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JPS5938815B2 - Microbubble release device in liquid - Google Patents
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JPS5938815B2 - Microbubble release device in liquid - Google Patents

Microbubble release device in liquid

Info

Publication number
JPS5938815B2
JPS5938815B2 JP55108021A JP10802180A JPS5938815B2 JP S5938815 B2 JPS5938815 B2 JP S5938815B2 JP 55108021 A JP55108021 A JP 55108021A JP 10802180 A JP10802180 A JP 10802180A JP S5938815 B2 JPS5938815 B2 JP S5938815B2
Authority
JP
Japan
Prior art keywords
liquid
rotating shaft
rotating body
supply path
gas supply
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP55108021A
Other languages
Japanese (ja)
Other versions
JPS5732723A (en
Inventor
浩三 新井
良達 大塚
繁美 谷本
雅司 坂口
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Altemira Co Ltd
Original Assignee
Showa Aluminum Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Showa Aluminum Corp filed Critical Showa Aluminum Corp
Priority to JP55108021A priority Critical patent/JPS5938815B2/en
Publication of JPS5732723A publication Critical patent/JPS5732723A/en
Publication of JPS5938815B2 publication Critical patent/JPS5938815B2/en
Expired legal-status Critical Current

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01FMIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F23/00Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
    • B01F23/20Mixing gases with liquids
    • B01F23/23Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids
    • B01F23/233Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids using driven stirrers with completely immersed stirring elements
    • B01F23/2331Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids using driven stirrers with completely immersed stirring elements characterised by the introduction of the gas along the axis of the stirrer or along the stirrer elements
    • B01F23/23311Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids using driven stirrers with completely immersed stirring elements characterised by the introduction of the gas along the axis of the stirrer or along the stirrer elements through a hollow stirrer axis
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01FMIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F23/00Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
    • B01F23/20Mixing gases with liquids
    • B01F23/23Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids
    • B01F23/233Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids using driven stirrers with completely immersed stirring elements
    • B01F23/2331Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids using driven stirrers with completely immersed stirring elements characterised by the introduction of the gas along the axis of the stirrer or along the stirrer elements
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01FMIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F23/00Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
    • B01F23/20Mixing gases with liquids
    • B01F23/23Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids
    • B01F23/233Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids using driven stirrers with completely immersed stirring elements
    • B01F23/2331Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids using driven stirrers with completely immersed stirring elements characterised by the introduction of the gas along the axis of the stirrer or along the stirrer elements
    • B01F23/23314Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids using driven stirrers with completely immersed stirring elements characterised by the introduction of the gas along the axis of the stirrer or along the stirrer elements through a hollow stirrer element

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Manufacture And Refinement Of Metals (AREA)

Description

【発明の詳細な説明】 この発明は液中における気泡の微細化放出装置に関する
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a device for emitting fine bubbles in a liquid.

アルミニウム溶湯中に窒素ガスおよびアルゴンガスなど
の不活性ガスを気泡状態で放出し、アルミニウム溶湯中
の水素ガスを除去したり、あるいはアルミニウム、マグ
ネシウムの酸化物などの非金属介在物を除去する方法や
、たとえば化学反応を促進するため、液体中に気体を気
泡状態で放出する気液接触方法があるが、いずれの場合
にも気体と液体との接触を良くするためには、気泡をで
きるだけ微細化し、均一に分散させることが要請せられ
ろ。
A method in which inert gas such as nitrogen gas and argon gas is released in the form of bubbles into molten aluminum to remove hydrogen gas in molten aluminum or non-metallic inclusions such as oxides of aluminum and magnesium. For example, there is a gas-liquid contact method in which gas is released in the form of bubbles into a liquid in order to promote chemical reactions, but in either case, in order to improve the contact between the gas and liquid, the bubbles must be made as fine as possible. , uniform dispersion is required.

この発明の目的は、上記の要請にこたえるとともに、構
造が簡単で操作の容易な液中における気泡の微細化放出
装置を提供することにある。
SUMMARY OF THE INVENTION An object of the present invention is to provide a device for emitting fine bubbles in a liquid, which meets the above-mentioned needs, has a simple structure, and is easy to operate.

