JPS6045929B2 - Microbubble dispersion device - Google Patents
Microbubble dispersion deviceInfo
- Publication number
- JPS6045929B2 JPS6045929B2 JP56115540A JP11554081A JPS6045929B2 JP S6045929 B2 JPS6045929 B2 JP S6045929B2 JP 56115540 A JP56115540 A JP 56115540A JP 11554081 A JP11554081 A JP 11554081A JP S6045929 B2 JPS6045929 B2 JP S6045929B2
- Authority
- JP
- Japan
- Prior art keywords
- rotating body
- tank
- bubbles
- liquid
- gas
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F23/00—Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
- B01F23/20—Mixing gases with liquids
- B01F23/23—Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids
- B01F23/233—Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids using driven stirrers with completely immersed stirring elements
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F23/00—Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
- B01F23/20—Mixing gases with liquids
- B01F23/23—Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids
- B01F23/233—Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids using driven stirrers with completely immersed stirring elements
- B01F23/2336—Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids using driven stirrers with completely immersed stirring elements characterised by the location of the place of introduction of the gas relative to the stirrer
- B01F23/23362—Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids using driven stirrers with completely immersed stirring elements characterised by the location of the place of introduction of the gas relative to the stirrer the gas being introduced under the stirrer
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F27/00—Mixers with rotary stirring devices in fixed receptacles; Kneaders
- B01F27/05—Stirrers
- B01F27/11—Stirrers characterised by the configuration of the stirrers
- B01F27/115—Stirrers characterised by the configuration of the stirrers comprising discs or disc-like elements essentially perpendicular to the stirrer shaft axis
- B01F27/1154—Stirrers characterised by the configuration of the stirrers comprising discs or disc-like elements essentially perpendicular to the stirrer shaft axis the discs being cup shaped, e.g. semi sphere
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Mixers Of The Rotary Stirring Type (AREA)
- Manufacture And Refinement Of Metals (AREA)
Description
【発明の詳細な説明】 この発明は気泡の微細化分散装置に関する。[Detailed description of the invention] The present invention relates to an apparatus for atomizing and dispersing bubbles.
アルミニウム溶湯中に窒素ガスやアルゴンガスのような
不活性ガスを気泡状態で放出し、アルミニウム溶湯中の
水素などのガスやアルミニウム、マグネシウムの酸化物
などの介在物を除去する方法や、またたとえば化学反応
を促進するため、液体中に気体をバブリングする気液接
触方法があ、′ 、 一戸 ▼ 1−1、、、Lム n
、↓日Λを、Jを三゛Aμ LCサ!14−& Lの接
触を良好なものとするためには、気泡をてきるだけ微細
化し、液中に均一に分散させることが要請せられる。こ
の発明の目的は、上記の要請にこたえるとともに、構造
が簡単で操作の容易な気泡の微細化分散装置を提供する
ことにある。There are methods for removing gases such as hydrogen and inclusions such as aluminum and magnesium oxides in the molten aluminum by releasing an inert gas such as nitrogen gas or argon gas in the form of bubbles into the molten aluminum. In order to promote the reaction, there is a gas-liquid contact method in which gas is bubbled into the liquid.
,↓day Λ, J to 3゛Aμ LC sa! In order to achieve good contact between 14-&L, it is required to make the bubbles as fine as possible and to disperse them uniformly in the liquid. SUMMARY OF THE INVENTION An object of the present invention is to provide a bubble atomization and dispersion device that meets the above requirements, has a simple structure, and is easy to operate.
以下、この発明を図面の実施例により具体的に説明する
。Hereinafter, the present invention will be specifically explained with reference to embodiments of the drawings.
第1図、第2図において、この発明による気泡の微細化
分散装置は、槽1と、同槽1内に配置された回転軸2と
、同回転軸2の下端に取付けられた気泡細化分散用回転
体3と、同槽1の底部に配された気体供給管5とからな
る。1 and 2, the bubble atomization and dispersion device according to the present invention includes a tank 1, a rotating shaft 2 disposed in the tank 1, and a bubble atomizing device attached to the lower end of the rotating shaft 2. It consists of a dispersion rotating body 3 and a gas supply pipe 5 arranged at the bottom of the tank 1.
