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JPS6028365B2 - Manufacturing method of voltage nonlinear resistor - Google Patents
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JPS6028365B2 - Manufacturing method of voltage nonlinear resistor - Google Patents

Manufacturing method of voltage nonlinear resistor

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Publication number
JPS6028365B2
JPS6028365B2 JP55051935A JP5193580A JPS6028365B2 JP S6028365 B2 JPS6028365 B2 JP S6028365B2 JP 55051935 A JP55051935 A JP 55051935A JP 5193580 A JP5193580 A JP 5193580A JP S6028365 B2 JPS6028365 B2 JP S6028365B2
Authority
JP
Japan
Prior art keywords
insulating film
nonlinear resistor
voltage nonlinear
manufacturing
pod
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP55051935A
Other languages
Japanese (ja)
Other versions
JPS56148801A (en
Inventor
信行 吉岡
佳行 柏木
貴保 川村
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Meidensha Electric Manufacturing Co Ltd
Original Assignee
Meidensha Electric Manufacturing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Meidensha Electric Manufacturing Co Ltd filed Critical Meidensha Electric Manufacturing Co Ltd
Priority to JP55051935A priority Critical patent/JPS6028365B2/en
Publication of JPS56148801A publication Critical patent/JPS56148801A/en
Publication of JPS6028365B2 publication Critical patent/JPS6028365B2/en
Expired legal-status Critical Current

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Description

【発明の詳細な説明】 A 産業上の利用分野 本発明は、酸化亜鉛(Zn0)を主成分とする電庄非直
線抵抗体の製造方法に関する。
DETAILED DESCRIPTION OF THE INVENTION A. Field of Industrial Application The present invention relates to a method for manufacturing an electric nonlinear resistor whose main component is zinc oxide (Zn0).

B 発明の概要 素体周縁部にR面取りを有し、又はその他に縁をR面取
りした溝を有する素体に絶縁皮膜を形成した電圧非直線
抵抗体の製造方法において、焼成サャ内で繁体の焼成お
よび絶縁皮膜形成材の蒸発又は昇華による気相−固相反
応で絶縁皮膜を形成することにより、均一厚みの絶縁皮
膜を容易に形成しようとしたものである。
B. In the method of manufacturing a voltage nonlinear resistor of the invention, in which an insulating film is formed on an element body having a rounded chamfer on the peripheral edge of the element body or a groove with a rounded edge on the edge, traditional This method attempts to easily form an insulating film of uniform thickness by forming the insulating film through a gas phase-solid phase reaction through firing and evaporation or sublimation of the insulating film forming material.

C 従来の技術 従来、遮雷素子等に使用される電圧非直線抵抗体は、第
1図に示すように、蓬Dおよび厚さtの円柱状の秦体1
の周面には、沿面放電防止用の絶縁皮膜2が形成されて
おり、素体1の両端面には、電極3,4が形成されてい
る。
C. PRIOR TECHNOLOGY Conventionally, a voltage non-linear resistor used in a lightning shielding element, etc. has a cylindrical body 1 with a length D and a thickness t, as shown in FIG.
An insulating film 2 for preventing creeping discharge is formed on the circumferential surface of the element body 1, and electrodes 3 and 4 are formed on both end surfaces of the element body 1.

そして、かかる構成の電圧非直線抵抗体の絶縁皮膜形成
には、ェポキシ樹脂などの有機絶縁物又はリン酸アルミ
ニウム系、可溶性珪酸塩系などの無機絶縁物を素子焼成
後に塗布する。
To form an insulating film on a voltage nonlinear resistor having such a configuration, an organic insulator such as epoxy resin or an inorganic insulator such as aluminum phosphate or soluble silicate is applied after firing the element.