この発明の第1番目のものは、液槽と、垂直状の中空回
転軸と、回転軸の下端に取付けられかつ液面の下方に液
槽の底と所定間隔をおいて配置される気泡微細化用回転
体とからなり、上記中空回転軸の中空部が気体供給路と
なされ、上記回転体の底が平坦面となされ、上記気体供
給路の下端が回転体の底部平坦面に開口している液中に
おける気泡の微細化放出装置である。この発明の第2番
目のものは、第1番目の液中における気泡の微細化放出
装置において、回転体の底部平坦面の中央に凹所が設け
られ、回転軸の気体供給路の下端が凹所内に開口してい
るものである。
The first aspect of the present invention is to provide a liquid tank, a vertical hollow rotating shaft, and a bubble microscopic device attached to the lower end of the rotating shaft and disposed below the liquid surface at a predetermined distance from the bottom of the liquid tank. The hollow part of the hollow rotating shaft serves as a gas supply path, the bottom of the rotating body is a flat surface, and the lower end of the gas supply path opens into the bottom flat surface of the rotating body. This is a device for emitting fine bubbles in a liquid. A second aspect of the invention is that in the first device for atomizing and releasing bubbles in a liquid, a recess is provided in the center of the bottom flat surface of the rotating body, and the lower end of the gas supply path of the rotating shaft is recessed. It opens into the facility.

この発明の第3番目のものは、第1番目の液中における
気泡の微細化放出装置において、回転体の底部平坦面に
、気体供給路の開口部から、その周縁に至る複数の溝が
放射状に設けられているものである。
A third aspect of the present invention is that in the first device for atomizing and discharging bubbles in a liquid, a plurality of grooves are formed in the bottom flat surface of the rotating body in a radial pattern extending from the opening of the gas supply path to the periphery thereof. It is provided in

この発明の第4番目のものは、第1番目の液中における
気泡の微細化放出装置において、気泡微細化用回転体の
底部平坦面の中央部に凹所が設けられるとともに凹所か
ら底部平坦面の周縁に至る複数の溝が放射状に設けられ
、中空回転軸の気体供給路の下端が凹所内に開口してい
るものである。
A fourth aspect of the present invention is that in the first device for atomizing and discharging bubbles in a liquid, a recess is provided in the center of the flat bottom surface of the rotating body for air atomization, and the bottom flat surface is flattened from the recess. A plurality of grooves extending to the periphery of the surface are provided radially, and the lower end of the gas supply path of the hollow rotating shaft opens into the recess.

以下、この発明を図面に示す実施例を参照して説明する
。第1図において、この発明の液中における気泡の微細
化放出装置は、液槽1と、垂直状の中空回.転軸2と、
中央部にて中空回転軸2の下端に取付けられかつ液面の
下方に位置する気泡微細化用回転体3とからなる。
The present invention will be described below with reference to embodiments shown in the drawings. In FIG. 1, the apparatus for atomizing and discharging bubbles in a liquid according to the present invention includes a liquid tank 1, a vertical hollow conduit. Rotating axis 2 and
It consists of a rotary body 3 for bubble miniaturization attached to the lower end of a hollow rotary shaft 2 in the center and located below the liquid level.

