JPS5931998B2 - Manufacturing method of optical semiconductor device with monitor - Google Patents
Manufacturing method of optical semiconductor device with monitorInfo
- Publication number
- JPS5931998B2 JPS5931998B2 JP52140361A JP14036177A JPS5931998B2 JP S5931998 B2 JPS5931998 B2 JP S5931998B2 JP 52140361 A JP52140361 A JP 52140361A JP 14036177 A JP14036177 A JP 14036177A JP S5931998 B2 JPS5931998 B2 JP S5931998B2
- Authority
- JP
- Japan
- Prior art keywords
- photodetector
- optical semiconductor
- light
- manufacturing
- semiconductor laser
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/02—Structural details or components not essential to laser action
- H01S5/026—Monolithically integrated components, e.g. waveguides, monitoring photo-detectors, drivers
- H01S5/0262—Photo-diodes, e.g. transceiver devices, bidirectional devices
- H01S5/0264—Photo-diodes, e.g. transceiver devices, bidirectional devices for monitoring the laser-output
Landscapes
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Optics & Photonics (AREA)
- Semiconductor Lasers (AREA)
- Photo Coupler, Interrupter, Optical-To-Optical Conversion Devices (AREA)
Description
【発明の詳細な説明】
本発明は光半導体装置、特に周囲条件の変化により出力
状態が大きく変動する半導体レーザー装置に対して有効
な技術となり得る光出力安定化機能を具備する光半導体
装置の製造方法に関するものである。DETAILED DESCRIPTION OF THE INVENTION The present invention is directed to the manufacture of an optical semiconductor device having an optical output stabilization function, which can be an effective technique for optical semiconductor devices, particularly semiconductor laser devices whose output state fluctuates greatly due to changes in ambient conditions. It is about the method.
光半導体装置は、他の半導体装置と同じように固体内の
電子を利用して発光を得るものであるから低消費電力で
あり、また信頼性の点から見ても本質的に消耗する部分
がなく、長寿命であると称されている。Optical semiconductor devices, like other semiconductor devices, use electrons in solids to generate light, so they have low power consumption, and from the point of view of reliability, they inherently have no consumable parts. It is said to have a long lifespan.
しかしながら用途面から考察するに、一般に発光ダイオ
ード、レーザーダイオード等の光半導体装置の光出力は
素子特性の劣化あるいは使用電流、温度、湿度、振動等
の環境、使用条件等によつて変化し、光出力状態は一定
出力を常時維持することが困難となり、不安定な出力状
態を呈する結果となる。従つて安定な光出力源として実
用に供することが必要な場合には従来発光素子の光出力
の変化を検知し、出力量の過不足分を補正する光出力安
定化機構が採用されている。これを半導体レーザーにつ
いて更に詳しく説明すると一般に半導体レーザーの出力
は温度、湿度、振動、使用電流等の環境、使用条件ある
いは経時変化等により出力状態が変動する。従つて安定
なレーザー出力源として実用に供することが必要な場合
には、出力されたレーザー光の1部をサンプルとして抽
出してレーザー光の出力状態を検知し、半導体レーザー
の駆動電流を制御して出力量の変動分を補正する必要が
ある。このため従来より光増幅を行なう共振器の両共振
面が互いに平行で共振面の双方からレーザー光を出力す
るレーザーに於いてはその一方の共振面より出力される
レーザー光を実用に供し、該レーザー光の出力状態を検
知するため他方の共振面よ゛り出力されるレーザー光を
サンプリングレーザー光として利用することにより、半
導体レーザーの駆動電流を制御して、レーザー光の出力
状態を安定に保持していた。共振面の各々から出力され
るレーザー光の出力量は原理的に比例関係を有している
ため、サンプリングレーザー光の出力量を測定すること
により、共振器の他面側から出力されるレーザー光の出
力量が検知できることとなる。この方式の具体的構成を
第1図に示す。第1図について説明すると、半導体レー
ザー1を取付けたヒートシンク2上に光検出器3が設置
され、光検出器3の受光面は半導体レーザー1の共振面
と平行に、即ち、ヒートシンク2取付表面と垂直に、か
つ半導体レーザー1の対向する共振面と一定距離を置い
て配置されている。半導体レーザー1から発振されるレ
ーザー光の放射パターンは第2図に示す如く、共振面で
スポツト状に発振され、光進行方向に沿つて円錐状に拡
大されるコヒーレント光となるため、レーザー光を効率
良く受光検知するためには光検出器3の受光面をレーザ
ー光の進行方向に対して垂直に設けることが望ましい。
一方上記構成とした場合、光検出器3のリード取出電極
面と半導体レーザー1のリード取出電極面が互いに直交
するため、ネールヘツドボンダ法、超音波ボンダ法等に
よるリード線の取付けが同時製作できなくなり、製造ラ
