JPS5845774B2 - Manufacturing method of correction filter for exposure equipment - Google Patents
Manufacturing method of correction filter for exposure equipmentInfo
- Publication number
- JPS5845774B2 JPS5845774B2 JP8763877A JP8763877A JPS5845774B2 JP S5845774 B2 JPS5845774 B2 JP S5845774B2 JP 8763877 A JP8763877 A JP 8763877A JP 8763877 A JP8763877 A JP 8763877A JP S5845774 B2 JPS5845774 B2 JP S5845774B2
- Authority
- JP
- Japan
- Prior art keywords
- correction filter
- transmittance
- manufacturing
- exposure
- exposure equipment
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000012937 correction Methods 0.000 title claims description 24
- 238000004519 manufacturing process Methods 0.000 title claims description 9
- 238000002834 transmittance Methods 0.000 claims description 24
- 229910052751 metal Inorganic materials 0.000 claims description 11
- 239000002184 metal Substances 0.000 claims description 11
- 239000000758 substrate Substances 0.000 claims description 7
- 238000010438 heat treatment Methods 0.000 claims description 6
- 238000007740 vapor deposition Methods 0.000 claims description 5
- 230000001590 oxidative effect Effects 0.000 claims description 3
- 239000010409 thin film Substances 0.000 description 6
- 238000010586 diagram Methods 0.000 description 5
- 238000009826 distribution Methods 0.000 description 5
- 239000010408 film Substances 0.000 description 5
- 238000000034 method Methods 0.000 description 4
- 229910001179 chromel Inorganic materials 0.000 description 3
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 2
- 230000008020 evaporation Effects 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 229910001026 inconel Inorganic materials 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- 235000003976 Ruta Nutrition 0.000 description 1
- 240000005746 Ruta graveolens Species 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 229910052703 rhodium Inorganic materials 0.000 description 1
- 239000010948 rhodium Substances 0.000 description 1
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 1
- 229910052701 rubidium Inorganic materials 0.000 description 1
- IGLNJRXAVVLDKE-UHFFFAOYSA-N rubidium atom Chemical compound [Rb] IGLNJRXAVVLDKE-UHFFFAOYSA-N 0.000 description 1
- 235000005806 ruta Nutrition 0.000 description 1
- 238000010301 surface-oxidation reaction Methods 0.000 description 1
Landscapes
- Optical Filters (AREA)
- Formation Of Various Coating Films On Cathode Ray Tubes And Lamps (AREA)
Description
【発明の詳細な説明】
本発明は、カラー受像管の螢光面形成時に用いられる露
光装置にｋいて、その露光量を調整する補正フィルタの
製造方法に関する。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method of manufacturing a correction filter for adjusting the exposure amount of an exposure apparatus used in forming a fluorescent surface of a color picture tube.
カラー受像管の螢光面を形成する工程では、フェースパ
ネルの内面に＋様に塗布された螢光体感光層を、装着さ
れたシャドウマスクを介して紫外光により露光し、現像
その他の処理工程を繰り返すことによって多数のドツト
またはストライプを有する螢光面を作製している。In the process of forming the fluorescent surface of a color picture tube, the fluorescent photosensitive layer coated on the inner surface of the face panel is exposed to ultraviolet light through an attached shadow mask, and then subjected to development and other processing steps. By repeating this process, a fluorescent surface having a large number of dots or stripes is produced.
第１図に上記工程にむける露光状態を模式的に示すと、
１はフェースパネル、２はフェースパネル内面に塗布さ
れた螢光体感光層、３は装着されたシャドウマスクであ
り、一方露光装着は、４が点光源、５が補正レンズ、６
が補正フイ、ルタである。FIG. 1 schematically shows the exposure conditions for the above process.
1 is a face panel, 2 is a phosphor photosensitive layer coated on the inner surface of the face panel, 3 is a shadow mask attached, and on the other hand, as for the exposure attachment, 4 is a point light source, 5 is a correction lens, 6
is the correction fee and ruta.
この補正フィルタ６は透過率が中央部で低く、周辺部は
ど高くなした特性を有し、螢光体感光層２の全面にわた
って光量を調整する目的で使用されている。This correction filter 6 has a characteristic that the transmittance is low at the center and high at the periphery, and is used for the purpose of adjusting the amount of light over the entire surface of the phosphor photosensitive layer 2.
上記補正フィルタ６は、ガラス等の透明基板７に金属薄
膜８を蒸着したもので以下に述べるようにして作製され
ていた。The correction filter 6 is made by depositing a metal thin film 8 on a transparent substrate 7 made of glass or the like, and was manufactured as described below.
