JPS5844743B2 - Method for producing etched products using photoetching method - Google Patents
Method for producing etched products using photoetching methodInfo
- Publication number
- JPS5844743B2 JPS5844743B2 JP9000576A JP9000576A JPS5844743B2 JP S5844743 B2 JPS5844743 B2 JP S5844743B2 JP 9000576 A JP9000576 A JP 9000576A JP 9000576 A JP9000576 A JP 9000576A JP S5844743 B2 JPS5844743 B2 JP S5844743B2
- Authority
- JP
- Japan
- Prior art keywords
- acid
- metal plate
- etching
- resin composition
- parts
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000000034 method Methods 0.000 title claims description 18
- 238000004519 manufacturing process Methods 0.000 title claims description 9
- 238000001259 photo etching Methods 0.000 title claims description 6
- 239000002253 acid Substances 0.000 claims description 26
- 239000002184 metal Substances 0.000 claims description 26
- 229910052751 metal Inorganic materials 0.000 claims description 26
- 238000005530 etching Methods 0.000 claims description 22
- 239000011342 resin composition Substances 0.000 claims description 19
- 150000001875 compounds Chemical class 0.000 claims description 10
- -1 methacryloyl group Chemical group 0.000 claims description 7
- 125000003647 acryloyl group Chemical group O=C([*])C([H])=C([H])[H] 0.000 claims description 4
- 239000003504 photosensitizing agent Substances 0.000 claims description 3
- 239000000049 pigment Substances 0.000 claims description 3
- 239000000758 substrate Substances 0.000 claims description 3
- 239000004606 Fillers/Extenders Substances 0.000 claims description 2
- 239000010408 film Substances 0.000 claims 1
- 239000010409 thin film Substances 0.000 claims 1
- 239000000047 product Substances 0.000 description 14
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 12
- 229910052802 copper Inorganic materials 0.000 description 12
- 239000010949 copper Substances 0.000 description 12
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 11
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 6
- 239000011248 coating agent Substances 0.000 description 6
- 238000000576 coating method Methods 0.000 description 6
- KWYUFKZDYYNOTN-UHFFFAOYSA-M potassium hydroxide Substances [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 6
- 239000011347 resin Substances 0.000 description 5
- 229920005989 resin Polymers 0.000 description 5
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 4
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 4
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
- 239000002202 Polyethylene glycol Chemical group 0.000 description 3
- 238000007259 addition reaction Methods 0.000 description 3
- 239000012670 alkaline solution Substances 0.000 description 3
- 238000004132 cross linking Methods 0.000 description 3
- 239000003822 epoxy resin Substances 0.000 description 3
- 230000001678 irradiating effect Effects 0.000 description 3
- 229920000647 polyepoxide Polymers 0.000 description 3
- 229920001223 polyethylene glycol Chemical group 0.000 description 3
- 239000000243 solution Substances 0.000 description 3
- 239000000454 talc Substances 0.000 description 3
- 229910052623 talc Inorganic materials 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- 229910001868 water Inorganic materials 0.000 description 3
- FALRKNHUBBKYCC-UHFFFAOYSA-N 2-(chloromethyl)pyridine-3-carbonitrile Chemical compound ClCC1=NC=CC=C1C#N FALRKNHUBBKYCC-UHFFFAOYSA-N 0.000 description 2
- KMNCBSZOIQAUFX-UHFFFAOYSA-N 2-ethoxy-1,2-diphenylethanone Chemical compound C=1C=CC=CC=1C(OCC)C(=O)C1=CC=CC=C1 KMNCBSZOIQAUFX-UHFFFAOYSA-N 0.000 description 2
- BQZJOQXSCSZQPS-UHFFFAOYSA-N 2-methoxy-1,2-diphenylethanone Chemical compound C=1C=CC=CC=1C(OC)C(=O)C1=CC=CC=C1 BQZJOQXSCSZQPS-UHFFFAOYSA-N 0.000 description 2
- VVBLNCFGVYUYGU-UHFFFAOYSA-N 4,4'-Bis(dimethylamino)benzophenone Chemical compound C1=CC(N(C)C)=CC=C1C(=O)C1=CC=C(N(C)C)C=C1 VVBLNCFGVYUYGU-UHFFFAOYSA-N 0.000 description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 2
- 229910019142 PO4 Inorganic materials 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 150000007513 acids Chemical class 0.000 description 2
- ISAOCJYIOMOJEB-UHFFFAOYSA-N benzoin Chemical compound C=1C=CC=CC=1C(O)C(=O)C1=CC=CC=C1 ISAOCJYIOMOJEB-UHFFFAOYSA-N 0.000 description 2