インに対して量産性を阻害する要因となる。However, when considered from an application perspective, the optical output of optical semiconductor devices such as light emitting diodes and laser diodes generally changes depending on the deterioration of element characteristics or the environment and usage conditions such as operating current, temperature, humidity, and vibration. It becomes difficult to maintain a constant output state all the time, resulting in an unstable output state. Therefore, when it is necessary to put it to practical use as a stable light output source, a light output stabilization mechanism is conventionally employed that detects changes in the light output of a light emitting element and corrects excesses and deficiencies in the amount of output. To explain this in more detail regarding semiconductor lasers, the output state of semiconductor lasers generally fluctuates depending on the environment such as temperature, humidity, vibration, and current used, usage conditions, and changes over time. Therefore, if it is necessary to use it practically as a stable laser output source, a part of the output laser light is extracted as a sample, the output state of the laser light is detected, and the driving current of the semiconductor laser is controlled. It is necessary to correct the fluctuations in the output amount. For this reason, in conventional lasers in which both resonant surfaces of a resonator that perform optical amplification are parallel to each other and output laser light from both resonant surfaces, the laser light output from one of the resonant surfaces is used for practical purposes. In order to detect the output state of the laser light, the laser light output from the other resonant surface is used as a sampling laser light to control the drive current of the semiconductor laser and maintain the laser light output state stably. Was. Since the amount of laser light output from each resonant surface has a proportional relationship in principle, by measuring the amount of output of the sampling laser beam, it is possible to determine the amount of laser light output from the other side of the resonator. This means that the output amount can be detected. The specific configuration of this system is shown in FIG. Explaining FIG. 1, a photodetector 3 is installed on a heat sink 2 to which a semiconductor laser 1 is attached, and the light-receiving surface of the photodetector 3 is parallel to the resonance plane of the semiconductor laser 1, that is, the heat sink 2 mounting surface. It is arranged vertically and at a certain distance from the opposing resonant surface of the semiconductor laser 1 . As shown in Fig. 2, the radiation pattern of the laser beam emitted from the semiconductor laser 1 is a coherent beam that is oscillated in a spot shape on the resonant surface and expanded conically along the direction of light propagation. In order to efficiently detect light reception, it is desirable that the light receiving surface of the photodetector 3 be provided perpendicular to the traveling direction of the laser beam.
On the other hand, in the case of the above configuration, since the lead-out electrode surface of the photodetector 3 and the lead-out electrode surface of the semiconductor laser 1 are perpendicular to each other, the lead wires can be attached at the same time by the nail head bonder method, ultrasonic bonder method, etc. This becomes a factor that hinders mass productivity on the manufacturing line.
本発明は上記現状に鑑み、Si単結晶等の半導体材料を
利用し、技術的手段を駆使することによつて量産性向上
を図つた新規有用なモニター付光半導体装置の製造方法
を提供することを目的とするものである。In view of the above-mentioned current situation, the present invention provides a method for manufacturing a new and useful optical semiconductor device with a monitor, which uses semiconductor materials such as Si single crystal and utilizes technical means to improve mass production. The purpose is to
本発明の1実施例について、半導体レーザーを例にとつ
て図面を参照しながら以下に詳説する。One embodiment of the present invention will be described in detail below with reference to the drawings, taking a semiconductor laser as an example.
