JPS5945237B2 - Method for forming circuit elements using photoetching method - Google Patents
Method for forming circuit elements using photoetching methodInfo
- Publication number
- JPS5945237B2 JPS5945237B2 JP51090446A JP9044676A JPS5945237B2 JP S5945237 B2 JPS5945237 B2 JP S5945237B2 JP 51090446 A JP51090446 A JP 51090446A JP 9044676 A JP9044676 A JP 9044676A JP S5945237 B2 JPS5945237 B2 JP S5945237B2
- Authority
- JP
- Japan
- Prior art keywords
- acid
- metal plate
- resin composition
- parts
- cured film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Manufacturing Of Printed Wiring (AREA)
Description
【発明の詳細な説明】
本発明は金属板の面上に、紫外線を照射することによつ
て硬化しうる樹脂組成物を塗布し、紫外線を照射せしめ
所望形状の硬化被膜を形成した後、金属板の露出面にメ
ッキ処理を施して回路素子を形成し、かつ硬化被膜を取
除いた後この部分の金属板層をエッチング処理すること
を特徴とする回路素子の形成方法に関する。DETAILED DESCRIPTION OF THE INVENTION The present invention involves applying a resin composition that can be cured by irradiating ultraviolet rays onto the surface of a metal plate, irradiating it with ultraviolet rays to form a cured film in a desired shape, and then applying the resin composition to the surface of the metal plate. The present invention relates to a method for forming a circuit element, which comprises plating the exposed surface of a plate to form a circuit element, and after removing a hardened film, etching the metal plate layer in this area.
本発明者らは、従来のホトエッチング法による回路素子
の形成方法において、紫外線により架橋硬化しうる樹脂
を適用する方法について検討中のところ、酸価が30以
上の不飽和酸を含む樹脂組成物を用いた場合、その目的
を達成しうることを見出し本発明を完成した。The present inventors are currently investigating a method of applying a resin that can be crosslinked and cured by ultraviolet light in a conventional method of forming circuit elements using a photoetching method. The present invention was completed based on the discovery that the object could be achieved by using the following method.
本発明の要旨とするところは、金属板の面上に分子量が
200〜2000で1分子中にアクリロイル基又はメタ
クリロイル基を1個以上有し、かつ酸価が30〜300
KOH〜数/Vなる不飽和酸八5〜75重量%と他の架
橋重合性不飽和化合物(B)95〜25重量%及び光増
感剤とよりなる樹脂組成物を塗布し、紫外線を照射せし
め所望形状の硬化被膜を形成せしめた後、金属板の露出
面にメッキ処理を施して回路素子を形成し、次いで硬化
被膜を取除いた後、この部分の金属板層をエッチング処
理することを特徴とする回路素子の形成方法にある。The gist of the present invention is that the metal plate has a molecular weight of 200 to 2000, one or more acryloyl group or methacryloyl group per molecule, and an acid value of 30 to 300.
A resin composition consisting of 85 to 75% by weight of an unsaturated acid of KOH ~ number/V, 95 to 25% by weight of another crosslinking polymerizable unsaturated compound (B), and a photosensitizer is applied and irradiated with ultraviolet rays. After forming a hardened film in the desired shape, the exposed surface of the metal plate is plated to form a circuit element, and after the hardened film is removed, this portion of the metal plate layer is etched. The main feature lies in the method for forming circuit elements.
本発明を実施する際に用いる樹脂組成物の構成成分であ
る不飽和酸(2)は分子量が200〜2000なる範囲
であることが必要であり、分子量が200よりも小さい
不飽和酸を含む樹脂を用い本発明と同様の方法によつて
形成される硬化被膜は金属板への密着性が不足し、メッ
キ処理時に硬化被膜が剥離したり、鮮明な像を有するメ
ッキによる回路素子の形成ができにくいなどの不都合が
生じ好ましくなく、一方分子量が2000よりも大きい
不飽和酸を含む樹脂組成物は粘度が極端に高くなり作業
性に支障をきたすと共に所望形状の硬化被膜の形成が難
しく、またこのような樹脂組成物を用いて形成された硬
化被膜は回路素子形成に要するアルカリ溶液による硬化
被膜の除膜性が低下して好ましくない。The unsaturated acid (2), which is a component of the resin composition used in carrying out the present invention, must have a molecular weight in the range of 200 to 2,000, and the resin containing an unsaturated acid with a molecular weight of less than 200 A cured film formed using a method similar to that of the present invention has insufficient adhesion to the metal plate, and the cured film may peel off during plating, or it may not be possible to form a circuit element by plating with a clear image. On the other hand, a resin composition containing an unsaturated acid with a molecular weight of more than 2000 has an extremely high viscosity, which impedes workability and makes it difficult to form a cured film in the desired shape. A cured film formed using such a resin composition is not preferable because the removability of the cured film with an alkaline solution required for forming a circuit element is reduced.
