JPS5920722B2 - Metal powder manufacturing equipment using gas atomization method - Google Patents
Metal powder manufacturing equipment using gas atomization methodInfo
- Publication number
- JPS5920722B2 JPS5920722B2 JP1995980A JP1995980A JPS5920722B2 JP S5920722 B2 JPS5920722 B2 JP S5920722B2 JP 1995980 A JP1995980 A JP 1995980A JP 1995980 A JP1995980 A JP 1995980A JP S5920722 B2 JPS5920722 B2 JP S5920722B2
- Authority
- JP
- Japan
- Prior art keywords
- gas
- metal powder
- tank
- liquefied gas
- evaporator
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000000843 powder Substances 0.000 title claims description 30
- 239000002184 metal Substances 0.000 title claims description 29
- 238000000034 method Methods 0.000 title claims description 10
- 238000004519 manufacturing process Methods 0.000 title claims description 6
- 238000009689 gas atomisation Methods 0.000 title claims description 5
- 238000002347 injection Methods 0.000 claims description 10
- 239000007924 injection Substances 0.000 claims description 10
- 239000007788 liquid Substances 0.000 claims description 9
- 238000011084 recovery Methods 0.000 claims description 6
- 230000008016 vaporization Effects 0.000 claims description 3
- 230000005484 gravity Effects 0.000 claims description 2
- 238000000889 atomisation Methods 0.000 description 6
- 230000001105 regulatory effect Effects 0.000 description 4
- 238000010586 diagram Methods 0.000 description 3
- 230000008020 evaporation Effects 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 238000003860 storage Methods 0.000 description 2
- 229910000851 Alloy steel Inorganic materials 0.000 description 1
- 229910000997 High-speed steel Inorganic materials 0.000 description 1
- 230000001276 controlling effect Effects 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Manufacture Of Metal Powder And Suspensions Thereof (AREA)
Description
【発明の詳細な説明】
本発明はガスアトマイズ法による金属粉末製造装置に関
するもので、特にアトマイズガスの新規な供給システム
に関するものである。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to an apparatus for producing metal powder using a gas atomization method, and particularly to a novel supply system for atomization gas.
ガスアトマイズ法は、流下している溶融金属にＮ２．Ａ
ｒ等の高圧ガスを噴射してこれを霧化することにより、
酸化皮膜を有しない清浄な金属粉末を生産する方法とし
て、高速度鋼粉末等の合金鋼粉末の製造に広く利用され
ている方法である。In the gas atomization method, N2. A
By injecting high pressure gas such as r and atomizing it,
This method is widely used for producing alloy steel powders such as high-speed steel powders as a method for producing clean metal powders that do not have oxide films.
この方法はガスを溶湯に噴射してアトマイズする関係Ｆ
入量のガスを必要とするが、従来は多数の高圧ガスボン
ベを配置し、該ホンへより調圧弁を通して圧力調整され
たアトマイズガスをアトマイザ−のガス噴射ノズルに供
給し、溶湯を噴霧化した後はアトマイザ−より排出し、
必要に応じて別の容器に回収したりあるいはアトマイザ
−中にリサイクルさせたりしていたが、近年のガスアト
マイズ粉末の需要増化と共にアトマイサーも大型化し、
それに併なってアトマイズガスの使用量も人中に増加し
てきたため、従来のようにアトマイズガスを高圧ガスボ
ンベから供給する方式では、ガスボンベの配置スペース
か人中に増加し、工場レイアウト上問題がある。This method involves injecting gas into the molten metal to atomize it.
Conventionally, a large number of high-pressure gas cylinders are arranged, and the pressure-adjusted atomizing gas is supplied to the gas injection nozzle of the atomizer through a pressure regulating valve to atomize the molten metal. is discharged from the atomizer,
If necessary, it was collected in a separate container or recycled into an atomizer, but as the demand for gas atomized powder has increased in recent years, atomizers have also become larger.
