JPS5831522B2 - Himakunoatsumisokuteisouchi - Google Patents
HimakunoatsumisokuteisouchiInfo
- Publication number
- JPS5831522B2 JPS5831522B2 JP50059320A JP5932075A JPS5831522B2 JP S5831522 B2 JPS5831522 B2 JP S5831522B2 JP 50059320 A JP50059320 A JP 50059320A JP 5932075 A JP5932075 A JP 5932075A JP S5831522 B2 JPS5831522 B2 JP S5831522B2
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- coating
- radiation
- intensity
- thickness
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000000576 coating method Methods 0.000 claims description 36
- 239000011248 coating agent Substances 0.000 claims description 34
- 230000005855 radiation Effects 0.000 claims description 33
- 239000000758 substrate Substances 0.000 claims description 33
- 229910000831 Steel Inorganic materials 0.000 description 5
- 239000010959 steel Substances 0.000 description 5
- 238000007747 plating Methods 0.000 description 3
- 238000010586 diagram Methods 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 230000005284 excitation Effects 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
Landscapes
- Analysing Materials By The Use Of Radiation (AREA)
- Length-Measuring Devices Using Wave Or Particle Radiation (AREA)
Description
【発明の詳細な説明】
鋼板に施した鍍金層のような被膜の厚みを測定する場合
にX線その他の放射線が用いられる。DETAILED DESCRIPTION OF THE INVENTION X-rays and other radiation are used to measure the thickness of a coating such as a plating layer applied to a steel plate.
すなわち上記鋼板にX線を照射して、被膜の鍍金層また
は基板の鋼板から発生する螢光X線強度を観測するので
あるが、このような方式によって鋼板等の表裏両面に鍍
金された被膜の厚みをそれぞれ別個に測定する場合に、
従来は2台の装置を用いてその各々を鋼板等の表側と裏
側とに対設しなければならなかった。In other words, the above-mentioned steel plate is irradiated with X-rays and the intensity of fluorescent X-rays generated from the plating layer of the coating or the steel plate of the substrate is observed. When measuring the thickness separately,
Conventionally, two devices had to be used and each device had to be installed on the front side and the back side of a steel plate, etc.
従ってX線管のような放射線源を2つ必要とし、装置が
極めて大型で高価になると共に放射線に対する放課対策
も容易でない等の欠点があった。Therefore, two radiation sources such as X-ray tubes are required, making the device extremely large and expensive, and there are drawbacks such as the difficulty in taking measures against radiation during school hours.
本発明はこのような欠点を除去し、1つの放射線源のみ
を用いて基板の表裏両面における被膜の厚みを同時に測
定し得る装置を提供するものである。The present invention eliminates these drawbacks and provides an apparatus that can simultaneously measure the thickness of a coating on both the front and back surfaces of a substrate using only one radiation source.
第1図は本発明実施例の構成を示す図で、鋼板等の基板
1の表裏両面に亜鉛、錫等の鍍金層よりなる被膜2およ
び3を設けである。FIG. 1 is a diagram showing the structure of an embodiment of the present invention, in which coatings 2 and 3 made of plating layers of zinc, tin, etc. are provided on both the front and back surfaces of a substrate 1 such as a steel plate.
この被膜2゜3の厚みを測定しようとするもので、上記
基板1の表側にX線管あるいはラジオアイソトープのよ
うな放射線源4を対設して該基板に一定強度の放射線r
をほぼ直角に照射し、基板1の裏側に該基板を透過した
放射線の強度を検出する放射線検出器5を設けである。In order to measure the thickness of this coating 2.3, a radiation source 4 such as an X-ray tube or radioisotope is placed opposite to the front side of the substrate 1, and the substrate is exposed to radiation r of a constant intensity.
A radiation detector 5 is provided on the back side of the substrate 1 to detect the intensity of the radiation transmitted through the substrate.
また上記放射線で励起されて被膜2から発生する螢光X
線x1を検出する検出器6を該基板の表側に対設すると
共に被膜3が励起されて発生する螢光X線X2の検出器
7を基板の裏側に対設しである。In addition, fluorescence X generated from the coating 2 by being excited by the radiation
A detector 6 for detecting rays x1 is disposed opposite to the front side of the substrate, and a detector 7 for detecting fluorescent X-rays X2 generated by excitation of the coating 3 is disposed opposite to the back side of the substrate.
上記検出器6の出力を被膜の厚みを表示する表示器8に
加え、また検出器5および7の出力を補正回路9に加え
て、補正された出力を表示器10に加えである。The output of the detector 6 is added to a display 8 which displays the thickness of the coating, the outputs of the detectors 5 and 7 are added to a correction circuit 9, and the corrected output is added to a display 10.
