JPS5817219B2 - Manufacturing method of condensation polymer - Google Patents
Manufacturing method of condensation polymerInfo
- Publication number
- JPS5817219B2 JPS5817219B2 JP5812680A JP5812680A JPS5817219B2 JP S5817219 B2 JPS5817219 B2 JP S5817219B2 JP 5812680 A JP5812680 A JP 5812680A JP 5812680 A JP5812680 A JP 5812680A JP S5817219 B2 JPS5817219 B2 JP S5817219B2
- Authority
- JP
- Japan
- Prior art keywords
- group
- acid halide
- diaminodiphenyl ether
- methylcarbonamide
- diamino
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 229920000642 polymer Polymers 0.000 title claims description 6
- 230000005494 condensation Effects 0.000 title claims 2
- 238000009833 condensation Methods 0.000 title claims 2
- 238000004519 manufacturing process Methods 0.000 title claims 2
- 239000002253 acid Substances 0.000 claims description 10
- 150000001875 compounds Chemical group 0.000 claims description 8
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 claims description 5
- 239000004952 Polyamide Substances 0.000 claims description 5
- 125000000217 alkyl group Chemical group 0.000 claims description 5
- 125000003277 amino group Chemical group 0.000 claims description 5
- 239000012442 inert solvent Substances 0.000 claims description 5
- 229920002647 polyamide Polymers 0.000 claims description 5
- 125000003118 aryl group Chemical group 0.000 claims description 4
- 125000004432 carbon atom Chemical group C* 0.000 claims description 3
- 125000004965 chloroalkyl group Chemical group 0.000 claims description 3
- 230000002194 synthesizing effect Effects 0.000 claims 1
- -1 2,5 -Diamino-N-methylbenzamide Chemical compound 0.000 description 17
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 12
- HFACYLZERDEVSX-UHFFFAOYSA-N benzidine Chemical group C1=CC(N)=CC=C1C1=CC=C(N)C=C1 HFACYLZERDEVSX-UHFFFAOYSA-N 0.000 description 7
- 150000004820 halides Chemical group 0.000 description 6
- KWGKDLIKAYFUFQ-UHFFFAOYSA-M lithium chloride Chemical compound [Li+].[Cl-] KWGKDLIKAYFUFQ-UHFFFAOYSA-M 0.000 description 6
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 3
- 125000000753 cycloalkyl group Chemical group 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- TWRXJAOTZQYOKJ-UHFFFAOYSA-L Magnesium chloride Chemical compound [Mg+2].[Cl-].[Cl-] TWRXJAOTZQYOKJ-UHFFFAOYSA-L 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- BAULSHLTGVOYKM-UHFFFAOYSA-N n-butylbenzamide Chemical compound CCCCNC(=O)C1=CC=CC=C1 BAULSHLTGVOYKM-UHFFFAOYSA-N 0.000 description 2
- 238000006798 ring closing metathesis reaction Methods 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- IGVXNMNZCHTKIU-UHFFFAOYSA-N 2,4-diamino-n-ethylbenzamide Chemical compound CCNC(=O)C1=CC=C(N)C=C1N IGVXNMNZCHTKIU-UHFFFAOYSA-N 0.000 description 1
- DLHWNBZHYWNPIG-UHFFFAOYSA-N 2,4-diamino-n-phenylbenzamide Chemical compound NC1=CC(N)=CC=C1C(=O)NC1=CC=CC=C1 DLHWNBZHYWNPIG-UHFFFAOYSA-N 0.000 description 1
- UXVMQQNJUSDDNG-UHFFFAOYSA-L Calcium chloride Chemical compound [Cl-].[Cl-].[Ca+2] UXVMQQNJUSDDNG-UHFFFAOYSA-L 0.000 description 1
- WLJVNTCWHIRURA-UHFFFAOYSA-N Heptanedioic acid Natural products OC(=O)CCCCCC(O)=O WLJVNTCWHIRURA-UHFFFAOYSA-N 0.000 description 1
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 1
- SUAKHGWARZSWIH-UHFFFAOYSA-N N,N‐diethylformamide Chemical compound CCN(CC)C=O SUAKHGWARZSWIH-UHFFFAOYSA-N 0.000 description 1
