JPS5953204B2 - Method for removing sulfur dioxide contained in hydrogen chloride gas - Google Patents
Method for removing sulfur dioxide contained in hydrogen chloride gasInfo
- Publication number
- JPS5953204B2 JPS5953204B2 JP55181342A JP18134280A JPS5953204B2 JP S5953204 B2 JPS5953204 B2 JP S5953204B2 JP 55181342 A JP55181342 A JP 55181342A JP 18134280 A JP18134280 A JP 18134280A JP S5953204 B2 JPS5953204 B2 JP S5953204B2
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- Japan
- Prior art keywords
- sulfur dioxide
- hydrogen chloride
- chloride gas
- hydrochloric acid
- gas
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- Gas Separation By Absorption (AREA)
Description
【発明の詳細な説明】
本発明は、二酸化イオウを含む不純塩化水素ガスから二
酸化イオウを除去する方法に関するものである。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method for removing sulfur dioxide from impure hydrogen chloride gas containing sulfur dioxide.
二酸化イオウを含む不純塩化水素ガスは、例えば食塩を
硫酸で分解するときあるいはシクロアルカンを光ニトロ
ソ化して得られるシクロアルカノンオキシム塩酸塩を硫
酸もしくは発煙硫酸によってベックマン転位する際など
で発生する。Impure hydrogen chloride gas containing sulfur dioxide is generated, for example, when common salt is decomposed with sulfuric acid or when cycloalkanone oxime hydrochloride obtained by photonitrosation of cycloalkane is subjected to Beckmann rearrangement using sulfuric acid or fuming sulfuric acid.
このような二酸化イオウ含有塩化水素ガスから二酸化イ
オウを除去する方法として、前記塩化水素ガスを希塩酸
に吸収させ、吸収液中の二酸化イオウを酸化剤を用いて
不揮発性の硫酸に酸化後、吸収液を加熱して塩化水素を
発生回収する方法、例えば(A)特公昭43−2345
9号、(B)特公昭42−3376号および(C)特公
昭46−32567号公報に記載された方法が知られて
いる。As a method for removing sulfur dioxide from such hydrogen chloride gas containing sulfur dioxide, the hydrogen chloride gas is absorbed into dilute hydrochloric acid, the sulfur dioxide in the absorption liquid is oxidized to non-volatile sulfuric acid using an oxidizing agent, and then the absorption liquid is A method of generating and recovering hydrogen chloride by heating, for example (A) Japanese Patent Publication No. 43-2345
9, (B) Japanese Patent Publication No. 42-3376 and (C) Japanese Patent Publication No. 46-32567 are known.
(A)は亜硝酸もしくは亜硝酸塩を酸化剤とし、(B)
は塩化ニトロシル、(C)は塩素を使用している。(A) uses nitrite or nitrite as an oxidizing agent; (B)
uses nitrosyl chloride, and (C) uses chlorine.
これら公知の方法は、二酸化イオウ含有塩化水素ガスを
一旦、希塩酸に吸収し、酸化後加熱して塩化水素ガスを
回収するので処理装置として吸収塔及び放散塔の2塔を
必要とするばかりか、熱エネルギー的な面から非常に不
合理な方法である。In these known methods, hydrogen chloride gas containing sulfur dioxide is first absorbed into dilute hydrochloric acid, and after oxidation, the hydrogen chloride gas is recovered by heating, so not only do they require two towers, an absorption tower and a stripping tower, as processing equipment. This is a very unreasonable method from a thermal energy perspective.
もし塩化水素ガスを実質的に吸収せずに不純物として含
有する二酸化イオウを効率よく選択的に除去することが
可能であれば工業的に有利であることはいうまでもない
。Needless to say, it would be industrially advantageous if it were possible to efficiently and selectively remove sulfur dioxide contained as an impurity without substantially absorbing hydrogen chloride gas.
この目的のために従来性なわれた方法は(D)特公昭4
6−31535号および(E)特公昭42−16930
号公報に記載されている。The conventional method for this purpose is (D)
No. 6-31535 and (E) Special Publication No. 16930/1973
It is stated in the No.