槽1内にはアルミニウム溶湯4が入れられている。そし
て回転体3は同溶湯4中において、槽底と所要間隔を置
いて位置している。回転軸2は上端にて回転駆動装置に
よつて回転せられるようになされている。同軸2の下端
部には雄ねじ6が刻設されている。ま回転体3は上面か
ら見て円形てあつて、頂面7はJ突球面となされ、底面
8は平坦面となされている。回転体3の頂部中央には垂
直に雌ねじ部9が形成されている。そしてこれが回転軸
2の雄ねじ部6にねじ合されることにより、回転体3が
回転軸2の下端に取付けられている。回転体3の周縁門
11には、複数の垂直溝12が、等間隔おきに形成さ
れている。また気体供給管5の開口10は回転体3の底
面中央部に真下から臨ませられている。回転体3の底面
と気体供給管5の開口10の間隔は、小さい方が有利で
あり、通常50Wr!!l以内である。上記構成の気泡
の微細化分散装置において、転体2は駆動装置により高
速回転せられ、気体供給管5には気体供給装置から不活
性ガスが導入される。Molten aluminum 4 is placed in the tank 1. The rotating body 3 is located in the molten metal 4 at a required distance from the tank bottom. The rotating shaft 2 is adapted to be rotated at its upper end by a rotational drive device. A male thread 6 is cut into the lower end of the coaxial 2. The rotating body 3 has a circular shape when viewed from above, the top surface 7 is a J-shaped spherical surface, and the bottom surface 8 is a flat surface. A female threaded portion 9 is vertically formed at the center of the top of the rotating body 3 . The rotating body 3 is attached to the lower end of the rotating shaft 2 by screwing this into the male threaded portion 6 of the rotating shaft 2. A plurality of vertical grooves 12 are formed in the peripheral gate 11 of the rotating body 3 at equal intervals. Further, the opening 10 of the gas supply pipe 5 faces the center of the bottom surface of the rotating body 3 from directly below. It is advantageous to have a smaller distance between the bottom surface of the rotating body 3 and the opening 10 of the gas supply pipe 5, and it is usually 50Wr! ! It is within l. In the bubble atomization and dispersion device configured as described above, the rolling body 2 is rotated at high speed by a drive device, and an inert gas is introduced into the gas supply pipe 5 from the gas supply device.
不活性ガスは開口10を経て、回転体3の底面8に供給
される。すると、不活性ガスは回転体3の底面8に沿つ
て中央部から周縁に拡がり、液圧によつて回転体3の底
面8に沿つて薄い気体層を形成する。そして、同層は回
転体3の回転によるせん断作用および遠心力によつて細
分化され、微細な気泡が形成されて回転体3の周縁から
放散される。さらに放散気泡は垂直溝12によつて砕か
れて、一層微細化される。また垂直溝12によつて液が
よく攪拌され、そのため気泡が槽内全体に均一に分散せ
られる。なお、回転体3の頂面7は突球面となされてい
るため、液は第1図に矢印Aで示すように、槽内のほぼ
全体を回流する。The inert gas is supplied to the bottom surface 8 of the rotating body 3 through the opening 10. Then, the inert gas spreads along the bottom surface 8 of the rotating body 3 from the center to the periphery, and forms a thin gas layer along the bottom surface 8 of the rotating body 3 due to the hydraulic pressure. The same layer is then fragmented by the shearing action and centrifugal force caused by the rotation of the rotating body 3, and fine bubbles are formed and dispersed from the periphery of the rotating body 3. Furthermore, the diffused bubbles are crushed by the vertical grooves 12 and made even finer. Further, the liquid is well stirred by the vertical grooves 12, so that air bubbles are uniformly dispersed throughout the tank. Since the top surface 7 of the rotating body 3 is a convex spherical surface, the liquid circulates almost throughout the tank as shown by arrow A in FIG.
