JPS5935496B2 - Manufacturing method of correction filter for exposure equipment - Google Patents
Manufacturing method of correction filter for exposure equipmentInfo
- Publication number
- JPS5935496B2 JPS5935496B2 JP11282577A JP11282577A JPS5935496B2 JP S5935496 B2 JPS5935496 B2 JP S5935496B2 JP 11282577 A JP11282577 A JP 11282577A JP 11282577 A JP11282577 A JP 11282577A JP S5935496 B2 JPS5935496 B2 JP S5935496B2
- Authority
- JP
- Japan
- Prior art keywords
- transmittance
- correction filter
- manufacturing
- exposure
- heat treatment
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000012937 correction Methods 0.000 title claims description 34
- 238000004519 manufacturing process Methods 0.000 title claims description 17
- 238000002834 transmittance Methods 0.000 claims description 38
- 238000010438 heat treatment Methods 0.000 claims description 14
- 239000010409 thin film Substances 0.000 claims description 10
- 229910052751 metal Inorganic materials 0.000 claims description 9
- 239000002184 metal Substances 0.000 claims description 9
- 238000000034 method Methods 0.000 claims description 8
- 239000000758 substrate Substances 0.000 claims description 5
- 238000005259 measurement Methods 0.000 claims description 4
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 claims description 4
- 229910052753 mercury Inorganic materials 0.000 claims description 4
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 3
- 229910052760 oxygen Inorganic materials 0.000 claims description 3
- 239000001301 oxygen Substances 0.000 claims description 3
- 239000011521 glass Substances 0.000 description 6
- 238000009826 distribution Methods 0.000 description 5
- 238000010586 diagram Methods 0.000 description 4
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 3
- 229910001179 chromel Inorganic materials 0.000 description 3
- 239000010408 film Substances 0.000 description 3
- 239000000725 suspension Substances 0.000 description 3
- 238000007740 vapor deposition Methods 0.000 description 3
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 230000008020 evaporation Effects 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
- 229910001026 inconel Inorganic materials 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- 238000012935 Averaging Methods 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- -1 Inconel Chemical class 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 229910052703 rhodium Inorganic materials 0.000 description 1
- 239000010948 rhodium Substances 0.000 description 1
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 1
- 229910052701 rubidium Inorganic materials 0.000 description 1
- IGLNJRXAVVLDKE-UHFFFAOYSA-N rubidium atom Chemical compound [Rb] IGLNJRXAVVLDKE-UHFFFAOYSA-N 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
Landscapes
- Optical Filters (AREA)
- Formation Of Various Coating Films On Cathode Ray Tubes And Lamps (AREA)
- Control Of Non-Electrical Variables (AREA)
Description
【発明の詳細な説明】
本発明は、カラー受像管の螢光面形成時に用いられる露
光装置において、その露光量を調整する補正フィルタの
調整方法に関する。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method for adjusting a correction filter for adjusting the amount of exposure in an exposure apparatus used for forming a fluorescent surface of a color picture tube.
カラー受像管の螢光面を形成する工程では、フェースパ
ネルの内面に一様に塗布された螢光体懸濁液を、装着さ
れたシヤドウマスクを介して紫外光により露光し、現像
その他の処理工程を繰力返すことによつて多数のドット
またはストライプを有する螢光面を作製している。In the process of forming the fluorescent surface of a color picture tube, a phosphor suspension uniformly applied to the inner surface of the face panel is exposed to ultraviolet light through an attached shadow mask, and then subjected to development and other processing steps. By repeating this process, a fluorescent surface with many dots or stripes is produced.
第1図に上記工程における露光状態を模式的に示すと、
1はフェースパネル、2はフェースパネル内面に塗布さ
れた螢光体懸濁液層、3は装着されたシャドウマスクで
あれ、一方露光装置は、4が点光源、5が補正レンズ、
6が補正フィルタである。FIG. 1 schematically shows the exposure state in the above process.
1 is a face panel, 2 is a phosphor suspension layer applied to the inner surface of the face panel, 3 is a shadow mask attached, and the exposure device is 4 a point light source, 5 a correction lens,
6 is a correction filter.
