JPS5831799B2 - Manufacturing method of speaker diaphragm - Google Patents
Manufacturing method of speaker diaphragmInfo
- Publication number
- JPS5831799B2 JPS5831799B2 JP9269980A JP9269980A JPS5831799B2 JP S5831799 B2 JPS5831799 B2 JP S5831799B2 JP 9269980 A JP9269980 A JP 9269980A JP 9269980 A JP9269980 A JP 9269980A JP S5831799 B2 JPS5831799 B2 JP S5831799B2
- Authority
- JP
- Japan
- Prior art keywords
- coating layer
- diaphragm
- substrate
- water
- boron
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04R—LOUDSPEAKERS, MICROPHONES, GRAMOPHONE PICK-UPS OR LIKE ACOUSTIC ELECTROMECHANICAL TRANSDUCERS; ELECTRIC HEARING AIDS; PUBLIC ADDRESS SYSTEMS
- H04R7/00—Diaphragms for electromechanical transducers; Cones
- H04R7/02—Diaphragms for electromechanical transducers; Cones characterised by the construction
- H04R7/12—Non-planar diaphragms or cones
- H04R7/127—Non-planar diaphragms or cones dome-shaped
Landscapes
- Engineering & Computer Science (AREA)
- Multimedia (AREA)
- Physics & Mathematics (AREA)
- Acoustics & Sound (AREA)
- Signal Processing (AREA)
- Diaphragms For Electromechanical Transducers (AREA)
Description
【発明の詳細な説明】
本発明はスピーカ用振動板、特にドーム型振動板の製造
方法に関するものである。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method for manufacturing a speaker diaphragm, particularly a dome-shaped diaphragm.
スピーカ用振動板材料としてはヤング率Eが大きく、密
度ρの小さい材料、換言すればE/ρの大きな材料が良
いことは周知である。It is well known that a material with a large Young's modulus E and a small density ρ, in other words, a material with a large E/ρ is good as a material for a diaphragm for a speaker.
このE/ρが大きなものとしてはベリリウム、ボロンが
あるが、これらの材料は、従来から振動板材料として用
いられてきたアルミニウム、チタン等の如く、圧延で薄
板を製作したり、プレスで振動板の形状に成形するとい
うような加工が不可能なために、振動板材料として使用
することが困難であった。Materials with large E/ρ include beryllium and boron, but these materials, like aluminum and titanium, which have traditionally been used as diaphragm materials, can be made into thin plates by rolling or pressed into diaphragms. It has been difficult to use it as a diaphragm material because it cannot be processed into the shape of .
そこで近年上記アルミニウム、チタン等で成形した振動
板基体にベリリウム、ボロン等のE/ρの大きな材料を
真空蒸着、スパッタリング、イオンブレーティング、気
相成長等の適宜手段によって付着させコーティング層を
形成上た多層膜振動板が開発され、かつこれが同一出願
人によって実願昭49−27263号、特願昭49
137760号として出願されている。Therefore, in recent years, a material with a large E/ρ such as beryllium or boron is attached to the diaphragm substrate molded from aluminum, titanium, etc. by an appropriate means such as vacuum evaporation, sputtering, ion blating, or vapor phase growth to form a coating layer. A multilayer membrane diaphragm has been developed, and this has been filed by the same applicant as Utility Model Application No. 49-27263 and Japanese Patent Application No. 137760.
そしてこの振動板は全体としてE/ρが大きいので、特
性の良いスピーカを製作することができた。Since this diaphragm has a large E/ρ as a whole, it was possible to manufacture a speaker with good characteristics.
しかし上記振動板の場合、アルミニウム、チタン等の振
動板基体は、振動板の質量を増加させるだけであって、
全く不要なものであるが、現在この振動板基体を有効に
除去する方法がなかった。However, in the case of the above-mentioned diaphragm, the diaphragm base made of aluminum, titanium, etc. only increases the mass of the diaphragm;
Although completely unnecessary, there is currently no way to effectively remove this diaphragm substrate.
本発明の叙上の点に鑑みて成されたもので、その目的は
、振動板基体とヤング率が大きく密度の小さいコーティ
ング層を簡単な手段によって剥離するスピーカ用振動板
の製造方法を提供するにある。The present invention has been made in view of the above points, and an object thereof is to provide a method for manufacturing a speaker diaphragm in which a coating layer having a large Young's modulus and a low density is separated from a diaphragm substrate by a simple means. It is in.
次に本発明の一実施例を図面と共に説明する。Next, one embodiment of the present invention will be described with reference to the drawings.
1はガラス、石英、シリコン、セラミックもしくは、タ
ングステン、モリブテン、タンタル等の金属をドーム状
に形成した振動板基体にして、その−面にベリリウム、
ボロン等のヤング率が大きく、密度の小さい材料を真空
蒸着、スパッタリング、イオンブレーティング、気相成
長等の適宜手段によって付着されコーティング層2が形
成されている。1 has a diaphragm base made of glass, quartz, silicon, ceramic, or metal such as tungsten, molybdenum, tantalum, etc. in a dome shape, and has beryllium,
The coating layer 2 is formed by depositing a material such as boron, which has a high Young's modulus and a low density, by appropriate means such as vacuum deposition, sputtering, ion blasting, and vapor phase growth.