なお上記螢光X線X、 、 X2の波長は放射線rの1
0倍以上であって、放射線rは基板および被膜を比較的
容易に透過するが、螢光X線は基板中でほぼ完全に吸収
されるように放射線rのエネルギを螢光X線より充分大
きく選定しである。The wavelength of the fluorescent X-rays X, , X2 is 1 of the radiation r.
0 times or more, and the radiation r passes through the substrate and coating relatively easily, but the energy of the radiation r is sufficiently greater than that of the fluorescent X-ray so that the fluorescent X-ray is almost completely absorbed in the substrate. It is selected.
上述の装置において、基板1の表面側に放射される螢光
X線X、は第2図aのように放射線rが被膜2を通過す
る間に該被膜が励起されて発生するもので、被膜に入射
する放射線rの強度をIs、被膜2の厚みをtlとする
と検出器6で検出され3螢光X線X、の強度■1は、
I 1= f t (tl) Is ・
”・・・(1)で与えられるが、放射線強度Isは前述
のように一定であるから、この関係は第3図aのように
1本の曲線Pで表わされる。In the above-mentioned apparatus, the fluorescent X-rays X emitted to the surface side of the substrate 1 are generated when the coating 2 is excited while the radiation r passes through the coating 2, as shown in FIG. Let Is be the intensity of the radiation r incident on the film 2, and tl be the thickness of the coating 2, then the intensity 1 of the 3 fluorescent X-rays X detected by the detector 6 is: I 1= f t (tl) Is ・
"...(1) However, since the radiation intensity Is is constant as described above, this relationship is represented by a single curve P as shown in FIG. 3a.
また放射線rは基板1をも励起して螢光X線X1を発生
させるから、その螢光X線を検出して被膜2の厚みtl
を測定することも可能で、この場合は厚みtlと検出器
6による検出強度■1との間に曲線P′のような関係が
ある。Furthermore, since the radiation r also excites the substrate 1 and generates fluorescent X-rays X1, the fluorescent X-rays are detected and the thickness tl of the coating 2 is measured.
In this case, there is a relationship between the thickness tl and the detection intensity 1 by the detector 6 as shown by the curve P'.
従って検出器6の出力を適宜の表示器8に加えて被膜2
の厚みtを表示することができるもので、この測定原理
は従来の装置と同一である。Therefore, the output of the detector 6 is added to an appropriate display 8 and the coating 2
The measurement principle is the same as that of conventional devices.
かつ放射線rは前述のように充分大きいエネルギを有す
るから、基板1を比較的容易に透過して裏面の被膜3を
励起する。In addition, since the radiation r has sufficiently large energy as described above, it passes through the substrate 1 relatively easily and excites the coating 3 on the back surface.
従って第2図すのようにこの被膜3から螢光X線x2が
発生して、検出器7でその強度が検出される。Therefore, as shown in FIG. 2, fluorescent X-rays x2 are generated from this coating 3, and the intensity thereof is detected by the detector 7.
しかしこの場合は基板1および表面の被膜2の厚みが倒
れも不定であるから、被膜3に入射する放射線の強度が
変動する。However, in this case, since the thickness of the substrate 1 and the coating 2 on the surface are not constant, the intensity of the radiation incident on the coating 3 varies.
その放射線が上記被膜3で更に吸収を受けて該被膜を透
過した強度■、が検出器5で検出される。The radiation is further absorbed by the coating 3 and the intensity (2) transmitted through the coating is detected by the detector 5.
被膜3の厚みをt2、検出器7で検出される螢光X線の
強度を■2とすると、
□2=r2(i2) II ・・・・・・・・
(2)の関係がある。If the thickness of the coating 3 is t2, and the intensity of the fluorescent X-rays detected by the detector 7 is ■2, then □2=r2(i2) II...
There is the relationship (2).
第3図すの曲線Q1.Q2・・・・・・は透過放射線の
強度■1をバラメークとしてこの関係を表わしたもので
ある。Curve Q1 in Figure 3. Q2... expresses this relationship with the intensity ■1 of the transmitted radiation as a parameter.
また基板1を透過する放射線で該基板の裏面附近が励起
されて発生する基板の螢光X線x /2を前記検出器7
によって検出することもできる。Further, the fluorescent X-ray x/2 of the substrate generated when the vicinity of the back surface of the substrate is excited by the radiation transmitted through the substrate 1 is detected by the detector 7.
It can also be detected by
その螢光X線強度■2と被膜3の厚みt2との間にも上
記第(2)式の関係が成立して、この場合は透過放射線
強度■、をパラメータとすると曲線Q’+ + Q’2
・・・・・・で表わされる。The relationship of equation (2) above also holds true between the fluorescence X-ray intensity ■2 and the thickness t2 of the coating 3, and in this case, if the transmitted radiation intensity ■ is taken as a parameter, the curve Q'+ + Q '2
It is expressed as...
