Deprecated: The each() function is deprecated. This message will be suppressed on further calls in /home/zhenxiangba/zhenxiangba.com/public_html/phproxy-improved-master/index.php on line 456
JPS5952782B2 - gas sensing element - Google Patents
[go: Go Back, main page]

JPS5952782B2 - gas sensing element - Google Patents

gas sensing element

Info

Publication number
JPS5952782B2
JPS5952782B2 JP52055401A JP5540177A JPS5952782B2 JP S5952782 B2 JPS5952782 B2 JP S5952782B2 JP 52055401 A JP52055401 A JP 52055401A JP 5540177 A JP5540177 A JP 5540177A JP S5952782 B2 JPS5952782 B2 JP S5952782B2
Authority
JP
Japan
Prior art keywords
gas
sensitive element
mol
present
catalyst
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP52055401A
Other languages
Japanese (ja)
Other versions
JPS53141091A (en
Inventor
昇 一ノ瀬
雄二 横溝
正樹 桂
忠夫 金田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Shibaura Electric Co Ltd filed Critical Tokyo Shibaura Electric Co Ltd
Priority to JP52055401A priority Critical patent/JPS5952782B2/en
Publication of JPS53141091A publication Critical patent/JPS53141091A/en
Publication of JPS5952782B2 publication Critical patent/JPS5952782B2/en
Expired legal-status Critical Current

Links

Landscapes

  • Investigating Or Analyzing Materials By The Use Of Fluid Adsorption Or Reactions (AREA)
  • Non-Adjustable Resistors (AREA)

Description

【発明の詳細な説明】 本発明は感ガス素子に係り、特にガス感応体表面に触媒
層を設け感度選択性および経時特性など。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a gas-sensitive element, and particularly to a gas-sensitive element having a catalyst layer provided on the surface thereof to improve sensitivity selectivity, aging characteristics, and the like.

を向上せしめた感ガス素子に関する。酸化物半導体表面
にガスが接触すると、酸化物半導体の表面の比抵抗が変
化する事を利用した感ガス素子が知られている。
This invention relates to a gas-sensitive element with improved properties. Gas-sensitive elements are known that utilize the fact that the specific resistance of the surface of an oxide semiconductor changes when gas comes into contact with the surface of the oxide semiconductor.

例えばN型半導体性を示すZnO、SnO2、Fe。O
。等に還元性ガスが接触すると抵抗値は減少し、また酸
化性ガスが接触すると抵抗値は増加する。またP型半導
性を示す酸化物半導体においては抵抗値の増減が逆の関
係を示す。上記のごとき酸化物半導体において、各種ガ
スとの反応性すなわち選択性は半導体表面温度、表面電
子レベルの構造、気孔率および気孔の大きさ等により決
まるが、一般には酸化物半導体のみでは感ガス素子とし
て感度が小さく、選択性も十分とは言えない。そこで酸
化物半導体にPt、Pdなどの触媒を添加含有せしめ感
度を上げる事が試みられているが、以下の如く欠点を有
している。つまり、主成分である酸化物半導体と触媒と
は、それぞれ最適の焼成温度が異なるため、両者の特徴
を充分発揮する焼成温度を選ぶ事がきわめて難しかつた
。さらに感ガス素子として高温条件下で使用する場合(
感ガス素子は感度を上げるため加熱部を設け、酸化物半
導体表面を300℃に保つて使用することが好ましい)
、触媒が酸化物半導体中に固溶し、感度の低下、経時変
化の増大などの要因となつていた。本発明は、上述の従
来素子の欠点を改良したもので、一対の電極間に設けら
れた、ZnOを99.85〜20モル%、Me2o3を
0.1〜50モル%(ただし、MeはSc、Y、Laの
うち少なくとも一種)およびMe’。
For example, ZnO, SnO2, and Fe exhibiting N-type semiconductor properties. O
. When a reducing gas comes into contact with the material, the resistance value decreases, and when an oxidizing gas comes into contact with the material, the resistance value increases. In addition, in an oxide semiconductor exhibiting P-type semiconductivity, increases and decreases in resistance value exhibit an inverse relationship. In the above-mentioned oxide semiconductors, the reactivity with various gases, that is, the selectivity, is determined by the semiconductor surface temperature, surface electron level structure, porosity, pore size, etc.; As a result, the sensitivity is low and the selectivity is not sufficient. Therefore, attempts have been made to increase the sensitivity by adding a catalyst such as Pt or Pd to the oxide semiconductor, but this method has the following drawbacks. In other words, since the oxide semiconductor and the catalyst, which are the main components, have different optimal firing temperatures, it has been extremely difficult to select a firing temperature that fully brings out the characteristics of both. Furthermore, when used as a gas-sensitive element under high temperature conditions (
In order to increase the sensitivity of the gas-sensitive element, it is preferable to provide a heating section and use the oxide semiconductor surface to maintain it at 300°C.)
However, the catalyst is dissolved in the oxide semiconductor, causing a decrease in sensitivity and an increase in changes over time. The present invention improves the above-mentioned drawbacks of the conventional element, and includes 99.85 to 20 mol% of ZnO and 0.1 to 50 mol% of Me2O3 (However, Me is Sc , Y, La) and Me'.

