JPS5910253B2 - gas treatment equipment - Google Patents
gas treatment equipmentInfo
- Publication number
- JPS5910253B2 JPS5910253B2 JP55094993A JP9499380A JPS5910253B2 JP S5910253 B2 JPS5910253 B2 JP S5910253B2 JP 55094993 A JP55094993 A JP 55094993A JP 9499380 A JP9499380 A JP 9499380A JP S5910253 B2 JPS5910253 B2 JP S5910253B2
- Authority
- JP
- Japan
- Prior art keywords
- bottom plate
- gas
- gas treatment
- scraper
- treated
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J8/00—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes
- B01J8/08—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with moving particles
- B01J8/12—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with moving particles moved by gravity in a downward flow
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Treating Waste Gases (AREA)
- Separation Of Gases By Adsorption (AREA)
- Devices And Processes Conducted In The Presence Of Fluids And Solid Particles (AREA)
Description
【発明の詳細な説明】
本発明は種々の物理的および化学的操作を行うだめの装
置に関し、さらに詳細には、粒体にガスを接触させ粒体
にガス中の或る成分を吸着させ、又は接触によって化学
反応をさせるだめの装置に関するもので、特に連続して
接触作用を行うのに効果的な装置の構成に係るものであ
る。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to an apparatus for performing various physical and chemical operations, and more particularly, it involves bringing gas into contact with granules to cause the granules to adsorb a certain component in the gas; Or, it relates to an apparatus for causing a chemical reaction by contact, and in particular, it relates to an apparatus structure that is effective for carrying out a continuous contact action.
ガス中の或る成分を粒体に吸着あるいは粒体と接触反応
させる装置には燃焼排ガス中のSO2を活性炭に吸着さ
せる脱硫装置、タンクベントガス中の炭化水素吸着装置
あるいは燃焼排ガス中のNOXガスの脱硝装置などがあ
る。Devices that adsorb certain components in gas to particles or react with particles include desulfurization devices that adsorb SO2 in flue gas to activated carbon, devices that adsorb hydrocarbons in tank vent gas, or devices that absorb NOx gas in flue gas. There are denitrification equipment, etc.
しかし、使用する処理粒体の機能には限度があり劣化を
防止して対象装置および本装置自身の安定かつ幼果的操
業を遂行するために接触作用を停止せずに一定の効率を
保って連続作業を行なうことが望ましく処理物質は連続
して入れ替えられなければならない。However, the function of the treated granules used is limited, and in order to prevent deterioration and to achieve stable and effective operation of the target equipment and this equipment itself, it is necessary to maintain a certain efficiency without stopping the contact action. Continuous operation is desirable and the material to be treated must be replaced continuously.
従来粒体物質の排出法には、電磁振動フイーダ、ロータ
リフイーダ、ダンパ、或はテーブルフイーダ等が用いら
れそれらの効果には一長一短があり、いずれも粒体破壊
度および定量排出性において満足し得ない点が多かった
。Conventional methods for discharging granular materials include electromagnetic vibration feeders, rotary feeders, dampers, table feeders, etc., and each has its advantages and disadvantages, but all of them are satisfactory in terms of the degree of granule destruction and quantitative discharge performance. There were many things I couldn't do.
本発明は上述の欠点を克服するために、接触槽内充填物
を定量的にかつ破損を伴うことなく、さらには大型接触
槽でも充填物の偏流落下もなく均一に取出し得る排出機
構を具備したガス処理装置を提供することを目的とする
。In order to overcome the above-mentioned drawbacks, the present invention is equipped with a discharge mechanism that can uniformly take out the filling in the contact tank quantitatively and without damage, and even in a large contact tank without drifting and falling of the filling. The purpose is to provide a gas processing device.
