JPS6032717B2 - cleaning equipment - Google Patents
cleaning equipmentInfo
- Publication number
- JPS6032717B2 JPS6032717B2 JP53046579A JP4657978A JPS6032717B2 JP S6032717 B2 JPS6032717 B2 JP S6032717B2 JP 53046579 A JP53046579 A JP 53046579A JP 4657978 A JP4657978 A JP 4657978A JP S6032717 B2 JPS6032717 B2 JP S6032717B2
- Authority
- JP
- Japan
- Prior art keywords
- core tube
- tube
- cleaning
- pure water
- furnace
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Cleaning In General (AREA)
Description
【発明の詳細な説明】 本発明は管状物の洗浄装置に関する。[Detailed description of the invention] The present invention relates to a cleaning device for tubular objects.
半導体装置、集積回路等の製造においては、薄い半導体
板(ゥヱハ)を加熱状態に維持される石英管からなる炉
心管内に入るとともに、所定の反応ガス等を炉心管内に
流し、ウェハ表面部に被膜を形成したり、不純物を拡散
させる作業がある。In the production of semiconductor devices, integrated circuits, etc., a thin semiconductor board (wafer) is placed in a furnace tube made of a quartz tube that is maintained in a heated state, and a prescribed reaction gas is flowed into the furnace tube to coat the surface of the wafer. There are operations to form impurities and to diffuse impurities.
この作業にあっては、炉心管(単に管とも称する。)内
には反応ガスの反応によって各種の生成物が発生し、こ
の生成物はウェハ以外の不所望な管壁にも付着する。こ
のため、この付着層は塊となって管壁から落下してゥェ
ハ表面に付着し、ウェハ表面での被膜の異常生長の原因
等になったりする。また、付着層内に含まれている不純
物が管内に再蒸発し、これが再びウェハ表層部に拡散し
、(いわゆるオートドーピング)、拡散濃度が不均一と
なったりする。そこで、一定処理回数毎に、この炉心管
を拡散炉(熱処理装置)から取り外し、管内壁に付着す
る被膜を取り除く洗浄作業が行なわれ、この洗浄作業は
、第1図および第2図に示すような構造の洗浄装置を用
いることが提案される。In this operation, various products are generated in the reactor core tube (also simply referred to as a tube) due to reactions of reaction gases, and these products adhere to undesirable tube walls other than the wafer. For this reason, this adhesion layer becomes a lump and falls from the tube wall and adheres to the wafer surface, causing abnormal growth of the film on the wafer surface. Further, impurities contained in the deposited layer re-evaporate into the tube and diffuse again into the surface layer of the wafer (so-called autodoping), resulting in non-uniform diffusion concentration. Therefore, the furnace core tube is removed from the diffusion furnace (heat treatment equipment) every certain number of times, and cleaning work is performed to remove the coating that adheres to the inner wall of the tube.This cleaning work is performed as shown in Figures 1 and 2. It is proposed to use a cleaning device with a similar structure.
すなわち、この洗浄装置には並列に第1洗浄槽1〜第3
洗浄槽3が配設され、第1洗浄槽1には炉心管4の内壁
に付着した被膜を溶解するエッチング液、たとえば、シ
リコンやシリコン化合物の場合にはふつ酸を王とするエ
ッチング液が入れられ、第2洗浄槽2には純水が順次供
給される状態で入れられる。また、第3洗浄槽3の下方
には回転制御される複数のローラ5が配設され、第2洗
浄槽2で洗浄された炉心管4はこれらローラ5上に載せ
られ回転するようになっている。また、第3洗浄槽3の
側内壁上部には純水をローラ5上の炉心管4に吹き付け
る噴射管6が配設されている。このような洗浄装置にあ
っては、炉心管4の両端近傍を下方が円弧状に屈曲した
アーム7でそれぞれ支え、第1洗浄槽1のエッチング液
8中に浸して炉心管4の内壁に付着している被膜を除去
し、その後、アーム7を上昇、水平移動、下降させて炉
心管4を第2洗浄槽2の純水からなる洗浄液9中に入れ
てエッチング液等を洗い流す。That is, this cleaning device has first to third cleaning tanks in parallel.