00を0.05〜30モル%(ただしMe’はGa、B
、In、Fe、Al、Crのうち少なくとも一種)を含
むガス感応体と、シリカアルミナ系化合物に添加物とし
てptcl。
00 to 0.05 to 30 mol% (however, Me' is Ga, B
, In, Fe, Al, and Cr) and ptcl as an additive to the silica-alumina compound.

を0.01〜10重量%含む触媒層とからなる感ガス素
子で感度およびガスの選択性に優れ、特に長時間の使用
による経時変化の少ない感ガス素子を提供する事を目的
とする。なお本発明における組成範囲は以下の如き理由
により限定された。
The object of the present invention is to provide a gas-sensitive element comprising a catalyst layer containing 0.01 to 10 wt. Note that the composition range in the present invention was limited for the following reasons.

つまりZnOが99.85モル%を超えた場合、Me。
O。が0.1モル%未満の場合、およびMe″203が
0.05モル%未満の場合においてはガス吸着による抵
抗値変化が小さく、またZnOが20モル%未満の場合
、Me2O3が50モル%を超えた場合およびMe″2
03が30モル%を超えた場合においてはガス吸着によ
る抵抗値変化が小さく、さらに温度に対する抵抗値変化
が大きくなるのでこの範囲とした。さらにシリカアルミ
ナ系へのPtcl2の添加量を0.01〜10%とした
のはPtcl2は経時変化特性改良の点から必要であり
、0.01重量%未満ではその効果が小さく、また10
重量%を超えるとガス吸着による抵抗値変化が小さくな
るので、この範囲とした。以下本発明を実施例により詳
細に説明する。
That is, when ZnO exceeds 99.85 mol%, Me.
O. When ZnO is less than 0.1 mol% and when Me″203 is less than 0.05 mol%, the change in resistance due to gas adsorption is small, and when ZnO is less than 20 mol%, Me2O3 is less than 50 mol%. If exceeded and Me″2
When 03 exceeds 30 mol%, the change in resistance due to gas adsorption is small, and the change in resistance with respect to temperature becomes large, so this range was set. Furthermore, the amount of Ptcl2 added to the silica alumina system was set at 0.01 to 10% because Ptcl2 is necessary from the viewpoint of improving the aging characteristics, and if it is less than 0.01% by weight, the effect is small.
If it exceeds % by weight, the change in resistance value due to gas adsorption becomes small, so this range was set. The present invention will be explained in detail below with reference to Examples.