液槽1にはアルミニウム溶湯4が入れられている。また
、液槽1の中央部に回転軸2のまわりを取り囲む垂直状
の被覆管5が配・されている。被覆管5は上端にて液槽
1の蓋6に取付けられており、この管5の上端は蓋6の
上面に開口している。中空回転軸2は被覆管5に挿通さ
れてその上端は蓋6の上方に伸び、下端は被覆管5の下
端開口から下方に突出している。そして、回転軸2は上
端部にお(・て回転駆動装置(図示りで回転せられるよ
うになされている。また中空回転軸2の中空部は、気体
供給装置(図示略)に連通せしめられた気体供給路7と
なされている。また、中空回転軸2の下端部外周面には
雄ねじ部が形成されている。気泡微細化用回転体3は、
下面が平坦面となされた円盤状であり、その中央部に貫
通孔8があけられている。貫通孔8の上端部には雌ねじ
部が形成されている。そして、この雌ねじ部に中空回転
軸2の雄ねじ部をねじ嵌めることにより、回転体3が回
転軸2に取付けられており、回転軸2の気体供給路7は
貫通孔8を介して回転体3の下面中央部に開口している
。上記のような気泡微細化放出装置において、回転軸2
が駆動装置により高速回転せられるとともに気体供給装
置から供給路7に不活性ガスが供給される。
A liquid tank 1 contains molten aluminum 4. Further, a vertical cladding tube 5 surrounding the rotating shaft 2 is arranged in the center of the liquid tank 1. The upper end of the cladding tube 5 is attached to the lid 6 of the liquid tank 1, and the upper end of the tube 5 is open to the upper surface of the lid 6. The hollow rotary shaft 2 is inserted through the cladding tube 5 , its upper end extends above the lid 6 , and its lower end projects downward from the lower end opening of the cladding tube 5 . The rotating shaft 2 is configured to be rotated by a rotation drive device (as shown in the figure) at its upper end.The hollow portion of the hollow rotating shaft 2 is connected to a gas supply device (not shown). A male threaded portion is formed on the outer circumferential surface of the lower end of the hollow rotating shaft 2.The rotating body 3 for air bubble refinement is
It has a disk shape with a flat lower surface, and a through hole 8 is bored in the center thereof. A female thread is formed at the upper end of the through hole 8 . The rotary body 3 is attached to the rotary shaft 2 by screwing the male screw portion of the hollow rotary shaft 2 into this female screw portion, and the gas supply path 7 of the rotary shaft 2 is connected to the rotary body through the through hole 8. It opens at the center of the bottom surface. In the bubble atomization release device as described above, the rotating shaft 2
is rotated at high speed by the drive device, and inert gas is supplied to the supply path 7 from the gas supply device.

不活性ガスは、供給路7の下端から貫通孔8を経て、回
転体3の底面に供給される。すると、不活性ガスは、回
転体3の底面に沿つて、中央部から外方に拡がり、液圧
によつて回転体3の底面に沿つて薄い不活性ガス層9が
形成される。そして、回転体3の回転作用により生じる
遠心力によつて、不活性ガス層9が細分化され、微細な
気泡10となつて回転体3の周縁から放出される。気泡
10は、矢印で示すように、まず斜め下方に進んだ後槽
底に当つて液槽1の周壁の方に進み、アルミニウム溶湯
4全体に拡がりながら上昇する。この実施例では、中空
回転軸2のまわりが被覆管5に覆われているので、回転
軸2の回転により軸2のまわりに発生する渦流によつて
、液面に浮上している反応生成物や不純物が巻込まれて
アルミニウム溶湯に悪影響を及ぼすのを防ぐことができ
る。しかしながら、上記渦流が発生するのは、回転軸2
の回転速度が3000r.p.mを越えた場合のように
かなり大きくなつたときであり、それ以下の場合には、
被覆管5は必ずしも必要としない気泡をできるだけ微細
化し、均一に液中に放出するためには、回転体の形状お
よび大きさ、回転速度、回転体の液槽の底からの距離等
が重要な因子となる。
The inert gas is supplied to the bottom surface of the rotating body 3 from the lower end of the supply path 7 through the through hole 8 . Then, the inert gas spreads outward from the center along the bottom surface of the rotating body 3, and a thin inert gas layer 9 is formed along the bottom surface of the rotating body 3 due to the hydraulic pressure. Then, due to the centrifugal force generated by the rotating action of the rotating body 3, the inert gas layer 9 is divided into fine bubbles 10 which are released from the periphery of the rotating body 3. As shown by the arrow, the bubbles 10 first advance diagonally downward, hit the tank bottom, advance toward the peripheral wall of the liquid tank 1, and rise while spreading over the entire molten aluminum 4. In this embodiment, since the hollow rotating shaft 2 is covered with the cladding tube 5, the reaction products floating on the liquid surface are generated by the vortex generated around the shaft 2 due to the rotation of the rotating shaft 2. It is possible to prevent impurities from being involved and having a negative effect on the molten aluminum. However, the above-mentioned vortex is generated only at the rotating shaft 2.
The rotation speed is 3000r. p. This is when it becomes quite large, such as when it exceeds m, and when it is less than that,
For the cladding tube 5, the shape and size of the rotating body, the rotation speed, the distance of the rotating body from the bottom of the liquid tank, etc. are important in order to make bubbles that are not necessarily necessary as fine as possible and release them uniformly into the liquid. Become a factor.