又は低融点ガラス又は無機の加熱硬化形絶縁皮膜形成材
を素子焼成後塗布し、素子の諸特性に悪影響のないよう
素子焼成温度より低温で加熱する。或いはガラス質又は
結晶質の絶縁皮膜形成材を素子焼成前のプレス成形品に
塗布し、素子の焼成と同時に皮膜も形成する。又は素子
を仮燈して皮膜形成材を塗布し素子の本焼成と同時に絶
縁皮膜も形成する方法等がある。D 発明が解決しよう
とする問題点 しかしながら、上記し、ずれの方法によっても、絶縁皮
膜材を塗布せねばならず、秦体の綾部に丸味を有する部
分に、均一に塗布するのは相当な技術を要し、更に綾部
以外にも均一厚みに塗布するのには量産性を向上するた
めに特別な治具、装置など必要であり、これら治具等を
使用しても均一厚みとすることは困難であった。
Alternatively, a low melting point glass or an inorganic thermosetting insulating film forming material is applied after firing the element, and heated at a temperature lower than the firing temperature of the element so as not to adversely affect various properties of the element. Alternatively, a glassy or crystalline insulating film-forming material is applied to the press-formed product before firing the element, and the film is also formed at the same time as the firing of the element. Alternatively, there is a method of temporarily lighting the element, applying a film-forming material, and forming an insulating film at the same time as the main firing of the element. D Problems to be Solved by the Invention However, even with the above-mentioned and offset methods, it is necessary to apply the insulating coating material, and it takes considerable skill to apply it uniformly to the rounded part of the twill part of the body. In addition, special jigs and equipment are required to improve mass production in order to apply the coating to a uniform thickness on areas other than the twill, and even if these jigs are used, it is not possible to achieve a uniform thickness. It was difficult.

本発明の製造方法は、以上の問題点をすべて解決し、丸
味のある縁部も含めて、複雑な形状の素子側面に極めて
容易に、かつ均一な絶縁皮膜を形成させる方法である。
The manufacturing method of the present invention solves all of the above-mentioned problems, and is a method for forming an insulating film extremely easily and uniformly on the side surface of an element having a complex shape, including rounded edges.

E 問題点を解決するための手段第1の発明が対象とす
る電圧非直線抵抗体は、第2図aに示すように、素体5
の縁部5AにR面取りを有し、この縁部5Aも含めた秦
体周面に絶縁皮膜6を形成している。
E. Means for Solving the Problem The voltage nonlinear resistor to which the first invention is directed has an element body 5 as shown in FIG. 2a.
The edge 5A has an R chamfer, and an insulating film 6 is formed on the circumferential surface of the body including this edge 5A.

この秦体緑部のR面取りと絶縁皮膜形成は、中空の黍体
7においては第2図bに示すように外周面綾部7Aのほ
かに内周面緑部7Bにも施され、外周面及び内周面に絶
縁皮膜8A,8Bを形成している。これらR面取りは最
大t/2にされる。このように、秦体縁部にR面取りを
施し、このR面取り部にも絶縁皮膜を形成した構造によ
り、第1図に示すものよりも周綾部での電界集中が減少
し、該緑部での部分放電が抑制されると共に周綾部の欠
け発生も防止できる。
This R-chamfering of the green part of the mill body and the formation of an insulating film are performed not only on the outer circumferential surface twilling part 7A but also on the inner circumferential surface green part 7B of the hollow millet 7, as shown in FIG. 2b. Insulating films 8A and 8B are formed on the inner peripheral surface. These R chamfers are made to have a maximum of t/2. In this way, the structure in which the rounded edge is rounded and an insulating film is also formed on this rounded side reduces the concentration of electric field at the periphery compared to the one shown in Fig. 1, and the green part Partial discharge is suppressed, and chipping of the circumferential twill portion can also be prevented.