この液の流れによつて、微細化気泡が槽内に均一に分散
せられる。なお、回転体3の頂面7は突球面に限定され
るものてはなく、たとえば下方に未広がり状の面てもよ
い。第3図は回転体の第1変形例を示すもので、回転体
3の頂面7に頂部放射溝13が形成され、これらがそれ
ぞれ垂直溝12に連通している。この場合頂部放射溝1
3によつて気泡の微細化が一層助長され、また同溝13
によつて液がよく攪拌さ.れるため、気泡の均一分散効
果もさらに向上する。また第3図に鎖線で示すように、
回転体3の周縁にて各頂部放射溝13の間にこれらに連
通しない垂直溝14が形成されてもよい。第4図、第5
図は回転体の第2の変形例を示す.もので、回転体3の
底面8の中央部に凹所15が形成されている。The flow of this liquid causes the fine bubbles to be uniformly dispersed within the tank. Note that the top surface 7 of the rotating body 3 is not limited to a convex spherical surface, and may be a surface that does not expand downward, for example. FIG. 3 shows a first modification of the rotating body, in which top radial grooves 13 are formed on the top surface 7 of the rotating body 3, and these communicate with the vertical grooves 12, respectively. In this case, the top radial groove 1
3 further promotes the miniaturization of bubbles, and the same groove 13
Stir the liquid well. As a result, the effect of uniformly dispersing bubbles is further improved. Also, as shown by the chain line in Figure 3,
A vertical groove 14 that does not communicate with each of the top radial grooves 13 may be formed at the peripheral edge of the rotating body 3 between the top radial grooves 13. Figures 4 and 5
The figure shows a second modification of the rotating body. A recess 15 is formed in the center of the bottom surface 8 of the rotating body 3.
この場合中空部から供給された気体は、一旦凹所15内
に溜つて頂溜層を形成する。そして回転体3の回転によ
り、同層が細分化さらに微細化されながら周縁方向に放
出される。そのため一層微細な気泡が形成される。第6
図、第7図は回転体の第3の変形例を示すものて、回転
体3の底面8に底部放射溝16が形成されている。この
場合回転体3の底面8に形成された気体層は、底部放射
溝16によつて砕かれて、細分化さらに微細化される。
したがつて気泡の微細化が一層助長される。また底部放
射溝16によつても液がよく攪拌されるため、気泡の均
一分散効果もさらに向上する。第8図、第9図は回転体
の第4の変形例を示すもので、回転体3の底面8の中央
部に凹所15が形成されるとともに、凹所15から底面
8の周縁に底部放射溝16が形成されている。In this case, the gas supplied from the hollow portion is temporarily accumulated in the recess 15 to form a top layer. Then, as the rotating body 3 rotates, the same layer is finely divided and further refined while being discharged toward the circumferential edge. Therefore, even finer bubbles are formed. 6th
FIG. 7 shows a third modification of the rotating body, in which a bottom radial groove 16 is formed in the bottom surface 8 of the rotating body 3. In this case, the gas layer formed on the bottom surface 8 of the rotating body 3 is crushed by the bottom radial grooves 16, and is further divided into fine particles.
Therefore, the miniaturization of the bubbles is further promoted. Furthermore, since the liquid is well stirred by the bottom radial groove 16, the effect of uniformly dispersing bubbles is further improved. 8 and 9 show a fourth modification of the rotating body, in which a recess 15 is formed in the center of the bottom surface 8 of the rotating body 3, and a bottom portion is formed from the recess 15 to the periphery of the bottom surface 8. Radial grooves 16 are formed.
この場合第”2変形例と第3変形例を合せた作用が発揮
される。第3および第4変形例において底部放射溝16
は気泡の案内溝としての役目も果すため、気泡が回転体
3から放射状に放出される。In this case, a combined effect of the second modification and the third modification is exhibited.In the third and fourth modifications, the bottom radial groove 16
Since the grooves also serve as bubble guide grooves, the bubbles are released radially from the rotating body 3.
したがつて気泡が槽内において局在することがなく、こ
の点でも均一分散が達せられる。この発明による気泡の
微細化分散装置において、気泡をできるだけ微細化し、
均一に液中に放出するためには、回転体の形状および大
きさ、回転速度、回転体の槽底からの距離等が重要な因
子となる。Therefore, bubbles are not localized within the tank, and uniform dispersion is achieved in this respect as well. In the bubble dispersion device according to the present invention, the bubbles are made as fine as possible,
For uniform release into the liquid, the shape and size of the rotating body, the rotation speed, the distance of the rotating body from the bottom of the tank, etc. are important factors.