まず本発明に係る感ガス素子は例えば第1図に断面的に
示すごとく、筒状絶縁基体1外周面に一対の電極2を有
し、前記筒状絶縁基体1および電極2を被覆するように
ガス感応体3が設けられている。さらに前記ガス感応体
3表面にはPtcl2を含むシリカアルミナ系化合物か
らなる触媒層4が設けられている。また前記のように構
成された感ガス素子は例えば第2図に斜視的に示す如く
ピン足上に組立てられる。なお図中5はリード線を、6
は絶縁板を、7はヒーターを示す。ヒーター7は、ガス
感応体の感度を向上させるために設けられたものであり
、必要に応じ適宜設けることができる。なお触媒層4は
ガス感応体3表面を必ずしも全面的に被覆していなくと
もよい。本発明に係る感ガス素子は例えば以下の如く製
造される。
First, the gas-sensitive element according to the present invention has a pair of electrodes 2 on the outer peripheral surface of a cylindrical insulating base 1, as shown in cross section in FIG. A gas sensitive body 3 is provided. Furthermore, a catalyst layer 4 made of a silica-alumina compound containing Ptcl2 is provided on the surface of the gas sensitive body 3. Further, the gas-sensitive element constructed as described above is assembled on a pin leg, for example, as shown perspectively in FIG. Note that 5 in the figure is the lead wire, and 6 is the lead wire.
indicates an insulating plate, and 7 indicates a heater. The heater 7 is provided to improve the sensitivity of the gas sensitive element, and can be provided as appropriate if necessary. Note that the catalyst layer 4 does not necessarily need to completely cover the surface of the gas sensitive body 3. The gas-sensitive element according to the present invention is manufactured, for example, as follows.

すなわち、ZnO,Me2O3(MeはSc,Y,La
のうち少なくとも一種)およびMe″203(MeはG
a,B,In,Fe,Al,Crのうち少なくとも一種
)を所定組成比で秤取し、混合したのち、水またはバイ
ンダーを加えペースト状とし、第1図に示すごとく一対
の電極2を設けた絶縁基板1に塗布し乾燥後600〜1
000℃で焼成し、ガス感応体を形成する。一方シリカ
アルミナ系化合物をたとえば遊星ミル、ポツトミル等の
粉砕機で粉砕し、微粉末とする。
That is, ZnO, Me2O3 (Me is Sc, Y, La
) and Me″203 (Me is G
At least one of a, B, In, Fe, Al, Cr) is weighed out in a predetermined composition ratio, mixed, water or a binder is added to form a paste, and a pair of electrodes 2 are provided as shown in Figure 1. 600 to 1 after drying.
It is fired at 000°C to form a gas sensitive body. On the other hand, the silica-alumina compound is ground into a fine powder using a grinder such as a planetary mill or a pot mill.

次にこの微粉末と塩化第1白金(Ptcl2を所定組成
比で秤取し混合したのち乾燥を施し、触媒を得る。この
触媒を前記ガス感応体3上に塗布乾燥し、さらに300
℃で焼成し、感ガス素子を得る。
Next, this fine powder and platinum chloride (Ptcl2) are weighed out in a predetermined composition ratio, mixed, and dried to obtain a catalyst. This catalyst is coated on the gas sensitive member 3 and dried, and then
C. to obtain a gas-sensitive element.

次に本発明に係る感ガス素子の諸特性例を第3ノ図乃至
第9図に示す。
Next, various characteristic examples of the gas-sensitive element according to the present invention are shown in FIGS. 3 to 9.

先ず第3図乃至第5図はガス感応体成分のMe2O3(
ただしMe−Sc,Y,Laのうち少なくとも一種)お
よびMe″203(ただしM6はGa,B,In,Fe
,Al,Crのうち少なくとも一種)の量を変えたとき
の空気中における抵抗値ROと0.2%のインブタンガ
ス濃度中での抵抗値Rgとの比により感度(RO/Rg
)を示したものである。なお触媒層としては0.2重量
%のPtcl2を含んだシリカアルミナ系化合物を用い
、図中曲線1はGa2O3,B2O3,Fe2O3,c
r2O3の場合の抵抗値、曲線2はB2O3,In2O
3,cr2O3の場合の抵抗値、また曲線3はAl2O
3,Fe2O3の場合の抵抗値をそれぞれ示し、第3図
はMe2O3としてSC2O3、第4図はY2O3、第
5図はLa2O3を用いた場合を表す。
First, Figures 3 to 5 show Me2O3 (
However, at least one of Me-Sc, Y, La) and Me″203 (however, M6 is Ga, B, In, Fe)
Sensitivity (RO/Rg
). A silica-alumina compound containing 0.2% by weight of Ptcl2 was used as the catalyst layer, and curve 1 in the figure shows Ga2O3, B2O3, Fe2O3, c
Resistance value in case of r2O3, curve 2 is B2O3, In2O
3. Resistance value in case of cr2O3, and curve 3 is Al2O
3 and Fe2O3 are shown, respectively. FIG. 3 shows the case where SC2O3 is used as Me2O3, FIG. 4 shows the case where Y2O3 is used, and FIG. 5 shows the case where La2O3 is used.

