JP2554875B2 - Liquid crystal device manufacturing method - Google Patents
Liquid crystal device manufacturing methodInfo
- Publication number
- JP2554875B2 JP2554875B2 JP62074770A JP7477087A JP2554875B2 JP 2554875 B2 JP2554875 B2 JP 2554875B2 JP 62074770 A JP62074770 A JP 62074770A JP 7477087 A JP7477087 A JP 7477087A JP 2554875 B2 JP2554875 B2 JP 2554875B2
- Authority
- JP
- Japan
- Prior art keywords
- liquid crystal
- rubbing
- substrate
- alignment film
- crystal device
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000004973 liquid crystal related substance Substances 0.000 title claims description 24
- 238000004519 manufacturing process Methods 0.000 title claims description 10
- 239000000758 substrate Substances 0.000 claims description 23
- 239000004744 fabric Substances 0.000 claims description 12
- 238000000034 method Methods 0.000 claims description 10
- 230000000052 comparative effect Effects 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 229920000728 polyester Polymers 0.000 description 3
- 229920001721 polyimide Polymers 0.000 description 3
- 229920000297 Rayon Polymers 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 239000002964 rayon Substances 0.000 description 2
- 239000004677 Nylon Substances 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- 239000004962 Polyamide-imide Substances 0.000 description 1
- 239000004695 Polyether sulfone Substances 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- 239000004372 Polyvinyl alcohol Substances 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 229920002978 Vinylon Polymers 0.000 description 1
- -1 acryl Chemical group 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 229910003437 indium oxide Inorganic materials 0.000 description 1
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 description 1
- 229920001778 nylon Polymers 0.000 description 1
- 229920000620 organic polymer Polymers 0.000 description 1
- 239000005011 phenolic resin Substances 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920002312 polyamide-imide Polymers 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229920006393 polyether sulfone Polymers 0.000 description 1
- 239000009719 polyimide resin Substances 0.000 description 1
- 239000002952 polymeric resin Substances 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000000565 sealant Substances 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 229920002803 thermoplastic polyurethane Polymers 0.000 description 1
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 1
- 229910001887 tin oxide Inorganic materials 0.000 description 1
Landscapes
- Liquid Crystal (AREA)
Description
【発明の詳細な説明】 〔産業上の利用分野〕 本発明は、液晶装置の製造方法に関する。さらに詳し
くは、液晶を配向させるラビング方法に関する。The present invention relates to a method for manufacturing a liquid crystal device. More specifically, it relates to a rubbing method for aligning liquid crystals.
従来の液晶表示装置の配向方法としては、基板上にポ
リイミド系高分子樹脂を塗布した後、布等で一定の方向
にラビングする(特開昭55−143525号公報)方法、又は
ラビング布を巻きつけたドラムを回転させてラビングす
る方法等が行なわれていた。As a conventional liquid crystal display alignment method, a polyimide-based polymer resin is applied on a substrate and then rubbed in a certain direction with a cloth or the like (JP-A-55-143525), or a rubbing cloth is wound. The method of rubbing by rotating the attached drum was performed.
しかし、前述のラビング布を巻きつけたドラムを回転
させてラビング(以下回転ラビングと呼ぶ)する方法は
均一な配向を得るのには有利であるが、反面条件設定が
非常に困難であり、特に基板の表面とラビング布を巻き
つけた回転体との間隔がバラツクと配向膜にキズ(以下
線ホールドと呼ぶ)が発生してしまう。このキズは表示
装置としての表示品位の低下を起こす欠点となる。即
ち、パネルとなった場合キズの部分が目で確認できるぐ
らいに露出してしまうのである。又、前記間隔の制御は
容易ではなく実用化をする上で問題点となっていた。However, the method of rubbing by rotating the drum around which the rubbing cloth is wound (hereinafter referred to as “rotational rubbing”) is advantageous for obtaining a uniform orientation, but on the other hand, it is very difficult to set the conditions, The distance between the surface of the substrate and the rotating body around which the rubbing cloth is wound varies, and scratches (hereinafter referred to as line hold) occur on the alignment film. This flaw is a drawback that the display quality of the display device is deteriorated. That is, when it becomes a panel, the scratched portion is exposed so that it can be visually confirmed. Further, the control of the interval is not easy and has been a problem in practical use.
そこで、本発明はこのような問題点を解決するもの
で、その目的は均一で線ホールドのない配向が得られる
と共に、条件設定を容易にし量産製造に適した液晶表示
装置の製造方法を提供するところにある。Therefore, the present invention solves such a problem, and an object thereof is to provide a liquid crystal display device manufacturing method suitable for mass production, which makes it possible to obtain a uniform alignment with no line hold and facilitates condition setting. Where it is.