(D)においては二酸化イオウ含有の塩化水素ガスを飽
和濃塩酸と接触させながら塩化ニトロシルを酸化剤とし
、(E)ではニトロシル硫酸と接触せしめ塩化水素を塩
化ニトロシルガスに変換させると共に二酸化イオウを硫
酸に酸化分離するものである。In (D), hydrogen chloride gas containing sulfur dioxide is brought into contact with saturated concentrated hydrochloric acid while using nitrosyl chloride as an oxidizing agent, and in (E), hydrogen chloride is brought into contact with nitrosyl sulfuric acid to convert hydrogen chloride into nitrosyl chloride gas and sulfur dioxide is converted into sulfuric acid. It oxidizes and separates into.
これを反応式で示すと、次のとおりである。The reaction formula for this is as follows.
これらの従来方法では、確かに含有する二酸化イオウを
除去して精製塩化水素ガスを取得できるが、しかし、上
記反応式でわかるように塩化水素ガスは酸化窒素ガスを
含むことになるため、塩化水素の用途上の制限をまぬが
れない。In these conventional methods, purified hydrogen chloride gas can be obtained by removing the sulfur dioxide contained therein. However, as can be seen from the above reaction formula, hydrogen chloride gas contains nitrogen oxide gas, so hydrogen chloride It is impossible to avoid the restrictions on usage.
そこで、本発明者らは塩化水素をガス状のままで二酸化
イオウのみを除去し、しかも、精製塩化水素ガス中に酸
化窒素ガスを含まない方法の確立について鋭意検討を重
ねた結果、本発明をなすに至った。Therefore, the present inventors have conducted intensive studies to establish a method that removes only sulfur dioxide while leaving hydrogen chloride in a gaseous state, and does not contain nitrogen oxide gas in purified hydrogen chloride gas, and has developed the present invention. I arrived at the eggplant.
従って本発明の目的は、二酸化イオウ含有塩化水素ガス
中から熱エネルギーを必要以上に消費することなく、二
酸化イオウを除去し、塩化水素を全て塩酸とすることな
くガスのまま、酸化窒素ガスを含まないで御収すること
であり、さらに、シクロアルカンを光ニトロソ化しベッ
クマン転位する一連の工程において発生する二酸化イオ
ウ含有塩化水素ガスを二酸化イオウ除去 処理して再使
用する場合に適した二酸化イオウの除去方法を提供する
ことにある。Therefore, it is an object of the present invention to remove sulfur dioxide from hydrogen chloride gas containing sulfur dioxide without consuming more thermal energy than necessary, and to remove hydrogen chloride from hydrogen chloride gas without converting it into hydrochloric acid, leaving it as a gas and containing nitrogen oxide gas. In addition, the sulfur dioxide-containing hydrogen chloride gas generated in the series of steps of photonitrosation and Beckmann rearrangement of cycloalkanes is treated to remove sulfur dioxide and is suitable for reuse. The purpose is to provide a method.
上記の目的は二酸化イオウ含有塩化水素ガスを塩酸と接
触させて塩化水素ガス中に含まれる二酸化イオウを除去
する方法において、
前記塩酸として硝酸含有かつ実質的に飽和の塩酸溶液を
使用することによって達成される。The above object is achieved by using a substantially saturated hydrochloric acid solution containing nitric acid as the hydrochloric acid in a method for removing sulfur dioxide contained in the hydrogen chloride gas by contacting hydrogen chloride gas containing sulfur dioxide with hydrochloric acid. be done.
具体的に、本発明法を図面を参照しながら詳述する。Specifically, the method of the present invention will be explained in detail with reference to the drawings.
図面は、本発明法が適用される一工程のフローシートで
ある。The drawing is a flow sheet of one step in which the method of the present invention is applied.
シクロアルカンの光ニトロン化反応装置1で生成するシ
クロアルカノンオキシム塩酸塩2をベックマン転位装置
3にて硫酸もしくは発煙硫酸4でベックマン転位すると
、相当するラクタム硫酸塩5と同時に塩化水素を主成分
とし少量の二酸化イオウ等を含む転位排ガス6が発生す
る。When the cycloalkanone oxime hydrochloride 2 produced in the cycloalkane photonitronation reaction apparatus 1 is subjected to Beckmann rearrangement with sulfuric acid or oleum 4 in the Beckmann rearrangement apparatus 3, hydrogen chloride is converted as the main component at the same time as the corresponding lactam sulfate 5. Dislocation exhaust gas 6 containing a small amount of sulfur dioxide and the like is generated.