- VCUFZILGIRCDQQ-KRWDZBQOSA-N N-[[(5S)-2-oxo-3-(2-oxo-3H-1,3-benzoxazol-6-yl)-1,3-oxazolidin-5-yl]methyl]-2-[[3-(trifluoromethoxy)phenyl]methylamino]pyrimidine-5-carboxamide Chemical compound O=C1O[C@H](CN1C1=CC2=C(NC(O2)=O)C=C1)CNC(=O)C=1C=NC(=NC=1)NCC1=CC(=CC=C1)OC(F)(F)F VCUFZILGIRCDQQ-KRWDZBQOSA-N 0.000 description 1
- BDJRBEYXGGNYIS-UHFFFAOYSA-N Nonanedioid acid Natural products OC(=O)CCCCCCCC(O)=O BDJRBEYXGGNYIS-UHFFFAOYSA-N 0.000 description 1
- KDYFGRWQOYBRFD-UHFFFAOYSA-N Succinic acid Natural products OC(=O)CCC(O)=O KDYFGRWQOYBRFD-UHFFFAOYSA-N 0.000 description 1
- 238000005299 abrasion Methods 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 239000001361 adipic acid Substances 0.000 description 1
- 235000011037 adipic acid Nutrition 0.000 description 1
- JFCQEDHGNNZCLN-UHFFFAOYSA-N anhydrous glutaric acid Natural products OC(=O)CCCC(O)=O JFCQEDHGNNZCLN-UHFFFAOYSA-N 0.000 description 1
- KKEYFWRCBNTPAC-UHFFFAOYSA-N benzene-dicarboxylic acid Natural products OC(=O)C1=CC=C(C(O)=O)C=C1 KKEYFWRCBNTPAC-UHFFFAOYSA-N 0.000 description 1
- 239000001110 calcium chloride Substances 0.000 description 1
- 229910001628 calcium chloride Inorganic materials 0.000 description 1
- 125000005521 carbonamide group Chemical group 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000012772 electrical insulation material Substances 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 125000005843 halogen group Chemical group 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 125000000623 heterocyclic group Chemical group 0.000 description 1
- WNLRTRBMVRJNCN-UHFFFAOYSA-N hexanedioic acid Natural products OC(=O)CCCCC(O)=O WNLRTRBMVRJNCN-UHFFFAOYSA-N 0.000 description 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 1
- 239000012433 hydrogen halide Substances 0.000 description 1
- 229910000039 hydrogen halide Inorganic materials 0.000 description 1
- 229910001629 magnesium chloride Inorganic materials 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 239000012778 molding material Substances 0.000 description 1
- QQVIHTHCMHWDBS-UHFFFAOYSA-N perisophthalic acid Natural products OC(=O)C1=CC=CC(C(O)=O)=C1 QQVIHTHCMHWDBS-UHFFFAOYSA-N 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 238000001223 reverse osmosis Methods 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 239000001384 succinic acid Substances 0.000 description 1
- HXJUTPCZVOIRIF-UHFFFAOYSA-N sulfolane Chemical compound O=S1(=O)CCCC1 HXJUTPCZVOIRIF-UHFFFAOYSA-N 0.000 description 1
- IMFACGCPASFAPR-UHFFFAOYSA-N tributylamine Chemical compound CCCCN(CCCC)CCCC IMFACGCPASFAPR-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
- Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
Description
【発明の詳細な説明】
本発明は式
C式中、Arけジアミノモノアミド化a物残基、R1は
二塩基酸ハロゲン化物残基、YはCOまたばSO□、R
はアルキル、ンクロアルキル、アリル基から選ばれる1
価の基を示す)で示されるポリマーの製造法に関するも
ので、その目的とするところは耐熱性、耐摩耗性、耐薬
品性がすぐれていて、電気絶縁材料、成形材料、フィル
ム、逆浸透膜、配向膜、被覆材料、接着剤などとして有
用なポリマーを提供することにある。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to formula C, where Ar is a diaminomonoamide compound a residue, R1 is a dibasic acid halide residue, Y is CO or SO□, R
is 1 selected from alkyl, cycloalkyl, and allyl groups
The purpose is to produce polymers with excellent heat resistance, abrasion resistance, and chemical resistance, and to be used as electrical insulation materials, molding materials, films, and reverse osmosis membranes. The object of the present invention is to provide polymers useful as alignment films, coating materials, adhesives, and the like.