第3図、第4図、第5図及び第6図は本発明の1実施例
であるモニター付光半導体装置の製造方法を工程順に示
す製造工程図である。第3図A1第4図A1第5図Aは
断面図、第3図B1第4図B1第5図Bはそれぞれ前記
と対応する平面図である。第3図に示す如く、p型Si
単結晶基板4の表面にCVD法あるいは熱酸化法によつ
て1000〜2000八程度の膜厚を有するSlO2膜
5を形成し、一般的に使用されているホトリソグラフィ
法で2m1幅のストライプ状にピツチ間隔約571t7
!tでSiO2膜5を除去する。FIG. 3, FIG. 4, FIG. 5, and FIG. 6 are manufacturing process diagrams showing, in order of process, a method for manufacturing an optical semiconductor device with a monitor, which is an embodiment of the present invention. 3A, 4A, and 5A are sectional views, and FIGS. 3B, 4B, and 5B are plan views corresponding to the above. As shown in Figure 3, p-type Si
A SlO2 film 5 having a thickness of about 1000 to 20008 is formed on the surface of a single crystal substrate 4 by CVD or thermal oxidation, and then formed into stripes with a width of 2 m1 by a commonly used photolithography method. Pitch interval approx. 571t7
! The SiO2 film 5 is removed at t.
次に残存しているSiO2膜5を保護膜として、化学エ
ツチング法によりSlO2膜5が除去された部分に深さ
10〜20μm程度の凹状溝6を形成する。更に第4図
に示す如く、上記SiO2膜5を除去した後再度全面に
SlO2膜7を形成し、凹状溝6の側端面に沿つて1m
771程度このSiO2膜7を除去して後述する光検出
器の受光面とする。残存するSiO2膜7を拡散防止膜
とし、気相成長法でAsをS!02膜7の除去された面
よりp型Sl単結晶基板4内へ拡散させ、Si単結晶基
板4にn型層8及びp−n接合を形成するとともに受光
ダイオードを構成する。この受光ダイオードが光検出器
として作用し、凹状溝6の側端面に光検出器の受光面が
設置されることとなる。S1単結晶基板4裏面に形成さ
れたn型拡散領域は化学エツチング法で除去する。凹状
溝6底部のSiO2膜7を171Lm幅のストライプ状
にエツチング除去し、ホトリソグラフィ法を用いて光検
出器のn型層8上面にn型電極9、半導体レーザー素子
をマウントする凹状溝6底面にp型電極10,S1単結
晶基板4裏面に光検出器のp型電極11をそれぞれAu
−Si共晶合金を用いて真空蒸着する。更に半導体レー
ザー素子をマウントする凹状溝6底面に形成されたp型
電極10上にロウ材としてInあるいはSn等の低融点
金属膜12を1〜5μmの膜厚で被着する。以上の工程
を第5図に示す。次に凹状溝6の中央位置及び凹状溝6
配列ピツチ間隔の中央位置(即ち第5図の破線で示す位
置)でSl単結晶基板4を分割し、ペレツトとする。Next, using the remaining SiO2 film 5 as a protective film, a concave groove 6 with a depth of about 10 to 20 μm is formed in the portion where the SlO2 film 5 has been removed by chemical etching. Furthermore, as shown in FIG. 4, after removing the SiO2 film 5, a SlO2 film 7 is again formed on the entire surface, and a layer of 1 m is formed along the side end surface of the concave groove 6.
