phosphorus vapor and arsenic vapor reached equilibrium. .
又、管径のより大きい石英毛細管を使用した実施例では
、インゴット先端部の組成の不均一性は大きく改善され
たが、インゴット後端部で、燐化ガリウムの濃度が増大
してしまうことがわかった(第5図−b)。In addition, in an example using a quartz capillary tube with a larger diameter, the compositional non-uniformity at the tip of the ingot was greatly improved, but the concentration of gallium phosphide increased at the rear end of the ingot. I understand (Figure 5-b).
これは石英毛細管が太すぎて、砒素蒸気が赤燐収容室へ
拡散してしまい、砒素の蒸気圧が下がったためであった
。This was because the quartz capillary was too thick, allowing arsenic vapor to diffuse into the red phosphorus storage chamber, lowering the arsenic vapor pressure.
これに対して、本発明による合成装置を提供することに
よって成長した結晶の先端部または後端部で組成の不均
一性が生ずることを解決して、インゴット全体にわたっ
て均一な組成を持つ化合物を合成する装置を提供するこ
とができる。In contrast, by providing a synthesis apparatus according to the present invention, the problem of compositional non-uniformity occurring at the leading or trailing end of a grown crystal can be solved and a compound having a uniform composition throughout the ingot can be synthesized. It is possible to provide a device for
本発明によれば、縦型の密閉反応容器内で化合物を合成
する場合に使用する石英毛細管と液体金属シールとから
なる差圧弁を具備する合成装置を得る。According to the present invention, there is obtained a synthesis apparatus equipped with a differential pressure valve consisting of a quartz capillary tube and a liquid metal seal, which is used when synthesizing a compound in a vertical closed reaction vessel.
石英毛細管は微細圧力調整として、液体金属シールは過
大圧力調整として働き、インゴット全体にわたって均一
な組成を得ることができる。The quartz capillary acts as a fine pressure regulator and the liquid metal seal acts as an overpressure regulator to obtain a uniform composition throughout the ingot.
第3図は、本発明による改良された差圧弁の断面図を示
す。FIG. 3 shows a cross-sectional view of an improved differential pressure valve according to the invention.
8は石英毛細管、9は液体金属、10は液体金属保持板
、11は過大圧力調整孔、12は金属砒素保持板、13
は金属砒素である。8 is a quartz capillary tube, 9 is a liquid metal, 10 is a liquid metal holding plate, 11 is an overpressure adjustment hole, 12 is a metal arsenic holding plate, 13
is metallic arsenic.
次にこの差圧弁の働きを説明する。Next, the function of this differential pressure valve will be explained.
まず、密閉反応容器に、ガリウム、金属砒素、赤燐を所
定の位置に所定量封入し、液体金属シールとしてはイン
ジウムまたはガリウムを用いる。First, a predetermined amount of gallium, metallic arsenic, and red phosphorus are sealed at predetermined positions in a closed reaction vessel, and indium or gallium is used as a liquid metal seal.
ついで密閉反応容器の中を真空にし、電気炉中にセット
し温度を上昇させる。Next, the inside of the sealed reaction vessel is evacuated, and the vessel is placed in an electric furnace and the temperature is raised.
液体金属シールとして用いるインジウムまたはガリウム
の融点はそれぞれ156℃または29.7℃であるから
、差圧弁の所の温度は少くとも160℃以上とすればイ
ンジウム、ガリウムは液体金属シールとして働らくこと
になる。The melting points of indium and gallium used as liquid metal seals are 156°C and 29.7°C, respectively, so if the temperature at the differential pressure valve is at least 160°C, indium and gallium will work as liquid metal seals. Become.
さて例えば赤燐の温度を420℃とすると燐の蒸気圧は
1気圧、金属砒素の温度を550℃とすると砒素の蒸気
圧は0.3気圧となるから、差圧弁の所で0.7気圧の
過大な圧力差が最初存在する。For example, if the temperature of red phosphorus is 420°C, the vapor pressure of phosphorus is 1 atm, and if the temperature of metal arsenic is 550°C, the vapor pressure of arsenic is 0.3 atm, so at the differential pressure valve it is 0.7 atm. An excessive pressure difference initially exists.
この過犬な圧力差によって第3図11の過大圧力調整孔
内の液体金属9は押し下げられ、ついにシールが破れて
、燐蒸気は金属砒素収容室内に流入する。This excessive pressure difference pushes down the liquid metal 9 in the overpressure adjustment hole of FIG. 3, and finally the seal breaks and phosphorous vapor flows into the metal arsenic storage chamber.
この燐蒸気の流入は、差圧弁のところで圧力差がほとん
ど無くなるまで続く。This inflow of phosphorus vapor continues until the pressure difference at the differential pressure valve is almost eliminated.