A cleaning tank 3 is provided, and the first cleaning tank 1 contains an etching solution for dissolving the film attached to the inner wall of the reactor core tube 4, for example, an etching solution mainly containing acid in the case of silicon or silicon compounds. The second cleaning tank 2 is filled with pure water and is sequentially supplied with pure water. Further, a plurality of rollers 5 whose rotation is controlled are disposed below the third cleaning tank 3, and the reactor core tube 4 cleaned in the second cleaning tank 2 is placed on these rollers 5 and rotated. There is. Further, an injection pipe 6 for spraying pure water onto the furnace core tube 4 on the roller 5 is disposed at the upper part of the side inner wall of the third cleaning tank 3. In such a cleaning device, the vicinity of both ends of the furnace core tube 4 are supported by arms 7 each bent in an arc shape at the bottom, and the core tube 4 is immersed in an etching solution 8 in the first cleaning tank 1 to adhere to the inner wall of the furnace core tube 4. After that, the arm 7 is raised, moved horizontally, and lowered, and the core tube 4 is placed in the cleaning liquid 9 made of pure water in the second cleaning tank 2 to wash away the etching liquid and the like.
さらに、アーム7を移動させて炉心管4を第3洗浄槽3
内のローラ5上に載層する。そして、第2図に示すよう
に、炉心管4の一端の細警部(枝管)10に回転可能な
回転ジョイント1 1を介して純水供給管12を接続し
、純水供給管12から炉心管4内に純水を流し込み、管
内の洗浄を行なう。また、上方の噴射管6から純水を炉
心管4に吹き付け、炉心管4の外壁を洗う。この際、ロ
ーラ5は共に同一方向に回転することから、炉心管4は
一定回転方向に廻り続け、炉心管4の内外壁全体に洗浄
液が流れ洗浄が行なわれる。しかし、このような洗浄装
置ではつぎのような欠点がある。Furthermore, the arm 7 is moved to remove the reactor core tube 4 from the third cleaning tank 3.
It is placed on the inner roller 5. Then, as shown in FIG. 2, a pure water supply pipe 12 is connected to a fine pipe (branch pipe) 10 at one end of the reactor core tube 4 via a rotatable rotary joint 11, and the pure water supply pipe 12 is connected to the reactor core. Pure water is poured into the tube 4 to clean the inside of the tube. Further, pure water is sprayed onto the core tube 4 from the upper injection pipe 6 to wash the outer wall of the core tube 4. At this time, since the rollers 5 both rotate in the same direction, the furnace core tube 4 continues to rotate in a constant rotation direction, and the cleaning liquid flows over the entire inner and outer walls of the furnace core tube 4 to perform cleaning. However, such a cleaning device has the following drawbacks.
{1) 第3洗浄槽での洗浄にあっては、洗浄の都度炉
心管に回転ジョイントを接続しなければならず、作業性
が悪い。{1) When cleaning in the third cleaning tank, a rotary joint must be connected to the reactor core tube each time cleaning is performed, resulting in poor work efficiency.
‘2’炉心管には回転ジョイントを介して純水供給管を
接続しているため、本来ならば純水供給管が炉心管の回
転によって嫁れたりするわけはないが、実際には回転ジ
ョイント近傍を固定構造としていないため、純水供給管
が模れ、純水の供給が変動し、管内洗浄が充分行なえな
い欠点も生じる。'2' The pure water supply pipe is connected to the reactor core tube via a rotating joint, so normally there is no way that the pure water supply pipe would be affected by the rotation of the reactor core tube, but in reality the rotary joint Since the vicinity is not a fixed structure, the pure water supply pipe is imprinted, the supply of pure water fluctuates, and the inside of the pipe cannot be sufficiently cleaned.
{3’純水供給管は第3洗浄槽の底部を這う状態となる
ため、ゴム質の純水供給管がふつ酸に侵され、新に不純
物が発生し、炉心管を汚染するおそれもある。{3' Since the pure water supply pipe runs along the bottom of the third cleaning tank, there is a risk that the rubbery pure water supply pipe will be corroded by the acid, creating new impurities and contaminating the reactor core tube. .
{4} 炉○管の枝管部分は炉心管の一端部が急激に絞
む構造となっていて、洗浄液は板管から大径部である炉
心管内に流れ込む。{4} The branch pipe portion of the furnace tube has a structure in which one end of the furnace core tube is rapidly constricted, and the cleaning liquid flows from the plate tube into the large diameter portion of the furnace core tube.
この結果、絞む領域では流れの渦が発生して、この部分
では洗浄液の新陳代謝が極めて悪くなり、炉心管の絞り
曲面内壁での洗浄が充分できない。‘5} 板管のない
炉心管では大径な回転ジョイントが市場にないので、こ
のような洗浄装置では洗浄ができない。すなわち汎用性
が低い。■ 第1洗浄槽および第2洗浄槽の液中への炉
心管の出入時、炉心管を水平状態で出し入れする構造と
なっているため、炉心管を液中に沈める際枝管側が塞が
れていることもあって管内の空気のリークが不充分とな
る。As a result, a vortex of flow is generated in the constriction region, and the metabolism of the cleaning fluid is extremely slow in this region, making it impossible to sufficiently clean the inner wall of the constriction curved surface of the reactor core tube. '5} Since there are no large-diameter rotary joints on the market for reactor core tubes without plate tubes, such cleaning equipment cannot clean them. In other words, it has low versatility. ■ When the reactor core tube is inserted into and removed from the liquid in the first and second cleaning tanks, the structure is such that the reactor core tube is inserted and removed horizontally, so when submerging the reactor core tube into the liquid, the branch pipe side is not blocked. This may also result in insufficient air leakage within the pipe.