本発明の特徴とするところは2個のアミン基と1個のY
−NHR基(ただし、YはCOまたはSO2を示し、S
けアルキル基、ンクロアルキル基、アリル基から選ばれ
る1価の基を示す)とを芳香族核に有し、そのうち、1
個のアミノ基とY−NHR基とけ隣接炭素原子に結合し
ているジアミノモノアミド化合物と二塩基酸・・ロゲン
化物とを不活性溶媒中で反応させてポリアミド型中間体
を合成し、このポリアミド型中間体を脱水し閉環させる
ことにある。The feature of the present invention is that two amine groups and one Y
-NHR group (where, Y represents CO or SO2, S
(represents a monovalent group selected from a cycloalkyl group, a chloroalkyl group, and an allyl group) in the aromatic nucleus, and among them, 1
A diaminomonoamide compound bonded to carbon atoms adjacent to the amino groups and Y-NHR groups and a dibasic acid...logenide are reacted in an inert solvent to synthesize a polyamide type intermediate. The purpose is to dehydrate the intermediate and cause ring closure.
本発明に用いる前記ジアミノモノアミド化合物とけ次の
一般式
((I)〜(財)式において、YばSO□またばCOを
示し、Rはアルキル基、ンクロアルキル基、アリ四基か
ら選ばれる1価の基を示す。The diaminomonoamide compound used in the present invention has the following general formulas ((I) to (I)), where Y represents SO□ or CO, and R is 1 selected from an alkyl group, a chloroalkyl group, and an ali group. Indicates a valence group.
Xけ0 、 CH2゜SO2,sあるいはCOなどを示
す。Indicates XKe0, CH2°SO2,s or CO, etc.
芳香族核に紹合している1個のアミノ基とY−NHRと
は互いに隣接炭素原子に結合していれば、その位置は制
訳されない。As long as one amino group introduced to the aromatic nucleus and Y-NHR are bonded to adjacent carbon atoms, their positions are not restricted.
また、芳香族核に結合している水素原子は他の不活性基
例えばアルキル基、アリル基、ハロゲン原子などで置換
されていてもよい)で示されるもので、具体的に例を挙
げれば4,4′−ジアミノジフェニルエーテル−3−N
−メチルスルホンアミド、4.4’−ジアミノジフェニ
ルスルホン−3−N−メチルスルホンアミド、4.4’
−ジアミノジフェニルサルファイド−3−N−メチルス
ルホンアミド、2,5−ジアミノベンゼン−1−N−メ
チルスルホンアミド、2,4−ジアミノベンゼン−1−
N−メチルスルホンアミド、2,4−ジアミノベンゼン
−1−N−エチルスルホンアミド2.4−ジアミノベン
ゼン−IN−n−プロピルスルホンアミド、2,4−ジ
アミノベンゼン−1−N−iso−プロピルスルホンア
ミド、2,4−ジアミノベンゼン−lN−n−ブチルス
ルホンアミド2.4−ジアミノベンゼン−1−N−フェ
ニルスルホンアミド、4.4’−ジアミノジフェニルエ
ーテル−3−N−メチルカルボンアミド、4,4′−ジ
アミノジフェニルエーテル−3−N−エチルカルボンア
ミド、4,4′−ジアミノジフェニルエーテル−3N
n−プロピルカルボンアミド、4,4′−ジアミノジ
フェニルエーテル−3N−iso−プロピルカルボンア
ミド、4.4’−ジアミノジフェニルエーテル−3N−
n−/’チルカルボンアミド、4.4’−ジアミノジフ
ェニルエーテル−3−N−フェニルカルボンアミド、3
.4’−ジアミノジフェニルエーテル−4−N−メチル
カルボンアミド、3.4’−ジアミノジフェニルエーテ
ル−3′−N−メチルカルボンアミド、3.4’−ジア
ミノジフェニルエーテル−3’−N−エチルカルボンア
ミド、3.4’−ジアミノジフェニルエーテル−3′N
−n−プロピルカルボンアミド、3.4’−ジアミノジ
フェニルエーテル−3’ N 1so−プロピルカ
ルボンアミド、3.4’−ジアミノジフェニルエーテル
−3’Nn−7”チルカルボンアミド3.4′−ジアミ
ノジフェニルエーテル−3’−N−フェニルカルボンア
ミド、3.3’−ジアミノジフェニルエーテル−4−N
−メチルカルボンアミド4.4′−ジアミノジフェニル
メタン−3’−N−メチルカルボンアミド、3.4’−
ジアミノジフェニルメタン−4−N−メチルカルボンア
ミド、3.4’−ジアミノジフェニルメタン−3’ −
N−エチル・カルボンアミド、3,3′−ジアミノジフ
ェニルメタン−4−N−メチル−カルボンアミド、4.
