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JPS5847308B2 - Surface polishing method - Google Patents
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JPS5847308B2 - Surface polishing method - Google Patents

Surface polishing method

Info

Publication number
JPS5847308B2
JPS5847308B2 JP56042279A JP4227981A JPS5847308B2 JP S5847308 B2 JPS5847308 B2 JP S5847308B2 JP 56042279 A JP56042279 A JP 56042279A JP 4227981 A JP4227981 A JP 4227981A JP S5847308 B2 JPS5847308 B2 JP S5847308B2
Authority
JP
Japan
Prior art keywords
workpiece
polisher
particles
fluid
grains
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP56042279A
Other languages
Japanese (ja)
Other versions
JPS57163056A (en
Inventor
利次 黒部
浩 今中
栄十 波田野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
TOYO KENMAZAI KOGYO KK
Original Assignee
TOYO KENMAZAI KOGYO KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by TOYO KENMAZAI KOGYO KK filed Critical TOYO KENMAZAI KOGYO KK
Priority to JP56042279A priority Critical patent/JPS5847308B2/en
Publication of JPS57163056A publication Critical patent/JPS57163056A/en
Publication of JPS5847308B2 publication Critical patent/JPS5847308B2/en
Expired legal-status Critical Current

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B31/00Machines or devices designed for polishing or abrading surfaces on work by means of tumbling apparatus or other apparatus in which the work and/or the abrasive material is loose; Accessories therefor

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)

Description

【発明の詳細な説明】 本発明は新規なる精密表面研摩法に関するものである。[Detailed description of the invention] The present invention relates to a novel precision surface polishing method.

工作物の表面加圧には付刃バイトや、回転切刃等を用い
る切削力目玉、といし等を用いる研削力ロ王、遊離の微
細と粒をラップと工作物の間に注入しラップに圧力を加
えつつラップと工作物に交差運動を与えるラッピング等
の所謂機挾加工法が古くより知られ、またと粒などを工
作物表面に噴射するブラスティング ショットピーニン
グ等、あるいはと粒を超音波を利用し工作物表面に激し
く衝突させる超音波力日王等の技術も逐次開発されてき
た。
To pressurize the surface of the workpiece, use a tool with a cutting edge, a rotating cutting blade, etc. for cutting power, a grinding wheel for grinding, etc., and inject free fine particles between the lap and the workpiece to create a lap. So-called mechanical machining methods such as lapping, which creates intersecting motion between the lap and the workpiece while applying pressure, have been known for a long time. Techniques such as ultrasonic power, which uses energy to violently collide with the surface of a workpiece, have been successively developed.

しかしながらこれらはいづね、も大きな応力場tこより
工作物材料内に先住する転位やクラックの活性化を伴な
った破壊による加工、塑性変形に基づく加工であるため
、塑性変形の現象精度が仕上面精度となり、より高性能
高信頼性の機器を生み出すためにはより高精度の加工技
術の開発が望まれている。
However, these processes are always based on plastic deformation, which is caused by destruction accompanied by the activation of dislocations and cracks existing in the workpiece material due to a large stress field, and therefore the phenomenon accuracy of plastic deformation is dependent on the finished surface accuracy. Therefore, the development of higher precision processing technology is desired in order to produce equipment with higher performance and higher reliability.

ところで全ての材料は原子の結合により構成されている
のであるから、力OIにおける破壊の単位を原子オーダ
ーのものとすることができれば仕上面精度も原子オーダ
ーにまで近づけうる筈である。
By the way, since all materials are composed of atomic bonds, if the unit of fracture in the force OI can be made on the atomic order, the finished surface accuracy should be able to approach the atomic order.

かかる原子オーダーでの除去加工法として電解研摩、化
学研摩などの電気化学的加工法、あるいは電子ビーム力
ロエ、イオンビーム加工法等が鋭意研究されてきた。
As such removal processing methods on the atomic order, electrochemical processing methods such as electrolytic polishing and chemical polishing, electron beam force Loe processing, ion beam processing methods, and the like have been intensively studied.

前者に於ては原子の結合を分離するに要するエネルギー
が電気化学的あるいは化学的に与えられ、また後者にお
いては電子の運動エネルギーが熱エネルギーに変換され
て材料原子の溶融、蒸発が行なわれるとか、あるいはイ
オンの弾性衝突により原子がはじき出されるスパッタ現
象が利用されているが、いづれにしても原子の分離に必
要なエネルギーが何らかの方法fこより付与され、共f
こ原子オーダーの単位での力U工を原理的に行いうる物
理現象を利用しているものと言うことができる。
In the former, the energy required to separate the bonds between atoms is provided electrochemically or chemically, and in the latter, the kinetic energy of electrons is converted into thermal energy, which melts and evaporates the material atoms. Alternatively, the sputtering phenomenon in which atoms are ejected by elastic collisions of ions is used, but in any case, the energy necessary to separate the atoms is applied by some method, and both f
It can be said that this method utilizes a physical phenomenon that can, in principle, perform force U-work in units of the atomic order.

しかしながらこれらの方法の実際の力IJ工に於ては、
それほどよい精度は実現さrしていない。
However, the actual power of these methods in IJ engineering is
Such good accuracy has not been achieved.

電気化学的加工法では材料の不均一性や内部の微視的欠
陥の分布等のため選択的加工がなされるのがその原因と
思われるし、叉一方物理的加工では供給エネルギーが極
めて大きく溶融現象が優先し、また工具としての電子や
イオンが材料表面下に侵入するため加工向あるいは内部
に熱的変質あるいは多数の点欠陥を発生し、加工表面層
の物性が損なわれることが原因しているものであろう。
The reason for this seems to be that in electrochemical processing, selective processing is performed due to the non-uniformity of the material and the distribution of internal microscopic defects, while in physical processing, the supplied energy is extremely large and it is difficult to melt. In addition, electrons and ions from the tool penetrate beneath the surface of the material, causing thermal deterioration or numerous point defects in the machining direction or inside, which impairs the physical properties of the machined surface layer. There must be something there.