管内に残留する小さい気泡のためにエッチング、洗浄が
これなし、部分も生じエッチング、洗浄が効果的に行な
えない。また、管内の空気がリークしにくいので、管が
浮き、セット位置がずれてしまい、その後のアームによ
る支持等が不充分となったり、ローラ上に規定通りに管
を戦瞳させることができなくなったりする。したがって
、本発明の目的は、洗浄が充分行なえ、かつ作業能率の
高い管状物の洗浄装置を提供することにある。Due to the small air bubbles remaining in the tube, etching and cleaning are not possible, and the etching and cleaning cannot be performed effectively due to the formation of parts. In addition, since the air inside the tube is difficult to leak, the tube may float and the set position may shift, resulting in insufficient support by the arm or the inability to place the tube on the roller as specified. or Therefore, an object of the present invention is to provide a tubular object cleaning device that can perform sufficient cleaning and has high working efficiency.
また、本発明の他の目的は汎用性の高い管状物の洗浄装
置を提供することにある。Another object of the present invention is to provide a highly versatile cleaning device for tubular objects.
このような目的を達成するために本発明の一つの実施例
は、エッチング液を入れる第1洗浄槽と、純水を入れる
第2洗浄槽と、炉心管を回転させるとともに炉心管外周
面に純水を掛けかつ炉心管の一端から管内に純水を流し
込む機構群をする第3洗浄槽及び、これら各洗浄槽内に
順次炉心管を出入する移送機とを備える炉心管洗浄装置
において、前記第3洗浄槽の管内洗浄機構としては炉心
管の大径関口側から炉心管内壁に向かって純水を吹き付
ける純水噴射機構等の液体の噴出手段を設けたものであ
る。In order to achieve such an object, one embodiment of the present invention includes a first cleaning tank containing an etching solution, a second cleaning tank containing pure water, and rotating the core tube and applying pure water to the outer peripheral surface of the core tube. A core tube cleaning device comprising a third cleaning tank serving as a mechanism group for spraying water and flowing pure water into the tube from one end of the core tube, and a transfer device for sequentially moving the core tube in and out of each of these cleaning tanks. The pipe cleaning mechanism of the third cleaning tank is provided with liquid jetting means such as a pure water jetting mechanism that sprays pure water from the large-diameter entrance side of the core tube toward the inner wall of the core tube.
また、前記移送機構にあっては、各洗浄槽の液中への炉
○管の浸債時に炉○管が液面上に浮かないように、また
炉心管内に空気が残留しないように、さらに液中からの
炉心管の取出時に炉心管からの水切れが良好となるよう
に、一時的に炉心管を数回に亘つて煩斜支持する支持機
構を有する構造としたものであって、以下実施例により
本発明を説明する。第3図〜第7図a〜dは本発明の炉
○管洗浄装置の一実施例を示す。In addition, the transfer mechanism is designed to prevent the furnace tubes from floating above the liquid surface and to prevent air from remaining in the furnace tubes when the furnace tubes are immersed in the liquid of each cleaning tank. The structure has a support mechanism that temporarily supports the reactor core tube several times obliquely so that water can drain well from the reactor core tube when the reactor core tube is removed from the liquid. The invention will be illustrated by way of example. 3 to 7 a to 7 d show an embodiment of the furnace tube cleaning device of the present invention.
