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JPH025014B2 - - Google Patents
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JPH025014B2 - - Google Patents

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Publication number
JPH025014B2
JPH025014B2 JP60248656A JP24865685A JPH025014B2 JP H025014 B2 JPH025014 B2 JP H025014B2 JP 60248656 A JP60248656 A JP 60248656A JP 24865685 A JP24865685 A JP 24865685A JP H025014 B2 JPH025014 B2 JP H025014B2
Authority
JP
Japan
Prior art keywords
plate
plating
opening
plates
holes
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP60248656A
Other languages
Japanese (ja)
Other versions
JPS62216250A (en
Inventor
Yukiharu Takeuchi
Kunyuki Hori
Shinobu Sasaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shinko Electric Industries Co Ltd
Shindo Denshi Kogyo KK
Original Assignee
Shinko Electric Industries Co Ltd
Shindo Denshi Kogyo KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shinko Electric Industries Co Ltd, Shindo Denshi Kogyo KK filed Critical Shinko Electric Industries Co Ltd
Priority to JP60248656A priority Critical patent/JPS62216250A/en
Publication of JPS62216250A publication Critical patent/JPS62216250A/en
Publication of JPH025014B2 publication Critical patent/JPH025014B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W70/00Package substrates; Interposers; Redistribution layers [RDL]
    • H10W70/60Insulating or insulated package substrates; Interposers; Redistribution layers
    • H10W70/67Insulating or insulated package substrates; Interposers; Redistribution layers characterised by their insulating layers or insulating parts
    • H10W70/68Shapes or dispositions thereof
    • H10W70/685Shapes or dispositions thereof comprising multiple insulating layers

Landscapes

  • Production Of Multi-Layered Print Wiring Board (AREA)
  • Printing Elements For Providing Electric Connections Between Printed Circuits (AREA)

Description

【発明の詳細な説明】 (発明の技術分野) 本発明はPGAパツケージの製造方法に係り、
特にプリント基板型PGAパツケージの製造方法
の改良に関する。
[Detailed Description of the Invention] (Technical Field of the Invention) The present invention relates to a method for manufacturing a PGA package,
In particular, it relates to improvements in the manufacturing method of printed circuit board type PGA packages.

(技術の背景) 従来からのPGAパツケージ(ピングリツトア
レイパツケージ)はセラミツクを使用していたた
め、高価であり、低価格化が課題となつていた。
そこで、近年、ガラス繊維入り合成樹脂等の板体
を積層してなるプリント基板型PGAパツケージ
が開発され、多ピン化への対応と低価格化を同時
に実現し得るようになつてきた。
(Technical background) Conventional PGA packages (pin grid array packages) use ceramics, which is expensive, and reducing the price has been an issue.
Therefore, in recent years, a printed circuit board type PGA package, which is made by laminating plates made of glass fiber-containing synthetic resin, etc., has been developed, and it has become possible to simultaneously support a large number of pins and reduce costs.

まず、このようなプリント基板型PGAパツケ
ージの従来の製造方法を第2図A,Bにより説明
する。
First, a conventional manufacturing method of such a printed circuit board type PGA package will be explained with reference to FIGS. 2A and 2B.

