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JPS5827865B2 - Hydrogen ion and hydrofluoric acid concentration measuring device - Google Patents
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JPS5827865B2 - Hydrogen ion and hydrofluoric acid concentration measuring device - Google Patents

Hydrogen ion and hydrofluoric acid concentration measuring device

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Publication number
JPS5827865B2
JPS5827865B2 JP53123726A JP12372678A JPS5827865B2 JP S5827865 B2 JPS5827865 B2 JP S5827865B2 JP 53123726 A JP53123726 A JP 53123726A JP 12372678 A JP12372678 A JP 12372678A JP S5827865 B2 JPS5827865 B2 JP S5827865B2
Authority
JP
Japan
Prior art keywords
ion selective
selective electrode
hydrogen ion
electrode
hydrofluoric acid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP53123726A
Other languages
Japanese (ja)
Other versions
JPS5550153A (en
Inventor
康夫 猪熊
崇 落合
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Steel Corp
Original Assignee
Sumitomo Metal Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Metal Industries Ltd filed Critical Sumitomo Metal Industries Ltd
Priority to JP53123726A priority Critical patent/JPS5827865B2/en
Publication of JPS5550153A publication Critical patent/JPS5550153A/en
Publication of JPS5827865B2 publication Critical patent/JPS5827865B2/en
Expired legal-status Critical Current

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  • Investigating Or Analyzing Materials By The Use Of Electric Means (AREA)
  • Investigating Or Analyzing Non-Biological Materials By The Use Of Chemical Means (AREA)

Description

【発明の詳細な説明】 本発明は、酸洗浴中の水素イオンおよびフッ化水素酸の
濃度を求める装置に関するものである。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to an apparatus for determining the concentration of hydrogen ions and hydrofluoric acid in a pickling bath.

酸洗浴中の硝酸(HNO3)およびフッ化水素酸(HF
)ならびに鉄(Fe)、クロム(Cr)およびニッケル
(Ni)等の金属イオンは、金属や合金を酸洗する場合
、それも主としてステンレス鋼を酸洗する際に、フッ化
物と共に錯体を形成し、これにより金属や合金を更に溶
解する。
Nitric acid (HNO3) and hydrofluoric acid (HF) in the pickling bath
), as well as metal ions such as iron (Fe), chromium (Cr), and nickel (Ni), form complexes with fluorides when pickling metals and alloys, primarily stainless steel. , which further melts the metal or alloy.

この際HNO3とHFとは酸洗い工程の経過と共Oこ消
耗するので、浴の機能は次第に低下する。
At this time, HNO3 and HF are consumed as the pickling process progresses, so the functionality of the bath gradually deteriorates.

従って、浴中成分のうちHNO3とHFとの濃度を迅速
かつ正確に測定し、これらの濃度を適正維持することは
浴管理上重要なことである。
Therefore, it is important for bath management to quickly and accurately measure the concentrations of HNO3 and HF among the components in the bath and to maintain these concentrations appropriately.

従来、HNO3濃度即ち浴中の水素イオン濃度、および
フッ化水素酸濃度の測定は中和滴定や金属錯体を利用す
る湿式化学分析法が行われていたが、金属イオンが多量
に存在する場合には誤差が大きく、さらに分析所要時間
が長く、前記酸洗浴の管理等ζこは実用的ではないとい
う欠点があった。
Conventionally, the HNO3 concentration, that is, the hydrogen ion concentration in the bath, and the hydrofluoric acid concentration have been measured using neutralization titration or wet chemical analysis using metal complexes. The disadvantages are that the error is large, the time required for analysis is long, and the management of the pickling bath is not practical.