この実施例では第1図および第2図で示した前記炉心管
洗浄装置において、第3洗浄槽3の構造を一部改良し、
かつ炉心管4を支持するアーム7を含む移送機構を改良
したものである。すなわち、第3洗浄槽3の底板13上
には4個のロ−ラ5が取り付けうれ、それぞれ対となる
2個のローラ5でそれぞれ炉心管4の両端近傍を支える
ようになっている。また、一側に位置する2つのローラ
5の中心には、一本の連結軸14が固定状態で貫通して
いる。この連結軸14は第3洗浄槽3の一端例のカバー
15の下に配設されるモータ16の回転軸17にカップ
リング18を介して連結され、モータ16の駆動によっ
て回転するようになっている。したがって、ローフ5上
に炉心管4を敷遣してモータ16を駆動させると、炉心
管4はローラ5によって回転する。また、第3洗浄槽3
のカバー15側には純水からなる洗浄液を噴射する純水
噴射機構19が配設されている。この純水噴射機構19
は純水を噴き出すジェットノズル20と、このジェット
ノズル20‘こ純水を導く供給管21とからなっている
。また、前記ジェットノズル20は上下にジェットノズ
ルを揺動させる首振部22をも有している。また、第3
洗浄槽3の両側内壁上部には、ローラ5上に戦層される
炉心管4に純水を吹き付ける複数の噴射孔(図示せず)
を有する噴射管6が配設されている。一方、炉心管4を
移送する移送機構は第5図に示す構造となっている。In this embodiment, in the core tube cleaning device shown in FIGS. 1 and 2, the structure of the third cleaning tank 3 is partially improved,
Moreover, the transfer mechanism including the arm 7 that supports the reactor core tube 4 is improved. That is, four rollers 5 are mounted on the bottom plate 13 of the third cleaning tank 3, and each pair of rollers 5 supports the vicinity of both ends of the furnace tube 4, respectively. Further, one connecting shaft 14 is fixedly fixed and passes through the center of the two rollers 5 located on one side. This connecting shaft 14 is connected via a coupling 18 to a rotating shaft 17 of a motor 16 disposed under a cover 15 at one end of the third cleaning tank 3, and is rotated by the drive of the motor 16. There is. Therefore, when the hearth tube 4 is placed on the loaf 5 and the motor 16 is driven, the hearth tube 4 is rotated by the rollers 5. In addition, the third cleaning tank 3
A pure water injection mechanism 19 for spraying a cleaning liquid made of pure water is disposed on the cover 15 side. This pure water injection mechanism 19
It consists of a jet nozzle 20 that spouts out pure water, and a supply pipe 21 that guides the pure water to the jet nozzle 20'. The jet nozzle 20 also has a swinging section 22 that swings the jet nozzle up and down. Also, the third
At the top of both inner walls of the cleaning tank 3, there are a plurality of injection holes (not shown) for spraying pure water onto the reactor core tube 4 layered on the rollers 5.
An injection pipe 6 having a diameter is provided. On the other hand, the transfer mechanism for transferring the furnace core tube 4 has a structure shown in FIG.
すなわち、第1洗浄槽1〜第3洗浄槽3の上方にはこれ
らを共に横切るように2本のレール23が配設され、こ
のレール23上には可動箱24が車輪25を介して載っ
ている。この車輪25は図示しないモー夕系によって回
転制御される。また、可動箱24の底面からは下端が円
弧状に屈曲し、その屈曲部に炉心管4を敷置するアーム
7が二本延びている。これらアーム7の上端はそれぞれ
可動箱24内の昇降板26に固定され支持されている。
これら昇降板26は可動箱24内で鉛直方向に延びる2
本のガイド27に滑動自在に競合している。また、昇降
板26には前記ガイド27に平行となるねじ棒28が螺
合し、このねじ棒28の上端はカップリング29を介し
て可動箱24の天井板30の上面に支持板31を介して
固定された昇降用モータ32の回転軸33に連結されて
いる。したがってアーム、昇降板、ねじ榛、モータ等か
らなる支持機構にあって、前記昇降用モータ32を正転
させると昇降板26は下降するため、アーム7も下降し
、昇降用モー夕32を逆転させると昇降板26は上昇す
る。また、2本のアーム7は個別に昇降制御が可能とな
っている。つぎに、このような炉心管洗浄装置による洗
浄動作について、第6図a〜eおよび第7図a〜dをも
参照しながら説明する。That is, two rails 23 are disposed above the first to third cleaning tanks 1 to 3 so as to cross them together, and a movable box 24 is mounted on these rails 23 via wheels 25. There is. The rotation of this wheel 25 is controlled by a motor system (not shown). Further, from the bottom surface of the movable box 24, the lower end thereof is bent in an arc shape, and two arms 7 extend from the bent portion on which the furnace core tube 4 is placed. The upper ends of these arms 7 are each fixed and supported by a lifting plate 26 inside the movable box 24.
These elevating plates 26 extend vertically within the movable box 24.