第1の発明は、上記のような構成のものにおいて、R面
取り部を含む秦体周面に絶縁皮膜を形成するに、焼成サ
ャ内の耐熱性台座に圧縮成形又はリ仮競した素体を敷直
し、この秦体の近傍に絶縁皮膜形成材を配置し、前記焼
成サャを焼成サャと同材質のふたによりふたをして加熱
し、素体の焼成および絶縁皮膜形成材の蒸発又は昇華に
よる素体表面での気相−固相反応で秦体表面に絶縁皮膜
を形成するようにしたものである。
In the first invention, in the structure as described above, in order to form an insulating film on the circumferential surface of the body including the R-chamfered part, the element body is compression-molded or re-molded on a heat-resistant pedestal in the firing sac. The insulating film forming material is placed in the vicinity of this sinter body, and the firing shard is covered with a lid made of the same material as the firing shard and heated to cause firing of the element and evaporation or sublimation of the insulating film forming material. An insulating film is formed on the surface of the element body through a gas phase-solid phase reaction on the surface of the element body.

また、第2の発明が対象とする電圧非直線抵抗体は、第
1の発明の周綾部R面取りに加えて、第3図a又はbに
半断面を示すように、秦体9の周面円周方向に少なくと
−も1つの溝9AをR面取りを施して形成した構造、即
ち周面が凹凸を有する構造とし、この凹凸部も含めた周
面に沿って絶縁皮膜10を形成した抵抗体構造としてい
る。
In addition to the chamfering of the circumferential twill portion R of the first invention, the voltage non-linear resistor to which the second invention is directed has the circumferential surface of the square body 9 as shown in a half cross section in FIG. 3 a or b. A resistor having a structure in which at least one groove 9A is formed in the circumferential direction by R-chamfering, that is, a structure in which the circumferential surface is uneven, and an insulating film 10 is formed along the circumferential surface including the uneven portions. It has a body structure.

第3図aは2つの角溝を有する場合を示し、bは4つの
波形溝を有する場合である。このように、素体周面にR
面取りした溝を有し、この周面に絶縁皮膜を形成した構
造により、沿面距離が長くなって周面リーク電流を減少
及び沿面放電抑制ができる。
FIG. 3a shows a case with two square grooves, and FIG. 3b shows a case with four wavy grooves. In this way, R
The structure having a chamfered groove and an insulating film formed on the circumferential surface increases the creepage distance, thereby reducing circumferential leakage current and suppressing creeping discharge.

また、雰囲気中に晒される素体表面積が増し、素体から
の放熱効果が向上して温度による電流増を抑えることが
できる。例えば、第3図aに示す構造のものは「溝9A
を持たない従来構造との比較で沿面距離、周面表面積は
下記表に示す値に向上する。但し、本発明のものは径3
仇帆、厚さ25側の素体に深さ5側、幅5肌の溝を2つ
等間隔に有する場合である。なお、溝の形成は素体周面
に限らず、第4図に示すように泰体11の電極部を除い
た端面円周方向に少なくとも1つの溝11AをR面取り
を施し溝1 1Aにも絶縁皮膜12を形成して同様の作
用効果を得ることができる。また、素体の端面と周面の
両方にR面取りした溝を形成したものも本発明の対陣と
する電圧非直線抵抗体である。第2の発明は、その対象
とする電圧非直線抵抗体の構成が、第1の発明のR面取
りに加え、電極形成面を除いた素体表面にその間方向に
してかつ緑をR面取りした溝を形成し、各R面取り部を
含む素体間面および溝に絶縁皮膜を形成しており、主要
部である絶縁皮膜形成法については第1の発明と同様で
ある。
Furthermore, the surface area of the element body exposed to the atmosphere increases, the heat dissipation effect from the element body improves, and an increase in current due to temperature can be suppressed. For example, the structure shown in FIG.
Compared to a conventional structure that does not have this structure, the creepage distance and peripheral surface area are improved to the values shown in the table below. However, the one of the present invention has a diameter of 3
This is a case where the element body on the 25-thickness side has two grooves of 5 depth and 5 width at equal intervals. Note that the formation of grooves is not limited to the circumferential surface of the element body, as shown in FIG. Similar effects can be obtained by forming the insulating film 12. Furthermore, a voltage nonlinear resistor that has R-chamfered grooves formed on both the end surface and the circumferential surface of the element body is also an opposing voltage nonlinear resistor of the present invention. In the second invention, in addition to the R-chamfered structure of the first invention, the target voltage non-linear resistor has a groove in which the green groove is R-chamfered in the direction between the surfaces of the element body excluding the electrode forming surface. , and an insulating film is formed on the inter-element surfaces and grooves including each R chamfered portion, and the method of forming the insulating film, which is the main part, is the same as that of the first invention.