At the same time, the amount of atomized gas used has also increased, and the conventional method of supplying atomized gas from high-pressure gas cylinders requires more space for the gas cylinders and increases the number of people, which poses problems in terms of factory layout.
そこで本発明は、かかる大型アトマイズ装置のレイアウ
ト上の問題を解決するため、アトマイズガスを液化ガス
として貯蔵すると共に、液化ガスとしたときの最適な装
置を提供するもので、その要旨とするところは、アトマ
イズガスを高圧液体状態で貯蔵する液化ガスタンクと、
溶融金属を霧化して金属粉末とするアトマイザ−のガス
噴射ノズルに、前記タンクからの液化ガスを気化させて
供給する主蒸発器と、前記タンクからの液化ガスを気化
させて該タンクの気相側に帰還させる副蒸発器と、アト
マイサーからの排出ガス中の金属粉末を回収する粉末回
収装置とを有してなることを特徴とするガスアトマイズ
法による金属粉末製造装置にある。Therefore, in order to solve the layout problem of such a large atomization device, the present invention aims to store atomized gas as a liquefied gas and provide an optimal device for converting the atomized gas into a liquefied gas. , a liquefied gas tank that stores atomized gas in a high-pressure liquid state;
a main evaporator that vaporizes and supplies liquefied gas from the tank to the gas injection nozzle of an atomizer that atomizes molten metal into metal powder; There is provided an apparatus for producing metal powder using a gas atomization method, characterized by comprising a sub-evaporator for returning the metal powder to the side, and a powder recovery device for recovering the metal powder in the exhaust gas from the atomizer.
以下回向によって本発明装置の構成を具体的に説明する
。The configuration of the apparatus of the present invention will be specifically explained below.
第１図は本発明に係る装置を示す系統図で、図中１は液
化ガスタンク、２はガスアトマイザ−１３はガスアトマ
イザ−のアトマイズガス噴射ノズル、４は主蒸発器、５
は副蒸発器、６はアトマイザ−２から排出されるガス中
の金属粉末を回収するだめの回収装置、例えばサイクロ
ンであり、以上の機器を主要構成機器としている。FIG. 1 is a system diagram showing an apparatus according to the present invention, in which 1 is a liquefied gas tank, 2 is a gas atomizer, 13 is an atomizing gas injection nozzle of the gas atomizer, 4 is a main evaporator, and 5 is a system diagram showing an apparatus according to the present invention.
6 is a sub-evaporator, and 6 is a recovery device such as a cyclone for recovering metal powder in the gas discharged from the atomizer 2. The above-mentioned devices are the main components.
次にこれらの機器の作用について説明すると先ずアトマ
イズガスは液体状態でタンクローリ−等により工場内に
搬入され、供給管７より、高圧液体例えは２０〜３０ｋ
ｙ／ｄの圧力で液化ガスタンク１内に供給され同圧力の
高圧液化ガスの状態で貯蔵される。Next, to explain the operation of these devices, first, the atomized gas is brought into the factory in a liquid state by a tank truck, etc., and from the supply pipe 7, a high pressure liquid of 20 to 30 kg is supplied.
The liquefied gas is supplied into the liquefied gas tank 1 at a pressure of y/d and stored as a high-pressure liquefied gas at the same pressure.
アトマイズ時には液化ガスは主蒸発器４に送給され、こ
こで空気あるいは水と熱交換して蒸発し、液化ガスと同
じ圧力の高圧ガスとなって導管８及び調圧弁９を経て一
定の圧力でアトマイザ−頂部のガス噴射ノズル３に供給
され、タンディツシュ１０より流下している溶融金属流
１１に向けて高速で噴射される。During atomization, the liquefied gas is fed to the main evaporator 4, where it is evaporated by exchanging heat with air or water, becoming high-pressure gas with the same pressure as the liquefied gas, and passing through the conduit 8 and pressure regulating valve 9 at a constant pressure. The gas is supplied to the gas injection nozzle 3 at the top of the atomizer and is injected at high speed into the molten metal stream 11 flowing down from the tundish 10.