この転位排ガスを酸化反応装置7に導入し、一方、貯槽
8からポンプ9及び管11を経て硝酸12を補給された
実質上飽和の塩酸溶液13と接触させる。This rearranged exhaust gas is introduced into the oxidation reactor 7 and brought into contact with a substantially saturated hydrochloric acid solution 13 supplemented with nitric acid 12 from the storage tank 8 via the pump 9 and the pipe 11.
塩酸溶液は循環使用されるが下記式によって生成した硫
酸が循環系に蓄積する。Although the hydrochloric acid solution is recycled, the sulfuric acid produced by the following formula accumulates in the circulation system.
SO2+HNO3+HC1→H2SO4+N0CI塩酸
溶液中の硫酸濃度が上昇すると二酸化イオウの吸収が阻
害され二酸化イオウの除去効率が低下する。SO2+HNO3+HC1→H2SO4+NOCI When the sulfuric acid concentration in the hydrochloric acid solution increases, the absorption of sulfur dioxide is inhibited and the removal efficiency of sulfur dioxide decreases.
従って塩酸溶液中硫酸濃度は二酸化イオウの除去効率が
低下しないようにコントロールされ、該コントロールの
ため循環系排出口10より適宜当該系外へ塩酸溶液を排
出する。Therefore, the sulfuric acid concentration in the hydrochloric acid solution is controlled so as not to reduce the removal efficiency of sulfur dioxide, and for this control, the hydrochloric acid solution is appropriately discharged from the circulation system outlet 10 to the outside of the system.
かくして二酸化イオウを除去し、塩化ニトロシルを少量
含む塩化水素ガス14は塩化ニトロシル製造装置15に
てニトロシル硫酸16と接触され、塩化ニトロシルを相
当量含有塩化水素混合ガス17として光ニトロソ化反応
に循環使用される。Hydrogen chloride gas 14 from which sulfur dioxide has been removed and which contains a small amount of nitrosyl chloride is brought into contact with nitrosyl sulfuric acid 16 in a nitrosyl chloride production device 15, and is recycled for photonitrosation reaction as a hydrogen chloride mixed gas 17 containing a considerable amount of nitrosyl chloride. be done.
次に、本発明を上記工程において実施する場合に好まし
い操作条件について述べる。Next, preferred operating conditions when implementing the present invention in the above steps will be described.
本発明の対象となる二酸化イオウ含有塩化水素ガスとし
ては、二酸化イオウを30モル%以下、更に10モル%
以下含有するものが好ましい。As the sulfur dioxide-containing hydrogen chloride gas that is the object of the present invention, sulfur dioxide may be 30 mol% or less, and further 10 mol% or less.
Those containing the following are preferred.
二酸化イオウを30%を超える量含む場合は硝酸の使用
量が増加し、それに伴ない硝酸が酸化反応系内に持ちこ
む水の量が増加するので二酸化イオウの酸化除去を十分
性ない難い。When sulfur dioxide is contained in an amount exceeding 30%, the amount of nitric acid used increases, and the amount of water that nitric acid brings into the oxidation reaction system increases accordingly, making it difficult to oxidize and remove sulfur dioxide sufficiently.
前記において、硝酸含有かつ実質的に飽和の塩酸溶液と
は、硝酸を、塩化水素ガス中の二酸化イオウを酸化する
に十分の量で、好ましくは、二酸化イオウ1モルに対し
て1.0〜1.5モルの割合で含み、かつ塩化水素ガス
の吸収量が30%以下の溶液が好ましい。In the above, a substantially saturated hydrochloric acid solution containing nitric acid refers to an amount of nitric acid sufficient to oxidize sulfur dioxide in hydrogen chloride gas, preferably 1.0 to 1 nitric acid per mole of sulfur dioxide. A solution containing hydrogen chloride gas at a ratio of .5 mol and having an absorption amount of hydrogen chloride gas of 30% or less is preferable.
ここで吸収量は、酸化反応系内に供給される塩化水素ガ
スを基準として吸収される塩化水素ガスの量をいう。Here, the absorption amount refers to the amount of hydrogen chloride gas absorbed based on the hydrogen chloride gas supplied into the oxidation reaction system.
本発明に使用される硝酸としては、通常の61%までの
硝酸や発煙硝酸又は両者の混合物、さらに工業的に副生
する硝酸などが該当し、他の無機酸や強酸、例えば塩酸
などを含有するものを用いてもよい。The nitric acid used in the present invention includes up to 61% normal nitric acid, fuming nitric acid, or a mixture of both, as well as industrially produced nitric acid, and may also contain other inorganic acids or strong acids such as hydrochloric acid. You may use one that does.