It slidably competes with the guide 27 of the book. Further, a threaded rod 28 parallel to the guide 27 is screwed into the lifting plate 26, and the upper end of this threaded rod 28 is connected to the upper surface of the ceiling plate 30 of the movable box 24 via a support plate 31 via a coupling 29. It is connected to a rotating shaft 33 of an elevating motor 32 which is fixed. Therefore, in a support mechanism consisting of an arm, an elevating plate, a screw, a motor, etc., when the elevating motor 32 is rotated in the normal direction, the elevating plate 26 is lowered, so the arm 7 is also lowered, and the elevating motor 32 is reversely rotated. When this is done, the elevating plate 26 rises. In addition, the two arms 7 can be individually controlled up and down. Next, the cleaning operation by such a core tube cleaning device will be described with reference to FIGS. 6 a to 6 e and 7 a to d.
まず、移送機構のアーム7に炉心管4を引っ掛けた後、
移送機構を第1洗浄槽1の真上で停止させ、第6図a,
bで示すように2組の支持機構の昇降用モータ32を共
に正回転させて炉0管4を水平状態を保って降下させる
。そして、炉心管4の下面がエッチング液8に接触する
頃、一方の支持機構のアーム7の下降を停止させ、他方
の支持機構のアーム7の下降をのみ続行する。停止側ア
ーム7は炉心管4の枝管10側を支持している。したが
って、同図cで示すように、炉心管4はその大蓬部から
エッチング液8中に入る。この大径部側はストレートな
円管となることから管も浮くようなことなく管内にはス
ムーズにエッチング液が入り込む。つぎに、同図dで示
すように、他方のアーム7を停止させ、一方のアーム7
を下降させて炉心管4をその枝管側からエッチング液中
に入れる。First, after hooking the reactor core tube 4 to the arm 7 of the transfer mechanism,
The transfer mechanism is stopped directly above the first cleaning tank 1, and as shown in FIG.
As shown in b, the lifting motors 32 of the two sets of support mechanisms are both rotated in the forward direction to lower the furnace tube 4 while keeping it in a horizontal state. Then, when the lower surface of the furnace tube 4 comes into contact with the etching liquid 8, the lowering of the arm 7 of one support mechanism is stopped, and only the lowering of the arm 7 of the other support mechanism is continued. The stop-side arm 7 supports the branch pipe 10 side of the reactor core tube 4. Therefore, as shown in FIG. 2c, the furnace tube 4 enters the etching solution 8 from its large opening. Since this large-diameter side is a straight circular tube, the etching solution smoothly enters the tube without floating the tube. Next, as shown in d in the same figure, the other arm 7 is stopped, and one arm 7 is
is lowered and the furnace core tube 4 is placed into the etching solution from its branch tube side.
この際、エッチング液は大経側からも枝管内に流れ込む
ので、炉心管4が浮き上がったりしない。また、枝管1
0が炉心管4の大蓬部よりも下方に位置する頃斜状態と
なった所で一方のアーム7の降下を停止させ、代りに停
止状態にあった他方のアーム7を徐徐に降下させ、炉心
管4をエッチング液8中に水平状態で停止させ、炉心管
内の付着層のエッチングを行なう。このように、炉心管
4を交互に斜の状態にてエッチング液中に浸潰させるた
め、炉心管内に気泡が残留することはない。つぎに、エ
ッチングによって管壁の不所望付着層が溶解された頃、
第T図a〜dで示す手日頃で炉心管4をエッチング液中
から引き上げる。すなわち、同図aで示すように、エッ
チング液8中で水平状態となっている炉心管にあって、
同図bで示すように一方のアーム7を上昇させ、枝管1
0が上位置となるように炉心管4を傾斜させる。つぎに
、この状態で両方のアーム7を共に上昇させる。すると
、炉心管のエッチング液が流れる管内壁底面は全て同一
方向の傾きをする面、すなわち、同図cで示すように左
上がりの底面となり、エッチング液は胆外されることな
く管内から流れ落ちる。この炉心管4が傾斜状態でエッ
チング液上に引き上げられた後、同図dで示すように枝
管10側の一方のアーム7の上昇は停止し、他方のアー
ム7が上昇して炉心管4を水平状態とする。つぎに、移
送機構は移動して第2洗浄槽2上で停止し、前記手順と
同様な手順で炉心管4を洗浄液(純水)中に一定時間浸
潰させて炉心管の内外壁を洗浄する。つぎに、移送機構
は炉心管4を第3図および第4図に示すように、第3洗
浄槽3内に搬送する。At this time, since the etching solution flows into the branch pipes from the major side as well, the furnace core tube 4 does not float up. Also, branch pipe 1
0 is located below the large part of the reactor core tube 4, the lowering of one arm 7 is stopped, and the other arm 7, which has been in a stopped state, is gradually lowered, The reactor core tube 4 is suspended horizontally in the etching solution 8, and the deposited layer inside the reactor core tube is etched. In this manner, since the furnace core tube 4 is alternately immersed in the etching liquid in an oblique state, no air bubbles remain in the furnace core tube. Next, when the undesired adhesion layer on the tube wall is dissolved by etching,
The furnace core tube 4 is lifted out of the etching solution on a daily basis as shown in FIGS. That is, as shown in FIG.
