JPS5913588B2 - Manufacturing method for products with glassy coating - Google Patents
Manufacturing method for products with glassy coatingInfo
- Publication number
- JPS5913588B2 JPS5913588B2 JP266279A JP266279A JPS5913588B2 JP S5913588 B2 JPS5913588 B2 JP S5913588B2 JP 266279 A JP266279 A JP 266279A JP 266279 A JP266279 A JP 266279A JP S5913588 B2 JPS5913588 B2 JP S5913588B2
- Authority
- JP
- Japan
- Prior art keywords
- film
- solution
- aqueous
- silicate
- water
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000011248 coating agent Substances 0.000 title claims description 8
- 238000000576 coating method Methods 0.000 title claims description 8
- 238000004519 manufacturing process Methods 0.000 title claims description 6
- 239000000243 solution Substances 0.000 claims description 26
- 239000000463 material Substances 0.000 claims description 25
- 239000007864 aqueous solution Substances 0.000 claims description 22
- 239000002253 acid Substances 0.000 claims description 21
- 229910052910 alkali metal silicate Inorganic materials 0.000 claims description 21
- 238000001035 drying Methods 0.000 claims description 14
- AZDRQVAHHNSJOQ-UHFFFAOYSA-N alumane Chemical class [AlH3] AZDRQVAHHNSJOQ-UHFFFAOYSA-N 0.000 claims description 13
- 238000000034 method Methods 0.000 claims description 9
- 239000011521 glass Substances 0.000 claims description 8
- 238000005507 spraying Methods 0.000 claims description 3
- 238000007654 immersion Methods 0.000 claims description 2
- 239000012266 salt solution Substances 0.000 claims description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 25
- 238000006253 efflorescence Methods 0.000 description 18
- 206010037844 rash Diseases 0.000 description 18
- 235000019353 potassium silicate Nutrition 0.000 description 13
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 11
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 9
- 239000000047 product Substances 0.000 description 9
- RAHZWNYVWXNFOC-UHFFFAOYSA-N Sulphur dioxide Chemical compound O=S=O RAHZWNYVWXNFOC-UHFFFAOYSA-N 0.000 description 8
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 7
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 description 7
- 239000003513 alkali Substances 0.000 description 7
- 239000004111 Potassium silicate Substances 0.000 description 5
- 229910052782 aluminium Inorganic materials 0.000 description 5
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 5
- PAZHGORSDKKUPI-UHFFFAOYSA-N lithium metasilicate Chemical compound [Li+].[Li+].[O-][Si]([O-])=O PAZHGORSDKKUPI-UHFFFAOYSA-N 0.000 description 5
- 229910052912 lithium silicate Inorganic materials 0.000 description 5
- 229910052913 potassium silicate Inorganic materials 0.000 description 5
- NNHHDJVEYQHLHG-UHFFFAOYSA-N potassium silicate Chemical compound [K+].[K+].[O-][Si]([O-])=O NNHHDJVEYQHLHG-UHFFFAOYSA-N 0.000 description 5
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 4
- 239000000919 ceramic Substances 0.000 description 4
- 230000000052 comparative effect Effects 0.000 description 4
- 239000004033 plastic Substances 0.000 description 4
- 229920003023 plastic Polymers 0.000 description 4
- 238000006467 substitution reaction Methods 0.000 description 4
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 3
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 3
- 239000004115 Sodium Silicate Substances 0.000 description 3
- 229910052783 alkali metal Inorganic materials 0.000 description 3
- 150000001340 alkali metals Chemical class 0.000 description 3
- 229910052802 copper Inorganic materials 0.000 description 3
- 239000010949 copper Substances 0.000 description 3
- 239000007789 gas Substances 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 229910017604 nitric acid Inorganic materials 0.000 description 3
- 235000011121 sodium hydroxide Nutrition 0.000 description 3
- 229910052911 sodium silicate Inorganic materials 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- 150000007513 acids Chemical class 0.000 description 2
- DIZPMCHEQGEION-UHFFFAOYSA-H aluminium sulfate (anhydrous) Chemical compound [Al+3].[Al+3].[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O DIZPMCHEQGEION-UHFFFAOYSA-H 0.000 description 2