従って、力U二表面層の物性を損うことなく該表面原子
を選択的に除去しようとすれば、可及的に微小なただし
電子やイオンよりは大きな工具で機械的に加工エネルギ
ーを供給するのがむしろ有利であることがうかがい知れ
る。
Therefore, in order to selectively remove surface atoms without damaging the physical properties of the surface layer, mechanical processing energy is supplied using a tool as small as possible, but larger than electrons or ions. It can be seen that this is rather advantageous.

勿論従来の切削、研削、ラッピング等の機械的力U工法
では工具切刃の及ぼす応力場の範囲が犬fこすぎるため
材料内に先夜する転位やクラックの振舞いによる塑性変
形を伴った破壊となりやはり加工表面層の物性損傷はま
ぬがれない。
Of course, in conventional mechanical force methods such as cutting, grinding, and lapping, the range of the stress field exerted by the cutting edge of the tool is too large, resulting in fracture accompanied by plastic deformation due to the behavior of dislocations and cracks that occur within the material. After all, damage to the physical properties of the processed surface layer cannot be avoided.

そこで電子やイオンに。比し十分に大きく、ラッピング
等の工具切刃に比し十分に小さな工具(例えば微粒と粒
)を用い、材料の欠陥分布間隔の理想結晶領域に機械的
にエネルギーを与えることができれば欠陥に関与しない
原子オーダーシこ近い加工が可能をこなるであろうこと
が考えられる。
There, it becomes electrons and ions. If it is possible to mechanically apply energy to the ideal crystalline region of the defect distribution interval of the material using a tool that is sufficiently large compared to the cutting edge of a tool such as lapping and sufficiently small compared to the cutting edge of a tool such as lapping, etc., it is possible to cause defects. It is conceivable that processing close to the atomic order would be possible.

かかる考えに基づいて空気と微粒子の混合流を回転円盤
により加速し被加工物に衝突させる加工法、あるいは微
粒粉末をアルカリ性液fこ懸濁した力日工液中で加工物
表面に接近して軸受状態を利用する回転球による加工法
が提案された。
Based on this idea, there is a processing method in which a mixed flow of air and fine particles is accelerated by a rotating disk and collides with the workpiece, or a process in which fine powder is suspended in an alkaline liquid and approaches the surface of the workpiece. A machining method using a rotating ball that utilizes the bearing condition was proposed.

しかしながらこれらの方法によってもなお精度は充分な
ものとはいえずより加工精度の向上した超精密研摩法が
依然要望されている。
However, even with these methods, the accuracy cannot be said to be sufficient, and there is still a need for an ultra-precision polishing method with improved processing accuracy.

液体ホーニングにおいてはと粒を液体に懸濁させた加工
液を圧縮空気の力をかりて40〜50゜の傾斜角で工作
物表面に噴射させているが、微粉末と粒を懸濁した加工
液を工作物表面に作用させ加工を行う場合、工作物材料
の転位欠陥を避けて破壊をおこすには、と粒ができるだ
け工作物の力l玉表面fこ対し平行に近い角度で作用す
ることが望ましい。
In liquid honing, a machining fluid containing grains suspended in a liquid is injected onto the surface of the workpiece at an angle of inclination of 40 to 50 degrees using the force of compressed air. When machining a workpiece surface by applying a liquid to it, in order to avoid dislocation defects in the workpiece material and cause it to break, the particles should act at an angle as close to parallel to the workpiece surface as possible. is desirable.

また加工能率を犬にするため微粒粉末と粒にできるだけ
大きな運動エネルギーを与え工作物表面に作用させるこ
との必要性は勿論のことである。
In order to improve machining efficiency, it is of course necessary to impart as much kinetic energy as possible to the fine powder and grains so that they act on the surface of the workpiece.

そこで工作物の加工表面と極めて狭い間隔で平行に設け
られた対向面との間に、微粒粉末と粒の低粘度流体懸濁
液である加工液を高速度で通過せしめる方法か当然に考
慮せられる。
Therefore, it is natural to consider a method in which a machining fluid, which is a low-viscosity fluid suspension of fine powder and grains, is passed at high speed between the machining surface of the workpiece and an opposing surface provided in parallel with an extremely narrow interval. It will be done.

しかしながら粉末と粒の加速手段に流体の流れを用いる
場合、その加工単位(と粒)が微小であればあるほどそ
の流動状態に特別な考慮をはられねばならない。
However, when using a fluid flow as a means for accelerating powder and grains, the smaller the processing unit (and grains), the more special consideration must be given to the flow state.

即ち上記の如く流体の流路中が決まっているときには、
流体速度が犬fこつれ流動状態が層流から乱流へと移行
する。
That is, when the flow path of the fluid is determined as described above,
As the fluid velocity increases, the flow state changes from laminar to turbulent.

層流では流れの状態は流れ方向に一様で、流体中のと粒
は壁面に垂直方向へは運動しないが、乱流では流れが乱
れていてと粒の運動も一様ではない。
In laminar flow, the flow condition is uniform in the flow direction, and particles in the fluid do not move in the direction perpendicular to the wall surface, but in turbulent flow, the flow is turbulent and the movement of particles is not uniform.

従ってと粒を工作物表面をこできるだけ平行(こ近い角
度で作用させるためには、流体の流動状態は層流である
ことが望ましく、加工液の流速に自ら一定の制限があり
、と粒にできるだけ大きな運動エネルギーを付与するこ
と、ひいては加工能率を犬ならしめることの命題とあい
拮抗することになる。
Therefore, in order to cause the particles to cross the workpiece surface as parallel as possible (at an angle as close as possible), it is desirable that the flow state of the fluid be laminar. This conflicts with the proposition of imparting as much kinetic energy as possible, and ultimately improving machining efficiency.

