JPS582604B2 - gas supply valve - Google Patents
gas supply valveInfo
- Publication number
- JPS582604B2 JPS582604B2 JP52092202A JP9220277A JPS582604B2 JP S582604 B2 JPS582604 B2 JP S582604B2 JP 52092202 A JP52092202 A JP 52092202A JP 9220277 A JP9220277 A JP 9220277A JP S582604 B2 JPS582604 B2 JP S582604B2
- Authority
- JP
- Japan
- Prior art keywords
- gas
- valve
- chamber
- spool
- gas supply
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000007789 gas Substances 0.000 description 111
- 238000012856 packing Methods 0.000 description 9
- 238000002347 injection Methods 0.000 description 7
- 239000007924 injection Substances 0.000 description 7
- 230000007935 neutral effect Effects 0.000 description 7
- 239000002245 particle Substances 0.000 description 7
- 230000014759 maintenance of location Effects 0.000 description 3
- 150000001875 compounds Chemical class 0.000 description 2
- 230000004927 fusion Effects 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- YZCKVEUIGOORGS-OUBTZVSYSA-N Deuterium Chemical compound [2H] YZCKVEUIGOORGS-OUBTZVSYSA-N 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 239000000567 combustion gas Substances 0.000 description 1
- 229910052805 deuterium Inorganic materials 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000010884 ion-beam technique Methods 0.000 description 1
- 230000013011 mating Effects 0.000 description 1
- 238000006386 neutralization reaction Methods 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E30/00—Energy generation of nuclear origin
- Y02E30/10—Nuclear fusion reactors
Landscapes
- Plasma Technology (AREA)
- Sliding Valves (AREA)
Description
【発明の詳細な説明】
本発明は、ガス供給弁殊に中性粒子注入弁として最適に
使用でき得るガス供給弁に関する。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a gas supply valve that can be optimally used as a gas supply valve, particularly as a neutral particle injection valve.
核融合炉のプラズマ加熱装置として中性粒子入射装置が
現在有望視され開発中にあるが、第１図に示すように、
この中性粒子入射装置ａの一部品である中性粒子（水素
ガス又は重水素ガス）注入弁ｂは、イオン発生装置Ｃか
らのイオンビームと荷電交換させる中性化セルｄへ中性
粒子を供給しその流量を制御する働きをなす。Neutral particle injection devices are currently under development and are considered promising as plasma heating devices for nuclear fusion reactors, but as shown in Figure 1,
A neutral particle (hydrogen gas or deuterium gas) injection valve b, which is a part of the neutral particle injection device a, injects neutral particles into a neutralization cell d where charge is exchanged with the ion beam from the ion generator C. It functions to supply and control the flow rate.
なお、第１図において、ｅはガス供給設備、ｆはトーラ
ス、ｇはプラズマをそれぞれ示す。In FIG. 1, e represents gas supply equipment, f represents torus, and g represents plasma.
しかして、この種中性粒子注入弁においては、被供給側
が超高真空状態に維持され、稀釈濃度のガスが要求され
ることから、弁の開閉時間が数ミリ秒と非常に短い作動
時間が要求されている。However, in this type of neutral particle injection valve, the supply side is maintained in an ultra-high vacuum state and a diluted concentration of gas is required, so the valve opening and closing time is extremely short, only a few milliseconds. requested.
これは、真空中へガスを注入する場合、弁による制御が
非常に困難なことを意味し、これら作動時間から推定し
てガス濃度のバラツキがかなり太きいと言える。This means that when gas is injected into a vacuum, it is very difficult to control the valve, and judging from these operating times, it can be said that the gas concentration varies considerably.
すなわち、弁の開口面積（流れ断面積）及び開放時間に
よって供給ガスの流量（ひいては、出口側のガス濃度）
を制御する場合、弁の開閉時間が極めて短い（数ミリ秒
）と、時間にバラツキが生じ、正確にガス供給量を制御
できないことになる。In other words, the flow rate of the supplied gas (and thus the gas concentration on the outlet side) depends on the opening area (flow cross-sectional area) and opening time of the valve.
When controlling the amount of gas supplied, if the opening/closing time of the valve is extremely short (several milliseconds), there will be variations in the time, making it impossible to accurately control the gas supply amount.