また曲線1″,2″および3″は曲線1,2および3に
それぞれ対応する感度を示す。第3図乃至第5図から明
らかな如く、本発明に係る感ガス素子においては、常に
優れた感度が得られた。さらに第6図乃至第8図は、第
3図乃至第5図における曲線1についてMe2O3の添
加量を2モル%に固定したときのPtcl2のシリカア
ルミナ化合物への添加量に対する経時変化特性の示す。
Curves 1'', 2'' and 3'' indicate sensitivities corresponding to curves 1, 2 and 3, respectively.As is clear from FIGS. 3 to 5, the gas-sensitive element according to the present invention always has excellent sensitivity. Further, Figures 6 to 8 show the relationship between the amount of Ptcl2 added to the silica alumina compound when the amount of Me2O3 added was fixed at 2 mol% for curve 1 in Figures 3 to 5. Indication of temporal change characteristics.

なお測定は5000時間通電後の抵抗値の変化率を示し
、点線は比較例としてPtおよびPt酸化物触媒を使用
した場合を示し、第6図はMe2O3としてSC2O3
、第7図はY2O3、第8図はLa2O3を用いた場合
である。この結果第6図乃至第8図から明らかな如く、
本発明に係る感ガス素子において、長期間の使用に際し
高々5%程度の低下しか見られなかつた。このようにP
tcl2を添加した感ガス素子の経時変化率が小さいの
は次のような理由によるものと考えられる。
The measurement shows the rate of change in resistance value after 5000 hours of energization, and the dotted line shows the case where Pt and Pt oxide catalysts were used as a comparative example.
, FIG. 7 shows the case using Y2O3, and FIG. 8 shows the case using La2O3. As a result, as is clear from Figs. 6 to 8,
In the gas-sensitive element according to the present invention, a decrease of only about 5% at most was observed during long-term use. Like this P
The reason why the rate of change over time of the gas-sensitive element added with tcl2 is small is considered to be due to the following reason.

まず、ガス感応体と触媒層とを分離した2層構造により
触媒のPtcl2がガス感応体の中に固溶しないため、
触媒の能力の劣化が起らないためと考えられる。また従
来触媒として使用されているPt,Pd等または、その
酸化物は、使用されることにより粒成長をおこし触媒の
表面積が小さくなるが、Ptcl2およびシリカアルミ
ナ系化合物の組合せによる触媒は塩化物のための粒成長
がおこりにくく、また耐熱性のあるシリカアルミナ系化
合物に担持されているため表面積が大きい状態で維持さ
れるためと考えられる。第9図は本発明に係る感ガス素
子を用いてCO,H2,C2H6,C3H8,C4Hl
Oのガス濃度に対する抵抗値の変化率を示し、この結果
優れた選択性を有することは明確である。
First, due to the two-layer structure in which the gas sensitive material and the catalyst layer are separated, the catalyst Ptcl2 does not dissolve solidly in the gas sensitive material.
This is thought to be because the catalyst performance does not deteriorate. In addition, Pt, Pd, etc., or their oxides, which have been conventionally used as catalysts, cause grain growth and reduce the surface area of the catalyst, but catalysts made from a combination of Ptcl2 and silica-alumina compounds are chloride-based. This is thought to be because grain growth is less likely to occur, and the surface area is maintained in a large state because it is supported on a heat-resistant silica-alumina compound. FIG. 9 shows CO, H2, C2H6, C3H8, C4Hl obtained using the gas-sensitive element according to the present invention.
It shows the rate of change in resistance value with respect to O gas concentration, and as a result, it is clear that it has excellent selectivity.

以上述べたように、本発明に係る感ガス素子は感度選択
性および経時変化特性に優れており従来にないすぐれた
特長をもつたものである。
As described above, the gas-sensitive element according to the present invention has excellent sensitivity selectivity and temporal change characteristics, and has excellent features never seen before.