- VSCWAEJMTAWNJL-UHFFFAOYSA-K aluminium trichloride Chemical compound Cl[Al](Cl)Cl VSCWAEJMTAWNJL-UHFFFAOYSA-K 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 230000007797 corrosion Effects 0.000 description 2
- 238000005260 corrosion Methods 0.000 description 2
- 239000003599 detergent Substances 0.000 description 2
- 230000007935 neutral effect Effects 0.000 description 2
- BNGXYYYYKUGPPF-UHFFFAOYSA-M (3-methylphenyl)methyl-triphenylphosphanium;chloride Chemical compound [Cl-].CC1=CC=CC(C[P+](C=2C=CC=CC=2)(C=2C=CC=CC=2)C=2C=CC=CC=2)=C1 BNGXYYYYKUGPPF-UHFFFAOYSA-M 0.000 description 1
- FUJCRWPEOMXPAD-UHFFFAOYSA-N Li2O Inorganic materials [Li+].[Li+].[O-2] FUJCRWPEOMXPAD-UHFFFAOYSA-N 0.000 description 1
- 229910002651 NO3 Inorganic materials 0.000 description 1
- 230000005856 abnormality Effects 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 229910000329 aluminium sulfate Inorganic materials 0.000 description 1
- 235000011128 aluminium sulphate Nutrition 0.000 description 1
- 239000011260 aqueous acid Substances 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 239000002585 base Substances 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000001569 carbon dioxide Substances 0.000 description 1
- 229910002092 carbon dioxide Inorganic materials 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000005238 degreasing Methods 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- XUCJHNOBJLKZNU-UHFFFAOYSA-M dilithium;hydroxide Chemical compound [Li+].[Li+].[OH-] XUCJHNOBJLKZNU-UHFFFAOYSA-M 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 238000005187 foaming Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- -1 nSlO 2 Chemical compound 0.000 description 1
- 238000006386 neutralization reaction Methods 0.000 description 1
- 230000003472 neutralizing effect Effects 0.000 description 1
- 235000019645 odor Nutrition 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 239000012466 permeate Substances 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- RLQWHDODQVOVKU-UHFFFAOYSA-N tetrapotassium;silicate Chemical compound [K+].[K+].[K+].[K+].[O-][Si]([O-])([O-])[O-] RLQWHDODQVOVKU-UHFFFAOYSA-N 0.000 description 1
- 230000009466 transformation Effects 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Landscapes
- Surface Treatment Of Glass (AREA)
Description
【発明の詳細な説明】
この発明はガラス質皮膜を有する製品の製法に関するも
のである。DETAILED DESCRIPTION OF THE INVENTION This invention relates to a method of manufacturing a product having a vitreous coating.
5 ガラス質皮膜を有する製品は、ガラス、プラスチッ
クス、セラミックス等の表面に金属層を形成(蒸着、め
つき、張り合わせ等による)してなる素材の金属層表面
またはガラス、プラスチックス、セラミックスそのもの
からなる素材の表面にガラ″0ス質皮膜を形成して防食
性、耐候性、硬度、耐酸性、耐アルカリ性および耐水性
を向上させたものである。5. Products with a vitreous film are products made by forming a metal layer on the surface of glass, plastics, ceramics, etc. (by vapor deposition, plating, laminating, etc.) or from the metal layer surface of the glass, plastics, ceramics themselves. A glass-free film is formed on the surface of the material to improve corrosion resistance, weather resistance, hardness, acid resistance, alkali resistance, and water resistance.
このような製品は、これまでつぎのようにして製造され
ていた。すなわち、素材の表面に、ケイ酸アルカリ水溶
液を塗布して乾燥させ、これ″5を焼付けることにより
素材表面にケイ酸アルカリにもとづくガラス質皮膜を形
成して製造していた。このようにして得られた製品のガ
ラス質皮膜は、硬度も大きく、かつ充分な熱処理を経る
ことにより耐水性、耐酸性、耐アルカリ性も大になる。
し)0かしながら、このガラス質皮膜には、皮膜中のア
ルカリ金属が経時的に大気中の炭酸ガスや亜硫酸ガスと
反応し氷河溶性成分となつて表面に移行し乾燥して結晶
となつて析出するため、エフロレツセンス(白華)が発
生するという問題があつた。’5これを回避するために
、素材にガラス質皮膜を形成したのち、これを、硝酸、
硫酸、塩酸およびリン酸等の希薄水溶液中に短時間浸漬
し、皮膜中のアルカリ金属を除去することが行われてい
る。この場合、エフロレツセンスの発生を効果的に防止
10するためには、それらの酸の水溶液の濃度を高める
とともに液温を高め、そのなかにガラス質皮膜を有する
製品を比較的長時間浸漬する必要がある。しかしによが
ら、このようにすると、ガラス質皮膜自身が酸の水溶液
に溶解するため、ガラス質皮膜■5の強度が低下すると
いう問題が生じた。また、酸を使用すると、臭気等によ
り作業環境が悪化するとともに、公害等の問題も生じて
くるため、それiウハーらの対策に莫大な設備が必要に
なつていた。Such products have been manufactured in the following manner. That is, it was manufactured by applying an aqueous alkali silicate solution to the surface of the material, drying it, and baking it to form a glassy film based on the alkali silicate on the surface of the material.In this way, The glassy coating of the obtained product has high hardness, and when subjected to sufficient heat treatment, has high water resistance, acid resistance, and alkali resistance.