回転体の形状は円盤状が好ましい。The rotating body preferably has a disc shape.

回転体の直径は大きい方が好ましい。回転速度は大きい
方が好ましく、通常700〜3000r.p.mが良好
である。回転速度が700r.p.m未満では気泡が微
細化せず、3000r.p.mを越えると回転軸のまわ
りが被覆管で覆われていない場合、回転軸のまわりに渦
流が発生し、液面に浮上している反応生成物や不純物等
が液中に巻込まれ、液に悪影警を及ぼすことがある。回
転体の底面と液槽の底との距離は5〜100Trrmが
好ましい。5wrr1未満では、回転体が槽底に接触す
る危険性があり、100wnを越えると槽の全体に気泡
が行き渡らないことがあるとともに、液中の各部におけ
る微細気泡の密度が不均一になるおそれがある。
It is preferable that the rotating body has a larger diameter. The higher the rotation speed, the better, usually 700 to 3000 r. p. m is good. The rotation speed is 700r. p. If the temperature is less than 3000r.m, the bubbles will not become finer. p. If the rotating shaft is not covered with a cladding tube, a vortex will be generated around the rotating shaft, and reaction products and impurities floating on the liquid surface will be engulfed in the liquid. It may cause negative effects. The distance between the bottom of the rotating body and the bottom of the liquid tank is preferably 5 to 100 Trrm. If it is less than 5wrr1, there is a risk that the rotating body will come into contact with the bottom of the tank, and if it exceeds 100wn, the bubbles may not be distributed throughout the tank, and the density of microbubbles in various parts of the liquid may become uneven. be.

気体の供給圧力は静水圧以上必要である。気体供給量は
液槽の大きさにより決められるが、少ないと気液接触が
不充分になり、逆に多すぎると気泡の微細化が困難にな
つて気液接触効率が悪くなる。第2図ないし第6図には
この発明の気泡微細化用回転体の他の例が示されている
The gas supply pressure must be equal to or higher than the hydrostatic pressure. The amount of gas supplied is determined by the size of the liquid tank, but if it is too small, gas-liquid contact will be insufficient, and if it is too large, it will be difficult to make the bubbles finer and the efficiency of gas-liquid contact will deteriorate. FIGS. 2 to 6 show other examples of the rotary body for making bubbles according to the present invention.

第2図において、気泡微細化用回転体13は、底面の中
央部に凹面状の凹所14が設けられ、回転軸2内の気体
供給路7の下端が凹所14の底部において開口している
In FIG. 2, the bubble-refining rotating body 13 is provided with a concave recess 14 in the center of the bottom surface, and the lower end of the gas supply path 7 in the rotating shaft 2 is opened at the bottom of the recess 14. There is.

このような回転体13を用いた場合には、気体供給装置
から気体供給路7を経て供給された気体は、一旦凹所1
4内にたまつた後、回転体13の回転により、微細化さ
れながら放射状に放出されるので、凹所が設けられてな
いものに比べてより均一に微細気泡を液中に放出するこ
とができる。第3図および第4図において、気泡微細化
用回転体23の底面には、回転体23の中央部に形成さ
れた貫通孔8の下端から周縁に至る複数の溝24が放射
状に設けられている。
When such a rotary body 13 is used, the gas supplied from the gas supply device through the gas supply path 7 is temporarily transferred to the recess 1.
After accumulating in the liquid, the rotating body 13 rotates to release the microbubbles radially into the liquid, making it possible to emit microbubbles more uniformly into the liquid than when no recesses are provided. can. In FIGS. 3 and 4, a plurality of grooves 24 are radially provided on the bottom surface of the rotary body 23 for air bubble refinement, extending from the lower end of the through hole 8 formed in the center of the rotary body 23 to the periphery. There is.