本発明はこのような問題を解消するためになされたもの
で、その目的は弁の開閉時間（又は弁体の作動時間）の
バラツキに関係なく、ガス供給量を精確に制御しえ、ひ
いては被供給側の供給ガス濃度を精確に調節しうるガス
供給弁を提供することにある。The present invention was made to solve these problems, and its purpose is to accurately control the gas supply amount regardless of variations in the opening/closing time of the valve (or the operating time of the valve body), and thereby to reduce the amount of gas supplied. An object of the present invention is to provide a gas supply valve that can accurately adjust the supply gas concentration on the supply side.
以下第２図を参照して本発明の好適な一実施例について
詳述する。A preferred embodiment of the present invention will be described in detail below with reference to FIG.
第２図において、１は弁本体、１ａはガス人口１ｂはガ
ス出口、２，２′はガス供給流路、３，３′は内弁、３
−１．３’−１．３−２．３′−２はスプール弁、４，
４′はガス保持室、５はガス排出室、６．６’，６″は
弁棒、７はベローズシール、８ａ，８ｂ，８’ａ，８’
ｂはスプール弁用シールリング、９ａ＋９ｂ！９’ａ＋
９’ｂは内弁用シールパッキン、Ａ．Ｎはスプール弁座
、Ｂ，Ｂ’，Ｃ，Ｃ’は内弁座、Ｄ，Ｄ’はスプール弁
座をそれぞれ示す。In Fig. 2, 1 is the valve body, 1a is the gas port, 1b is the gas outlet, 2, 2' are the gas supply channels, 3, 3' are the inner valves, 3
-1.3'-1.3-2.3'-2 is a spool valve, 4,
4' is a gas holding chamber, 5 is a gas discharge chamber, 6.6', 6'' is a valve stem, 7 is a bellows seal, 8a, 8b, 8'a, 8'
b is the seal ring for the spool valve, 9a+9b! 9'a+
9'b is a seal packing for the inner valve, A. N indicates a spool valve seat, B, B', C, and C' indicate inner valve seats, and D and D' indicate spool valve seats, respectively.
ガス人口１ａ、ガス出口１ｂおよびガス排出室５は同一
中心線Ｓを有し、またこの中心線Ｓを中心としてガス供
給流路２と２′、ガス供給室２ａと２′ａ、スプール弁
座ＡとＡ′、内弁座ＢとＢ′、ガス保持室４と４′、内
弁座ＣとＣ′およびスプール弁座ＤとＤ′がそれぞれ対
称となるように弁本体１内に形成されている。The gas population 1a, the gas outlet 1b, and the gas discharge chamber 5 have the same center line S, and the gas supply channels 2 and 2', the gas supply chambers 2a and 2'a, and the spool valve seat are centered around this center line S. A and A', inner valve seats B and B', gas holding chambers 4 and 4', inner valve seats C and C', and spool valve seats D and D' are formed in the valve body 1 so as to be symmetrical with each other. ing.
内弁３とスプール弁３−１．３−２および内弁３′とス
プール弁３’−１．３’−２はそれぞれ一体に組込まれ
て複式弁を構成し、このふたつの複式弁は弁棒６，６’
．６“によって連結されてガス出口１ｂをはさんで対称
に配置されている。The inner valve 3 and the spool valve 3-1.3-2 and the inner valve 3' and the spool valve 3'-1.3'-2 are each integrated into a double valve, and these two double valves are Rod 6,6'
．． 6" and are arranged symmetrically across the gas outlet 1b.
内弁３，３′の各両側にはそれぞれシールパッキン９ａ
＋９ｂ＋９’ａ，９’ｂが設けられ、またスプール弁：
３−１．３−２．３”−１．３’−２にはそれぞれシー
ルリング８ａ＋８ｂ＋８’ａ，ｓ’ｂが組込まれている
。Seal packings 9a are provided on each side of the inner valves 3 and 3'.
+9b+9'a, 9'b are provided, and a spool valve:
Seal rings 8a+8b+8'a and s'b are incorporated in each of 3-1.3-2.3''-1.3'-2.