また不飽和酸の酸価は30〜300に0H〜数/f7で
あることが必要であり、酸価が30よりも小さな不飽和
酸を含む樹脂組成物を用いて形成された硬化被膜は金属
板への密着性ならびにアルカリ溶液による除膜性が低下
するので本発明においては使用することができず、一方
酸価が300よりも大きい不飽和酸を含む樹脂組成物は
貯蔵安定性が不良であり好ましくない。In addition, the acid value of the unsaturated acid must be 30 to 300, 0H to several f7, and the cured film formed using a resin composition containing an unsaturated acid with an acid value of less than 30 is It cannot be used in the present invention because the adhesion to the board and the film removability with an alkaline solution deteriorate, while a resin composition containing an unsaturated acid with an acid value greater than 300 has poor storage stability. Yes, it's not good.
本発明で用いる不飽和酸中にはアクリロイル基又はメタ
クリロイル基を1個以上なる割合で含むことが必要であ
り、このような化合物でないと本発明の方法による回路
素子の形成において良好な像形成性を有する硬化被膜を
形成することができない。It is necessary that the unsaturated acid used in the present invention contains at least one acryloyl group or methacryloyl group, and if such a compound is not used, good image forming properties will not be obtained in the formation of circuit elements by the method of the present invention. It is not possible to form a cured film with
本発明を実施するに際して用いる不飽和酸の具体例とし
ては一般式
〔式中R1はH又はCH3、R2はC1〜10のアルキ
レン基又は繰返し単位10個以下のポリエチレングリコ
ール残基又はポリプロピレングリコール残基、R3は−
CH2CH2− −CH=CH一〜′より選ばれた基を
示す。Specific examples of unsaturated acids used in carrying out the present invention include the general formula [wherein R1 is H or CH3, R2 is a C1-10 alkylene group, or a polyethylene glycol residue or polypropylene glycol residue having 10 or less repeating units] , R3 is -
CH2CH2- -CH=CH represents a group selected from 1-'.
〕で表わされる化合物類であり、これらの化合物はヒド
ロキシアルキルアクリレート又はメタクリレートとコ・
・ク酸、フマル酸、イタコン酸、マレイン酸、フタル酸
、テトラヒドロフタル酸、トリメリツト酸又はこれらの
無水物とを反応せしめることによつて製造できる。], and these compounds are co-formed with hydroxyalkyl acrylate or methacrylate.
- Can be produced by reacting with citric acid, fumaric acid, itaconic acid, maleic acid, phthalic acid, tetrahydrophthalic acid, trimellitic acid, or anhydrides thereof.
また他の型の不飽和酸(4)とはビスフエノールAとエ
ピクロルヒドリンとの縮合物であるエポキシ化合物とア
クリル酸又はメタクリル酸とを付加反応せしめて得たジ
又はトリアクリロイル又はメタクリロイル化合物中に含
まれる水酸基1モルに対し、(R3は前記に同じ)
で表わされる酸無水物を付加反応せしめることによつて
製造される化合物類、或いはヒドロキシアルキルアクリ
レート又はメタクリレートと無水リン酸、ポリリン酸と
の付加反応物であるアクリロイルオキシアルキルフオス
フエート又はメタクリロイルオキシアルキルフオスフエ
ートである。Other types of unsaturated acids (4) are contained in di- or triacryloyl or methacryloyl compounds obtained by addition-reacting acrylic acid or methacrylic acid with an epoxy compound that is a condensate of bisphenol A and epichlorohydrin. Compounds produced by addition reaction of an acid anhydride represented by (R3 is the same as above) to 1 mole of hydroxyl group, or addition of hydroxyalkyl acrylate or methacrylate with phosphoric anhydride or polyphosphoric acid. The reactant is acryloyloxyalkyl phosphate or methacryloyloxyalkyl phosphate.