As shown in figure b, one arm 7 is raised and the branch pipe 1 is
The furnace core tube 4 is tilted so that 0 is in the upper position. Next, both arms 7 are raised together in this state. As a result, the bottom surfaces of the inner walls of the furnace core tubes through which the etching solution flows are all inclined in the same direction, that is, as shown in FIG. After the core tube 4 is lifted onto the etching solution in an inclined state, one arm 7 on the side of the branch tube 10 stops rising, and the other arm 7 rises, causing the core tube 4 to rise as shown in d in the same figure. is in a horizontal state. Next, the transfer mechanism moves and stops above the second cleaning tank 2, and the core tube 4 is immersed in the cleaning liquid (pure water) for a certain period of time in the same manner as described above to clean the inner and outer walls of the core tube. do. Next, the transfer mechanism transfers the reactor core tube 4 into the third cleaning tank 3, as shown in FIGS. 3 and 4.
炉心管4は大蓬部をジェットノズル20側に対岐させた
状態でローラ5上に載る。この際、アーム7の屈曲部は
炉心管4の下面からわずか下方に外れる。すると、モー
タ16が駆動してローラ5が回転することから、炉心管
4は回転し、これと同時に噴射管6から純水が吹き出さ
れ、炉心管4の外周壁が洗浄される。また、同時にジェ
ットノズル20からも賢いよく純水が噴射され、この水
流は回転する炉心管4の内壁に当たる。また、ジェット
ノズル20の首振部22が首を振ることから水流は炉○
管の母線に沿って移動するため、炉○管4の内壁全域が
炉心管の回転もあって洗浄される。また、水流は奥の絞
り曲面部や枝管内壁にも勢い良く当たるため、洗浄が効
果的に行なえる。なお、汚れた洗浄液は排水口34から
排水される。このように一定時間洗浄されると、ジェッ
トノズル20および噴射管6からの純水の噴射は停止さ
れ、モータ16の回転も停止する。そして、アーム7が
上昇して洗浄化された炉心管4は所定位置に運ばれ、一
連の洗浄作業が完了する。このように実施例によれば、
炉心管のエッチング液および洗浄液内への浸債にあって
、管内に空気を残留させることな〈浸債できる。また、
勢いよく管壁に水流を当てることができる等のことから
、管壁に付着する不所望被膜を完全に除去できかつ清浄
化できる。また、この実施例によれば、炉心管内に洗浄
液を流すために、炉心管の枝管に回転ジョイントを介し
て純水供給管等を接続する必要もないので、作業性が向
上する。The furnace core tube 4 is placed on the rollers 5 with its large section branched toward the jet nozzle 20 side. At this time, the bent portion of the arm 7 is slightly removed downward from the lower surface of the furnace core tube 4. Then, since the motor 16 is driven and the roller 5 rotates, the furnace core tube 4 rotates, and at the same time, pure water is blown out from the injection tube 6 to clean the outer peripheral wall of the furnace core tube 4. At the same time, pure water is also jetted from the jet nozzle 20, and this water stream hits the inner wall of the rotating reactor core tube 4. In addition, since the swinging part 22 of the jet nozzle 20 swings its head, the water flow is
Since it moves along the generatrix of the tube, the entire inner wall of the furnace tube 4 is cleaned due to the rotation of the furnace core tube. In addition, the water flow hits the inner wall of the constrictor and the inner wall of the branch pipe with great force, allowing for effective cleaning. Note that the dirty cleaning liquid is drained from the drain port 34. After cleaning for a certain period of time in this way, the injection of pure water from the jet nozzle 20 and the injection pipe 6 is stopped, and the rotation of the motor 16 is also stopped. Then, the arm 7 rises and the cleaned reactor core tube 4 is carried to a predetermined position, completing a series of cleaning operations. Thus, according to the embodiment,
When immersing the reactor core tube into the etching solution and cleaning solution, it is possible to immerse the reactor core tube into the etching solution and cleaning solution without leaving any air remaining in the tube. Also,
Since the water stream can be applied vigorously to the pipe wall, it is possible to completely remove and clean the undesirable film adhering to the pipe wall. Furthermore, according to this embodiment, there is no need to connect a pure water supply pipe or the like to a branch pipe of the reactor core tube via a rotary joint in order to flow the cleaning liquid into the reactor core tube, so that work efficiency is improved.