スプール弁座Ａとシールリング８ａ（スプール弁３−１
）、内弁座Ｂとシールパッキン９ａ（内弁３）、内弁座
Ｃとシールパッキン９ｂ（内弁３）、スプール弁座Ｄと
シールリング８ｂ（スプール弁３−２）およびスプール
弁座Ａ′とシールリング８′ａ（スプール弁３’−１）
、内弁Ｂ′とシールパッキン９′ａ（内弁３′）、スブ
ール弁座Ｄ′とシールリング８′ｂ（スプール弁３’−
２）は、いずれかのストローク状態において密着してシ
ールバウンダリを形成する。Spool valve seat A and seal ring 8a (spool valve 3-1
), inner valve seat B and seal packing 9a (inner valve 3), inner valve seat C and seal packing 9b (inner valve 3), spool valve seat D and seal ring 8b (spool valve 3-2), and spool valve seat A ' and seal ring 8'a (spool valve 3'-1)
, inner valve B' and seal packing 9'a (inner valve 3'), Sbour valve seat D' and seal ring 8'b (spool valve 3'-
2) forms a seal boundary in close contact in any stroke state.
そして、ガス人口１ａはガス供給設備（図示せず）に接
続され、ガス出口１ｂはガス需要設備（図示せず）に接
続され（真空側）、またベローズシール７は弁本体１か
ら露出する弁棒６“の部分と弁本体１とに接続されて弁
本体内と大気とのシールバウンダリを形成している。The gas outlet 1a is connected to a gas supply facility (not shown), the gas outlet 1b is connected to a gas demand facility (not shown) (vacuum side), and the bellows seal 7 is connected to a valve exposed from the valve body 1. The rod 6'' is connected to the valve body 1 to form a sealing boundary between the inside of the valve body and the atmosphere.
次にその作用について説明する。Next, its effect will be explained.
第２図は一方のガス保持室４がガス供給室２ａには連通
されていないがガス排出室５およびガス出口１ｂに連通
されている状態を示し、このガス保持室４内のガスがガ
ス排出室５およびガス出口１ｂを通してガス需要設備へ
拡散供給されている。FIG. 2 shows a state in which one gas holding chamber 4 is not communicated with the gas supply chamber 2a but is communicated with the gas discharge chamber 5 and the gas outlet 1b, and the gas in this gas holding chamber 4 is discharged. The gas is diffusely supplied to the gas demand equipment through the chamber 5 and the gas outlet 1b.
この状態で、他方のガス保持室４′は逆にガス排出室５
には連通されていないがガス供給室２′ａと連通されて
いる状態であって、このガス保持室４′にはガス人口１
ａを通してガス供給設備よりガスが供給されている。In this state, the other gas holding chamber 4' is conversely connected to the gas discharging chamber 5.
Although not in communication with the gas supply chamber 2'a, the gas holding chamber 4' has a gas population of 1.
Gas is supplied from gas supply equipment through a.
この状態から弁棒６“に接続された適当な弁駆動装置（
図示せず）によって弁棒６“を右側方向へ動かすと、ま
ずシールリング８′ａがスプール弁座Ａ′に密着してガ
ス供給室２′ａとガス保持室４′とをまたシールリング
８ｂがスプール弁座Ｄに密着してガス保持室４とガス排
出室５とをそれぞれ隔離し、更にシールパッキン９ｂが
内弁座Ｃにまたシールパッキン９′ａが内弁座Ｂ′にそ
れぞれ密着してガス保持室４とガス供給流路２ａおよび
ガス保持室４′とガス排出室５とをそれぞれ連通し、こ
れにより今度はガス保持室４′内のガスがガス排出室５
およびガス出口１ｂを通してガス需要設備へ供給されま
た、ガス保持室４内にはガス入Ｄ１ａ，ガス供給流路２
およびガス供給室２ａを通してガス供給設備よりガスが
供給される。From this state, a suitable valve drive device (
When the valve stem 6'' is moved to the right by the lever (not shown), the seal ring 8'a comes into close contact with the spool valve seat A', and the gas supply chamber 2'a and the gas holding chamber 4' are separated by the seal ring 8b. is in close contact with the spool valve seat D to isolate the gas holding chamber 4 and the gas discharge chamber 5, and furthermore, the seal packing 9b is in close contact with the inner valve seat C, and the seal packing 9'a is in close contact with the inner valve seat B'. The gas holding chamber 4 and the gas supply channel 2a and the gas holding chamber 4' and the gas exhausting chamber 5 are connected to each other, so that the gas in the gas holding chamber 4' is transferred to the gas exhausting chamber 5.