溶湯流１１は該噴射ガスによって霧化され、チャンバー
１２内を落下中に冷却固化して金属粉末となってチャン
バー底部に堆積し切り出し弁１３よりコンテナ１４内に
定量排出される。The molten metal stream 11 is atomized by the injected gas, cooled and solidified while falling in the chamber 12 to become metal powder, deposited at the bottom of the chamber, and discharged in a fixed amount into the container 14 through the cutting valve 13.
一方溶湯な霧化したガスは、チャンバー下部に設けられ
た導管１５より排出さｎるが、該排出ガス中には超微粉
金属粉末が陰有されているのでこれをサイクロン等の金
属粉未回収装置６に供給し、含有粉末を回収しに後、そ
の頂部の導管１６よりブロアー１７で吸引排出する。On the other hand, the molten metal atomized gas is discharged from a conduit 15 provided at the bottom of the chamber, but since the discharged gas contains ultrafine metal powder, it is removed by a cyclone or the like to collect the metal powder. After the powder is supplied to the device 6 and the contained powder is recovered, it is sucked and discharged from the conduit 16 at the top by a blower 17.
排ガスの一部は、導管１９よりノズルボックス１８に供
給され、ガス噴射ノズル３の雰囲気をアトマイズガス雰
囲気となし、該ノズル３からのガス噴射によりノズルボ
ックス１８内が負圧になってチャンバー１２内に浮遊し
ている金属粉末を吸引したり、あるし・は装置外から空
気が流入してアトマイズガスが汚染されるのを防止する
だめに使用されるが、大部分は排出管２０及び調圧弁２
１を経て人気中に放出される。A part of the exhaust gas is supplied to the nozzle box 18 through the conduit 19 to make the atmosphere of the gas injection nozzle 3 an atomized gas atmosphere, and the inside of the nozzle box 18 becomes negative pressure due to the gas injection from the nozzle 3, and the inside of the chamber 12 is It is used to suck up metal powder floating in the atomized gas, or to prevent air from entering from outside the device and contaminating the atomized gas, but mostly the exhaust pipe 20 and pressure regulating valve. 2
It will be released during popularity after 1.
アトマイズガスとして一般に使用されているＮ２ ガス
は、比較的安価であり、これをアトマイズ後回収するこ
とも提案されているが、回収コストの方が筒く付くこと
から、殆んどの場合放棄されている。N2 gas, which is commonly used as an atomizing gas, is relatively cheap, and it has been proposed to recover it after atomization, but this method has been abandoned in most cases because the recovery cost is higher. There is.
従って本発明においてもアトマイズ後は放棄してもよい
が、アトマイズガスの消費量を少なくするためガスの一
部を昇圧してガス噴射ノズル３に帰還させることが好ま
しく、また従来より一部提案されているような回収方法
を採用してもよく、要は排出ガスの処理は全く任意であ
る。Therefore, in the present invention, it may be abandoned after atomization, but in order to reduce the consumption of atomized gas, it is preferable to pressurize a part of the gas and return it to the gas injection nozzle 3. Any recovery method such as that described above may be adopted; in short, the treatment of exhaust gas is completely arbitrary.
なお液化ガスタンク１より液化ガスをアトマイザ−に向
けて排出し続けると、該タンク内の圧力は次第に低下し
、一定のアトマイズガス圧を得ることができなくなるの
で、本発明では、液化ガスタンク１の液化ガスを加温気
化して、再び該タンクに帰還させる副蒸発器５を設けて
いる。Note that if the liquefied gas is continued to be discharged from the liquefied gas tank 1 toward the atomizer, the pressure inside the tank will gradually decrease, making it impossible to obtain a constant atomized gas pressure. A sub-evaporator 5 is provided which heats and vaporizes the gas and returns it to the tank again.