即ち、真空中で円環状の蒸発源からインコネル、クロメ
ル、白金等の金属を蒸発させ、星形の透孔を形成した蒸
着マスクを介してガラス等の透明基板γの表面に金属薄
膜８を形成するものであった。That is, a metal such as Inconel, chromel, or platinum is evaporated from an annular evaporation source in vacuum, and a thin metal film 8 is formed on the surface of a transparent substrate γ made of glass or the like through an evaporation mask having star-shaped holes. It was something to do.
このとき透過率が補正フィルタ６の中心部から周辺部に
向って均一に高くなるように透明基板を回転させる場合
もあった。At this time, the transparent substrate may be rotated so that the transmittance increases uniformly from the center of the correction filter 6 toward the periphery.
蒸着材料としては、上記以外にニッケル、クロム、ロジ
ウム、ルビジウム等が知られているが、コストや蒸着の
容易さからインコネルまたはクロメルが従来から多く用
いられている。In addition to the above, nickel, chromium, rhodium, rubidium, and the like are known as vapor deposition materials, but Inconel or chromel has traditionally been widely used due to cost and ease of vapor deposition.
一般に補正フィルタ６は、第２図の実線で示した曲線９
のように中央部で低く、周辺部で高い透過率分布を有す
るように形成されるが、長期にわたって露光工程に使用
されると経時変化を起こし、第２図の破線で示した曲線
１０のように透過率が上昇して本来の特性を失なってし
筐う。In general, the correction filter 6 is formed by a curve 9 shown as a solid line in FIG.
It is formed to have a transmittance distribution that is low in the center and high in the periphery, but if it is used in the exposure process for a long period of time, it will change over time, and as shown in curve 10 shown by the broken line in Figure 2. The transmittance increases and the original characteristics are lost.
透過率の経時変化を第３図に示すと、補正フィルタ６の
中央部に釦ける透過率曲線１１も周辺部に釦ける透過率
曲線１２も時間の経過とともに徐々に上昇している。When the change in transmittance over time is shown in FIG. 3, both the transmittance curve 11 buttoned at the center of the correction filter 6 and the transmittance curve 12 buttoned at the periphery gradually increase with the passage of time.
この経時変化の理由は、露光時に点光源４に超高圧水銀
灯等を用いるため、輻射熱や伝導熱により露光装置の温
度が上昇し、補正フィルタ６ば４００Ｃ〜６０℃にも達
している。The reason for this change over time is that since an ultra-high pressure mercury lamp or the like is used as the point light source 4 during exposure, the temperature of the exposure apparatus increases due to radiant heat and conduction heat, and the temperature of the correction filter 6 reaches 400 to 60 degrees Celsius.
このため金属薄膜８が徐々に酸化され透過率が上昇して
いた。Therefore, the metal thin film 8 was gradually oxidized and the transmittance increased.
従来から補正フィルタ６の透過率分布を精度高く得るこ
とは非常に難しく、多くの努力がこの点に傾けられてい
たが、上述のようにその透過率に経時変化が起こるため
、工業的には品質や量産効果に大きな問題となっていた
。Conventionally, it has been extremely difficult to obtain the transmittance distribution of the correction filter 6 with high precision, and much effort has been devoted to this point. This caused major problems in quality and mass production efficiency.
本発明は、金属薄膜を蒸着後、これを強制的に酸化して
経時変化の少ない補正フィルタを得る製造方法で、以下
にその一実施例を説明する。The present invention is a manufacturing method for obtaining a correction filter with little change over time by forcibly oxidizing a metal thin film after vapor deposition, and one embodiment thereof will be described below.
オず従来と同様に透明基板にクロメル等を蒸着し、金属
薄膜を形成するが、このとき膜厚を厚めにして透過率が
目標値より低い値（第４図破線１３）となるようにする
。O. As in the conventional method, chromel or the like is deposited on a transparent substrate to form a thin metal film, but at this time, the film thickness is made thicker so that the transmittance is lower than the target value (dashed line 13 in Figure 4). .
次に酸化雰囲気中にお−いて１０００Ｃ〜２５００Ｃ１
２０分〜６０分間加熱処理を行ない上記金属薄膜の表面
を酸化する。Next, in an oxidizing atmosphere, 1000C to 2500C1
Heat treatment is performed for 20 to 60 minutes to oxidize the surface of the metal thin film.
この表面酸化によって透過率が上昇し、第４図実線１４
のようになるから、この実線１４が目標値に一致するよ
うに加熱処理を制御する。This surface oxidation increases the transmittance, and the solid line 14 in Figure 4
Therefore, the heat treatment is controlled so that the solid line 14 matches the target value.
上記で得られた補正フィルタの経時変化を調べると、加
熱処理により上昇した透過率は、第５図に示したように
その後通常の使用状態ではわずかの上昇が認められるの
みである。When examining the change over time of the correction filter obtained above, the transmittance increased by the heat treatment shows only a slight increase after that under normal usage conditions, as shown in FIG.