すなわち本発明は、ガス処理用物質を含む1個以上のガ
ス処理層を内蔵するガス処理装置において、被処理ガス
が導入され処理後のガスが導出される容器と、該容器内
に粒状ガス処理物質より成る該ガス処理層を内装する一
対の有隙板および底板を有する接触槽を1個以上設け、
該一対の有隙板の一方の下端部と該底板との間にぱ切欠
部が形成され、該底板には奥行方向に延長するスリット
および巾方向に延長する開口部が形成され、該底板上に
奥行方向の往復動可能なスクレイパが配設され、該底板
の下部にはホツパー状の下部シュートが装着され、該下
部シュートの下端には排出弁を設け、前記切欠部より溢
出して前記底板上に安負角内に形成される前記処理質を
前記スクレイパにより該スリットおよび該開口部を経て
掻出して前記下部シュートに受納した後前記排出弁より
排出することにより定量掻取部と排出部とを分離したこ
とを特徴とするガス処理装置である。That is, the present invention provides a gas treatment device that incorporates one or more gas treatment layers containing a gas treatment substance, including a container into which a gas to be treated is introduced and a gas to be treated is discharged, and a granular gas treatment layer in the container. providing one or more contact tanks each having a pair of gap plates and a bottom plate containing the gas treatment layer made of a substance;
A cutout is formed between the lower end of one of the pair of gap plates and the bottom plate, and the bottom plate has a slit extending in the depth direction and an opening extending in the width direction. A scraper capable of reciprocating in the depth direction is provided, a hopper-shaped lower chute is attached to the lower part of the bottom plate, and a discharge valve is provided at the lower end of the lower chute, so that the scraper overflows from the notch to the bottom plate. The treated material formed within the upper stabilization angle is scraped out by the scraper through the slit and the opening, received in the lower chute, and then discharged from the discharge valve to form a quantitative scraping section and discharge. This is a gas treatment device characterized by having separate parts.
以下附図を参照しつつ本発明を説明する。The present invention will be explained below with reference to the accompanying drawings.
第1図乃至第3図は本発明の処理装置を具備した連続移
動層式接触装置の1実施例の正面、側面および平面図、
第4図は本発明による粒体掻取装置の1実施例を示す断
面図、第5a,b図は第4図の線A−Aに沿ってとられ
た断面図で、第5aおよび第5b図はそれぞれ形状を異
にするスクレイパを装備した図である。1 to 3 are front, side and plan views of an embodiment of a continuous moving bed contact device equipped with the processing device of the present invention,
FIG. 4 is a sectional view showing one embodiment of the granule scraping device according to the present invention, and FIGS. 5a and 5b are sectional views taken along line A-A in FIG. The figures are each equipped with scrapers of different shapes.
処理容器1の中には所定間隔を保って平行に対向する2
枚の有隙板2によって区割される接触槽3が1列あるい
は複数列、処理容器内に直立に併設して形成されている
。Inside the processing container 1, there are two parallel plates facing each other with a predetermined distance therebetween.
One or more rows of contact tanks 3 divided by a number of gap plates 2 are arranged vertically in parallel within the processing container.
実施例では4列接触槽の例を示したが、特に列数を限定
するものではない。In the embodiment, an example of a four-row contact tank was shown, but the number of rows is not particularly limited.
ガスは図中矢印で示したように接触槽3のガス通過断面
と並行に処理容器内1に入り、接触槽3の列数に応じて
均一に分割され、各接触槽3に直角に入りこれを通過し
たガスは合流して処理容器1を出る。Gas enters the processing container 1 parallel to the gas passage cross section of the contact tank 3 as shown by the arrow in the figure, is divided uniformly according to the number of rows of the contact tank 3, and enters each contact tank 3 at right angles. The gases that have passed through merge and exit the processing container 1.
さて本形式の処理容器1では接触槽3の列数および各接
触槽の高さ、奥行、厚みなどの大きさは処理容器の能力
および条件すなわちガスの空塔速度および線速あるいは
処理物質による圧力損失などの諸因子により任意に選定
できる。Now, in the processing container 1 of this type, the number of rows of contact tanks 3 and the height, depth, thickness, etc. of each contact tank are determined by the capacity and conditions of the processing container, that is, the superficial velocity and linear velocity of gas, or the pressure due to the processing material. It can be arbitrarily selected depending on various factors such as loss.