第2図Aは、プリント基板型PGAパツケージ
の基板1の構成を示す説明図であり、この基板1
の最下部には、上面に配線パターンが形成され所
要のめつきが施される半導体素子搭載用の銅箔3
が貼着され、下面には配線パターンが形成され所
要のめつきが施される銅箔4が貼着された絶縁材
料製の板体2が配設されている。この板体2上に
は、開口6が形成された絶縁材料製の板体5が積
層して貼着されるようになつており、この板体5
の上面には半導体素子実装用端子パターンが形成
され所要のめつきが施される銅箔7が貼着されて
いる。この板体5上には、板体5の開口6に合致
し、かつこの開口6より大きな開口9が形成され
た絶縁材料製の板体8が積層して貼着されるよう
になつている。さらに、この板体8上には、板体
8の開口9に合致し、かつこの開口9より大きな
開口11が形成された絶縁材料製の板体10が積
層して貼着されるようになつている。この板体1
0の上面には、配線パターンが形成され所要のめ
つきが施される銅箔12が貼着されている。
FIG. 2A is an explanatory diagram showing the structure of the board 1 of the printed circuit board type PGA package.
At the bottom, there is a copper foil 3 for mounting a semiconductor element, on which a wiring pattern is formed and required plating is applied.
A plate body 2 made of an insulating material is disposed on which a wiring pattern is formed and a copper foil 4 is adhered to the lower surface thereof and which is plated in a required manner. On this plate 2, a plate 5 made of an insulating material and having an opening 6 formed therein is laminated and adhered.
A copper foil 7, on which a terminal pattern for mounting a semiconductor element is formed and a required plating is applied, is adhered to the upper surface. A plate 8 made of an insulating material is laminated and pasted on this plate 5, and has an opening 9 formed therein that matches the opening 6 of the plate 5 and is larger than the opening 6. . Further, on this plate 8, a plate 10 made of an insulating material is laminated and pasted, and the plate 10 is formed with an opening 11 that matches the opening 9 of the plate 8 and is larger than the opening 9. ing. This plate 1
A copper foil 12 on which a wiring pattern is formed and a required plating is applied is adhered to the upper surface of 0.

このような第2図Aの各板体2,5,8,10
により第2図Bに示す基板1を形成するには、ま
ず板体2,5間、板体5,8間ならびに板体8,
10間にそれぞれ接着剤シート13,14,15
を介して、銅箔3,7に所要の配線パターンが形
成され所要のめつき(図示しないが、一般にはニ
ツケルめつき下地の金めつき)が施された板体
2,5、板体8,10を積層して貼着する。する
と、各開口6,9,11により半導体素子収納穴
16が形成される。ついで、第2図Bに示すよう
に、基板1に貫通孔17,17,…を形成し、各
貫通孔17内に無電解銅めつき等のめつきを施
し、板体2の銅箔4および板体10の銅箔12に
所要の配線パターンを形成し、所要のめつきを施
す。さらにリードピン(図示せず)をこの貫通孔
17に挿通してはんだ付け等により固定すること
によりプリント基板型PGAパツケージとなる。
Each of the plates 2, 5, 8, 10 in FIG. 2A like this
In order to form the substrate 1 shown in FIG.
Adhesive sheets 13, 14, 15 between 10 and 10 respectively
The required wiring patterns are formed on the copper foils 3 and 7 through the copper foils 3 and 7, and the required plating (not shown, but generally gold plating on a nickel plating base) is applied to the plates 2 and 5 and the plate 8. , 10 are laminated and pasted. Then, a semiconductor element storage hole 16 is formed by each of the openings 6, 9, and 11. Next, as shown in FIG. 2B, through holes 17, 17, . Then, a required wiring pattern is formed on the copper foil 12 of the plate body 10, and required plating is applied. Further, lead pins (not shown) are inserted into the through holes 17 and fixed by soldering or the like, thereby forming a printed circuit board type PGA package.

(従来技術の問題点) しかしながら、このような従来の方法では貫通
孔17へ無電解銅めつき等を施すと、めつき金め
つきされた銅箔3や半導体素子実装用の金めつき
された端子パターンが形成された銅箔7はもとよ
り基板1の全体に析出し、端子パターンが全て短
絡してしまう等の問題点があつた。
(Problems with the prior art) However, in such a conventional method, when electroless copper plating or the like is applied to the through hole 17, the gold-plated copper foil 3 and the gold-plated copper foil for semiconductor element mounting are removed. The copper foil 7 on which the terminal pattern was formed was deposited, as well as the entire board 1, resulting in problems such as short-circuiting of all the terminal patterns.

このため無電解銅めつきを基板1に施した後貫
通孔17や貫通孔周囲の銅めつき必要部のみをエ
ツチングレジストで被覆し、不要部分の銅めつき
を選択的に剥離除去して金めつきが施された端子
パターンを露出させて独立のパターンにするか、
または貫通孔等の銅めつき必要部以外を予めマス
キング状態で被覆しておき、必要部のみに選択的
に無電解銅めつきを施す必要があつた。
For this reason, after applying electroless copper plating to the substrate 1, only the through holes 17 and the parts around the through holes that require copper plating are coated with etching resist, and the copper plating in unnecessary parts is selectively peeled off and gold plated. Either expose the plated terminal pattern and make it an independent pattern, or
Alternatively, it has been necessary to cover areas other than those requiring copper plating, such as through holes, in advance in a masked state, and selectively apply electroless copper plating only to the required areas.