これは補正フィルタの中央部の透過率曲線１５も周辺部
の透過率曲線１６も同様である。This is the same for the transmittance curve 15 at the central portion of the correction filter and the transmittance curve 16 at the peripheral portion.
この理由は加熱処理時に金属薄膜の表面に形成された金
属酸化膜が、使用時に酸化が進むのを妨げるためである
。The reason for this is that the metal oxide film formed on the surface of the metal thin film during heat treatment prevents oxidation from proceeding during use.
また上記の加熱処理により金属薄膜と透明基板との密着
性もよくなり、機械的強度が増加するという効果も認め
られた。Furthermore, the above heat treatment improved the adhesion between the metal thin film and the transparent substrate, and the effect of increasing mechanical strength was also observed.
上記実施例によれば、経時変化の非常に少ない補正フィ
ルタを得ることができ、最初に高精度な透過率分布を有
する補正フィルタを得て露光装置に用いれば、高品質の
カラー受像管を経済的に量産可能となる。According to the above embodiment, it is possible to obtain a correction filter with very little change over time, and if a correction filter with a highly accurate transmittance distribution is first obtained and used in an exposure device, a high-quality color picture tube can be made economically. mass production becomes possible.
以上のように本発明は、補正フィルタとなるべき透明基
板に、金属蒸着膜を目標値より低い透過率に１で蒸着し
、その後、酸素雰囲気中で１００°Ｃ以上、２０分間以
上の加熱処理を行なって透過率を高め、目標値を得るこ
とにより、透過率の経時変化が極めて少なく、工業上非
常に有利な露光装置用補正フィルタの製造方法を提供す
るものである。As described above, in the present invention, a metal vapor deposition film is deposited on a transparent substrate to be a correction filter at a transmittance of 1 lower than the target value, and then heat-treated at 100°C or more for 20 minutes or more in an oxygen atmosphere. By carrying out the above steps to increase the transmittance and obtain a target value, the present invention provides a method of manufacturing a correction filter for an exposure apparatus, which shows extremely little change in transmittance over time and is industrially very advantageous.
第１図は露光状態を示す断面図、第２図は従来の製造方
法による補正フィルタの透過率分布曲線図、第３図は従
来の補正フィルタの透過率経時変化線図、第４図は本発
明の製造方法の一実施例による補正フィルタの透過率分
布曲線図、第５図は本発明の補正フィルタの透過率経時
変化線図である。Fig. 1 is a cross-sectional view showing the exposure state, Fig. 2 is a transmittance distribution curve diagram of a correction filter made by a conventional manufacturing method, Fig. 3 is a transmittance change diagram over time of a conventional correction filter, and Fig. 4 is a diagram of the present invention. FIG. 5 is a transmittance distribution curve diagram of a correction filter according to an embodiment of the manufacturing method of the invention, and FIG. 5 is a diagram of transmittance change over time of the correction filter of the invention.
Claims (1)
目標値より低い透過率に蒸着し、その後酸化雰囲気中で
１００℃以上、２０分間以上の加熱処理を行なって透過
率を高め、目標値を得ることを特徴とする露光装置用補
正フィルタの製造方法。1 A metal vapor deposition film is deposited on a transparent substrate that is to become a correction filter to a transmittance lower than the target value, and then heat treatment is performed at 100°C or higher for 20 minutes or more in an oxidizing atmosphere to increase the transmittance and reach the target value. A method of manufacturing a correction filter for an exposure apparatus, characterized in that:
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8763877A JPS5845774B2 (en) | 1977-07-20 | 1977-07-20 | Manufacturing method of correction filter for exposure equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8763877A JPS5845774B2 (en) | 1977-07-20 | 1977-07-20 | Manufacturing method of correction filter for exposure equipment |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5422155A JPS5422155A (en) | 1979-02-19 |
| JPS5845774B2 true JPS5845774B2 (en) | 1983-10-12 |
Family
ID=13920514
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP8763877A Expired JPS5845774B2 (en) | 1977-07-20 | 1977-07-20 | Manufacturing method of correction filter for exposure equipment |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5845774B2 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60126556U (en) * | 1984-01-28 | 1985-08-26 | 西武機材株式会社 | water control valve housing |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5525044A (en) * | 1978-08-11 | 1980-02-22 | Fujitsu Ltd | Production of light attenuator |
-
1977
- 1977-07-20 JP JP8763877A patent/JPS5845774B2/en not_active Expired
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60126556U (en) * | 1984-01-28 | 1985-08-26 | 西武機材株式会社 | water control valve housing |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5422155A (en) | 1979-02-19 |
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