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JPS5853561B2 - How to operate a centrifugal thin film evaporator - Google Patents
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JPS5853561B2 - How to operate a centrifugal thin film evaporator - Google Patents

How to operate a centrifugal thin film evaporator

Info

Publication number
JPS5853561B2
JPS5853561B2 JP1624877A JP1624877A JPS5853561B2 JP S5853561 B2 JPS5853561 B2 JP S5853561B2 JP 1624877 A JP1624877 A JP 1624877A JP 1624877 A JP1624877 A JP 1624877A JP S5853561 B2 JPS5853561 B2 JP S5853561B2
Authority
JP
Japan
Prior art keywords
thin film
processing liquid
film evaporator
rotation speed
centrifugal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP1624877A
Other languages
Japanese (ja)
Other versions
JPS53102275A (en
Inventor
義之 高村
保徳 真崎
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP1624877A priority Critical patent/JPS5853561B2/en
Publication of JPS53102275A publication Critical patent/JPS53102275A/en
Publication of JPS5853561B2 publication Critical patent/JPS5853561B2/en
Expired legal-status Critical Current

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D1/00Evaporating
    • B01D1/22Evaporating by bringing a thin layer of the liquid into contact with a heated surface
    • B01D1/222In rotating vessels; vessels with movable parts
    • B01D1/223In rotating vessels; vessels with movable parts containing a rotor
    • B01D1/225In rotating vessels; vessels with movable parts containing a rotor with blades or scrapers

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Vaporization, Distillation, Condensation, Sublimation, And Cold Traps (AREA)

Description

【発明の詳細な説明】 本発明は、遠心薄膜蒸発装置の運転方法に関するもので
、特に、回転翼が回転軸に対してピン等の滑節を介して
設けられ、回転翼に生じる遠心力によって伝熱面に接し
ながら回転し、処理液に遠心力を与えて薄膜を形成し、
蒸発をさせると同時に薄膜をかき取る作用を行なうこと
によって処理液をスラリ゛−状あるいは粉体状に寸で蒸
発させる遠心薄膜蒸発装置に適するものである。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method of operating a centrifugal thin film evaporator, and in particular, the present invention relates to a method of operating a centrifugal thin film evaporator. It rotates while in contact with the heat transfer surface, applying centrifugal force to the processing liquid and forming a thin film.
It is suitable for a centrifugal thin film evaporator that evaporates the processing liquid into a slurry or powder form by scraping off the thin film at the same time as the evaporation.

従来の遠心薄膜蒸発装置は、供給液の性状と処理目的に
応じて定めた供給量と回転翼の回転数は一定として運転
をし、制御装置としては供給量を一定とするためのもの
や、装置の温度条件を一定とするためのものがほとんど
であった。
Conventional centrifugal thin film evaporators operate with a constant supply rate and rotating speed of the rotor blades, which are determined according to the properties of the supplied liquid and the processing purpose, and the control device is designed to keep the supply rate constant. Most of them were designed to keep the temperature conditions of the equipment constant.

捷たせいぜい一定濃度の蒸発残渣を得るために、供給量
を制御する程度のものであった。
At best, the supply amount was controlled in order to obtain a constant concentration of evaporation residue.

このため、処理液が伝熱面あるいは回転翼に付着し、こ
れが固形物として徐々に成長していく性質のものである
場合や、処理中にこのような性質に変化するものの場合
は、所定の回転数に釦ける遠心力釦よび回転翼が伝熱面
をかき取るかき取り力では付着物を除去することができ
ず、伝熱面および回転翼の付着物のために伝熱性能の低
下、回転翼の過負荷むよび回転翼のバランスのくずれ等
を招くことがあった。
For this reason, if the processing liquid adheres to the heat transfer surface or rotor blade and gradually grows as a solid, or if this property changes during processing, the specified The centrifugal force button that changes the rotation speed and the scraping force that the rotor blade scrapes off the heat transfer surface cannot remove the deposits, and the deposits on the heat transfer surface and the rotor blade reduce heat transfer performance. This may lead to overloading of the rotor blades or loss of balance of the rotor blades.

このため一定時間運転後は付着物の洗滌除去のため、一
時運転を停止しなければならないという欠点があった。
For this reason, there was a drawback that the operation had to be temporarily stopped after a certain period of operation in order to wash and remove the deposits.

本発明の目的は、このような付着性を有する処理液に対
して長時間の連続運転を可能にすることにある。
An object of the present invention is to enable continuous operation for a long period of time for processing liquids having such adhesive properties.

遠心薄膜蒸発装置中特にかき取り方式のものでは、回転
翼の回転数を増せば回転翼の遠心力およびかき取り力は
大きくなり、付着物を除去する作用は大きくなる。
Among centrifugal thin film evaporators, particularly those of the scraping type, as the number of rotations of the rotor blades increases, the centrifugal force and scraping force of the rotor blades increase, and the effect of removing deposits becomes greater.