本発明の液晶装置の製造方法は、一対の基板間に液晶
が挟持され、前記基板の前記液晶に接する側の面には配
向膜が形成されてなる液晶装置の製造方法において、式
(πr×A−V)/Vで表されるラビング密度の値が15〜
1000となる条件下で前記配向膜をラビングすることを特
徴とする。但し、r(cm)はラビング布を巻いたドラム
の直径、A(rpm)は前記ドラムの回転数、V(cm/mi
n)は基板の移動スピードを表す。A method for manufacturing a liquid crystal device according to the present invention is a method for manufacturing a liquid crystal device in which a liquid crystal is sandwiched between a pair of substrates, and an alignment film is formed on a surface of the substrate on the side in contact with the liquid crystal, The value of the rubbing density represented by A−V) / V is 15 to
The alignment film is rubbed under the condition of 1000. Where r (cm) is the diameter of the drum around which the rubbing cloth is wound, A (rpm) is the rotation speed of the drum, and V (cm / mi)
n) represents the moving speed of the substrate.
上記ラビング密度は15〜1000が好ましく、15未満では
ラビング不足となり配向ムラになるばかりでなく線ホー
ルドが発生してしまう。又、1000を越えるとラビング密
度が高すぎるため配向膜をけずってしまい表面の凹凸が
激しく配向ムラが発生すると共に線ホールドが発生しや
すいのである。The rubbing density is preferably 15 to 1000. If the rubbing density is less than 15, rubbing becomes insufficient, resulting in not only uneven alignment but also line hold. On the other hand, if it exceeds 1000, the rubbing density is too high, so that the alignment film is scraped off, the surface irregularities are severe and the alignment unevenness occurs, and the line hold easily occurs.
以下、図示した一実施例により本発明を詳細に説明す
る。Hereinafter, the present invention will be described in detail with reference to one illustrated embodiment.
第1図は本発明に用いるラビング装置の概略図であ
り、1は図示してない支持体により支持された金属製の
回転体、2は回転体1の周囲に貼られたラビング布であ
る。このラビング布は、ナイロン、ビニロン、ポリエス
テル、アクリル、レーヨン等の一般的な布を用いた。FIG. 1 is a schematic view of a rubbing apparatus used in the present invention, where 1 is a metallic rotating body supported by a supporting body (not shown), and 2 is a rubbing cloth attached around the rotating body 1. The rubbing cloth used was a general cloth such as nylon, vinylon, polyester, acryl, rayon and the like.
実施例1 回転体1の回転数Aを500(rpm),回転体1の直径r
を10(cm),基板3と支持台4の移動スピードVを157
(cm/min)と設定した。この時のラビング密度(πr×
A−V)/Vは約100である。Example 1 The rotational speed A of the rotating body 1 is 500 (rpm), and the diameter r of the rotating body 1 is
10 (cm), the moving speed V of the substrate 3 and the support 4 is 157
(Cm / min) was set. Rubbing density at this time (πr ×
AV) / V is about 100.
まず、酸化スズまたは酸化インジウム等で所定パター
ンの透明電極が形成された基板上にポリイミド樹脂溶液
をスピンナー等で塗布後焼成してポリイミドでなる配向
膜を100〜300Å形成する。このように透明電極と配向膜
が形成された基板を上述の条件でラビング処理した。ラ
ビング布2としては植毛タイプのポリエステルを用い
た。First, a polyimide resin solution is applied on a substrate on which a transparent electrode having a predetermined pattern is formed of tin oxide or indium oxide by a spinner or the like, and then baked to form an alignment film of 100 to 300 Å made of polyimide. The substrate on which the transparent electrode and the alignment film were thus formed was rubbed under the above conditions. As the rubbing cloth 2, flocked type polyester was used.
以上のようにしてラビング処理された上下基板を組み
合わせシール剤等で一定の間隔をもって接着した後、液
晶を封入して液晶表示装置を構成した。その結果、表示
面にキズ状のものは見えず、均一な表示面が得られた。
従って、線ホールドは発生していないと言える。The upper and lower substrates that were rubbed as described above were bonded with a sealant or the like at regular intervals, and then liquid crystal was sealed to form a liquid crystal display device. As a result, scratches were not visible on the display surface, and a uniform display surface was obtained.
Therefore, it can be said that the line hold does not occur.
又、ラビング布2と基板3との間隔が多少変動しても
線ホールドの発生がなく安定した配向を得ることができ
た。Further, even if the distance between the rubbing cloth 2 and the substrate 3 fluctuates to some extent, a line hold does not occur and a stable orientation can be obtained.
