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JPS597183B2 - electronic microscope - Google Patents
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JPS597183B2 - electronic microscope - Google Patents

electronic microscope

Info

Publication number
JPS597183B2
JPS597183B2 JP54138294A JP13829479A JPS597183B2 JP S597183 B2 JPS597183 B2 JP S597183B2 JP 54138294 A JP54138294 A JP 54138294A JP 13829479 A JP13829479 A JP 13829479A JP S597183 B2 JPS597183 B2 JP S597183B2
Authority
JP
Japan
Prior art keywords
magnetic field
sample
coil
electron beam
electron
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP54138294A
Other languages
Japanese (ja)
Other versions
JPS5663761A (en
Inventor
好則 青木
敏和 本田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Jeol Ltd
Original Assignee
Nihon Denshi KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nihon Denshi KK filed Critical Nihon Denshi KK
Priority to JP54138294A priority Critical patent/JPS597183B2/en
Publication of JPS5663761A publication Critical patent/JPS5663761A/en
Publication of JPS597183B2 publication Critical patent/JPS597183B2/en
Expired legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26Electron or ion microscopes; Electron or ion diffraction tubes

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)

Description

【発明の詳細な説明】 本発明は磁性試料に交番磁場を印加して磁区な観察する
のに適した電子顕微鏡に関する。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to an electron microscope suitable for observing magnetic domains by applying an alternating magnetic field to a magnetic sample.

近時磁場の印加された磁性試料を電子顕微鏡で観察し、
磁区構造等に関する多くの知見を得ることが行なわれて
いる。
A magnetic sample to which a magnetic field has recently been applied is observed with an electron microscope,
Much work has been done to obtain knowledge regarding magnetic domain structure, etc.

しかしながら従来においてはいずれも試料に印加される
磁場は静磁場であり、交番的に変化する磁場を試料に印
加した場合に、試料の磁区がどのように移動するかを観
察するための電子顕微鏡は存在せず、このような電子顕
微鏡の出現が望まれていた。
However, conventionally, the magnetic field applied to the sample is a static magnetic field, and an electron microscope is used to observe how the magnetic domains of the sample move when an alternatingly changing magnetic field is applied to the sample. None existed, and the emergence of such an electron microscope was awaited.

本発明はこのような要請に沿ってなされたもので、試料
にその強度が矩形パルス状に変化する交番磁場を印加し
た際に各強度の磁場印加状態における磁区像を分離して
表示することのできる磁区観察に適した電子顕微鏡を提
供するもので以下図面に基づき本発明の一実施例を詳述
する。
The present invention has been made in response to these demands, and it is a method of separating and displaying magnetic domain images in each magnetic field application state when an alternating magnetic field whose intensity changes in a rectangular pulse shape is applied to a sample. DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment of the present invention will be described in detail below with reference to the drawings.

第1図は本発明の一実施例を示すための図面であり、図
面中1は電子銃であり、該電子銃1より発生した電子線
2は収束レンズ3に入射して平行ビームされ、光軸4に
沿って磁性試料5に入射する。
FIG. 1 is a drawing for showing one embodiment of the present invention. In the drawing, 1 is an electron gun, and an electron beam 2 generated from the electron gun 1 enters a converging lens 3 and becomes a parallel beam. It is incident on the magnetic sample 5 along the axis 4.

6は該試料5に磁場を印加するためのコイルであり、該
コイル6には電源7より第2図aに示す如き例えば′P
IKHzの矩形波電流が供給されている。
Reference numeral 6 denotes a coil for applying a magnetic field to the sample 5, and the coil 6 is supplied with a voltage such as 'P' as shown in FIG. 2a from a power source 7.
A square wave current of IKHz is supplied.

従って、該磁場印加用コイル6より第2図bに示すよう
なその磁場強度がH,O, −Hというように矩形パル
ス状に周期的に変化する交番磁場が試料に印加される。
Therefore, from the magnetic field applying coil 6, an alternating magnetic field whose magnetic field intensity changes periodically in a rectangular pulse shape such as H, O, -H as shown in FIG. 2B is applied to the sample.

試料5を透過した電子線は該磁場印加用コイル6によっ
て作られた磁場の影響を受ける。
The electron beam transmitted through the sample 5 is influenced by the magnetic field created by the magnetic field applying coil 6.