しかしながら、かき取り力があすりに増加すると形成さ
れた薄膜が回転翼にかき取られてし昔い、回転翼に処理
液が偏よってし1い、伝熱効果の低下を1ねき薄膜蒸発
装置本来の長所が生かせなくなる。
However, when the scraping force increases, the formed thin film is scraped off by the rotary blades, and the processing liquid is biased towards the rotary blades, which reduces the heat transfer effect. The original strengths of the device cannot be utilized.

さらには、伝熱面と回転翼が直接接触し、摩耗が激しく
なると同時に駆動動力も過大なものが必要となる等の短
所がある。
Furthermore, there are disadvantages such as direct contact between the heat transfer surface and the rotor blade, resulting in severe wear and the need for excessive driving power.

本発明の要点は、従来用いられることのなかった高速回
転数における特質に着眼したもので、付着性を有する処
理液を一定時間は従来通り所定の供給量に対し所定の回
転数で運転し、この運転時間中にかき取られずに付着成
長した付着物を除去するために、次の段階において供給
量を減少もしくは停止すると同時に回転翼の回転数を増
し、付着物を除去した後に再び回転数を所定の回転数に
もどし、同時に供給量も所定量として運転を再開し、こ
の動作を繰返し行なうことにより長期間にわたる安定し
た連続運転を可能としたものである。
The main point of the present invention is to focus on the characteristics of high rotational speeds that have not been used in the past. In order to remove the deposits that have grown without being scraped off during this operating time, in the next step, the feed rate is reduced or stopped, and at the same time the rotation speed of the rotor is increased, and after removing the deposits, the rotation speed is increased again. By returning the rotation speed to a predetermined number and at the same time restarting operation with a predetermined supply amount, repeating this operation enables stable continuous operation over a long period of time.

本発明の一実施例を第1,2図に示す。An embodiment of the present invention is shown in FIGS. 1 and 2.

第1図において、処理液は貯槽1に貯えられ、供給ポン
プ2により制御弁3を通じて遠心薄膜蒸発器6に送られ
る。
In FIG. 1, the processing liquid is stored in a storage tank 1 and sent by a supply pump 2 through a control valve 3 to a centrifugal thin film evaporator 6.

遠心薄膜蒸発器6に釦いて、処理液は回転翼7の遠心力
の作用により薄膜が形成され、熱媒ジャケット8からの
熱により蒸発し、ペーパー出口9より排出される。
When the centrifugal thin film evaporator 6 is turned on, the processing liquid is formed into a thin film by the action of the centrifugal force of the rotary blades 7, evaporated by the heat from the heat medium jacket 8, and discharged from the paper outlet 9.

同時に蒸発残渣は回転翼7のかき取り作用によってかき
取られつつ、スラリー状あるいは粉体状となってボトム
排出口10より排出される。
At the same time, the evaporation residue is scraped off by the scraping action of the rotary blades 7 and is discharged from the bottom discharge port 10 in the form of slurry or powder.

この際、処理液の供給量と回転翼の回転数との関係は、
処理液の性状に応じて予め定めてむき、制御装置11に
記憶させる。
At this time, the relationship between the supply amount of processing liquid and the rotation speed of the rotor blade is as follows.
It is predetermined and peeled according to the properties of the processing liquid and stored in the control device 11.

これにより制御弁3をコントロールし供給量を調整する
This controls the control valve 3 and adjusts the supply amount.

同時に回転翼駆動用の無段変速機13を調整する。At the same time, the continuously variable transmission 13 for driving the rotary blades is adjusted.

処理液の供給量と回転翼の回転数の関係の一例を第2図
に示す。
An example of the relationship between the supply amount of the processing liquid and the rotational speed of the rotor blade is shown in FIG.

運転開始より一定時間は、処理液は従来と同様一定供給
量を供給し、同時に回転翼70回転数も所定の回転数で
運転する。
For a certain period of time from the start of operation, the processing liquid is supplied in a constant amount as in the conventional case, and at the same time, the rotary blade 70 is operated at a predetermined rotation speed.

付着性を有する処理液の場合、伝熱面および回転翼7に
徐々に付着物が戒長し、この1捷では運転を続行できな
くなる。
In the case of a treatment liquid that has adhesive properties, deposits gradually accumulate on the heat transfer surface and the rotor blade 7, making it impossible to continue operation with just one treatment.

そこで時間t1の時点で供給量を減少または停止させる
と同時に回転翼70回転数を増加し、遠心力釦よびかき
取り力を太きくすることによって付着物を除去する。
Therefore, at time t1, the supply amount is reduced or stopped, and at the same time the number of revolutions of the rotary blade 70 is increased, and the centrifugal force button and the scraping force are increased to remove the deposits.