However, in this glassy film, the alkali metals in the film react with carbon dioxide and sulfur dioxide gas in the atmosphere over time, become glacier-soluble components, migrate to the surface, dry, and become crystals. There was a problem that efflorescence (efflorescence) was generated due to the precipitation. '5 In order to avoid this, after forming a glassy film on the material, this is treated with nitric acid,
Alkali metals in the film are removed by immersing the film in a dilute aqueous solution such as sulfuric acid, hydrochloric acid, or phosphoric acid for a short time. In this case, in order to effectively prevent the occurrence of efflorescence10, it is necessary to increase the concentration and temperature of the aqueous solution of these acids, and to immerse the product with the glassy film therein for a relatively long time. There is a need. However, when this was done, the vitreous coating itself was dissolved in the acid aqueous solution, resulting in a problem in that the strength of the vitreous coating 5 was reduced. Furthermore, when acids are used, the working environment deteriorates due to odors and the like, and problems such as pollution arise, so a huge amount of equipment is required to deal with these problems.
この発明は、このような事情に鑑みなされたもので、素
材表面にケイ酸アルカリ水浴液を塗布し乾燥してケイ酸
アルカリ皮膜を形成し、このケイ酸アルカリ皮膜を素材
に焼付けて素材表面にガラス質皮膜を形成することによ
りガラス質皮膜を有する製品を製造する方法であつて、
ケイ酸アルカリ水溶液の乾喋以降の適宜の段階で強酸の
アルミニウム塩水溶液で脱アルカリ処理することをその
要旨とするものである。すなわち、この発明は、従来の
ように酸の水溶液を用いるのではなく、強酸のアルミニ
ウム塩水溶液を用いて脱アルカリ処理するため、ガラス
質皮膜の強度劣化や公害等の問題を起こすことなく効果
的にエフロレツセンスを防止することができるのである
。This invention was made in view of these circumstances, and involves coating the surface of a material with an alkaline silicate water bath solution, drying it to form an alkali silicate film, and baking this alkali silicate film onto the material surface. A method for manufacturing a product having a vitreous film by forming a vitreous film, the method comprising:
The gist of the method is to perform a dealkalization treatment with an aqueous aluminum salt solution of a strong acid at an appropriate stage after drying the aqueous alkali silicate solution. In other words, this invention uses an aluminum salt aqueous solution of a strong acid to carry out the dealkalization treatment, instead of using an aqueous acid solution as in the conventional method. It is possible to prevent efflorescence.
そして、このような強酸のアルミニウム塩水溶液を用い
て脱アルカリ処理することにより素材表面に透明なガラ
ス質皮膜を形成することができるのである。強酸のアル
ミニウム塩水浴液の作用をより詳しく説明すると、つぎ
のとおりである。A transparent glassy film can be formed on the surface of the material by dealkalization treatment using such a strong acid aluminum salt aqueous solution. A more detailed explanation of the action of the strong acid aluminum salt bath solution is as follows.
すなわち、ケイ酸アルカリによる皮膜を構成しているシ
ロキサン結合は、下記の反応によつて生じる。この反応
は600℃程度の高温下でないと100%完了しない。That is, the siloxane bonds that constitute the alkali silicate film are produced by the following reaction. This reaction is not 100% complete unless it is at a high temperature of about 600°C.
ところが、アルミニウムのように変態点の低い基材では
そのような高温で焼成することができないため、結局、
皮膜表面などには下記のごとき基が残る。このような皮
膜を強酸のアルミニウム塩水浴液で処理すると、S1と
Alの置換により、基が生じる。However, base materials with low transformation points such as aluminum cannot be fired at such high temperatures, so in the end,
The following groups remain on the surface of the film. When such a film is treated with a strong acid aluminum salt bath, groups are generated by substitution of S1 with Al.