実施例2 ラビング密度を約20に設定し配向剤としてエポキシ樹
脂を使用した以外は実施例1と同様に処理した基板を用
いて液晶表示装置を構成したところ、実施例1と同様の
結果が得られた。Example 2 A liquid crystal display device was constructed using a substrate treated in the same manner as in Example 1 except that the rubbing density was set to about 20 and an epoxy resin was used as an aligning agent, and the same results as in Example 1 were obtained. Was given.
実施例3 ラビング密度を約500とした以外は実施例1と同様に
処理した基板を用いて液晶表示装置を構成したところ、
実施例1と同様の結果が得られた。Example 3 A liquid crystal display device was constructed using a substrate treated in the same manner as in Example 1 except that the rubbing density was about 500.
The same result as in Example 1 was obtained.
実施例4 ラビング密度を約1000とした以外は実施例1と同様に
処理した基板を用いて液晶表示装置を構成したところ、
実施例1と同様の結果が得られた。Example 4 A liquid crystal display device was constructed using a substrate treated in the same manner as in Example 1 except that the rubbing density was about 1000.
The same result as in Example 1 was obtained.
実施例5 ラビング密度を約100,ラビング布にレーヨンを用いて
ラビング処理した基板を用いて液晶表示装置を構成した
ところ、実施例1と同様の結果が得られた。Example 5 A liquid crystal display device was constructed using a rubbing density of about 100 and a rubbing-processed substrate using rayon, and the same results as in Example 1 were obtained.
比較例1 ラビング密度を約10に設定(設定の方法としては、
(1)基板の移動スピードを上げる。(2)回転体の直
径を小さくする(3)回転体の回転数を低くするなどい
くつかあげられる。)して、実施例1と同様に処理した
基板を用いて液晶表示装置を製造した。Comparative Example 1 The rubbing density is set to about 10 (as a setting method,
(1) Increase the substrate moving speed. (2) Reducing the diameter of the rotating body (3) Reducing the rotating speed of the rotating body. Then, a liquid crystal display device was manufactured using the substrate treated in the same manner as in Example 1.
この液晶表示装置を観察したところ、表示面に肉眼で
確認できる線状のスジ(線ホールド)があらわれており
表示外観を損なうものであった。又配向が不完全である
ため表示面にムラが見られ、これでは表示装置として使
用することができないものであった。When this liquid crystal display device was observed, linear streaks (line hold) that could be visually confirmed appeared on the display surface, impairing the display appearance. In addition, since the orientation is incomplete, the display surface has unevenness, which cannot be used as a display device.
比較例2 ラビング密度を約1200に設定して、実施例1と同様に
処理した基板を用いて液晶表示装置を構成した。この液
晶表示装置を観察したところ、比較例1と同じように表
示面には肉眼で確認できる線状のスジ(線ホールド)が
目立つと共に、配向膜の表面の凹凸が激しいために配向
ムラになり結果として表示ムラが起こっており表示装置
としては支障があった。Comparative Example 2 A liquid crystal display device was constructed using the substrate treated in the same manner as in Example 1 with the rubbing density set to about 1200. When this liquid crystal display device was observed, similar to Comparative Example 1, linear streaks (line hold) visible to the naked eye were conspicuous on the display surface, and the unevenness of the surface of the alignment film was severe, resulting in uneven alignment. As a result, display unevenness has occurred, which is an obstacle for the display device.
尚、回転数A,直径r,基板と支持台の移動スピードVは
本実施例に限定されるものではなく他の条件でも良いの
であって、重要なのはラビング密度を15〜1000に設定し
てやることにより本発明の効果が得られることである。The number of revolutions A, the diameter r, and the moving speed V of the substrate and the support are not limited to those in this embodiment, and other conditions may be used. What is important is to set the rubbing density to 15 to 1000. That is, the effect of the present invention can be obtained.
さらに、本発明者は、ラビング密度の好ましい範囲が
15〜1000の範囲にあることを見いだしたものである。つ
まり、15未満ではラビング不足となり配向ムラになるば
かりでなく線ホールドが発生してしまう。又、1000を越
えるとラビング密度が高すぎるため配向膜を削ってしま
い表面の凹凸が激しく配向ムラが発生すると共に線ホー
ルドが発生しやすいのである。Furthermore, the present inventors have found that the preferred range of rubbing density is
It was found to be in the range of 15 to 1000. That is, if it is less than 15, rubbing becomes insufficient, resulting in not only uneven alignment but also line hold. If it exceeds 1000, the rubbing density is too high and the alignment film is scraped off, resulting in severe surface irregularities and uneven alignment and line hold.
又、本発明に用いる配向膜は本実施例に限定されるも
のではなく以下のような周知の配向剤にも有効である。Further, the alignment film used in the present invention is not limited to this embodiment, and is also effective for the following well-known aligning agents.