微粒粉末と粒を懸濁させた流体(770工液)を工作物
加工面と狭い間隔で平行的にもうけられた対向面との間
に層流状態で流動させ、懸濁と粒により表面仕上又は研
摩を行わしめる方法は、従って他の何らかの手段により
乱流を生せしめることなく該と粒自身に大きな運動エネ
ルギーを与え、あるいはと粒の開側]を行なわぬ限り(
こおいては加工能率の点よりして工業的に有利な精密表
面研摩法たり得ぬことが容易に理解されるのである。
A fluid (770 working fluid) in which fine powder and particles are suspended is flowed in a laminar flow state between the workpiece processing surface and an opposing surface that is parallel to each other at a narrow interval, and the suspension and particles create a surface finish. or the method of carrying out the polishing is, therefore, unless by some other means imparting large kinetic energy to the grains themselves without creating turbulence, or by opening the grains (
It is easy to understand that in this case, there is no industrially advantageous precision surface polishing method from the point of view of processing efficiency.

一般に、砂粒とかコロイド粒子を懸濁した液中に2本の
電極を挿入し、この間に直流電圧をかけると粒子は移動
し、粒子側が負に、また溶液側が正に荷電されていると
きは、粒子が陽極へと移動し、この現象を電気泳動とよ
ぶこと、またこのときの粒子の泳動速度υは式υ−εc
E/μ(式中ε、μは溶媒の誘導率、粘性率;Cは粒子
のゼータ電位;Eは電場の大きさ)で与えられることは
衆知である。
Generally, when two electrodes are inserted into a liquid in which sand grains or colloidal particles are suspended, and a DC voltage is applied between them, the particles move.When the particle side is negatively charged and the solution side is positively charged, The particles move toward the anode, and this phenomenon is called electrophoresis, and the migration speed υ of the particles at this time is expressed by the formula υ−εc
It is well known that it is given by E/μ (where ε and μ are the dielectric constant and viscosity of the solvent; C is the zeta potential of the particles; and E is the magnitude of the electric field).

ところで研削工具のと粒として広く用いられている例え
ばS IO2は低粘性流体の代表的な水の中では負に帯
電する。
By the way, for example, SIO2, which is widely used as abrasive grains for grinding tools, is negatively charged in water, which is a typical low-viscosity fluid.

これはS io2の酸性度が非常に大きく、水の塩基仕
度も大きいためである。
This is because the acidity of S io2 is very high and the basicity of water is also high.

非水系溶媒の代表例エチルアルコール中をこおいても、
アルコールの塩基仕度は水より小さいが5102の酸性
度が大きいため、やはり負に帯電している。
Even in ethyl alcohol, a typical example of a non-aqueous solvent,
Although the basicity of alcohol is lower than that of water, since the acidity of 5102 is high, it is also negatively charged.

またAl2O3の場合、酸性度はそれほど大きくないの
で、その面からはアルコール中で負に帯電するとはいい
がたいが、誘電率の面から(コロイド粒子と溶媒の誘電
率がことなるとき、誘電率の大きい力が正に帯電)アル
コールの方がAl2O3よりはるかに誘電率が犬であり
、実際に試験してみてもアルコール中でAl2O3は負
(こ帯電していることが判る。
In addition, in the case of Al2O3, the acidity is not so high, so from that point of view it is difficult to say that it will be negatively charged in alcohol, but from the point of view of dielectric constant (when the dielectric constants of colloidal particles and solvent are different, the dielectric constant The dielectric constant of alcohol is much higher than that of Al2O3 (a large force causes a positive charge), and an actual test shows that Al2O3 is negatively charged in alcohol.

このようにと粒の荷電状態をしらべてみると、水中でも
非水系液体中でも通常力DIMと呼ばれる液体中でと粒
は一般に負に帯電していることが判った。
When examining the charged state of particles in this way, it was found that particles are generally negatively charged in water, non-aqueous liquids, and liquids called DIM.

従って流体中に懸濁せしめられた微粒粉末と粒は電気泳
動的には陽極側へひきつけられ移動する性質をもつ。
Therefore, the fine powder and particles suspended in the fluid have the property of being electrophoretically attracted to and moving toward the anode.

また平行平板コンデシャー(こ電荷を蓄えると極板間の
空間に電場が生じること、磁場の変化により電場の誘導
されることは物理学の初歩的知識である。
In addition, it is elementary knowledge in physics that when parallel plate condensers store electric charge, an electric field is generated in the space between the plates, and that the electric field is induced by changes in the magnetic field.

そこで加工面との間にわずかなすき間を有する対向面が
あるとき、その間にと粒の懸濁された加工液を通じてそ
こへ電場あるいは磁場を働らかせるなら、陽極側となる
加工面、対向面いづれかの面へと粒が引きつけられる電
気泳動現象が生じ、該空間内のいづれかの面側に於てと
粒密度が犬となりひいてはカロ工面に作用すると粒数が
犬となり加工能率の向上へとつながることになる。
Therefore, when there is a facing surface with a slight gap between it and the machined surface, if an electric field or magnetic field is applied there through the working fluid in which particles are suspended, the machined surface that becomes the anode side, and the facing surface An electrophoresis phenomenon occurs in which grains are attracted to one side of the space, and the density of grains increases on either side of the space, which in turn causes the number of grains to increase as it acts on the surface, leading to improved processing efficiency. It turns out.