従って補正回路9により検出器7の出力強度■2と検出
器5の出力強度■、との比を算出して表示器10に加え
ることにより、被膜3の厚みt2を知ることができる。Therefore, by calculating the ratio between the output intensity (2) of the detector 7 and the output intensity (2) of the detector 5 using the correction circuit 9 and adding it to the display 10, the thickness t2 of the coating 3 can be determined.
上述のように本発明は、検出される被膜または基板の螢
光X線より充分大きいエネルギの放射線を該基板に照射
することにより基板の表面における被膜の厚みを測定す
ると同時に該基板を透過する放射線を利用して裏側の被
膜の厚みを測定するものである。As described above, the present invention measures the thickness of a coating on the surface of a substrate by irradiating the substrate with radiation having sufficiently higher energy than the fluorescent X-rays of the coating or substrate to be detected, and at the same time measuring the thickness of the coating on the surface of the substrate. This is used to measure the thickness of the coating on the back side.
すなわち1つの放射線源によっテ基板の表裏両側の被膜
の厚みをそれぞれ別個に測定し得るから装置を小型で安
価に構成し得ると共に特に放射線に対する防護対策が容
易である。That is, since the thickness of the coating on both the front and back sides of the substrate can be measured separately using one radiation source, the apparatus can be constructed in a small size and at low cost, and in particular, protection measures against radiation can be easily taken.
第1図は本発明実施例の構成を示す図、第2図は本発明
の詳細な説明するための第1図の一部を拡大した図、第
3図は本発明の測定原理を説明する曲線である。
なお図において、1は基板、2,3は被膜、4は放射線
源、5は放射線検出器、6,7は螢光X線検出器、8,
10は表示器、9は補正回路である。Fig. 1 is a diagram showing the configuration of an embodiment of the present invention, Fig. 2 is a partially enlarged view of Fig. 1 for explaining the invention in detail, and Fig. 3 is an illustration of the measurement principle of the invention. It is a curve. In the figure, 1 is a substrate, 2 and 3 are coatings, 4 is a radiation source, 5 is a radiation detector, 6 and 7 are fluorescent X-ray detectors, 8,
10 is a display, and 9 is a correction circuit.
Claims (1)
形成された基板にその表面側から上記被膜または基板の
螢光X線より充分大きいエネルギを有する一定強度の放
射線を照射する放射線源と、基板の表面側に放出される
被膜または基板の螢光X線を検出してその強度により基
板の表面側における被膜の厚みを求めるためのX線検出
器と、基板を透過した放射線の強度を検出する放射線検
出器と、基板の裏面側に放出される被膜または基板の螢
光X線を検出してその強度と上記放射線検出器で検出さ
れる透過放射線の強度との比により基板の裏面側におけ
る被膜の厚みを求めるためのX線検出器とよりなること
を特徴とする被膜の厚み測定装置。1. A radiation source that irradiates a substrate with a coating whose thickness is to be measured on both the front and back surfaces of the substrate from the front side with radiation of a constant intensity having sufficiently higher energy than the fluorescent X-rays of the coating or substrate; An X-ray detector that detects the fluorescent X-rays of the coating or substrate emitted to the surface side and determines the thickness of the coating on the surface side of the substrate based on the intensity, and a radiation detector that detects the intensity of the radiation that has passed through the substrate. A detector detects the fluorescent X-rays of the coating or substrate emitted to the back side of the substrate, and determines the intensity of the coating on the back side of the substrate by the ratio of its intensity to the intensity of the transmitted radiation detected by the radiation detector. A coating thickness measuring device characterized by comprising an X-ray detector for determining the thickness.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP50059320A JPS5831522B2 (en) | 1975-05-20 | 1975-05-20 | Himakunoatsumisokuteisouchi |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP50059320A JPS5831522B2 (en) | 1975-05-20 | 1975-05-20 | Himakunoatsumisokuteisouchi |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS51135561A JPS51135561A (en) | 1976-11-24 |
| JPS5831522B2 true JPS5831522B2 (en) | 1983-07-06 |
Family
ID=13109937
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP50059320A Expired JPS5831522B2 (en) | 1975-05-20 | 1975-05-20 | Himakunoatsumisokuteisouchi |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5831522B2 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02109319U (en) * | 1989-02-18 | 1990-08-31 |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5636045A (en) * | 1979-08-31 | 1981-04-09 | Sumitomo Metal Ind Ltd | Quantity determination method for sticking quantity of plating metal and quantity of component in ni-zn alloy-plated steel plate |
| DE10307356A1 (en) * | 2003-02-21 | 2004-09-16 | Sikora Ag | Method and device for determining the thickness of the insulation of a flat cable in areas of the metallic conductor tracks |
-
1975
- 1975-05-20 JP JP50059320A patent/JPS5831522B2/en not_active Expired
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02109319U (en) * | 1989-02-18 | 1990-08-31 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS51135561A (en) | 1976-11-24 |
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