Alは酸素に対し4配位をとるが、電荷的には3+であ
るので、上記基の部分は負の電荷をもつことになる。そ
のため、この皮膜表面などは、Alの置換数と同数のN
aを固定することができるのである。脱アルカリ処理し
た皮膜といえども、アルカリは完全に無くなつている訳
ではない。Al has a 4-coordination with respect to oxygen, but has a 3+ charge, so the above group has a negative charge. Therefore, the surface of this film has the same number of N as the number of Al substitutions.
Therefore, a can be fixed. Even though the film has been treated with alkalization, alkali is not completely eliminated.
そのため、SO2ガスなどが浸透したとき残存アルカリ
分が皮膜表面に滲み出してくるのであるが、上記Al置
換の起きている皮膜では滲み出そうとするアルカリ分が
Al基で固定されるため、エフロレツセンスが防止され
る。これに対し、冷水や温水による脱アルカリ処理ある
いは酸水溶液による脱アルカリ処理ではAl置換が起き
ないため、残存アルカリ分の滲み出しを防止することが
できない、と考えられるのである。つぎに、この発明を
詳しく説明する。Therefore, when SO2 gas etc. permeate, residual alkaline content oozes out to the film surface, but in the film where Al substitution has occurred, the alkali content that is about to ooze out is fixed by the Al group, so it is not possible to Loretsense is prevented. On the other hand, dealkalization treatment using cold water or hot water or dealkalization treatment using an acid aqueous solution does not cause Al substitution, and therefore it is thought that oozing of residual alkali components cannot be prevented. Next, this invention will be explained in detail.
この発明は、皮膜形成用にケイ酸アルカリ水溶液を用い
る。This invention uses an aqueous alkali silicate solution for film formation.
ケイ酸アルカリとしては、ケイ酸ナトリウム、ケイ酸カ
リウム、ケイ酸リチウム等があげられる。そのなかでも
ケイ酸ナトリウムがよく用いられる。ケイ酸ナトリウム
は、通称水ガラスと呼ばれるもので、一般式Na2O−
NsiO2をもち、nの数によりつぎのように分けられ
る。n=2(1号水ガラス)、n=2.5(2号水ガラ
ス)n=3(3号水ガラス)、n=4(4号水ガラス)
。また、ケイ酸リチウムは、一般式Li2O,nSlO
2をもち、ケイ酸カリウムは、一般式K2O−NSlO
2をもつ。ケイ酸アルカリ水溶液が塗布される素材とし
ては、前述のようなガラス、プラスチツクス、セラミツ
クス等の表面に 金属を蒸着したものおよびガラス、プ
ラスチツクス、セラミツクスそのもの等があげられるが
、これに限定されるものではない。このような素材にケ
イ酸アルカリ水済液を塗布する。Examples of alkali silicates include sodium silicate, potassium silicate, lithium silicate, and the like. Among them, sodium silicate is often used. Sodium silicate is commonly called water glass and has the general formula Na2O-
It has NsiO2 and can be divided into the following depending on the number of n. n = 2 (No. 1 water glass), n = 2.5 (No. 2 water glass), n = 3 (No. 3 water glass), n = 4 (No. 4 water glass)
. In addition, lithium silicate has the general formula Li2O, nSlO
2, potassium silicate has the general formula K2O-NSlO
Has 2. Materials to which the aqueous alkali silicate solution is applied include, but are not limited to, glass, plastics, ceramics, etc., with metals deposited on their surfaces, as well as glass, plastics, and ceramics themselves. It's not a thing. An alkaline silicate water solution is applied to such materials.