本発明はこのような欠点を除くものであって、第1図に
示す如く、測定溶液中1中に設けた基準電極2と、水素
イオン選択性電極3と、フッ素イオン選択性電極4と、
前記水素イオン選択性電極基準電極間、あるいは水素イ
オン選択性電極フッ素イオン選択性電極間の電位差を測
定するための切換スイッチ5、ならびに電位差計7と、
前記水素イオン選択性電極−フッ素イオン選択性電極間
の電位差のゲインを調節するための調節器6と、前記水
素イオン選択性電極−基準電極間の電位差測定値、およ
び水素イオン選択性電極−フッ素イオン選択性電極間の
電位差測定値にもとづき、水素イオンおよびフッ化水素
酸の濃度を演算する演算器8と該演算器の演算値を表示
する表示器9とから構成されている。
The present invention eliminates such drawbacks, and as shown in FIG. 1, a reference electrode 2, a hydrogen ion selective electrode 3, a fluorine ion selective electrode 4 provided in a measurement solution 1,
a changeover switch 5 for measuring the potential difference between the hydrogen ion selective electrode and the reference electrode or between the hydrogen ion selective electrode and the fluorine ion selective electrode, and a potentiometer 7;
a regulator 6 for adjusting the gain of the potential difference between the hydrogen ion selective electrode and the fluorine ion selective electrode, a measured value of the potential difference between the hydrogen ion selective electrode and the reference electrode, and a hydrogen ion selective electrode and the fluorine ion selective electrode; It is comprised of a calculator 8 that calculates the concentrations of hydrogen ions and hydrofluoric acid based on the measured potential difference between the ion-selective electrodes, and a display 9 that displays the calculated values of the calculator.

なおこの明細書において、水素イオン選択性電極とは水
素イオンに選択的に感応する電極をいい、フッ素イオン
選択性電極とはフッ素イオンに選択的に感応する電極を
いう。
In this specification, a hydrogen ion selective electrode refers to an electrode selectively sensitive to hydrogen ions, and a fluorine ion selective electrode refers to an electrode selectively sensitive to fluorine ions.

次に、本発明装置の測定原理を述べる。Next, the measurement principle of the device of the present invention will be described.

水素イオン選択性電極−基準電極間の電位差EH+、お
よびフッ素イオン選択性電極−基準電極間の電位差EF
−はネルンストの式として次のように示される。
The potential difference EH+ between the hydrogen ion selective electrode and the reference electrode, and the potential difference EF between the fluorine ion selective electrode and the reference electrode
- is expressed as Nernst's equation as follows.

ここで EH+:水素イオン選択性電極−基準電極間の電位差 BF−、フッ素イオン選択性電極−基準電極間の電位差 〔H+〕:水素イオンの濃度 CF−):フッ素イオンの濃度 EoH+、EoF−2SH+、SF−:夫々個別の定数
また、フッ化水素酸の解離定数は次式で示される。
Here, EH+: Potential difference between the hydrogen ion selective electrode and the reference electrode BF-, Potential difference between the fluorine ion selective electrode and the reference electrode [H+]: Hydrogen ion concentration CF-): Fluorine ion concentration EoH+, EoF-2SH+ , SF-: Individual constants Further, the dissociation constant of hydrofluoric acid is expressed by the following formula.

ここで KHF ”フッ化水素酸の解離定数 (HF):フツ化水素酸の濃度 (1) 、 (2) 、(3)式より水素イオン選択性
電極−フッ化水素酸選択性電極間の電位差Beef l
(−EH” EF −)は、SH+=SF−(−8H
F)ならしめるときは次のように示される。
Here, KHF "Dissociation constant (HF) of hydrofluoric acid: Concentration of hydrofluoric acid (1), (2), (3) From equations, potential difference between hydrogen ion selective electrode and hydrofluoric acid selective electrode. Beef l
(−EH” EF −) is SH+=SF−(−8H
F) When adjusting, it is shown as follows.

従って、(1式により、EoH+、SH+が既知のとき
は、BH+を測定すれば〔H+〕が、(4)式により、
EoCell、SHFカ五知ノトキハ、ECellヲ測
定スれば(HF)が求められる。
Therefore, (by equation 1, when EoH+ and SH+ are known, measuring BH+ will yield [H+], and by equation (4),
By measuring EoCell, SHF, and ECell, (HF) can be obtained.

ここで、EoH+、SH+は実験的に求めたE H+−
1og CH” )関係直線より、EoF−2SF−は
実験的に求めたE” −1ogCF :]関係直線よ
り求められる。
Here, EoH+, SH+ are experimentally determined EH+-
EoF-2SF- can be obtained from the experimentally obtained E"-1ogCF:] relational line.

SF−は理論的にはSH+と同一であるべきものである
が、電極の特性により僅かながら差異が生ずるので、本
発明装置においてはSF−−SH+なる如く調節し、こ
の値をSHFとする。
Theoretically, SF- should be the same as SH+, but since there is a slight difference due to the characteristics of the electrodes, in the device of the present invention, it is adjusted so that SF--SH+, and this value is defined as SHF.