極端に低濃度の硝酸は、硝酸添加によって持ち込まれる
水分量が増加することにより、塩化水素ガスの吸収量が
増加し、吸収塩化水素を加熱などの別途処理によって回
収しなければならないので本発明の有利性を減する結果
となり、好ましくない。Extremely low concentration of nitric acid increases the amount of water brought in by adding nitric acid, which increases the amount of hydrogen chloride gas absorbed, and the absorbed hydrogen chloride must be recovered by separate treatment such as heating. This is not desirable as it reduces the advantage.
硝酸の添加方法はいかなる方法でもよく、例えば図面に
示されているように、装置外を循環する塩酸溶液に添加
してもよく、また、直接、装置内に添加してもよい。Nitric acid may be added by any method; for example, as shown in the drawing, it may be added to a hydrochloric acid solution circulating outside the apparatus, or it may be added directly into the apparatus.
又、添加方法は連続的でも間欠的でもよい。Further, the addition method may be continuous or intermittent.
酸化反応装置内の反応条件は、温度10〜50℃、好ま
しくは20〜40℃、圧力常圧又は若干の加圧が選ばれ
る。The reaction conditions in the oxidation reactor are selected to be a temperature of 10 to 50°C, preferably 20 to 40°C, and a pressure of normal pressure or slightly increased pressure.
前記温度範囲外では二酸化イオウ除去効率の低下となる
のでよくない。Temperatures outside the above range are not good because the sulfur dioxide removal efficiency decreases.
また熱エネルギー的にみても得策ではない。Also, it is not a good idea from a thermal energy perspective.
二酸化イオウ含有塩化水素ガスと硝酸を含有する塩酸溶
液との接触方法は、該塩酸溶液を入れた反応槽に前記塩
化水素を吹き込む方法、あるいは多孔板塔、充填塔など
の一般的気液接触方法で行なわれる。The method of contacting the hydrogen chloride gas containing sulfur dioxide with the hydrochloric acid solution containing nitric acid is to blow the hydrogen chloride into a reaction tank containing the hydrochloric acid solution, or to use a general gas-liquid contact method such as a perforated plate column or a packed column. It will be held in
前記の酸化反応装置において二酸化イオウは硫酸になり
、それと等モルの塩化ニトロシルが発生するが、例えば
シクロアルカノンオキシム塩酸塩を硫酸、もしくは発煙
硫酸でベックマン転位する際発生する二酸化イオウを含
む塩化水素ガスの処理を本発明により実施し、処理後の
塩化水素ガスを塩化ニトロシル製造工程へ供する場合に
は、前記塩化ニトロシルの発生は好都合である。In the above oxidation reactor, sulfur dioxide is converted to sulfuric acid, and an equimolar amount of nitrosyl chloride is generated. For example, hydrogen chloride containing sulfur dioxide generated when cycloalkanone oxime hydrochloride is subjected to Beckmann rearrangement with sulfuric acid or fuming sulfuric acid. The generation of nitrosyl chloride is advantageous when the gas treatment is carried out according to the invention and the treated hydrogen chloride gas is sent to the nitrosyl chloride production process.
本発明法においては、塩酸溶液に硝酸を添加することに
よって生成する発生期の塩素が有効に二酸化イオウの酸
化に作用しているものと推定される。In the method of the present invention, it is presumed that the nascent chlorine produced by adding nitric acid to the hydrochloric acid solution effectively acts on the oxidation of sulfur dioxide.
これは、酸化剤として硝酸を酸化反応系へ添加した場合
と塩素ガスを添加した場合とを対比した結果、本発明法
の硝酸添加方法が二酸化イオウ除去効率が高いという事
実から導かれる。This is derived from the fact that as a result of comparing the case where nitric acid is added to the oxidation reaction system as an oxidizing agent and the case where chlorine gas is added as an oxidizing agent, the nitric acid addition method of the present invention has a high sulfur dioxide removal efficiency.