塗布の方法は問わない。ケイ酸アルカリ水溶液に素材を
浸漬してもよいし、ケイ酸アルカリ水浴液を素材に吹付
けてもよい。この場合、ケイ酸アルカリ水溶液の濃度は
、必要とするガラス質皮膜の膜厚に応じて調節されるが
、一般に30重量%(以下1−%」と略す)以上の高濃
度になると、浸漬によつては生成膜厚が大きくなりすぎ
、乾燥、焼付け時に発泡したり、クラツクが生じたりす
るため、良好なガラス質皮膜が形成されにくくなる。耐
食性、耐薬品性などを確保するためには、厚いガラス質
皮膜(ま必要で1コない。一般には、約5μ以下の膜厚
で光分であり、望ましくは0.5〜2μである。そのよ
うなガラス質皮膜を1回の浸漬によつて形成するのであ
れば、ケイ酸アルカリ水浴液の濃度を15%以下に調節
すればよい。しかしながら、これをさらに希釈し、1回
浸漬して乾燥した後、さらにもう1回浸漬するようにす
ると、ピンホールの発生等が大幅に低減するため、より
好ましいのである。この発明は、このようにしてケイ酸
アルカリ水浴液を素材に塗布し、塗布されたケイ酸アル
カリ永溶液の乾燥以降の適宜の段階で強酸のアルミニウ
ム塩水浴液で脱アルカリ処理する。The method of application does not matter. The material may be immersed in an aqueous alkali silicate solution, or an aqueous alkaline silicate bath solution may be sprayed onto the material. In this case, the concentration of the aqueous alkali silicate solution is adjusted depending on the required thickness of the vitreous film, but generally, if the concentration is 30% by weight or more (hereinafter abbreviated as 1-%), it will not be possible to immerse it. As a result, the thickness of the resulting film becomes too large, causing foaming or cracking during drying and baking, making it difficult to form a good glassy film. In order to ensure corrosion resistance, chemical resistance, etc., a thick vitreous coating is necessary (or at least one layer is required). Generally, the film thickness is approximately 5 μm or less, and preferably 0.5 to 2 μm. If such a glassy film is to be formed by one immersion, the concentration of the alkaline silicate water bath solution may be adjusted to 15% or less. It is more preferable to immerse the material one more time after drying, as this will greatly reduce the occurrence of pinholes, etc.This invention applies the alkaline silicate water bath solution to the material in this way, At an appropriate stage after drying the applied alkaline silicate permanent solution, dealkalization treatment is performed with a strong acid aluminum salt water bath.
すなわち、塗布されたケイ酸アルカリ水溶液の乾燥によ
り水分が蒸発して素材表面にケイ酸アルカリ皮膜が形成
(部分的形成でもよい)された段階、または乾燥後焼付
けを行つて素材表面にガラス質皮膜が形成された段階で
強酸のアルミニウム塩水溶液を用いて脱アルカリ処理す
る。この脱アルカリ処理は、ケイ酸アルカリ皮膜または
ガラス質皮膜が形成された素材に対して強酸のアルミニ
ウム塩水溶液をスプレイしたり、また(1上記の皮膜が
形成された素材を強酸のアルミニウム塩水溶液に浸漬す
ること等によつて行われる。脱アルカリ処理に用いる強
酸のアルミニウム塩水溶液としては、例えば、塩化アル
ミニウム、硝酸アルミニウム、硫酸アルミニウム等の2
〜30(f)水溶液が用いられる。この水溶液による処
理は、水溶液の液温を常温から80℃の範囲内に設定し
て行うことが効果の点から好ましい。なお、前述の素材
表面に塗布されたケイ酸アルカリ水溶液の乾喋は150
〜1600C程度の温度でゆつくりと行うことが好まし
い。そして引続いて行われる焼付けは、通常、乾燥時の
温度より高温であつて400℃程度までの温度で行われ
、それによつてケイ酸アルカリ皮膜中の微量の水を蒸発
させ、ケイ酸アルカリ皮膜をガラス化してガラス皮膜と
して素材に焼付けることにより、ガラス皮膜を有する製
品化する工程である。ケイ酸アルカリ水浴液を塗布、乾
燥した段階の素材または塗布、乾燥、焼付けを施した段
階の素材のいずれに対して上記の脱アルカリ処理を行う
かは自由であるが、効果の点では前者に対して行う方が
後者に対して行うよりも大である。このようにして得ら
れたガラス質皮膜を有する製品は、エフロレツセンスの
原因となるアルカリ金属が皮膜中から除去されているた
め、経時的なエフロレツセンスの発生が防止されている
。つぎに、実施例について比較例と併せて説明する。In other words, the applied aqueous alkali silicate solution dries and the water evaporates, forming an alkali silicate film on the surface of the material (it may be partially formed), or after drying, baking is performed to form a glassy film on the surface of the material. At the stage when is formed, dealkalization treatment is performed using a strong acid aluminum salt aqueous solution. This dealkalization treatment can be carried out by spraying a strong acid aluminum salt aqueous solution onto the material on which the alkali silicate film or glassy film has been formed, or (1) spraying the material on which the above film has been formed into a strong acid aluminum salt aqueous solution. The aluminum salt aqueous solution of a strong acid used for the dealkalization treatment includes, for example, aluminum chloride, aluminum nitrate, aluminum sulfate, etc.