Approximately 771 parts of this SiO2 film 7 is removed to form a light receiving surface of a photodetector to be described later. The remaining SiO2 film 7 is used as a diffusion prevention film, and As is grown by vapor phase growth using S! It is diffused into the p-type Sl single-crystal substrate 4 from the removed surface of the 02 film 7, forming an n-type layer 8 and a pn junction on the Si single-crystal substrate 4, and forming a light-receiving diode. This light-receiving diode acts as a photodetector, and the light-receiving surface of the photodetector is installed on the side end surface of the concave groove 6. The n-type diffusion region formed on the back surface of the S1 single crystal substrate 4 is removed by chemical etching. The SiO2 film 7 at the bottom of the concave groove 6 is etched and removed in a stripe shape with a width of 171 Lm, and the bottom surface of the concave groove 6 on which the n-type electrode 9 and the semiconductor laser element are mounted on the top surface of the n-type layer 8 of the photodetector is formed using photolithography. The p-type electrode 10 is made of Au, and the p-type electrode 11 of the photodetector is made of Au on the back surface of the S1 single crystal substrate 4.
Vacuum deposition is performed using a -Si eutectic alloy. Furthermore, a low melting point metal film 12 such as In or Sn is deposited to a thickness of 1 to 5 μm as a brazing material on the p-type electrode 10 formed on the bottom surface of the concave groove 6 in which the semiconductor laser element is mounted. The above steps are shown in FIG. Next, the center position of the concave groove 6 and the concave groove 6
The Sl single crystal substrate 4 is divided into pellets at the center position of the array pitch interval (ie, the position indicated by the broken line in FIG. 5).
このペレツトの金属膜12上に半導体レーザー素子13
を熱融着法または熱圧着法でマウントする。半導体レー
ザー素子13は一方の共振面を凹状溝6の端面、即ち光
検出器の受光面に対向させて配置する。半導体レーザー
素子13のマウントされたペレツトはステム14にIn
,Sn等でロウ付けされ、半導体レーザー素子13のn
型電極16、光検出器のn型電極9には超音波ボンダ法
、ネールヘツドボンダ法等によつてリード線17が取付
けられ、ステム端子と接続される。以上により第6図に
示す如く本発明に係るモニター付半導体レーザー装置が
製作される。A semiconductor laser element 13 is placed on the metal film 12 of this pellet.
Mount using heat fusion or thermocompression method. The semiconductor laser element 13 is arranged with one resonant surface facing the end surface of the concave groove 6, that is, the light receiving surface of the photodetector. The pellet on which the semiconductor laser element 13 is mounted is attached to the stem 14.
, Sn, etc., and the n of the semiconductor laser element 13 is
A lead wire 17 is attached to the type electrode 16 and the n-type electrode 9 of the photodetector by an ultrasonic bonder method, a nail head bonder method, etc., and is connected to a stem terminal. Through the above steps, a semiconductor laser device with a monitor according to the present invention is manufactured as shown in FIG.
上記構成から成る半導体レーザー素子13にn型電極1
6及びp型電極10を介して電圧を印加すると、半導体
レーザー素子13の両共振面間で励起された電子−ホー
ル対の再結合に基く光の誘導放射が起こり、共振面間で
多重往復運動した光は急激に増幅され、各共振面より互
いに逆向きにレーザー光として出力される。An n-type electrode 1 is attached to the semiconductor laser element 13 having the above configuration.
6 and the p-type electrode 10, stimulated emission of light occurs based on recombination of electron-hole pairs excited between both resonance surfaces of the semiconductor laser device 13, and multiple reciprocating movements occur between the resonance surfaces. The emitted light is rapidly amplified and output as laser light from each resonant surface in opposite directions.