F作用 第1の発明および第2の発明ともに、絶縁皮膜は、ある
温度以上に加熱すると高蒸気圧成分の絶縁皮膜形成材が
蒸発又は昇華し素体表面に至って素体中のZn○と気相
一閲相反応して均一な厚みに形成される。
F action In both the first invention and the second invention, when the insulating film is heated above a certain temperature, the insulating film forming material of the high vapor pressure component evaporates or sublimates, reaching the surface of the element body, and the Zn○ and gas in the element body are heated. It is formed into a uniform thickness by a phase reaction.

G 実施例 以下、第1の発明を第5図に示す一実施例に基づき詳細
に説明する。
G. Example Hereinafter, the first invention will be explained in detail based on an example shown in FIG.

なお、第2の発明については、その対象とする電圧非直
線抵抗体の構成が異なるだけなので、説明を省略する。
第5図に示すように、中空を持って圧縮成形又は仮焼し
た素体13を耐熱性セラミック台座14を介してアルミ
ナ質サャ15内に贋き、台座14と同材質のマスク材1
6を乗せる。
Note that the second invention differs only in the configuration of the target voltage nonlinear resistor, so a description thereof will be omitted.
As shown in FIG. 5, a hollow compression-molded or calcined blank 13 is placed into an alumina sac 15 via a heat-resistant ceramic pedestal 14, and a mask material 1 made of the same material as the pedestal 14 is placed.
Put 6 on it.

中空部には例えばサャ15と同材質の補助部材17を設
置する。サャ15の内面及び補助部村17の外面には高
蒸気圧でZnq素体と気相−固相反応によって周面絶縁
皮膜を形成する、形成材18を適当な面積で、適当な厚
み即ち数10A肌以上の厚みの側面絶縁皮膜を形成する
に足るに充分な量を塗布してある。なお、絶縁皮膜は気
相−固相反応により形成されるので、絶縁皮膜材は泰体
の近傍に配置すればよい。サャと同材質のふた19をサ
ャとの隙間がほとんどないように被せて置き、1000
qo以上に加熱すると高蒸気圧成分の絶縁皮膜材18が
蒸発又は昇華し素体表面に至り黍体中のZn○と気相−
固相反応により高い電気特性の周面絶縁皮膜を形成する
と同時に素子の焼成も完了する。なお、台座15及びマ
スク材16は酸化亜鉛系暁結板が秦体の特性に悪影響が
ないので最も良く、又粉体でも良い。
For example, an auxiliary member 17 made of the same material as the shell 15 is installed in the hollow portion. On the inner surface of the shell 15 and the outer surface of the auxiliary part 17, a forming material 18 which forms a peripheral insulating film by a gas-solid reaction with the Znq element at high vapor pressure is applied to an appropriate area and an appropriate thickness. A sufficient amount is applied to form a side insulation film with a thickness of 10A or more. Incidentally, since the insulating film is formed by a gas phase-solid phase reaction, the insulating film material may be placed near the body. Place the lid 19 made of the same material as the pod so that there is almost no gap between the pod and the pod, and
When heated above qo, the insulating coating material 18, which is a high vapor pressure component, evaporates or sublimates and reaches the surface of the element, whereupon the Zn○ in the millet and the gas phase -
A peripheral insulating film with high electrical properties is formed by solid-phase reaction, and the firing of the device is completed at the same time. The base 15 and the mask material 16 are best made of a zinc oxide-based solidified plate since it does not have a negative effect on the properties of the material, and powder may also be used.