この補正フィルタ6は透過率が中央部で低く、周辺部ほ
ど高くなした特性を有し、螢光体懸濁液層2の全面にわ
たつて光量を平均化させる目的で使用されている。上記
補正フィルタ6は、ガラス等の透明基板Tに金属薄膜8
を蒸着したもので、真空中で円環状の蒸発源からインコ
ネル、クロメル、白金等の金属を蒸発させ、星形の透孔
を形成した蒸着マスクを介してガラス等の透明基板Tの
表面に金属薄膜8を蒸着形成して作製されていた。This correction filter 6 has a characteristic that the transmittance is low at the center and high at the periphery, and is used for the purpose of averaging the amount of light over the entire surface of the phosphor suspension layer 2. The correction filter 6 has a metal thin film 8 on a transparent substrate T such as glass.
Metals such as Inconel, chromel, platinum, etc. are evaporated from a circular evaporation source in vacuum, and the metal is deposited on the surface of a transparent substrate T such as glass through a evaporation mask with star-shaped holes. The thin film 8 was formed by vapor deposition.
蒸着材料としては、上記以外にニッケル、クロム、ロジ
ウム、ルビジウム等が知られているが、コストや蒸着の
容易さからインコネルとクロメルが従来から多く用いら
れている。In addition to the above, nickel, chromium, rhodium, rubidium, and the like are known as vapor deposition materials, but Inconel and chromel have traditionally been widely used because of their cost and ease of vapor deposition.
一般に補正フィルタ6は、第2図の実線で示した曲線9
のように中央部で低く、周辺部で高い透過率分布を有す
るように形成されるが、長期にわたつて露光工程に使用
されると経時変化を起こレ第2図の破線で示した曲線1
0のように透過率が上昇して本来の特性を失なつてしま
う。In general, the correction filter 6 is formed by a curve 9 shown as a solid line in FIG.
It is formed to have a transmittance distribution that is low in the center and high in the periphery, as shown in Figure 2.However, if it is used in the exposure process for a long time, it will change over time.Curve 1 shown by the broken line in Figure 2
0, the transmittance increases and the original characteristics are lost.
透過率の経時変化を第3図に示すと、補正フィルタ6の
中央部における透過率曲線11も周辺部における透過率
曲線12も時間の経過とともに徐々に上昇している。こ
の経時変化の理由は、露光時に点光源4に超高圧水銀灯
等を用いるため、輻射熱や伝導熱によれ露光装置の温度
が上昇し、補正フィルタ6は40℃〜60℃にも達して
いる。このため使用中に金属薄膜8が徐々に酸化され透
過率が上昇していた。従来の製造方法によれば上述のよ
うに補正フィルタ6の透過率に経時変化が起こるため、
工業的には品質や量産効果に大きな問題が生じていた。When the change in transmittance over time is shown in FIG. 3, both the transmittance curve 11 in the central part of the correction filter 6 and the transmittance curve 12 in the peripheral part gradually increase with the passage of time. The reason for this change over time is that since an ultra-high pressure mercury lamp or the like is used as the point light source 4 during exposure, the temperature of the exposure apparatus increases due to radiant heat and conduction heat, and the temperature of the correction filter 6 reaches 40 to 60 degrees Celsius. Therefore, during use, the metal thin film 8 was gradually oxidized and the transmittance increased. According to the conventional manufacturing method, as mentioned above, the transmittance of the correction filter 6 changes over time.
Industrially, there were major problems with quality and mass production efficiency.