以上に述べたように本発明の特徴は、二酸化イオウを含
む不純塩化水素ガスを硝酸含有かつ実質的に飽和の塩酸
溶液と接触させることにより、不純物の二酸化イオウを
硫酸に酸化して前記塩酸溶液中に移行せしめ、塩化水素
ガスを実質上吸収除去させることなく、しかも酸化窒素
ガスを含まずに回収し再利用することが出来るものであ
り、−従来公知の方法に比較して処理装置が簡略化され
、さらに昨今の省エネルギー策に適合するため前記した
ベックマン転位工程のみならず、広く工業的にも有効に
利用され得るものである。As described above, the feature of the present invention is that impure hydrogen chloride gas containing sulfur dioxide is brought into contact with a substantially saturated hydrochloric acid solution containing nitric acid, whereby the impurity sulfur dioxide is oxidized to sulfuric acid and the hydrochloric acid solution is This method can be recovered and reused without substantially absorbing and removing hydrogen chloride gas and containing no nitrogen oxide gas, and - compared to conventionally known methods, the processing equipment is simpler. Furthermore, since it is compatible with recent energy saving measures, it can be effectively used not only in the above-mentioned Beckmann rearrangement process but also in a wide range of industrial applications.
次に実施例をもって本発明法の効果を述べる。Next, the effects of the method of the present invention will be described using examples.
実施例 1
55mmφ、長さ500mmのガラス製反応管に濃塩酸
11を入れ、反応管下部のガス吹き込み管より二酸化イ
オウ1.20vo1%を含む塩化水素ガスを1200m
1/minの速度で導入し、一方、反応管上部から30
wt%の硝酸を前記二酸化イオウに対し等モルを連続的
に濃塩酸に添加しながら外部冷却により濃塩酸温度を3
0℃に保った。Example 1 Concentrated hydrochloric acid 11 was placed in a glass reaction tube with a diameter of 55 mm and a length of 500 mm, and hydrogen chloride gas containing 1.20 vol.
Introduced at a rate of 1/min, while 30 min.
While continuously adding wt% of nitric acid to concentrated hydrochloric acid in an amount equivalent to the sulfur dioxide, the temperature of the concentrated hydrochloric acid was lowered to 3% by external cooling.
It was kept at 0°C.
2時間処理を行った結果処理期間を通して、濃塩酸中を
気泡状で通過した反応管用塩化水素ガス中の二酸化イオ
ウ含有率は0.04vo1%であり、二酸化イオウ除去
率は97%に相当した。As a result of the 2-hour treatment, the sulfur dioxide content in the hydrogen chloride gas for the reaction tube that passed through the concentrated hydrochloric acid in the form of bubbles was 0.04 vol%, and the sulfur dioxide removal rate was equivalent to 97%.
また、反応管量ガス中の塩化ニトロシル濃度を測定する
と1.20vo1%であった。Furthermore, the concentration of nitrosyl chloride in the reaction tube gas was measured to be 1.20 vol%.
実施例 2
実施例1で濃塩酸の代りに硫酸16vo1%を含有する
飽和塩酸溶液を用いた他は実施例1と同様に行なった。Example 2 The same procedure as in Example 1 was conducted except that a saturated hydrochloric acid solution containing 16 vol. % of sulfuric acid was used instead of concentrated hydrochloric acid.
反応管量ガス中二酸化イオウ濃度は0.06vO1%で
あり、二酸化イオウ除去率は95%であった。The sulfur dioxide concentration in the reaction tube gas was 0.06 vO1%, and the sulfur dioxide removal rate was 95%.
実施例 3
30mmφ、長さ1200mmのガラス管に5X5X3
mmφの磁製ラツシヒリングを充填した塔下部より、二
酸化イオウ1.10vo1%を含む塩化水素ガスを12
00m1/minの速度で導入し、一方、硫酸20wt
%を含む飽和塩酸溶液500m1を、20℃にて30m
1/minで塔頂部より供給し、前記塩酸溶液に二酸化
イオウに対し1.1倍モルの割合で20wt%硝酸を連
続的に添加しながら、循環使用した。Example 3 5X5X3 in a glass tube with a diameter of 30mm and a length of 1200mm
Hydrogen chloride gas containing 1.10 vol.
00ml/min, while 20wt of sulfuric acid
% of saturated hydrochloric acid solution at 20°C.
The hydrochloric acid solution was supplied from the top of the column at a rate of 1/min, and 20 wt % nitric acid was continuously added to the hydrochloric acid solution at a molar ratio of 1.1 times that of sulfur dioxide.
浴出ガス中二酸化イオウ濃度は0.04vo1%であり
、二酸化イオウ除去率は96%であった。The sulfur dioxide concentration in the bath gas was 0.04 vol%, and the sulfur dioxide removal rate was 96%.