また、第3洗浄槽内にゴム等からなる純水供給管もない
ので、エッチング液に侵されることもなく新な不純物の
発生もない。したがって、炉心管の再汚染も生じない。
また、この実施例では炉心管の一端関口側から水流を管
内壁に吹き付ける構造のため枝管のない炉心管であって
も確実に洗浄でき、汎用性に優れている。Further, since there is no pure water supply pipe made of rubber or the like in the third cleaning tank, there is no possibility of being attacked by the etching solution and no new impurities are generated. Therefore, recontamination of the reactor core tube does not occur.
Further, in this embodiment, since the structure is such that water is sprayed onto the inner wall of the tube from one end of the entrance, even a core tube without branch pipes can be reliably cleaned, and is highly versatile.
また、この実施例では液中への炉心管の出入時炉心管を
適宜傾けて浸漬、取出しできる構造となっていることか
ら、浸漬時管内に気泡が残留したり、あるいは液面に炉
心管が浮いてアームに対して移動したりすることはない
。In addition, in this embodiment, the structure is such that the tube can be immersed and taken out by tilting it appropriately when entering and exiting the liquid. It does not float and move relative to the arm.
したがって、前者ではエッチング、洗浄の均一性が保た
れ、後者では所望の状態で炉心管がアームに支持あるい
はローラ上に支持され、自動化も可能となる。なお、本
発明は前記実施例に限定されない。Therefore, in the former case, the uniformity of etching and cleaning is maintained, and in the latter case, the reactor core tube is supported on an arm or on a roller in a desired state, and automation is also possible. Note that the present invention is not limited to the above embodiments.
たとえば、ジェットノズルは液体中で用いてもよい。以
上のように、本発明の炉心管洗浄装置によれば、洗浄が
充分でかつ作業能率が高く、さらに汎用性の優れた炉心
管洗浄装置を提供することができる。For example, jet nozzles may be used in liquids. As described above, according to the core tube cleaning device of the present invention, it is possible to provide a core tube cleaning device that provides sufficient cleaning, high work efficiency, and excellent versatility.
第1図および第2図は炉D管洗浄装置の一部説明図であ
って、第1図は洗浄動作を示す動作図、第2図は第3洗
浄槽における炉心管内外の洗浄状態を示す一部断面図で
ある。
第3図〜第7図a〜dは本発明の炉心管洗浄装置の一実
施例を示し、第3図は第3洗浄槽の一部断面図、第4図
は同じく一部平面図、第5図は移送機構の一部を示す断
面図、第6図a〜eは液中への炉心管の浸燈状態を示す
動作図、第7図a〜dは液中からの炉心管の取出状態真
を示す動作図である。1・・・・・・第1洗浄槽、2・
・・・・・第2洗浄槽、3・・・・・・第3洗浄槽、4
・・・・・・炉心管、5・・・・・・ローラ、6・・・
…噴射管、7・・・・・・アーム、8・…・・エッチン
グ液、9・・・・・・洗浄液、10・・・…細警部(枝
管)、11・・・・・・回転ジョィン、12・・・・・
・純水供給管、13・・…・底板、14・・・・・・連
結軸、15・・・…カバ−、16…・・・モータ、17
・・・・・・回転軸、18・・・・・・カップリング、
19・・・・・・純水噴射機構、20・・・・・・ジェ
ットノズル、21・・・・・・供給管、22・・・・・
・百振部、23・・・・・・レール、24・・・・・・
可動箱、25・・・・・・車輪、26・…・・昇降板、
27・・・・・・ガイド、28・・・・・・ねじ榛、2
9・・・・・・カップリング、30・・・・・・天井板
、31・・・…支持板、32・・・・・・昇降用モータ
、33・・・・・・回転軸、34……排水口。
第1図
第2図
第3図
第4図
第5図
第6図
第7図Figures 1 and 2 are partial explanatory diagrams of the furnace D pipe cleaning device, with Figure 1 being an operational diagram showing the cleaning operation, and Figure 2 showing the state of cleaning inside and outside the core tube in the third cleaning tank. It is a partially sectional view. 3 to 7 a to 7 d show an embodiment of the core tube cleaning device of the present invention, FIG. 3 is a partial sectional view of the third cleaning tank, FIG. 4 is a partial plan view, and FIG. Figure 5 is a cross-sectional view showing a part of the transfer mechanism, Figures 6 a to e are operational diagrams showing the state of immersion of the core tube into the liquid, and Figures 7 a to d are the removal of the core tube from the liquid. It is an operation diagram showing a true state. 1...First cleaning tank, 2.
...Second cleaning tank, 3...Third cleaning tank, 4
...Furnace tube, 5...Roller, 6...