回転体の形状は円盤状が好ましい。回転体の直径は大き
い方が好ましい。回転速度は大きい方が好ましく、通常
700〜3000r′.P.mか良好である。回転速度
が700r.p.m未満では気泡が微細化せず、300
0r′.P.mを越えると回転軸のまわりに渦流が発生
し、液面に浮上している反応生成物や不純物等が液中に
巻込まれ、液に悪影響を及ぼすことがある。渦流を防止
するには槽内にバッフル板を配置するとよい。回転体の
底面と槽底との距離は5〜100Tn!nが好ましい。
5?未満ては、回転体が槽底に接触する危険性があり、
100WLを越えると槽の全体に気泡が行き渡らないこ
とがあるとともに、液中の各部における微細気泡の密度
が不均一になるおそれがある。The shape of the rotating body is preferably a disc. It is preferable that the rotating body has a larger diameter. The higher the rotation speed, the better, usually 700 to 3000 r'. P. m is good. The rotation speed is 700r. p. If it is less than 300 m, the bubbles will not become finer.
0r'. P. If it exceeds m, a vortex is generated around the rotating shaft, and reaction products, impurities, etc. floating on the liquid surface are drawn into the liquid, which may have an adverse effect on the liquid. To prevent swirling currents, it is recommended to place a baffle plate inside the tank. The distance between the bottom of the rotating body and the bottom of the tank is 5 to 100Tn! n is preferred.
5? Otherwise, there is a risk that the rotating body will come into contact with the tank bottom.
If it exceeds 100 WL, the bubbles may not be distributed throughout the tank, and the density of microbubbles in various parts of the liquid may become non-uniform.
気体の供給圧力は静水圧以上必要である。気体供給量は
槽の大きさにより決められるが、少ないと気液接触が不
充分になり、逆に多すぎると気泡の微細化が困難になつ
て気液接触効率が悪くなる。この発明による気泡の微細
化分散装置は、槽1内に垂直回転軸2が宙吊り状に配置
され、同軸2の下端に平坦底面8を有する気泡微細化分
散用回転体3が取付けられ、槽1の底部に気体供給管5
が配されて、その開口10が回転体3の底面中央部に真
下から臨ませられ、回転体3の周縁11に少なくとも1
つの垂直溝12が形成されてなるものてあるのて、気体
供給管5から回転体3の底面に供給された気体は、同底
面に沿つて気体層を形成し、これが回転体3の回転によ
るせん断作用および遠心力によつて細分化され、微細な
気泡が形成される。The gas supply pressure must be equal to or higher than the hydrostatic pressure. The amount of gas supplied is determined by the size of the tank, but if it is too small, the gas-liquid contact will be insufficient, and if it is too large, it will be difficult to make the bubbles finer and the efficiency of the gas-liquid contact will be poor. In the bubble atomization and dispersion device according to the present invention, a vertical rotating shaft 2 is disposed in a suspended manner in a tank 1, a rotary body 3 for air bubble atomization and dispersion having a flat bottom surface 8 is attached to the lower end of the coaxial shaft 2; Gas supply pipe 5 at the bottom of
is arranged so that its opening 10 faces the center of the bottom surface of the rotating body 3 from directly below, and at least one
Since two vertical grooves 12 are formed, the gas supplied from the gas supply pipe 5 to the bottom surface of the rotating body 3 forms a gas layer along the bottom surface, which is caused by the rotation of the rotating body 3. It is fragmented by shearing action and centrifugal force, forming fine bubbles.
ついで気泡は垂直溝12によつて破砕されて一層微細化
される。また液は垂直溝12によつてよく攪拌されて、
気泡が槽内全体に均一に分散せられる。こうしてこの発
明によれば、簡単な構造の装置によつて、気泡を著しく
微細化し、かつ槽内に均一に分散させることができる。The bubbles are then crushed by the vertical grooves 12 to become even finer. In addition, the liquid is well stirred by the vertical grooves 12,
Air bubbles are evenly distributed throughout the tank. Thus, according to the present invention, air bubbles can be made extremely fine and uniformly dispersed within the tank using a device with a simple structure.
第1図はこの発明の実施例を示す縦断面図、第2図は第
1図上の■−■線に沿う断面図、第3図は回転体の第1
変形例を示す第2図相当の断面図、第4図および第5図
は回転体の第2変形例を示す縦断面図および底面図、第
6図および第7図は回転体の第3の変形例を示す縦断面
図および底面図、第8図および第9図は回転体の第4変
形例を示す縦断面図および底面図である。
1・・・槽、2・・・回転軸、3・・・回転体、4・・
・アルミニウム溶湯、5・・・気体供給管、8・・・底
面、10・・開口、11・・・周縁、12・・・垂直溝
、13・・・頂部放射溝、15・・・凹所、16・・・
底部放射溝。FIG. 1 is a longitudinal sectional view showing an embodiment of the present invention, FIG. 2 is a sectional view taken along the line ■-■ in FIG. 1, and FIG.