従つてこのような方法では、エツチングレジス
トやマスキング材の塗布や剥離除去という工程が
必要で作業性が悪く、また端子パターンの金めつ
き面がエツチングレジストおよび銅めつきの剥離
液、またはマスキング材の剥離液に接触するため
表面状態が悪化し、ワイヤボンデイング特性が低
下する等の問題点があつた。また、マスキング材
を使用した場合は、マスキング材上に析出した銅
めつき皮膜が箔状となつてめつき液中に剥落して
浮遊するため、めつき液の寿命を著しく損なうと
いう問題点があつた。
Therefore, this method requires the steps of applying and peeling off the etching resist or masking material, resulting in poor workability, and the gold-plated surface of the terminal pattern is exposed to the etching resist, copper plating stripping solution, or masking material. There were problems such as deterioration of the surface condition due to contact with the stripping solution and deterioration of wire bonding characteristics. Additionally, when a masking material is used, the copper plating film deposited on the masking material becomes a foil and flakes off in the plating solution, causing it to float, significantly shortening the life of the plating solution. It was hot.

(発明の目的) 本発明は、前述した従来の製造方法における問
題点を克服し、銅箔3や銅箔7に貫通孔をめつき
する際のめつきが被着しないようにしたプリント
基板型PGAパツケージの製造方法を提供するこ
とを目的としている。
(Object of the Invention) The present invention overcomes the problems in the conventional manufacturing method described above, and provides a printed circuit board type that prevents plating from adhering when through-holes are plated on the copper foil 3 and the copper foil 7. The purpose is to provide a method for manufacturing a PGA package.

(発明の構成) 本発明は、積層された複数枚の板体に半導体素
子収納穴、貫通孔ならびに配線パターンが形成さ
れ、貫通孔にはメツキが施されているプリント基
板型PGAパツケージの製造方法において、前記
積層された複数枚の板体は、両外側の板体には半
導体素子収納穴を形成するための開口が形成され
ておらず、両外側の板体の外面を除く配線パター
ンは、両外側の板体によつて密閉されるように積
層されており、該積層された複数枚の板体に貫通
孔を形成するとともに貫通孔にめつきを施し、そ
の後両外側の板体の少なくとも一方に半導体素子
収納穴を形成するための開口を形成するようにし
たことを特徴としている。
(Structure of the Invention) The present invention provides a method for manufacturing a printed circuit board type PGA package in which a semiconductor element storage hole, a through hole, and a wiring pattern are formed in a plurality of laminated plates, and the through hole is plated. In the above-mentioned plurality of laminated plates, an opening for forming a semiconductor element storage hole is not formed in both outer plates, and the wiring pattern except for the outer surface of both outer plates is as follows. The plurality of laminated plates are laminated so as to be sealed by both outer plates, and through holes are formed in the plurality of laminated plates and the through holes are plated. It is characterized in that an opening for forming a semiconductor element storage hole is formed on one side.

(発明の実施例) 以下、本発明を第1図A〜Hに示す実施例によ
り説明する。なお、前述した従来のものと同一の
構成については、図面中に同一の符号を付し、そ
の説明は省略する。
(Embodiments of the Invention) The present invention will be described below with reference to embodiments shown in FIGS. 1A to 1H. Note that the same components as those of the conventional device described above are denoted by the same reference numerals in the drawings, and the explanation thereof will be omitted.