かくして本発明者らは、微粒粉末と粒が流体に懸濁され
た加工液を、加工面とそれに極めて接近しかつ平行に配
置された対行面との間(こ層流状態で通過させこれによ
り工作物の表面を仕上又は研摩する技術と、液中に分散
している粒子表面に電気二重層が存在して該コロイド粒
子系に電場あるいは磁場を与えた時、粒子が表面電荷(
こより前記の場より力をうけ電気泳動する現象を利用し
、と粒を加工面あるいは対向面に集中させ加工面に作用
すると粒数を制御して力目玉能率を向上させる技術とを
組合せることにより本発明を完成するにいたった。
Thus, the present inventors have developed a system in which a machining liquid in which fine powder and particles are suspended in a fluid is passed between a machining surface and an opposing surface disposed very close to and parallel to the machining surface in a laminar flow state. There is a technique for finishing or polishing the surface of a workpiece by using a method of finishing or polishing the surface of a workpiece, and an electric double layer exists on the surface of particles dispersed in a liquid, and when an electric or magnetic field is applied to the colloidal particle system, the particles have a surface charge (
This utilizes the phenomenon of electrophoresis due to the force exerted by the field, and combines this with a technology that concentrates the grains on the processed surface or the opposing surface and controls the number of grains when acting on the processed surface to improve the efficiency of the grains. This led to the completion of the present invention.

すなわち本発明に従えば、研摩材微粒子の流体懸濁液中
、ポリシャー上に静置せしめた加工物を該ポリシャーの
回転((より流体の動圧で浮上させて、ポリシャー面と
力[」上物との間に前記流体懸濁液の層流を形成せしめ
、同時(こ前記層流を電場あるいは磁場の影響下をこお
いて流体内機粒子を電気泳動により加工物表面あるいは
ポリシャ面側fこ引きつけ力ロエ物表面に作用する研摩
材微粒子数を制御することを特徴とする超精密表面研摩
法が提供せられる。
That is, according to the present invention, a workpiece placed stationary on a polisher in a fluid suspension of fine abrasive particles is floated by the dynamic pressure of the fluid, and the workpiece is placed on the polisher surface and the force ['' A laminar flow of the fluid suspension is formed between the workpiece and the workpiece, and at the same time (this laminar flow is passed under the influence of an electric field or a magnetic field, particles in the fluid are electrophoresed on the workpiece surface or polisher surface side f). An ultra-precision surface polishing method is provided, which is characterized by controlling the number of abrasive fine particles that exert this attraction force on the surface of an object.

狭い間隔で平行に保持された加工物表面と対向面との間
にと粒懸濁液の加工液の層流状態を作らしめるにあたり
、本発明では、研摩材微粒子(と粒)の流体懸濁液、す
なわち加工液中で、ポリシャー上に静置した加工物を該
ポリシャーの回転により流体の動圧で浮上させ、ポリシ
ャーと加工物の間に流体懸濁液の層流を形成せしめる手
段が用いられる。
In order to create a laminar flow state of the processing liquid of the particle suspension between the workpiece surface and the opposing surface that are held in parallel with a narrow interval, the present invention uses a fluid suspension of the abrasive fine particles (and particles). A method is used in which a workpiece placed stationary on a polisher is floated by the dynamic pressure of the fluid by rotation of the polisher in a processing liquid, and a laminar flow of a fluid suspension is formed between the polisher and the workpiece. It will be done.

流体内で、ある物体の静置された支持平板を水平方向に
急速に移動させれば流体の動圧で該物体が支持平板面よ
り浮上する現象は古くより知られているが、これを加工
物の表面研摩に利用することは全く試みられていない。
It has been known for a long time that if a stationary flat support plate of an object is rapidly moved in the horizontal direction in a fluid, the object will rise above the flat support plate due to the dynamic pressure of the fluid. No attempt has been made to use it for polishing the surface of objects.

これは浮上した加工物と支持ポリシャ面との間誓こ極め
て狭い間隔が作られその間に加工液の層が作られたとし
ても、それのみでは支持ポリシャ面を移動させるための
大エネルギーに比しと粒の運動エネルギーが不充分で充
分な研摩効果が得られぬことになるものと思われる。
This means that even if an extremely narrow gap is created between the floated workpiece and the support polisher surface, and a layer of machining fluid is created between them, the amount of energy required to move the support polisher surface alone is insufficient. It is thought that the kinetic energy of the particles is insufficient and a sufficient polishing effect cannot be obtained.

そこで本発明者らは次のこの加工面と対向ポリシャ面と
の間の層液に電場あるいは磁場を付与し流体内機粒子を
電気泳動的に加工物表面あるいは対向ポリシャ面側に引
きつけ加工物表面に作用する微粒子数を増大させ、これ
により加工能率の増大をはかることを意図した。
Therefore, the present inventors applied an electric field or a magnetic field to the laminar liquid between this processed surface and the opposing polisher surface, and electrophoretically attracted the particles in the fluid to the workpiece surface or the opposing polisher surface. The intention was to increase the number of particles acting on the material, thereby increasing processing efficiency.

液体中の分散粒子は一般に電荷を有しそれか粒子半径、
溶媒誘電率ならびにゼータ電位に比例すること、および
一様の電場内にある電荷をもつ粒子が存在すると該粒子
には電場の強さならびに電荷に正比例した静電気力が作
用することはよく知られていることである。
Dispersed particles in a liquid generally have an electric charge or a particle radius,
It is well known that the dielectric constant of a solvent is proportional to the zeta potential, and that when a charged particle exists in a uniform electric field, an electrostatic force that is directly proportional to the strength of the electric field and the electric charge acts on the particle. It is that you are.

今ある一定のすき間りで加工面と対向面が平行に保持さ
れ、負に帯電したと粒がその間を加工面と平行に移動せ
しめられ、加工面が正、対向面が負に帯電するよう直流
電圧Vが印加されるものとする。
If the machined surface and the opposing surface are held parallel with a certain gap, and the particles are negatively charged, they will be moved between them parallel to the machined surface, and a direct current will be applied so that the machined surface is positively charged and the opposing surface is negatively charged. Assume that a voltage V is applied.