~30(f) Aqueous solution is used. From the viewpoint of effectiveness, it is preferable that the treatment with the aqueous solution be carried out with the temperature of the aqueous solution set within the range of room temperature to 80°C. In addition, the dry density of the aqueous alkali silicate solution applied to the surface of the material mentioned above is 150
It is preferable to carry out slowly at a temperature of about 1600C. The subsequent baking process is usually carried out at a temperature higher than the drying temperature, up to about 400°C, thereby evaporating trace amounts of water in the alkali silicate film and forming the alkali silicate film. This is the process of producing a product with a glass film by vitrifying it and baking it onto a material as a glass film. It is up to you whether you want to perform the above dealkalization treatment on the material that has been coated with the alkaline silicate water bath and dried, or on the material that has been coated, dried, and baked, but in terms of effectiveness, the former is preferred. It is more important to do this to the latter than to do it to the latter. In the product having the glassy film obtained in this way, the alkali metal that causes efflorescence is removed from the film, so that the occurrence of efflorescence over time is prevented. Next, examples will be described together with comparative examples.
〔実施例 1〕
純度99.7%、厚さ1關のアルミ板をハブ研摩したの
ち中性洗剤で充分脱脂し水洗した。[Example 1] An aluminum plate with a purity of 99.7% and a thickness of 1 inch was hub-polished, thoroughly degreased with a neutral detergent, and washed with water.
ついで、これを水ガラス3号(日本化学工業社製)の1
5%水溶液に浸漬した。つぎに、これを90〜95℃で
30分間、ついで130〜140℃で10分間乾燥した
のち170〜180℃で20分間焼成した。この板をA
lCl3.9H2Oの5(:f)水溶液(60℃)中に
2分間浸漬して脱アルカリ処理したのち水洗し室温で乾
燥した。これを試料囚とした。〔比較例 1,2〕実施
例1と同様に水ガラス処理して乾燥したアルミ板を、温
度60℃、濃度2001)の硝酸水溶液に2分間浸漬し
て脱アルカリ処理し、引続いて濃度101)のNaOH
水浴液で中和後水洗して室温で乾燥した。Next, pour this into water glass No. 3 (manufactured by Nihon Kagaku Kogyo Co., Ltd.).
It was immersed in a 5% aqueous solution. Next, this was dried at 90-95°C for 30 minutes, then at 130-140°C for 10 minutes, and then baked at 170-180°C for 20 minutes. This board is A
After being immersed in a 5(:f) aqueous solution (60° C.) of 1Cl3.9H2O for 2 minutes for dealkalization treatment, it was washed with water and dried at room temperature. This was used as a sample prisoner. [Comparative Examples 1 and 2] An aluminum plate treated with water glass and dried in the same manner as in Example 1 was immersed in a nitric acid aqueous solution at a temperature of 60°C and a concentration of 2001 for 2 minutes for dealkalization treatment, and subsequently treated with a nitric acid solution of a concentration of 101. ) of NaOH
After neutralization with a water bath solution, it was washed with water and dried at room temperature.
これを試料(8)とした。また、実施例1と同様に水ガ
ラス処理して乾燥し焼付け処理したアルミ板を脱アルカ
リ処理せずそのまま試料(C)とした。これら3つの試
料について、室温で飽和水蒸気が満たされた密閉ボツク
スに入れてボツクス中の亜硫酸ガス濃度が500購にな
るように亜硫酸ガスを送り込み、その雰囲気中に1日放
置し、ついで95℃のオーブン中に1時間放置すること
をlサイクルとして強制白華試験を行つた。This was designated as sample (8). Further, an aluminum plate treated with water glass, dried and baked in the same manner as in Example 1 was used as a sample (C) without being subjected to dealkalization treatment. These three samples were placed in a closed box filled with saturated water vapor at room temperature, sulfur dioxide gas was pumped in so that the sulfur dioxide concentration in the box was 500%, and the samples were left in that atmosphere for one day, and then heated to 95°C. A forced efflorescence test was conducted with one cycle being one hour of standing in an oven.
その結果はつぎのとおりであつた。試料(A):5サイ
クルでも白華は認められない〃(B):2サイクルで白
華I(C):1サイクルで著しい白華
なお、(8),(Oの白華物を分析した結果はNa2s
O4であつた。The results were as follows. Sample (A): No efflorescence observed even after 5 cycles. (B): Efflorescence I after 2 cycles. (C): Significant efflorescence after 1 cycle. Furthermore, (8), (O) efflorescence was analyzed. The result is Na2s
It was O4.
