JPS5950461B2 - Micro group forming device - Google Patents
Micro group forming deviceInfo
- Publication number
- JPS5950461B2 JPS5950461B2 JP53043225A JP4322578A JPS5950461B2 JP S5950461 B2 JPS5950461 B2 JP S5950461B2 JP 53043225 A JP53043225 A JP 53043225A JP 4322578 A JP4322578 A JP 4322578A JP S5950461 B2 JPS5950461 B2 JP S5950461B2
- Authority
- JP
- Japan
- Prior art keywords
- rotating body
- workpiece
- cylindrical rotating
- micro
- group forming
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Liquid Crystal (AREA)
- Grinding Of Cylindrical And Plane Surfaces (AREA)
Description
【発明の詳細な説明】
本発明はガラス板、化粧板などの平板状被加工物に一定
方向のマイクログループを形成するマイクログループ形
成装置に関するものである。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a micro group forming apparatus for forming micro groups in a fixed direction on a flat workpiece such as a glass plate or a decorative board.
ガラス板、化粧板などの中には第1図に示すように被加
工物1に一定方向のマイクログループを矢印の如く矩形
状被加工物1の辺に対し直角あるいは平行以外に形成す
る必要のものがある。液晶表示素子基板の場合には被加
工物1の一辺に対し40度〜50度の角度でマイクログ
ループを形成したとき配向特性の良好な素子基板が得ら
れる。このようなマイクログループを形成する従来方法
は第2図に示す如く矩形状被加工物1の一辺をテーブル
2の運動方向(矢印)に対し必要な角度をもたせて保持
し、繊維質あるいは砥粒などで被覆された円筒回転体3
の回転軸とテーブル2の運動方向が直交するようテーブ
ル2を運動せしめてマイクログループを一定方向に形成
する。このような形成方法では被加工物1を保持するテ
ーブル2が大きくなること、円筒回転体3の長さが大き
くなるので、マイクログループの形成装置としては大型
になる欠点がある。また被加工物1の全面に対し均一な
マイクログループを形成しようとすれば、テーブル2、
円筒回転体3をそれぞれ高精度に製作組立をしなければ
ならない欠点がある。本発明の目的は上記した従来技術
の欠点をなくし、ガラス基板化粧板等の表面に一定方向
の高精度マイクログループを形成することができるよう
にしたマイクログループ形成装置を提供するにあ’る。As shown in Fig. 1, in some glass plates, decorative boards, etc., it is necessary to form micro groups in a certain direction on the workpiece 1 in a direction other than perpendicular or parallel to the sides of the rectangular workpiece 1, as shown by the arrows. There is something. In the case of a liquid crystal display element substrate, when microgroups are formed at an angle of 40 degrees to 50 degrees with respect to one side of the workpiece 1, an element substrate with good alignment characteristics can be obtained. The conventional method for forming such microgroups is to hold one side of a rectangular workpiece 1 at a necessary angle to the direction of movement (arrow) of the table 2, as shown in FIG. Cylindrical rotating body 3 covered with etc.
The table 2 is moved so that the axis of rotation of the table 2 and the direction of movement of the table 2 are perpendicular to each other to form micro groups in a fixed direction. In such a forming method, the table 2 that holds the workpiece 1 becomes large, and the length of the cylindrical rotating body 3 becomes large, so that the micro group forming apparatus has the disadvantage of becoming large. In addition, if you want to form uniform micro groups on the entire surface of the workpiece 1, the table 2,
There is a drawback that each cylindrical rotating body 3 must be manufactured and assembled with high precision. SUMMARY OF THE INVENTION An object of the present invention is to eliminate the above-described drawbacks of the prior art and to provide a micro group forming apparatus capable of forming highly accurate micro groups in a fixed direction on the surface of a glass substrate decorative board or the like.