EoCeIlは上記の如く求めたE。EoCeIl is E determined as above.

、Eo 、S 、および化学定数であるKHFより(
5)式で求められる。
, Eo, S, and the chemical constant KHF (
5) It is determined by the formula.

次に、本発明装置による水素イオンおよびフッ化水素酸
濃度測定法を説明する。
Next, a method for measuring hydrogen ion and hydrofluoric acid concentrations using the apparatus of the present invention will be explained.

該測定に先立って、その準備のため、実験によりE。Prior to the measurement, for the preparation, E.

H+、SH+EoF−およびSF−を求めておく必要が
ある。
It is necessary to obtain H+, SH+EoF- and SF-.

まず、EoH+とs”+こついては、水素イオン濃度〔
H+〕が既知であって、それが段階的に異なる種々の硝
酸溶液を測定液として、水素イオン選択性電極3と基準
電極2の間の電位差BH+を測定し、第2図の如きE”
−log [H” )の関係直線を求める。
First of all, the problem with EoH+ and s”+ is the hydrogen ion concentration [
H+] is known, and the potential difference BH+ between the hydrogen ion selective electrode 3 and the reference electrode 2 is measured using various nitric acid solutions that differ in stages as measurement solutions, and the potential difference BH+ as shown in FIG. 2 is obtained.
−log [H”) is found.

そして、log(H″−]−〇に対応するEH+値とし
てE。
And E as the EH+ value corresponding to log(H″-]-〇.

H+を求めると共に、直線の傾きとしてSH+を求めて
おく。
In addition to finding H+, SH+ is also found as the slope of the straight line.

またE。 とS については、フッ素イオン濃度〔F
−〕が既知であって、それが段階的に異なる種々のフッ
化ナトリウム溶液を測定液として、フッ素イオン選択性
電極4と基準電極2の間の電位差EF−を測定し、第3
図のとときEF−−1ogCF−〕の関係直線を求める
E again. and S, the fluorine ion concentration [F
-] is known, and the potential difference EF- between the fluorine ion-selective electrode 4 and the reference electrode 2 is measured using various sodium fluoride solutions that differ stepwise as measurement liquids, and the third
Find the relationship line between EF--1ogCF-] in the figure.

そして、logCF )=0に対応するEF−値とし
てE。
and E as the EF-value corresponding to logCF )=0.

Fを求めると共に、直線の傾きとしてSF−を求めてお
く。
In addition to finding F, SF- is also found as the slope of the straight line.

かくして得られたSH+、SF−を比較し、51−i+
= SF −(−8HF )なる如く、水素イオン選
択性電極3とフッ素イオン選択性電極4との間の電位差
のゲインを、調節器6で調節すると共に、該調節値SH
Fと、前記実1験によって求めたE。
Comparing SH+ and SF- thus obtained, 51-i+
= SF - (-8HF), the gain of the potential difference between the hydrogen ion selective electrode 3 and the fluorine ion selective electrode 4 is adjusted by the regulator 6, and the adjustment value SH
F and E determined from the above experiment.

H+とEoF−とから(5)式OこよりE。From H+ and EoF-, E is obtained from formula (5).

ce l lを求める。次に、上記E。Find ce l l. Next, the above E.

H+、SH+、EoCell、SHF、およびKHFの
値と、(1)式および(6)式を演算器8に記憶せしめ
ることにより測定準備を完了する。
Preparation for measurement is completed by storing the values of H+, SH+, EoCell, SHF, and KHF, and equations (1) and (6) in the calculator 8.

以上の如く測定準備された本発明装置に測定溶液を装入
し、まず、切換スイッチ5を基準電極側にセットし、基
準電極2と水素イオン選択性電極3との間の電位差EH
+を電位差計7で測定し、演算装置8へ出力する。
A measurement solution is charged into the apparatus of the present invention prepared for measurement as described above, and the selector switch 5 is first set to the reference electrode side, and the potential difference EH between the reference electrode 2 and the hydrogen ion selective electrode 3 is
+ is measured by the potentiometer 7 and output to the arithmetic unit 8.

演算装置8は、前記E をA、’I)変換すると共に、
該変換値およびあらかじめ記憶しているE。
The arithmetic unit 8 converts the above E to A, 'I), and
The converted value and E stored in advance.