第1図Fに示すプリント基板型PGAパツケー
ジの基板1を形成するためには、第1図Aに示す
ように、従来の方法において用いた3枚の板体
2,5,8のほか開口の形成されていない板体1
0Aを用いる。そして、板体2の銅箔3ならびに
板体5の銅箔7をそれぞれエツチングして配線パ
ターンを形成する。その後、第1図Bに示すよう
に、これらの配線パターン上に下地にニツケルめ
つきを施した金の皮膜18,19をメツキにより
被着する。ついで、第1図Cに示すように、接着
剤シート13,14,15により各板体2,5,
8、板体10Aを積層して接着する。なお、板体
8、板体10Aを接着するための接着剤シート1
5は、板体10Aに後で形成される開口11A
(第1図F)の部位を接着しないよう板体8の開
口9の外周との間に間隔が設けられている。
In order to form the substrate 1 of the printed circuit board type PGA package shown in FIG. 1F, as shown in FIG. 1A, in addition to the three plates 2, 5, 8 used in the conventional method, the Unformed plate 1
Use 0A. Then, the copper foil 3 of the plate 2 and the copper foil 7 of the plate 5 are etched to form a wiring pattern. Thereafter, as shown in FIG. 1B, gold films 18 and 19 having a nickel plating base are deposited on these wiring patterns by plating. Then, as shown in FIG. 1C, each plate 2, 5,
8. Laminate and adhere the plates 10A. Note that the adhesive sheet 1 for bonding the plate body 8 and the plate body 10A
5 is an opening 11A that will be formed later in the plate body 10A.
A space is provided between the opening 9 of the plate 8 and the outer periphery of the plate 8 so as not to bond the portion shown in FIG. 1F.

つぎに、第1図Dに示すように、板体2,5,
8、板体10Aにかけて貫通孔17,17、…を
形成し、各貫通孔17に無電解銅めつき20を施
し、各銅箔3,4,7,12Aに必要な電気的導
通を与える。さらに、第1図Eに示すように、板
体2の下面の銅箔4ならびに、板体10Aの上面
の銅箔12Aをエツチングして配線パターン2
1,22を形成し、これらの配線パターン21,
22および貫通孔に下地にニツケルめつきを施し
た金の皮膜23をめつきにより施してリードピン
を固定するための配線パターンを形成する。そし
て、最後に、第1図Fに示すように、板体10A
に開口11Aを穿設して、板体5,8の開口6,
9とともに半導体素子収納穴16を形成する。
Next, as shown in FIG. 1D, the plates 2, 5,
8. Through-holes 17, 17, . Furthermore, as shown in FIG.
1, 22 are formed, and these wiring patterns 21,
A gold film 23 with nickel plating applied to the base is applied to 22 and the through hole by plating to form a wiring pattern for fixing the lead pin. Finally, as shown in FIG. 1F, the plate body 10A
An opening 11A is formed in the plate bodies 5, 8, and the opening 6,
Together with 9, a semiconductor element storage hole 16 is formed.

この際板体10Aの開口11Aと接する部分の
板体8の上面には開口11Aを形成する際のカツ
ター等により若干の凹部が形成されるためこの面
に配線パターンを設けることは極めて困難であ
る。この凹部は半導体素子搭載後に蓋体で気密封
止する際の接着剤流入凹部となり、不具合が生じ
る個所への接着剤の流出を防止して、蓋体の接着
剤強度を高めることができる。
At this time, it is extremely difficult to provide a wiring pattern on this surface because a slight recess is formed on the upper surface of the plate 8 in the portion that contacts the opening 11A of the plate 10A by the cutter used to form the opening 11A. . This recess serves as an adhesive inflow recess when airtightly sealing the semiconductor element with the lid after mounting the semiconductor element, and prevents the adhesive from flowing out to areas where problems occur, thereby increasing the adhesive strength of the lid.

なお、第1図Gに示すように板体10Aの開口
11Aの形成部全周に積層前に予め凹溝24を形
成しておくことにより、板体8に何ら影響を与え
ることなく開口11Aを形成できるため、板体8
にも配線パターンを形成することができ、一層の
多ピン化、高密度化が可能となる。この凹溝24
は開口形成部へ接着剤が流出し、基板型10Aの
開口形成部が板体8と接着することを防止でき
る。また、板体8に配線パターンを形成する必要
がない場合は、板体8を取り去つて板体5と板体
10Aを直接積層しても配線パターンを損なうこ
となく開口を形成することもできるのでより小型
化が可能となる。
As shown in FIG. 1G, by forming a groove 24 in advance around the entire circumference of the opening 11A of the plate 10A before lamination, the opening 11A can be formed without affecting the plate 8 in any way. Because it can be formed, the plate body 8
It is also possible to form wiring patterns on the substrate, making it possible to increase the number of pins and increase the density even further. This groove 24
This can prevent the adhesive from flowing out to the opening forming portion and adhering the opening forming portion of the substrate mold 10A to the plate body 8. Further, if it is not necessary to form a wiring pattern on the plate 8, the opening can be formed without damaging the wiring pattern even if the plate 8 is removed and the plate 5 and the plate 10A are directly laminated. Therefore, further miniaturization is possible.