すると加工面と対向面の間にはE=V/hなる電場が生
じるので、と粒には静電気的に加工面の方向への力が作
用し、それによりυ。
Then, an electric field of E=V/h is generated between the machined surface and the opposing surface, so an electrostatic force acts on the grain in the direction of the machined surface, causing υ.

の運動速度を生じる。またと粒には重力が作用し一υ
の運動速度も生じるので、加工面への垂直方向には結局
このυ。
yields a velocity of motion. In addition, gravity acts on the grains, and
Since a motion velocity of υ is also generated, in the direction perpendicular to the machined surface, this υ.

とυ8の合力としての運動速度υ が与えられることに
なる。
The velocity of motion υ is given as the resultant force of υ8 and υ8.

他方と粒は流体と同速度でもって加工面に対し平行に移
動しようとの力が働らいているからυ なる横方向への
運動速度も与えられ、加工面に対すると粒の相対速度υ
は により表わされることが判る。
Since a force is acting on the other grain to move parallel to the machined surface at the same speed as the fluid, a lateral motion velocity of υ is also given, and the relative velocity of the grain with respect to the machined surface is υ
It turns out that is expressed by.

すなわち平行に保持された加工面と対向面の間にと粒を
含む加工液が層流状態で通過せしめられ、加工面と対向
面の間に直流電流が印加され電場が作られるとき、υは
層流状態の保持で一定であり、υ は加工液により一定
しているから、と粒に対しては結局υ。
In other words, when a machining fluid containing particles is passed in a laminar flow state between the machined surface and the opposing surface held in parallel, and a DC current is applied between the machined surface and the opposing surface to create an electric field, υ is It is constant when the laminar flow state is maintained, and υ is constant depending on the machining fluid, so for grains, υ.

に比例した加工面に対しての相対速度が与えられること
は明らかである。
It is clear that a relative velocity with respect to the machined surface is given that is proportional to .

電場が強くなればなる程静電気的に加工面の方向へと粒
が引きよせられる力、すなわちと粒のυ。
The stronger the electric field, the more the grain is electrostatically drawn toward the machined surface, i.e., the grain's υ.

運動速度が犬となり、電場はまた加工面と対向面間の距
離が一定しておれぼ印加電圧に比例することからして、
印加電圧の制御により電気泳動すると粒の加工面に対し
ての相対速度を制御なしうろことが容易に理解される。
Since the motion speed is constant, and the distance between the machined surface and the opposing surface is constant and the electric field is proportional to the applied voltage,
It is easily understood that when electrophoresis is performed by controlling the applied voltage, the relative velocity of the grains to the machined surface is uncontrolled.

また加工量がと粒の加工面に接触するときの運動エネル
ギーに比例するものと考えれば、加工量もまた電場の強
さ、すなわち電圧の制御で制御可能であることが理解さ
れるのである。
Furthermore, if we consider that the amount of processing is proportional to the kinetic energy when the grain comes into contact with the processed surface, it is understood that the amount of processing can also be controlled by controlling the strength of the electric field, that is, the voltage.

次fこと粒が対向面に集中する場合、すなわち対向面が
正、加工面または他の電極が負の電極をもつように距離
りをおいて直流電圧Vをかける場合について考察する。
Next, let us consider the case where the grains are concentrated on the opposing surface, that is, when the DC voltage V is applied at a distance such that the opposing surface has a positive electrode and the processed surface or other electrode has a negative electrode.

この場合には加工面または他の電極と対向面の間にE=
V/hなる電場が生じこれ(こよってと粒は対向面へと
ひっばられる。
In this case, E=
An electric field of V/h is generated, which causes the grains to be pulled toward the opposing surface.

こうして対向面上に集中したと粒は対向面との摩擦力に
より対向面と共に運動して加工面へ作用を及ぼすことに
なるが、電場の強さが犬となり対向面へ集中すると粒数
が増大すれば増大する程加工面へ作用すると粒密度が犬
となることが判るし、また対向面とと粒、と粒同志間の
結合力がこの静電気力と重力とにより左右されること、
それらの結合はと粒が加工面と接触しそれから力を受け
れば簡単(こ解けるものであり、と粒が加工面に与える
エネルギーはこの結合力(ご比例していることを考慮す
れば電場すなわち電圧を犬にし静電気力を増大せしめれ
ばせしめるだけ、加工面に与えると粒のエネルギーも犬
になることが容易に理解され、結局電場の強さの制御が
加工量あるいは表面処理効果の制御につながるものであ
る。
When the particles are concentrated on the opposing surface in this way, they move together with the opposing surface due to the frictional force with the opposing surface and act on the machined surface, but when the electric field becomes stronger and concentrates on the opposing surface, the number of particles increases. It can be seen that as the force increases, the grain density increases as it acts on the machined surface, and that the bonding force between grains and the opposing surface is influenced by this electrostatic force and gravity.
These bonds can be easily broken if the carcass grains come into contact with the machined surface and receive force from it, and the energy given by the carcass grains to the machined surface is proportional to this bond force (considering that it is proportional to the electric field) It is easy to understand that by increasing the voltage and increasing the electrostatic force, the energy of the grains increases when applied to the machined surface, and in the end, controlling the strength of the electric field can control the amount of processing or the surface treatment effect. It is something that connects.