このような回転体23を用いた場合には、中空回転軸2
内部の気体供給路7により供給された気体は、各溝24
間において回転体23の底面に気体層をつくるとともに
、各溝24に分散して入り込み、回転体23の回転によ
つて回転体23の周縁部および各溝24の周縁側の端部
から微細な気泡となつて放出される。したがつて、溝を
設けていないものに比べて気泡の微細化が一層助長され
るとともに、液全体に均一に放出される。さらに、溝2
4が設けられているために、回転体23の回転によつて
溶湯4が攪拌され、気泡10は一層均一に溶湯4中に分
散される。第5図および第6図において、気泡微細化用
回転体33は、底面の中央部に凹面状の凹所34が設け
られ、この凹所34から底面の周縁に至る複数の溝35
が放射状に設けられたものである。
When such a rotating body 23 is used, the hollow rotating shaft 2
The gas supplied from the internal gas supply path 7 is supplied to each groove 24.
At the same time, a gas layer is created on the bottom surface of the rotary body 23 in between, and the gas is dispersed and enters each groove 24, and due to the rotation of the rotary body 23, fine particles are released from the peripheral edge of the rotary body 23 and the peripheral end of each groove 24. It is released in the form of bubbles. Therefore, the bubbles are further promoted to become finer than those without grooves, and are uniformly released throughout the liquid. Furthermore, groove 2
4 is provided, the molten metal 4 is stirred by the rotation of the rotating body 23, and the bubbles 10 are more uniformly dispersed in the molten metal 4. In FIGS. 5 and 6, the bubble-refining rotating body 33 is provided with a concave recess 34 in the center of the bottom surface, and a plurality of grooves 35 extending from this recess 34 to the periphery of the bottom surface.
are arranged radially.