又、有隙板2としては金網、パンチングプレートあるい
はルーバーなど任意のものを用いることができ、さらに
金網の目開き、パンチングプレートの孔の形状および孔
の大きさあるいはルーバーの長さ、ピッチおよび傾斜な
どは処理物質の種類、大きさおよび処理ガスの性状、ガ
ス線速などに応じて任意に選定できる。Further, as the gap plate 2, any material such as a wire mesh, a punching plate, or a louver can be used, and the opening of the wire mesh, the shape and size of the hole in the punching plate, or the length, pitch, and inclination of the louver can be adjusted. etc. can be arbitrarily selected depending on the type and size of the processing substance, the properties of the processing gas, the gas linear velocity, etc.
接触槽3の上部は装入弁8を介して再生装置7に連通し
、接触槽3の下部にはホッパ状の下部シュート10が配
設され、下部シュート10の下端部に排出弁5(例えば
ロータリバルブ等)が装着される。The upper part of the contact tank 3 communicates with the regenerator 7 via the charging valve 8, the lower part of the contact tank 3 is provided with a hopper-shaped lower chute 10, and the lower end of the lower chute 10 is equipped with a discharge valve 5 (e.g. (rotary valve, etc.) is installed.
排出弁5と再生装置7とは輸送装置6により連絡され接
触槽3内の物質を循環させる。The discharge valve 5 and the regeneration device 7 are connected by a transport device 6 to circulate the substance in the contact tank 3.
つぎに第4図,第5a図および第5b図を参照して接触
槽3の下部の構成について詳細な説明する。Next, the structure of the lower part of the contact tank 3 will be explained in detail with reference to FIGS. 4, 5a and 5b.
接触槽3および3′の2列が一組に配置され、それぞれ
の底部を共に覆う底板9が配置される。Two rows of contact tanks 3 and 3' are arranged in a set, and a bottom plate 9 is arranged to cover the bottoms of each tank.
接触槽3,3′それぞれの外有隙板2a,2a’の下端
は底板9と密着され、内有隙板2bt2b’の下端と底
板9との間には間隙が設けられ切欠部12がそれぞれ形
成される。The lower ends of the outer gap plates 2a and 2a' of the contact tanks 3 and 3' are in close contact with the bottom plate 9, and a gap is provided between the lower ends of the inner gap plates 2bt2b' and the bottom plate 9, and a notch 12 is formed in each of the contact tanks 3 and 3'. It is formed.
底板9には奥行方向に延長するスリット10aが形成さ
れる。A slit 10a extending in the depth direction is formed in the bottom plate 9.
また底板9の上面にはスクレイパ4が奥行方向に往復動
可能に配置される。Further, a scraper 4 is arranged on the upper surface of the bottom plate 9 so as to be able to reciprocate in the depth direction.
スリット10aの巾S2より小さい。It is smaller than the width S2 of the slit 10a.
底板9の奥行方向の端部には開口部11が形成される。An opening 11 is formed at the end of the bottom plate 9 in the depth direction.
底板9の下部にはホッパ状の下部シュート10が装着さ
れ、スリツNOaおよび開口部11は下部シュート10
に開口する。A hopper-shaped lower chute 10 is attached to the lower part of the bottom plate 9, and the slot NOa and the opening 11 are connected to the lower chute 10.
Open to.
次に処理物質の抜出しについて述べる。Next, the extraction of the processed material will be described.
第4図に示すように接触槽3,3′ 内の一般に粒状の
処理物質13は切欠部12より溢出し各々の接触槽3底
部に配設された底板9上の奥行方向全長にわたって安息
角を形成して滞留する。As shown in FIG. 4, the generally granular treated material 13 in the contact tanks 3, 3' overflows from the notch 12 and maintains an angle of repose over the entire length in the depth direction on the bottom plate 9 disposed at the bottom of each contact tank 3. Form and stay.