即ち液化ガスは導管２２より副蒸発器５に供給され、こ
こで気化して液化ガスタンク１の気相側２３に帰還する
ことにより気相２３の圧力を高め、この気相圧力で液化
ガスを主蒸発器４に送給すると共に、液体排出に併なう
タンク内圧力の低下を補償するようになっている。That is, the liquefied gas is supplied from the conduit 22 to the sub-evaporator 5, where it is vaporized and returned to the gas phase side 23 of the liquefied gas tank 1, thereby increasing the pressure of the gas phase 23, and using this gas phase pressure to main the liquefied gas. It is designed to supply the liquid to the evaporator 4 and to compensate for the drop in pressure inside the tank due to liquid discharge.
なお副蒸発器５は、ここでの液化ガス蒸発量により液化
ガスタンク１内の圧力を調整する機能を有しているから
、単に液化ガスを蒸発させるのみならずその蒸発速度も
制御する必要かあるが、こｎは該副蒸発器５に供給され
る加熱流体の供給量あるいはヒーター等の加熱手段を制
御することにより容易に実施できる。Note that the sub-evaporator 5 has a function of adjusting the pressure inside the liquefied gas tank 1 according to the amount of evaporation of the liquefied gas, so it is necessary not only to simply evaporate the liquefied gas but also to control its evaporation rate. However, this can be easily implemented by controlling the amount of heating fluid supplied to the sub-evaporator 5 or heating means such as a heater.
また副蒸発器５への液化ガスの導入は小型液体ポンプに
より行なってもよいが、該副蒸発器５を前記タンク１よ
り下位に設け、ヘッドにより液化ガスが重力で流入する
ようにしておく方が好ましい。The liquefied gas may be introduced into the sub-evaporator 5 using a small liquid pump, but it is preferable to install the sub-evaporator 5 below the tank 1 so that the liquefied gas flows in by gravity using a head. is preferred.
以上説明した通り本発明の装置によると、アトマイズガ
スを液化ガスとして貯蔵するようにしているから、貯蔵
スペースは従来のガスボンベ貯Ｒ方式に比べて著しく小
さくすることができ、また液化ガスを高圧下に貯蔵して
いるから、アトマイズに必要なガス圧は単に液化ガスの
気化によってのみ得ることができ、圧縮機等のガス昇圧
装置は不要であり、更に副蒸発器によって液化ガスタン
ク内の圧力を一定に保つと共に、副蒸発器で気化された
ガスの圧力により液化ガスを円滑に主蒸発器に供給する
ようになっているから、液室ポンプ等低温液体ポンプが
不要となり、装置の保守も極めて容易となる。As explained above, according to the device of the present invention, since the atomized gas is stored as liquefied gas, the storage space can be significantly reduced compared to the conventional gas cylinder storage R method, and the liquefied gas is stored under high pressure. Since the gas pressure required for atomization can be obtained simply by vaporizing the liquefied gas, there is no need for a gas pressure booster such as a compressor, and the pressure inside the liquefied gas tank can be kept constant using a sub-evaporator. At the same time, the liquefied gas is smoothly supplied to the main evaporator using the pressure of the gas vaporized in the sub-evaporator, eliminating the need for a low-temperature liquid pump such as a liquid chamber pump, making the equipment extremely easy to maintain. becomes.
またアトマイズガスを液化ガスから得ているから極めて
清浄なカスであり、金属粉末を不純ガスで汚染すること
がない等、顕著な効果が期待される。Furthermore, since the atomized gas is obtained from liquefied gas, it is extremely clean and is expected to have significant effects, such as not contaminating the metal powder with impure gas.
第１図は本発明に係る金属粉末製造装置の系統図である
。
１・・・・・・液化ガスタンク、２・・・・・・ガスア
トマイザ−１３・・・・・・アトマイズガス噴射ノズル
、４・・・・・・主蒸発器、５・・・・・・副蒸発器、
６・・・・・・金属粉未回収袋５置、９，２１・・・・
・・調圧弁、１０・・・・・・タンディツシュ、１１・
・・・・・溶？５Ｒ１１２・・・・・・チャンバー、１
γ・・・・・・ブロアー、１８・・・・・・ノズルボッ
クス、２３・・・・・・気相。FIG. 1 is a system diagram of a metal powder manufacturing apparatus according to the present invention. 1...Liquefied gas tank, 2...Gas atomizer-13...Atomized gas injection nozzle, 4...Main evaporator, 5... sub evaporator,
6...5 uncollected metal powder bags, 9,21...