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 2
- 239000007795 chemical reaction product Substances 0.000 description 2
- 238000005260 corrosion Methods 0.000 description 2
- 230000007797 corrosion Effects 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 2
- 229910052753 mercury Inorganic materials 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 2
- 239000010452 phosphate Substances 0.000 description 2
- XNGIFLGASWRNHJ-UHFFFAOYSA-N phthalic acid Chemical compound OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- 238000003860 storage Methods 0.000 description 2
- 229940014800 succinic anhydride Drugs 0.000 description 2
- DLYUQMMRRRQYAE-UHFFFAOYSA-N tetraphosphorus decaoxide Chemical compound O1P(O2)(=O)OP3(=O)OP1(=O)OP2(=O)O3 DLYUQMMRRRQYAE-UHFFFAOYSA-N 0.000 description 2
- ARCGXLSVLAOJQL-UHFFFAOYSA-N trimellitic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C(C(O)=O)=C1 ARCGXLSVLAOJQL-UHFFFAOYSA-N 0.000 description 2
- PMBXCGGQNSVESQ-UHFFFAOYSA-N 1-Hexanethiol Chemical compound CCCCCCS PMBXCGGQNSVESQ-UHFFFAOYSA-N 0.000 description 1
- JAHNSTQSQJOJLO-UHFFFAOYSA-N 2-(3-fluorophenyl)-1h-imidazole Chemical compound FC1=CC=CC(C=2NC=CN=2)=C1 JAHNSTQSQJOJLO-UHFFFAOYSA-N 0.000 description 1
- OMIGHNLMNHATMP-UHFFFAOYSA-N 2-hydroxyethyl prop-2-enoate Chemical compound OCCOC(=O)C=C OMIGHNLMNHATMP-UHFFFAOYSA-N 0.000 description 1
- UDXXYUDJOHIIDZ-UHFFFAOYSA-N 2-phosphonooxyethyl prop-2-enoate Chemical compound OP(O)(=O)OCCOC(=O)C=C UDXXYUDJOHIIDZ-UHFFFAOYSA-N 0.000 description 1
- SKKXTPQPJYBUEF-UHFFFAOYSA-N 3-phosphonooxypropyl prop-2-enoate Chemical compound OP(O)(=O)OCCCOC(=O)C=C SKKXTPQPJYBUEF-UHFFFAOYSA-N 0.000 description 1
- 239000004925 Acrylic resin Substances 0.000 description 1
- 229920000178 Acrylic resin Polymers 0.000 description 1
- 229910000881 Cu alloy Inorganic materials 0.000 description 1
- 102000016942 Elastin Human genes 0.000 description 1
- 108010014258 Elastin Proteins 0.000 description 1
- BRLQWZUYTZBJKN-UHFFFAOYSA-N Epichlorohydrin Chemical compound ClCC1CO1 BRLQWZUYTZBJKN-UHFFFAOYSA-N 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- 229910021578 Iron(III) chloride Inorganic materials 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 1
- 244000028419 Styrax benzoin Species 0.000 description 1
- 235000000126 Styrax benzoin Nutrition 0.000 description 1
- 235000008411 Sumatra benzointree Nutrition 0.000 description 1
- ZJCCRDAZUWHFQH-UHFFFAOYSA-N Trimethylolpropane Chemical compound CCC(CO)(CO)CO ZJCCRDAZUWHFQH-UHFFFAOYSA-N 0.000 description 1
- 150000008065 acid anhydrides Chemical class 0.000 description 1
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 238000003915 air pollution Methods 0.000 description 1
- 125000002947 alkylene group Chemical group 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 150000008064 anhydrides Chemical class 0.000 description 1
- 229910052788 barium Inorganic materials 0.000 description 1
- DSAJWYNOEDNPEQ-UHFFFAOYSA-N barium atom Chemical compound [Ba] DSAJWYNOEDNPEQ-UHFFFAOYSA-N 0.000 description 1
- AYJRCSIUFZENHW-DEQYMQKBSA-L barium(2+);oxomethanediolate Chemical compound [Ba+2].[O-][14C]([O-])=O AYJRCSIUFZENHW-DEQYMQKBSA-L 0.000 description 1
- 229960002130 benzoin Drugs 0.000 description 1
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 1
- 239000012965 benzophenone Substances 0.000 description 1
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 1
- 239000004327 boric acid Substances 0.000 description 1
- WERYXYBDKMZEQL-UHFFFAOYSA-N butane-1,4-diol Chemical compound OCCCCO WERYXYBDKMZEQL-UHFFFAOYSA-N 0.000 description 1
- 239000004927 clay Substances 0.000 description 1
- 229910052570 clay Inorganic materials 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 239000007859 condensation product Substances 0.000 description 1
- XCJYREBRNVKWGJ-UHFFFAOYSA-N copper(II) phthalocyanine Chemical compound [Cu+2].C12=CC=CC=C2C(N=C2[N-]C(C3=CC=CC=C32)=N2)=NC1=NC([C]1C=CC=CC1=1)=NC=1N=C1[C]3C=CC=CC3=C2[N-]1 XCJYREBRNVKWGJ-UHFFFAOYSA-N 0.000 description 1
- IFDVQVHZEKPUSC-UHFFFAOYSA-N cyclohex-3-ene-1,2-dicarboxylic acid Chemical compound OC(=O)C1CCC=CC1C(O)=O IFDVQVHZEKPUSC-UHFFFAOYSA-N 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 239000000975 dye Substances 0.000 description 1
- 229920002549 elastin Polymers 0.000 description 1