実施例 4
光ニトロソ化反応で得たシクロへキサノンオキシム塩酸
塩を硫酸で転位して発生した二酸化イオウ0.90vo
1%を含む転位排ガスを使用した以外は実施例3と同様
に行なった。Example 4 0.90 vol of sulfur dioxide generated by rearranging cyclohexanone oxime hydrochloride obtained by photonitrosation reaction with sulfuric acid
The same procedure as in Example 3 was carried out except that a dislocation exhaust gas containing 1% was used.
浴出ガス中二酸化イオウ濃度は0.04vo1%であり
、二酸化イオウ除去率は96%であった。The sulfur dioxide concentration in the bath gas was 0.04 vol%, and the sulfur dioxide removal rate was 96%.
比較例
実施例1で30wt%硝酸の代りに酸化剤として硝酸と
等モルの塩素ガスを二酸化イオウ含有塩化水素中に導入
した以外は実施例1と同様の方法により行なった。Comparative Example A process was carried out in the same manner as in Example 1, except that instead of 30 wt % nitric acid in Example 1, chlorine gas of equimolar amount to nitric acid was introduced into the sulfur dioxide-containing hydrogen chloride as an oxidizing agent.
反応管量ガス中の二酸化イオウ濃度は0.60%であり
、二酸化イオウ除去率は50%であった。The sulfur dioxide concentration in the reaction tube gas was 0.60%, and the sulfur dioxide removal rate was 50%.
図面は本発明法が適用される一工程を示すフローシート
である。
1・・・・・・光ニトロソ化反応装置、3・・・・・・
ベックマン転位装置、6・・・・・・二酸化イオウ含有
塩化水素ガス、7・・・・・・酸化反応装置、8・・・
・・・貯槽、12・・・・・・硝酸、13・・・・・・
塩酸溶液、14・・・・・・塩化ニトロシルを含有する
塩化水素ガス、15・・・・・・塩化ニトロシル製造装
置。The drawing is a flow sheet showing one step in which the method of the present invention is applied. 1...Photonitrosation reaction device, 3...
Beckmann rearrangement device, 6... Hydrogen chloride gas containing sulfur dioxide, 7... Oxidation reaction device, 8...
...Storage tank, 12...Nitric acid, 13...
Hydrochloric acid solution, 14...Hydrogen chloride gas containing nitrosyl chloride, 15...Nitrosyl chloride production equipment.
Claims (1)
塩化水素ガス中に含まれる二酸化イオウを除去する方法
において、前記塩酸として硝酸含有かつ実質的に飽和の
塩酸溶液を使用することを特徴とする塩化水素ガス中に
含まれる二酸化イオウの除去法。1. A method for removing sulfur dioxide contained in hydrogen chloride gas by contacting hydrogen chloride gas containing sulfur dioxide with hydrochloric acid, characterized in that a substantially saturated hydrochloric acid solution containing nitric acid is used as the hydrochloric acid. A method for removing sulfur dioxide contained in hydrogen gas.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP55181342A JPS5953204B2 (en) | 1980-12-23 | 1980-12-23 | Method for removing sulfur dioxide contained in hydrogen chloride gas |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP55181342A JPS5953204B2 (en) | 1980-12-23 | 1980-12-23 | Method for removing sulfur dioxide contained in hydrogen chloride gas |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS57105224A JPS57105224A (en) | 1982-06-30 |
| JPS5953204B2 true JPS5953204B2 (en) | 1984-12-24 |
Family
ID=16099013
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP55181342A Expired JPS5953204B2 (en) | 1980-12-23 | 1980-12-23 | Method for removing sulfur dioxide contained in hydrogen chloride gas |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5953204B2 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109569234A (en) * | 2018-11-09 | 2019-04-05 | 河北东华冀衡化工有限公司 | A method of removing monoxone sulfur dioxide in tail gas |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20250333304A1 (en) * | 2022-06-10 | 2025-10-30 | Tokuyama Corporation | Method for producing high-purity hydrochloric acid |
| CN117069064B (en) * | 2023-09-01 | 2025-09-23 | 山东新和成精化科技有限公司 | Treatment methods for chlorinated tail gas |
-
1980
- 1980-12-23 JP JP55181342A patent/JPS5953204B2/en not_active Expired
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109569234A (en) * | 2018-11-09 | 2019-04-05 | 河北东华冀衡化工有限公司 | A method of removing monoxone sulfur dioxide in tail gas |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS57105224A (en) | 1982-06-30 |
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