また、これら(A),(B),(C)の耐酸性、耐アル
カリ性は共に艮好であつた。すなわち、10%の塩酸、
10%苛性ソーダ水溶液を試料表面に滴下しカバーをし
て30分間放置したのち、水洗して残跡を調べたが異常
はなかつた。〔実施例 2〕
厚み1muの銅板に対してハブ研摩、中性洗剤での脱脂
を施こしたのち、ケイ酸リチウム(日産化学社製、LS
S35,Ll2O・3.5Si02)の15%水溶液に
浸漬した。Furthermore, the acid resistance and alkali resistance of these (A), (B), and (C) were all excellent. i.e. 10% hydrochloric acid,
A 10% aqueous solution of caustic soda was dropped onto the surface of the sample, the sample was covered and left for 30 minutes, then washed with water and examined for residue, but no abnormalities were found. [Example 2] After polishing the hub and degreasing with a neutral detergent, a copper plate with a thickness of 1 μm was coated with lithium silicate (manufactured by Nissan Chemical Co., Ltd., LS
It was immersed in a 15% aqueous solution of S35, Ll2O.3.5Si02).
つぎに、これを90〜95℃で30分間、ついで130
〜140℃で10分間乾燥したのち、190〜200℃
で20分間焼成した。この板をAl(NO3)3・6H
20の10%水溶液′(6『C)に2分間浸漬して脱ア
ルカリ処理したのち水洗し室温で乾燥した。Next, this was heated at 90 to 95°C for 30 minutes, then heated to 130°C.
After drying at ~140℃ for 10 minutes, drying at 190~200℃
Baked for 20 minutes. This board is Al(NO3)3.6H
After being immersed in a 10% aqueous solution of 20'(6'C) for 2 minutes for dealkalization treatment, it was washed with water and dried at room temperature.
これを試料(D)とした。〔比較例 3,4〕実施例2
と同様にケイ酸リチウム水浴液処理して乾燥し焼成した
銅板を、温度60℃、濃度5%の硫酸水溶液中に2分間
浸漬して脱アルカリ処理した。This was designated as sample (D). [Comparative Examples 3, 4] Example 2
A copper plate treated with a lithium silicate water bath solution, dried and fired in the same manner as above was immersed in a 5% aqueous sulfuric acid solution at a temperature of 60° C. for 2 minutes to dealkalize it.
ついで、これを水洗し乾燥して試料(Dとした。また、
実施例1と同様にケイ酸リチウム水爵液処理して乾燥し
焼成じた銅板を脱アルカリ処理せずそのまま試料(}′
)とした。これらの試料Q)),(D,(F′)につい
て、実施例1と同様の強制白華試験を行つた。Next, this was washed with water and dried to form a sample (D.
A copper plate treated with lithium silicate hydrochloride, dried and fired in the same manner as in Example 1 was used as a sample (}' without dealkalization treatment).
). A forced efflorescence test similar to that in Example 1 was conducted on these samples Q)), (D, and (F')).
その結果はつぎのとおりであつた。試料(11):5サ
イクルまで白華が認められない〃(8:3サイクルで白
華〃(F):2サイクルで白華
なお、実施例1と同様にして行つた耐酸性、耐アルカリ
性等の耐薬品性試験の結果は試料(1)L(F4),(
F′)共に艮好であつた。The results were as follows. Sample (11): No efflorescence observed until 5 cycles (8: Efflorescence after 3 cycles) (F): Efflorescence after 2 cycles In addition, acid resistance, alkali resistance, etc. were determined in the same manner as in Example 1. The results of the chemical resistance test for sample (1) L (F4), (
F') Both were beautiful.
〔実施例 3〕
ガラス板にアルミニウムの蒸着を施こしてハーフミラー
としたものを、ケイ酸カリウム(日本化学工業社製、ケ
イ酸カリウムA,K2O・3.5S102)の10%水
浴液に浸漬し、90〜95℃で30分間、130〜14
0℃で10分間乾燥したのち、180〜190℃で20
分間焼成した。[Example 3] A half mirror made by vapor-depositing aluminum on a glass plate was immersed in a 10% water bath solution of potassium silicate (Potassium silicate A, K2O, 3.5S102, manufactured by Nihon Kagaku Kogyo Co., Ltd.). and 30 minutes at 90-95℃, 130-14
After drying at 0℃ for 10 minutes, drying at 180-190℃ for 20 minutes.
Bake for a minute.
