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JPS581557B2 - Manufacturing method of wiring board - Google Patents
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JPS581557B2 - Manufacturing method of wiring board - Google Patents

Manufacturing method of wiring board

Info

Publication number
JPS581557B2
JPS581557B2 JP56145522A JP14552281A JPS581557B2 JP S581557 B2 JPS581557 B2 JP S581557B2 JP 56145522 A JP56145522 A JP 56145522A JP 14552281 A JP14552281 A JP 14552281A JP S581557 B2 JPS581557 B2 JP S581557B2
Authority
JP
Japan
Prior art keywords
wiring layer
insulating substrate
divided
mask
wiring board
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP56145522A
Other languages
Japanese (ja)
Other versions
JPS5783088A (en
Inventor
宇賀耕三
原島二三男
内藤英樹
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JEKOO KK
Original Assignee
JEKOO KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by JEKOO KK filed Critical JEKOO KK
Priority to JP56145522A priority Critical patent/JPS581557B2/en
Publication of JPS5783088A publication Critical patent/JPS5783088A/en
Publication of JPS581557B2 publication Critical patent/JPS581557B2/en
Expired legal-status Critical Current

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  • Manufacturing Of Printed Wiring (AREA)

Description

【発明の詳細な説明】 この発明はパターン化された配線層の表面の局部に電解
メッキが施こされた配線基板の製造方法に関する。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method of manufacturing a wiring board in which electrolytic plating is applied locally to the surface of a patterned wiring layer.

従来、このような配線基板を製造するには、Auなとの
高価なメッキ金属が不要な部分に被着するのを防止する
ため、電解メッキを施こす部分と対応する個所に孔開け
されたマスクを配線層が形成された絶縁基板上に被着し
、このマスクから露出された配線層の表面にメッキ層を
形成する方法が採られる。
Conventionally, in order to manufacture such wiring boards, holes were drilled in locations corresponding to the areas to be electrolytically plated in order to prevent expensive plating metals such as Au from adhering to unnecessary areas. A method is adopted in which a mask is placed on an insulating substrate on which a wiring layer is formed, and a plating layer is formed on the surface of the wiring layer exposed from the mask.

しかしながら、このような方法は、所定の個所に孔を形
成したマスクを用意したり、このマスクを絶縁基板面に
被着させる際に前記孔を電解メッキを施こす部分に対応
して位置すげなげればならず、特にメッキを施こす部分
が多数の領域に分離している場合はそれぞれについて行
なわなければならず、極めて作業が煩雑であった。
However, such a method requires preparing a mask with holes formed at predetermined locations, and when attaching this mask to the insulating substrate surface, the holes must be positioned in correspondence with the areas to be electrolytically plated. Especially when the part to be plated is divided into many areas, plating must be performed for each area, which is extremely complicated.

それ故、この発明の目的はマスク形成が簡単にでき、作
業能率の向上を図ることができる配線基板の製造方法を
提供するものである。
SUMMARY OF THE INVENTION Therefore, an object of the present invention is to provide a method of manufacturing a wiring board that allows easy mask formation and improves work efficiency.

以下、実施例を用いてこの発明を詳細に説明する。Hereinafter, this invention will be explained in detail using Examples.

第1図はこの発明に係る配線基板の製造方法の一実施例
を説明するために示す水晶時計用のプリント基板の正面
図である。
FIG. 1 is a front view of a printed circuit board for a crystal watch, shown for explaining an embodiment of the method for manufacturing a wiring board according to the present invention.

同図において、絶縁基板1aがあり、この主表面はたと
えば幅方向に平行な2つの仮想的な直線(点線αで示す
)に画された3つの区分領域を有し、このうち両脇の区
分領域にはそれぞれ1個あるいはそれ以上の電極2が配
置されている。
In the same figure, there is an insulating substrate 1a, the main surface of which has, for example, three divided areas demarcated by two virtual straight lines (indicated by dotted lines α) parallel to the width direction. One or more electrodes 2 are arranged in each region.

この各電極2は2つに分割された接点端子2aから構成
され、その各々の表面にはAu層2bが電解メッキによ
って被着されている。
Each electrode 2 is composed of a contact terminal 2a divided into two parts, each of which has an Au layer 2b deposited on its surface by electrolytic plating.