本発明を実施する際に不飽和酸(4)と共に用いる他の
架橋重合性不飽和化合物とは、紫外線の照射により架橋
硬化した乾燥被膜を形成しめる化合物類であり、とくに
分子中に少なくとも1個のアクリロイル基又はメタクリ
ロイル基を有する化合物類であり、その具体例としては
次の如きものを挙げることができる。(1)ポリエポキ
シ化合物の(メタ)アクリル酸付加反応物(10多官能
ポリエステルアクリレート類(4)多官能モノマー類及
びモノアクリレート類例えばポリエチレングリコールジ
(メタ)アクリレート、ポリプロピレングリコールジ(
メタ)アクリレート、1・4−ブタンジオールジ(メタ
)アクリレート、1・6−ヘキサンジオールジ(メタ)
アクリレート、トリメチロールプロパントリ(メタ)ア
クリレート、2−ヒドロキシプロピル(メタ)アクリレ
ート、カルビトール(メタ)アクリレート、テトラヒド
ロフルフリル(メタ)アクリレート等である。Other crosslinking polymerizable unsaturated compounds used together with the unsaturated acid (4) in carrying out the present invention are compounds that form a dry film that is crosslinked and cured by ultraviolet irradiation, and in particular, at least one compound in the molecule. These are compounds having an acryloyl group or a methacryloyl group, and specific examples thereof include the following. (1) (meth)acrylic acid addition reaction products of polyepoxy compounds (10 polyfunctional polyester acrylates (4) polyfunctional monomers and monoacrylates such as polyethylene glycol di(meth)acrylate, polypropylene glycol di(
meth)acrylate, 1,4-butanediol di(meth)acrylate, 1,6-hexanediol di(meth)
These include acrylate, trimethylolpropane tri(meth)acrylate, 2-hydroxypropyl(meth)acrylate, carbitol(meth)acrylate, and tetrahydrofurfuryl(meth)acrylate.
本発明を実施するに際しては前記不飽和酸(A)5〜7
5重量%と前記架橋重合性不飽和化合物(8)95〜2
5重量%の割合で配合された樹脂組成物が用いられ、不
飽和酸を5重量%以下含む樹脂組成物を用いて形成され
る硬化被膜は金属板への密着性が不足し、メツキ処理特
性が低下し好ましくなく、またアルカリ溶液による除膜
が容易にできず好ましくない。When carrying out the present invention, the unsaturated acid (A) 5 to 7
5% by weight and the crosslinked polymerizable unsaturated compound (8) 95-2
A resin composition containing 5% by weight or less of an unsaturated acid is used, and a cured film formed using a resin composition containing 5% by weight or less of an unsaturated acid has insufficient adhesion to the metal plate and has poor plating properties. This is undesirable because it reduces the film resistance, and it is also undesirable because the film cannot be easily removed with an alkaline solution.
本発明を実施するに際しては前記樹脂組成物にベンゾイ
ン、ベンゾインメチルエーテル、ベンゾィンエチルエー
テル、ベンゾフエノン、ミヒラ一ズケトン、ジエトキシ
アセトフエン等の光増感剤を1〜10重量%の範囲で添
加して波長200〜800nm好ましくは250〜45
0nmの近紫外線を照射せしめればよい。When carrying out the present invention, a photosensitizer such as benzoin, benzoin methyl ether, benzoin ethyl ether, benzophenone, Michler's ketone, diethoxyacetophene, etc. is added to the resin composition in an amount of 1 to 10% by weight. The wavelength is 200-800 nm, preferably 250-45 nm.
It is sufficient to irradiate near ultraviolet rays of 0 nm.
また本発明の樹脂組成物はそのままでも使用できるが、
必要に応じて顔料、染料などその他の適宜の添加物を添
加して用いることもできるが、本発明の目的を更に効率
よくとくに回路形成を効率よくスクリーン印刷法にて実
施するには顔料として体質顔料例えばバライト粉、沈降
性硫酸バリウム、炭酸バリウム、クレー、シリカ粉、微
粒ケイ酸、タルクなどを樹脂組成物中に70重量%以下
なる割合で加えることが好ましい。Furthermore, the resin composition of the present invention can be used as it is, but
Other suitable additives such as pigments and dyes may be added and used as necessary, but in order to more efficiently achieve the purpose of the present invention, especially to form circuits efficiently by screen printing, it is necessary to Pigments such as barite powder, precipitated barium sulfate, barium carbonate, clay, silica powder, fine silicic acid, talc, etc. are preferably added to the resin composition in a proportion of 70% by weight or less.