【図面の簡単な説明】 第1図は本発明の構成例を示す断面図、第2図は本発明
に係る感ガス素子を用いる装置例を示す斜視図、第3図
乃至第5図はMe2O3添加量に対する抵抗値及び感度
の関係を示す曲線図、第6図乃至第8図はMe2O3添
加量を2モル%に固定したときPtcl2の添加量によ
る経時変化を示す曲線図、第9図は本発明に係る感ガス
素子の選択性を示す曲線図。 2・・・電極、3・・・ガス感応体、4・・・触媒層。
[BRIEF DESCRIPTION OF THE DRAWINGS] FIG. 1 is a sectional view showing a configuration example of the present invention, FIG. 2 is a perspective view showing an example of an apparatus using a gas-sensitive element according to the present invention, and FIGS. 3 to 5 are Me2O3 A curve diagram showing the relationship between resistance value and sensitivity with respect to the amount of addition. Figures 6 to 8 are curve diagrams showing changes over time depending on the amount of Ptcl2 added when the amount of Me2O3 added is fixed at 2 mol%. FIG. 3 is a curve diagram showing the selectivity of the gas-sensitive element according to the invention. 2... Electrode, 3... Gas sensitive body, 4... Catalyst layer.

Claims (1)

【特許請求の範囲】 1 一対の電極と、前記電極間に設けられた、ZnOを
99.85〜20モル%、Me_2O_3を0.1〜5
0モル%。 (ただしMeはSc、Y、Laのうち少なくとも一種)
およびMe′_2O_3を0.05〜30モル%(ただ
しMe′はGa、B、In、Fe、Al、Crのうち少
なくとも一種)を含むガス感応体と、前記ガス感応体表
面に設けられた0.01〜10重量%のPtCl_2を
含むシリカアルミナ系化合物からなる触媒層とを具備し
たことを特徴とする感ガス素子。
[Claims] 1 A pair of electrodes and 99.85 to 20 mol % of ZnO and 0.1 to 5 mol % of Me_2O_3 provided between a pair of electrodes.
0 mol%. (However, Me is at least one of Sc, Y, and La)
and 0.05 to 30 mol% of Me'_2O_3 (where Me' is at least one of Ga, B, In, Fe, Al, and Cr); A gas-sensitive element comprising a catalyst layer made of a silica-alumina compound containing .01 to 10% by weight of PtCl_2.
JP52055401A 1977-05-16 1977-05-16 gas sensing element Expired JPS5952782B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP52055401A JPS5952782B2 (en) 1977-05-16 1977-05-16 gas sensing element

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP52055401A JPS5952782B2 (en) 1977-05-16 1977-05-16 gas sensing element

Publications (2)

Publication Number Publication Date
JPS53141091A JPS53141091A (en) 1978-12-08
JPS5952782B2 true JPS5952782B2 (en) 1984-12-21

Family

ID=12997504

Family Applications (1)

Application Number Title Priority Date Filing Date
JP52055401A Expired JPS5952782B2 (en) 1977-05-16 1977-05-16 gas sensing element

Country Status (1)

Country Link
JP (1) JPS5952782B2 (en)

Also Published As

Publication number Publication date
JPS53141091A (en) 1978-12-08

Similar Documents

Publication Publication Date Title
JPS6360339B2 (en)
KR900002500B1 (en) Gas sensor
EP0114310A2 (en) Carbon monoxide sensing element and process for manufacturing it
US4242303A (en) Gas detecting element
JPS626182B2 (en)
JPS5952782B2 (en) gas sensing element
JPS6013142B2 (en) gas sensing element
JPS5847018B2 (en) gas sensing element
JPS5952781B2 (en) gas sensing element
JPS6036017B2 (en) Manufacturing method of reducing gas detection element
JPS5848056B2 (en) gas sensing element
JPS5847020B2 (en) gas sensing element
JPS5847019B2 (en) gas sensing element
JP3026523B2 (en) Gas sensor
JPH08226909A (en) Catalytic combustion type carbon monoxide gas sensor
JPS604849A (en) Nitrogen oxide detecting element
JP3046387B2 (en) Gas sensor
JP3191544B2 (en) Thick film type gas sensor
JPS6128937B2 (en)
JPH0221256A (en) Gas sensor
JPS58623B2 (en) gas sensing element
JPS6363064B2 (en)
JPS5848060B2 (en) gas sensing element
JPH0875692A (en) Contact combustion gas sensor
JPH03223660A (en) Metal-oxide-based semiconductor element for gas sensor