4 and 5 are vertical sectional views and bottom views showing a second modification of the rotating body, and FIGS. 6 and 7 are a sectional view corresponding to the third modification of the rotating body. A longitudinal sectional view and a bottom view showing a modification, and FIGS. 8 and 9 are a longitudinal sectional view and a bottom view showing a fourth modification of the rotating body. 1... Tank, 2... Rotating shaft, 3... Rotating body, 4...
- Molten aluminum, 5... Gas supply pipe, 8... Bottom surface, 10... Opening, 11... Periphery, 12... Vertical groove, 13... Top radial groove, 15... Recess , 16...
Bottom radial groove.
Claims (1)
軸2の下端に平坦底面8を有する気泡細化分散用回転体
3が取付けられ、槽1の底部に気体供給管5が配されて
、その開口10が回転体3の底面中央部に真下から臨ま
せられ、回転体3の周縁11に少なくとも1つの垂直溝
12が形成されている気泡の微細化分散装置。 2 回転体3の頂面7に頂部放射溝13が形成されてい
る特許請求の範囲第1項記載の装置。 3 回転体3の底面8の中央部に凹所15が形成されて
いる特許請求の範囲第1または第2項記載の装置。 4 回転体3の底面8に底部放射溝16が形成されてい
る特許請求の範囲第1〜3のうちいずれか1項記載の装
置。[Claims] 1. A vertical rotating shaft 2 is suspended in a tank 1, and a rotary body 3 for bubble thinning and dispersion having a flat bottom surface 8 is attached to the lower end of the vertical rotating shaft 2. A gas supply pipe 5 is disposed, its opening 10 faces the center of the bottom surface of the rotating body 3 from directly below, and at least one vertical groove 12 is formed in the peripheral edge 11 of the rotating body 3. Device. 2. The device according to claim 1, wherein a top radial groove 13 is formed on the top surface 7 of the rotating body 3. 3. The device according to claim 1 or 2, wherein a recess 15 is formed in the center of the bottom surface 8 of the rotating body 3. 4. The device according to any one of claims 1 to 3, wherein the bottom radial groove 16 is formed on the bottom surface 8 of the rotating body 3.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP56115540A JPS6045929B2 (en) | 1981-07-22 | 1981-07-22 | Microbubble dispersion device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP56115540A JPS6045929B2 (en) | 1981-07-22 | 1981-07-22 | Microbubble dispersion device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5817823A JPS5817823A (en) | 1983-02-02 |
| JPS6045929B2 true JPS6045929B2 (en) | 1985-10-12 |
Family
ID=14665055
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP56115540A Expired JPS6045929B2 (en) | 1981-07-22 | 1981-07-22 | Microbubble dispersion device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6045929B2 (en) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6134126A (en) * | 1984-07-24 | 1986-02-18 | Kobe Steel Ltd | Treating method for molten aluminum and its alloy |
| GB2396310A (en) | 2002-12-21 | 2004-06-23 | Foseco Int | Rotary device with vanes for dispersing a gas in a molten metal |
| JP6196533B2 (en) * | 2013-11-06 | 2017-09-13 | 三井金属鉱業株式会社 | Degassing apparatus, degassing method, molten metal stirrer and method for producing the same |
| JP2017113687A (en) * | 2015-12-22 | 2017-06-29 | アイシン精機株式会社 | Gas-liquid mixer |
| JP6169207B1 (en) * | 2016-02-29 | 2017-07-26 | 株式会社メデック | Rotating body for stirring and stirring device |
| JP6558706B2 (en) * | 2017-01-13 | 2019-08-14 | 直樹 會田 | Stirrer for stirrer |
| JP7655837B2 (en) * | 2021-11-08 | 2025-04-02 | ウォーターナビ株式会社 | Microbubble generator |
-
1981
- 1981-07-22 JP JP56115540A patent/JPS6045929B2/en not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5817823A (en) | 1983-02-02 |
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