... Injection pipe, 7 ... Arm, 8 ... Etching liquid, 9 ... Cleaning liquid, 10 ... Inspector (branch pipe), 11 ... Rotation Join, 12...
・Pure water supply pipe, 13...Bottom plate, 14...Connection shaft, 15...Cover, 16...Motor, 17
...Rotating shaft, 18...Coupling,
19...Pure water injection mechanism, 20...Jet nozzle, 21...Supply pipe, 22...
・Hyakushibu, 23...Rail, 24...
Movable box, 25...wheels, 26...lifting plate,
27...Guide, 28...Nejisha, 2
9... Coupling, 30... Ceiling plate, 31... Support plate, 32... Lifting motor, 33... Rotating shaft, 34 ...Drain port. Figure 1 Figure 2 Figure 3 Figure 4 Figure 5 Figure 6 Figure 7
Claims (1)
させる機構と(b) 上記被処理管状物の内面の処理液
または洗浄水を供給するための液体噴出手段と(c)
上記被処理管状物の外面に処理液または洗浄水を供給す
るための液体供給手段よりなることを特徴とする被処理
管状物の洗浄装置。1 (a) a mechanism for rotating the tubular object to be treated around an axis of rotational symmetry; (b) a liquid jetting means for supplying a treatment liquid or cleaning water to the inner surface of the tubular object to be treated; and (c)
A cleaning device for a tubular object to be processed, comprising a liquid supply means for supplying a processing liquid or cleaning water to the outer surface of the tubular object to be processed.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP53046579A JPS6032717B2 (en) | 1978-04-21 | 1978-04-21 | cleaning equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP53046579A JPS6032717B2 (en) | 1978-04-21 | 1978-04-21 | cleaning equipment |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS54138827A JPS54138827A (en) | 1979-10-27 |
| JPS6032717B2 true JPS6032717B2 (en) | 1985-07-30 |
Family
ID=12751204
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP53046579A Expired JPS6032717B2 (en) | 1978-04-21 | 1978-04-21 | cleaning equipment |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6032717B2 (en) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5996296A (en) * | 1982-11-26 | 1984-06-02 | Nippon Steel Corp | Surface treatment of long sized material |
| JP2731720B2 (en) * | 1994-03-24 | 1998-03-25 | 山形日本電気株式会社 | Furnace tube cleaning equipment |
| KR100408566B1 (en) * | 2001-09-05 | 2003-12-06 | 동부전자 주식회사 | Apparatus For Cleaning Quartz Tube |
| JP4127996B2 (en) * | 2001-10-25 | 2008-07-30 | Necエレクトロニクス株式会社 | Tube cleaning device and cleaning method thereof |
| US7073522B2 (en) * | 2004-04-05 | 2006-07-11 | Quantum Global Technologies, Llc | Apparatus for applying disparate etching solutions to interior and exterior surfaces |
-
1978
- 1978-04-21 JP JP53046579A patent/JPS6032717B2/en not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPS54138827A (en) | 1979-10-27 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| KR100282160B1 (en) | Substrate treatment device and processing method | |
| US5376176A (en) | Silicon oxide film growing apparatus | |
| JP3131149B2 (en) | Flow liquid scrubber cleaning method and apparatus | |
| CN101409211B (en) | Substrate processing apparatus and method of cleaning the same | |
| JPS63185029A (en) | Wafer treatment apparatus | |
| US20010041311A1 (en) | Coating and developing method and apparatus therefor | |
| JP3341727B2 (en) | Wet equipment | |
| JP3665715B2 (en) | Developing method and developing apparatus | |
| JPH08139007A (en) | Cleaning method and device | |
| TW202041289A (en) | Cleaning chamber and cleaning equipment | |
| JPS6032717B2 (en) | cleaning equipment | |
| JPH1190359A (en) | Overflow scrub cleaning method and apparatus | |
| JPH04200768A (en) | Coating apparatus | |
| JPH0156147B2 (en) | ||
| CN111151504A (en) | Polysilicon cleaning machine and method for cleaning polysilicon | |
| CN115565916A (en) | Wafer cleaning and drying device and method using Marangoni effect | |
| JP2007123559A (en) | Substrate processing apparatus and substrate processing method | |
| JPH04118067A (en) | Coating device | |
| JP3441896B2 (en) | Substrate processing equipment | |
| JP3068404B2 (en) | Semiconductor substrate cleaning equipment | |
| CN219393340U (en) | Cleaning and stripping device and cleaning and stripping system | |
| CN214417128U (en) | Wafer cleaning device | |
| KR0123423Y1 (en) | Device for wet etching | |
| KR100646060B1 (en) | Developing method and developing apparatus | |
| JPS63299233A (en) | Processor |