サヤ15が大きく、秦体13との距離が大きい場合はサ
ャ内面と素体間20に円筒形などの補助部材を設けてそ
の内面に絶縁皮膜材を塗布してもよい。周面絶縁皮膜材
18としては、 Zn23Sbo.釘04,Znぶi04を形成する酸化
アンチモン、シリカ及び反応を促進する酸化ビスマスな
どが適している。
If the sheath 15 is large and the distance from the body 13 is large, an auxiliary member such as a cylinder may be provided between the inner surface of the sheath and the element body 20, and an insulating coating material may be applied to the inner surface of the auxiliary member. As the peripheral insulating film material 18, Zn23Sbo. Suitable materials include antimony oxide, silica, which forms Nail 04 and Znbu i04, and bismuth oxide, which accelerates the reaction.

シリカは蒸気圧は低いがSQ03の昇華又はBi203
蒸発に伴って秦体表面に至り素体と反応するものと思わ
れる。マスク材16は必ずしも必要としない。即ち焼成
後素体に電極を設ける時表面を研摩するので例えば数1
0山肌を研摩する時間はわずかなので表子の価格がアッ
プすることもない。一方、第2の発明においては、第3
図および第4図に示す溝を設けた素体の溝部、R面部に
も均一な絶縁皮膜を形成できる。
Silica has a low vapor pressure, but sublimation of SQ03 or Bi203
It is thought that it reaches the Qin body surface as it evaporates and reacts with the element body. The mask material 16 is not necessarily required. That is, when providing electrodes on the element body after firing, the surface is polished, so for example,
Since it takes only a short time to polish the 0-mountain surface, the price of the surface does not increase. On the other hand, in the second invention, the third invention
A uniform insulating film can also be formed on the groove portion and the R surface portion of the element body provided with the grooves shown in FIGS.

H 発明の効果 以上のように、第1および第2の発明によれば、電圧非
直線抵抗体の絶縁皮膜を、素体の焼成と同時に行なう気
相−園相反応によって形成するので、複雑な構造となる
R面および溝部に対しても容易に均一厚みの絶縁皮膜を
形成することができる。
H. Effects of the Invention As described above, according to the first and second inventions, the insulating film of the voltage nonlinear resistor is formed by a gas-phase reaction that is carried out at the same time as the firing of the element body. An insulating film with a uniform thickness can be easily formed on the R surface and the groove portion that constitute the structure.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は従来の電圧非直線抵抗体を示す縦断面図、第2
図a,bは第1の発明が対象とする電圧非直線抵抗体の
縦断面図、第3図a,bおよび第4図は第2の発明が対
象とする電圧非直線抵抗体の縦断面図、第5図は第1の
発明の一実施例を示す縦断面図である。 5,7,9,11,13……秦体、5A,7A,7B,
・・・・・・R面取り部、9A・・・・・・溝、6,8
A,8B,10,12・・・・・・絶縁皮膜、14・・
・・・・セラミック台座、15……サヤ、16……マス
ク材、17……補助部村、18……絶縁皮膜形成材、1
9・・・・・・ふた。 第1図 第2図 第4図 第3図 第5図
Figure 1 is a vertical cross-sectional view showing a conventional voltage nonlinear resistor;
Figures a and b are longitudinal cross-sectional views of the voltage nonlinear resistor targeted by the first invention, and Figures 3 a, b, and 4 are longitudinal cross sections of the voltage nonlinear resistor targeted by the second invention. FIG. 5 is a vertical sectional view showing an embodiment of the first invention. 5, 7, 9, 11, 13... Qin body, 5A, 7A, 7B,
......R chamfer, 9A...groove, 6,8
A, 8B, 10, 12...Insulating film, 14...
... Ceramic pedestal, 15 ... Saya, 16 ... Mask material, 17 ... Auxiliary village, 18 ... Insulating film forming material, 1
9... Lid. Figure 1 Figure 2 Figure 4 Figure 3 Figure 5

Claims (1)