- ZIFBQDDDTRMSDJ-UHFFFAOYSA-N furan-2-yl prop-2-enoate Chemical compound C=CC(=O)OC1=CC=CO1 ZIFBQDDDTRMSDJ-UHFFFAOYSA-N 0.000 description 1
- 125000003827 glycol group Chemical group 0.000 description 1
- 238000007646 gravure printing Methods 0.000 description 1
- 235000019382 gum benzoic Nutrition 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 150000002505 iron Chemical class 0.000 description 1
- RBTARNINKXHZNM-UHFFFAOYSA-K iron trichloride Chemical compound Cl[Fe](Cl)Cl RBTARNINKXHZNM-UHFFFAOYSA-K 0.000 description 1
- 238000004898 kneading Methods 0.000 description 1
- 229910000833 kovar Inorganic materials 0.000 description 1
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 1
- 239000011976 maleic acid Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- LVHBHZANLOWSRM-UHFFFAOYSA-N methylenebutanedioic acid Natural products OC(=O)CC(=C)C(O)=O LVHBHZANLOWSRM-UHFFFAOYSA-N 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 229910000889 permalloy Inorganic materials 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920000137 polyphosphoric acid Polymers 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 238000007639 printing Methods 0.000 description 1
- 238000007650 screen-printing Methods 0.000 description 1
- 238000004062 sedimentation Methods 0.000 description 1
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 150000003512 tertiary amines Chemical class 0.000 description 1
- 125000003718 tetrahydrofuranyl group Chemical group 0.000 description 1
- UFDHBDMSHIXOKF-UHFFFAOYSA-N tetrahydrophthalic acid Natural products OC(=O)C1=C(C(O)=O)CCCC1 UFDHBDMSHIXOKF-UHFFFAOYSA-N 0.000 description 1
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 1
Landscapes
- ing And Chemical Polishing (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Description
【発明の詳細な説明】
本発明は金属板の面上に、紫外線を照射せしめることに
よって硬化しうる樹脂組成物を塗布し、紫外線を照射せ
しめ所望形状の硬化被膜を形成した後、エツチング処理
を施すことを特徴とする食刻製品の製造方法に関する。DETAILED DESCRIPTION OF THE INVENTION The present invention involves coating a metal plate with a resin composition that can be cured by irradiating it with ultraviolet rays, irradiating it with ultraviolet rays to form a cured film in a desired shape, and then performing an etching treatment. The present invention relates to a method for producing an engraved product.
一般に食刻製品の製造は、金属板上に所望形状の被膜を
形成せしめた後、エツチング処理を施し被膜の形成され
ていない金属板部分を腐食除去し、不要な硬化被膜部分
を後にアルカリ溶液で溶解除去することによって行なわ
れている。Generally, in the production of etched products, a coating of the desired shape is formed on a metal plate, and then an etching process is performed to remove the parts of the metal plate where the coating is not formed, and the unnecessary hardened coating parts are then etched with an alkaline solution. This is done by dissolving and removing.
従来開発されてきたホトエツチング法に利用しうる樹脂
は樹脂被膜の金属板への密着性が十分ではなく、エツチ
ング処理の際、被膜が剥離するなどの現象が生じ食刻を
要しない部分までも金属板面が食刻される場合があり必
ずしも所望とする食刻製品を得ることが困難であった。The adhesion of the resin coating to the metal plate of the resins that can be used in the conventionally developed photoetching method is not sufficient, and during the etching process, phenomena such as peeling of the coating occur, resulting in the metal being damaged even in areas that do not require etching. In some cases, the plate surface is etched, making it difficult to obtain a desired etched product.
そこで本発明者らは、かかる問題点を改善する手法とし
て被膜の乾燥手段として紫外線照射法を利用することを
考え検討を進めたところ、不飽和酸を特定量含む無溶剤
型のアクリル系樹脂組成物を用いた場合紫外線照射によ
って速やかに乾燥硬化し、形成された硬化被膜の金属板
への密着性が良好でエツチング処理時における上述した
如き不都合が起りに<<、シかもエツチング処理後剥離
することが必要な硬化被膜部のアルカリ溶液による除膜
が容易であるなどの特徴があり、より優れた食刻製品が
製造できることを見出し本発明を完成した。Therefore, the present inventors considered and investigated the use of ultraviolet irradiation as a means of drying the film as a method to improve this problem, and found that a solvent-free acrylic resin composition containing a specific amount of unsaturated acid. When a material is used, it quickly dries and hardens when exposed to ultraviolet rays, and the formed cured film has good adhesion to the metal plate, causing the above-mentioned problems during the etching process, and may peel off after the etching process. The present invention was completed based on the discovery that it is possible to manufacture a more excellent engraved product by easily removing the cured film using an alkaline solution.