そしてこの各電極2はこの電極2と対向しかつ絶縁基板
1aの面に対して垂直に可動する導電材(図示せず)と
でスイッチを構成するようになっている。
Each electrode 2 constitutes a switch with a conductive material (not shown) facing the electrode 2 and movable perpendicularly to the surface of the insulating substrate 1a.

また、点線αで画された3つの区分領域のうち真中の区
分領域には前記各電極2の接点端子2aと接続されかつ
水晶時計の回路に基づく配線層(説明の便宜上省略)、
および各接点端子2aをそれぞれ共通に接続する配線層
3が形成され、この配線層3は配線基板の製造の過程に
おいて形成される孔8によって断線されている。
Further, in the middle divided region of the three divided regions delineated by the dotted line α, a wiring layer (omitted for convenience of explanation) connected to the contact terminal 2a of each electrode 2 and based on the circuit of a crystal clock;
A wiring layer 3 is formed which commonly connects each contact terminal 2a, and this wiring layer 3 is disconnected by a hole 8 formed in the process of manufacturing the wiring board.

さらにこれら各配線層が形成されている区分領域内の任
意の個所には電子部品搭載用の孔7が設けられている。
Furthermore, holes 7 for mounting electronic components are provided at arbitrary locations within the segmented areas where these wiring layers are formed.

以下このような配線基板の製造方法の一実施例を第2図
ないし第5図を用いて説明する。
An embodiment of the method for manufacturing such a wiring board will be described below with reference to FIGS. 2 to 5.

まず第2図に示すように比較的大きな面積を有する絶縁
基板1を用意する。
First, as shown in FIG. 2, an insulating substrate 1 having a relatively large area is prepared.

この絶縁基板1は後工程において複数の絶縁基板に分割
されるものである。
This insulating substrate 1 is divided into a plurality of insulating substrates in a subsequent process.

そして前記絶縁基板1の主表面の全域に銅箔を形成し、
この銅箔を適当にエッチングすることにより配線層を形
成する。
Then, a copper foil is formed over the entire main surface of the insulating substrate 1,
A wiring layer is formed by appropriately etching this copper foil.

この配線層は、前記絶縁基板1上において後工程で分割
されるべく各領域A,B,C・・・・・・・・・ごとに
、水晶時計の回路に基づいて同一パターン化されていろ
This wiring layer is formed into the same pattern on the insulating substrate 1 for each region A, B, C, etc. based on the circuit of the quartz clock so as to be divided in a later process. .

そして、第3図の拡大図に示すように、各領域A,B,
C・・・・・・・・・における配線層はその一部におい
て複数の電極2を有し、この各電極2は前記各領域A,
B,C・・・・・・・・・の列方向の直線(点線αで示
す)で画された3つの区分領域のうち両側の各区分領域
に形成されている。
Then, as shown in the enlarged view of Fig. 3, each area A, B,
The wiring layer in C...... has a plurality of electrodes 2 in a part thereof, and each electrode 2 is connected to each of the areas A,
They are formed in each of the three divided areas on both sides of the three divided areas defined by straight lines (indicated by dotted lines α) in the column direction of B, C, . . . .

なお、水晶時計の回路に基づく配線層は、前記3つの区
分領域のうち真中の区分領域に形成されるが、図では説
明の便宜上これを省略している。
Note that the wiring layer based on the circuit of the quartz watch is formed in the middle segmented area of the three segmented areas, but this is omitted in the figure for convenience of explanation.

そして、前記各電極2は2つに分割された接点端子2a
から構成されるもので、各電極2と対向しかつ絶縁基板
10表面に対して垂直に可動する導電材(図示せず)と
でスイッチを構成するものである。
Each electrode 2 is divided into two contact terminals 2a.
The switch is composed of a conductive material (not shown) that faces each electrode 2 and is movable perpendicularly to the surface of the insulating substrate 10.

また、前記各電極2を構成する接点端子2aはそれぞれ
点線αで画された3つの区分領域のうち真中の区分領域
内において形成された配線層3により共通接続されてい
る。
Further, the contact terminals 2a constituting each of the electrodes 2 are commonly connected by a wiring layer 3 formed in the middle divided area among the three divided areas demarcated by dotted lines α.