そして、気体供給路7の下端は貫通孔8を介して凹所3
4の底呉に開口している。このような回転体33を用い
た場合、気体供給路7を経て供給された気体は、一旦凹
所34内に入つた後、各溝35間において回転体33の
底面に気体層をつくるとともに、分散されて各溝35に
入り、回転体33の回転により微細気泡となつて放出さ
れる。さらに、回転体33の回転による撹拌作用によつ
て、気泡は均一に分散される。したがつて、凹所34お
よび溝35が設けられていないものに比べて気泡の微細
化および放出の均一化は一層促進される。この発明の液
中における気泡の微細化放出装置によれば、上述のよう
にして、液中に気泡を充分に微細化して放出することが
できる。また、この発明の液中における気泡の微細化放
出装置は、液槽と、垂直状でかつ内部に気体供給路が設
けられた中空回転軸と、回転軸の下端に取付けられかつ
液面の下方に槽底と所要間隔をおいて配置された気泡微
細化用回転体とからなり、気体供給路の下端が回転体の
底部平坦面に開口したものであるから構造が簡単である
。さらに、気泡微細化用回転体を回転させつつ気体供給
路から気体を供給するだけで、液中への微細気泡の放出
を行いうるので、操作も容易になる。さらに、第2ない
し第4番目の発明によれば、放出気泡の微細化および均
一化が一層促進される。
The lower end of the gas supply path 7 is connected to the recess 3 through the through hole 8.
It opens at the bottom of No. 4. When such a rotating body 33 is used, the gas supplied through the gas supply path 7 once enters the recess 34 and then forms a gas layer on the bottom surface of the rotating body 33 between the grooves 35. The gas is dispersed and enters each groove 35, and is released as fine bubbles by the rotation of the rotating body 33. Furthermore, the bubbles are uniformly dispersed due to the stirring action caused by the rotation of the rotating body 33. Therefore, miniaturization of bubbles and uniform release of bubbles are further promoted compared to a structure in which the recesses 34 and grooves 35 are not provided. According to the apparatus for atomizing and discharging bubbles in a liquid according to the present invention, bubbles can be sufficiently miniaturized and discharged into a liquid as described above. Further, the device for atomizing and discharging bubbles in a liquid according to the present invention includes a liquid tank, a hollow rotating shaft that is vertical and has a gas supply path provided therein, and a hollow rotating shaft that is attached to the lower end of the rotating shaft and located below the liquid level. The structure is simple because the lower end of the gas supply path is open to the bottom flat surface of the rotor, and the gas supply path is opened at the bottom flat surface of the rotor. Furthermore, the operation becomes easy because fine bubbles can be discharged into the liquid simply by supplying gas from the gas supply path while rotating the rotary body for making bubbles fine. Furthermore, according to the second to fourth inventions, the miniaturization and uniformity of the discharged bubbles is further promoted.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図はこの発明の実施例を示す縦断面図、第2図は気
泡微細化用回転体の他の実施例を示す垂直断面図、第3
図および第4図は気泡微細化用回転体のさらに他の実施
例を示し、第3図は垂直断面図、第4図は底面図、第5
図および第6図は気泡微細化用回転体のさらに他の実施
例を示し、第5図は垂直断面図、第6図は底面図である
。 1・・・・・・液槽、2・・・・・・中空回転軸、3,
13,23,33・・・・・・気泡微細化用回転体、7
・・・・・・気体供給路、14・・・・・・凹所、24
・・・・・・溝、34・・・・・・凹所、35・・・・
・・溝。
FIG. 1 is a vertical sectional view showing an embodiment of the present invention, FIG. 2 is a vertical sectional view showing another embodiment of the rotary body for bubble refinement, and FIG.
Figures 4 and 4 show still another embodiment of the rotating body for bubble refinement, with Figure 3 being a vertical sectional view, Figure 4 being a bottom view, and Figure 5 being a bottom view.
The figures and FIG. 6 show still another embodiment of the rotating body for bubble refinement, with FIG. 5 being a vertical sectional view and FIG. 6 being a bottom view. 1...Liquid tank, 2...Hollow rotating shaft, 3,
13, 23, 33...Rotating body for bubble refinement, 7
... Gas supply path, 14 ... Recess, 24
...Groove, 34...Recess, 35...
··groove.

Claims (1)