上記の経時変化に対して、本発明者らは、透明基板にク
ロメル等を蒸着して薄膜を形成するときに、薄膜を厚め
にして透過率を目標値より低い値(第4図破線13)と
なるようにし、強制的に薄膜表面を酸化して第4図実線
14のように透過率を上昇させて補正フイルタを得る製
造方法を既に特許出願昭和52年第87638号明細書
により提案している。上記明細書中に示した製造方法に
より得られた補正フイルタの経時変化を調べると、第5
図に示したように通常の使用状態ではほとんど透過率が
変化していない。な訃透過率曲線15は補正フイルタ中
央部の、透過率曲線16は同周辺部の値を示す。このよ
うに上記製造方法では経時変化の非常に少ない補正フイ
ルタが得られる八加熱処理によつて目標とする透過率分
布(実線14)を得るには、あらかじめ蒸着膜の厚さと
透過率,加熱温度とその時間との相関関係を調べて卦く
必要があり1量産効果や作業性が少し劣つていた。本発
明は透過率を測定しながら加熱し、目標とする透過率の
補正フイルタを得る製造方法で、以下にその一実施例を
説明する。In order to deal with the above-mentioned changes over time, the present inventors created a thin film by depositing chromel or the like on a transparent substrate, and made the thin film thicker so that the transmittance was lower than the target value (dashed line 13 in Figure 4). A manufacturing method for obtaining a correction filter by forcibly oxidizing the thin film surface to increase the transmittance as shown by the solid line 14 in FIG. 4 has already been proposed in patent application No. 87638 of 1978. There is. When examining the change over time of the correction filter obtained by the manufacturing method shown in the above specification, it was found that the fifth
As shown in the figure, the transmittance hardly changes under normal usage conditions. A transmittance curve 15 shows the values at the center of the correction filter, and a transmittance curve 16 shows the values at the periphery. In this way, with the above manufacturing method, a correction filter with very little change over time can be obtained.8 In order to obtain the target transmittance distribution (solid line 14) through heat treatment, the thickness and transmittance of the deposited film, the heating temperature, and the It was necessary to investigate and calculate the correlation between 1 and the time, which resulted in a slight decrease in mass production effectiveness and workability. The present invention is a manufacturing method for obtaining a correction filter with a target transmittance by heating while measuring the transmittance, and one embodiment thereof will be described below.
第6図は本発明を実施する装置の例である。FIG. 6 is an example of an apparatus implementing the present invention.
17は電気炉、18は電気炉17の上面に設けた透孔に
はめ込まれた遮蔽ガラス板、19も遮蔽ガラス板で電気
炉17の下面に同様に設けられている。17 is an electric furnace, 18 is a shielding glass plate fitted into a through hole provided on the upper surface of the electric furnace 17, and 19 is also a shielding glass plate similarly provided on the lower surface of the electric furnace 17.
20はメータ21に接続され、上面の遮蔽ガラス板18
の所に設けられたフオトセル、22はカラー受像管の露
光工程で用いる超高圧水銀灯の光源装置で、下面の遮蔽
ガラス板19の所に設けられている。20 is connected to the meter 21, and the upper shielding glass plate 18
A photocell 22 is a light source device of an ultra-high pressure mercury lamp used in the exposure process of the color picture tube, and is provided at the lower shielding glass plate 19.
23は補正フイルタで、表面に金属薄膜24が透過率が
少し低くなるよう厚めに形成されたものである。Reference numeral 23 denotes a correction filter, on the surface of which a thin metal film 24 is formed to be thick enough to slightly lower transmittance.
補正フイルタ23を電気炉中に保持し、酸素を含む雰囲
気中で加熱をするが、同時に光源装置22からの光を補
正フイルタ23を介してフオトセル20で受け刻々と透
過率を測定する。The correction filter 23 is held in an electric furnace and heated in an oxygen-containing atmosphere, and at the same time, the transmittance of light from the light source device 22 is measured at every moment by the photocell 20 via the correction filter 23.
このとき、電気炉17内に攪拌用のフアンを設けたb1
補正フイルタ23を回転させる機構を設けてより均一な
加熱を図つてもよい。補正フイルタ23の金属薄膜24
の表面が徐々に酸化されて、フオトセル20で測定され
る透過率が土昇してゆくが、第4図実線14に示した目
標値に達した時点で加熱処理を終了させる。上記の製造
方法によれば常に一定の透過率の補正フイルタを得るこ
とが可能で、補正フイルタの品質を一定に保つことがで
き経済的な効果が大きい。At this time, b1 is provided with a stirring fan in the electric furnace 17.