さらに、この配線層3は列方向に位置づけられている他
の領域間において配線層4により接続されているととも
に、行方向に位置づけられている各領域の配線層4は絶
縁基板1の=辺の近傍に形成された共通配線層5に引き
出されている。
Furthermore, this wiring layer 3 is connected by a wiring layer 4 between other regions located in the column direction, and the wiring layer 4 in each region located in the row direction is connected to the = side of the insulating substrate 1. It is drawn out to a common wiring layer 5 formed nearby.

このようにして絶縁基板1の主表面に配線層を形成した
後は、第4図に示すように、各領域A,B,C・・・・
・・・・・のうち列方向に配置された領域に形成された
配線層を共通に被うマスク6を被着して形成する。
After forming the wiring layer on the main surface of the insulating substrate 1 in this way, as shown in FIG. 4, each area A, B, C...
. . . are formed by depositing a mask 6 that commonly covers the wiring layers formed in the regions arranged in the column direction.

このマスク6はたとえば帯状の粘着テープ等を用い、各
領域A,B,C・・・・・・・・・の列方向に並設され
た各電極2を前記マスク6から露出させるようにして、
絶縁基板1面に被着させる。
This mask 6 is made of, for example, a band-shaped adhesive tape, and is made so that the electrodes 2 arranged in parallel in the column direction of each area A, B, C, etc. are exposed from the mask 6. ,
Deposit on one side of the insulating substrate.

そして電源のプラス極を共通配線層5に、そして前記電
源のマイナス極をたとえばAu板にそれぞれ接続し、前
記絶縁基板1とAu板を電解液に浸すことによって電解
メッキを行なう。
Then, the positive pole of the power source is connected to the common wiring layer 5, and the negative pole of the power source is connected to, for example, an Au plate, and electrolytic plating is performed by immersing the insulating substrate 1 and the Au plate in an electrolytic solution.

このようにして、電極2面にAu層を形成した後、前記
絶縁基板1を電解液から取り出し、マスク6を剥す。
After forming the Au layer on the surface of the electrode 2 in this way, the insulating substrate 1 is taken out from the electrolyte and the mask 6 is peeled off.

そして前記絶縁基板1を切断することにより、第5図に
示すように各領域A,B,C・・・・・・・・・ごとの
絶縁基板1aにそれぞれ分割する。
By cutting the insulating substrate 1, the insulating substrate 1a is divided into regions A, B, C, . . . , respectively, as shown in FIG.

その後、絶縁基板1aに電子部品搭載用の孔7をプレス
等で形成する。
Thereafter, holes 7 for mounting electronic components are formed in the insulating substrate 1a by a press or the like.

この際同時に、表面にAu層2bが被着された複数の接
点端子2aのうち任意の2個を接続する部分、共通配線
層5に接続される部分等に絶縁基板1aを貫通する孔8
を形成して前記配線層3を断線する。
At this time, at the same time, a hole 8 penetrating the insulating substrate 1a is formed in a portion connecting any two of the plurality of contact terminals 2a whose surfaces are coated with the Au layer 2b, a portion connected to the common wiring layer 5, etc.
is formed to disconnect the wiring layer 3.

なお、各電極2のうち一方の接点端子2aのそれぞれに
VSS電圧を印加するような場合には、これらを接続す
る配線層3の断線は避けろようにする。
In addition, when applying the VSS voltage to each of the contact terminals 2a of each electrode 2, breakage of the wiring layer 3 connecting these should be avoided.

これにより水晶時計の回路に基づく配線層のみがその機
能を有するようになる。
As a result, only the wiring layer based on the circuit of the quartz watch has that function.

このように、一方向に真直ぐに配列された複数の領域を
設けた絶縁基板1の面において、たとえば電極のように
電解メッキを施こす配線層のみを、たとえば幅方向に平
行な2つの仮想的な直線で画された3つの区分領域のう
ち両側の区分領域に位置づけるようにして形成し、前記
電解メッキを施こす配線層のみを露出させるマスク6を
真中の区分領域のみを共通に被うように被着してメッキ
を行なう三とにより、特に所定の個所に孔を形成して複
雑な形状のマスクを用意することもなく、帯状の単純な
形状のマスクですみ、これによりマスクを絶縁基板上に
被着させる際位置づけの煩雑さもなくなる。
In this way, on the surface of the insulating substrate 1, which has a plurality of regions arranged straight in one direction, only the wiring layer to be electrolytically plated, such as an electrode, is divided into two virtual regions parallel to the width direction. The mask 6 is formed so as to be positioned on both sides of the three divided areas demarcated by straight lines, and the mask 6 that exposes only the wiring layer to which the electrolytic plating is applied is placed so as to commonly cover only the middle divided area. By depositing the mask on the insulating substrate and plating it, there is no need to prepare a mask with a complicated shape by forming holes in specific locations, and a mask with a simple band shape can be used. There is no need to worry about positioning it when applying it on top.