即ち、第2図bにおいてBで示される期間においては電
子線2は該コイル6によって作られる磁場によって全く
偏向されずに光軸4に沿って直進するが、第2図bにお
いてAで示される磁場Hが印加される期間においては軌
跡イのように偏向され、又第2図bにおいてCで示され
る磁場一Hが印加される期間においては軌跡口のように
軌跡イとは逆向きに偏向される。
That is, during the period indicated by B in FIG. 2b, the electron beam 2 travels straight along the optical axis 4 without being deflected at all by the magnetic field created by the coil 6, but during the period indicated by A in FIG. During the period when the magnetic field H is applied, it is deflected as shown by the locus A, and during the period when the magnetic field H is applied, which is indicated by C in Fig. 2b, it is deflected in the opposite direction to the locus I, like the trajectory mouth. be done.

lはこのような偏向を受けた電子線が再び光軸上を進行
するようにさせるための補正磁場印加手段であり、該補
正磁場印加手段旦は前記電源7よりの電流が供給されて
いる第1、第2の補正コイル9a,9bからなっている
Reference numeral 1 denotes a correction magnetic field applying means for causing the electron beam that has undergone such a deflection to travel on the optical axis again. 1. It consists of second correction coils 9a and 9b.

該第1、第2の補正コイル9at9bは夫々前記磁場印
加用コイル6の結線の向きに対して逆向き及び同じ向き
に結線されている。
The first and second correction coils 9at9b are connected in the opposite direction and the same direction as the connection direction of the magnetic field applying coil 6, respectively.

従って第1の補正コイル9aは第2図Cに示すように同
図bに示した磁場強度波形とは逆位相の磁場を発生し、
第2の補生コイル9bは第2図bと同位相の補正磁場を
発生する。
Therefore, the first correction coil 9a generates a magnetic field having an opposite phase to the magnetic field strength waveform shown in FIG. 2B, as shown in FIG.
The second compensation coil 9b generates a compensation magnetic field having the same phase as that in FIG. 2b.

従って例えば磁場印加用コイル6によって前述した軌跡
イのように偏向された電子線は第1の補正コイル9aに
よって、今度は光軸4に向う方向に偏向され、更に第2
の補正コイル9bによって光軸4に沿って進行するよう
に進向される。
Therefore, for example, the electron beam deflected by the magnetic field applying coil 6 as shown in the above-mentioned trajectory A is now deflected in the direction toward the optical axis 4 by the first correction coil 9a, and is further deflected by the second correction coil 9a.
is directed along the optical axis 4 by the correction coil 9b.

このようにして補正磁場印加手段旦によって常に光軸4
に沿って進行するようにされた電子線は対物レンズ10
に入射する。
In this way, the optical axis 4 is always
The electron beam is caused to travel along the objective lens 10.
incident on .

該対物レンズ10の後段には前記電源7よりの第2図a
に示した如き矩形パルス状電流が供給されている像分離
用コイル11と、像撮影用の写真フイルム12が配置さ
れている。
At the rear stage of the objective lens 10, there is a power source connected to the power source 7 as shown in FIG.
An image separation coil 11 to which a rectangular pulsed current as shown in FIG.

勿論対物レンズ10の後段には他の結像レンズが配置さ
れ得る。
Of course, other imaging lenses may be arranged after the objective lens 10.

斯くして、像分離用コイル11は第2図bに示すような
、試料5に印加される磁場と完全に同期のとれた矩形パ
ルス状磁場を発生する。
In this way, the image separation coil 11 generates a rectangular pulsed magnetic field that is completely synchronized with the magnetic field applied to the sample 5, as shown in FIG. 2b.

従って第2図bにおいてAで示すところの試料5に強度
Hの磁場が印加されている期間に試料5を透過した電子
線は像分離用コイル11により偏向されて、例えば写真
フイルム12上のA′の位置に投射され、又夫々第2図
bにおいてB,Cで示すところの試料5に磁場が印加さ
れていない期間及び強度一Hの磁場が印加されている期
間に試料5を通過した電子線は写真フイルム12上の『
及びびの位置に投射される。
Therefore, during the period when a magnetic field of strength H is applied to the sample 5 indicated by A in FIG. The electrons projected at the position 2 and passed through the sample 5 during the period when no magnetic field was applied to the sample 5 and during the period when a magnetic field of strength -H was applied to the sample 5, respectively, as shown by B and C in Fig. 2b. The line is ``
It is projected to the position of and.