A mechanism for rotating the correction filter 23 may be provided to achieve more uniform heating. Metal thin film 24 of correction filter 23
The surface of the film is gradually oxidized and the transmittance measured by the photocell 20 gradually increases, but the heat treatment is terminated when the target value shown by the solid line 14 in FIG. 4 is reached. According to the above manufacturing method, it is possible to always obtain a correction filter with a constant transmittance, and the quality of the correction filter can be kept constant, which has a large economical effect.
また測定部分(上記フオトセル20等)の出力を加熱装
置にフイードバツクし、一定の透過率になつた時に加熱
を停止するように自動化することも容易である。さらに
あらかじめ蒸着された金属薄膜24は目標値より低い透
過率にして卦く必要があるが、この値は、後に加熱処理
時に正確に調整できるため、厳密なものでなくてもよい
ため、作業性も向上する。上記の製造方法によつて最初
に高精度な透過率分布を有する補正フイルタを得て卦け
ば、露光装置に用いた時に経時変化が非常に少ないため
高品質のカラー受像管を経済的に量産可能となる。It is also easy to automate the heating by feeding back the output of the measuring part (the photocell 20, etc.) to the heating device and stopping the heating when a certain transmittance is reached. Furthermore, the metal thin film 24 deposited in advance must have a transmittance lower than the target value, but this value does not have to be exact because it can be adjusted accurately later during heat treatment, making it easier to work. It also improves. If a correction filter with a highly accurate transmittance distribution is first obtained using the manufacturing method described above, there will be very little change over time when used in an exposure device, resulting in the economical mass production of high-quality color picture tubes. It becomes possible.
以上のように本発明は、補正フイルタの透明基板上に目
標透過率よりも低い透過率になるように金属薄膜を蒸着
形成したのち、酸素を含む雰囲気中で加熱処理を行なう
補正フイルタの製造に訃いて、露光用超高圧水銀灯を光
源とする透過率測定を上記加熱処理の期間中行ない、上
記透過率測定の測定値が上記目標透過率に達した時点で
上記加熱処理を終了させるのであり、透過率の経時変化
が極めて少なく補正フイルタの品質も一定となD1工業
上非常に有利な露光装置用補正フイルタの製造方法を提
供するものである。As described above, the present invention provides a method for manufacturing a correction filter in which a metal thin film is deposited on a transparent substrate of the correction filter so that the transmittance is lower than the target transmittance, and then heat treatment is performed in an atmosphere containing oxygen. During the heat treatment, transmittance measurement is performed using an ultra-high pressure mercury lamp for exposure as a light source, and the heat treatment is terminated when the measured value of the transmittance measurement reaches the target transmittance. The present invention provides a method of manufacturing a correction filter for an exposure apparatus, which is extremely advantageous in the D1 industry, in which the change in transmittance over time is extremely small and the quality of the correction filter is constant.
第1図は露光状態を示す断面図、第2図は従来の製造方
法による補正フイルタの透過率分布曲線図、第3図は従
来の補正フイルタの透過率経時変化線図、第4図は本発
明の製造方法の一実施例による補正フイルタの透過率分
布曲線図、第5図は本発明の補正フイルタの透過率経時
変化線図、第6図は本発明を実現する製造装置の一実施
例を示す要部断面図である。
17・・・電気炉、20・・・フオトセル、22・・・
光源装置、23・・・補正フイルタ。Fig. 1 is a cross-sectional view showing the exposure state, Fig. 2 is a transmittance distribution curve diagram of a correction filter made by a conventional manufacturing method, Fig. 3 is a transmittance change diagram over time of a conventional correction filter, and Fig. 4 is a diagram of the present invention. FIG. 5 is a transmittance distribution curve diagram of a correction filter according to an embodiment of the manufacturing method of the invention. FIG. FIG. 17... Electric furnace, 20... Photo cell, 22...
Light source device, 23... correction filter.
