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JPS5924098B2 - Method for producing particulate glass - Google Patents
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JPS5924098B2 - Method for producing particulate glass - Google Patents

Method for producing particulate glass

Info

Publication number
JPS5924098B2
JPS5924098B2 JP13800976A JP13800976A JPS5924098B2 JP S5924098 B2 JPS5924098 B2 JP S5924098B2 JP 13800976 A JP13800976 A JP 13800976A JP 13800976 A JP13800976 A JP 13800976A JP S5924098 B2 JPS5924098 B2 JP S5924098B2
Authority
JP
Japan
Prior art keywords
nozzle
gas
reaction
temperature
glass
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP13800976A
Other languages
Japanese (ja)
Other versions
JPS5363417A (en
Inventor
武信 東本
豪太郎 田中
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Electric Industries Ltd
Original Assignee
Sumitomo Electric Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Electric Industries Ltd filed Critical Sumitomo Electric Industries Ltd
Priority to JP13800976A priority Critical patent/JPS5924098B2/en
Publication of JPS5363417A publication Critical patent/JPS5363417A/en
Publication of JPS5924098B2 publication Critical patent/JPS5924098B2/en
Expired legal-status Critical Current

Links

Landscapes

  • Chemical Vapour Deposition (AREA)
  • Glass Melting And Manufacturing (AREA)
  • Manufacture, Treatment Of Glass Fibers (AREA)
  • Glass Compositions (AREA)

Description

【発明の詳細な説明】 本発明は、ガラス形成気相原料と気相酸化剤とを高温雰
囲気で加熱し、反応を起し、微粒子状ガラスを合成する
方法に関するものである。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method for synthesizing particulate glass by heating a glass-forming gas-phase raw material and a gas-phase oxidizing agent in a high-temperature atmosphere to cause a reaction.

従来、ガラス形成気相原料と気相酸化剤とを高温に加熱
し、反応を起し、微粒子状ガラスを合成する方法として
は高温壁のマツフル或いは高温の反応管壁を利用すると
いう熱伝達による反応エネルギーを利用していた。
Conventionally, the method of heating glass-forming gas-phase raw materials and gas-phase oxidizing agent to a high temperature to cause a reaction and synthesize fine particulate glass is by heat transfer using a high-temperature wall or a high-temperature reaction tube wall. Reaction energy was used.

例えばSiO2ガラス微粒子を合成する方法としてはS
iCl4をArガス、N2ガス等の不活性ガスで輸送し
、高温ノズルの内壁でこれらのガスを加熱し、ノズル先
端より吹き出させ、一方、O2ガスを別の系路で輸送し
、同様にして別のノズル内壁で加熱し吹き出させ、これ
らのガスを混合し、反応させ、スズ状SiO2ガラスを
得ていた。所がSiCl4及びO2を十分に反応させる
為には、ノズル内を流れるガス自体を1200℃前後ま
で加熱する必要があり、この為には、さらに高温の過酷
な温度条件をノズルに与える必要があつた。この為、ノ
ズルの材料が著しく劣下するため発熱体の材料選択等が
大きな問題となつた。又、加熱源を原料ガスと接触させ
て反応を行う装置では高温の加熱源から生じる不純物の
揮散があり、高純度の生成物を得るには困難があつた。
本発明は、これらの欠点を除去する為、ノズルは反応ガ
スの反応開始温度程度の比較的低温に保持し、ノズルを
出て混合した直後のガスに輻射熱を与える(例えば、集
光した赤外線を照射する)ことによつて反応せしめるこ
とを特徴とするものである。
For example, as a method for synthesizing SiO2 glass particles, S
iCl4 is transported using an inert gas such as Ar gas or N2 gas, and these gases are heated on the inner wall of a high-temperature nozzle and blown out from the nozzle tip.On the other hand, O2 gas is transported through a separate system and similarly The gases were heated and blown out using the inner wall of another nozzle, and these gases were mixed and reacted to obtain tin-like SiO2 glass. However, in order to fully react SiCl4 and O2, it is necessary to heat the gas itself flowing inside the nozzle to around 1200°C, and to do this, it is necessary to subject the nozzle to even higher and harsher temperature conditions. Ta. For this reason, the material of the nozzle deteriorated significantly, and the selection of the material for the heating element became a major problem. In addition, in an apparatus in which a reaction is carried out by bringing a heating source into contact with a raw material gas, impurities generated from the high-temperature heating source volatilize, making it difficult to obtain a highly pure product.
In order to eliminate these drawbacks, the present invention maintains the nozzle at a relatively low temperature, about the reaction starting temperature of the reaction gas, and applies radiant heat to the gas immediately after it exits the nozzle and is mixed (for example, by applying concentrated infrared light to the gas). It is characterized by causing a reaction by irradiation).