なお、この実施例では水晶時計に用いる配線基板を一例
として掲げたものであるが、他の配線層の製造において
も適用できることはいうまでもない。
In this embodiment, a wiring board used in a quartz watch is used as an example, but it goes without saying that the invention can also be applied to the manufacture of other wiring layers.

以上述べたようにこの発明に係る配線基板の製造方法に
よれば、メッキする領域が分離していても、マスク形成
を簡単にして作業能率の向上を図ることができろ効果が
ある。
As described above, the method for manufacturing a wiring board according to the present invention has the advantage that even if the regions to be plated are separated, mask formation can be simplified and work efficiency can be improved.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図はこの発明に係る配線基板の製造方法の一実施例
を説明するために示すプリント基板の正面図、第2図な
いし第5図はこの発明に係る配線基板の製造方法の一実
施例を示す説明図である。 1,1a・・・・・・絶縁基板、2・・・・・・電極、
2a・・・・・・接点端子、2b・・・・・・Au層、
3,4・・・・・・配線層、5・・・・・・共通配線層
、6・・・・・・マスク、7,8・・・・・・孔。
FIG. 1 is a front view of a printed circuit board shown for explaining one embodiment of the method for manufacturing a wiring board according to the present invention, and FIGS. 2 to 5 are examples of the method for manufacturing a wiring board according to the present invention. FIG. 1, 1a... Insulating substrate, 2... Electrode,
2a...Contact terminal, 2b...Au layer,
3, 4... Wiring layer, 5... Common wiring layer, 6... Mask, 7, 8... Hole.

Claims (1)

【特許請求の範囲】[Claims] 1 絶縁基板上に一方向に真直ぐに配列された複数の領
域を設け、これらの各領域を配列方向に平行な直線で3
つの区分領域に画し、両側の区分領域に電極を位置づけ
、真中の区分領域に電極に接続されるとともに絶縁基板
の端部に設けられた共通配線層に領域毎に共通接続され
る配線層を位置づけてそれぞれ形成し、次いで各領域の
真中の区分領域を帯状のマスクで共通に覆い、共通配線
層に電源を接続して電極にメッキを行ない、次いでマス
クを剥した後に配線層の接続不用部分を貫通孔を形成し
て切断することを特徴とする配線基板の製造方法。
1 A plurality of regions are arranged straight in one direction on an insulating substrate, and each of these regions is separated by 3 straight lines parallel to the arrangement direction.
It is divided into two divided areas, electrodes are placed in the divided areas on both sides, and a wiring layer is connected to the electrodes in the middle divided area and commonly connected for each area to a common wiring layer provided at the end of the insulating substrate. Then, the divided area in the middle of each area is commonly covered with a band-shaped mask, a power supply is connected to the common wiring layer and the electrodes are plated, and after the mask is peeled off, the unconnected parts of the wiring layer are covered. A method of manufacturing a wiring board, comprising forming a through hole and cutting the wiring board.
JP56145522A 1981-09-17 1981-09-17 Manufacturing method of wiring board Expired JPS581557B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56145522A JPS581557B2 (en) 1981-09-17 1981-09-17 Manufacturing method of wiring board

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56145522A JPS581557B2 (en) 1981-09-17 1981-09-17 Manufacturing method of wiring board

Publications (2)

Publication Number Publication Date
JPS5783088A JPS5783088A (en) 1982-05-24
JPS581557B2 true JPS581557B2 (en) 1983-01-11

Family

ID=15387164

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56145522A Expired JPS581557B2 (en) 1981-09-17 1981-09-17 Manufacturing method of wiring board

Country Status (1)

Country Link
JP (1) JPS581557B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61121972A (en) * 1984-11-19 1986-06-09 Canon Inc Platen structure

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5332868B2 (en) * 1972-05-19 1978-09-11

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61121972A (en) * 1984-11-19 1986-06-09 Canon Inc Platen structure

Also Published As

Publication number Publication date
JPS5783088A (en) 1982-05-24

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