H+、SH+の値と(1)式により、水素イオン濃度〔
H+〕を演算し、該演算値は表示器9により表示される
Using the values of H+ and SH+ and equation (1), the hydrogen ion concentration [
H+], and the calculated value is displayed on the display 9.

次に切換スイッチ5をフッ素電極側にセットし、フッ素
イオン選択性電極4と水素イオン選択性電極3との間の
電位差Bcellを電位差計7で測定し、演算装置8へ
出力する。
Next, the changeover switch 5 is set to the fluorine electrode side, and the potential difference Bcell between the fluorine ion selective electrode 4 and the hydrogen ion selective electrode 3 is measured by the potentiometer 7 and output to the arithmetic unit 8.

演算装置8は前記EcellをA/D変換すると共に該
変換値、およびあらかじめ記憶しているE。
The arithmetic unit 8 performs A/D conversion on the Ecell, and also converts the converted value and the E cell stored in advance.

cellSHFの値と(6)式により、フッ化水素酸濃
度〔HF〕を演算し、該演算値は表示器9により表示さ
れる。
The hydrofluoric acid concentration [HF] is calculated using the cellSHF value and equation (6), and the calculated value is displayed on the display 9.

次に、本発明装置による水素イオンおよびフッ**化水
素酸濃度の測定結果を実施例により示す。
Next, the results of measuring hydrogen ion and hydrofluoric acid concentrations using the apparatus of the present invention will be shown in Examples.

実施例 1 ステンレス酸洗浴より採増した種々の測定溶液の水素イ
オンおよびフッ化水素酸の濃度を、本発明装置および精
密化学分析法により求め、両者測定値を比較した結果を
第1表および第2表に示す。
Example 1 The concentrations of hydrogen ions and hydrofluoric acid in various measurement solutions taken from a stainless steel pickling bath were determined using the device of the present invention and the precision chemical analysis method, and the results of comparing the measured values of both are shown in Table 1 and Table 1. It is shown in Table 2.

第1表および第2表より明かなように、水素イオン濃度
およびフッ化水素酸濃度が±0.2N以内の精度で求め
られることがわかる。
As is clear from Tables 1 and 2, it can be seen that the hydrogen ion concentration and hydrofluoric acid concentration can be determined with an accuracy within ±0.2N.

尚、化学分析法による場合は、水素イオン濃度の測定に
10分、フッ化水素酸濃度の測定に40分を要したのに
対し、本発明装置による場合は水素イオン濃度およびフ
ッ化水素酸濃度を同時に1分以内で測定することができ
た。
In addition, when using the chemical analysis method, it took 10 minutes to measure the hydrogen ion concentration and 40 minutes to measure the hydrofluoric acid concentration, whereas when using the device of the present invention, it took 10 minutes to measure the hydrogen ion concentration and hydrofluoric acid concentration. could be measured simultaneously within 1 minute.

以上の如く、本発明装置によれば、酸浴中の水素イオン
およびフッ化水素酸の濃度を迅速かつ正確に測定するこ
とができ、精度の高い浴管理を行うことができる。
As described above, according to the apparatus of the present invention, the concentrations of hydrogen ions and hydrofluoric acid in an acid bath can be measured quickly and accurately, and highly accurate bath management can be performed.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明装置の模式図で、1は測定溶液、2は基
準電極、3は水素イオン選択性電極、4はフッ素イオン
選択性電極、5は切換スイッチ、6は調節器、7は電位
差計、8は演算器、9は表示器である。 第2図は水素イオン濃度〔H+〕の対数値と、水素イオ
ン選択性電極−基準電極間の電位差BH+との間の関係
を示す直線である。 第3図はフッ素イオン濃度CF−)の対数値と、水素イ
オン選択性電極−フッ素イオン選択性電極間の電位差E
F−との間の関係直線である。
FIG. 1 is a schematic diagram of the apparatus of the present invention, where 1 is a measurement solution, 2 is a reference electrode, 3 is a hydrogen ion selective electrode, 4 is a fluorine ion selective electrode, 5 is a changeover switch, 6 is a regulator, and 7 is a A potentiometer, 8 a computing unit, and 9 a display. FIG. 2 is a straight line showing the relationship between the logarithmic value of the hydrogen ion concentration [H+] and the potential difference BH+ between the hydrogen ion selective electrode and the reference electrode. Figure 3 shows the logarithm of the fluorine ion concentration CF-) and the potential difference E between the hydrogen ion selective electrode and the fluorine ion selective electrode.
This is the relationship straight line between F-.