本発明の目的は加熱源及びノズルの温度上昇を軽減する
事で発熱体及びノズルの高温部の材料劣下を防止し、高
温による加熱源物質の揮散を反応系の中へ入れない事に
より高純度の生成物を得る事にある。以下に、本発明の
方法を高純度SiO2微粒子の合成に応用した実施例を
あげて詳細に説明する第1図はSiO2微粒子の合成装
置を説明する断面図である。
The purpose of the present invention is to prevent material deterioration in the high-temperature parts of the heating element and nozzle by reducing the temperature rise of the heating source and nozzle, and to prevent the volatilization of the heating source material due to high temperature from entering the reaction system. The goal is to obtain a product of purity. Hereinafter, an example in which the method of the present invention is applied to the synthesis of high-purity SiO2 fine particles will be explained in detail. FIG. 1 is a sectional view illustrating an apparatus for synthesizing SiO2 fine particles.

第1図中、1は原料供給口であり、ArNa等のキャリ
アガスで輸送されSiCl4がコネクター3によりノズ
ル内管4に流される。2はO2の供給口であり、コネク
ター3によりノズル外管5とノズル内管4との中間部に
流される。
In FIG. 1, reference numeral 1 denotes a raw material supply port, and SiCl4, which is transported by a carrier gas such as ArNa, is flowed into the nozzle inner tube 4 through a connector 3. Reference numeral 2 denotes a supply port for O2, which is supplied to an intermediate portion between the outer nozzle tube 5 and the inner nozzle tube 4 through the connector 3.

6は片端給電式の管状発熱体であり、ノズルを加熱する
6 is a tubular heating element that is powered at one end and heats the nozzle.

Tは反応生成物をそれぞれ示す。原料ガスは管4の内側
8から供給されO2ガスは二重管4.5の間に供給され
る。
T each represents a reaction product. Raw material gas is supplied from the inside 8 of the tube 4, and O2 gas is supplied between the double tubes 4.5.

これらのガスはそれぞれノズル出口付近の温度で800
〜900℃になるまでノズルの壁面により加熱される。
ノズルの先端から出た反応ガスは互に拡散し、混合する
結果、次の化学式で示すような反応が開始する。SiC
l4+02→SiO2+2C12 第2図に反応系温度に対する上式の反応の転化度を示す
Each of these gases has a temperature of 800°C near the nozzle exit.
Heated by the nozzle wall until ~900°C.
The reaction gases emitted from the tip of the nozzle diffuse and mix with each other, and as a result, a reaction begins as shown in the following chemical formula. SiC
14+02→SiO2+2C12 FIG. 2 shows the degree of conversion of the above reaction with respect to the reaction system temperature.

第2図から分るように、この反応の開始温度は800℃
前後とみなし得る。
As can be seen from Figure 2, the starting temperature of this reaction is 800°C.
It can be considered as before and after.

即ち、ノズルを出た800〜900℃に加熱された反応
ガスは微粒子状のSiO,を若干含有するようになる。
この雰囲気に輻射熱をを与えると、例えば集光された赤
男線を照射するとSlO2微粒子以男のSiCl4,O
2,Cl2,Ar等のガスに関しては赤め線は透過する
が、SiO2微粒子は赤男線エネルギーをある程度吸収
し、微粒子自体の温度を上昇させる。この温度の上昇し
たSiC2粒子に衝突したガスはエネルギーを受け反応
系温度も上昇する。即ちSlC2微粒子の存在が赤男線
エネルギーを反応系へ取りこませる事になりSiCl4
→SiO2への転化率を上げる事につながる。このよう
にしてSiO2ガラス系の場合にはノズル先端付近での
反応ガスの温度を1100℃以上に上昇させる事なく8
00〜900℃程度の温度で、SiCl4のSiO2へ
の転化率を100%にあげる事が出来る。本発明による
微粒子状ガラス生成方法によれば原料ガスならばに酸化
ガスを比較的低温で加熱ノズルが噴出しても混合ガスに
赤列線等のエネルギーを与えることにより反応が100
(!)行なわれる。
That is, the reaction gas heated to 800 to 900 DEG C. that exits the nozzle contains some particulate SiO.
When radiant heat is applied to this atmosphere, for example, when irradiated with a focused red light beam, SiCl4, O
Although the red line passes through gases such as 2, Cl2, and Ar, SiO2 fine particles absorb some of the red line energy and increase the temperature of the fine particles themselves. The gas that collides with the SiC2 particles whose temperature has increased receives energy and the temperature of the reaction system also increases. In other words, the presence of SlC2 fine particles allows the red male ray energy to be taken into the reaction system, resulting in SiCl4
→It leads to increasing the conversion rate to SiO2. In this way, in the case of the SiO2 glass system, the temperature of the reactant gas near the nozzle tip does not rise above 1100°C.
The conversion rate of SiCl4 to SiO2 can be increased to 100% at a temperature of about 00 to 900°C. According to the method for producing particulate glass according to the present invention, even if the oxidizing gas is ejected from a heating nozzle at a relatively low temperature, the reaction can be reduced to 100% by applying energy such as a red line to the mixed gas.
(!) It is done.