【特許請求の範囲】 1 素体周縁部にR面取りを形成するとともにそのR面
取り部を含む素体周面に絶縁皮膜を形成してなる電圧非
直線抵抗体を製造するにあたり、焼成サヤ内の耐熱性台
座に圧縮成形又は仮焼した素体を載置し、この素体の近
傍に絶縁皮膜形成材を配置し、前記焼成サヤを焼成サヤ
と同材質のふたによりふたをして加熱し、素体の焼成お
よび絶縁皮膜形成材の蒸発又は昇華による素体表面での
気相−固相反応で素体表面に絶縁皮膜を形成することを
特徴とする電圧非直線抵抗体の製造方法。 2 素体周縁部にR面取りを形成るとともに、電極形成
面を除いた素体表面にその周方向にしてかつ縁をR面取
りした溝を形成し、各R面取り部を含む素体周面および
溝に絶縁皮膜を形成してなる電圧非直線抵抗体を製造す
るにあたり、焼成サヤ内の耐熱性台座に圧縮成形又は仮
焼した素体を載置し、この素体の近傍に絶縁皮膜形成料
を配置し、前記焼成サヤを焼成サヤと同材質のふたによ
りふたをして加熱し、素体の焼成および絶縁皮膜形成材
の蒸発又は昇華による素体表面での気相−固相反応で素
体表面に絶縁皮膜を形成することを特徴とする電圧非直
線抵抗体の製造方法。
[Claims] 1. In manufacturing a voltage nonlinear resistor in which an R chamfer is formed on the peripheral edge of the element body and an insulating film is formed on the peripheral surface of the element body including the R chamfered part, A compression molded or calcined element is placed on a heat-resistant pedestal, an insulating film forming material is placed near the element, the fired pod is covered with a lid made of the same material as the fired pod, and heated; 1. A method for manufacturing a voltage nonlinear resistor, which comprises forming an insulating film on the surface of the element by firing the element and evaporating or sublimating an insulating film forming material to cause a gas-solid phase reaction on the surface of the element. 2 A round chamfer is formed on the peripheral edge of the element body, and a groove is formed in the circumferential direction of the element body surface excluding the electrode forming surface and the edge is rounded with a round chamfer, so that the peripheral surface of the element body including each R chamfered part and In manufacturing a voltage nonlinear resistor with an insulating film formed in the groove, a compression-molded or calcined element is placed on a heat-resistant pedestal in a firing pod, and an insulating film-forming material is placed near the element. The fired pod is covered with a lid made of the same material as the fired pod and heated, and the element is fired by a gas phase-solid reaction on the surface of the element due to evaporation or sublimation of the insulating film forming material. A method for manufacturing a voltage nonlinear resistor, characterized by forming an insulating film on the body surface.
JP55051935A 1980-04-19 1980-04-19 Manufacturing method of voltage nonlinear resistor Expired JPS6028365B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP55051935A JPS6028365B2 (en) 1980-04-19 1980-04-19 Manufacturing method of voltage nonlinear resistor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP55051935A JPS6028365B2 (en) 1980-04-19 1980-04-19 Manufacturing method of voltage nonlinear resistor

Publications (2)

Publication Number Publication Date
JPS56148801A JPS56148801A (en) 1981-11-18
JPS6028365B2 true JPS6028365B2 (en) 1985-07-04

Family

ID=12900717

Family Applications (1)

Application Number Title Priority Date Filing Date
JP55051935A Expired JPS6028365B2 (en) 1980-04-19 1980-04-19 Manufacturing method of voltage nonlinear resistor

Country Status (1)

Country Link
JP (1) JPS6028365B2 (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58175602U (en) * 1982-05-19 1983-11-24 マルコン電子株式会社 barista
JPS60193302A (en) * 1984-03-15 1985-10-01 株式会社東芝 Method of producing nonlinear resistor
JPH01123401A (en) * 1987-11-09 1989-05-16 Ngk Insulators Ltd Manufacture of voltage dependent nonlinear resistor

Also Published As

Publication number Publication date
JPS56148801A (en) 1981-11-18

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