なお、上記コーティング層2を形成する方法の中、蒸着
手段がコーティングの能率が高く優れている。Note that among the methods for forming the coating layer 2, the vapor deposition method is superior because of its high coating efficiency.
そして蒸着時の加熱方法としては電子ビームによる方法
が最も適している。The most suitable heating method during vapor deposition is a method using an electron beam.
またコーティング層2、特にボロンによるコーティング
層の特性を向上させるためには振動板基体1を加熱する
必要がある。Further, in order to improve the characteristics of the coating layer 2, particularly the boron coating layer, it is necessary to heat the diaphragm substrate 1.
ところでタングステン、モリブテンタンタル等の金属に
よる基体1の温度が300〜650℃では非晶質構造の
膜が得られ、この範囲では蒸着膜の特性、特にヤング率
はあまり高くならない。By the way, when the temperature of the substrate 1 made of metal such as tungsten or molybten-tantalum is 300 to 650 DEG C., a film having an amorphous structure is obtained, and within this range, the characteristics of the deposited film, particularly the Young's modulus, do not become very high.
650〜700℃付近まで温度を上げると、小さな結晶
粒が現われ始めかなり特性が向上するが、バルクに近い
特性を得るには、1000℃近くまで基体1を加熱しな
げればならないが、量産等の問題を考慮すると、700
〜800℃位の加熱が適当である。When the temperature is raised to around 650-700°C, small crystal grains begin to appear and the properties improve considerably, but in order to obtain properties close to those of the bulk, the substrate 1 must be heated to nearly 1000°C, but this is difficult for mass production etc. Considering the problem of 700
Heating to about 800°C is appropriate.
また基体1の加熱は蒸着手段以外の場合にも必要である
。Heating of the substrate 1 is also necessary in cases other than vapor deposition means.
上記手段によって振動板基体1にコーティング層2を形
威したものを、フッ化水素酸等のエツチング液中に浸漬
する。The coating layer 2 formed on the diaphragm base 1 by the above method is immersed in an etching solution such as hydrofluoric acid.
この結果基体1がガラス、石英、シリコン、セラミック
の場合にはコーティング層2の周辺部分が腐食され、ま
た基体1がタングステン、モリブデン、タンタルの場合
には、該基体1とコーティング層20両方の周辺部分が
腐食される。As a result, when the substrate 1 is made of glass, quartz, silicon, or ceramic, the periphery of the coating layer 2 is corroded, and when the substrate 1 is made of tungsten, molybdenum, or tantalum, the periphery of both the substrate 1 and the coating layer 20 is corroded. Parts are corroded.
なお、エツチングは全面に亘って薄く行うこともある。Note that etching may be performed thinly over the entire surface.
次に上記エツチング液にてエツチングしたものを水に浸
し、エツチング部分に水3を浸入させた後、液体窒素中
で上記水3を凍結させる。Next, the material etched with the etching solution is immersed in water to allow water 3 to penetrate into the etched portion, and then the water 3 is frozen in liquid nitrogen.
次に500〜600℃に加熱するが、この加熱によって
基体1とコーティング層2との熱膨張率が相違している
ので、基体1とコーティング層2とは分離され、従って
両者は剥離する。Next, the substrate is heated to 500 to 600° C., but since the thermal expansion coefficients of the substrate 1 and the coating layer 2 are different due to this heating, the substrate 1 and the coating layer 2 are separated, and therefore, both are peeled off.
なお上記において水の凍結と加熱との操作を操り返すこ
とにより、良り確実な分離が行われる。In addition, by re-manipulating the freezing and heating operations of water in the above, a more reliable separation can be performed.
また基体1とコーティング層2との熱膨張係数が大きく
異なる場合、例えば基体1にタングステン、モリブデン
を使用し、コーティング層2にボロンを使用した場合に
は、剥離をより確実に行うことができる。Furthermore, when the coefficients of thermal expansion of the substrate 1 and the coating layer 2 are significantly different, for example, when the substrate 1 is made of tungsten or molybdenum and the coating layer 2 is made of boron, separation can be performed more reliably.
上記において製造されたコーティング層2による振動板
、特にボロンのコーティング層の場合には、該ボロンの
機械的性質が非常にもろいため靭性を持たせる必要があ
る。In the case of the diaphragm using the coating layer 2 manufactured above, especially the boron coating layer, it is necessary to provide toughness because the mechanical properties of boron are very fragile.
そのためには、基体1にボロンのコーティング層2を形
成した後に熱処理を行うか、ボロンにジルコニウム、チ
タン、アルミニウム特を附加すれば良い。For this purpose, heat treatment may be performed after forming the boron coating layer 2 on the substrate 1, or zirconium, titanium, or aluminum may be added to boron.
上記熱処理は1300℃で約5時開校度行うと非常に大
きな効果が得られた。When the above heat treatment was performed at 1300° C. at about 5 o'clock opening time, a very large effect was obtained.