即ち本発明の特徴はテーブルの運動方向と円筒回転体の
回転軸を90度以外の角度に設定し、円筒回転体の速度
ベクトルとテーブルの速度ベクトルとで合成された一定
方向のマイクログループを形成するので、装置を小形化
できることにある。That is, the feature of the present invention is that the movement direction of the table and the rotation axis of the cylindrical rotating body are set at an angle other than 90 degrees, and a micro group in a fixed direction is formed by combining the velocity vector of the cylindrical rotating body and the velocity vector of the table. Therefore, the device can be made smaller.
本発明の具体的実施例について第3図を用いて説明する
。被加工物1をエアチャック等で保持したテーブル2の
移動方向に対し、円筒回転体3の軸をθだけ傾むけて設
定する。また被加工物1と円筒回転体3は被加工物1の
長さ全長にわたり均一に切りこみ接触するよう予め高さ
方向の調整をする。かかる状態において円筒回転体3を
回転せしめてテーブル2に送りをかける。第4図はマイ
クにグループ形成中の横断面図である。このとき被加工
物1と円筒回転体3の接触部の1点Pでは第5図に示す
ように被加工物1には円筒回転体3の周速υ1とテーブ
ル2の送り速度υ2とを適当,に選定することによつて
合成されたH方向(設定値)にマイクログループを形成
することができる。即ち円筒回転体3の軸とテーブル2
の移動方向との角度θ=45゜でかつ被加工物寸法とし
て巾,100×長さ300mmの場合には円筒回転体3
の長さ及びテーブルの幅はともに従来法に比し1/2に
小さくできるので装置が小形にしてコンパタトにできる
効果がある。A specific embodiment of the present invention will be described using FIG. 3. The axis of the cylindrical rotating body 3 is set to be inclined by θ with respect to the moving direction of the table 2 holding the workpiece 1 with an air chuck or the like. Further, the height direction of the workpiece 1 and the cylindrical rotating body 3 are adjusted in advance so that the workpiece 1 and the cylindrical rotating body 3 are uniformly incised over the entire length of the workpiece 1 and come into contact with each other. In this state, the cylindrical rotating body 3 is rotated to feed the table 2. FIG. 4 is a cross-sectional view of the microphones during group formation. At this time, at one point P of the contact portion between the workpiece 1 and the cylindrical rotor 3, the circumferential speed υ1 of the cylindrical rotor 3 and the feed rate υ2 of the table 2 are set appropriately for the workpiece 1, as shown in FIG. , it is possible to form a micro group in the synthesized H direction (set value). That is, the axis of the cylindrical rotating body 3 and the table 2
When the angle θ with the moving direction of
Since both the length of the table and the width of the table can be reduced to 1/2 compared to the conventional method, there is an effect that the apparatus can be made smaller and more compact.
さらに液晶表示素子の配向膜面に対しては円筒回転体3
の回転数500r.p.m、テーブル2の送り速度20
00mm/分以下では従来方法と同等以上の配向特性が
得られる効果がある。以上説明したように本発明によれ
ば、従来と同等以上の配向特性が得られ、しかも装置を
小形にしてコンパクトすることができる。Furthermore, a cylindrical rotating body 3 is used for the alignment film surface of the liquid crystal display element.
rotation speed of 500r. p. m, feed rate of table 2 20
At a speed of 0.00 mm/min or less, there is an effect that alignment characteristics equivalent to or better than those of the conventional method can be obtained. As explained above, according to the present invention, it is possible to obtain alignment characteristics equivalent to or better than conventional ones, and also to make the device smaller and more compact.
第1図は被加工物の平面図、第2図は従来のマイタログ
ループ形成装置の概略構成を示す平面図、第3図は本発
明のマイクログループ形成装置の一実施例を示す平面図
、第4図は第3図の断面図、第5図はマイクログループ
の形成方向を示す説明図である。
符号の説明、1・・・・・・被加工物、2・・・・・・
テーブル、3・・・・・・円筒回転体。FIG. 1 is a plan view of a workpiece, FIG. 2 is a plan view showing a schematic configuration of a conventional micro group forming device, and FIG. 3 is a plan view showing an embodiment of the micro group forming device of the present invention. FIG. 4 is a sectional view of FIG. 3, and FIG. 5 is an explanatory diagram showing the direction in which micro groups are formed. Explanation of symbols, 1... Workpiece, 2...