また第1図Hに示すようにパツケージの熱放散
性を一層高めるために半導体素子を銅板等の放熱
板2A上に搭載する場合には、板体8Aの開口6
Aの形成は、貫通孔17にめつきを施し、板体1
0Aに開口11Aを形成した後に行い、最後に放
熱板2Aを板体5Aに貼着し半導体素子収納穴を
形成することにより、貫通孔17に無電解銅めつ
きを施す際に配線パターン7Aにこのめつきが被
着することを阻止することができる。
Furthermore, as shown in FIG.
A is formed by plating the through hole 17 and attaching it to the plate 1.
This is done after forming the opening 11A in 0A, and finally attaching the heat dissipation plate 2A to the plate 5A to form the semiconductor element storage hole. This plating can be prevented from adhering.

さらにこの場合には板体10Aに第1図Gに示
す凹溝24を形成することにより板体8を取り去
ることが可能となり、板体10A,5Aの半導体
素子収納穴を形成するための開口は、貫通孔17
にめつきを施して後に形成し、その後放熱板2A
を貼着することもできる。
Furthermore, in this case, the plate 8 can be removed by forming the groove 24 shown in FIG. , through hole 17
The heat sink plate 2A is formed after applying a coating.
You can also paste.

以上述べたように本実施例によれば、半導体素
子収納穴16の端に位置する板体10Aの開口1
1Aを最後に形成するので、貫通孔17にめつき
を施す際にめつきが板体2,5の銅箔3,7の配
線パターンに被着するという事態を確実に阻止す
ることができる。
As described above, according to this embodiment, the opening 1 of the plate body 10A located at the end of the semiconductor element storage hole 16
1A is formed last, it is possible to reliably prevent the plating from adhering to the wiring patterns of the copper foils 3 and 7 of the plates 2 and 5 when plating the through holes 17.

なお、銅箔3,7には、配線パターン形成後に
所要のめつきを施さずに積層し、貫通孔17に無
電解銅めつき等を施した後に開口11Aを形成
し、金等のめつき皮膜23を施す際に同時に銅箔
3,7にも金等のめつき皮膜18,19を形成す
ることによつても、銅箔3,7に不要な無電解銅
めつき等が被膜することを阻止することができ
る。
Note that the copper foils 3 and 7 are laminated without applying the required plating after forming the wiring pattern, and after electroless copper plating or the like is applied to the through hole 17, the opening 11A is formed and then plated with gold or the like. Even by forming plating films 18 and 19 of gold or the like on the copper foils 3 and 7 at the same time as applying the film 23, the copper foils 3 and 7 may be coated with unnecessary electroless copper plating, etc. can be prevented.

(発明の効果) 以上説明したように、本発明によれば、基板の
貫通孔に無電解めつき等を施す際に半導体素子収
納穴内の配線パターンにこのめつきが被着するこ
とを完全に阻止できるため、量産性に優れる等の
効果を奏する。
(Effects of the Invention) As explained above, according to the present invention, when applying electroless plating or the like to the through-hole of a substrate, it is possible to completely prevent the plating from adhering to the wiring pattern in the semiconductor element housing hole. Since it can be prevented, it has effects such as excellent mass productivity.