その結果該写真フイルム12を現像すれば、試料5にそ
の強度がH,0,−Hという順に交番磁場を印加した場
合の対物レンズ11による拡大像が、該写真フイルム1
2上に各印加磁場を異にする3種の像として分離されて
記録され、これら3種の像を比較、対照することによっ
て、これらの磁場印加状態間での磁区の移動の様子を観
察することができる。
As a result, when the photographic film 12 is developed, the magnified image obtained by the objective lens 11 when an alternating magnetic field is applied to the sample 5 in the order of intensity H, 0, -H is the photographic film 12.
2, each applied magnetic field is separated and recorded as three types of images with different applied magnetic fields, and by comparing and contrasting these three types of images, the movement of magnetic domains between these magnetic field application states can be observed. be able to.

上述した実施例においては、試料に印加される磁場がH
,0,−Hというように交番的に変化するようなもので
あったが、試料にH,−H或るいはH,0というように
交番的に変化させる磁場を印加する場合にも同様に実施
することができる。
In the embodiment described above, the magnetic field applied to the sample is H
, 0, -H, but the same applies when applying a magnetic field that alternatingly changes H, -H or H, 0 to the sample. It can be implemented.

又交番磁場の周波数を変化させて、それによる磁区の移
動の態様を観察しても良い、更に補正コイル9a,9b
を試料の上方に設けても交番磁場による電子線の偏向を
補正することが可能である。
It is also possible to change the frequency of the alternating magnetic field and observe the movement of the magnetic domains.
It is also possible to correct the deflection of the electron beam due to the alternating magnetic field even if it is placed above the sample.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明の一実施例を示すための図、第2図は第
1図に示したー実施例装置の各コイルに供給される電流
波形とコイルによって発生した磁場を示すための図であ
る。 1:電子銃、2:電子線、3:収束レンズ、4:光軸、
5:試料、6:磁場印加用コイル、7:電源、fl:補
正磁場印加手段、9a,9b:補正コイル、10:対物
レンズ、11:像分離用コイル、12:写真フイルム。
FIG. 1 is a diagram showing one embodiment of the present invention, and FIG. 2 is a diagram showing the current waveforms supplied to each coil of the embodiment device shown in FIG. 1 and the magnetic field generated by the coils. It is. 1: Electron gun, 2: Electron beam, 3: Converging lens, 4: Optical axis,
5: sample, 6: magnetic field application coil, 7: power supply, fl: correction magnetic field application means, 9a, 9b: correction coil, 10: objective lens, 11: image separation coil, 12: photographic film.

Claims (1)

【特許請求の範囲】[Claims] 1 電子銃と、該電子銃から発生した電子線を試料上に
収束するための収束レンズと、該試料にその強度が矩形
パルス状に変化する磁場を印加するための手段と、該手
段による電子線の偏向を補正するための補正手段と、該
補正手段によって補正された電子線が入射する対物レン
ズと、該対物レンズの後段に配置され試料に印加される
磁場強度の変化に同期して前記電子線を偏向するための
手1段とを具備していることを特徴とする電子顕微鏡。
1. An electron gun, a converging lens for converging an electron beam generated from the electron gun onto a sample, means for applying a magnetic field whose intensity changes in a rectangular pulse shape to the sample, and an electron beam generated by the means. a correction means for correcting the deflection of the beam; an objective lens into which the electron beam corrected by the correction means is incident; An electron microscope characterized in that it comprises a means for deflecting an electron beam.
JP54138294A 1979-10-26 1979-10-26 electronic microscope Expired JPS597183B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP54138294A JPS597183B2 (en) 1979-10-26 1979-10-26 electronic microscope

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP54138294A JPS597183B2 (en) 1979-10-26 1979-10-26 electronic microscope

Publications (2)

Publication Number Publication Date
JPS5663761A JPS5663761A (en) 1981-05-30
JPS597183B2 true JPS597183B2 (en) 1984-02-16

Family

ID=15218516

Family Applications (1)

Application Number Title Priority Date Filing Date
JP54138294A Expired JPS597183B2 (en) 1979-10-26 1979-10-26 electronic microscope

Country Status (1)

Country Link
JP (1) JPS597183B2 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6554066B2 (en) * 2016-05-31 2019-07-31 株式会社日立製作所 Electron microscope for magnetic field measurement and magnetic field measurement method

Also Published As

Publication number Publication date
JPS5663761A (en) 1981-05-30

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