本発明の要旨とするところは、金属板の面上に分子量が
200〜2000で1分子中にアクリロイル基又はメタ
クリロイル基を1個以上有し、かつ酸価が30〜300
KOH■数/gなる不飽和酸A5〜75重量%と他の
架橋重合性不飽和化合物B95〜25重量%及び光増感
剤とよりなる樹脂組成物を塗布せしめ、紫外線を照射す
ることによって所望形状の硬化被膜を形成せしめた後、
酸によるエツチング処理を施すことによって不要金属板
面を腐食除去することを特徴とするホトエツチング法に
よる食刻製品の製造方法にある。The gist of the present invention is that the metal plate has a molecular weight of 200 to 2000, one or more acryloyl group or methacryloyl group per molecule, and an acid value of 30 to 300.
A resin composition consisting of 5 to 75% by weight of an unsaturated acid A of KOH/g, 95 to 25% by weight of another crosslinking polymerizable unsaturated compound B, and a photosensitizer is coated, and the desired amount is irradiated with ultraviolet rays. After forming a shaped hardened film,
A method for producing an etched product by a photo-etching method, characterized in that unnecessary metal plate surfaces are corroded and removed by etching with acid.
本発明を実施する際に用いる樹脂組放物の構成成分であ
る不飽和酸Aは分子量が200〜2000なる範囲であ
ることが必要である。The unsaturated acid A, which is a component of the resin assembly used in carrying out the present invention, needs to have a molecular weight in the range of 200 to 2,000.
分子量が200よりも小さい不飽和酸を用いて、形成さ
れる硬化被膜は金属板への密着性が不足し、耐エツチン
グ液性に劣り、一方分子量が2000よりも大きい不飽
和酸を用いて得られる樹脂組放物は粘度が極端に高くな
り作業性に支障をきたすと共に、所望形状の硬化皮膜の
形成が難しいので好しくない。When an unsaturated acid with a molecular weight smaller than 200 is used, the cured film formed has insufficient adhesion to the metal plate and has poor etching resistance. The resulting resin composition is not preferred because it has an extremely high viscosity, which impedes workability, and it is difficult to form a cured film in the desired shape.
また不飽和酸の酸価は30〜300KOH■数/gであ
ることが必要であり、酸価が30よりも小さな不飽和酸
を用いて形成された硬化被膜は金属板への密着性ならび
にエツチング処理時の金属のエツチング性が低下する傾
向があり好しくない。In addition, the acid value of the unsaturated acid must be 30 to 300 KOH/g, and a cured film formed using an unsaturated acid with an acid value lower than 30 has poor adhesion to metal plates and etching. This is not preferable because it tends to reduce the etching properties of the metal during processing.
方酸価が300よりも大きい不飽和酸を用いて得られる
樹脂組放物は貯蔵安定性が不良であり、しかも硬化被膜
の耐エツチング液性が劣り、金属のエツチング性が低下
するので好しくない。Resin compositions obtained using unsaturated acids with a boric acid value higher than 300 have poor storage stability, and furthermore, the resistance of the cured film to etching liquids is poor, and the etching properties of metals are reduced, so these are not preferred. do not have.
本発明で用いる不飽和酸中にはアクリロイル基またはメ
タクリロイル基を1個以上なる割合で含むことが必要で
あり、このような化合物でないと本発明の方法によって
乾燥した硬化被膜を形成することができない。The unsaturated acid used in the present invention must contain at least one acryloyl group or methacryloyl group, and unless such a compound is present, a dried cured film cannot be formed by the method of the present invention. .
本発明を実施するに際して用いる不飽和酸の具体例とし
ては一般式
%式%
(式中R1はH又はCH3,R2はC1〜、。Specific examples of unsaturated acids used in carrying out the present invention include the general formula % (wherein R1 is H or CH3, and R2 is C1~).
のアルキレン基又は繰返し単位10個以下のポリエチレ
ングリコール残基又はポリプロプレンゲリコール残基、
R3は−CH2CH2−、、−CH=CH−沙
\/
C−CH2−2登
ミ=≦ ≧7≦ C00H
dけ
より選ばれた基を示九)
で表わされる化合物類であり、これらの化合物はヒドロ
キシアルキルアクリレート又はメタクリレートとコハク
酸、フマル酸、イタコン酸、マレイン酸、フタル酸、テ
トラヒドロフタル酸、トリメリット酸又はこれらの無水
物とを反応せしめることによって製造できる。an alkylene group or a polyethylene glycol residue or a polypropylene gelicol residue having 10 or less repeating units,
R3 is -CH2CH2-, -CH=CH-sha
\/ C-CH2-2 = ≦ ≧ 7 ≦ C00H (indicates a group selected from It can be produced by reacting itaconic acid, maleic acid, phthalic acid, tetrahydrophthalic acid, trimellitic acid, or anhydrides thereof.