従つてノズルは劣下せず、又生成反応物中にノズルの材
料の不純物が混入することがなく高純度の生成物を得る
ことができる。本発明による方法の説明は微粒子状Si
O2ガラスの合成系について述べたが、他のガラス、例
えばGeO2,p2O5,B2O3系ガラス等又はこれ
らのガラスを混合した多成分系の微粒子状ガラス等につ
いても同様に適用する事が出来る。
Therefore, the nozzle is not deteriorated, and a highly pure product can be obtained without contaminating the produced reaction product with impurities from the material of the nozzle. The description of the method according to the invention is based on fine-grained Si
Although the synthetic system of O2 glass has been described, the present invention can be similarly applied to other glasses, such as GeO2, p2O5, B2O3 glass, etc., or multi-component fine particulate glass made by mixing these glasses.

図面の簡串な説明 第1図はSlO2微粒子合成方法の模式図であり6は発
熱体、7は生成スート、8はSlCl4+キヤリアガス
、9は02ガスを示す。
BRIEF DESCRIPTION OF THE DRAWINGS FIG. 1 is a schematic diagram of a method for synthesizing SlO2 fine particles, where 6 is a heating element, 7 is a generated soot, 8 is SlCl4+carrier gas, and 9 is 02 gas.

第2図はSlCl4の高温気相酸化反応によるSlO介
の転化率に対する反応温度の依存性を示す。
FIG. 2 shows the dependence of the reaction temperature on the conversion rate via SlO in the high-temperature gas phase oxidation reaction of SlCl4.

Claims (1)

【特許請求の範囲】[Claims] 1 少くともガラス形成原料と酸化ガスをノズル内に別
個に導き、これを噴射して拡散混合し高温雰囲気中で反
応させて微粒子状ガラスを生成する方法において、該ノ
ズルを該反応の開始温度以上に加熱し、加熱された原料
ガス及び酸化ガスがノズルより噴射した直後に輻射熱を
与えて反応を促進せしめることを特徴とする微粒子状ガ
ラスの生成方法。
1. A method in which at least a glass-forming raw material and an oxidizing gas are introduced separately into a nozzle, and the nozzle is heated to a temperature higher than the starting temperature of the reaction by injecting them, diffusing and mixing them, and reacting in a high-temperature atmosphere to produce particulate glass. 1. A method for producing particulate glass, characterized in that radiant heat is applied immediately after the heated raw material gas and oxidizing gas are injected from a nozzle to accelerate the reaction.
JP13800976A 1976-11-16 1976-11-16 Method for producing particulate glass Expired JPS5924098B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13800976A JPS5924098B2 (en) 1976-11-16 1976-11-16 Method for producing particulate glass

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13800976A JPS5924098B2 (en) 1976-11-16 1976-11-16 Method for producing particulate glass

Publications (2)

Publication Number Publication Date
JPS5363417A JPS5363417A (en) 1978-06-06
JPS5924098B2 true JPS5924098B2 (en) 1984-06-07

Family

ID=15211920

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13800976A Expired JPS5924098B2 (en) 1976-11-16 1976-11-16 Method for producing particulate glass

Country Status (1)

Country Link
JP (1) JPS5924098B2 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3335126A1 (en) * 1983-09-28 1985-04-11 Wacker-Chemitronic Gesellschaft für Elektronik-Grundstoffe mbH, 8263 Burghausen METHOD FOR CHEMICAL GAS PHASE DEPOSITION OF OXIDIC PARTICLES

Also Published As

Publication number Publication date
JPS5363417A (en) 1978-06-06

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