Claims (1)
透過率になるように金属薄膜を蒸着形成したのち、酸素
を含む雰囲気中で加熱処理を行なう補正フィルタの製造
において、露光用超高圧水銀灯を光源とする透過率測定
を上記加熱処理の期間中行ない、上記透過率測定の測定
値が上記目標透過率に達した時点で上記加熱処理を終了
させることを特徴とする露光装置用補正フィルタの製造
方法。1. In the production of correction filters, in which a metal thin film is deposited on the transparent substrate of the correction filter to have a transmittance lower than the target transmittance, and then heat-treated in an oxygen-containing atmosphere, an ultra-high pressure mercury lamp for exposure is used. Manufacturing a correction filter for an exposure apparatus, characterized in that transmittance measurement using a light source is performed during the heat treatment period, and the heat treatment is terminated when the measured value of the transmittance measurement reaches the target transmittance. Method.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11282577A JPS5935496B2 (en) | 1977-09-19 | 1977-09-19 | Manufacturing method of correction filter for exposure equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11282577A JPS5935496B2 (en) | 1977-09-19 | 1977-09-19 | Manufacturing method of correction filter for exposure equipment |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5445568A JPS5445568A (en) | 1979-04-10 |
| JPS5935496B2 true JPS5935496B2 (en) | 1984-08-29 |
Family
ID=14596467
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP11282577A Expired JPS5935496B2 (en) | 1977-09-19 | 1977-09-19 | Manufacturing method of correction filter for exposure equipment |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5935496B2 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62282220A (en) * | 1986-05-30 | 1987-12-08 | Takenaka Komuten Co Ltd | Apparatus for measuring displacement of leading pipe in medium and small caliber propelling construction method |
-
1977
- 1977-09-19 JP JP11282577A patent/JPS5935496B2/en not_active Expired
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62282220A (en) * | 1986-05-30 | 1987-12-08 | Takenaka Komuten Co Ltd | Apparatus for measuring displacement of leading pipe in medium and small caliber propelling construction method |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5445568A (en) | 1979-04-10 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| GB1602386A (en) | Method of manufacturing semiconductor devices | |
| JPS5935496B2 (en) | Manufacturing method of correction filter for exposure equipment | |
| JPS5845774B2 (en) | Manufacturing method of correction filter for exposure equipment | |
| US3984585A (en) | Vacuum evaporation plating method | |
| US3226253A (en) | Method of producing photosensitive layers of lead selenide | |
| JP3259914B2 (en) | Method for manufacturing mesh filter for forming interference film and apparatus for forming interference film | |
| US1491040A (en) | Process of manufacturing selenium cells for photo-electric work and crystal radiodetectors | |
| JPH0370326B2 (en) | ||
| JPS6212620B2 (en) | ||
| JPH0645885B2 (en) | Deposited film formation method | |
| US2661304A (en) | Method of manufacturing mosaic screens for use in television transmitting tubes | |
| Asao | Photoelectric Properties of Thin Films of Alkali Metals | |
| DeLollis | Method of preparing nickel powder with a large surface area | |
| Yeater et al. | Method of testing a metallic sample | |
| JPS6372128A (en) | Thin film manufacturing device | |
| JP2790900B2 (en) | Method for manufacturing a composite film composed of SiC and Si <3> N <4> and method for manufacturing a mask for X-ray lithography | |
| JP2722578B2 (en) | Manufacturing method of ultraviolet detector | |
| JPH04239742A (en) | Film thickness measuring method in manufacturer of semiconductor | |
| SU1005212A1 (en) | Method of manufacturing colour filters for correcting illumination intensity at exposure of colour kinescope screens | |
| JPS5950167A (en) | Thin film forming device by glow discharge | |
| JPH04286833A (en) | Exposure device for color picture tube screen | |
| JPS61190989A (en) | Manufacture of photoelectric conversion film | |
| JP3001968B2 (en) | Photocathode evaporation source and X-ray image tube | |
| JPS62212605A (en) | Production of optical waveguide | |
| JPS62172764A (en) | Manufacture of cdse photoconductive film |