...Pressure regulating valve, 10... Tanditshu, 11.
...melt? 5R112・・・Chamber, 1
γ... Blower, 18... Nozzle box, 23... Gas phase.
Claims (1)
タンク１と、溶融金属を霧化して金属粉末とするガスア
トマイザ−２のガス噴射ノズル３に前記タンクからの液
化ガスを気化させて供給する主蒸発器４と、前記タンク
からの液化ガスを気化させて該タンクの気相側２３に帰
還させる副蒸発器５と、アトマイザ−からの排出ガス中
の金属粉末を回収する粉末回収装置６とを有してなるこ
とを特徴とするガスアトマイズ法による金属粉末製造装
置。 ２ 粉末回収装置６から排出されるガスの一部をアトマ
イザ−のガス噴射ノズル３を内蔵したノズルボックス１
８内に供給してなる特許請求の範囲第１項記載の金属粉
末製造装置。 ３ 副蒸発器５と液化ガスタンク１との相対位置関係が
、液化ガスが重力で副蒸発器５内に流入する様な位置関
係である特許請求の範囲第１項又は第２項いづれかに記
載の金属粉末製造装置。[Scope of Claims] 1. A liquefied gas tank 1 that stores atomized gas in a high-pressure liquid state, and a gas injection nozzle 3 of a gas atomizer 2 that atomizes molten metal into metal powder by vaporizing the liquefied gas from the tank. a main evaporator 4 for supplying liquefied gas from the tank, a sub-evaporator 5 for vaporizing the liquefied gas from the tank and returning it to the gas phase side 23 of the tank, and a powder recovery unit for recovering metal powder in the exhaust gas from the atomizer. An apparatus for producing metal powder using a gas atomization method, characterized in that it has an apparatus 6. 2 A part of the gas discharged from the powder recovery device 6 is transferred to the nozzle box 1 containing the atomizer gas injection nozzle 3.
8. A metal powder manufacturing apparatus according to claim 1, wherein the metal powder is supplied into a metal powder manufacturing apparatus according to claim 1. 3. The device according to claim 1 or 2, wherein the relative positional relationship between the sub-evaporator 5 and the liquefied gas tank 1 is such that the liquefied gas flows into the sub-evaporator 5 by gravity. Metal powder manufacturing equipment.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1995980A JPS5920722B2 (en) | 1980-02-19 | 1980-02-19 | Metal powder manufacturing equipment using gas atomization method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1995980A JPS5920722B2 (en) | 1980-02-19 | 1980-02-19 | Metal powder manufacturing equipment using gas atomization method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS56116805A JPS56116805A (en) | 1981-09-12 |
| JPS5920722B2 true JPS5920722B2 (en) | 1984-05-15 |
Family
ID=12013727
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1995980A Expired JPS5920722B2 (en) | 1980-02-19 | 1980-02-19 | Metal powder manufacturing equipment using gas atomization method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5920722B2 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0316409A (en) * | 1989-06-14 | 1991-01-24 | Hitachi Ltd | Surface acoustic wave device and manufacture thereof |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6365004A (en) * | 1986-09-05 | 1988-03-23 | Takeshi Masumoto | Apparatus for producing fine particle by high-pressure gas spraying |
| JP2020182900A (en) * | 2019-05-07 | 2020-11-12 | 日本エア・リキード合同会社 | Supply system of gas for high pressure gas atomizer |
-
1980
- 1980-02-19 JP JP1995980A patent/JPS5920722B2/en not_active Expired
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0316409A (en) * | 1989-06-14 | 1991-01-24 | Hitachi Ltd | Surface acoustic wave device and manufacture thereof |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS56116805A (en) | 1981-09-12 |
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