本発明の回路素子の形成は、金属板として例えば銅、銅
合金、コバール、パーマロイなどの金属薄膜を絶縁基板
上に設けてなる金属積層板の金属板面上に前記樹脂組成
物をスクリーン印刷機あるいはグラビア印刷機により印
刷し、紫外線を照射せしめ硬化被膜をネガテブに即ち回
路を形成すべきでない部分に形成して、その部分に対す
るメツキの塗着防止処理を施こしてから、金属板の露出
部分にメッキ処理を施こしてポジテブに即ち回路を形成
すべき部分に例えば銅、金、銀、ニツケル、錫などの金
属メッキ層を形成し、その後不要となつた硬化被膜部を
PH9以上のアルカリ溶液たとえばNaOH.KOH、
アンモニア、第1〜第3級アミン類の水または水溶性有
機溶媒溶液で溶解除去したのち、不要部の金属板層をエ
ツチング液として、例えば硝酸、塩酸、塩化第2鉄など
の酸溶液を用いてエツチング処理を行なうことによつて
回路素子を得ることができる。The circuit element of the present invention is formed by printing the resin composition on the metal plate surface of a metal laminate, which is a metal plate in which a metal thin film of copper, copper alloy, Kovar, permalloy, etc. is provided on an insulating substrate. Alternatively, print with a gravure printing machine, irradiate with ultraviolet rays, form a cured film negatively, that is, on areas where circuits should not be formed, and perform a treatment to prevent plating from being applied to those areas, and then apply a coating to the exposed areas of the metal plate. A positive plating process is performed to form a metal plating layer of copper, gold, silver, nickel, tin, etc. on the part where a circuit is to be formed, and then the unnecessary hardened film is removed with an alkaline solution with a pH of 9 or higher. For example, NaOH. KOH,
After dissolving and removing ammonia and primary to tertiary amines in water or a water-soluble organic solvent solution, the unnecessary portions of the metal plate layer are etched using an acid solution such as nitric acid, hydrochloric acid, or ferric chloride. By performing an etching process, a circuit element can be obtained.
本発明で用いる樹脂組成物は無溶剤型であるため、硬化
被膜を形成する過程において、大気汚染の懸念がなく、
また紫外線照射法であるので基板の熱変形もなく、迅速
に乾燥硬化でき、形成された硬化被膜は金属板との密着
性が良好で、メツキ処理時に剥離するなどの現象が生じ
ることなく、良好なメッキ特性を有し、しかもメツキ処
理後不要となる硬化被膜部の除膜が容易であり、このよ
うな硬化被膜を形成することができその工業的価値は極
めて大である。Since the resin composition used in the present invention is solvent-free, there is no concern about air pollution during the process of forming a cured film.
In addition, since it is an ultraviolet irradiation method, there is no thermal deformation of the substrate, and it can be dried and cured quickly.The formed cured film has good adhesion to the metal plate, and there is no phenomenon such as peeling during the plating process. It has excellent plating properties, and it is easy to remove the hardened film that becomes unnecessary after the plating process, and it is possible to form such a hardened film, and its industrial value is extremely large.
以下本発明を実施例を用いてさらに詳しく説明する。The present invention will be explained in more detail below using examples.
尚実施例中部とあるのは重量部の意である。Note that "Example Middle" means parts by weight.