ポリシャ上に静置された加工物はその重力とポリシャ回
転による流体動圧による浮力が釣り合った位置でポリシ
ャ面よりある狭い間隔をおいて平行(こ浮揚保持されて
いるが、この加工物と対向ポリシャとをそれぞれ正ある
いは負に帯電せしめることは例えば適当なブラシを用い
るとか、流体懸濁液中に別に電極をもうけ、この電極と
ポリシャーの間に直流電圧を印加することにより容易に
実施できるし、また容器外にコイル電極を置き流体懸濁
液全体を強い磁場の下において前記層流fこ磁場を働ら
かせることも極めて容易である。
The workpiece placed stationary on the polisher is held parallel to the polisher surface at a narrow distance at a position where its gravity and the buoyant force due to the fluid dynamic pressure caused by the rotation of the polisher are balanced. The polisher and the polisher can be easily charged positively or negatively, for example, by using a suitable brush or by providing a separate electrode in the fluid suspension and applying a DC voltage between the electrode and the polisher. It is also extremely easy to place a coil electrode outside the container and apply the laminar magnetic field to the entire fluid suspension under a strong magnetic field.

先をこ述べた如く一般にと粒の流体懸濁液(加工液)中
に於て、流体が水系、非水系を問わず、と粒は負に帯電
されている。
As mentioned above, in general, in a fluid suspension (processing fluid) of grains, the grains are negatively charged, regardless of whether the fluid is aqueous or non-aqueous.

従って電場あるいは磁場の付与によりと粒は電気泳動的
(こ陽極側へと弓かれ、該陽極面上に密に集中する傾向
かある。
Therefore, by applying an electric or magnetic field, the particles tend to be electrophoretically bent toward the anode and concentrated densely on the anode surface.

しかしながら水を刃口上液に用いる場合にはと粒表面の
電離塵が犬で、と粒はイオン化して電解質溶液となり電
極反応で陽極面に吸着さ4ユ、る点に考慮をはられねば
ならない。
However, when water is used as the liquid on the cutting edge, consideration must be given to the fact that the ionized dust on the surface of the grains becomes ionized, becomes an electrolyte solution, and is adsorbed to the anode surface by an electrode reaction. .

そこで以下(こ於ては加工液の溶媒が水系である場合と
、非水系である場合(こわけて考察を加えることとする
Therefore, below (in this case, cases where the solvent of the processing fluid is aqueous and non-aqueous) will be considered separately.

I)非水系溶媒を用いる場合 この場合にはと粒の電離、イオン化は考慮しなくてもよ
いので、刃口工面とポリシャ面のいづれが陽極となって
もその陽極側に微小と粒が電気泳動的に引きよせられ該
面上のと粒密度が犬となり、結局は加工面に作用すると
粒数も犬となり加工能率の向上が期待せられる。
I) When using a non-aqueous solvent In this case, there is no need to consider the ionization and ionization of the grains, so even if either the cutting surface or the polisher surface serves as an anode, the fine grains on the anode side are electrically charged. When the particles are electrophoretically attracted to each other on the surface, the density of the particles increases, and when the particles eventually act on the surface to be processed, the number of particles also decreases, and an improvement in processing efficiency is expected.

層流に電場あるいは磁場を付与するには加工液中の刃口
工面およびポリシャ面をブラシを介し直接直流電源ター
ミナルに接続するとか、加工面とポリシャ面を強い磁場
の影響Tに置くとか、ポリシャ面に対向して加工液中に
電極を置きこの電極とポリシャ面とを直流電源ターミナ
ルに接続し、電場の影響を受けた層流を刃口工面とポリ
シャ面の間の空間に通過せしめる方法など種々の態様で
本発明方法の実施が可能である。
To apply an electric field or a magnetic field to the laminar flow, the cutting surface and the polisher surface in the machining fluid can be directly connected to a DC power terminal via a brush, the machining surface and the polisher surface can be placed under the influence of a strong magnetic field, or the polisher surface can be directly connected to the DC power terminal via a brush. A method in which an electrode is placed in the machining liquid facing the surface, and the electrode and polisher surface are connected to a DC power terminal, and a laminar flow affected by the electric field is passed through the space between the cutting surface and the polisher surface. It is possible to carry out the method of the invention in various ways.

そこで、最も簡単な電極とポリシャ面を直流電源のター
ミナルに直接接続する場合(こつき添付図第1図の装置
を用い下記の如き実験を行なった。
Therefore, the following experiment was conducted using the apparatus shown in Figure 1 of the attached figure, in which the simplest electrode and polisher surface were directly connected to the terminal of a DC power source.

第1図の装置に於て1は非導電性材料で作られた加工液
を収容するための二重円筒容器:2は回転軸3により容
器1内で回転せしめられる金属製ポリシャ;4は加工物
ホルダ;5は加工物ホルダに保持され、作動の初期に金
属製ポリシャ上に静置せしめらるべき加工物;6は電極
;7はブラシ;8は直流電源;9は電圧計;10は電流
計、11は力u上液(研摩材微粒子の流体懸濁液)を表
わす。
In the apparatus shown in Fig. 1, 1 is a double cylindrical container made of a non-conductive material for containing the processing liquid; 2 is a metal polisher rotated within the container 1 by a rotating shaft 3; 4 is a processing liquid. Object holder; 5 is a workpiece held in the workpiece holder and is to be placed stationary on a metal polisher at the beginning of operation; 6 is an electrode; 7 is a brush; 8 is a DC power source; 9 is a voltmeter; 10 is a The ammeter, 11, represents the force u superfluid (fluid suspension of abrasive particles).