The gas is supplied to the gas demand equipment through the gas outlet 1b, and the gas holding chamber 4 includes a gas input D1a and a gas supply channel 2.
Gas is supplied from gas supply equipment through the gas supply chamber 2a.
そして、このような作動を繰り返しおこなわせることに
よってガスがガス需要設備側へ定容量づつ供給される。By repeating such an operation, gas is supplied to the gas demand facility at a constant volume.
この場合、シールリング８ａ，８ｂ又は８’ａ＋８’ｂ
は、弁作動時に、それぞれ、ガス供給室２ａとガス保持
室４、ガス排出室５とガス保持室４′又はガス保持室４
とガス排出室５、ガス供給室２′ａとガス保持室４′が
連通しないようにシールして、ガス保持室４，４′の容
積すなわちガス供給量を定格値に確保する。In this case, seal rings 8a, 8b or 8'a+8'b
are the gas supply chamber 2a and the gas holding chamber 4, the gas discharge chamber 5 and the gas holding chamber 4', or the gas holding chamber 4, respectively, when the valve is operated.
The gas discharge chamber 5, the gas supply chamber 2'a, and the gas holding chamber 4' are sealed so that they do not communicate with each other, thereby ensuring the volume of the gas holding chambers 4, 4', that is, the gas supply amount at the rated value.
また、シールパッキン９ａ，９ｂ又は９’ａ＋９’ｂは
弁作動完了時にそれぞれガス供給室２ａとガス保持室４
、ガス排出室５とガス保持室４′又はガス保持室４とガ
ス排出室５、ガス供給室２′ａとガス保持室４′が連通
しないように確実にシール（ダブルシール）して確実な
弁作用を保証している。Further, the seal packings 9a, 9b or 9'a+9'b are respectively inserted into the gas supply chamber 2a and the gas holding chamber 4 when the valve operation is completed.
, the gas discharge chamber 5 and the gas retention chamber 4', the gas retention chamber 4 and the gas discharge chamber 5, and the gas supply chamber 2'a and the gas retention chamber 4' are securely sealed (double sealed) so that they do not communicate with each other. Guarantees valve action.
以上述べたように、本発明に係るガス供給弁は、ガス入
口とガス出口とを有する弁本体の内部に前記ガス人口に
連通ずる一方の壁側と前記ガス出口に連通ずる他方の壁
側とに相対峙して同軸状に形成したふたつのスブール弁
座を有する一対の互いに連通ずるガス保持室を前記ガス
出口をはさんで対称に形成し、各ガス保持室のこれらふ
たつのスプール弁座に選択的に嵌合するふたつのスプー
ル弁を間隔を置いて有する一対の複式弁をその関連する
ガス保持室内にそれぞれ往復自在に配設するとともにこ
れら複式弁を弁棒により連結し、これら複式弁の各スプ
ール弁を同期して往復させる手段を設けて前記ガス入口
からのガスを前記一対のガス保持室から交互に前記ガス
出口に流出させることを特徴とするから、定格容積にて
ガスの安定供給を行なうことができ、したがって弁の開
閉作動時間に影響されることなくガス供給量すなわちガ
ス濃度の制御が確実に行なうことができ、また複式内弁
構造としているため弁棒の１ストロークでガス供給、準
備ができ、ほぼ連続的にガス供給作動が行なわれ得るな
ど種々の効果を有する。As described above, the gas supply valve according to the present invention has one wall side communicating with the gas port and the other wall side communicating with the gas outlet inside the valve body having a gas inlet and a gas outlet. A pair of mutually communicating gas holding chambers having two Spool valve seats facing each other and coaxially formed are formed symmetrically across the gas outlet, and the two Spool valve seats of each gas holding chamber are provided with A pair of compound valves having two selectively mating spool valves spaced apart are arranged in their associated gas holding chambers so as to be able to reciprocate, and these compound valves are connected by a valve stem. The invention is characterized in that a means for reciprocating each spool valve synchronously is provided so that the gas from the gas inlet is alternately discharged from the pair of gas holding chambers to the gas outlet, thereby stably supplying gas at the rated volume. Therefore, the gas supply amount, that is, the gas concentration, can be reliably controlled without being affected by the opening/closing operation time of the valve.In addition, the double internal valve structure allows gas to be supplied with one stroke of the valve stem. It has various advantages, such as being able to prepare and almost continuously operate the gas supply.