実施例 1アクリル酸2−ヒドロキシエチルに無水コハ
ク酸を付加して得た不飽和酸(酸価260K0Hη数/
t)30部、アクリロイルオキシエチルフオスフエート
(酸価265K0Hη数/7)10部、エポキシ樹脂(
シヨウダイン508、昭和電工社製)のアクリル酸付加
物40部、アクリル酸カルビトール20部からなる樹脂
組成物100部に対しベンゾインメチルエーテル5部、
タルク30部、フタロシアニンブルー2部を混練するこ
とによつて印刷インキ(1)を得た。Example 1 Unsaturated acid obtained by adding succinic anhydride to 2-hydroxyethyl acrylate (acid value 260K0Hη number/
t) 30 parts, 10 parts of acryloyloxyethyl phosphate (acid value 265K0Hη number/7), epoxy resin (
5 parts of benzoin methyl ether per 100 parts of a resin composition consisting of 40 parts of acrylic acid adduct of Syodyne 508 (manufactured by Showa Denko) and 20 parts of carbitol acrylate;
Printing ink (1) was obtained by kneading 30 parts of talc and 2 parts of phthalocyanine blue.
該印刷インキ(1)を250メッシユのスクリーン印刷
機を用い銅箔積層板に印刷し、次いで80W/礪の高圧
水銀ランプを用い紫外線を8秒間照射して硬化被膜を回
路を形成すべきでない部分に形成した。The printing ink (1) is printed on a copper foil laminate using a 250-mesh screen printer, and then irradiated with ultraviolet rays for 8 seconds using a high-pressure mercury lamp of 80 W/cm to form a cured film on areas where circuits should not be formed. was formed.
その後銅板の露出部に銀メツキ処理を施して、回路を形
成する部分に銀メッキ層を形成し、次いで硬化被膜をP
H9.5のNaOH溶液で溶解除去し、この部分の銅板
を塩化第2鉄を用いてエツチング処理を施し、回路素子
を形成した。After that, silver plating is applied to the exposed parts of the copper plate to form a silver plating layer on the parts where the circuit will be formed, and then a hardened film is applied to the parts where the circuit will be formed.
The copper plate was dissolved and removed using a H9.5 NaOH solution, and the copper plate in this area was etched using ferric chloride to form a circuit element.
尚上記手法によつて得た印刷インキ(1)を用いて形成
された硬化被膜特性を付表−1に示した。Incidentally, the characteristics of the cured film formed using the printing ink (1) obtained by the above method are shown in Attached Table 1.
比較例 1実施例1の樹脂組成物の構成成分のうちアク
リル酸2−ヒドロキシエチルの無水コ・・ク酸付加物と
アクリロイルオキシエチルフオスフエートを用いないで
、エポキシ樹脂(シヨウダイン508、昭和電工社製)
のアクリル酸付加物を70部、アクリル酸カルビトール
30部を用いる他は全く実施例1と同様にして印刷イン
キ()を得た。Comparative Example 1 Among the constituent components of the resin composition of Example 1, an epoxy resin (Syodyne 508, Showa Denko company)
A printing ink () was obtained in the same manner as in Example 1, except that 70 parts of the acrylic acid adduct and 30 parts of carbitol acrylate were used.
該印刷インキI[)を実施例1と同様に印刷し、紫外線
を照射して硬化被膜を回路を形成すべきでない部分に形
成した。その後も実施例1と同様に、銅板の露出部に銀
メッキ層を形成し、次いで硬化被膜を除去し、この部分
の銅板を塩化第2鉄を用いてエツチング処理を施し、回
路素子を形成した。The printing ink I [) was printed in the same manner as in Example 1, and UV rays were irradiated to form a cured film on areas where no circuit should be formed. Thereafter, in the same manner as in Example 1, a silver plating layer was formed on the exposed part of the copper plate, the hardened film was then removed, and this part of the copper plate was etched using ferric chloride to form a circuit element. .
尚上記手法によつて得た印刷インキ(11)を用いて形
成された硬化被膜特性を付表−1に示した。The properties of the cured film formed using the printing ink (11) obtained by the above method are shown in Appendix Table 1.
実施例 2エポキシ樹脂(シヨウダイン729、昭和電
工社製)のアクリル酸付加物680部に無水コ・・ク酸
100部を付加して得られる不飽和酸50部、アクリロ
イルオキシプロピルフオスフエート10部、テトラヒド
ロフルフリルアクリレート20部、カルビトールアクリ
レート20部からなる樹脂組成物100部に対し、ベン
ゾインエチルエーテル6部、タルク40部を添加し樹脂
組成物を得た。Example 2 50 parts of unsaturated acid obtained by adding 100 parts of co-citric anhydride to 680 parts of acrylic acid adduct of epoxy resin (Syodyne 729, manufactured by Showa Denko), 10 parts of acryloyloxypropyl phosphate , 20 parts of tetrahydrofurfuryl acrylate, and 20 parts of carbitol acrylate were added with 6 parts of benzoin ethyl ether and 40 parts of talc to obtain a resin composition.