【図面の簡単な説明】[Brief explanation of drawings]

第1図A,B,C,D,E,F,G,Hは本発
明に係るプリント基板型PGAパツケージの製造
方法の実施例をしめす説明図、第2図A,Bは従
来の方法を示す説明図である。 1……基板、2,5,8,10,10A……板
体、6,9,11,11A……開口、16……半
導体阻止収納穴、17……貫通孔、24……凹
溝。
Figures 1A, B, C, D, E, F, G, and H are explanatory diagrams showing an embodiment of the method for manufacturing a printed circuit board type PGA package according to the present invention, and Figures 2A and B are explanatory diagrams showing a conventional method. FIG. 1... Substrate, 2, 5, 8, 10, 10A... Plate body, 6, 9, 11, 11A... Opening, 16... Semiconductor blocking storage hole, 17... Through hole, 24... Concave groove.

Claims (1)

【特許請求の範囲】[Claims] 1 積層された複数枚の板体に半導体素子収納
穴、貫通孔ならびに配線パターンが形成され、貫
通孔にはメツキが施されているプリント基盤型
PGAパツケージの製造方法において、前記積層
された複数枚の板体は、両外側の板体には半導体
素子収納穴を形成するための開口が形成されてお
らず、両外側の板体の外面を除く配線パターン
は、両外側の板体によつて密閉されるように積層
されており、該積層された複数枚の板体に貫通孔
を形成するとともに貫通孔にめつきを施し、その
後両外側の板体の少なくとも一方に半導体素子収
納穴を形成するための開口を形成するようにした
ことを特徴とするプリント基板型PGAパツケー
ジの製造方法。
1 A printed circuit board type in which semiconductor element storage holes, through holes, and wiring patterns are formed on multiple laminated plates, and the through holes are plated.
In the method for manufacturing a PGA package, the plurality of laminated plates have no opening for forming a semiconductor element storage hole in both outer plates, and the outer surfaces of both outer plates are not formed. The wiring patterns to be removed are laminated so as to be sealed by both outer plates, through-holes are formed in the plurality of laminated plates, and the through-holes are plated, and then both outer plates are sealed. A method for manufacturing a printed circuit board type PGA package, characterized in that an opening for forming a semiconductor element storage hole is formed in at least one of the plates.
JP60248656A 1985-11-06 1985-11-06 Manufacture of printed substrate type pga package Granted JPS62216250A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60248656A JPS62216250A (en) 1985-11-06 1985-11-06 Manufacture of printed substrate type pga package

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60248656A JPS62216250A (en) 1985-11-06 1985-11-06 Manufacture of printed substrate type pga package

Publications (2)

Publication Number Publication Date
JPS62216250A JPS62216250A (en) 1987-09-22
JPH025014B2 true JPH025014B2 (en) 1990-01-31

Family

ID=17181373

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60248656A Granted JPS62216250A (en) 1985-11-06 1985-11-06 Manufacture of printed substrate type pga package

Country Status (1)

Country Link
JP (1) JPS62216250A (en)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63255996A (en) * 1987-04-14 1988-10-24 シチズン時計株式会社 Multilayer board for semiconductor chip mounting
JP2520429B2 (en) * 1987-10-27 1996-07-31 松下電工株式会社 Printed wiring board for mounting electronic components
US5804422A (en) * 1995-09-20 1998-09-08 Shinko Electric Industries Co., Ltd. Process for producing a semiconductor package
JPH09232465A (en) * 1996-02-27 1997-09-05 Fuji Kiko Denshi Kk Printed wiring board for semiconductor mounting
US6011694A (en) * 1996-08-01 2000-01-04 Fuji Machinery Mfg. & Electronics Co., Ltd. Ball grid array semiconductor package with solder ball openings in an insulative base
JPH10223800A (en) * 1997-02-12 1998-08-21 Shinko Electric Ind Co Ltd Semiconductor package manufacturing method
CN103227164A (en) * 2013-03-21 2013-07-31 日月光半导体制造股份有限公司 Semiconductor package structure and manufacturing method thereof

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS568855A (en) * 1979-07-04 1981-01-29 Mitsubishi Electric Corp Container for semiconductor
JPS5892248A (en) * 1981-11-28 1983-06-01 Mitsubishi Electric Corp Large scale mounted semiconductor device
US4630172A (en) * 1983-03-09 1986-12-16 Printed Circuits International Semiconductor chip carrier package with a heat sink

Also Published As

Publication number Publication date
JPS62216250A (en) 1987-09-22

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