Table, 3... Cylindrical rotating body.
Claims (1)
円筒回転体と平板状の被加工物を保持して円筒回転体と
は相対的に移動できる摺動体とを接触せしめ、かつ接触
点における円筒回転体の速度ベクトルと摺動体の速度ベ
クトルとが異なるように円筒回転体及び摺動体を配置せ
しめ平板状の被加工物に一定方向のマイクログループを
形成するように構成したことを特徴とするマイクログル
ープ形成装置。1. A cylindrical rotating body having a surface coated with fibers or abrasive grains, etc. and a sliding body that holds a flat workpiece and can move relative to the cylindrical rotating body are brought into contact, and the cylindrical body at the contact point A cylindrical rotating body and a sliding body are arranged so that the velocity vector of the rotating body and the velocity vector of the sliding body are different, and a micro group is formed in a fixed direction on a flat workpiece. Group forming device.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP53043225A JPS5950461B2 (en) | 1978-04-14 | 1978-04-14 | Micro group forming device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP53043225A JPS5950461B2 (en) | 1978-04-14 | 1978-04-14 | Micro group forming device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS54136355A JPS54136355A (en) | 1979-10-23 |
| JPS5950461B2 true JPS5950461B2 (en) | 1984-12-08 |
Family
ID=12657960
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP53043225A Expired JPS5950461B2 (en) | 1978-04-14 | 1978-04-14 | Micro group forming device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5950461B2 (en) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5870210A (en) * | 1981-10-22 | 1983-04-26 | Dainippon Printing Co Ltd | Rubbing treatment method |
| JPS60125054U (en) * | 1984-02-01 | 1985-08-23 | 有限会社 篠田鉄工所 | Hairline finishing machine |
| JPS6263055A (en) * | 1985-09-13 | 1987-03-19 | Takeo Nakagawa | Surface grinding method |
| JP2554875B2 (en) * | 1987-03-27 | 1996-11-20 | セイコーエプソン株式会社 | Liquid crystal device manufacturing method |
| JP2817141B2 (en) * | 1988-07-11 | 1998-10-27 | セイコーエプソン株式会社 | Manufacturing method of liquid crystal display device |
-
1978
- 1978-04-14 JP JP53043225A patent/JPS5950461B2/en not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPS54136355A (en) | 1979-10-23 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP4847513B2 (en) | Breaking method for brittle material substrate | |
| JP4436592B2 (en) | Breaking device for brittle material substrate | |
| JPS5950461B2 (en) | Micro group forming device | |
| JP2817141B2 (en) | Manufacturing method of liquid crystal display device | |
| CN107507793B (en) | Etching apparatus | |
| JPS62100440A (en) | Method and apparatus for chamfering glass sheet fixed with liquid crystal display element | |
| JPH0330924B2 (en) | ||
| JP2002075941A (en) | Semiconductor chip grinding method | |
| JPH01306172A (en) | Method and device for grinding thin film | |
| JPH04163720A (en) | Method and apparatus for manufacturing magnetic recording medium | |
| JP3230860B2 (en) | Magnetic head processing method and apparatus | |
| JPS60115447A (en) | Stamping apparatus | |
| SU1469454A1 (en) | Device for applying layer of sorbent onto substrate | |
| JP2000153451A (en) | Crown forming method and crown forming device for flotation type magnetic head | |
| JPH1110055A (en) | Coating equipment | |
| JPS60242954A (en) | Bevelling method | |
| JP2000153452A (en) | Lapping machine, and crown forming device | |
| JPS6219368A (en) | tape processing equipment | |
| JPH06210563A (en) | Wafer polishing device | |
| JPH06162431A (en) | Production of laminated magnetic head | |
| JPH0647235B2 (en) | Processing device for the flying top of the magnetic head slider | |
| JPH03254416A (en) | Processing device for magnetic head intake slope | |
| JPS5875728U (en) | Plasma polymerization/processing equipment | |
| JPS59182058A (en) | How to polish a flat plate | |
| JP2000061822A (en) | Polishing surface plate |