この実験装置の容器1に5容積係A1203(8μm)
のアルコール液を加工液として入れ、黄銅製ポリシャ2
上に、アクリル製加工物ホルダー4に保持された20X
20X0.8間のSi単結晶ウェハを加工物5として静
置させ、回転軸3を300rl)II(94m/分)で
回転させて、該刃口上物5をホルダ4と共に流体動圧で
浮上させ刃口上物とポリシャ面の間に加工液の層流状態
を作らしめると共に、ポリシャー側を陽極とし、電極6
との間に直流電圧O〜500Vを印加してポリシャー面
と電極との間に電場を付与し、前記層流のと粒に電気泳
動を生せしめ、その時の加工効果を時間当りの加工量と
印加電圧との関係でしらべ結果を第2図に示した。
5 volumetric A1203 (8 μm) in container 1 of this experimental equipment
Add the alcohol solution as a processing liquid and use the brass polisher 2.
Above, 20X held in acrylic workpiece holder 4
A Si single crystal wafer between 20×0.8 was left still as the workpiece 5, and the rotating shaft 3 was rotated at 300 rl) II (94 m/min) to levitate the blade edge material 5 together with the holder 4 by fluid dynamic pressure. A laminar flow state of the machining liquid is created between the cutting edge material and the polisher surface, and the polisher side is used as an anode, and the electrode 6
An electric field is applied between the polisher surface and the electrode by applying a DC voltage of 0 to 500 V between the polisher surface and the electrode to cause electrophoresis in the grains of the laminar flow, and the processing effect at that time is expressed as the processing amount per hour. Figure 2 shows the results of the investigation in relation to the applied voltage.

図から判るとおり、電圧を増大させ電場を強くすると、
加工液中のと粒は対向ポリシャ面上に集中し、加工面に
作用すると粒密度の増大Eこつれ、加工量が増力口する
効果が顕著に認められる。
As you can see from the figure, if you increase the voltage and strengthen the electric field,
The grains in the machining fluid concentrate on the opposing polisher surface, and when they act on the machining surface, the effect of increasing the grain density and increasing the amount of machining is noticeable.

第1図の装置で電極6の代りに上下方向に移動調節可能
なブラシを用い導電性加工物ホルダーを介しあるいは介
さず直接加工物に電圧を加える方式で加工物とポリシャ
ーの間に直流電圧を印加する方法をとれば、加工物を正
に帯電させ電気泳動で負fこ帯電せると粒を加工物表面
側に引きつけることができ、と粒の運動エネルギーを増
大させ、あるいは加工物表面に作用すると粒数を増大さ
せて表面柱−ヒ又は研摩の制御をなしうろことは極めて
容易に理解されるところである。
In the apparatus shown in Fig. 1, a vertically movable brush is used in place of the electrode 6, and a DC voltage is applied between the workpiece and the polisher by directly applying voltage to the workpiece with or without a conductive workpiece holder. If you use the method of applying voltage, if the workpiece is positively charged and negatively charged by electrophoresis, the grains can be attracted to the workpiece surface, increasing the kinetic energy of the grains or acting on the workpiece surface. It is then very easy to understand that by increasing the number of grains, surface scratches or polishing can be controlled.

2)水を加工液溶媒とする場合 この場合fこはと粒表面の電離度が太きすぎ、加工物に
直接電圧を印加すると、カロエ物表面上で電極反応がお
こりイオン化していると粒は該表面上で電気的に中和し
その上に吸着され結局加工をさまたげることになる。
2) When water is used as a processing liquid solvent In this case, the degree of ionization on the surface of the amber grains is too high, and if a voltage is applied directly to the workpiece, an electrode reaction will occur on the surface of the amber grain and the ionized grains will is electrically neutralized on the surface and adsorbed thereon, eventually interfering with processing.

従ってこの場合には加工物以外に電極をおく第1図の如
き装置が特(こ選択使用せられるべきである。
Therefore, in this case, a device such as that shown in FIG. 1, in which an electrode is placed in addition to the workpiece, should be selectively used.

刃口上面と対向ポリシャ面の間に層流が作られた後この
層流中のと粒に電気泳動現象を生ぜしめと粒を加工面あ
るいは対向ポリシャ面側をこ引きつけることは、単(こ
上記の如く層流を電場の下におくことのみに限定される
ものではなく、同じ作用効果は磁場の付与によっても達
成することができる。
After a laminar flow is created between the upper surface of the cutting edge and the opposing polisher surface, it is easy to cause the particles in this laminar flow to undergo an electrophoretic phenomenon and attract the particles to the processed surface or the opposing polisher surface. The present invention is not limited to placing the laminar flow under an electric field as described above, but the same effect can also be achieved by applying a magnetic field.

すなわち本発明はまた第3図の如き装置でもって実施す
ることもできる。
That is, the present invention can also be practiced with an apparatus such as that shown in FIG.

図示の装置において21は磁極:22は加工物ホルダー
;23は加工物;24は加工液;25はポリシャー:2
6は回転軸;27はコイル;28は容器である。
In the illustrated apparatus, 21 is a magnetic pole; 22 is a workpiece holder; 23 is a workpiece; 24 is a processing fluid; 25 is a polisher; 2
6 is a rotating shaft; 27 is a coil; 28 is a container.

回転軸26のまわりに二重円筒を配置し、内円筒のまわ
りにコイル27を巻き電流を通じて内円筒の外表面と外
円筒の内表面を磁極21とし、回転軸26を中心fこ放
射状の強い磁場を作り、ポリシャ25の回転により加工
物23をホルダー22と共にポリシャ面から浮揚させ、
加工物表面とポリシャ面の間に形成せられる加工液層流
中のと粒に電気泳動を生せしめ磁場の影響でと粒の運動
を制御するものである。
A double cylinder is arranged around the rotating shaft 26, a coil 27 is wound around the inner cylinder, and a current is passed through the outer surface of the inner cylinder and the inner surface of the outer cylinder as magnetic poles 21. A magnetic field is created and the polisher 25 rotates to levitate the workpiece 23 together with the holder 22 from the polisher surface,
This system causes electrophoresis in the grains in the laminar flow of machining liquid that is formed between the surface of the workpiece and the polisher surface, and controls the movement of the grains under the influence of a magnetic field.