即ち0.7気圧分の燐蒸気が金属砒素収容室内に流入す
る。That is, 0.7 atm of phosphorous vapor flows into the metal arsenic storage chamber.
その結果赤燐収容室側では燐の蒸気圧が1気圧、金属砒
素収容室側では0.3気圧の砒素蒸気と、0,7気圧の
燐蒸気とで1気圧となり、差圧弁の上下で圧力バランス
する。As a result, the vapor pressure of phosphorus on the red phosphorus storage chamber side is 1 atm, and on the metal arsenic storage chamber side, the arsenic vapor at 0.3 atm and the phosphorus vapor at 0.7 atm become 1 atm, and the pressure at the top and bottom of the differential pressure valve becomes 1 atm. balance.
そして過大圧力調整孔11内は再び液体金属9によって
満たされ、シールされる。Then, the inside of the overpressure adjustment hole 11 is again filled with the liquid metal 9 and sealed.
これ以後結晶が成長しても差圧弁の上下に大きな圧力差
のあらわれることはないから、液体金属シールが壊れる
ことはない。After this point, even if crystals grow, there will be no large pressure difference between the top and bottom of the differential pressure valve, so the liquid metal seal will not break.
即ち砒化燐化ガリウム結晶が成長するにしたがい、金属
砒素およびガリウム収容室内の燐蒸気は消費されて、燐
蒸気は少しづつ減少しようとするが、その減少しようと
する場合は非常に遅いので、そのような微細な圧力減少
は、微細圧力調整用としての石英毛細管8を通して補わ
れ、差圧弁の上下で圧力がバランスし、金属砒素および
ガリウム収容室内の燐および砒素蒸気の分圧は一定に保
たれ、その結果第5図−Cに示すようなインゴット全体
にわたる均一な組成を持つ砒化燐化ガリウム結晶を得る
ことができる。That is, as the gallium arsenide phosphide crystal grows, the metal arsenic and phosphorus vapor in the gallium storage chamber are consumed, and the phosphorus vapor tends to decrease little by little, but the reduction is very slow, so Such a minute pressure decrease is compensated for through the quartz capillary tube 8 for minute pressure adjustment, and the pressure is balanced above and below the differential pressure valve, and the partial pressures of phosphorus and arsenic vapor in the metal arsenic and gallium storage chamber are kept constant. As a result, a gallium arsenide phosphide crystal having a uniform composition throughout the ingot as shown in FIG. 5-C can be obtained.
また石英毛細管の管径を充分細くすることができるから
、砒素蒸気の赤燐収容室への拡散はごくわずかであり、
ほとんど計数量の金属砒素だけでも、第5図一bに示す
ような、インゴット後端部で燐化ガリウムの濃度が増大
することもない。In addition, since the diameter of the quartz capillary can be made sufficiently thin, the diffusion of arsenic vapor into the red phosphorus storage chamber is negligible.
A small quantity of metallic arsenic alone will not increase the concentration of gallium phosphide at the rear end of the ingot, as shown in FIG. 5b.
第4図は同様の効果を持つ他の実施例であって14は石
英毛細管、15は液体金属、16は過大圧力調整孔、1
7は金属砒素、18は液体金属溜、19は差圧弁付砒素
るつぼである。FIG. 4 shows another embodiment having a similar effect, in which 14 is a quartz capillary, 15 is a liquid metal, 16 is an overpressure adjustment hole, and 1
7 is metal arsenic, 18 is a liquid metal reservoir, and 19 is an arsenic crucible with a differential pressure valve.
即ちこの装置は赤燐と、金属砒素とを同時に封入するこ
とができ、なおかつ差圧弁として、第3図のものと同様
の働きをする。That is, this device can contain red phosphorus and metallic arsenic at the same time, and also functions as a differential pressure valve similar to the device shown in FIG.
第3図のものでは赤燐の封入と、金属砒素およびガリウ
ムの封入を別々に行なわねばならないが、第4図の装置
では一度に赤燐と金属砒素とガリウムとを封入すること
ができる。In the device shown in FIG. 3, the encapsulation of red phosphorus and the encapsulation of metal arsenic and gallium must be performed separately, but in the device shown in FIG. 4, red phosphorus, metal arsenic, and gallium can be encapsulated at the same time.
即ち、第4図19の差圧弁付砒素るつぼを液体金属溜1
8より引き上げ、赤燐を所定の位置に入れ、ついで差圧
弁付砒素るつぼに金属砒素およびシール用の液体金属を
入れ、しかるのち差圧弁付砒素るつぼを液体金属溜18
の中に入れればよい。That is, the arsenic crucible with a differential pressure valve shown in FIG.