一方の共振面より出力されたレーザー光は実用に供され
、他方の共振面より出力されたレーザー光はサンプリン
グレーザー光として対向する光検出器の受光面に照射さ
れる。光検出器は照射されたレーザー光を検知するとと
もにその出力状態を電気信号に変換して制御回路へ供給
する。制御回路はレーザー光の出力状態に応じて半導体
レーザー素子13の,駆動回路を調整し、これによつて
一定のレーザー出力状態が持続される。上記実施例は半
導体レーザーについてその製造方法を説明したが、本発
明はこれに限定されるものではなく広く光半導体装置一
般について適用可能である。The laser light output from one resonant surface is used for practical use, and the laser light output from the other resonant surface is irradiated as sampling laser light onto the light-receiving surface of the opposing photodetector. The photodetector detects the irradiated laser light, converts its output state into an electrical signal, and supplies the electrical signal to the control circuit. The control circuit adjusts the drive circuit of the semiconductor laser element 13 according to the output state of the laser beam, thereby maintaining a constant laser output state. Although the above embodiment describes a method for manufacturing a semiconductor laser, the present invention is not limited thereto and can be widely applied to optical semiconductor devices in general.
また単結晶基板に形成された光検出器はSi以外に受光
素子となり得る材料であれば他のものを使用することが
できる。単結晶基板は上記とは逆にn型を使用してB等
のp型元素を拡散しても本発明のモニター構造を製作で
きることは当然である。本発明に依れば光検出器のリー
ド取出電極と半導体レーザーのリード取出電極面をとも
に上面方向に配置することができるため、リード線取付
が同時製作可能であり、量産ラインに適した製造工程を
得ることができる。Further, the photodetector formed on the single crystal substrate can be made of any material other than Si as long as it can serve as a light receiving element. It goes without saying that the monitor structure of the present invention can be manufactured by using an n-type single crystal substrate and diffusing a p-type element such as B, contrary to the above. According to the present invention, since both the lead extraction electrode of the photodetector and the lead extraction electrode surface of the semiconductor laser can be arranged in the upper surface direction, lead wire attachment can be manufactured at the same time, and the manufacturing process is suitable for mass production lines. can be obtained.
また半導体レーザーと光検出器を同一ヒートシンクに取
付ける場合、位置合わせ等の作業が容易となり、製造コ
ストの縮減に大きく寄与する。Furthermore, when a semiconductor laser and a photodetector are mounted on the same heat sink, operations such as alignment become easier, which greatly contributes to reducing manufacturing costs.
第1図は従来のモニター構造を示す構成図である。
第2図は半導体レーザーの放射パターンを示す説明図で
ある。第3図、第4図、第5図及び第6図は本発明の1
実施例であるモニター付光半導体装置の製造方法を工程
順に示す製造工程図である。4・・・・・・S1単結晶
基板、6・・・・・・凹状溝、8・・・・・・n型層、
9・・・・・・光検出器のn型電極、10・・・・・・
半導体レーザー素子のp型電極、11・・・・・・光検
出器のp型電極、13・・・・・・半導体レーザー素子
、16・・・・・・半導体レーザー素子のn型電極、1
7・・・・・・リード線。FIG. 1 is a block diagram showing a conventional monitor structure. FIG. 2 is an explanatory diagram showing a radiation pattern of a semiconductor laser. 3, 4, 5, and 6 are 1 of the present invention.
FIG. 2 is a manufacturing process diagram showing a method for manufacturing an optical semiconductor device with a monitor according to an embodiment in order of steps. 4... S1 single crystal substrate, 6... Concave groove, 8... N-type layer,
9... N-type electrode of photodetector, 10...
p-type electrode of semiconductor laser device, 11... p-type electrode of photodetector, 13... semiconductor laser device, 16... n-type electrode of semiconductor laser device, 1
7...Lead wire.