4’−ジアミノジフェニルスルホン−3−N−メチルカ
ルボンアミド、4,4′−ジアミノジフェニルスルホン
−3−N−エチルカルボンアミド、4.4’フージアミ
ノジフエニルスルホンー3N−n−プロピルカルボンア
ミド、4.4’−ジアミノジフェニルスルホン−3Ni
so−7”ロピルカルボンアミド、4.4’−ジアミノ
ジフェニルメン−3Nn−ブチルカルボンアミド、4,
4′−シア;ミノジフェニルスルホン−3−N−フェニ
ルカルボンアミド、3,4′−ジアミノジフェニルスル
ホン−3′−N−メチルカルボンアミド、3.3’−ジ
アミノジフェニルスルホン−4N−エチルカルボンアミ
ド、4,4′−ジアミノジフェニルサルファイド−3−
N−メチルカルボンアミド、3j4′−ジアミノジフェ
ニルサルファイド−4−N−メチルカルボンアミド、3
,3′−ジアミノジフェニルサルファイド−4−N−メ
チルカルボンアミド、3,4′−ジアミノジフェニルサ
ルファイド−・3−N−メチルカルボンアミド、2,5
−ジアミノ−N−メチルベンズアミド、2,4−ジアミ
ノ−N−メチルベンズアミド、2,4−ジアミノ−N−
エチル−ベンズアミド、2,4−ジアミノ−N−n−プ
ロピルベンズアミド、2,4−ジアミノ−N −’ 1
so−プロピルベンズアミド、2,4−ジアミノ−N−
n−ブチルベンズアミド、2,4−ジアミノ−N−フェ
ニルベンズアミドなどがある。Furthermore, the hydrogen atom bonded to the aromatic nucleus may be substituted with other inert groups such as an alkyl group, an allyl group, a halogen atom, etc. ,4'-diaminodiphenyl ether-3-N
-Methylsulfonamide, 4.4'-diaminodiphenylsulfone-3-N-methylsulfonamide, 4.4'
-diaminodiphenyl sulfide-3-N-methylsulfonamide, 2,5-diaminobenzene-1-N-methylsulfonamide, 2,4-diaminobenzene-1-
N-methylsulfonamide, 2,4-diaminobenzene-1-N-ethylsulfonamide 2,4-diaminobenzene-IN-n-propylsulfonamide, 2,4-diaminobenzene-1-N-iso-propylsulfone Amide, 2,4-diaminobenzene-1-N-butylsulfonamide, 2,4-diaminobenzene-1-N-phenylsulfonamide, 4,4'-diaminodiphenyl ether-3-N-methylcarbonamide, 4,4 '-Diaminodiphenyl ether-3-N-ethyl carbonamide, 4,4'-diaminodiphenyl ether-3N
n-propylcarbonamide, 4,4'-diaminodiphenyl ether-3N-iso-propylcarbonamide, 4,4'-diaminodiphenyl ether-3N-
n-/'thylcarbonamide, 4.4'-diaminodiphenyl ether-3-N-phenylcarbonamide, 3
.. 4'-Diaminodiphenyl ether-4-N-methylcarbonamide, 3.4'-Diaminodiphenyl ether-3'-N-methylcarbonamide, 3.4'-Diaminodiphenyl ether-3'-N-ethylcarbonamide, 3. 4'-diaminodiphenyl ether-3'N
-n-propyl carbonamide, 3,4'-diaminodiphenyl ether-3'N 1so-propyl carbonamide, 3,4'-diaminodiphenyl ether-3'Nn-7'' thyl carbonamide 3,4'-diaminodiphenyl ether-3 '-N-phenylcarbonamide, 3,3'-diaminodiphenyl ether-4-N
-Methylcarbonamide 4.4'-Diaminodiphenylmethane-3'-N-methylcarbonamide, 3.4'-
Diaminodiphenylmethane-4-N-methylcarbonamide, 3.4'-diaminodiphenylmethane-3' -
N-ethyl carbonamide, 3,3'-diaminodiphenylmethane-4-N-methyl-carbonamide, 4.