また他の型の不飽和酸AとはビスフェノールAとエピク
ロルヒドリンとの縮合物であるエポキシ化合物とアクリ
ル酸又はメタクリル酸とを付加反応せしめて得たジアク
リロイル又はメタクリロイル化合物中に含まれる水酸基
に対し
で表わされる酸無水物を付カロ反応せしめることによっ
て製造される化合物類、或いはヒドロキシアルキルアク
リレート又はメタクリレートと無水リン酸、ポリリン酸
との付加反応物であるアクリロイルオキシアルキルフォ
スフェート又はメタクリロイルオキシアルキルフォスフ
ェートである。Another type of unsaturated acid A refers to a hydroxyl group contained in a diacryloyl or methacryloyl compound obtained by addition-reacting an epoxy compound, which is a condensation product of bisphenol A and epichlorohydrin, with acrylic acid or methacrylic acid. Compounds produced by the addition reaction of the represented acid anhydrides, or acryloyloxyalkyl phosphate or methacryloyloxyalkyl phosphate, which is an addition reaction product of hydroxyalkyl acrylate or methacrylate and phosphoric anhydride or polyphosphoric acid. be.
本発明を実施する際に不飽和酸Aと共に用いる他の架橋
重合性不飽和化合物とは紫外線の照射により架橋硬化し
た乾燥被膜を形成しうる化合物類であり、とくに分子中
に少なくとも1個のアクリロイル基又はメタクリロイル
基を有する化合物類であり、その具体例としては次の如
きものを挙げることができる。Other cross-linking polymerizable unsaturated compounds used together with unsaturated acid A in carrying out the present invention are compounds that can form a dry film that is cross-linked and cured by irradiation with ultraviolet rays, and in particular contain at least one acryloyl group in the molecule. or methacryloyl group, and specific examples thereof include the following.
(I) ポリエキシ化合物の(メタ)アクリル酸付加
反応物
(n) 多官能ポリエステルアクリレート類(ト)多
官能七ツマー類及びモノアクリレート類例えば
ポリエチレングリコールジ(メタ)アクリレート、ポリ
エチレングリコールジ(メタ)アクリレート、
1.4−ブタンジオールジ(メタ)アクリレート、1,
6−ヘキサンシオールジ(メタ)アクリレート、トリメ
チロールプロパントリ(メタ)アクリレート、
2−ヒドロキシプロピル(メタ)アクリレート、カルピ
トール(メタ)アクリレート、テトラヒドロフルフリル
(メタ)アクリレート等である。(I) (Meth)acrylic acid addition reaction products of polyexyl compounds (n) Polyfunctional polyester acrylates (G) Polyfunctional heptadumers and monoacrylates such as polyethylene glycol di(meth)acrylate, polyethylene glycol di(meth)acrylate , 1.4-butanediol di(meth)acrylate, 1,
These include 6-hexanethiol di(meth)acrylate, trimethylolpropane tri(meth)acrylate, 2-hydroxypropyl(meth)acrylate, carpitol(meth)acrylate, and tetrahydrofurfuryl(meth)acrylate.
本発明を実施するに際しては前記不飽和酸A5〜75重
量%と前記架橋重合性不飽和化合物895〜25重量%
の割合で配合された樹脂組成物が用いられ、不飽和酸を
5重量%以下含む樹脂組成物を用いて形成される硬化被
膜は金属板への密着性が不足し、エツチング処理特性が
低下するので好ましくなく、また75重量%以上となる
と樹脂組成物の貯蔵安定性が低下するので好ましくない
0
本発明を実施するに際しては前記樹脂組成物にベンゾイ
ン、ベンゾインメチルエーテル、ベンゾインエチルエー
テル、ベンゾフェノン、ミヒラーズケトン、ジェトキシ
アセトフェン等の光増感剤を1〜10重量%の範囲で添
加して波長200〜800n71L好ましくは250〜
4501mの近紫外線を照射せしめればよい。When carrying out the present invention, the unsaturated acid A is 5 to 75% by weight and the crosslinking polymerizable unsaturated compound is 895 to 25% by weight.
A cured film formed using a resin composition containing 5% by weight or less of an unsaturated acid has insufficient adhesion to the metal plate and has poor etching properties. If it exceeds 75% by weight, the storage stability of the resin composition decreases, which is undesirable. When carrying out the present invention, benzoin, benzoin methyl ether, benzoin ethyl ether, benzophenone, and Michler's ketone are added to the resin composition. , a photosensitizer such as jetoxyacetophene is added in a range of 1 to 10% by weight to obtain a wavelength of 200 to 800n71L, preferably 250 to 71L.