これをAl2(SO4)3の8%水浴液(6『C)に2
分間浸漬し脱アルカリ処理したのち水洗し室温で乾燥し
た。これを試料(Gとした。〔比較例 5,6〕
実施例3と同様にケイ酸カリウム水溶液処理して乾燥、
焼成したハーフミラーを、温度60℃、濃度50I)の
塩酸中に2分間浸漬して脱アルカリ処理し、ついで濃度
1%のNaOH7l<.浴液で中和したのち水洗し室温
で乾燥した。Add this to an 8% water bath solution (6'C) of Al2(SO4)3.
After being immersed for a minute and dealkalized, it was washed with water and dried at room temperature. This was designated as sample (G. [Comparative Examples 5 and 6]) It was treated with a potassium silicate aqueous solution in the same manner as in Example 3, dried,
The fired half mirror was dealkalized by immersing it in hydrochloric acid at a temperature of 60°C and a concentration of 50 l for 2 minutes, and then treated with 7 l of NaOH at a concentration of 1%. After neutralizing with bath solution, it was washed with water and dried at room temperature.
これを試料圓とした。また、実施例3と同様にケイ酸カ
リウム水溶液処理して乾燥、焼成したハーフミラーを脱
アルカリ処理せずそのまま試料(1)とした。これらの
試料(0,(1,(1)について実施例1と同様の強制
白華試験を行つた。This was used as the sample circle. Further, a half mirror treated with an aqueous potassium silicate solution, dried, and fired in the same manner as in Example 3 was used as sample (1) without being subjected to dealkalization treatment. A forced efflorescence test similar to that in Example 1 was conducted on these samples (0, (1, (1)).
その結果はつぎのとおりであつた。試料(C1):5サ
イクルまで白華が認められない〃l−0:2サイクルで
白華I(1):1サイクルで著しく白華
なお、実施例1と同様にして行つた耐薬品性試験の結果
(1試料(GJL(1)共に良好であつた。The results were as follows. Sample (C1): No efflorescence observed until 5 cycles l-0: Efflorescence I (1): Significant efflorescence after 1 cycle Chemical resistance test conducted in the same manner as in Example 1 The results for both samples (GJL (1)) were good.
Claims (1)
ケイ酸アルカリ皮膜を形成し、このケイ酸アルカリ皮膜
を素材に焼付けて素材表面にガラス質皮膜を形成するこ
とによりガラス質皮膜を有する製品を製造する方法であ
つて、ケイ酸アルカリ水溶液の乾燥以降の適宜の段階で
強酸のアルミニウム塩水溶液で脱アルカリ処理すること
を特徴とするガラス質皮膜を有する製品の製法。 2 強酸のアルミニウム塩水溶液による脱アルカリ処理
をスプレイによつて行う特許請求の範囲第1項記載のガ
ラス質皮膜を有する製品の製法。 3 強酸のアルミニウム塩水溶液による脱アルカリ処理
を浸漬によつて行う特許請求の範囲第1項記載のガラス
質皮膜を有する製品の製法。[Claims] 1. Glass is produced by applying an aqueous alkali silicate solution to the surface of the material and drying it to form an alkali silicate film, and then baking this alkali silicate film onto the material to form a vitreous film on the surface of the material. 1. A method for producing a product having a glassy film, the method comprising dealkalizing the product with an aqueous aluminum salt solution of a strong acid at an appropriate stage after drying the aqueous alkali silicate solution. 2. A method for manufacturing a product having a vitreous coating according to claim 1, wherein the dealkalization treatment with an aqueous solution of a strong acid aluminum salt is carried out by spraying. 3. A method for manufacturing a product having a vitreous film according to claim 1, wherein the dealkalization treatment with an aqueous solution of a strong acid aluminum salt is carried out by immersion.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP266279A JPS5913588B2 (en) | 1979-01-12 | 1979-01-12 | Manufacturing method for products with glassy coating |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP266279A JPS5913588B2 (en) | 1979-01-12 | 1979-01-12 | Manufacturing method for products with glassy coating |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5594480A JPS5594480A (en) | 1980-07-17 |
| JPS5913588B2 true JPS5913588B2 (en) | 1984-03-30 |
Family
ID=11535535
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP266279A Expired JPS5913588B2 (en) | 1979-01-12 | 1979-01-12 | Manufacturing method for products with glassy coating |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5913588B2 (en) |
-
1979
- 1979-01-12 JP JP266279A patent/JPS5913588B2/en not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5594480A (en) | 1980-07-17 |
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