4'-diaminodiphenylsulfone-3-N-methylcarbonamide, 4,4'-diaminodiphenylsulfone-3-N-ethylcarbonamide, 4,4'-diaminodiphenylsulfone-3N-n-propylcarbonamide, 4.4'-diaminodiphenylsulfone-3Ni
so-7''ropylcarbonamide, 4,4'-diaminodiphenylmene-3Nn-butylcarbonamide, 4,
4'-Sia; Minodiphenylsulfone-3-N-phenylcarbonamide, 3,4'-diaminodiphenylsulfone-3'-N-methylcarbonamide, 3,3'-diaminodiphenylsulfone-4N-ethylcarbonamide, 4,4'-diaminodiphenyl sulfide-3-
N-methylcarbonamide, 3j4'-diaminodiphenyl sulfide-4-N-methylcarbonamide, 3
, 3'-diaminodiphenyl sulfide-4-N-methylcarbonamide, 3,4'-diaminodiphenyl sulfide-.3-N-methylcarbonamide, 2,5
-Diamino-N-methylbenzamide, 2,4-diamino-N-methylbenzamide, 2,4-diamino-N-
Ethyl-benzamide, 2,4-diamino-N-n-propylbenzamide, 2,4-diamino-N-' 1
so-propylbenzamide, 2,4-diamino-N-
Examples include n-butylbenzamide and 2,4-diamino-N-phenylbenzamide.
これらのジアミノモノアミド化合物は2種以上併用する
こともできる。Two or more of these diaminomonoamide compounds can also be used in combination.
また、ジカルボン酸ハロゲン化物としては例えばイソフ
タル酸ハロゲン化物、テレフタル酸ハロゲン化物、4,
4′−ジフェニルエーテルジカルボン酸ハロゲン化物、
4.4’ −ジフェニルスルホンジカルボン酸ハロゲン
化物、2,6−ナフタリンジカルボン酸ハロゲン化物、
ンユウ酸ハロゲン化物、マロン酸ハロゲン化物、コハク
酸ハロゲン化物、グルタル酸ハロゲン化物、アジピン酸
ハロゲン化物、ピメリン酸ハロゲン化物、スペリン酸ハ
ロゲン化物、アゼライン酸ハロゲン化物、セバチッ酸ハ
ロゲン化物、1,10−デカンジカルボン酸ノ10ゲン
化物、1,3−ジクロペンタンジカルボン酸ハロゲン化
物、■、4−ジクロヘキサンジカルボン酸ハロゲン化物
などがある。In addition, examples of dicarboxylic acid halides include isophthalic acid halides, terephthalic acid halides, 4,
4'-diphenyl ether dicarboxylic acid halide,
4.4'-diphenylsulfonedicarboxylic acid halide, 2,6-naphthalenedicarboxylic acid halide,
malonic acid halide, malonic acid halide, succinic acid halide, glutaric acid halide, adipic acid halide, pimelic acid halide, speric acid halide, azelaic acid halide, sebatic acid halide, 1,10-decane Examples include dicarboxylic acid decogenide, 1,3-diclopentanedicarboxylic acid halide, and (1),4-diclohexanedicarboxylic acid halide.
本発明を実施するに当っては不活性な溶媒が使用される
。Inert solvents are used in the practice of this invention.