また、本発明は真空用ガス注入弁のみならずエンジン用
稀釈燃刺ガス供給弁などに広く応用できるものである。Furthermore, the present invention can be widely applied not only to vacuum gas injection valves but also to diluted combustion gas supply valves for engines.
第１図は核融合炉のプラズマ加熱装置としての中性粒子
入射装置の−例を示す図、第２図は本発明の一実施例を
示す断面図である。
１・・・・・・弁本体、１ａ・・・・・・ガス入口、１
ｂ・・・・・・ガス出口、２，２′・・・・・・ガス供
給流路、３，３′・・・・・・内弁、３−１．３′−１
，３−２．３′−２・・・・・・スプール弁、４，４′
・・・・・・ガス保持室、５・・・・・・ガス排出室、
６．６’，６“・・・・・・弁棒、７・・・・・・ベロ
ーズシール、８ａ，８ｂ，８’ａ，８’ｂ−スプール弁
用シールリング、９ａ＋９ｂ＋９’ａ＋９’ｂ・・・・
・・内弁用シールパッキン、Ａ，Ａ′・・・・・・スプ
ール弁座、Ｂ，Ｂ′，ｃ，ｃ’・・・・・・内弁座、Ｄ
，Ｄ’・・・・・・スプール弁座。FIG. 1 is a diagram showing an example of a neutral particle injection device as a plasma heating device for a nuclear fusion reactor, and FIG. 2 is a sectional view showing an embodiment of the present invention. 1...Valve body, 1a...Gas inlet, 1
b...Gas outlet, 2,2'...Gas supply channel, 3,3'...Inner valve, 3-1.3'-1
, 3-2.3'-2... Spool valve, 4, 4'
...Gas holding chamber, 5...Gas discharge chamber,
6.6', 6"...Valve stem, 7...Bellows seal, 8a, 8b, 8'a, 8'b-spool valve seal ring, 9a+9b+9'a+9'b・...
... Seal packing for inner valve, A, A'... Spool valve seat, B, B', c, c'... Inner valve seat, D
,D'...Spool valve seat.
Claims (1)
ガス入口に連通ずる一方の壁側と前記ガス出口に連通ず
る他方の壁側とに相対峙して同軸状に形成したふたつの
スプール弁座を有する一対の互いに連通ずるガス保持室
を前記ガス出口をはさんで対称に形成し、各ガス保持室
のこれらふたつのスプール弁座に選択的に嵌合するふた
つのスプール弁を間隔を置いて有する一対の複式弁をそ
の関連するガス保持室内にそれぞれ往復自在に配設する
とともにこれら複式弁を弁棒により連結し、これら複式
弁の各スプール弁を同期して往復させる手段を設けて前
記ガス入口からのガスを前記一対のガス保持室から交互
に前記ガス出口に流出させることを特徴とするガス供給
弁。1. Two spool valves coaxially formed in a valve body having a gas inlet and a gas outlet, facing each other on one wall side communicating with the gas inlet and the other wall side communicating with the gas outlet. A pair of mutually communicating gas holding chambers having seats are formed symmetrically across the gas outlet, and two spool valves selectively fitted into the two spool valve seats of each gas holding chamber are spaced apart. A pair of duplex valves each having a gas holding chamber are arranged reciprocably in their associated gas holding chambers, and these duplex valves are connected by a valve stem, and means is provided for reciprocating each spool valve of these duplex valves in synchronization. A gas supply valve characterized in that gas from the gas inlet is caused to alternately flow out from the pair of gas holding chambers to the gas outlet.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP52092202A JPS582604B2 (en) | 1977-08-02 | 1977-08-02 | gas supply valve |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP52092202A JPS582604B2 (en) | 1977-08-02 | 1977-08-02 | gas supply valve |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5427393A JPS5427393A (en) | 1979-03-01 |
| JPS582604B2 true JPS582604B2 (en) | 1983-01-18 |
Family
ID=14047851
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP52092202A Expired JPS582604B2 (en) | 1977-08-02 | 1977-08-02 | gas supply valve |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS582604B2 (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2016070453A (en) * | 2014-10-01 | 2016-05-09 | 株式会社フロント | Flow control valve |
-
1977
- 1977-08-02 JP JP52092202A patent/JPS582604B2/en not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5427393A (en) | 1979-03-01 |
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