Claims (1)

【特許請求の範囲】[Claims] 1 測定溶液中lこ設けられた基準電極、水素イオン選
択性電極およびフッ素イオン選択性電極と、前記水素イ
オン選択性電極およびフッ素イオン選択性電極に接続さ
れてそれら電極相互間の電位差のゲインを調節する調節
器と、該調節器を介して前記フッ素イオン選択性電極に
接続された接点および基準電極に直接的に接続された接
点ならびにそれら二つの接点を各別に選択してセットす
る共通接点を有する切換スイッチと、該切換スイッチの
共通接点に接続されると共に前記調節器を介して水素イ
オン選択性電極に接続され、前記切換スイッチの操作に
より前記水素イオン選択性電極基準電極間の電位差と水
素イオン選択性電極−フッ素イオン選択性電極間の電位
差を測定する電位差計と、該電位差計に接続され該電位
差計の出力にもとずいて水素イオン濃度とフッ化水素酸
濃度を演算する演算器と、該演算器に接続され該演算器
の出力にもとすいて水素イオン濃度とフッ化水素酸濃度
の値を表示する表示器とを備えていることを特徴とする
水素イオンおよびフッ化水素酸濃度測定装置。
1. A reference electrode, a hydrogen ion selective electrode and a fluorine ion selective electrode provided in the measurement solution, and a reference electrode connected to the hydrogen ion selective electrode and the fluorine ion selective electrode to determine the gain of the potential difference between these electrodes. A regulator for adjusting, a contact connected to the fluorine ion selective electrode through the regulator, a contact directly connected to the reference electrode, and a common contact for individually selecting and setting these two contacts. a changeover switch having a changeover switch connected to a common contact of the changeover switch and connected to a hydrogen ion selective electrode via the regulator, and operating the changeover switch to change the potential difference between the hydrogen ion selective electrode and the reference electrode. A potentiometer that measures the potential difference between the ion selective electrode and the fluorine ion selective electrode, and a calculator that is connected to the potentiometer and calculates the hydrogen ion concentration and hydrofluoric acid concentration based on the output of the potentiometer. and a display device connected to the computing device and displaying the hydrogen ion concentration and the hydrofluoric acid concentration as well as the output of the computing device. Acid concentration measuring device.
JP53123726A 1978-10-06 1978-10-06 Hydrogen ion and hydrofluoric acid concentration measuring device Expired JPS5827865B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP53123726A JPS5827865B2 (en) 1978-10-06 1978-10-06 Hydrogen ion and hydrofluoric acid concentration measuring device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP53123726A JPS5827865B2 (en) 1978-10-06 1978-10-06 Hydrogen ion and hydrofluoric acid concentration measuring device

Publications (2)

Publication Number Publication Date
JPS5550153A JPS5550153A (en) 1980-04-11
JPS5827865B2 true JPS5827865B2 (en) 1983-06-11

Family

ID=14867835

Family Applications (1)

Application Number Title Priority Date Filing Date
JP53123726A Expired JPS5827865B2 (en) 1978-10-06 1978-10-06 Hydrogen ion and hydrofluoric acid concentration measuring device

Country Status (1)

Country Link
JP (1) JPS5827865B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101661013B (en) 2008-08-27 2013-04-17 华北电力科学研究院有限责任公司 Electrochemical measuring device

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS577550A (en) * 1980-06-16 1982-01-14 Shimadzu Corp Apparatus for measuring ion in solution
JPS58748A (en) * 1981-06-25 1983-01-05 Horiba Ltd Measuring method for concentration of salt

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2356965A1 (en) * 1972-11-16 1974-05-22 Avesta Jernverks Ab PROCEDURE FOR DETERMINING THE CONCENTRATIONS OF HYDROFLUORIC ACID AND HYDROGEN IONS IN Aqueous SOLUTIONS OF STRONG ACIDS AND ELECTRODE FOR CARRYING OUT THE PROCEDURE

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101661013B (en) 2008-08-27 2013-04-17 华北电力科学研究院有限责任公司 Electrochemical measuring device

Also Published As

Publication number Publication date
JPS5550153A (en) 1980-04-11

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