付着物を除去した時間t2に勢いて、回転数を所定の回
転数に復帰させ、同時に供給量も再び元の量に寸で戻す
At time t2 after the deposits have been removed, the rotational speed is returned to the predetermined rotational speed, and at the same time, the supply amount is also slightly returned to the original amount.

以後は以上の運転を繰返す。After that, repeat the above operation.

以上のように、本発明は、処理液の供給量を周期的に変
動させ、この変動値に応じて回転翼の回転数を変動させ
ることによって、遠心薄膜蒸発装置に付着して成長する
付着物を除去し、長期間にわたる連続運転を可能にする
効果がある。
As described above, the present invention can prevent deposits that adhere to and grow in a centrifugal thin film evaporator by periodically varying the supply amount of the processing liquid and varying the rotational speed of the rotor blades in accordance with this variation value. It has the effect of removing the gas and enabling continuous operation over a long period of time.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は遠心薄膜蒸発装置を示す図、第2図は供給量と
回転数の関係の一例を示す線図である。 1・・・・・・貯槽、2・・・・・・供給ポンプ、3・
・・・・・制御弁、4・・・・・・戻り弁、5・・・・
・・流量検出器、6・・・・・・遠心薄膜蒸発器、7・
・・・・・回転翼、8・・・・・・熱媒ジャケット、9
・・・・・・ペーパー出口、10・・・・・・ボトム排
出口、11・・・・・・制御装置、12・・・・・・変
速装置、13・・・・・・無段変速機、14・・・・・
・熱媒入口、15・・・・・・熱媒出口。
FIG. 1 is a diagram showing a centrifugal thin film evaporator, and FIG. 2 is a diagram showing an example of the relationship between supply amount and rotation speed. 1... Storage tank, 2... Supply pump, 3.
...Control valve, 4...Return valve, 5...
・・Flow rate detector, 6・・Centrifugal thin film evaporator, 7・
...Rotary blade, 8 ... Heat medium jacket, 9
... Paper outlet, 10 ... Bottom discharge port, 11 ... Control device, 12 ... Transmission device, 13 ... Continuously variable speed Machine, 14...
・Heat medium inlet, 15... Heat medium outlet.

Claims (1)

【特許請求の範囲】 1 回転軸に取付けられた回転翼が遠心力によって伝熱
面を摺動し、伝熱面に処理液の薄膜を形成して蒸発させ
ると同時に、薄膜をかき取る作用を行なわせてスラリー
状あるいは粉体状の蒸発残渣を得る遠心薄膜蒸発装置の
運転方法に3いて、処理液の供給量を周期的に変動させ
、この変動値に応じて回転翼の回転数を変動させること
を特徴とする遠心薄膜蒸発装置の運転方法。 2 処理液の供給を周期的に停止し、この停止中には処
理液供給中の回転数より高い回転数で回転翼を回転させ
、一定時間経過後再び処理液供給中の回転数に復帰させ
ると同時に処理液を供給することを特徴とする特許請求
の範囲第1項記載の遠心薄膜蒸発装置の運転方法。
[Claims] 1. A rotary blade attached to a rotating shaft slides on a heat transfer surface by centrifugal force, forms a thin film of processing liquid on the heat transfer surface, evaporates it, and at the same time has the effect of scraping off the thin film. In the third method of operating a centrifugal thin film evaporator to obtain a slurry-like or powder-like evaporation residue, the supply amount of the processing liquid is periodically varied, and the rotation speed of the rotor blade is varied according to this variation value. A method of operating a centrifugal thin film evaporator, characterized in that: 2. Periodically stop the supply of the processing liquid, and during this stop, rotate the rotor at a higher rotation speed than the rotation speed during the processing liquid supply, and after a certain period of time, return to the rotation speed during the processing liquid supply. A method of operating a centrifugal thin film evaporator according to claim 1, characterized in that a processing liquid is supplied at the same time.
JP1624877A 1977-02-18 1977-02-18 How to operate a centrifugal thin film evaporator Expired JPS5853561B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1624877A JPS5853561B2 (en) 1977-02-18 1977-02-18 How to operate a centrifugal thin film evaporator

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1624877A JPS5853561B2 (en) 1977-02-18 1977-02-18 How to operate a centrifugal thin film evaporator

Publications (2)

Publication Number Publication Date
JPS53102275A JPS53102275A (en) 1978-09-06
JPS5853561B2 true JPS5853561B2 (en) 1983-11-30

Family

ID=11911249

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1624877A Expired JPS5853561B2 (en) 1977-02-18 1977-02-18 How to operate a centrifugal thin film evaporator

Country Status (1)

Country Link
JP (1) JPS5853561B2 (en)

Also Published As

Publication number Publication date
JPS53102275A (en) 1978-09-06

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