It is sufficient to irradiate near ultraviolet rays of 4501 m.
また本発明の樹脂組成物はそのままでも使用できるが、
必要に応じて顔料、染料などその他の適宜の添カロ物を
添加して用いることもできるが、本発明の目的を更に効
率よ〈実施するには顔料として体質顔料、例えば、パラ
イト粉、沈降性硫酸、バリウム、炭酸バリウム、クレー
、シリカ粉、微粒ケイ酸、タルクなどを樹脂組成物中に
70重量%以下なる割合で加えることが好ましい。Furthermore, the resin composition of the present invention can be used as it is, but
Other appropriate additives such as pigments and dyes may be added and used as needed, but in order to achieve the purpose of the present invention more efficiently, extender pigments such as pallite powder, sedimentation It is preferable to add sulfuric acid, barium, barium carbonate, clay, silica powder, fine silicic acid, talc, etc. to the resin composition in a proportion of 70% by weight or less.
本発明の食刻製品の製造は、絶縁基板に金属板として銅
、銅合金、コバール、パーマロイ等の金属薄膜を設けて
なる金属積層板の金属板面上に前記樹脂組成物をスクリ
ーン印刷機あるいはグラビア印刷機により所望形状に印
刷し、紫外線を照射して硬化被膜を形成せしめるか、あ
るいは金属板面上に前記樹脂組放物を施し、紫外線を所
望形状に遮断するマスクを介し、紫外線を照射し未硬化
樹脂部分を除去して、硬化被膜を形成せしめた後、エツ
チング液として、例えば硝酸、塩酸、塩化第2鉄などの
酸浴、液によってエツチング処理を行ない、硬化被膜で
覆われていない部分の金属板を腐食除去し、この後不要
となった硬化被膜部はpH9以上のアルカリ溶液たとえ
ばNaOH,KOH,アンモニア、第1〜第3級アミン
類の水または水溶性有機溶媒溶液で溶解除去することに
よって食刻製品を得ることができ硬化被膜除去部は更に
メッキを施したりして保護することもできる。The production of the engraved product of the present invention involves printing the resin composition on the metal plate surface of a metal laminate, which is formed by providing a thin metal film of copper, copper alloy, Kovar, permalloy, etc., on an insulating substrate as a metal plate using a screen printing machine or Either print the desired shape using a gravure printing machine and irradiate it with ultraviolet rays to form a cured film, or apply the resin composition on the metal plate surface and irradiate it with ultraviolet rays through a mask that blocks ultraviolet rays into the desired shape. After removing the uncured resin portion and forming a hardened film, etching is performed using an acid bath or liquid such as nitric acid, hydrochloric acid, or ferric chloride as an etching solution to remove the parts that are not covered with the hardened film. Corrosion is removed from the metal plate, and the hardened film that is no longer needed is removed by dissolving it in an alkaline solution with a pH of 9 or higher, such as NaOH, KOH, ammonia, water or a water-soluble organic solvent solution of primary to tertiary amines. By doing so, an etched product can be obtained, and the portion from which the hardened film has been removed can be further protected by plating.
本発明で用いる樹脂組放物は無溶剤型であるため、硬化
被膜を形成する過程において、大気汚染の懸念がなく、
また紫外線照射法である゛ので基板の熱変形もなく、迅
速に乾燥硬化でき、形成された硬化被膜は金属板との密
着性ならびにエツチング処理時の金属のエツチング性が
良好であり、しかもエツチング処理後剥離することが必
要な硬化被膜部の除膜が容易であり、このような硬化被
膜を形成された金属板をエツチング処理することにより
優れた食刻製品を得ることができその工業的価値は極め
て犬である。Since the resin compound used in the present invention is solvent-free, there is no concern about air pollution during the process of forming a cured film.
In addition, since it is an ultraviolet irradiation method, there is no thermal deformation of the substrate, and it can be dried and cured quickly.The formed cured film has good adhesion to the metal plate and good etching properties of the metal during the etching process. It is easy to remove the hardened film that requires post-peeling, and by etching a metal plate on which such a hardened film is formed, an excellent etched product can be obtained, and its industrial value is high. Very dog-like.
以下本発明を実施例を用いてさらに詳しく説明する。The present invention will be explained in more detail below using Examples.
尚実施例中部とあるのは重量部の意である。Note that "Example Middle" means parts by weight.
実施例 1
アクリル酸2−ヒドロキシエチルに無水コハク酸をma
t、=て得た不飽和酸(酸価260KOH■数/、?)
30部、アクリロイルオキシエチルフォスフェート(酸
価265 KOH■数/g)10部、エポキシ樹脂(シ
ョウダイン508、昭和電工社製)のアクリル酸付加物
40部、アクリル酸カルピトール20部からなる樹脂組
成物を得た。Example 1 Adding succinic anhydride to 2-hydroxyethyl acrylate
t, = unsaturated acid obtained (acid value 260KOH■number/?)