安息角に形成された処理物質13をスクレイパ4を往復
させることによって掻取る。The treated material 13 formed at the angle of repose is scraped off by reciprocating the scraper 4.
なお安息角分の処理物質13を掻取った後には処理物質
自身の自重で直ちに新しい安息角が以前と同一の形で形
成される。Note that after scraping off the treated material 13 corresponding to the angle of repose, a new angle of repose is immediately formed in the same shape as before due to the weight of the treated material itself.
掻取った処理物質は処理容器下部の下部シュート10の
ホツパー状部を滑り落ち、該絞り口に設けた排出弁5(
例えばロータリバルブまたぱ二重タンパなど)の中へ落
下させ、さらにコンベアとパケットエレベータ等の組合
せによる機械あるいは空気輸送装置6を用いて再生装置
7に送り、ここで処理物質をスチーミング、ふるい、焼
成あるいは化学処理などの再生操作を行った後に装入弁
8(例えばロータリバルブまたは二重ダンパなど)を経
て処理容器1へ循環補給する。The scraped processing material slides down the hopper-shaped part of the lower chute 10 at the bottom of the processing container, and passes through the discharge valve 5 (
For example, a rotary valve or a double tamper) is used to transport the treated material to a regeneration device 7 using a machine such as a combination of a conveyor and a packet elevator or a pneumatic transport device 6, where the treated material is steamed, sieved, etc. After performing a regeneration operation such as firing or chemical treatment, it is circulated and replenished into the processing vessel 1 via a charging valve 8 (for example, a rotary valve or a double damper).
さてスクレイパ4の往復摺動け電動式あるいは空気圧式
など通常の方法で実施できる。Now, the reciprocating sliding movement of the scraper 4 can be carried out by a conventional method such as an electric type or a pneumatic type.
またスクレイパ4の設置位置け接触槽のガス入口側ある
いは出口側のいずれでも特に支障ないが、ガスの漏洩防
止および接触槽の区割に特にルーバーを使用したときに
起る可能性のある処理物質の接触槽からのオーバーフロ
一対策すなわちオーバーフローした充填物を円滑に抜出
し再循環出来るようにするためには、接触槽のガス出口
側の方が有利である。There is no particular problem with the installation position of the scraper 4 on either the gas inlet side or the outlet side of the contact tank; The gas outlet side of the contact tank is more advantageous in order to prevent overflow from the contact tank, that is, to enable smooth extraction and recirculation of the overflowing filler.
又、スクレイパ4の基数は接触槽1列あたり1基でも不
都合はないが掻取部のバランス上および処理物質の排出
、装入設備が簡素化できるなどの利点を有する接触槽2
列あたり1基の方式の方が有利である。In addition, although there is no problem with the number of scrapers 4 being one per row of contact tanks, the contact tank 2 has advantages such as improving the balance of the scraping section and simplifying the discharge and charging equipment for the treated material.
A one per column approach is advantageous.
本発明によるスクレイパ装置の1実施例を第4図、およ
び該図のA−A断面を示す第5a図、第5b図を参照し
て述べれば、
1)底板9上に安息角をなした粒体状物質13を往復動
するスクレイパ4にて底板上を摺動させてスクレイパ4
の巾S2の部分を掻取る。One embodiment of the scraper device according to the present invention will be described with reference to FIG. 4, and FIGS. 5a and 5b showing the A-A cross section of the figure. 1) Grains forming an angle of repose on the bottom plate 9. The scraper 4 reciprocates the physical substance 13 by sliding it on the bottom plate.
Scrape off a portion of width S2.
2)掻取られた粒体ぱ底板に奥行方向に切られたスリッ
ト10aより下部シュート10に落下する。2) The scraped particles fall into the lower chute 10 through a slit 10a cut in the depth direction in the bottom plate.