8, put the red phosphorus in the specified position, then put metal arsenic and a liquid metal for sealing into the arsenic crucible with a differential pressure valve, and then put the arsenic crucible with the differential pressure valve into the liquid metal reservoir 18.
Just put it inside.
液体金属溜中の液体金属は、過大圧力調整用の液体金属
15よりはるかに量が多いので、圧力調整弁としては働
らかず、シールとしてのみ働く。Since the liquid metal in the liquid metal reservoir is much larger in quantity than the liquid metal 15 for regulating overpressure, it does not act as a pressure regulating valve, but only as a seal.
以上実施例として二例述べたが、微細圧力調整として石
英毛細管を用い、過大圧力調整として液体金属シールを
用いた差圧弁は、この他に種々の変形があるが、それら
は皆原理的に本発明から考えられるものであることは明
らかである。Two examples have been described above, but there are various other variations of differential pressure valves that use quartz capillary tubes for fine pressure adjustment and liquid metal seals for overpressure adjustment, but all of them are based on the original principle. It is clear that this can be considered based on the invention.
第1図は均一組成をもつ化合物の合成に用いた装置の概
要を示し、aは装置の断面、bは装置内の温度分布を示
す。
第2図は従来の石英毛細管からなる差圧弁を示し、第3
図は本発明による石英毛細管と液体金属シールとからな
る改良された差圧弁を示し、第4図は、本発明による一
つの変形された差圧弁を示し、第5図は得られた結晶の
組成の成長方向への変化を示す図で、図中aおよびbは
第2図の方法によるもの、Cは本発明によるものである
。
1……ガリウム、2……金属砒素、3……赤燐、4……
差圧弁、5……石英板、6……石英毛細管、7……金属
砒素、8……石英毛細管、9……液体金属、10……液
体金属保持板、11……過大圧力調整孔、12……金属
砒素保持板、13……金属砒素、14……石英毛細管、
15……液体金属、16……過大圧力調整孔、17……
属砒素、18……液体金属溜、19……差圧弁付砒素る
つぼ。FIG. 1 shows an outline of the apparatus used for synthesizing a compound having a uniform composition, in which a shows a cross section of the apparatus and b shows the temperature distribution within the apparatus. Figure 2 shows a conventional differential pressure valve consisting of a quartz capillary tube;
The figure shows an improved differential pressure valve consisting of a quartz capillary and a liquid metal seal according to the invention, FIG. 4 shows one modified differential pressure valve according to the invention, and FIG. 5 shows the composition of the crystals obtained. Fig. 2 is a diagram showing changes in the growth direction of , where a and b are obtained by the method shown in Fig. 2, and C is obtained by the present invention. 1...Gallium, 2...Metal arsenic, 3...Red phosphorus, 4...
Differential pressure valve, 5...Quartz plate, 6...Quartz capillary, 7...Metal arsenic, 8...Quartz capillary, 9...Liquid metal, 10...Liquid metal holding plate, 11...Excess pressure adjustment hole, 12 ...Metal arsenic holding plate, 13...Metal arsenic, 14...Quartz capillary,
15...liquid metal, 16...excess pressure adjustment hole, 17...
Arsenic, 18...Liquid metal reservoir, 19...Arsenic crucible with differential pressure valve.
Claims (1)
を収容する室とを備えた縦型の封管を用いる化合物の合
成装置において、前記砒素を収容する室と、燐を収容す
る室とが、石英毛細管を備えた砒素保持板が、液体金属
保持板上に保持された液体金属中に載置せしめてなる差
圧弁によって分離されていることを特徴とする化合物の
合成装置.1. In a compound synthesis apparatus using a vertical sealed tube comprising a chamber for containing potassium, a chamber for containing arsenic, and a chamber for containing phosphorus, the chamber for containing arsenic and the chamber for containing phosphorus. and an arsenic holding plate provided with a quartz capillary tube are separated by a differential pressure valve formed by placing an arsenic holding plate in a liquid metal held on a liquid metal holding plate.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12610273A JPS5813487B2 (en) | 1973-11-09 | 1973-11-09 | Kagobutsuno Gouseisouchi |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12610273A JPS5813487B2 (en) | 1973-11-09 | 1973-11-09 | Kagobutsuno Gouseisouchi |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5075597A JPS5075597A (en) | 1975-06-20 |
| JPS5813487B2 true JPS5813487B2 (en) | 1983-03-14 |
Family
ID=14926651
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP12610273A Expired JPS5813487B2 (en) | 1973-11-09 | 1973-11-09 | Kagobutsuno Gouseisouchi |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5813487B2 (en) |
-
1973
- 1973-11-09 JP JP12610273A patent/JPS5813487B2/en not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5075597A (en) | 1975-06-20 |
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