30 parts, 10 parts of acryloyloxyethyl phosphate (acid value 265 KOH/g), 40 parts of acrylic acid adduct of epoxy resin (Shodyne 508, manufactured by Showa Denko), and 20 parts of carpitol acrylate. I got something.
この樹脂組成物100部に対しベンゾインメチルエーテ
ル5部、タルク30部、フタロシアニンブルー2部を混
練することによってインキ■を得た。Ink (2) was obtained by kneading 100 parts of this resin composition with 5 parts of benzoin methyl ether, 30 parts of talc, and 2 parts of phthalocyanine blue.
該インキ■を250メツシユのスクリーン印刷機を用い
、銅積層板に所望形状に印刷し、次いで80W/crf
Lの高圧水銀ランプを用い紫外線を8秒間照射して、イ
ンキ被膜を完全に硬化させた。The ink (2) was printed in the desired shape on a copper laminate board using a 250 mesh screen printer, and then 80W/crf
The ink film was completely cured by irradiating it with ultraviolet rays for 8 seconds using an L high-pressure mercury lamp.
この硬化インキ被膜を形成せしめた銅積層板を塩化第2
鉄の飽和水に24時間浸漬し、硬化インキ被膜で覆われ
ていない部分の銅板を腐食除去し、さらに不要となった
硬化インキ被膜部をpH9,5のNaOH溶液で溶解除
去することにより、食刻製品を得た。The copper laminate on which this cured ink film was formed was treated with dichloromethane.
The copper plate is immersed in saturated iron water for 24 hours to corrode and remove the portions of the copper plate that are not covered with the hardened ink film, and then the unnecessary hardened ink film is dissolved and removed using a NaOH solution with a pH of 9.5. I got a carved product.
上記手法により銅積層板の面上に形成された硬化インキ
被膜は付表−1に示したように優れた特性を有している
ため精度の高い食刻製品を得ることができた。The cured ink film formed on the surface of the copper laminate by the above method had excellent properties as shown in Appendix Table 1, making it possible to obtain highly accurate etched products.
比較例 1
実施例1の樹脂組成物の構成成分のうち不飽和酸である
アクリル酸2−ヒドロキシエチルの無水コハク酸付加物
とアクリロイルオキシエチルフオスフエートを用いない
で、エポキシ樹脂(ショウダイン508、昭和電工社製
)のアクリル酸付加物を70部、アクリル酸カルピトー
ル30部からなる樹脂組放物を用いて、実施例1と同様
にしてインキ■を得た。Comparative Example 1 An epoxy resin (Shodine 508 Ink (2) was obtained in the same manner as in Example 1 using a resin composition consisting of 70 parts of an acrylic acid adduct (manufactured by Showa Denko Co., Ltd.) and 30 parts of carpitol acrylate.
このインキ■を用い実施例1と同様にして銅積層板面上
に硬化インキ被膜を形成させ、エラチン申*グ処理を行
ない不要となった硬化被膜部を除去することにより食刻
製品を得た。A cured ink film was formed on the surface of the copper laminate board using this ink (2) in the same manner as in Example 1, and an etched product was obtained by removing the unnecessary hardened film portion by performing an elastin* treatment. .
上記手法により銅積層板の面上に形成された硬化インキ
被膜は付表−1に示したように、不飽和酸を含む樹脂組
成物を用いたインキ■の場合に比較して硬化被膜特性が
大巾に劣っており良好な食刻製品を得ることができなか
った。As shown in Appendix Table 1, the cured ink film formed on the surface of the copper laminate by the above method has greater properties than the ink (■) using a resin composition containing an unsaturated acid. The width was poor and it was not possible to obtain a good etched product.
実施例 2
エポキシ樹脂(ショウダイン729、昭和電工社製)の
アクリル酸付加物680部に無水コハク酸ioo部を付
加して得られる不飽和酸50部、アクリロイルオキシプ
ロピルフォスフェート10部、テトラヒドロフルフリル
アクリレート20部、カルピトールアクリレート20部
からなる樹脂組成物を得た。Example 2 50 parts of unsaturated acid obtained by adding ioo parts of succinic anhydride to 680 parts of acrylic acid adduct of epoxy resin (Shodyne 729, manufactured by Showa Denko), 10 parts of acryloyloxypropyl phosphate, and tetrahydrofuryl A resin composition consisting of 20 parts of furyl acrylate and 20 parts of carpitol acrylate was obtained.
この樹脂組成物100部に対しベンゾインエチルエーテ
ルを6部、タルク20部を添加した。6 parts of benzoin ethyl ether and 20 parts of talc were added to 100 parts of this resin composition.