不活性溶媒としては例えばN−メチル−2−ピロリドン
、N、N−ジメチルアセトアミド、N、N−ジメチルホ
ルムアミド、N、N−ジエチルホルムアミド、ヘキサメ
チルスルホルアミド、テトラメチレンスルホンなどの一
種以上が用いられる。As the inert solvent, for example, one or more of N-methyl-2-pyrrolidone, N,N-dimethylacetamide, N,N-dimethylformamide, N,N-diethylformamide, hexamethylsulfolamide, tetramethylenesulfone, etc. is used. It will be done.
これらの溶媒中に塩化リチウムや塩化マグネ7ウムなど
の無機塩を添加してポリマーの溶解性を高めることもで
きる。Inorganic salts such as lithium chloride and magnesium chloride can also be added to these solvents to increase the solubility of the polymer.
また、生成するハロゲン化水素を捕獲するためにエポキ
ン化合物を添加しておくとよい。Furthermore, it is advisable to add an epochine compound in order to capture the generated hydrogen halide.
本発明の実施の態様はジアミノモノアミド化合物および
ジカルボン酸ハロゲン化物の当モルを不活性溶媒中で室
温ないしはそれ以下の温度で反応させると反応はすみや
かに進行し、反応系の粘度は著しく高くなシボリアミド
型中間体が得られる。An embodiment of the present invention is that when equivalent moles of a diaminomonoamide compound and a dicarboxylic acid halide are reacted in an inert solvent at room temperature or lower temperature, the reaction proceeds rapidly and the viscosity of the reaction system is extremely high. A type intermediate is obtained.
このポリアミド型中間体を加熱あるいけ化学薬品と処理
することによシ閉環し、ヘテロ環を有するポリマーに変
換する。This polyamide-type intermediate undergoes ring closure by heating or treatment with chemicals, converting it into a polymer having heterocycles.
本発明を一般式で示すと次の如くである。The present invention is represented by the following general formula.
(式中、Arはジアミノモノアミド化合物残基、YけC
OまたはSO□を示し、Rはアルキル基、シクロアルキ
ル基、アリル基から選ばれる1価の基を示し、R1はジ
カルボン酸ハロゲン化物の残基、Zはハロゲンを示す。(In the formula, Ar is a diaminomonoamide compound residue,
O or SO□, R represents a monovalent group selected from an alkyl group, a cycloalkyl group, and an allyl group, R1 represents a residue of a dicarboxylic acid halide, and Z represents a halogen.
)次に実施例を示して具体的に説明する。) Next, examples will be shown and concretely explained.
実施例 1
温度計、攪拌機および塩化カルシウム管を備えた1 0
0 ccの三ロフラスコに2,4−ジアミノベンゼン−
1−N−メチルスルホンアミド2.01g。Example 1 10 equipped with thermometer, stirrer and calcium chloride tube
2,4-diaminobenzene- in a 0 cc three-loaf flask.
2.01 g of 1-N-methylsulfonamide.
N−メチル−2−ピロリドン30 CO1塩化リチウす
チウム1を入れ、内容物を攪拌し、フラスコを水浴で冷
却しておく。N-Methyl-2-pyrrolidone 30 CO1 lithium chloride is added, the contents are stirred and the flask is kept cooled in a water bath.
この中にインフタル酸ジクロライド2.03gを徐々に
加え、添加終了後10℃で3時皿反応させた。2.03 g of inphthalic acid dichloride was gradually added to the mixture, and after the addition was completed, a reaction was carried out at 10° C. for 3 hours.
反応生成物を水中に注ぎ沈殿を生成させ、f過、水洗、
室温で減圧乾燥した。The reaction product was poured into water to form a precipitate, filtered, washed with water,
It was dried under reduced pressure at room temperature.
生成したポリアミド型中間体の還元粘度η5p10は1
.36.qン(溶媒N−メチル−2−ピロリドン、濃度
” g/100 cc溶液、温度30℃、以下測定条件
同じ)であった。The reduced viscosity η5p10 of the produced polyamide type intermediate is 1
.. 36. (Solvent: N-methyl-2-pyrrolidone, concentration: g/100 cc solution, temperature: 30°C, measurement conditions are the same below).