3)底板の両端は第5図に示す如く開口部11が下部の
シュート10に対し形成されており、スクレイパ4にて
押された粒体状物質13は開口部11より落下し、堆積
によるスクレイパ4の動きを阻害することはない。3) At both ends of the bottom plate, openings 11 are formed relative to the chute 10 at the bottom as shown in FIG. It does not hinder the movement of 4.
4)スクレイパ4け第5a図に示す板状の如き任意好適
な形状を用いることができるが、例えば第5b図に示す
如く三角形状とすれば、粒体状物質13の掻取りに対し
一層滑り易く、又スクレイパ下部にガイドプレートを設
け底板のスリット10a部をガイドとして摺動させる事
により安定な往復動が可能である。4) 4 scrapers Any suitable shape can be used, such as the plate shape shown in FIG. 5a. For example, a triangular shape as shown in FIG. Furthermore, by providing a guide plate at the bottom of the scraper and sliding it using the slit 10a of the bottom plate as a guide, stable reciprocating movement is possible.
以上本発明の装置はその実施例を示す図面によって詳述
したとおりであり、次のようなすぐれた効果が期待でき
る。The apparatus of the present invention has been described in detail with reference to the drawings showing the embodiments thereof, and the following excellent effects can be expected.
1.接触槽底部の奥行方向全長にわたって形成された粒
体の安息角分を掻取る本方式は、掻取り後の新たな粒体
の安息角形成が瞬時にかつ奥行方向の長さに関係なく全
て同一の形でなされるため、すなわち接触槽よりの処理
物質の落下が奥行方向全て均一であるため装置の大型化
が容易である。1. This method scrapes the angle of repose of the grains formed over the entire length of the bottom of the contact tank in the depth direction, and the angle of repose of the new grains formed after scraping is instantaneous and the same regardless of the length in the depth direction. In other words, since the material to be treated falls uniformly from the contact tank in the entire depth direction, it is easy to increase the size of the device.
2.上記安息角形成はくり返し再現性が良いため、抜出
し量の定量安定化ができる。2. Since the above-described angle of repose formation has good repeatability, the amount of extraction can be quantitatively stabilized.
3.スクレイパの摺動および停止を任意にかつ容゜易に
できるので、粒体の抜出したタイマーのみの変更により
間欠又は連続のいずれでも自由にできる。3. Since the scraper can be moved and stopped easily and arbitrarily, the scraper can be operated either intermittently or continuously by changing only the timer for extracting the particles.
4.粒体の定量掻取部と排出部とを分離させ、定量掻取
部より掻取られた粒体ぱそこに設けたスリットよシホツ
パー状の受納手段内に落されるので、この受納手段のホ
ッパ状部の壁面に粒体が層をなくして付着することはな
く、従って排出部より粒体ぱ一様に(粒体の一部が長時
間滞留することなく)排出され、粒体の触媒機能の再生
を容易にする。4. The quantitative scraping part and the discharge part for the grains are separated, and the grains scraped from the quantitative scraping part are dropped into the hopper-shaped receiving means through a slit provided there. The granules do not adhere to the wall surface of the hopper-shaped part without a layer, and therefore the granules are uniformly discharged from the discharge part (without some of the granules remaining for a long time), and the granules are catalyzed by Facilitate playback of features.
またホツパー状受納手段の下端部には排出手段が設けら
れているので定量掻取部は装置内にあり、この定量掻取
部で粒体の切取をする場合、この部分から処理されるガ
スが装置より外界に洩れることはない。In addition, since the discharge means is provided at the lower end of the hopper-shaped storage means, the quantitative scraping section is located inside the device, and when the granules are cut with this quantitative scraping section, the gas processed from this section is will not leak from the device to the outside world.