この樹脂組成物を銅積層板の面上に塗布し、この上に所
望形状を有するネガフィルムを重ねて、次いで80W/
C1rLの高圧水銀ランプを用い紫外線を30秒間照射
し露光した。This resin composition was applied onto the surface of a copper laminate, a negative film having a desired shape was overlaid thereon, and then 80W/
Ultraviolet rays were irradiated and exposed for 30 seconds using a C1rL high-pressure mercury lamp.
その後未露光部分を水で洗い落して、ネガフィルムに忠
実な硬化被膜を形成せしめた。Thereafter, the unexposed areas were washed away with water to form a cured film faithful to the negative film.
その後実施例1と同様にしてエツチング処理を行ない、
硬化被膜で覆われていない部分の銅を腐食除去し、不要
となった硬化被膜部を除去して食刻製品を得た。Thereafter, etching treatment was performed in the same manner as in Example 1,
The copper in the areas not covered with the hardened film was removed by corrosion, and the unnecessary hardened film was removed to obtain an engraved product.
上記手法によって銅積層板の面上に形成された硬化被膜
は密着性及びエツチング処理時の銅エツチング性が優れ
ており、微細構造部迄十分食刻された食刻製品が得られ
た。The cured film formed on the surface of the copper laminate by the above method had excellent adhesion and copper etching properties during etching treatment, and an etched product was obtained in which the fine structure was sufficiently etched.
Claims (1)
子中にアクリロイル基又はメタクリロイル基を1個以上
有し、かつ酸価が30〜300KOH1rI9数1gな
る不飽和酸A5〜75重量%と他の架橋重合性不飽和化
合物B95〜25重量%及び光増感剤とよりなる樹脂組
成物を塗布し、紫外線を照射せしめて所望形状の硬化被
膜を形成せしめた後、酸によるエツチング処理を施すこ
とによって不要金属板面を腐食除去することを特徴とす
るホトエツチング法による食刻製品の製造方法。 2 金属板面が絶縁基板の上に金属薄膜を設けたもので
あることを特徴とする特許請求の範囲第1項記載のホト
エツチング法によるプリント配線板用食刻製品の製造方
法。 3 樹脂組成物として体質顔料を含むものを用いること
を特徴とする特許請求の範囲第1項記載のホトエツチン
グ法によるプリント配線板用食刻製品の製造方法。[Scope of Claims] 1 Unsaturated acid A5 having a molecular weight of 200 to 2000, having one or more acryloyl group or methacryloyl group in one molecule, and having an acid value of 30 to 300 KOH1rI9 several 1 g on the surface of the metal plate. A resin composition consisting of ~75% by weight, 95% to 25% by weight of other cross-linked polymerizable unsaturated compound B, and a photosensitizer is applied, and after irradiation with ultraviolet rays to form a cured film in the desired shape, acid 1. A method for producing an etched product using a photo-etching method, characterized in that unnecessary metal plate surfaces are corroded and removed by etching. 2. A method for producing an etched product for a printed wiring board by a photoetching method according to claim 1, wherein the metal plate surface is a metal thin film provided on an insulating substrate. 3. A method for producing an etched product for a printed wiring board by a photoetching method according to claim 1, characterized in that a resin composition containing an extender pigment is used.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9000576A JPS5844743B2 (en) | 1976-07-28 | 1976-07-28 | Method for producing etched products using photoetching method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9000576A JPS5844743B2 (en) | 1976-07-28 | 1976-07-28 | Method for producing etched products using photoetching method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5315233A JPS5315233A (en) | 1978-02-10 |
| JPS5844743B2 true JPS5844743B2 (en) | 1983-10-05 |
Family
ID=13986492
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP9000576A Expired JPS5844743B2 (en) | 1976-07-28 | 1976-07-28 | Method for producing etched products using photoetching method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5844743B2 (en) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5569262A (en) * | 1978-11-14 | 1980-05-24 | Susumu Yamada | Manufacture of name plate made of metal sheet |
| JPS5785050A (en) * | 1980-11-18 | 1982-05-27 | Mitsui Toatsu Chem Inc | Pattern forming composition |
| DE3404366A1 (en) * | 1984-02-08 | 1985-08-14 | Hoechst Ag, 6230 Frankfurt | LIGHT SENSITIVE MIXTURE BASED ON A DIAZONIUM SALT POLYCONDENSATION PRODUCT AND LIGHT SENSITIVE RECORDING MATERIAL MADE THEREOF |
| US4980264A (en) * | 1985-12-17 | 1990-12-25 | International Business Machines Corporation | Photoresist compositions of controlled dissolution rate in alkaline developers |
| JP3700869B2 (en) * | 1995-09-30 | 2005-09-28 | マスプロ電工株式会社 | Turnout |
-
1976
- 1976-07-28 JP JP9000576A patent/JPS5844743B2/en not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5315233A (en) | 1978-02-10 |
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