ポリアミド型中間体の粉末1gをN−メチル−2−ピロ
リドン20gに溶解し、さらにトリーn−ブチルアミン
を加え、180℃で2時間加熱し、溶液をガラス板に流
延し、フィルムを作成し、250〜350℃に加熱して
閉環させた。Dissolve 1 g of polyamide-type intermediate powder in 20 g of N-methyl-2-pyrrolidone, further add tri-n-butylamine, heat at 180 ° C. for 2 hours, and cast the solution on a glass plate to create a film. The ring was closed by heating to 250-350°C.
このフィルムは空気中で410℃まで減量しなかった。This film did not lose weight in air up to 410°C.
実施例 2
実施例1と同様のフラスコに4,4′−ジアミノジフェ
ニルエーテル−3−N−メチルカルボンアミド2.57
g、N−メチル−2−ピロリドン30cc、塩化リチウ
ム1.5gを入れ、内容物を攪拌し、フラスコを氷冷し
ておく。Example 2 In a flask similar to Example 1, 2.57 g of 4,4'-diaminodiphenyl ether-3-N-methylcarbonamide was added.
g, 30 cc of N-methyl-2-pyrrolidone, and 1.5 g of lithium chloride were added, the contents were stirred, and the flask was kept ice-cooled.
これにインフタル酸ジクロライド2.03gを徐々に加
え10℃で3時間反応させた。To this, 2.03 g of inphthalic acid dichloride was gradually added and reacted at 10° C. for 3 hours.
生成ポリアミド型中間体の還元粘度は1.56617g
であった。The reduced viscosity of the polyamide type intermediate produced is 1.56617g
Met.
ポリアミド型中間体のN−メチル−2−ピロリドン10
%溶液を作り、ガラス板に流延し、フィルムを作成し、
250〜350℃で熱処理し、閉環させた。Polyamide type intermediate N-methyl-2-pyrrolidone 10
% solution and cast it on a glass plate to create a film,
Heat treatment was performed at 250 to 350°C to close the ring.
このフィルムは空気中で420℃まで減量しなかった。This film did not lose weight in air up to 420°C.
Claims (1)
COまたけSO2を示し、Rはアルキル基ンクロアルキ
ル基、アリル基から選ばれる1価の基を示す)とを芳香
族核に有し、そのうち、1個のアミノ基とY−NHR基
とは隣接炭素原子に結合しているジアミノモノアミド化
合物と二塩基酸・・ロゲン化物とを不活性溶媒中で反応
させて、ポリアミド型中間体を合成し、しかる後、該中
間体を閉環させることを特徴とする縮合ポリマーの製造
法。12 amino groups and one Y-NHK group (wherein, Y represents CO spanning SO2, and R represents a monovalent group selected from an alkyl group, a chloroalkyl group, and an allyl group) as an aromatic nucleus. Among them, one amino group and Y-NHR group are formed by reacting a diamino monoamide compound bonded to adjacent carbon atoms with a dibasic acid...loginide in an inert solvent to form a polyamide type. A method for producing a condensation polymer, which comprises synthesizing an intermediate and then ring-closing the intermediate.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5812680A JPS5817219B2 (en) | 1980-04-30 | 1980-04-30 | Manufacturing method of condensation polymer |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5812680A JPS5817219B2 (en) | 1980-04-30 | 1980-04-30 | Manufacturing method of condensation polymer |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS56152838A JPS56152838A (en) | 1981-11-26 |
| JPS5817219B2 true JPS5817219B2 (en) | 1983-04-05 |
Family
ID=13075280
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP5812680A Expired JPS5817219B2 (en) | 1980-04-30 | 1980-04-30 | Manufacturing method of condensation polymer |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5817219B2 (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPWO2007111075A1 (en) | 2006-03-24 | 2009-08-06 | コニカミノルタエムジー株式会社 | Transparent barrier sheet and method for producing transparent barrier sheet |
-
1980
- 1980-04-30 JP JP5812680A patent/JPS5817219B2/en not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPS56152838A (en) | 1981-11-26 |
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