第3図の装置で加工液としてA1203(2μm)と粒
を体積分率で5係と5r02(0,02μm)を2係蒸
留水に混入した液を用い、Si単結晶(001)而をA
It 203 & 2000と粒でラッピング仕上げし
た試料を用い、300rpl’でポリシャを回転させ、
試料加工面とポリシャ面り間に層流を形成させ同時に0
〜1.OAのコイル電流を通じ磁場の及ぼす影響をしら
べたところ、電場の如く加工量の著るしい増加は認めら
れなかったが、第4図aに前加工面、bに磁場を掛けず
OAで軸回転による層流のみで1時間処理した加工面、
Cに0.5 Aの電流をコイルに通じ1時間処理した加
工面、旧こIAの電流をコイルに通じ1時間処理した加
工面を示すように、磁場の付与でと粒に電気泳動的な動
きが加えられ結果的には著るしい方向性のある刃口玉痕
として磁場の強さに比例しての力U工効果が認められた
Using the apparatus shown in Figure 3, a solution containing A1203 (2 μm) and grains at volume fractions of 5 and 5r02 (0.02 μm) mixed in 2 volume distilled water was used to process Si single crystals (001) and A1203 (2 μm).
Using a sample wrapped with It 203 & 2000 grains, rotate the polisher at 300 rpl',
A laminar flow is formed between the sample processing surface and the polisher surface, and at the same time
~1. When we examined the influence of the magnetic field through the coil current of the OA, we found that there was no significant increase in the amount of machining as with the electric field. The machined surface was treated for 1 hour using only laminar flow.
As shown in the figure, the processed surface was treated with a current of 0.5 A through a coil for 1 hour, and the processed surface was treated with a current of 0.5 A through a coil for 1 hour. As a result of the added motion, a force U effect proportional to the strength of the magnetic field was observed, resulting in markedly directional blade marks.

尚電場、磁場を付与するにあたり上記においては簡便の
ため直流電圧印力旧こついてのみ説明したが、直流の代
りに交流を用い層流を方位の変動する電場、磁場の影響
下に置き電気泳動でと粒の運動を制御することも本発明
に包含されることが理解さるべきである。
In applying electric and magnetic fields, we have only explained the trick of applying a DC voltage above for the sake of simplicity, but it is possible to perform electrophoresis by using alternating current instead of direct current and subjecting the laminar flow to the influence of an electric or magnetic field whose direction changes. It should be understood that controlling the movement of the grains is also encompassed by the present invention.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明方法の実施に用いられる装置の縦断面図
、第2図は第1図の装置を用い5i(ooi)力ロ工試
料を5%A1203(8μm)アルコール加工液で刃口
上処理した場合の印加電圧と時間当り加工量の関係を示
す図、第3図はさらに別の態様で本発明方法を実施する
際に用いられる装置の縦断面図、第4図a−dは第3図
の装置でSiウェハを加工処理した場合の加工痕を示す
図である。 1・・・・・・容器、2・・・・・・ポリシャ、3・・
・・・・ポリシャ回転軸、4・・・・・・加工物ホルダ
、5・・・・・・加圧物、6・・・・・・電極、7・・
・・・・ブラシ、8・・・・・・電源、11・・・・・
・加工液(研摩材微粒子の流体懸濁液)。
Fig. 1 is a vertical cross-sectional view of the apparatus used to carry out the method of the present invention, and Fig. 2 is a 5i (ooi) mechanically processed sample using the apparatus shown in Fig. 1. A diagram showing the relationship between applied voltage and processing amount per hour in the case of processing, FIG. 3 is a longitudinal cross-sectional view of the apparatus used when carrying out the method of the present invention in yet another embodiment, and FIGS. FIG. 4 is a diagram showing processing marks when a Si wafer is processed using the apparatus shown in FIG. 3; 1...Container, 2...Polisher, 3...
...Polisher rotating shaft, 4... Workpiece holder, 5... Pressure object, 6... Electrode, 7...
...Brush, 8...Power supply, 11...
- Processing fluid (fluid suspension of abrasive particles).

Claims (1)

【特許請求の範囲】[Claims] 1 研摩材微粒子の流体懸濁液中、ポリシャー上に静置
せしめた加工物を該ポリシャーの回転により流体の動圧
で浮上させて、ポリシャー面と加工物との間に、前記懸
濁液の層流を形成せしめ、同時に該層流を電場あるいは
磁場の影響下において、流体内機粒子を加工物表面ある
いはポリシャー面に電気泳動により引きつけ加工物表面
に作用する研摩材微粒子数を制御することを特徴とする
表面研摩法。
1. In a fluid suspension of fine abrasive particles, a workpiece placed on a polisher is floated by the dynamic pressure of the fluid by rotation of the polisher, and the suspension is placed between the polisher surface and the workpiece. Forming a laminar flow, and at the same time subjecting the laminar flow to the influence of an electric or magnetic field, particles within the fluid are electrophoretically attracted to the workpiece surface or polisher surface, thereby controlling the number of abrasive fine particles acting on the workpiece surface. Characteristic surface polishing method.
JP56042279A 1981-03-25 1981-03-25 Surface polishing method Expired JPS5847308B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56042279A JPS5847308B2 (en) 1981-03-25 1981-03-25 Surface polishing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56042279A JPS5847308B2 (en) 1981-03-25 1981-03-25 Surface polishing method

Publications (2)

Publication Number Publication Date
JPS57163056A JPS57163056A (en) 1982-10-07
JPS5847308B2 true JPS5847308B2 (en) 1983-10-21

Family

ID=12631600

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56042279A Expired JPS5847308B2 (en) 1981-03-25 1981-03-25 Surface polishing method

Country Status (1)

Country Link
JP (1) JPS5847308B2 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3727010A1 (en) * 1987-08-13 1989-02-23 Infors Gmbh WATER BATH SCHUETTLER

Also Published As

Publication number Publication date
JPS57163056A (en) 1982-10-07

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