また軟質な上記材料を附加する場合には5〜10%程度
で靭性が大きく改善された。Furthermore, when the above-mentioned soft material was added, the toughness was greatly improved by about 5 to 10%.
なお附加量を30%以上にするとボロンの特性がかなり
弱められ、振動板の特性が悪化する。Note that if the addition amount is 30% or more, the characteristics of boron will be considerably weakened, and the characteristics of the diaphragm will deteriorate.
なお、上記実施例にあってはコーティング層2を振動板
基体1の片面のみに形威し、エツチングおよび凍結膨張
するものを示したが、基体10両面にコーティング層2
を形威し、次いで上記と両じ作業を行えば、一度に2枚
の振動板を得ることができる。In the above embodiment, the coating layer 2 is formed on only one side of the diaphragm base 1 and is etched and freeze-expanded, but the coating layer 2 is formed on both sides of the base 10.
By forming the diaphragm and then performing the same operations as above, two diaphragms can be obtained at once.
また、エツチングを行う時にエツチング液に対し超音波
を加えれば迅速にエツチングを行うことができる。Further, when performing etching, if ultrasonic waves are applied to the etching solution, etching can be performed quickly.
本発明は上記したように振動板基体にヤング率が大きく
、密度の小さな材料をコーティングしコーティング層を
形成し、次いでこれを水に浸漬して基体とコーティング
層との間に水を浸入させ、かつこの水を凍結膨張させ、
次いで加熱して両者の熱膨張率の差によってコーティン
グ層を基体より剥離するものであるから、コーティング
層のみの振動板を容易かつ迅速に製造できる等の効果を
有するものである。As described above, the present invention involves coating a diaphragm substrate with a material having a large Young's modulus and a small density to form a coating layer, and then immersing this in water to allow water to penetrate between the substrate and the coating layer. This water is frozen and expanded,
Since the coating layer is then peeled off from the base by heating due to the difference in coefficient of thermal expansion between the two, it is possible to easily and quickly manufacture a diaphragm made of only the coating layer.
図は本発明に係るスピーカ用振動板の製造方法における
工程を示す図で、第1図は振動板基体にコーティング層
を形成した断面図、第2図は同上の基体とコーティング
層の間に水を浸入させた断面図、第3図は同上より剥離
した後のコーティング層の断面図である。
1・・・・・・振動板基体、2・・・・・・コーティン
グ層、3・・・・・・水。The figures are diagrams showing the steps in the method for manufacturing a speaker diaphragm according to the present invention, in which Fig. 1 is a cross-sectional view of a diaphragm substrate with a coating layer formed thereon, and Fig. 2 is a cross-sectional view of a case where a coating layer is formed on the diaphragm substrate, and Fig. 2 shows water between the same substrate and the coating layer. FIG. 3 is a cross-sectional view of the coating layer after it has been peeled off from the same as above. 1... Vibration plate base, 2... Coating layer, 3... Water.
Claims (1)
ステン、モリブデン、タンタル等の金属でドーム状等の
振動板形状に成形した振動板基体に、ボロン、ベリリウ
ム等のヤング率が大きく、密度の小さな材料のコーティ
ング層を形成し、しかる後にエツチング液で周辺部をエ
ツチングし基体とコーティング層の間に水を浸入させて
、その水を適宜手段によって凍結膨張させ、さらに加熱
して基体とコーティング層の熱膨張率の差で両者を剥離
してコーティング層の振動板を得るスピーカ用振動板の
製造方法。1. A diaphragm base made of glass, quartz, silicon, ceramic, or metal such as tungsten, molybdenum, tantalum, etc. into a diaphragm shape such as a dome, and a coating layer of a material with a high Young's modulus and low density such as boron or beryllium. After that, the peripheral part is etched with an etching solution, water is infiltrated between the substrate and the coating layer, the water is frozen and expanded by an appropriate means, and further heated to change the coefficient of thermal expansion of the substrate and the coating layer. A method of manufacturing a speaker diaphragm in which a diaphragm with a coating layer is obtained by peeling off the two layers based on the difference.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9269980A JPS5831799B2 (en) | 1980-07-09 | 1980-07-09 | Manufacturing method of speaker diaphragm |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9269980A JPS5831799B2 (en) | 1980-07-09 | 1980-07-09 | Manufacturing method of speaker diaphragm |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5635598A JPS5635598A (en) | 1981-04-08 |
| JPS5831799B2 true JPS5831799B2 (en) | 1983-07-08 |
Family
ID=14061734
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP9269980A Expired JPS5831799B2 (en) | 1980-07-09 | 1980-07-09 | Manufacturing method of speaker diaphragm |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5831799B2 (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS58159096A (en) * | 1982-03-16 | 1983-09-21 | Matsushita Electric Ind Co Ltd | Production of speaker diaphragm |
| JPH0385099A (en) * | 1989-08-29 | 1991-04-10 | Kenwood Corp | Diaphragm for speaker and its manufacture |
-
1980
- 1980-07-09 JP JP9269980A patent/JPS5831799B2/en not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5635598A (en) | 1981-04-08 |
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