ポリビニルアルコール,ポリアミドイミド,ポリアミ
ド,ポリエーテルサルフオン,ポリカーボネート,ポリ
エステル,ウレタン樹脂,フエノール樹脂,ケイ素樹脂
などの有機高分子物質。Organic polymers such as polyvinyl alcohol, polyamide imide, polyamide, polyether sulfone, polycarbonate, polyester, urethane resin, phenol resin, silicon resin.
そして、上記配向膜の膜厚は広く一般に用いられてい
る範囲(例えば100〜1000Å)において同様の効果を有
しており本実施例に限定されるものではない。The film thickness of the alignment film has the same effect in a widely used range (for example, 100 to 1000Å) and is not limited to this example.
以上述べたように、本発明の液晶装置の製造方法によ
れば、式(πr×A−V)/Vで表されるラビング密度の
値が15〜1000となる条件下で配向膜をラビングすること
により、均一で線ホールドのない配向膜が得られる。ま
た、条件設定もラビング密度の式に基づいて容易に設定
できるので、量産製造に適している。As described above, according to the method for manufacturing a liquid crystal device of the present invention, the alignment film is rubbed under the condition that the value of the rubbing density represented by the formula (πr × A−V) / V is 15 to 1000. As a result, a uniform alignment film having no line hold can be obtained. Further, the condition can be easily set based on the formula of the rubbing density, which is suitable for mass production.
第1図は本発明に用いるラビング装置の概略図。 1……回転体 2……ラビング布 3……ガラス基板 4……基板支持台 5……配向膜 FIG. 1 is a schematic view of a rubbing device used in the present invention. DESCRIPTION OF SYMBOLS 1 ... Rotating body 2 ... Rubbing cloth 3 ... Glass substrate 4 ... Substrate support base 5 ... Alignment film
Claims (1)
の前記液晶に接する側の面には配向膜が形成されてなる
液晶装置の製造方法において、下記式で表されるラビン
グ密度の値が15〜1000となる条件下で前記配向膜をラビ
ングすることを特徴とする液晶装置の製造方法。 (πr×A−V)/V 但し、 r(cm)はラビング布を巻いたドラムの直径、 A(rpm)は前記ドラムの回転数、 V(cm/min)は基板の移動スピードを表す。1. A method of manufacturing a liquid crystal device, comprising: a liquid crystal sandwiched between a pair of substrates; and an alignment film formed on a surface of the substrate in contact with the liquid crystal. A method for manufacturing a liquid crystal device, comprising: rubbing the alignment film under the condition that the value is 15 to 1000. (Πr × A−V) / V where r (cm) is the diameter of the drum around which the rubbing cloth is wound, A (rpm) is the rotation speed of the drum, and V (cm / min) is the moving speed of the substrate.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62074770A JP2554875B2 (en) | 1987-03-27 | 1987-03-27 | Liquid crystal device manufacturing method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62074770A JP2554875B2 (en) | 1987-03-27 | 1987-03-27 | Liquid crystal device manufacturing method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS63240522A JPS63240522A (en) | 1988-10-06 |
| JP2554875B2 true JP2554875B2 (en) | 1996-11-20 |
Family
ID=13556853
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP62074770A Expired - Lifetime JP2554875B2 (en) | 1987-03-27 | 1987-03-27 | Liquid crystal device manufacturing method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2554875B2 (en) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2574473B2 (en) * | 1989-08-09 | 1997-01-22 | 富士通株式会社 | Manufacturing method of ferroelectric liquid crystal display element |
| JPH07168186A (en) * | 1993-10-19 | 1995-07-04 | Optrex Corp | Production of liquid crystal display element |
| JP3155177B2 (en) * | 1995-09-06 | 2001-04-09 | シャープ株式会社 | Apparatus for orienting liquid crystal display element substrate, rubbing cloth, and method for manufacturing liquid crystal display element |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5439147A (en) * | 1977-09-02 | 1979-03-26 | Hitachi Ltd | Liquid crystal directivity control plane and production thereof |
| JPS5950461B2 (en) * | 1978-04-14 | 1984-12-08 | 株式会社日立製作所 | Micro group forming device |
| JPS5753729A (en) * | 1980-09-17 | 1982-03-30 | Citizen Watch Co Ltd | Manufacture of liquid crystal display cell |
| JPH0723942B2 (en) * | 1985-08-08 | 1995-03-15 | 株式会社半導体エネルギ−研究所 | Liquid crystal device |
| JPH07107589B2 (en) * | 1986-09-09 | 1995-11-15 | 旭硝子株式会社 | Liquid crystal display element manufacturing method |
-
1987
- 1987-03-27 JP JP62074770A patent/JP2554875B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPS63240522A (en) | 1988-10-06 |
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