Claims (1)
具備して成り、該光検出器の検出信号に呼応して光出力
状態が制御調整されるモニター付光半導体装置の製造方
法に於いて、半導体のベース基板に段差部をエッチング
加工する工程と、該段差部側壁より不純物拡散してp−
n接合を形成するとともに前記段差部側壁を受光面とし
て前記光検出器を構成する工程と、前記段差部底面位置
でかつ出力光の一部が検出光として前記受光面に照射さ
れる位置に前記光半導体素子を配置して前記ベース基板
に固着する工程と、前記光検出器の起電力を取り出すリ
ード線及び前記光半導体素子への給電用リード線を連結
する工程と、を具備して成るモニター付光半導体装置の
製造方法。1. A method for manufacturing an optical semiconductor device with a monitor, which is equipped with a photodetector that detects a part of the output light of an optical semiconductor element, and whose optical output state is controlled and adjusted in response to a detection signal from the photodetector. In this process, a step is etched into a semiconductor base substrate, and an impurity is diffused from the sidewall of the step to form a p-
forming an n-junction and configuring the photodetector using the side wall of the stepped portion as a light-receiving surface; A monitor comprising the steps of arranging and fixing an optical semiconductor element to the base substrate, and connecting a lead wire for extracting the electromotive force of the photodetector and a lead wire for feeding power to the optical semiconductor element. A method for manufacturing an optical semiconductor device.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP52140361A JPS5931998B2 (en) | 1977-11-22 | 1977-11-22 | Manufacturing method of optical semiconductor device with monitor |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP52140361A JPS5931998B2 (en) | 1977-11-22 | 1977-11-22 | Manufacturing method of optical semiconductor device with monitor |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5472991A JPS5472991A (en) | 1979-06-11 |
| JPS5931998B2 true JPS5931998B2 (en) | 1984-08-06 |
Family
ID=15267026
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP52140361A Expired JPS5931998B2 (en) | 1977-11-22 | 1977-11-22 | Manufacturing method of optical semiconductor device with monitor |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5931998B2 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6313099U (en) * | 1986-07-12 | 1988-01-28 |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH07101757B2 (en) * | 1988-03-26 | 1995-11-01 | 三菱電機株式会社 | Semiconductor light emitting device |
| JP2002134822A (en) * | 2000-10-24 | 2002-05-10 | Sharp Corp | Semiconductor light emitting device and method of manufacturing the same |
-
1977
- 1977-11-22 JP JP52140361A patent/JPS5931998B2/en not_active Expired
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6313099U (en) * | 1986-07-12 | 1988-01-28 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5472991A (en) | 1979-06-11 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US6474531B2 (en) | Semiconductor light-emitting device and method of manufacturing the same and mounting plate | |
| US7085300B2 (en) | Integral vertical cavity surface emitting laser and power monitor | |
| US6449296B1 (en) | Semiconductor laser device | |
| US5668822A (en) | Integrated semiconductor laser device | |
| US7804875B2 (en) | Vertical cavity surface emitting laser module having monitoring photodiode and method of fabricating the same | |
| JPS5833885A (en) | Laser diode | |
| JPS5931998B2 (en) | Manufacturing method of optical semiconductor device with monitor | |
| JPS5996789A (en) | Photosemiconductor device | |
| JPH11261111A (en) | Light-emitting device with monitor mechanism | |
| US8687664B2 (en) | Laser assembly with integrated photodiode | |
| JP3443170B2 (en) | Semiconductor laser device | |
| JPS59169190A (en) | light emitting semiconductor device | |
| KR101025428B1 (en) | Submount for photodiode | |
| JPS605592Y2 (en) | semiconductor laser equipment | |
| JPS62143492A (en) | Support and optoelectronic device incorporating this support | |
| JPS63273388A (en) | Semiconductor laser | |
| JP2000183439A (en) | Semiconductor laser | |
| JP2002368274A (en) | Light emitting module and semiconductor light emitting device | |
| JPS62150790A (en) | Supporting body | |
| JPH0951144A (en) | Optoelectronic devices | |
| JPH09326507A (en) | Surface emitting semiconductor light emitting device and manufacturing method thereof | |
| JPS61182291A (en) | Integrated semiconductor laser device | |
| JPS60198885A (en) | Integrated semiconductor laser | |
| JP3369813B2 (en) | Method of manufacturing semiconductor laser device | |
| JPS6293990A (en) | Semiconductor laser device |