該樹脂組成物を無電解銅メツキ積層板の銅メツキ層に2
50メツシユのスクリーン印刷機を用いて回路を形成す
べきでない部分に所望模様を施こし、紫外線を10秒間
照射して硬化被膜を形成した。次いで無電解銅メッキの
露出部に電気銅メッキ処理を施こし、さらに電気銀メツ
キ処理を施こしてポジテブに即ち回路を形成すべき部分
に銀メツキ層を形成し、次いで硬化被膜をPH9.5の
KOH溶液で溶解除去し、不要部の無電解銅メッキ層を
塩化第2鉄の飽和水を用いてエツチング処理を行ない回
路素子を形成した。The resin composition was applied to the copper plating layer of the electroless copper plating laminate.
A desired pattern was applied to the portion where no circuit should be formed using a 50-mesh screen printer, and a cured film was formed by irradiating ultraviolet rays for 10 seconds. Next, electrolytic copper plating is applied to the exposed areas of the electroless copper plating, followed by electrolytic silver plating to form a positive silver plating layer on the areas where circuits are to be formed, and then the cured film is heated to pH 9.5. The electroless copper plating layer in unnecessary portions was etched using ferric chloride saturated water to form a circuit element.
尚上記手法によつて樹脂組成物(ホ)を用いて形成され
た硬化被膜は銅メツキ層への密着性あるいはアルカリ液
除膜性などの硬化被膜特性が良好であり、すぐれた回路
素子を形成することができた。The cured film formed using the resin composition (e) by the above method has good properties such as adhesion to the copper plating layer and alkaline solution removability, and forms an excellent circuit element. We were able to.
Claims (1)
子中にアクリロイル基又はメタクリロイル基を1個以上
有し、かつ酸価が30〜300KOHmg数/gなる不
飽和酸(A)5〜75重量%と他の架橋重合性不飽和化
合物(B)95〜25重量%及び光増感剤とよりなる樹
脂組成物を塗布し、紫外線を照射せしめ所望形状の硬化
被膜を形成せしめた後、金属板の露出面にメッキ処理を
施して回路素子を形成し、次いで硬化被膜を取除いた後
、この部分の金属板層をエッチング処理することを特徴
とする回路素子の形成方法。 2 樹脂組成物として体質顔料を含むものを用いること
を特徴とする特許請求の範囲第1項記載の回路素子の形
成方法。[Scope of Claims] 1. An unsaturated acid having a molecular weight of 200 to 2000, having one or more acryloyl group or methacryloyl group in one molecule, and an acid value of 30 to 300 KOHmg/g on the surface of the metal plate. A resin composition consisting of 5 to 75% by weight of (A), 95 to 25% by weight of another cross-linked polymerizable unsaturated compound (B), and a photosensitizer is applied and irradiated with ultraviolet rays to form a cured film in the desired shape. After forming the metal plate, the exposed surface of the metal plate is plated to form a circuit element, and after the hardened film is removed, this portion of the metal plate layer is etched. Method. 2. The method for forming a circuit element according to claim 1, wherein a resin composition containing an extender pigment is used.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP51090446A JPS5945237B2 (en) | 1976-07-29 | 1976-07-29 | Method for forming circuit elements using photoetching method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP51090446A JPS5945237B2 (en) | 1976-07-29 | 1976-07-29 | Method for forming circuit elements using photoetching method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5316576A JPS5316576A (en) | 1978-02-15 |
| JPS5945237B2 true JPS5945237B2 (en) | 1984-11-05 |
Family
ID=13998835
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP51090446A Expired JPS5945237B2 (en) | 1976-07-29 | 1976-07-29 | Method for forming circuit elements using photoetching method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5945237B2 (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61252546A (en) * | 1985-05-01 | 1986-11-10 | Ueno Kagaku Kogyo Kk | Photosensitive resist ink and manufacture of ps plate by using it and method for etching this ps plate |
-
1976
- 1976-07-29 JP JP51090446A patent/JPS5945237B2/en not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5316576A (en) | 1978-02-15 |
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