第1図は本発明の処理装置を具備した連続移動層式接触
装置の正面図、第2図は第1図装置の側面図、第3図は
該装置の平面図、第4図は本発明による粒体掻取装置の
1実施例を示す断面図、第5atb図は第4図の線A−
Aに沿ってとられた断面図で、第5aおよび第5b図は
それぞれ形状を異にするスクレイパを装備した図である
。
1・・・・・・処理容器、2・・・・・・有隙板、3・
・・・・・接触槽、4・・・・・・スクレイパ、5・・
・・・・排出弁、6・・・・・・輸送装置、7・・・・
・・再生装置、8・・・・・・装入弁、9・・・・・・
底板、10・・・・・・下部シュート、10a・・・・
・・スリット、11・・・・・・開口部、12・・・・
・・切欠部、13・・・・・・物質。FIG. 1 is a front view of a continuous moving bed contact device equipped with the processing device of the present invention, FIG. 2 is a side view of the device shown in FIG. 1, FIG. 3 is a plan view of the device, and FIG. FIG.
Figures 5a and 5b are cross-sectional views taken along line A, each equipped with a scraper of a different shape. 1... Processing container, 2... Gap plate, 3.
...Contact tank, 4...Scraper, 5...
...Discharge valve, 6...Transport device, 7...
...Regeneration device, 8...Charging valve, 9...
Bottom plate, 10...Lower chute, 10a...
...Slit, 11...Opening, 12...
...notch, 13...substance.
Claims (1)
するガス処理装置において、被処理ガスが導入され処理
後のガスが導出される容器と、該容器内に粒状ガス処理
物質より成る該ガス処理層を内装する一対の有隙板およ
び底板を有する接触槽を1個以上設け、該一対の有隙板
の一方の下端部と該底板との間には切欠部が形成され、
該底板には奥行方向に延長するスリットおよび巾方向に
延長する開口部が形成され、該底板上に奥行方向の往復
動可能なスクレイパが配設され、該底板の下部にはホツ
パー状の下部シュートが装着され、該下部シュートの下
端には排出弁を設け、前記切矢部より溢出して前記底板
上に安負角内に形成される前記処理質を前記スクレイパ
により該スリットおよび該開口部を経て掻出して前記下
部シュートに受納した後前記排出弁より排出するように
して定量掻取部と排出部とを分離した構造であることを
特徴とするガス処理装置。1. A gas treatment device that incorporates one or more gas treatment layers containing a gas treatment substance, including a container into which a gas to be treated is introduced and a gas to be treated is discharged, and a gas treatment layer containing a particulate gas treatment substance in the container. One or more contact tanks each having a pair of gap plates containing a gas treatment layer and a bottom plate are provided, and a notch is formed between the lower end of one of the pair of gap plates and the bottom plate,
A slit extending in the depth direction and an opening extending in the width direction are formed in the bottom plate, a scraper capable of reciprocating in the depth direction is disposed on the bottom plate, and a hopper-shaped lower chute is provided at the bottom of the bottom plate. is installed, and a discharge valve is provided at the lower end of the lower chute, so that the treated material overflowing from the cut arrow part and formed on the bottom plate within a safe angle is passed through the slit and the opening by the scraper. A gas processing device characterized in that the quantitative scraping part and the discharge part are separated so that the scraped gas is stored in the lower chute and then discharged from the discharge valve.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP55094993A JPS5910253B2 (en) | 1980-07-14 | 1980-07-14 | gas treatment equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP55094993A JPS5910253B2 (en) | 1980-07-14 | 1980-07-14 | gas treatment equipment |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS56102932A JPS56102932A (en) | 1981-08-17 |
| JPS5910253B2 true JPS5910253B2 (en) | 1984-03-07 |
Family
ID=14125390
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP55094993A Expired JPS5910253B2 (en) | 1980-07-14 | 1980-07-14 | gas treatment equipment |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5910253B2 (en) |
-
1980
- 1980-07-14 JP JP55094993A patent/JPS5910253B2/en not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPS56102932A (en) | 1981-08-17 |
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