【特許請求の範囲】 1 液槽1と、垂直状の中空回転軸2と、回転軸2の下
端に取付けられかつ液面の下方に液槽1の底と所定間隔
をおいて配置される気泡微細化用回転体3とからなり、
上記中空回転軸2の中空部が気体供給路7となされ、上
記回転体3の底が平坦面となされ、上記気体供給路7の
下端が回転体3の底部平坦面に開口している液中におけ
る気泡の微細化放出装置。 2 液槽1と、垂直状の中空回転軸2と、回転軸2の下
端に取付けられかつ液面の下方に液槽1の底と所定間隔
をおいて配置される気泡微細化用回転体13とからなり
、上記中空回転軸2の中空部が気体供給路7となされ、
上記回転体13の底が平坦面となされ、この平坦面の中
央部に凹所14が設けられ、上記気体供給路7の下端が
凹所14内に開口している液中における気泡の微細化放
出装置。 3 液槽1と、垂直状の中空回転軸2と、回転軸2の下
端に取付けられかつ液面の下方に液槽1の底と所定間隔
をおいて配置される気泡微細化用回転体23とからなり
、上記中空回転軸2の中空部が気体供給路7となされ、
上記回転体23の底が平坦面となされ、気体供給路7の
下端が回転体23の底部平坦面に開口し、上記回転体2
3の底に、供給路7の開口部から周縁に至る複数の溝2
4が放射状に設けられている液中における気泡の微細化
放出装置。 4 液槽1と、垂直状の中空回転軸2と、回転軸2の下
端に取付けられかつ液面の下方に液槽1の底と所定間隔
をおいて配置される気泡微細化用回転体33とからなり
、上記中空回転軸2の中空部が気体供給路7となされ、
上記回転体33の底が平坦面となされ、この平坦面の中
央に凹所34が設けられるとともに、凹所34から周縁
に至る複数の溝35が設けられ、上記気体供給路7の下
端が上記凹所34内に開口している液中における気泡の
微細化放出装置。
[Scope of Claims] 1. A liquid tank 1, a vertical hollow rotating shaft 2, and a bubble attached to the lower end of the rotating shaft 2 and arranged below the liquid surface at a predetermined distance from the bottom of the liquid tank 1. It consists of a rotating body 3 for miniaturization,
The hollow part of the hollow rotating shaft 2 is a gas supply path 7, the bottom of the rotating body 3 is a flat surface, and the lower end of the gas supply path 7 is open to the bottom flat surface of the rotating body 3. Microbubble release device. 2. A liquid tank 1, a vertical hollow rotating shaft 2, and a rotating body 13 for bubble miniaturization that is attached to the lower end of the rotating shaft 2 and arranged below the liquid surface at a predetermined distance from the bottom of the liquid tank 1. The hollow part of the hollow rotating shaft 2 is made into a gas supply path 7,
The bottom of the rotating body 13 is a flat surface, a recess 14 is provided in the center of the flat surface, and the lower end of the gas supply path 7 opens into the recess 14. Minimization of air bubbles in the liquid. Emission device. 3. A liquid tank 1, a vertical hollow rotating shaft 2, and a rotating body 23 for bubble miniaturization, which is attached to the lower end of the rotating shaft 2 and arranged below the liquid surface at a predetermined distance from the bottom of the liquid tank 1. The hollow part of the hollow rotating shaft 2 is made into a gas supply path 7,
The bottom of the rotating body 23 is a flat surface, and the lower end of the gas supply path 7 is opened to the bottom flat surface of the rotating body 23.
3, a plurality of grooves 2 extending from the opening of the supply path 7 to the periphery
4 is provided radially in a liquid for atomizing and emitting bubbles. 4 A liquid tank 1, a vertical hollow rotating shaft 2, and a rotating body 33 for bubble miniaturization that is attached to the lower end of the rotating shaft 2 and arranged below the liquid surface at a predetermined distance from the bottom of the liquid tank 1. The hollow part of the hollow rotating shaft 2 is made into a gas supply path 7,
The bottom of the rotating body 33 is a flat surface, and a recess 34 is provided in the center of this flat surface, and a plurality of grooves 35 are provided extending from the recess 34 to the periphery. A device for atomizing and releasing air bubbles in a liquid that opens into a recess 34.
JP55108021A 1980-08-05 1980-08-05 Microbubble release device in liquid Expired JPS5938815B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP55108021A JPS5938815B2 (en) 1980-08-05 1980-08-05 Microbubble release device in liquid

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP55108021A JPS5938815B2 (en) 1980-08-05 1980-08-05 Microbubble release device in liquid

Publications (2)

Publication Number Publication Date
JPS5732723A JPS5732723A (en) 1982-02-22
JPS5938815B2 true JPS5938815B2 (en) 1984-09-19

Family

ID=14473959

Family Applications (1)

Application Number Title Priority Date Filing Date
JP55108021A Expired JPS5938815B2 (en) 1980-08-05 1980-08-05 Microbubble release device in liquid

Country Status (1)

Country Link
JP (1) JPS5938815B2 (en)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5527381A (en) * 1994-02-04 1996-06-18 Alcan International Limited Gas treatment of molten metals
US6056803A (en) * 1997-12-24 2000-05-02 Alcan International Limited Injector for gas treatment of molten metals
US6108943A (en) * 1998-01-30 2000-08-29 Nike, Inc. Article of footwear having medial and lateral sides with differing characteristics
JP4758204B2 (en) * 2005-11-17 2011-08-24 富士重工業株式会社 Work positioning device for press machine
JP2007253083A (en) * 2006-03-23 2007-10-04 Ebara Corp Agitating aerator and sewage treatment plant
JP2022092459A (en) * 2020-12-10 2022-06-22 オウ チュン コー チー クー フェン ユー シェン コン スー Fine fluid structure generation mechanism and fine fluid structure generation device using the same

Also Published As

Publication number Publication date
JPS5732723A (en) 1982-02-22

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